CN102902192A - Computer-generated holographic element used for installing, adjusting or detecting optical elements - Google Patents
Computer-generated holographic element used for installing, adjusting or detecting optical elements Download PDFInfo
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Abstract
The invention provides a computer-generated holographic element used for installing, adjusting or detecting optical elements. The computer-generated holographic element comprises one or more functional areas, wherein different functional areas represent different grating structures, which are respectively a transmission major holographic area (301), a reflection aligning holographic area (302), a basic holographic area (303) and a projection holographic area (304). When the optical elements are installed, adjusted or detected, the computer-generated holographic element adopting the computer-generated holographic element has the advantages of being high in precision, convenient to operate and the like, and is applicable to production enterprises or scientific research units which need to carry out location, aiming or guide on certain systems.
Description
Technical field
The invention belongs to the optic test field, relate in particular to a kind of computing machine be used to debuging or detect optical element and generate holographic (CGH, Computer Generated Hologram) element.
Background technology
Calculation holographic (CGH) combines advanced person's computer technology and light holographic technique, can realize some specific function that optical holography can't be realized or be difficult to realize.Be to utilize the interference of light principle such as optical holography, be recorded on the photosensitive material by means of the complex amplitude of reference light with thing light, one of necessary condition that can realize this record is the necessary being of object.Yet desirable " object " is difficult to be successful in a lot of practical applications, for example, standard component for detection of the optical element crudy, the various special spatial filter that is used for optical information processing, the phase-shifter that is used for data-storage system, the complex model that is used for engineering design, etc.But, just be not difficult to have realized with calculation holographic (CGH).Compare with optical holography, calculation holographic (CGH) has advantages of that also noise is low, repeatability is high, antijamming capability strong and can consider in advance error component.Therefore, in recent years, calculation holographic (CGH) development is extremely rapid, oneself is applied in all many-sides such as 3-D display, Holographic Interferometry, spatial filtering, optical information storage and laser scanning, along with the reaching its maturity and popularizing of computer technology, calculation holographic (CGH) more and more is subject to people's attention.
Most important and application most worthy of calculation holographic (CGH) is for interference testing, use its and reproduce and store in the reality of some special shapes the optical reference corrugated that can't produce with optical instrument, in interference testing, can be used for detecting the object that some have the special bit phase change.CGH is device by way of compensation, has a compensated wave surface accuracy high, and engaged test bulk is little, is easy to the advantages such as adjustment.
Point-diffraction interferometer can be used for carrying out high precision and detect aspheric surface, information carrier during its work is the aperture diffracted wave, the registration accuracy at incident light convergent point and aperture center directly affects the accuracy of aperture point diffraction wave surface, therefore, aperture is carried out the important process that accurate centralized positioning is guarantee point diffraction interferometer accuracy of detection.Can realize the aperture centralized positioning and provide working beam for little diffraction by aperture based on the optical system of CGH.
The present invention has designed a kind of new CGH form, utilizes it to debug or during testing, has the advantages such as precision is high, easy to operate.
Summary of the invention
The present invention just is based on the advantage of CGH in debuging and detecting, a kind of new CGH element form is provided, four kinds of functions corresponding to the needs realization, this CGH element has four different diffraction grating zones, and they are respectively transmission main hologram zone, reflected alignment holographic region, benchmark holographic region and projection holographic region.The present invention is take the CGH element application in the aperture center positioning device as example, provides a kind of for the aperture centralized positioning and the CGH element of working beam is provided for little diffraction by aperture.Except can be used for carrying out centralized positioning and for little diffraction by aperture provides these two functions of working beam for aperture, CGH element provided by the invention also can be used for debuging CGH and debugs aperture.
The technical solution used in the present invention is: a kind of computing machine be used to debuging or detect optical element generates holographic element, described computing machine be used to debuging or detect optical element generates holographic element and has comprised one or more functional areas, the difference in functionality zone is different optical grating construction, and they are respectively the transmission main holograms, reflected alignment is holographic, benchmark is holographic and projection is holographic.Described transmission main hologram is the phase-type grating, and reflected alignment is holographic, benchmark is holographic, the projection holography can be chosen phase-type grating or amplitude grating, so-called phase-type grating refers to realize mutually by the position of direct change light wave face the grating of diffraction and interference, and so-called amplitude grating refers to realize by changing zones of different place light wave face amplitude the grating of diffraction and interference.
Described computing machine generates each zone of holographic element and is periodically variable one or more grating composition by structure; Described computing machine generates each zone of holographic element can choose the mutually degree of depth of different grating cycles, dutycycle and cutting position according to actual conditions, so-called dutycycle refers to the ratio of cutting width and fringe period, the so-called cutting position phase degree of depth is the light light path change amount that is caused by cutting, and it is relevant with the cutting geometric depath with the refractive index of substrate.Described benchmark is holographic generally to be comprised of symmetrical two parts or many parts; Described transmission main hologram, benchmark are holographic and throw holographic trizonal surface coverage and increase transmission film, and the surface coverage reflection enhancing coating of reflected alignment holographic region.
The grating that described computing machine generates four location of holographic element is used the means such as laser direct-writing and is etched on the same surface of substrate, and this substrate is to melt the quartzy transparent material with appropriate index that waits; Be reserved with the gap area of being convenient to multiple exposure between the grating of four location of described computing machine generation holographic element; The order of diffraction that the area of raster size of four location of described computing machine generation holographic element and distributing position are used separately is inferior and present stage processes, the impact of detection level, the grating of four location is guaranteeing to detect on the basis of interferogram observation contrast and aperture centralized positioning precision, can choose the different orders of diffraction according to actual conditions inferior, the area of raster size of choosing and distributing position need to guarantee that the size of grating minimum period structure can realize processing and detection, and present stage, this was of a size of micron dimension.
The light that described transmission main hologram will come from pointolite carries out diffraction, diffraction light converges at the aperture center, this diffraction light is the working beam of inputting in order to realize little diffraction by aperture, and this convergent point is approximately desirable Airy disk, and Airy disk refers to that the point-like object is through ideal image system imaging.
The light that described reflected alignment holography will come from pointolite reflects and diffraction, the inferior diffracted ray of one of them order of diffraction returns according to former road, converge at the pointolite place, this diffraction light and the reference light that return are interfered, and are used for realizing accurately debuging of CGH element itself.
The light that described benchmark holography will come from pointolite carries out diffraction, the inferior diffraction light of one of them grade converges on the front thin film planar of a diffractive plate, reflected by thin film planar successively and again returned behind the diffraction by the benchmark holography, converge at the pointolite place, this diffraction light and the reference light that return are interfered, for accurately debuging of aperture on the realization point diffractive plate.
The holographic light that will come from pointolite of described projection carries out diffraction, so that light produces the hot spot mark at CCD, this mark can be the hot spot mark of a mark, cross curve mark or other shape according to the holographic version difference of projection.
Symcenter, aperture center and the pointolite of the holographic mark that produces of described projection are located along the same line.
The present invention's advantage compared with prior art is:
CGH element provided by the invention can be used for realizing high-precision aperture centralized positioning and provides accurately working beam for little diffraction by aperture, simultaneously, this CGH element can be used for auxiliary high precision of carrying out CGH element and some diffractive plate and debugs, this provides accuracy guarantee for the aperture centralized positioning, therefore, with debuging of carrying out of CGH element of the present invention with detection has the advantages such as precision is high, easy to operate, the manufacturing enterprise and the R﹠D institution that are suitable for positioning, aiming at or to lead some system use.
Description of drawings
The device schematic diagram of Fig. 1 for carrying out the aperture centralized positioning with the present invention;
Fig. 2 A is the schematic layout pattern that the present invention only contains the CGH element of transmission main hologram 301;
Fig. 2 B is the schematic layout pattern that the present invention contains the CGH element of transmission main hologram 301 and reflected alignment holography 302;
Fig. 2 C is the schematic layout pattern that the present invention contains the CGH element of transmission main hologram 301 and benchmark holography 303;
Fig. 2 D is the schematic layout pattern that the present invention contains the CGH element of transmission main hologram 301 and projection holographic 304;
Fig. 2 E is the schematic layout pattern that the present invention contains the CGH element of transmission main hologram 301, reflected alignment holographic 302 and benchmark holography 303;
Fig. 2 F is the schematic layout pattern that the present invention contains the CGH element of transmission main hologram 301, reflected alignment holographic 302 and projection holographic 304;
Fig. 2 G is the schematic layout pattern that the present invention contains the CGH element of transmission main hologram 301, benchmark holographic 303 and projection holographic 304;
Fig. 2 H is the schematic layout pattern that the present invention contains the CGH element of transmission main hologram 301, reflected alignment holographic 302 and projection holographic 304;
Fig. 3 is for realizing the design concept figure of reflected alignment holography 302 of the present invention;
Fig. 4 is for realizing the design concept figure of benchmark holography 303 of the present invention;
Fig. 5 is for making CGH element production and processing process figure of the present invention.
Embodiment
Below in conjunction with the drawings and specific embodiments the present invention is described in further detail.
The below is applied to the aperture center positioning device as example take CGH element 3, introduces in detail respectively the contents such as design concept, principle of work and method for making of transmission main hologram 301, reflected alignment holography 302, benchmark holographic 303 and holographic 304 4 functional areas of projection.
Can realize the aperture centralized positioning and provide working beam for little diffraction by aperture based on the optical system of CGH element 3.The aperture center positioning device as shown in Figure 1, the aperture center positioning device mainly is comprised of interferometer 1, standard lens 2, CGH 3, some diffractive plate 4 and CCD 5, wherein CGH 3 is parts of most critical in the optical system.
Four zones that function is different such as transmission main hologram 301, reflected alignment holography 302, benchmark holographic 303 and projection holographic 304 that can distribute on the described CGH element 3, wherein one or both or three kinds can certainly only distribute.Fig. 2 A is depicted as the schematic layout pattern that the present invention only contains the CGH element of transmission main hologram; Fig. 2 B is the schematic layout pattern that the present invention contains the CGH element of transmission main hologram and reflected alignment holography; Fig. 2 C is the schematic layout pattern that the present invention contains transmission main hologram and basic quasi holographic CGH element; Fig. 2 D is the schematic layout pattern that the present invention contains the CGH element of transmission main hologram and projection holography; Fig. 2 E is that the present invention contains the transmission main hologram, reflected alignment is holographic and the schematic layout pattern of basic quasi holographic CGH element; Fig. 2 H is that the present invention contains the transmission main hologram, reflected alignment is holographic and the schematic layout pattern of the CGH element that projection is holographic.
Four kinds of diffraction grating of CGH element 3 are used the etching means portrayals such as laser direct-writing or electron-beam direct writing on the same surface of same substrate.The making substrate of CGH element 3 is to melt the quartzy transparent material with appropriate index that waits.Distribution area size and the distributing position of the grating at 3 four functional area places of CGH element can change, and this variation is in order to improve the interferogram contrast and to improve aperture centralized positioning degree of accuracy.The grating distribution area size at four functional area places and inferior impact of the order of diffraction that distributing position is used separately, each regional grating can use the different orders of diffraction inferior according to actual conditions.The grating distribution area size at four functional area places and distributing position are subjected to the impact of present stage processing, detection level simultaneously, the grating minimum period size of structure can not be too little, want to realize processing, detect, adopting the Laser Processing minimum period is micron dimension, if adopting the electron beam process minimum period is nanometer scale (as coming etched diffraction grating with the laser direct-writing mode, then the size of grating minimum period structure can not be less than 1 μ m).To be reserved with the gap area of being convenient to multiple exposure between each regional grating, be grade.
Different according to the distribution area of each location grating size and distributing position, CGH element of the present invention has various versions, and Fig. 2 A-Fig. 2 H has just enumerated wherein part-structure form.
Transmission main hologram 301 is phase-type gratings, uses the phase-type grating to be conducive to improve the efficiency of light energy utilization, and so-called phase-type grating refers to realize mutually by changing light wave face position, zones of different place the grating of diffraction interference.Transmission main hologram 301 is comprised of a plurality of mutually similar periodic structures.Transmission main hologram 301 can be chosen according to actual conditions and use different dutycycles, and dutycycle refers to the ratio of cutting width and fringe period; Can choose the different cutting position phase degree of depth, the cutting position phase degree of depth is the light light path change amount that is caused by cutting, and it is relevant with the cutting geometric depath with the refractive index of substrate.Transmission main hologram 301 can be distributed in single zone or a plurality of zone according to actual conditions.Transmission main hologram 301 zones will cover and increase transmission film, and transmitance is greater than 99%.
The function that described transmission main hologram 301 has is as follows: the diffraction light that certain one-level is inferior converges to the aperture center on the diffractive plate 4, is reached for point-diffraction interferometer the purpose of work with light beam is provided.
Described transmission main hologram 301 designs according to Fresnel (Fresnel) wavestrip method, and the detailed process of designing and making transmission main hologram 301 is as follows:
According to inciding the form of transmission main hologram 301 light beams, the employed order of diffraction time and transmission main hologram 301 from standard lens 2 to design conditionss such as a diffractive plate 4 distances, transmission main hologram 301 region segmentations are become many concentric little endless belt, between the adjacent endless belt on the diffractive plate 4 the optical path difference half wavelength at aperture center and each endless belt area approximation equate;
Use Micrometer-Nanometer Processing Technology that transmission main hologram 301 odd number endless belt territories or even number endless belt territory are carried out cutting and plated anti-reflection film, wherein groove depth can be chosen different values with thicknesses of layers according to actual conditions.
Described reflected alignment holography 302 is according to actual conditions optional fetch bit facies pattern grating or amplitude grating, and so-called amplitude grating refers to realize by changing zones of different place light wave face amplitude the grating of diffraction interference.Reflected alignment holography 302 is comprised of a plurality of mutually similar periodic structures.Reflected alignment holography 302 can be chosen the mutually degree of depth of different grating cycles, dutycycle and cutting position according to actual conditions.Reflected alignment holography 302 can be distributed in single zone or a plurality of zone according to actual conditions.Holographic 302 zones of reflected alignment will cover reflection enhancing coating.
Described benchmark holography 303 is according to actual conditions optional fetch bit facies pattern grating or amplitude grating.Benchmark holography 303 is comprised of a plurality of mutually similar periodic structures.Benchmark holography 303 can be chosen the mutually degree of depth of different grating cycles, dutycycle and cutting position according to actual conditions.Benchmark holographic 303 generally is comprised of symmetrical two parts or many parts.Holographic 303 zones of benchmark will cover and increase transmission film.
The function that described reflected alignment holographic 302 and benchmark holography 303 have is as follows: reflected alignment holographic 302 is used for debuging CGH3 itself, and benchmark holographic 303 is used for debuging a diffractive plate 4, and the principle that they are used for the assembling ﹠ adjusting system parts is as follows:
Utilization is with the detection corrugated of debuging control information and do not interfere with the reference corrugated of debuging control information, and by debuging of adjustment component, so that interferogram reaches the most approaching not with the pattern of interference ring, at this moment, parts are debug correctly;
With interferogram the thought of debuging error is described as follows:
(Gram-Schmidt) orthogonalization method will detect the corrugated and carry out Ze Nike (Zernike) fitting of a polynomial with reference to the difference on corrugated, and Ze Nike (Zernike) polynomial expression is by Glan nurse-Schmidt
Wherein, a
iFor detecting the Ze Nike fitting coefficient on corrugated; Z
i(ρ, θ) is zernike polynomial, and it adopts polar coordinates to express, and ρ is the polar coordinates radius, and θ is polar angle, i=1,2,3 ... N(N is positive integer);
The wavefront figure that Wei You Ze Nike fitting coefficient and zernike polynomial represent; When i is respectively 2,3,4 o'clock, corresponding zernike polynomial was respectively ρ cos (θ), ρ sin (θ), 2 ρ
2-1, they represent respectively the corrugated in the inclination of x direction, in inclination and the out of focus of y direction;
If there is not error in debuging of element, then the interference fringe contrast of interferogram is 0; If debuging of element exists to tilt or defocus error, then corresponding polynomial the 2nd, 3,4 zernike coefficients of Ze Nike (Zernike) are not 0, interferogram also can present corresponding difference thus, carries debuging that the interferogram of debuging error can tutorial element by these.
Design, making and use method that described reflected alignment holographic 302 is concrete are as follows:
As shown in Figure 3, for the selected order of diffraction was inferior, spherical wave was reflected and reflects that to returning by former road after quasi-holographic 302 diffraction and the reflection, forming CGH debugs the detection ripple ω of error
Alignment(ρ, θ), then the difference of the light light path of advancing along this route and the light light path of advancing along optical axis has determined that the position of reflected alignment holography 302 distributes mutually, namely holographic 302 functions that distribute mutually of reflected alignment be φ (r)=-2[OT (r)-OP];
Wherein, the light path that OT (r) passes by for the light that incides the reflection holography zone, OP is the light path that the axle glazed thread is passed by, r is every radial location on holographic 302 territories of reflected alignment;
By formula φ (r)=-2[OT (r)-OP] can calculate the position and be mutually the link position of integral multiple half-wave strong point;
After holographic 302 regional locations of definite reflected alignment, use Micrometer-Nanometer Processing Technology that the holographic 302 odd number endless belt territories of reflected alignment or even number endless belt territory are carried out cutting and plated reflection enhancing coating, wherein groove depth can be chosen different values with thicknesses of layers according to actual conditions;
The interference data ω that the detection waveform of utilizing reference wave and reflection CGH to debug error becomes
Reference(ρ, θ)+ω
Alignment(ρ, θ) realizes accurately debuging CGH itself.
Concrete design, the making and use method of described benchmark holographic 303 is as follows:
As shown in Figure 4, for selected grade time diffraction light, the corrugated, is reflected by thin film planar successively and is again returned behind the diffraction by the benchmark holography on the front thin film planar of a diffractive plate 4 by the holographic 303 diffraction post-concentrations of benchmark, forms the detection ripple ω that reflection point diffractive plate is debug information
FiducialThe light path that (ρ, θ), light advance along this route and light have determined that along the difference of the light path that optical axis is advanced the position of benchmark holography 303 distributes mutually, namely holographic 303 functions that distribute mutually of benchmark be φ (r)=-[OPHS (r)-OS];
Wherein, the light path that OPHS (r) passes by for the light that incides the benchmark holographic region, OS is the light path that the axle glazed thread is passed by, r is every radial location on holographic 303 territories of benchmark;
By formula φ (r)=-[OPHS (r)-OS] can calculate the position and be mutually the link position of integral multiple half-wave strong point;
After holographic 303 regional locations of definite benchmark, use Micrometer-Nanometer Processing Technology that the holographic 303 odd number endless belt territories of benchmark or even number endless belt territory are carried out cutting and plate increasing transmission film, transmitance is greater than 99%, and wherein groove depth can be chosen different values with thicknesses of layers according to actual conditions;
In order to detect the accurately information of debuging of feedback point diffractive plate of corrugated, need the front surface of guarantee point diffractive plate 4 smooth smooth;
The interference data ω that the detection waveform of utilizing reference wave and reflection point diffractive plate 4 to debug error becomes
Reference(ρ, θ)+ω
Fiducial(ρ, θ) realizes accurately debuging a diffractive plate.
Described projection holographic 304 is according to actual conditions optional fetch bit facies pattern grating or amplitude grating.Projection holographic 304 can be the transmission hologram of various structures form.Projection holographic 304 is comprised of a plurality of mutually similar periodic structures.Projection holographic 304 can be chosen the mutually degree of depth of different grating cycles, dutycycle and cutting position according to actual conditions.Holographic 304 light that will come from pointolite of projection carry out diffraction, so that light produces the hot spot mark at CCD5.Projection holographic 304 can be distributed in single zone or a plurality of zone according to actual conditions.Throwing holographic 304 zones will cover and increase transmission film.
Concrete design, the making and use method of described projection holographic 304 is as follows:
For selected grade time diffraction light, holographic 304 diffraction post-concentrations are throwed to the CCD5 photosurface in the corrugated, form the projection mark;
Be symmetric owing to throwing holographic 304, so the mark center of introducing is on the light path light axis, introduce different two-dimensional phase distributions for throwing holographic 304, can produce different projection marks, common mark has a mark and cross curve mark;
In order to produce the some mark at CCD5, projection holographic 304 need to be made into Fresnel (Fresnel) zone plate, concrete method is as follows:
According to the form of incident beam, employed diffraction lighting level time and projection holographic 304 to CCD5 photosurface distance, to throw holographic 304 region segmentations and become many concentric little endless belt, optical path difference half wavelength and each endless belt area approximation that adjacent ring is taken the center, hole to equate;
After determining holographic 304 regional locations of projection, the use Micrometer-Nanometer Processing Technology will throw holographic 304 odd number endless belt territories or even number endless belt territory carries out cutting and plate increasing transmission film, and wherein groove depth can be chosen different values with thicknesses of layers according to actual conditions;
In order to produce the cross curve mark at CCD5, the concrete method for designing of projection holographic 304 is as follows:
Introduce respectively two kinds of two-dimensional phases for two zones wherein of throwing holography 304 and distribute, their Ze Nike (Zernike) expression formula is respectively
With
Wherein, K is the light path constant; Z
4, Z
5, Z
6Be respectively the 4th, 5,6 Ze Nike (Zernike) polynomial expression, they represent respectively the one-level astigmatism of out of focus, x direction, the one-level astigmatism of y direction; A and θ determine respectively length and the direction of cross curve;
Quantize accordingly throwing holographic 304 according to above position phase distribution function;
After determining holographic 304 regional locations of projection, to use Micrometer-Nanometer Processing Technology will throw holographic 304 respective regions and carry out cutting and plate increasing transmission film, transmitance is greater than 99%, and wherein groove depth can be chosen different values with thicknesses of layers according to actual conditions;
Can also use projection holographic 304 to produce the mark of other shape at CCD 5, concrete method for designing is enumerated no longer one by one;
Utilize projection holographic 304 to produce mark, this mark overlaps with the mark that methods such as using pinhole imaging system produces, and realizes the aperture centralized positioning.
Each grating part of described above CGH 3 elements needs to pass through successively the substrate matting, smear the process flows such as corrosion inhibitor operation, exposure process, etching procedure, polishing process, separation circuit and filming process.
The above; it only is part embodiment of the present invention; but protection scope of the present invention is not limited to this; anyly be familiar with the people of this technology in the disclosed technical scope of the present invention; the replacement that is understood that or increase and decrease; all should be encompassed in of the present invention comprising within the scope, therefore, protection scope of the present invention should be as the criterion with the protection domain of claims.
Claims (8)
1. a computing machine that is used for debuging or to detect optical element generates holographic element, it is characterized in that: this element has comprised one or more functional areas, the difference in functionality zone is different optical grating construction, and they are respectively transmission main hologram (301), reflected alignment holographic (302), benchmark holographic (303) and projection holographic (304); Described transmission main hologram (301) is the phase-type grating, and reflected alignment holographic (302), benchmark holographic (303), projection holographic (304) are chosen phase-type grating or amplitude grating, so-called phase-type grating refers to realize mutually by the position of direct change light wave face the grating of diffraction and interference, and so-called amplitude grating refers to realize by changing zones of different place light wave face amplitude the grating of diffraction and interference.
2. the computing machine be used to debuging or detect optical element according to claim 1 generates holographic element, it is characterized in that: described computing machine generates each zone of holographic element and is periodically variable one or more grating composition by structure; Described computing machine generates each zone of holographic element (3) can choose the mutually degree of depth of different grating cycles, dutycycle and cutting position according to actual conditions, so-called dutycycle refers to the ratio of cutting width and fringe period, the so-called cutting position phase degree of depth is the light light path change amount that is caused by cutting, and it is relevant with the cutting geometric depath with the refractive index of substrate; Described benchmark holographic (303) generally is comprised of symmetrical two parts or many parts; Described transmission main hologram (301), benchmark holographic (303) and holographic (304) the trizonal surface coverage of projection increase transmission film, and the surface coverage reflection enhancing coating in reflected alignment holographic (302) zone.
3. the computing machine be used to debuging or detect optical element according to claim 1 generates holographic element, it is characterized in that: the grating that described computing machine generates (3) four location of holographic element is used the means such as laser direct-writing and is etched on the same surface of substrate, and this substrate is to melt the quartzy transparent material with appropriate index that waits; Be reserved with the gap area of being convenient to multiple exposure between the grating of (3) four location of described computing machine generation holographic element; The order of diffraction that the area of raster size of (3) four location of described computing machine generation holographic element and distributing position are used separately is inferior and present stage processes, the impact of detection level, the grating of four location is guaranteeing to detect on the basis of interferogram observation contrast and aperture centralized positioning precision, can choose the different orders of diffraction according to actual conditions inferior, the area of raster size of choosing and distributing position need to guarantee that the size of grating minimum period structure can realize processing and detection, and present stage, this was of a size of micron dimension.
4. the computing machine be used to debuging or detect optical element according to claim 1 generates holographic element, it is characterized in that: the light that described transmission main hologram (301) will come from pointolite carries out diffraction, diffraction light converges at the aperture center, this diffraction light is the working beam of inputting in order to realize little diffraction by aperture, this convergent point is approximately desirable Airy disk, and Airy disk refers to that the point-like object is through ideal image system imaging.
5. the computing machine be used to debuging or detect optical element according to claim 1 generates holographic element, it is characterized in that: the light that described reflected alignment holographic (302) will come from pointolite reflects and diffraction, the inferior diffracted ray of one of them order of diffraction returns according to former road, converge at the pointolite place, this diffraction light and the reference light that return are interfered, and be used for to realize CGH(3) accurately the debuging of element itself.
6. the computing machine be used to debuging or detect optical element according to claim 1 generates holographic element, it is characterized in that: the light that described benchmark holographic (303) will come from pointolite carries out diffraction, the inferior diffraction light of one of them grade converges on the front thin film planar of a diffractive plate, reflected by thin film planar successively and again returned behind the diffraction by the benchmark holography, converge at the pointolite place, this diffraction light and the reference light that return are interfered, and are used for realizing accurately debuging of some diffractive plate (4) upper aperture.
7. the computing machine be used to debuging or detect optical element according to claim 1 generates holographic element, it is characterized in that: the light that described projection holographic (304) will come from pointolite carries out diffraction, so that light is at CCD(5) produce the hot spot mark, this mark can be the hot spot mark of a mark, cross curve mark or other shape according to the holographic version difference of projection.
8. the computing machine be used to debuging or detect optical element according to claim 1 generates holographic element, it is characterized in that: symcenter, aperture center and the pointolite of the mark that described projection holographic (304) produces are located along the same line.
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| CN109270817A (en) * | 2018-11-22 | 2019-01-25 | 厦门大学 | With the method for 3-D effect virtualization computed hologram replacement holographic aiming device hologram |
| CN110567392A (en) * | 2019-08-02 | 2019-12-13 | 华中科技大学 | method for testing surface shape of convex free-form surface reflector |
| CN110597012A (en) * | 2019-08-20 | 2019-12-20 | 无锡中微掩模电子有限公司 | Method for manufacturing aspheric surface detection high-precision calculation hologram |
| CN111103758A (en) * | 2019-12-28 | 2020-05-05 | 中国科学院长春光学精密机械与物理研究所 | Amplitude/phase mixed type calculation holographic plate and preparation method thereof |
| CN115200474A (en) * | 2022-07-14 | 2022-10-18 | 西安工业大学 | Device and method for positioning central axis of small hole diffraction light spot based on photosensitive detection array |
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