CN102732846A - Covering member and manufacture method thereof - Google Patents
Covering member and manufacture method thereof Download PDFInfo
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- CN102732846A CN102732846A CN2011100867412A CN201110086741A CN102732846A CN 102732846 A CN102732846 A CN 102732846A CN 2011100867412 A CN2011100867412 A CN 2011100867412A CN 201110086741 A CN201110086741 A CN 201110086741A CN 102732846 A CN102732846 A CN 102732846A
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Abstract
The invention provides a covering member, comprising a hard matrix on which a transition layer, a composite hard layer and an antioxidation layer are formed in sequence. The transition layer is a chromium layer. The composite hard layer consists of a chromium nitride layer, a hafnium nitride layer and a molybdenum nitride layer. The antioxidation layer is an aluminum oxide layer. In addition, the invention also provides a manufacture method for the covering member. The method comprises the following steps of: providing the hard matrix; and forming the transition layer, the composite hard layer and the antioxidation layer in sequence on the hard matrix through magnetron sputtering. The covering member manufactured by the method has high hardness as well as a relatively good antioxidation performance.
Description
Technical field
The present invention relates to a kind of lining part and method of manufacture thereof.
Background technology
Technique for vacuum coating has a wide range of applications at industrial circle, wherein, and TiN film plated work-ing life of significantly improving cutter and mould at cutter or mold surface energy.Yet, along with metal cutting processing develops towards high cutting speed, high speed of feed, high reliability, long lifetime, high precision and the good controlled aspect of cutting, to surface-coated demands for higher performance.Traditional single tin lining part can not meet the demands at aspects such as hardness, toughness.
The ZrN film gets more and more people's extensive concerning owing to its hardness and toughness all are superior to the TiN film.But the space that single ZrN film improves at aspects such as hardness, oxidation-resistances is little, is difficult to satisfy the demand of modern industry.Know that again CrN is a kind of hard thin film material, can be used as superhard tool material and surface protecting material.But because the hardness not very high (about 18GPa) of CrN itself; Its application on cutter or mould is restricted; In addition; The oxidation-resistance poor effect of above-mentioned ZrN or CrN ganoine thin film, plating can not play good antioxygenation in cutter or die surface, causes the inefficacy of film easily.
Summary of the invention
Given this, be necessary to provide a kind of lining part that had not only had high firmness but also had preferable antioxidant property.
A kind of method of manufacture of above-mentioned lining part also is provided in addition.
A kind of lining part; This lining part comprises hard substrate; Be formed at transition layer, composite ganoine layer and anti oxidation layer on this hard substrate successively; Said transition layer is the chromium layer, and said composite ganoine layer comprises chromium nitride layer, hafnium nitride and the nitrogenize molybdenum layer that is formed at successively on the transition layer, and said anti oxidation layer is an alumina layer.
A kind of method of manufacture of the part that is covered may further comprise the steps:
One hard substrate is provided;
Surface magnetic control sputtering chromium layer in this hard substrate;
Magnetron sputtering chromium nitride layer on this chromium layer;
Magnetron sputtering nitrogenize hafnium layer on this chromium nitride layer;
Magnetron sputtering nitrogenize molybdenum layer on this chromium nitride layer;
Magnetron sputtering alumina layer on this nitrogenize molybdenum layer.
Said chromium layer plays adhewsive action to the chromium nitride layer in the composite ganoine layer, and it can combine hard substrate and composite ganoine layer well more firmly.The combining of the chromium nitride layer that forms successively in the meanwhile said composite ganoine layer, hafnium nitride and nitrogenize molybdenum layer can make the composite ganoine layer more firm; Mainly be because chromium nitride layer has stronger sticking power to the chromium layer; Simultaneously all have the thermal expansivity more close with hard substrate as outer field hafnium nitride and molybdenum nitride; Therefore internal stress is little at the interface; Thereby make the bonding force of outer field hafnium nitride and nitrogenize molybdenum layer and chromium nitride layer stronger, toughness is higher; And the thermostability of the nitrogenize hafnium layer between chromium nitride and molybdenum nitride and chemicalstability all are better than other mechanically resistant material, so the chromium nitride of sputter and nitrogenize hafnium layer can significantly improve the hardness and the anti-deciduous of rete of lining part successively.At last, at this composite ganoine layer magnetron sputtering alumina layer, it brings better antioxidant property can for above-mentioned composite ganoine layer, thereby has prolonged the work-ing life of product.
Description of drawings
Fig. 1 is the sectional view of the lining part of preferred embodiment of the present invention;
Fig. 2 is the schematic top plan view of the used vacuum plating unit of lining part in the shop drawings 1.
The main element nomenclature
Lining part 10
Transition layer 13
Composite ganoine layer 15
Chromium nitride layer 151
Nitrogenize hafnium layer 153
Nitrogenize molybdenum layer 155
Anti oxidation layer 17
Track 21
Hafnium target 23
It below is embodiment
See also Fig. 1, the lining part 10 of the present invention's one preferred embodiment comprises a hard substrate 11, and is formed at transition layer 13, composite ganoine layer 15 and the anti oxidation layer 17 on this hard substrate 11 successively.
This transition layer 13 is the chromium layer.
This composite ganoine layer 15 comprises chromium nitride layer 151, nitrogenize hafnium layer 153 and the nitrogenize molybdenum layer 155 that is formed at successively on the hard substrate 11.This chromium nitride layer 151, nitrogenize hafnium layer 153 and nitrogenize molybdenum layer 155 can form through the mode of magnetron sputtering.
This anti oxidation layer 17 is an alumina layer.
In the present embodiment, the thickness of this composite ganoine layer 15 is 4～8 μ m.
The material of this hard substrate 11 can be hard metals such as rapid steel, stainless steel.
Lining part 10 in the present embodiment can be all kinds of cutting tools, precision measuringtoll or mould.
The method of making said lining part 10 mainly comprises the steps:
This hard substrate 11 is carried out pre-treatment.
Said hard substrate 11 is put into the ultrasonic cleaner that is loaded with ethanol or acetone soln shake cleaning, to remove the impurity and the greasy dirt on hard substrate 11 surfaces.Dry for standby after cleaning finishes.
Argon plasma is carried out on the surface of the hard substrate after above-mentioned processing 11 clean, further remove the greasy dirt on hard substrate 11 surfaces, to improve hard substrate 11 surfaces and follow-up coating's adhesion.
See also Fig. 2, a coating equipment 100 is provided, this coating equipment 100 comprises a coating chamber 20 and is connected in a vacuum pump 30 of coating chamber 20 that vacuum pump 30 is in order to vacuumize coating chamber 20.Be provided with pivoted frame (not shown) in this coating chamber 20; On these coating chamber 20 sidewalls, chromium target 22, hafnium target 23, molybdenum target 24 and aluminium target 25 are installed respectively; Pivoted frame drives aluminum or aluminum alloy matrix 11 along 21 revolution of circular track, and aluminum or aluminum alloy matrix 11 also rotation along track 21 revolution the time.
Concrete operations and processing parameter that this plasma cleans can be: to this coating chamber 20 vacuumize handle to vacuum tightness be 8.0 * 10
-3Pa; In coating chamber 20, feeding purity with the flow of 300～500sccm (standard state ml/min) is 99.999% argon gas (working gas); On hard substrate 11, apply-300～-bias voltage of 800V; In said coating chamber 20, form high-frequency voltage, make said argon gas ionization and produce argon plasma physical bombardment is carried out on the surface of hard substrate 11, and reach purpose hard substrate 11 surface cleaning.The time that said argon plasma is cleaned is 3～10min.
After hard substrate 11 being carried out the plasma cleaning, on this hard substrate 11, form said transition layer 13.The concrete operations and the processing parameter that form this transition layer 13 are following: be working gas with the argon gas; The adjusting argon flow amount is 100～300sccm, on hard substrate 11, apply-50～-bias voltage of 200V, the dutycycle that bias voltage is set is 30%～80%; And 20 to 100～150 ℃ of coating chambers of heating; With chromium target 22 is target, and it is 8～13kw that its power is set, deposition transition layer 13.This transition layer 13 is a chromium layer.The time that deposits this transition layer 13 is 10～30min.
On this transition layer 13, form composite ganoine layer 15.At first form the chromium nitride layer 151 in the said composite ganoine layer 15.The concrete operations and the processing parameter that form this chromium nitride layer 151 are following: be working gas with the argon gas; The adjusting argon flow amount is 100～300sccm; Feeding flow is the reactant gases nitrogen of 10～70sccm; On hard substrate 11, apply-50～-bias voltage of 200V, the dutycycle that bias voltage is set is 30%～80%, and 20 to 100～150 ℃ of heating coating chambers; Open chromium target 22, it is 1～3kw that its power is set, sedimenting chromium chloride layer 151.The time that deposits this chromium nitride layer 151 is 10～30min.
On this chromium nitride layer 151, form nitrogenize hafnium layer 153, concrete operations and processing parameter are following: be working gas with the argon gas, in said coating chamber 20, feeding flow is the reactant gases nitrogen of 10～70sccm; With hafnium target 23 is target, and the power that hafnium target 23 is set is 1～4KW, the bias voltage that puts on hard substrate 11 is-100～-300V; The dutycycle that bias voltage is set is 30%～80%; Nitrogen flow is 10～70sccm, and sputter temperature is 100～200 ℃, deposits said nitrogenize hafnium layer 153.The time that deposits this nitrogenize hafnium layer 153 is 60～90min.
On this nitrogenize hafnium layer 153, form nitrogenize molybdenum layer 155; Concrete operations and processing parameter are following: be working gas with the argon gas; It is 100～200sccm that argon flow amount is set, and the maintenance nitrogen flow is 100～200sccm, to hard substrate 11 apply-50～-bias voltage of 100V; The dutycycle that bias voltage is set is 30%～50%, and heating coating chamber to 100～150 ℃; Open molybdenum target 24, it is 8～13kw that its power is set, and deposits this nitrogenize molybdenum layer 155.The time of cvd nitride molybdenum layer 155 is 40～70min.
13 pairs of composite ganoine layer 15 of said chromium layer play and strengthen the effect of adhering to.Have the thermal expansivity more close as outermost molybdenum nitride 155 in the composite ganoine layer 15 with nitrogenize hafnium layer 153; Therefore internal stress is little at the interface; Thereby make the bonding force of itself and nitrogenize hafnium layer 153 stronger, toughness is higher; And the mechanically resistant material that the thermostability and the chemicalstability of 153 layers of nitrogenize and molybdenum nitride 155 all are better than other, so, the chromium nitride 151 of sputter successively, nitrogenize 153 and 155 layers of hardness that can significantly improve lining part 10 of molybdenum nitride.
On this composite ganoine layer 15, form anti oxidation layer 17; Its concrete operations and processing parameter are following: with the argon gas is working gas, and it is 100～200sccm that argon flow amount is set, and is reactant gases with oxygen; It is 150～200sccm that oxygen flow is set; To hard substrate 11 apply-50～-bias voltage of 100V, the dutycycle that bias voltage is set is 30%～50%, and heating coating chamber to 100～150 ℃; Open aluminium target 25, it is 8～13kw that its power is set, aluminum oxide layer 17.The time of aluminum oxide layer 17 is 30～60min.The thickness of controlled oxidation aluminium lamination 17 is 0.5～1.0 μ m.
Lining part 10 surface temperature when processing is used can raise; Through at lining part 10 outside surface coating one deck chemical properties highly stable aluminum oxide rete 17; Can protect the hard coat on the coating part 10 not aggravate oxidation because of use; Therefore can improve the use temperature of lining part 10, prolong the work-ing life of lining part 10.
Describe below in conjunction with the preparation method and the lining part 10 of specific embodiment lining part 10:
Embodiment 1
Plasma cleans: argon flow amount is 280sccm, and the bias voltage of hard substrate 11 is-300V that the time that plasma cleans is 9 minutes;
Sputter transition layer 13: feed argon gas 100sccm, the bias voltage that on hard substrate 11, applies is-50V, opens chromium target 22, and it is 8kw that its power is set, and depositing time is 10min.
Sputter chromium nitride layer 151: argon flow amount is 100sccm, and nitrogen flow is 10sccm, opens chromium target 22, and it is 1kw that its power is set, and the bias voltage that hard substrate 11 is applied is-100V to deposit 20 minutes;
Sputter nitrogenize hafnium layer 153: argon flow amount is 100sccm, and nitrogen flow is 10sccm, opens hafnium target 23, on hard substrate 11, applies-bias voltage of 100V, deposits 60 minutes.
Sputter nitrogenize molybdenum layer 155: argon flow amount is 100sccm, and nitrogen 40sccm is set, and opens molybdenum target 24, on hard substrate 11, applies-bias voltage of 200V, deposits 40 minutes.
Sputter anti oxidation layer 17: argon flow amount is 150sccm, and oxygen flow is 75sccm, opens aluminium target 25, on hard substrate 11, applies-bias voltage of 100V, and depositing time is 50min, on hard substrate 11, applies-bias voltage of 50V, and depositing time is 30min.
Embodiment 2
Plasma cleans: argon flow amount is 280sccm, and the bias voltage of hard substrate 11 is-300V that the time that plasma cleans is 9 minutes;
Sputter transition layer 13: feed argon gas 100sccm, the bias voltage-100V that on hard substrate 11, applies opens chromium target 22, and it is 10kw that its power is set, and depositing time is 20min.
Sputter chromium nitride layer 151: feed argon gas 100sccm, nitrogen flow is 40sccm, opens chromium target 22, and it is 2kw that its power is set, and the bias voltage that hard substrate 11 is set is-150V to deposit 25 minutes;
Sputter nitrogenize hafnium layer 153: argon flow amount is 100sccm, and nitrogen 40sccm is set, and opens hafnium target 23, on hard substrate 11, applies-bias voltage of 200V, deposits 70 minutes.
Sputter nitrogenize molybdenum layer 155: argon flow amount is 100sccm, and nitrogen 40sccm is set, and opens molybdenum target 24, on hard substrate 11, applies-bias voltage of 200V, deposits 50 minutes.
Anti oxidation layer 17: argon flow amount is 150sccm, and oxygen flow is 75sccm, opens aluminium target 25, on hard substrate 11, applies-bias voltage of 100V, and depositing time is 50min.
Embodiment 3
Plasma cleans: argon flow amount is 280sccm, and the bias voltage of hard substrate 11 is-300V that the time that plasma cleans is 9 minutes;
Sputter transition layer 13: argon flow amount is 100sccm, and the bias voltage-100V that on hard substrate 11, applies opens chromium target 22, and it is 13kw that its power is set, and depositing time is 30min.
Sputter chromium nitride layer 151: argon flow amount is 100sccm, and nitrogen flow is 70sccm, opens chromium target 22, and it is 3kw that its power is set, and the bias voltage that hard substrate 11 is set is-300V to deposit 30 minutes;
Sputter nitrogenize hafnium layer 153: argon flow amount is 100sccm, and nitrogen flow is 70sccm, opens hafnium target 23, on hard substrate 11, applies-bias voltage of 300V, deposits 90 minutes.
Sputter nitrogenize molybdenum layer 155: argon flow amount is 100sccm, and nitrogen 40sccm is set, and opens molybdenum target 24, on hard substrate 11, applies-bias voltage of 200V, deposits 70 minutes.
Anti oxidation layer 17: argon flow amount is 150sccm, and oxygen flow is 75sccm, opens aluminium target 25, on hard substrate 11, applies-bias voltage of 150V, and depositing time is 60min.
The performance test of lining part 10
(1) hardness test, concrete testing method is following:
Adopting MVK-H11 type Vickers hardness tester, is under the effect of 0.025kg power in load, the Vickers' hardness of test lining part 10.
The result shows, is respectively 621HV, 630HV and 634HV by the Vickers' hardness of the lining part 10 of the embodiment of the invention 1 to 3 manufacturing.It is thus clear that this lining part 10 has higher hardness.
(2) high-temperature oxidation resistant test, concrete testing method is following:
The testing tool that adopts is the tubular type heat treatment furnace, and test condition is: temperature rise rate is 10 ℃/min, and thermal treatment temp is 800 ℃, and soaking time is 10h.
Test result shows, by the embodiment of the invention 1 to 3 prepared lining part 10 behind 800 ℃ of thermal treatment 10h, all do not see oxidation, come off etc. bad.
Claims (9)
- One kind the lining part; Comprise hard substrate; It is characterized in that: this lining part also comprises transition layer, composite ganoine layer and the anti oxidation layer that is formed at successively on this hard substrate; Said transition layer is the chromium layer, and said composite ganoine layer comprises chromium nitride layer, hafnium nitride and the nitrogenize molybdenum layer that is formed at successively on the transition layer, and said anti oxidation layer is an alumina layer.
- 2. lining part as claimed in claim 1 is characterized in that: the thickness of this composite ganoine layer is 3～7 μ m.
- 3. lining part as claimed in claim 1 is characterized in that: the material of this hard substrate is the high speed steel or stainless steel.
- 4. the preparation method of the part that is covered may further comprise the steps:One hard substrate is provided;Surface magnetic control sputtering chromium layer in this hard substrate;Magnetron sputtering chromium nitride layer on this chromium layer;Magnetron sputtering nitrogenize hafnium layer on this chromium nitride layer;Magnetron sputtering nitrogenize molybdenum layer on this chromium nitride layer;Magnetron sputtering alumina layer on this nitrogenize molybdenum layer.
- 5. the preparation method of lining part as claimed in claim 4 is characterized in that: the said chromium nitride layer of magnetron sputtering is a working gas with the argon gas; The adjusting argon flow amount is 100～300sccm; Feeding flow is the nitrogen of 10～70sccm, to hard substrate apply bias voltage-50～-200V, the dutycycle that bias voltage is set is 30%～80%; Open chromium target, it is 1～3kw that its power is set.
- 6. the preparation method of lining part as claimed in claim 5 is characterized in that: the time of the said chromium nitride layer of magnetron sputtering is 20～30min.
- 7. the preparation method of lining part as claimed in claim 4; It is characterized in that: the processing parameter that forms this nitrogenize hafnium layer is: with the hafnium target is target; The power that the hafnium target is set is 1～4KW, hard substrate is applied bias voltage be-100～-300V, the dutycycle that bias voltage is set is 30%～80%; Nitrogen flow is 10～70sccm, and sputtering time is 60～90min.
- 8. the preparation method of lining part as claimed in claim 7; It is characterized in that: the processing parameter that forms this nitrogenize molybdenum layer is: nitrogen flow is 100～200sccm; To hard substrate apply-50～-bias voltage of 100V, the dutycycle that bias voltage is set is 30%～50%, opens molybdenum target; It is 8～13kw that its power is set, and the time of cvd nitride molybdenum layer is 40～70min.
- 9. the preparation method of lining part as claimed in claim 4; It is characterized in that: the technology of magnetron sputtering alumina layer: it is 100～200sccm that argon flow amount is set, and it is 150～200sccm that oxygen flow is set, to hard substrate apply-50～-bias voltage of 100V; The dutycycle that bias voltage is set is 30%～50%; Selection aluminium is target, and it is 8～13kw that its power is set, and depositing time is 30～60min.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011100867412A CN102732846A (en) | 2011-04-07 | 2011-04-07 | Covering member and manufacture method thereof |
| TW100112576A TW201240826A (en) | 2011-04-07 | 2011-04-12 | Coating and method for manufacturing the coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011100867412A CN102732846A (en) | 2011-04-07 | 2011-04-07 | Covering member and manufacture method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102732846A true CN102732846A (en) | 2012-10-17 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011100867412A Pending CN102732846A (en) | 2011-04-07 | 2011-04-07 | Covering member and manufacture method thereof |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN102732846A (en) |
| TW (1) | TW201240826A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103640273A (en) * | 2013-11-26 | 2014-03-19 | 浙江上城科技有限公司 | Fingerprint-preventing sapphire material |
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| WO2004026786A1 (en) * | 2002-09-14 | 2004-04-01 | Schott Ag | Protective layer, method and arrangement for the production of protective layers |
| CN101210310A (en) * | 2007-12-21 | 2008-07-02 | 广州有色金属研究院 | Multi-component multi-layer hard thin film material for minitype drill bit surface modification and preparation method thereof |
| CN101691654A (en) * | 2007-09-26 | 2010-04-07 | 山特维克知识产权股份有限公司 | Method of making a coated cutting tool |
| CN101746083A (en) * | 2008-12-17 | 2010-06-23 | 鸿富锦精密工业（深圳）有限公司 | Base plate with multi-layer film structure |
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2011
- 2011-04-07 CN CN2011100867412A patent/CN102732846A/en active Pending
- 2011-04-12 TW TW100112576A patent/TW201240826A/en unknown
Patent Citations (4)
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| WO2004026786A1 (en) * | 2002-09-14 | 2004-04-01 | Schott Ag | Protective layer, method and arrangement for the production of protective layers |
| CN101691654A (en) * | 2007-09-26 | 2010-04-07 | 山特维克知识产权股份有限公司 | Method of making a coated cutting tool |
| CN101210310A (en) * | 2007-12-21 | 2008-07-02 | 广州有色金属研究院 | Multi-component multi-layer hard thin film material for minitype drill bit surface modification and preparation method thereof |
| CN101746083A (en) * | 2008-12-17 | 2010-06-23 | 鸿富锦精密工业（深圳）有限公司 | Base plate with multi-layer film structure |
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| 余东海等: "《刀具涂层材料研究进展》", 《工具技术》 * |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103640273A (en) * | 2013-11-26 | 2014-03-19 | 浙江上城科技有限公司 | Fingerprint-preventing sapphire material |
| CN103640273B (en) * | 2013-11-26 | 2016-08-24 | 浙江上城科技有限公司 | A kind of fingerprint-preventisapphire sapphire material |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201240826A (en) | 2012-10-16 |
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Application publication date: 20121017 |