CN102824829A - System and method for simultaneously removing carbon tetrafluoride (CF4) and concomitant nitrogen oxide (NOx) gases - Google Patents
System and method for simultaneously removing carbon tetrafluoride (CF4) and concomitant nitrogen oxide (NOx) gases Download PDFInfo
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- CN102824829A CN102824829A CN2012103423526A CN201210342352A CN102824829A CN 102824829 A CN102824829 A CN 102824829A CN 2012103423526 A CN2012103423526 A CN 2012103423526A CN 201210342352 A CN201210342352 A CN 201210342352A CN 102824829 A CN102824829 A CN 102824829A
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Abstract
The invention provides a system and a method for simultaneously removing carbon tetrafluoride (CF4) and concomitant nitrogen oxide (NOx) gas. The system comprises a flow controller, a plasma reaction device, a catalytic reaction device and a tail gas processing device, wherein the catalytic reaction device is connected between the plasma reaction device and the tail gas processing device through a flange or a screw, so that the catalytic reaction device can be replaced; the catalytic reaction device comprises a silica tube; the silica tube is internally filled with a catalyst bed layer; the outer wall of the silica tube is coated with an insulating layer; the tail gas inlet of the tail gas processing device is connected with an absorption chamber through an inclined pipeline; and the top of the absorption chamber is provided with a tail gas outlet. The method for simultaneously removing CF4 and concomitant NOx gases by virtue of the system is as follows: performing microwave ignition in a quartz tube reactor and carrying out continuous processing on to-be-processed gases; reprocessing the processed mixed gas by virtue of a catalyst; and performing heat preservation on the catalyst by virtue of the insulating layer, thereby simultaneously removing the CF4 and concomitant NOx gases. The system and the method have the characteristics of high CF4 removal efficiency, low energy consumption and no secondary pollution.
Description
Technical field
The present invention relates to a kind of treatment of waste gas system and processing method, relate in particular to a kind of system and method that removes carbon tetrafluoride and nitrogen oxide simultaneously.
Background technology
Carbon tetrafluoride (CF
4) be the most stable a kind of gas in the perfluorinated hydrocarbon (be called for short PFCs), because it has the long time limit and the strong infrared absorbance of existing in atmosphere, can cause strong greenhouse effects.CF
4Waste gas mainly results from semi-conductor industry, control its be emitted in the past three cause strong concern during the decade in the world.In recent years, along with the fast development of China Semiconductor Industry, CF
4Discharge capacity increases year by year.Domestic related data shows that China is at CF
4Cut down the not starting as yet of technical research aspect, this will restrict China Semiconductor Industry and and CF
4The sustainable development of discharging related industries is carried out and is cut down CF
4The related work of discharging meets the environmental protection and the Strategy for economic development of China.
At present for cutting down CF
4Mainly contain four approach Deng the PFCs discharging: the new chemical substance of 1) selecting to substitute PFCs; 2) production technology optimization; 3) to the PFCs cycling and reutilization; 4) the PFCs gas to discharging carries out end treatment.Though first three measure meets the principle of cleaner production more, because produce conditionalities such as industrial state of art of PFCs and financial cost, end treatment removes PFCs gas becomes present relatively efficient ways.
End treatment for PFCs gas is removed, and a lot of technologies are abroad arranged at present, comprises combustion method, heat catalytic oxidation method, plasma decomposes method etc.Burning process is in combustion furnace, to add natural gas or hydrogen as fuel, can remove the C more than 90%
2F6, NF
3And SF
6, but for CF
4Removal but seldom, it mainly is because CF
4Character is more stable, is difficult for being removed.The adding of fuel increases processing cost, and in addition for accessory substance, for example the collection and treatment of HF also has difficulties, and burning can produce nitrogen oxide (NO
x) and the non-complete combustion of fuel product, these materials can form secondary pollution.Heat catalytic oxidation technology effectively combines thermal decomposition and catalytic decomposition, effective decomposed P FCs, the NO of generation
xFewer, but very high to the consersion unit requirement, and have catalyst failure, regularly need more catalyst changeout, problems such as operating cost height.The equipment volume that plasma method processing PFCs needs is little, and operating cost is relatively low.Wherein, microwave plasma is compared with dielectric barrier discharge, direct-current arc, radio frequency plasma, has the capacity usage ratio height; Electrodeless pollution, advantage such as electron density is high, and plasma distribution is even; Be to carry out chemical synthesis and decomposition; The desirable technology that material surface modifying, pernicious gas degraded remove, but this method still exist power consumption big, NO arranged
xThe shortcoming of association waste gas etc.
Catalyst and plasma Combined application are removed the focus that pernicious gas becomes research in recent years.External many scholars through the catalytic activity of plasma exciatiaon catalyst, produce plasma and the catalysis combined removal effect to polluter through in plasma-reaction-chamber, adding solid catalyst.Research at present more is the plasma that produces of dielectric barrier discharge or the synergy of surface wave plasma and catalyst, microwave plasma processing CF
4Technology is the new technology that grows up nineteen nineties, and the auxiliary microwave plasma of catalyst removes CF simultaneously
4And NO
xDo not appear in the newspapers.
Notification number is that the utility model patent of CN201454385U discloses a kind of system of removing PFCs gas; The plasma reaction device and the catalyst reaction device of this system are structure as a whole; Height and diameter that the reaction tube of beds promptly is housed are fixing; Cause the capacity of its loading catalyst to be restricted, very unstable to the treatment effect of the pending gas that contains variable concentrations PFCs, and can not remove the NO that produces in the PFCs processing procedure
xGas.
Summary of the invention
The object of the present invention is to provide a kind of CF that is used for removing simultaneously
4And NO
xAuxiliary normal pressure microwave plasma system of catalyst and method, its purpose is under the situation than low energy consumption, effectively removes CF simultaneously
4And NO
xGas, and removal effect is stable.
The CF that removes simultaneously of the present invention
4And NO
xThe system of gas mainly comprises with lower device: flow controller (or valve), plasma reaction device, catalyst reaction device and exhaust gas processing device.Catalyst reaction device according to the invention between plasma reaction device and exhaust gas processing device, makes the catalyst reaction device interchangeable through flange or spiral shell buckle.Because the catalyst reaction device interchangeable makes the catalyst loading adjustable, thereby can improve the utilization rate of catalyst; Also can be according to the component of pending gas and the difference of concentration, the kind of catalyst changeout more easily, thus obtain treatment effect efficiently.
Plasma reaction device of the present invention comprises quartz tube reactor, waveguide and microwave generating apparatus, and waveguide adopts the central point direct coupling system to be connected with quartz tube reactor.
Interconvertible catalyst reaction device comprises quartz ampoule among the present invention; Be filled with beds in the said quartz ampoule, and the quartz ampoule outer wall is surrounded by heat-insulation layer.In the prior art; Because beds is in room temperature state; Therefore the high-temperature plasma flame that produces in the plasma reaction device causes the active reduction of catalyst through progressively cooling in the process of beds, thereby reduces the treatment effect of pending gas.And the present invention is provided with heat-insulation layer at the quartz ampoule outer wall, can guarantee that the activation of catalyst utilizes with efficient to the insulation of high-temperature plasma flame.
The tail gas import of exhaust gas processing device of the present invention is connected with absorption chamber through the inclination pipeline, is provided with the tail gas outlet at the top of absorption chamber.Further, the present invention also is provided with the porous dottle pin in tail gas import department.Porous dottle pin and inclination pipeline can effectively improve the time of contact between tail gas and the absorbent, improve the treatment effect of gas.The porous dottle pin is porous flake or network structure among the present invention; Said porous dottle pin material is metal or high molecular polymer, and this porous pad has played the effect that the tail gas absorbent is fully disperseed, increases absorbent and tail gas contact area.
For further improving treatment effect, the present invention is connected with pipeline absorption chamber through pump (liquid pump or powder conveying pump), make the abundant recycle of absorbent in the absorption chamber, and to NO
xFurther remove with hydrofluoric acid gas.
The above flow controller can substitute with valve.
Adopt said apparatus to remove CF simultaneously
4And association NO
xThe method of gas may further comprise the steps:
1. pending gas gets in the quartz tube reactor of plasma reaction device through flow controller, in quartz tube reactor, carries out the microwave igniting, under atmospheric pressure excites to produce and keep microwave plasma, the CF in the pending gas
4After plasma flame is handled, produce mix waste gas, be mainly a large amount of free radicals, CF
4And the NO of association
xGas; Microwave power is 200-2000W, and gas flow rate is 1-20L/min, CF in the pending gas
4Concentration is 1-10000mL/m
3, NO in the said mix waste gas
xConcentration is 30-3000mL/m
3
2. the mix waste gas after 1. step is handled is tipped in the quartz ampoule of catalyst reaction device through flange or spiral shell; The microwave plasma flame heat that 1. beds is produced by step is to 300-900K, and the catalyst auxiliary plasma carries out further handling continuously to mix waste gas;
Catalyst in the beds of the present invention is oxide catalyst or supported oxide catalyst; Said oxide catalyst is γ-Al
2O3, TiO
2, ZrO
2, SiO
2, Co
2O3, WO
3, V
2O5, Fe
2Among O3, CuO, the NiO one or more; Said supported oxide catalyst is supported active species on the above-mentioned oxide catalyst; Said active specy is one or more among Ag, Mn, Co, Ni, Cu, Pt, the Pb, and the active specy of load of the present invention has the effect that removes the association nitrogen oxide and do not reduce the carbon tetrafluoride removal efficiency.Catalyst form comprises ball-type, column or trifolium-shaped etc. among the present invention.
3. the tail gas after 2. step is handled is tipped in the exhaust gas processing device through flange or spiral shell, adopts wet absorption method or dry type absorption process to absorb and handles the back discharging;
The absorbent of said wet absorption method is one or both the combination in sodium hydroxide solution, the aqua calcis; The absorbent of dry type absorption process is an aluminium oxide powder.
The step of the present invention 2. internal diameter of said quartz ampoule is preferably 10mm ~ 200mm, and length is preferably 100mm ~ 300mm.
The step of the present invention 2. volume of said beds is 1-1000mL.
The present invention uses microwave plasma to handle CF earlier
4Gas re-uses catalyst to the undecomposed CF of microwave plasma
4Further handle, and remove the NO that produces in the microwave plasma processing procedure simultaneously
xGas.Because microwave plasma has high temperature, and under atmospheric pressure can produce a large amount of high intensity ultraviolet rays, free radical activity particle, and catalyst is had activation.Through thermocouple near the exhaust temperature the reactor outlet is detected the discovery temperature about 300-900K, these ultraviolet rays and heat of high temperature are containing significant amount of energy, the waste heat heatable catalyst of plasma capable of using.High-intensity ultra-violet radiation like this, active particle and high temperature gas flow when utilizing waste heat, further excite catalyst, improve activity of such catalysts.In apparatus of the present invention, the interchangeable of catalyst reaction device makes catalyst filling yardstick adjustable, makes CF
4With association NO
xGas is under atmospheric pressure all by efficient removal.Therefore the interpolation of catalyst both can improve CF in the device and method provided by the invention
4Clearance and energy utilization efficiency, can reduce accessory substance NO again
xGenerate; In addition, porous dottle pin in the exhaust gas processing device and inclination pipeline can effectively improve the time of contact between tail gas and the absorbent, and circular treatment can be utilized absorbent fully, to NO
xCan further remove also and can effectively remove hydrofluoric acid gas.Treating capacity of the present invention is big, is an environmentally friendly technology that has very much practical prospect.
The present invention has improved the utilization ratio of catalyst from the following aspects: at first; The present invention is designed to interconvertible structure with catalyst reaction device; Can be according to the composition and the concentration of pending gas; At any time, the more kind of catalyst changeout, consumption, structure and form easily, avoided because of the capacity of catalyst limited to containing variable concentrations CH
4The unsettled defective of treatment effect of pending gas; Secondly; The present invention is provided with heat-insulation layer at the quartz ampoule outer wall of catalyst reaction device; Can guarantee the activation effect of high temperature microwave plasma to the insulation of high-temperature plasma flame, avoid weakening the activity of such catalysts effect owing to the reduction of temperature to catalyst.The present invention except to the catalyst utilization ratio improve effect obviously; Also improved the treatment effect of tail gas: the present invention is through being provided with the porous dottle pin and utilizing the inclination pipeline to increase the time of contact between tail gas and the absorbent in the tail gas import; And with the absorbent recycle, brought into play device for absorbing tail gas to greatest extent to NO through pump
xRemoval effect with hydrofluoric acid gas.
Description of drawings
Below in conjunction with accompanying drawing and embodiment the present invention is described further.
Fig. 1 is a system schematic of the present invention.
Among the figure: 1, pending gas access; 2, flow controller; 3, quartz tube reactor; 4, plasma flame; 5, waveguide; 6, microwave generating apparatus; 7, flange or spiral shell button; 8, beds; 9, heat-insulation layer; 10, thermocouple; 11, tail gas import; 12, exhaust gas processing device; 13, pump; 14, tail gas outlet; 15, quartz ampoule; 16, pipeline; 17, absorption chamber.
The specific embodiment
A kind of CF that removes simultaneously of the present invention
4And NO
xThe system of gas mainly comprises with lower device: flow controller 2, plasma reaction device, catalyst reaction device and exhaust gas processing device.Catalyst reaction device according to the invention is connected between plasma reaction device and the exhaust gas processing device through flange or spiral shell button 7, makes the catalyst reaction device interchangeable.
Plasma reaction device of the present invention comprises quartz tube reactor 3, waveguide 5 and microwave generating apparatus 6, and waveguide adopts the central point direct coupling system to be connected with quartz tube reactor.
Interconvertible catalyst reaction device comprises quartz ampoule 15 among the present invention; Be filled with beds 8 in the said quartz ampoule, and the quartz ampoule outer wall is surrounded by heat-insulation layer 9.
The tail gas import 11 of exhaust gas processing device of the present invention is connected with absorption chamber 17 through inclination pipeline 12, is provided with tail gas outlet 14 at the top of absorption chamber.Further, the present invention also is provided with the porous dottle pin in tail gas import department.Porous dottle pin and inclination pipeline can effectively improve the time of contact between tail gas and the absorbent, improve the treatment effect of gas.The porous dottle pin is porous flake or network structure among the present invention.The present invention also is connected absorption chamber and pipeline 16 through pump, make the abundant recycle of absorbent in the absorption chamber, and to NO
xFurther remove with hydrofluoric acid gas.
1 place is provided with a flow controller 2 at pending gas input port; Flow controller is connected to quartz tube reactor 3 through pipeline; Inside at quartz tube reactor produces plasma 4 through microwave; Said plasma provides energy by microwave generator 6 through waveguide 5, and waveguide adopts the central point direct coupling system to be connected with quartz tube reactor; Adopt flange or spiral shell button 7 to be connected between the quartz ampoule 15 of quartz tube reactor and catalyst reaction device, make the quartz ampoule internal diameter and the adjustable length of catalyst filling.Pending gas reacts through beds after plasma treatment again, and the catalyst filling dress quartz tube reactor wall outside once is surrounded by heat-insulation layer 9.Gas after the processing is tipped in the exhaust gas processing device through flange or spiral shell, and tail gas import 11 places are provided with the porous dottle pin, adopts pump 13 that the circulation of the absorbent in the absorption chamber 17 is caused pipeline 16, finally enters atmosphere through tail gas outlet 14.
Adopt embodiment 1 said apparatus processes to contain CF
4And NO
xThe method of the waste gas of gas is with the pending CF that contains
4 Gas 1 feeds in the reaction tube 3 through flow controller 2, the about 15mm of reaction tube 3 internal diameters, the about 500mm of length; Microwave power is 200W-2000W, and gas flow rate is 2L/min, CF
4Concentration is 2000mL/m
3, in reaction tube, adopt the microwave igniting, produce microwave plasma, mist is handled continuously; Gas is after treatment further handled through beds 8.The volume of beds is about 30mL, and bed temperature is 600-900K.Gas after the processing adopts wet type, and (wet absorption method liquid adopts saturated Ca (OH)
2Solution is as absorbent) or dry type absorption process (dry type absorption process adopt alundum (Al powder as absorbent) absorb and handle the back discharging, temperature is below normal temperature 40 degree, through detecting, the total CF when 1 hour and 10 hours have been carried out in reaction
4Removal efficiency is shown in table one.
Table one
After adding catalyst, clearance all has raising under each power, and can reach very high removal efficiency in that small-power is little, like γ-Al
2O3 catalyst and microwave plasma synergy, under the microwave power of 400W, CF
4Removal efficiency to be higher than the removal efficiency when microwave power is 800W in independent plasma method and the plasma; And catalyst and plasma body cooperative are done the time spent, when microwave power is 800W, and CF
4Removal efficiency all be higher than 98%.Therefore microwave plasma and the synergistic method of catalyst can reach energy-efficient purpose.
With the pending CF that contains
4 Gas 1 feeds in the reaction tube 3 through flow controller (or valve) 2, the about 15mm of reaction tube 3 internal diameters, the about 500mm of length; Microwave power is 200W-2000W, and gas flow rate is 2L/min, CF
4Concentration is 2000mL/m
3, in reaction tube, adopt the microwave igniting, produce microwave plasma, mist is handled continuously; Gas is after treatment further handled through beds 8.The volume of beds is about 100mL, and bed temperature is 600-900K.Gas after the processing adopts wet type or dry type absorption process to absorb and handles the back discharging, and wet absorption liquid adopts saturated Ca (OH)
2Solution, dry absorbent adopts the alundum (Al powder, and temperature is below normal temperature 40 degree.When catalyst is Ag/ γ-Al
2During O3, accessory substance NO
xObvious variation does not take place in concentration behind the operation 40min of system, and concentration remains on 10ml/m
3, clearance is 90%.When catalyst is Mn/ γ-Al
2During O3, MnO in the catalyst
2Load capacity be 2% o'clock, catalyst is to accessory substance NO
xAction effect best, NO
xClearance be 89%.When catalyst is 3%Pt/ γ-Al
2During O3, NO
xClearance be 95%.When catalyst is 2%Mn, 2%Ag/ γ-Al
2During O3, NO
xClearance be 93%.When catalyst is 2.5%Ni/ γ-Al
2During O3, NO
xClearance be 88%.When catalyst is γ-Al
2During other metal oxide active specy of O3 load, NO
xClearance be about 80%.
Comparative example 1
Investigate plasma to the pending CF that contains
4The removal effect of waste gas.With the pending CF that contains
4 Gas 1 feeds in the reaction tube 3 through flow controller (or valve) 2, the about 15mm of reaction tube 3 internal diameters, the about 500mm of length; Microwave power is 200W-800W, and gas flow rate is 2L/min, CF
4Concentration is 2000mL/m
3, in reaction tube, adopt the microwave igniting, produce microwave plasma, mist is handled continuously; Through detecting, microwave power is respectively 200,400 and during 800W, and 1 hour CF has been carried out in reaction
4Removal efficiency be respectively 68%, 83% and 93%.
Claims (8)
1. one kind removes CF simultaneously
4And association NO
xThe system of gas; Comprise flow controller (2), plasma reaction device, catalyst reaction device and exhaust gas processing device; It is characterized in that: said catalyst reaction device is connected between plasma reaction device and the exhaust gas processing device through flange or spiral shell button (7), makes the catalyst reaction device interchangeable;
Said catalyst reaction device comprises quartz ampoule (15); Be filled with beds (8) in the said quartz ampoule, the quartz ampoule outer wall is surrounded by heat-insulation layer (9);
The tail gas import (11) of said exhaust gas processing device is connected with absorption chamber (17) through inclination pipeline (12), is provided with tail gas outlet (14) at the top of absorption chamber.
2. system according to claim 1 is characterized in that: said absorption chamber (17) is connected through pump (13) with pipeline (16), makes the absorbent recycle in the absorption chamber.
3. system according to claim 2 is characterized in that: locate to be provided with the porous dottle pin in tail gas import (11).
4. system according to claim 3 is characterized in that: said porous dottle pin is a porous flake or netted.
5. according to claim 3 or 4 described systems, it is characterized in that: the material of said porous dottle pin is metal or high molecular polymer.
6. system removes CF simultaneously according to claim 1
4And association NO
xThe method of gas may further comprise the steps:
1. pending gas gets in the quartz tube reactor (3) of plasma reaction device through flow controller (2), in quartz tube reactor, carries out the microwave igniting, under atmospheric pressure excites to produce and keep microwave plasma, the CF in the pending gas
4, plasma flame produces mix waste gas after handling; Microwave power is 200-2000W, and gas flow rate is 1-20L/min, CF
4Concentration is 1-10000mL/m
3, NO in the said mix waste gas
xConcentration is 30-3000mL/m
3
2. the mix waste gas after 1. step is handled is tipped in the quartz ampoule (15) of catalyst reaction equipment through flange or spiral shell; To 300-900K, auxiliary plasma carries out further handling continuously to mix waste gas beds by the 1. middle microwave plasma flame heat that produces of step;
Catalyst in the said beds is oxide catalyst or supported oxide catalyst; Said oxide catalyst is γ-Al
2O3, TiO
2, ZrO
2, SiO
2, Co
2O3, WO
3, V
2O5, Fe
2Among O3, CuO, the NiO one or more; Said supported oxide catalyst is supported active species on the above-mentioned oxide catalyst, and said active specy is one or more among Ag, Mn, Co, Ni, Cu, Pt, the Pb;
3. the tail gas after 2. step is handled is tipped in the exhaust gas processing device through flange or spiral shell, adopts wet absorption method or dry type absorption process to absorb and handles the back discharging;
The absorbent of said wet absorption method is one or both the combination in sodium hydroxide solution, the aqua calcis; The absorbent of dry type absorption process is an aluminium oxide powder.
7. method according to claim 6 is characterized in that: the internal diameter of the 2. said quartz ampoule of step (15) is 10mm ~ 200mm, and length is 100mm ~ 300mm.
8. method according to claim 6 is characterized in that: the step 2. volume of said beds is 1-1000mL.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012103423526A CN102824829A (en) | 2012-09-14 | 2012-09-14 | System and method for simultaneously removing carbon tetrafluoride (CF4) and concomitant nitrogen oxide (NOx) gases |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012103423526A CN102824829A (en) | 2012-09-14 | 2012-09-14 | System and method for simultaneously removing carbon tetrafluoride (CF4) and concomitant nitrogen oxide (NOx) gases |
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ID=47328264
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|---|---|---|---|
| CN2012103423526A Pending CN102824829A (en) | 2012-09-14 | 2012-09-14 | System and method for simultaneously removing carbon tetrafluoride (CF4) and concomitant nitrogen oxide (NOx) gases |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103961987A (en) * | 2014-05-16 | 2014-08-06 | 电子科技大学 | Microwave-plasma-based nitrogen oxide removal device |
| CN107081057A (en) * | 2017-05-03 | 2017-08-22 | 江苏天楹环保能源成套设备有限公司 | Cold plasma arrangement for catalytic purification for handling medical wastes incineration tail gas |
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| CN101069811A (en) * | 2007-06-01 | 2007-11-14 | 中山大学 | Method and apparatus of low-temperature plasma coupling photo catalytic purification of toxic matter |
| CN101496992B (en) * | 2009-01-15 | 2011-09-07 | 大连海事大学 | System and method for removing PFCs gas |
| CN202844847U (en) * | 2012-09-14 | 2013-04-03 | 大连海事大学 | System for removing carbon tetrafluoride and associated nitric oxide gas synchronously |
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2012
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Patent Citations (4)
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| US20050034814A1 (en) * | 2001-09-13 | 2005-02-17 | Toshikazu Sugiura | Method for removing the harmful effects of organic halogen compound gas, apparatus for removing the harmful effects of organic halogen compound gas, system for fabricating semiconductor devices, and method for fabricating semiconductor devices |
| CN101069811A (en) * | 2007-06-01 | 2007-11-14 | 中山大学 | Method and apparatus of low-temperature plasma coupling photo catalytic purification of toxic matter |
| CN101496992B (en) * | 2009-01-15 | 2011-09-07 | 大连海事大学 | System and method for removing PFCs gas |
| CN202844847U (en) * | 2012-09-14 | 2013-04-03 | 大连海事大学 | System for removing carbon tetrafluoride and associated nitric oxide gas synchronously |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103961987A (en) * | 2014-05-16 | 2014-08-06 | 电子科技大学 | Microwave-plasma-based nitrogen oxide removal device |
| CN103961987B (en) * | 2014-05-16 | 2015-12-09 | 电子科技大学 | A kind of oxynitrides based on microwave plasma removes device |
| CN107081057A (en) * | 2017-05-03 | 2017-08-22 | 江苏天楹环保能源成套设备有限公司 | Cold plasma arrangement for catalytic purification for handling medical wastes incineration tail gas |
| CN107081057B (en) * | 2017-05-03 | 2019-11-12 | 江苏天楹环保能源成套设备有限公司 | For handling the cold plasma arrangement for catalytic purification of medical wastes incineration tail gas |
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Application publication date: 20121219 |