CN102736935A - Method for adding character strings in maskless lithography machine exposure in real time - Google Patents
Method for adding character strings in maskless lithography machine exposure in real time Download PDFInfo
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- CN102736935A CN102736935A CN2012101739045A CN201210173904A CN102736935A CN 102736935 A CN102736935 A CN 102736935A CN 2012101739045 A CN2012101739045 A CN 2012101739045A CN 201210173904 A CN201210173904 A CN 201210173904A CN 102736935 A CN102736935 A CN 102736935A
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Abstract
The invention relates to the field of data processing of maskless direct writing lithography machines, and in particular relates to a method for adding character strings in maskless lithography machine exposure in real time. The method comprises the following steps of: (1) loading a graphic file to be exposed through a computer, and determining the position, size and composition of characters or character strings which need to be added into the graphic file; and (2) finding the characters or character strings which need to be added in a character library through the computer, inputting the characters or character strings into the graphic file according to specific position and size, and saving, namely the whole adding process is finished. According to the method, the problem of adding the character strings in real time in the scanning maskless lithography machine exposure process is solved, and the requirements of generating marks, serial numbers and dates on light-sensitive media are met.
Description
Technical field
The present invention relates to the data processing field of non-mask write through photo-etching machine, be specially the method for adding character string in a kind of mask-free photolithography machine exposure in real time.
Background technology
In real time lithography data is handled, and is that the graphic file with forms such as GDSII is the input data, and through data processing at a high speed, output can directly be used for the process of the data of photo-etching machine exposal.In the data handling procedure of reality, often have the demand of on exposure figure, adding sign, sequence number and date, and still do not satisfy the method and the technology of the demand at present, therefore need to be resolved hurrily.
Summary of the invention
The purpose of this invention is to provide the method for adding character string in a kind of mask-free photolithography machine exposure in real time, this method can satisfy the demand of in exposure figure, adding sign, sequence number and date.
For realizing above-mentioned purpose, the present invention has adopted following technical scheme: add the method for character string in a kind of mask-free photolithography machine exposure in real time, it may further comprise the steps:
1), through computer loads graphic file to be made public, and confirm to add to the character that goes in the graphic file or position, size and the composition of character string;
2), computing machine searches out the character or the character string of required interpolation in character repertoire, and character or character string are input in the said graphic file according to appointed positions and size, preserves the whole interpolation process of promptly accomplishing then.
The method of adding character string in the exposure of this mask-free photolithography machine in real time can also be able to further realization in the following manner:
The character of storing in the said character repertoire comprises upper and lower case letter, numeral and visicode at least.Said visicode also is after printing, to show and to let the observed symbol of people.
Any character in the said character repertoire is all preserved according to vector data, also is that each character all is made up of the series of points of enclosing this character outline, and the coordinate of this series of points is used for confirming the position and the size of this character.
Said character repertoire comprises and is used for character repertoire file header structure that character searches and extract and the character repertoire file data district that is used for the store character vector data.
Said character repertoire file header structure comprises the character title, character is wide, character is high, character data start address and character data end address; Said character repertoire file data district comprises the quantity of the series of points of enclosing character outline and the coordinate data of each point; Step 2) in; Computing machine is searched through character repertoire file header structure; Find the character and the preservation position of character in character repertoire file data district of required interpolation; Again whole point coordinate data of the character that finds are added in the vector data of the graphic file that has loaded, carry out the translation of character position and the convergent-divergent of size during the whole point coordinate data of adding character as required.
The coordinate data of each point of said character is 2-D data.
The graphic file to be made public of said computer loads is the file of GDSII, OASIS or GERBER form.
The present invention has following beneficial effect: the invention solves the problem of in scan-type mask-free photolithography machine exposure process, how to add character string in real time, satisfied the demand that on the photaesthesia media, produces sign, sequence number and date.
Description of drawings
Fig. 1 is the process flow diagram that in graphic file, adds character string and exposure.
Fig. 2 is the structural representation of character vector data.
Fig. 3 is the form synoptic diagram in character repertoire file header structure and character repertoire file data district.
The implication of mark is following among the figure:
1-vector point, 2-vector point surrounds the zone that forms
3-character repertoire file header structure, 4-character repertoire file data district
Embodiment
As shown in Figure 1, real-time method of adding character string in a kind of mask-free photolithography machine exposure, it may further comprise the steps:
101, the graphic file through computer loads GDSII to be made public, OASIS or GERBER form;
102, confirm to add to position, size and the composition of the character string of going in the graphic file;
103, the computing machine memory location of searching each character in the character string through character repertoire file header structure;
104, computing machine extracts all point coordinate data of each character through character repertoire file data district;
105, computing machine adds whole point coordinate data of character in the vector data of the graphic file that has loaded to; Carry out the translation of character position and the convergent-divergent of size during interpolation as required, also be about to character or character string and be input in the said graphic file according to appointed positions and size;
106, Computer Processing and preserve the vector data of the graphic file of load string, computing machine also outputs to the vector data of graphic file in the exposure machine in real time, to obtain to be added with the figure of character string.
In the time need making public once more or new graphic file made public to same graphic file; Computing machine can add the character string of adding last time in the perhaps new graphic file of this same graphic file to according to position of adding last time and size automatically; This moment, whether the staff needed position, size, the content of acknowledge character string to change; Can certainly set in the character string content change rule (progressively increasing such as sequence number) by the staff, if change then character string adding that will be new so that generate new character string automatically by rule; And the last character string of deletion, add again if do not change then need not.
Character all is kept in the character repertoire, and the character of storing in the said character repertoire comprises upper and lower case letter, numeral and visicode at least.Any character in the said character repertoire is all preserved according to vector data, also is that each character all is made up of the series of points of enclosing this character outline, and the coordinate of this series of points is used for confirming the position and the size of this character.
As shown in Figure 2, character " 1 " is surrounded by several vector points 1 and forms, and these several vector points 1 surround the zone 2 that forms and promptly constituted character " 1 ".
The preservation form of character is as shown in Figure 3, and said character repertoire comprises and is used for character repertoire file header structure 3 that character searches and extract and the character repertoire file data district 4 that is used for the store character vector data.
Said character repertoire file header structure 3 comprises the character title, character is wide, character is high, character data start address and character data end address; Said character repertoire file data district 4 comprises the quantity of the series of points of enclosing character outline and the coordinate data of each point; Computing machine is at first searched through character repertoire file header structure; Find the character and the preservation position of character in character repertoire file data district of required interpolation; Again whole point coordinate data of the character that finds are added in the vector data of the graphic file that has loaded, carry out the translation of character position and the convergent-divergent of size during the whole point coordinate data of adding character as required.
The coordinate data of each point of said character is 2-D data.
Claims (7)
1. add the method for character string during a mask-free photolithography machine makes public in real time, it is characterized in that may further comprise the steps:
1), through computer loads graphic file to be made public, and confirm to add to the character that goes in the graphic file or position, size and the composition of character string;
2), computing machine searches out the character or the character string of required interpolation in character repertoire, and character or character string are input in the said graphic file according to appointed positions and size, preserves the whole interpolation process of promptly accomplishing then.
2. add the method for character string in the mask-free photolithography machine exposure according to claim 1 in real time, it is characterized in that: the character of storing in the said character repertoire comprises upper and lower case letter, numeral and visicode at least.
3. add the method for character string in the mask-free photolithography machine exposure according to claim 2 in real time; It is characterized in that: any character in the said character repertoire is all preserved according to vector data; Also be that each character all is made up of the series of points of enclosing this character outline, the coordinate of this series of points is used for confirming the position and the size of this character.
4. add the method for character string in the mask-free photolithography machine according to claim 3 exposure in real time, it is characterized in that: said character repertoire comprises and is used for character character repertoire file header structure of searching and extracting and the character repertoire file data district that is used for the store character vector data.
5. add the method for character string in the mask-free photolithography machine according to claim 4 exposure in real time, it is characterized in that: said character repertoire file header structure comprises the character title, character is wide, character is high, character data start address and character data end address; Said character repertoire file data district comprises the quantity of the series of points of enclosing character outline and the coordinate data of each point;
Step 2) in; Computing machine is searched through character repertoire file header structure; Find the character and the preservation position of character in character repertoire file data district of required interpolation; Again whole point coordinate data of the character that finds are added in the vector data of the graphic file that has loaded, carry out the translation of character position and the convergent-divergent of size during the whole point coordinate data of adding character as required.
6. add the method for character string in the mask-free photolithography machine exposure according to claim 5 in real time, it is characterized in that: the coordinate data of each point of said character is 2-D data.
7. according to the method for adding character string in each described mask-free photolithography machine exposure in the claim 1～6 in real time, it is characterized in that: the graphic file to be made public of said computer loads is the file of GDSII, OASIS or GERBER form.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012101739045A CN102736935A (en) | 2012-05-31 | 2012-05-31 | Method for adding character strings in maskless lithography machine exposure in real time |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012101739045A CN102736935A (en) | 2012-05-31 | 2012-05-31 | Method for adding character strings in maskless lithography machine exposure in real time |
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| CN102736935A true CN102736935A (en) | 2012-10-17 |
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| CN2012101739045A Pending CN102736935A (en) | 2012-05-31 | 2012-05-31 | Method for adding character strings in maskless lithography machine exposure in real time |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2020013042A (en) * | 2018-07-20 | 2020-01-23 | 株式会社Ｓｃｒｅｅｎホールディングス | Drawing device and drawing method |
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| CN1847983A (en) * | 2005-04-04 | 2006-10-18 | 中国科学院微电子研究所 | Prepn process of exposure registering mark for mixing and matching between electron beam and optical device |
| EP1903595A2 (en) * | 2006-09-21 | 2008-03-26 | NuFlare Technology, Inc. | Writing data processing control apparatus, writing method, and writing apparatus |
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- 2012-05-31 CN CN2012101739045A patent/CN102736935A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN1847983A (en) * | 2005-04-04 | 2006-10-18 | 中国科学院微电子研究所 | Prepn process of exposure registering mark for mixing and matching between electron beam and optical device |
| EP1903595A2 (en) * | 2006-09-21 | 2008-03-26 | NuFlare Technology, Inc. | Writing data processing control apparatus, writing method, and writing apparatus |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2020013042A (en) * | 2018-07-20 | 2020-01-23 | 株式会社Ｓｃｒｅｅｎホールディングス | Drawing device and drawing method |
| CN110737179A (en) * | 2018-07-20 | 2020-01-31 | 株式会社斯库林集团 | Drawing device and drawing method |
| CN110737179B (en) * | 2018-07-20 | 2022-08-02 | 株式会社斯库林集团 | Drawing device and drawing method |
| JP7133379B2 (en) | 2018-07-20 | 2022-09-08 | 株式会社Ｓｃｒｅｅｎホールディングス | Drawing device and drawing method |
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Application publication date: 20121017 |