CN102747322A - Preparation method of plated film member and plated film member prepared by method thereof - Google Patents
Preparation method of plated film member and plated film member prepared by method thereof Download PDFInfo
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- CN102747322A CN102747322A CN2011101017896A CN201110101789A CN102747322A CN 102747322 A CN102747322 A CN 102747322A CN 2011101017896 A CN2011101017896 A CN 2011101017896A CN 201110101789 A CN201110101789 A CN 201110101789A CN 102747322 A CN102747322 A CN 102747322A
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Abstract
The invention provides a preparation method of a plated film member, which comprises the following steps: providing a base material, wherein the base material is a transparent glass; using a sputtering method and forming a prefabricated layer A on the surface of the base material, wherein the prefabricated layer A is the alumina layer or aluminum nitride layer; continuously employing the sputtering method to form a prefabricated layer B on the surface of the prefabricated layer A, wherein the prefabricated layer B is aluminum layer, chromium layer or titanium layer; performing bombardment on the plated film surface of the base material by using argon plasma until the prefabricated layer B is completely stripped; repeating the above steps of plating the prefabricated layer B and argon plasma bombardment to form a color layer of the prefabricated layer A, wherein the color layer permeates the base material and the color layer presents white color. The preparation method of the plated film member enables stabilization, reliability and environmental protection. The invention also provides the plated film member prepared by the above method.
Description
Technical field
The present invention relates to a kind of preparation method and plated film spare obtained by this method of plated film spare.
Background technology
For the shell that makes electronic installation has rich colors, main at present through prepared decorative coveringns such as anodic oxidation, baking vanish, porcelains.Compare these traditional technologys, the environmental protection more of PVD coating technique, and adopt the PVD coating technique to form decorative colour layer on the product casing surface with metal-like.
Yet in the prior art, utilize the PVD coating technique very limited in the color of the rete of case surface formation, the PVD rete that can extensively prepare and use at present is mainly colour systems such as golden yellow, black, blueness.White is as a kind of color of classics, and industry is difficult at present obtains through the PVD coating technique, thereby to utilize the PVD coating technique to obtain stable white film be the focus of industry research always.
Summary of the invention
In view of this, be necessary to provide a kind of preparation method of PVD plated film spare of white.
In addition, also be necessary to provide a kind of by the prepared plated film spare of aforesaid method.
A kind of preparation method of plated film spare, it comprises the steps:
Base material is provided, and this base material is transparent glass;
Adopt sputtering method to form preformed layer A on the surface of this base material, this preformed layer A is alumina layer or aln layer;
Continue to adopt sputtering method to form preformed layer B on the surface of preformed layer A, this preformed layer B is aluminium, chromium or titanium layer;
Utilize the argon plasma bombarding base material to be coated with the surface of preformed layer A and preformed layer B, will peel off fully up to preformed layer B;
The step that repeats the bombardment of above-mentioned sputter preformed layer B and argon plasma is so that preformed layer A forms a color layer; Do not bombarded the preformed layer B that falls and form a metal level by argon plasma; This color layer sees through L* coordinate that said base material shows in CIE Lab colour system between 83 to 88; The a* coordinate is between-0.5 to 0.5, and the b* coordinate is between-0.5 to 0.5.
A kind of plated film spare; The metal level that it comprises base material, is formed at the color layer on base material one surface and is formed at the color layer surface, this base material is transparent glass, this color layer is alumina layer or aln layer; This metal level is aluminium, chromium or titanium layer; This color layer sees through L* coordinate that said base material shows in CIE Lab colour system between 83 to 88, and the a* coordinate is between-0.5 to 0.5, and the b* coordinate is between-0.5 to 0.5.
The preparation method of plated film spare according to the invention is when forming color layer, earlier at base material deposited preformed layer A, sputtering sedimentation preformed layer B again; Utilize the plated film face of high energy argon plasma bombarding base material then, thereby on transparent base material, prepare color layer, this color layer stable performance; Observe said color layer through transparent base material and present white; Make said plated film spare present white appearance, enriched the color of vacuum coating, improved the outward appearance competitive power of product; And the color of said color layer sees through transparent base material and shows, the wearing and tearing scraping of color layer can effectively be avoided usually as internal surface in the surface that is formed with color layer during use.Preparing method's technology of said color layer is simple, easy handling, environmental protection.
Description of drawings
Fig. 1 is the sectional view of the present invention's one preferred embodiment plated film spare;
Fig. 2 is the schematic top plan view of the present invention's one preferred embodiment vacuum plating unit.
The main element nomenclature
| Plated film spare | 10 |
| |
11 |
| |
13 |
| |
15 |
| Vacuum plating unit | 20 |
| Coating chamber | 21 |
| The aluminium target | 23 |
| Metallic target | 24 |
| Track | 25 |
| Vacuum pump | 30 |
Following embodiment will combine above-mentioned accompanying drawing to further specify the present invention.
Embodiment
The preparation method of the plated film spare 10 (as shown in Figure 1) of the present invention's one preferred embodiments comprises the steps:
Pre-treatment is carried out on surface to base material 11.Said pre-treatment comprises: conventional removing oil-removing wax, re-use deionized water base material 11 sprayed, after spray finishes with base material 11 dry for standby.
In conjunction with consulting Fig. 2, a vacuum plating unit 20 is provided, this vacuum plating unit 20 comprises a coating chamber 21 and is connected in a vacuum pump 30 of coating chamber 21 that vacuum pump 30 is in order to vacuumize coating chamber 21.Two metallic targets 24 that are provided with pivoted frame (not shown), the two aluminium targets 23 that are oppositely arranged in this coating chamber 21 and are oppositely arranged.Pivoted frame drives base material 11 along 25 revolution of circular track, and base material 11 also rotation along track 25 revolution the time.
Adopt sputtering method to form preformed layer A on surface through pretreated base material 11.This preformed layer A is alumina layer or aln layer.Base material 11 is fixed on the pivoted frame in the coating chamber 21, and setting the pivoted frame rotating speed is 3 commentaries on classics/min, and coating chamber 21 is evacuated to 1 * 10
-3Pa, heating coating chamber 21 to temperature is 100 ~ 180 ℃; In coating chamber 21, feed the working gas argon gas, the flow of argon gas is 100 ~ 300sccm, and aerating oxygen or nitrogen is reactant gases, and the flow of oxygen or nitrogen is 100 ~ 500sccm; The power of opening and set aluminium target 23 is 5 ~ 13kW, the bias voltage that puts on base material 11 is-10 ~-50V, the plated film time is 20 ~ 30min.Because base material 11 is nonconducting, so this step adopts the lower bias voltage of absolute value.The thickness of this preformed layer A is 80 ~ 120nm.Preformed layer A is non-crystalline state or is nanocrystalline, so this preformed layer A is lower to the reflectivity of visible light, so preformed layer A is lower in the L* value that CIE Lab colour system shows.
Continue to adopt the surface of sputtering method preformed layer A to form preformed layer B, this preformed layer B is aluminium, chromium or titanium layer.Close aluminium target 23, in coating chamber 21, feed the working gas argon gas, the flow of argon gas is 100 ~ 300sccm; The power of opening and set metallic target 24 is 8 ~ 11kW; The material of metallic target 24 is aluminium, chromium or titanium, to base material 11 apply-50 ~-bias voltage of 100V, sputtering time is 15 ~ 20min.The thickness of preformed layer B is 200 ~ 250nm.
When the thickness of preformed layer B reaches more than the 200nm, close metallic target 24, keeping the flow of argon gas is 100 ~ 300sccm, the bias voltage that strengthens base material 11 is-200 ~-600V, utilize argon plasma bombarding base material 11 to be coated with the surface of preformed layer A and preformed layer B.In the process that argon plasma bombards, the atoms metal on the top layer of preformed layer B will be peeled off by bombardment, thereby the thickness of preformed layer B is reduced.The time of argon plasma bombardment is 45 ~ 70min, will peel off fully up to preformed layer B.
The purpose of utilizing argon plasma to bombard is: utilize the argon plasma of high energy to bombard heat effect and the atomic rearrangement effect that brings; Impel preformed layer A from non-crystalline state or the nanocrystalline bigger crystalline state of grain-size that is transformed into; Thereby crystal boundary reflected light capable of using improves preformed layer A in the L* value of CIE Lab colour system.
Repeat the step of above-mentioned sputter preformed layer B and plasma bombardment so that preformed layer A forms a color layer 13, do not bombarded the preformed layer B that falls by argon plasma and form a metal level 15, the multiple number of times is 2 ~ 4 times.
See through said transparent base material 11 and observe, said color layer 13 presents white.This color layer 13 sees through L* coordinate that said base material 11 (when promptly testing base material 11 not being formed with the surperficial alignment light source of color layer 13) shows in CIE Lab colour system between 83 to 88; The a* coordinate is between-0.5 to 0.5, and the b* coordinate is between-0.5 to 0.5.
Please consult Fig. 1 again, by the prepared plated film spare 10 of aforesaid method comprise base material 11, be formed at base material 11 1 surface color layer 13 and be formed at the metal level 15 on color layer 13 surfaces.
This base material 11 is transparent glass.
This color layer 13 is alumina layer or aln layer, and its thickness is 80 ~ 120nm.See through said transparent base material 11 and observe, said color layer 13 presents white.This color layer 13 sees through L* coordinate that said base material 11 shows in CIE Lab colour system between 83 to 88, and the a* coordinate is between-0.5 to 0.5, and the b* coordinate is between-0.5 to 0.5.
This metal level 15 is aluminium, chromium or titanium layer, and its thickness is 30 ~ 50nm.
Come the present invention is specified through embodiment below.
Embodiment 1
The employed vacuum plating unit 20 of present embodiment is a magnetron sputtering coater.
Sputter preformed layer A: the power of aluminium target 23 is 13kW; The working gas argon flow amount is 300sccm; The reactant gases oxygen flow is 100sccm; The bias voltage that puts on base material 11 is-50V, and sputter temperature is 100 ℃, and sputtering time is 20min; The thickness of this preformed layer A is 120nm.
Sputter preformed layer B: the material of the metallic target 24 that uses is aluminium, and the power of metallic target 24 is 8kW; The flow of working gas argon gas is 300sccm; The bias voltage that puts on base material 11 is-50V that sputtering time is 20min; The thickness of preformed layer B is 250nm.
Plasma bombardment: bias voltage is-200V that the time of bombardment is 70min.
Repeat the step of above-mentioned sputter preformed layer B and argon plasma bombardment, multiplicity is 2 times.
The thickness of this color layer 13 is 120nm.It is 83 in the L* coordinate of CIE Lab colour system that this color layer 13 sees through said base material 11, and the a* coordinate is-0.4, and the b* coordinate is 0.1.
Embodiment 2
The employed vacuum plating unit 20 of present embodiment is identical in embodiment 1.
Sputter preformed layer A: the power of aluminium target 23 is 5kW; The working gas argon flow amount is 100sccm; The flow of reactant gases nitrogen is 500sccm; The bias voltage that puts on base material 11 is-10V, and sputter temperature is 180 ℃, and sputtering time is 30min; The thickness of this preformed layer A is 80nm.
Sputter preformed layer B: the material of the metallic target 24 that uses is chromium, and the power of metallic target 24 is 13kW; The flow of working gas argon gas is 100sccm; The bias voltage that puts on base material 11 is-100V that sputtering time is 15min; The thickness of preformed layer B is 200nm.
The argon plasma bombardment: bias voltage is-600V that the time of bombardment is 45min.
Repeat the step of above-mentioned sputter preformed layer B and argon plasma bombardment, multiplicity is 4 times.
The thickness of this color layer 13 is 80nm.It is 87 in the L* coordinate of CIE Lab colour system that this color layer 13 sees through said base material 11, and the a* coordinate is-0.2, and the b* coordinate is 0.3.
The preparation method of plated film spare 10 according to the invention is when forming color layer 13, earlier at base material 11 deposition preformed layer A, sputtering sedimentation preformed layer B again; Utilize the plated film face of high energy argon plasma bombarding base material 11 then, thereby on transparent base material 11, prepare color layer 13, these color layer 13 stable performances; See through the said color layer 13 of transparent base material 11 observations and present white; Make said plated film spare 10 present white appearance, enriched the color of vacuum coating, improved the outward appearance competitive power of product; And the color of said color layer 13 sees through transparent base material 11 and shows, the wearing and tearing scraping of color layer 13 can effectively be avoided usually as internal surface in the surface that is formed with color layer 13 during use.Preparing method's technology of said color layer 13 is simple, easy handling, environmental protection.
Claims (13)
1. the preparation method of a plated film spare, it comprises the steps:
Base material is provided, and this base material is transparent glass;
Adopt sputtering method to form preformed layer A on the surface of this base material, this preformed layer A is alumina layer or aln layer;
Continue to adopt sputtering method to form preformed layer B on the surface of preformed layer A, this preformed layer B is aluminium, chromium or titanium layer;
Utilize the argon plasma bombarding base material to be coated with the surface of preformed layer A and preformed layer B, will peel off fully up to preformed layer B;
The step that repeats the bombardment of above-mentioned sputter preformed layer B and argon plasma is so that preformed layer A forms a color layer; Do not bombarded the preformed layer B that falls and form a metal level by argon plasma; This color layer sees through L* coordinate that said base material shows in CIE Lab colour system between 83 to 88; The a* coordinate is between-0.5 to 0.5, and the b* coordinate is between-0.5 to 0.5.
2. the preparation method of plated film spare as claimed in claim 1 is characterized in that: the concrete processing parameter of the step of said sputter preformed layer A is: be working gas with the argon gas, argon flow amount is 100 ~ 300sccm; With oxygen or nitrogen is reactant gases, the flow 100 ~ 500sccm of oxygen or nitrogen; Use the aluminium target, the power of aluminium target is 5 ~ 13kW, the bias voltage that puts on base material is-10 ~-50V, coating temperature is 100 ~ 180 ℃, the plated film time is 20 ~ 30min.
3. the preparation method of plated film spare as claimed in claim 1 is characterized in that: the thickness of said preformed layer A is 80 ~ 120nm.
4. the preparation method of plated film spare as claimed in claim 1 is characterized in that: the concrete processing parameter of the step of said sputter preformed layer B is: be working gas with the argon gas, argon flow amount is 100 ~ 300sccm; Use metallic target; The material of metallic target is aluminium, chromium or titanium, and the power of metallic target is 8 ~ 11kW, the bias voltage that puts on base material is-50 ~-100V; Coating temperature is 100 ~ 180 ℃, and the plated film time is 15 ~ 20min.
5. the preparation method of plated film spare as claimed in claim 1 is characterized in that: the thickness of preformed layer B is 200 ~ 250nm.
6. the preparation method of plated film spare as claimed in claim 1; It is characterized in that: the concrete processing parameter of the step of said argon plasma bombardment is: the bias voltage that puts on base material is-200 ~-600V; Flow 100 ~ the 300sccm of argon gas, the time of bombardment is 45 ~ 70min.
7. the preparation method of plated film spare as claimed in claim 1 is characterized in that: the number of times of the step of said repetition sputter preformed layer B and argon plasma bombardment is total up to 3 ~ 5 times.
8. the preparation method of plated film spare as claimed in claim 1 is characterized in that: this color layer sees through said base material observation and presents white.
9. plated film spare, it comprises base material, is formed at the color layer on base material one surface, it is characterized in that: this plated film spare also comprises the metal level that is formed at the color layer surface; This base material is transparent glass; This color layer is alumina layer or aln layer, and this metal level is aluminium, chromium or titanium layer, and this color layer sees through L* coordinate that said base material shows in CIE Lab colour system between 83 to 88; The a* coordinate is between-0.5 to 0.5, and the b* coordinate is between-0.5 to 0.5.
10. plated film spare as claimed in claim 9 is characterized in that: the thickness of this color layer is 80 ~ 120nm.
11. plated film spare as claimed in claim 9 is characterized in that: this color layer is a crystalline state.
12. plated film spare as claimed in claim 9 is characterized in that: this color layer sees through said base material observation and presents white.
13. plated film spare as claimed in claim 9 is characterized in that: this metal layer thickness is 30 ~ 50nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011101017896A CN102747322A (en) | 2011-04-22 | 2011-04-22 | Preparation method of plated film member and plated film member prepared by method thereof |
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| CN2011101017896A CN102747322A (en) | 2011-04-22 | 2011-04-22 | Preparation method of plated film member and plated film member prepared by method thereof |
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| CN102747322A true CN102747322A (en) | 2012-10-24 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104441841A (en) * | 2014-11-03 | 2015-03-25 | 肇庆市振华真空机械有限公司 | Gold-imitation coated glass and preparation technology thereof |
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| JPH0238557A (en) * | 1988-07-28 | 1990-02-07 | Nippon Steel Corp | Stainless steel sheet having excellent wear resistance and corrosion resistance |
| JPH02156067A (en) * | 1988-12-08 | 1990-06-15 | Ikuyo:Kk | Formation for color film on transparent synthetic resin molding |
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| CN104441841A (en) * | 2014-11-03 | 2015-03-25 | 肇庆市振华真空机械有限公司 | Gold-imitation coated glass and preparation technology thereof |
| CN104441841B (en) * | 2014-11-03 | 2017-02-15 | 广东振华科技股份有限公司 | Gold-imitation coated glass and preparation technology thereof |
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Application publication date: 20121024 |