CN102847443A - Formulation of cleaning fluid for ultrafiltration membrane - Google Patents
Formulation of cleaning fluid for ultrafiltration membrane Download PDFInfo
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- CN102847443A CN102847443A CN2011101772566A CN201110177256A CN102847443A CN 102847443 A CN102847443 A CN 102847443A CN 2011101772566 A CN2011101772566 A CN 2011101772566A CN 201110177256 A CN201110177256 A CN 201110177256A CN 102847443 A CN102847443 A CN 102847443A
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- cleaning fluid
- formulation
- ultrafiltration membrane
- deionized water
- buffer solution
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Abstract
A formulation of cleaning fluid for ultrafiltration membrane adopts mixing compounding technology, and has the components as follows: deionized water as matrix of the cleaning fluid 70%-95%, sodium hydroxide 0.1%-5%, and buffer solution 1%-5%. The formulation of cleaning fluid for ultrafiltration membrane provided by the invention has the advantages of low-cost and easily-obtained chemicals, has broad-spectrum removal effect for pollutants, obvious effect, and good recovery effect for the water flux of the membrane.
Description
Technical field
The present invention relates to a kind of milipore filter cleaning fluid, belong to the Chemical cleaning field.
Background technology
The ultrafiltration membrane washing generally uses the mixed liquor of deionized water and acid or alkali as the cleaning fluid of milipore filter.Although these are cheap and easy to get, but their cleaning performance is not fully up to expectations, the recovery of membrane flux is very restricted, simultaneously, pollution cleaning performance for the profound level of film is also not satisfactory, particularly admittedly contains the stifled especially effect extreme difference of dirt that deposition and the chemical precipitation of thing on the film surface causes for height.
Summary of the invention
Technical problem to be solved by this invention provides a kind of high-efficiency washing ability that has, milipore filter cleaning fluid cheap and easy to get, easy to use.
The present invention is by the following technical solutions:
A kind of milipore filter cleaning fluid prescription adopts and mixes compounded technology, and its component and content are:
The base material deionized water 70%-95% of cleaning fluid
NaOH 0.1%-5%
Buffer solution 1%-5%
A kind of milipore filter cleaning fluid prescription adopts and mixes compounded technology, and its component and content are: the base material deionized water 70%-95% of cleaning fluid
Citric acid 0.1%-5%,
Buffer solution 1%-5%
Deionized water is the base material of cleaning fluid; Acid or alkali are the main components of cleaning fluid, determine with acid or with what of alkali and consumption depending on the character of pollutant; The effect of buffer solution is the complexing pollutant, makes pollutant easier by the dissolving of acid or alkali and remove.
The invention has the advantages that medicine is cheap and easy to get, pollutant is had the broad spectrum activity removal effect, and effect is remarkable, good to the water flux recovery effects of film.
The specific embodiment
Further specify the present invention below by embodiment:
Embodiment 1
A kind of milipore filter cleaning fluid prescription adopts and mixes compounded technology, and its component and content are:
The base material deionized water 95% of cleaning fluid
NaOH 2.5%
Buffer solution 2.5%
Embodiment 2
A kind of milipore filter cleaning fluid prescription adopts and mixes compounded technology, and its component and content are:
The base material deionized water 70% of cleaning fluid
NaOH 5%
Buffer solution 5%
Embodiment 3:
A kind of milipore filter cleaning fluid prescription adopts and mixes compounded technology, and its component and content are: the base material deionized water 95% of cleaning fluid
Citric acid 2.5%
Buffer solution 2.5%
Embodiment: 4:
Described milipore filter cleaning fluid prescription, its component and content are:
The base material deionized water 70% of cleaning fluid
Citric acid 3%,
Buffer solution 3%.
Claims (2)
1. a milipore filter cleaning fluid prescription adopts and mixes compounded technology, and its component and content are:
The base material deionized water 70%-95% of cleaning fluid
NaOH 0.1%-5%
Buffer solution 1%-5%.
2. a milipore filter cleaning fluid prescription adopts and mixes compounded technology, and its component and content are:
The base material deionized water 70%-95% of cleaning fluid
Citric acid 0.1%-5%,
Buffer solution 1%-5%.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2011101772566A CN102847443A (en) | 2011-06-28 | 2011-06-28 | Formulation of cleaning fluid for ultrafiltration membrane |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2011101772566A CN102847443A (en) | 2011-06-28 | 2011-06-28 | Formulation of cleaning fluid for ultrafiltration membrane |
Publications (1)
Publication Number | Publication Date |
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CN102847443A true CN102847443A (en) | 2013-01-02 |
Family
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Family Applications (1)
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CN2011101772566A Withdrawn CN102847443A (en) | 2011-06-28 | 2011-06-28 | Formulation of cleaning fluid for ultrafiltration membrane |
Country Status (1)
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CN (1) | CN102847443A (en) |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1887413A (en) * | 2006-06-06 | 2007-01-03 | 娄底市裕德科技有限公司 | Alkali-base detergent for inorganic ultrafiltering cermic membrane |
CN101224391A (en) * | 2007-10-17 | 2008-07-23 | 中国铝业股份有限公司 | Water curing reverse osmosis membrane chemical cleaning method |
CN101422700A (en) * | 2007-10-31 | 2009-05-06 | 中国石油化工股份有限公司 | Chemical cleaning method of ultrafiltration membrane |
CN101455945A (en) * | 2007-12-13 | 2009-06-17 | 中芯国际集成电路制造(上海)有限公司 | Reverse osmosis membrane on-line chemical cleaning method and cleaning agent |
CN101596410A (en) * | 2009-07-03 | 2009-12-09 | 首钢总公司 | The cleaning method of moisture film method desalting system reverse osmosis membrane in a kind of iron and steel |
CN101912735A (en) * | 2010-08-20 | 2010-12-15 | 秦皇岛首秦金属材料有限公司 | Chemical cleaning method of ultrafiltration membrane for metallurgical sewage pretreatment |
-
2011
- 2011-06-28 CN CN2011101772566A patent/CN102847443A/en not_active Withdrawn
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1887413A (en) * | 2006-06-06 | 2007-01-03 | 娄底市裕德科技有限公司 | Alkali-base detergent for inorganic ultrafiltering cermic membrane |
CN101224391A (en) * | 2007-10-17 | 2008-07-23 | 中国铝业股份有限公司 | Water curing reverse osmosis membrane chemical cleaning method |
CN101422700A (en) * | 2007-10-31 | 2009-05-06 | 中国石油化工股份有限公司 | Chemical cleaning method of ultrafiltration membrane |
CN101455945A (en) * | 2007-12-13 | 2009-06-17 | 中芯国际集成电路制造(上海)有限公司 | Reverse osmosis membrane on-line chemical cleaning method and cleaning agent |
CN101596410A (en) * | 2009-07-03 | 2009-12-09 | 首钢总公司 | The cleaning method of moisture film method desalting system reverse osmosis membrane in a kind of iron and steel |
CN101912735A (en) * | 2010-08-20 | 2010-12-15 | 秦皇岛首秦金属材料有限公司 | Chemical cleaning method of ultrafiltration membrane for metallurgical sewage pretreatment |
Non-Patent Citations (2)
Title |
---|
徐铜文: "《膜化学与技术教程》", 31 December 2003, 中国科学技术大学出版社 * |
李东光: "《工业清洗剂配方与制备》", 31 August 2009, 中国纺织出版社 * |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C04 | Withdrawal of patent application after publication (patent law 2001) | ||
WW01 | Invention patent application withdrawn after publication |
Application publication date: 20130102 |