CN102707356A - Method for manufacturing color filter, color filter and display device - Google Patents
Method for manufacturing color filter, color filter and display device Download PDFInfo
- Publication number
- CN102707356A CN102707356A CN2011103402807A CN201110340280A CN102707356A CN 102707356 A CN102707356 A CN 102707356A CN 2011103402807 A CN2011103402807 A CN 2011103402807A CN 201110340280 A CN201110340280 A CN 201110340280A CN 102707356 A CN102707356 A CN 102707356A
- Authority
- CN
- China
- Prior art keywords
- photosensitive material
- colored filter
- filter substrate
- percentage
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Landscapes
- Liquid Crystal (AREA)
- Optical Filters (AREA)
- Materials For Photolithography (AREA)
Abstract
The invention provides a method for manufacturing a color filter, the color filter and a display device, relates to the field of displaying, and aims to solve the problem that a spacer topples over easily in a boxing process or when a liquid crystal screen is extruded in the prior art. The method for manufacturing the color filter comprises the following steps of: obtaining a color filter substrate; coating a layer of first light sensing material on the color filter substrate to form a first light sensing material coating layer; coating a second light sensing material on the first light sensing material coating layer to form a second light sensing material coating layer; and exposing and developing the first light sensing material coating layer and the second light sensing material coating layer on the color filter substrate, and forming the spacer on the color filter substrate, wherein the spacer has a step structure; and a lower step formed on the first light sensing material coating layer is wider than an upper step formed on the second light sensing material coating layer. By the method, the stability of the display effect and the display device can be improved.
Description
Technical field
The present invention relates to the demonstration field, be meant a kind of color filter making method, colored filter and display device especially.
Background technology
Colored filter is the important component part of LCDs, also is the key component that influences display effect.Colored filter comprises black matrix (BM), color filter layer, flatness layer (OC), the conductive layer (public electrode) that forms on the glass substrate.Generally in order to keep box thick (cell gap), prevent the liquid crystal extrusion and can't normally show, need be between Array array base palte and colored filter (Color Filer) substrate, some chock insulator matters distribute.Early stage liquid crystal panel adopts a kind of chock insulator matter (Ball Spacer) of sphere, and this chock insulator matter can't be fixed, might be in long-time use; Skewness causes at a certain region clustering; Can't play the thick effect of box of keeping, therefore, influence the display effect of display screen.
The method of main flow is to adopt photoetching process to make Post Spacer (protruding chock insulator matter) as chock insulator matter at present.Step is that the PS photosensitive material is coated the colored filter surface, produces chock insulator matter through overexposure, developing process.But, because the restriction of technology is difficult to guarantee that all chock insulator matters can both form up-narrow and down-wide shape, like this, make the part chock insulator matter to box technology or when liquid crystal display is squeezed, topple over easily, thereby influence the display effect of display screen.
Summary of the invention
The technical matters that the present invention will solve provides a kind of color filter making method, colored filter and display device, thereby the chock insulator matter that prevents colored filter is to box technology or when liquid crystal display is squeezed, topple over the display effect that influences display device.
For solving the problems of the technologies described above, embodiments of the invention provide technical scheme following:
On the one hand, a kind of color filter making method is provided, comprises:
Obtain a colored filter substrate;
On said colored filter substrate, apply one deck first photosensitive material, form the coating of first photosensitive material;
On the coating of said first photosensitive material, apply second photosensitive material, form the coating of second photosensitive material;
The coating of said first photosensitive material on the said colored filter substrate, the coating of said second photosensitive material are made public, developed; On said colored filter substrate, form chock insulator matter, said colored filter substrate and said chock insulator matter are formed colored filter; Wherein, said chock insulator matter is a ledge structure, and the width of getting out of a predicament or an embarrassing situation of said first photosensitive material formation is greater than the width of topping bar of said second photosensitive material formation.
Said first photosensitive material and said second photosensitive material are negative photoresist, and the ratio of the alkali soluble resin in said second photosensitive material is higher than the ratio of the alkali soluble resin in said first photosensitive material.
Said getting out of a predicament or an embarrassing situation is ladder-shaper structure, and said topping bar is ladder-shaper structure.
Said one deck first photosensitive material that on said colored filter substrate, applies forms after the step of coating of first photosensitive material, and said method also comprises: the colored filter substrate to applying said first photosensitive material toasts;
Said second photosensitive material that on the coating of said first photosensitive material, applies forms after the step of coating of second photosensitive material, and said method also comprises: the colored filter substrate to applying said second photosensitive material toasts.
The said step that the colored filter substrate that applies said first photosensitive material is toasted is specially: the colored filter substrate to applying said first photosensitive material toasts 20s～350s down at 50 ℃～150 ℃;
The said step that the colored filter substrate that applies said second photosensitive material is toasted is specially: the colored filter substrate to applying said second photosensitive material toasts 20s～350s down at 50 ℃～150 ℃.
Said first photosensitive material comprises: percentage by weight is that the alkali soluble resin of 0.05%-50%, the unsaturated vinyl monomer that percentage by weight is 5%-35%, the epoxy resin that percentage by weight is 0.05%-10%, the solvent that percentage by weight is 20%-70%, light initiator, the percentage by weight that percentage by weight is 0.05%-10% are the adjuvant of 0.01%-2%;
Said second photosensitive material comprises: percentage by weight is that alkali soluble resin, the percentage by weight of 10%-65% is that 10%～20% acrylic resin, the unsaturated vinyl monomer that percentage by weight is 2%-35%, the epoxy resin that percentage by weight is 0.05%-10%, the solvent that percentage by weight is 20%-75%, light initiator, the percentage by weight that percentage by weight is 0.05%-10% are the adjuvant of 0.01%-2%.
Said unsaturated vinyl monomer is multi-functional acrylate's monomer; Said adjuvant comprises: levelling agent, planarization agent and/or silane coupling agent.
Said colored filter substrate comprises: the glass-based flaggy that sets gradually from top to bottom, black matrix and chromatic filter layer, flatness layer and conductive layer; Said step at coating one deck first photosensitive material on the said colored filter substrate is specially: on said conductive layer, apply one deck first photosensitive material;
Perhaps, said colored filter substrate comprises: the conductive layer that sets gradually from top to bottom, glass-based flaggy, black matrix and chromatic filter layer and flatness layer; Said step at coating one deck first photosensitive material on the said colored filter substrate is specially: on said flatness layer, apply one deck first photosensitive material.
On the other hand; A kind of colored filter is provided; Comprise: colored filter substrate be arranged on the chock insulator matter on the said colored filter substrate, said chock insulator matter is a ledge structure, and the width of getting out of a predicament or an embarrassing situation of said ledge structure is greater than the width of topping bar of said ledge structure.
On the other hand; A kind of display device is provided; Comprise: colored filter substrate be arranged on the chock insulator matter on the said colored filter substrate, said chock insulator matter is a ledge structure, and the width of getting out of a predicament or an embarrassing situation of said ledge structure is greater than the width of topping bar of said ledge structure.
Embodiments of the invention have following beneficial effect:
In the such scheme, on colored filter, apply one deck first photosensitive material, form the coating of first photosensitive material; On the coating of said first photosensitive material, apply second photosensitive material, form the coating of second photosensitive material; After the coating of the coating of said first photosensitive material on the said colored filter, said second photosensitive material is made public, is developed; The coating of the coating of first photosensitive material, said second photosensitive material forms the chock insulator matter of ledge structure on said colored filter; Said ledge structure comprises: get out of a predicament or an embarrassing situation and top bar; The coating of said first photosensitive material forms and gets out of a predicament or an embarrassing situation, and the coating of said second photosensitive material forms and tops bar.Chock insulator matter structure of the present invention is up-narrow and down-wide, and chock insulator matter shape that should " up-narrow and down-wide " can guarantee the stability of chock insulator matter, prevents chock insulator matter to box technology or when liquid crystal display is squeezed, topple over, thereby has improved the stability of liquid crystal indicator.
Description of drawings
Fig. 1 is the schematic flow sheet of color filter making method of the present invention;
Fig. 2 is for adopting the structural representation of color filter making method under the TN pattern shown in Figure 1;
Fig. 3 is for adopting the structural representation of color filter making method under the FFS pattern shown in Figure 1.
Embodiment
For technical matters, technical scheme and advantage that embodiments of the invention will be solved is clearer, will combine accompanying drawing and specific embodiment to be described in detail below.
As shown in Figure 1, be a kind of color filter making method of the present invention, comprising:
Chock insulator matter structure of the present invention is up-narrow and down-wide, and chock insulator matter shape that should " up-narrow and down-wide " can guarantee the stability of chock insulator matter, prevents chock insulator matter to box technology or when liquid crystal display is squeezed, topple over, thereby has improved the stability of liquid crystal display.
Wherein, Said first photosensitive material and said second photosensitive material are negative photoresist; The ratio of the alkali soluble resin in said second photosensitive material is higher than the ratio of the alkali soluble resin in said first photosensitive material; Make that said chock insulator matter is a ledge structure, and the width of getting out of a predicament or an embarrassing situation of said first photosensitive material formation is greater than the width of topping bar of said second photosensitive material formation.Wherein, said getting out of a predicament or an embarrassing situation can be trapezium structure, and said topping bar is trapezium structure.
Optional; After the step 12, said method also comprises: step 12A, toast the colored filter substrate that applies said first photosensitive material; Wherein, step 12A can for: to the colored filter substrate that applies said first photosensitive material at 50 ℃～150 ℃ baking 20s～350s down.
Optional, after the step 13, said method also comprises: step 13A, toast the colored filter substrate that applies said second photosensitive material.Wherein, step 13A can for: to the colored filter substrate that applies said second photosensitive material at 50 ℃～150 ℃ baking 20s～350s down.
Said first photosensitive material comprises: percentage by weight is that the alkali soluble resin of 0.05%-50%, the unsaturated vinyl monomer that percentage by weight is 5%-35%, the epoxy resin that percentage by weight is 0.05%-10%, the solvent that percentage by weight is 20%-70%, light initiator, the percentage by weight that percentage by weight is 0.05%-10% are the adjuvant of 0.01%-2%;
Said second photosensitive material comprises: percentage by weight is that alkali soluble resin, the percentage by weight of 10%-69% is that 10%～20% acrylic resin, the unsaturated vinyl monomer that percentage by weight is 2%-35%, the epoxy resin that percentage by weight is 0.05%-10%, the solvent that percentage by weight is 20%-75%, light initiator, the percentage by weight that percentage by weight is 0.05%-10% are the adjuvant of 0.01%-2%.
Said unsaturated vinyl monomer is multi-functional acrylate's monomer; Said adjuvant comprises: levelling agent, planarization agent and/or silane coupling agent.
For example, photosensitive material 1 (first photosensitive material) component that is used to form chock insulator matter can be 10g alkali soluble resin, 15g tetramethylol methane tetraacrylate, 1.5g epoxy resin, 59g solvent, 0.8g light initiator, 0.3g levelling agent, 0.3g silane coupling agent.Photosensitive material 2 (second photosensitive material) component that is used to form chock insulator matter can be 30g alkali soluble resin, 18g polyurethane acrylic resin, 5.8g trimethylolpropane triacrylate, 1.5g epoxy resin, 56g solvent, 0.8g light initiator, 0.3g levelling agent, 0.3g silane coupling agent.Those skilled in the art can understand, and the ratio of each component can be with reference to as above in the photosensitive material, and weight is decided according to the area size of colored filter.
In the such scheme, on colored filter substrate, apply one deck first photosensitive material, form the coating of first photosensitive material; On the coating of said first photosensitive material, apply second photosensitive material, form the coating of second photosensitive material; After the coating of the coating of said first photosensitive material on the said colored filter substrate, said second photosensitive material is made public, is developed; The coating of the coating of first photosensitive material, said second photosensitive material forms the chock insulator matter of ledge structure on said colored filter; Said ledge structure comprises: get out of a predicament or an embarrassing situation and top bar; The coating of said first photosensitive material forms and gets out of a predicament or an embarrassing situation, and the coating of said second photosensitive material forms and tops bar.Because said first photosensitive material and said second photosensitive material are negative photoresist; The ratio of the alkali soluble resin in said second photosensitive material is higher than the ratio of the alkali soluble resin in said first photosensitive material; The dissolution velocity of said second photosensitive material in developer solution is faster than the dissolution velocity of said first photosensitive material in developer solution; Therefore, the width of getting out of a predicament or an embarrassing situation of said first photosensitive material formation is greater than the width of topping bar of said second photosensitive material formation.That is to say that the photosensitive material that is used to form chock insulator matter is a negative photoresist, comprise light-cured components and alkali soluble constituent, wherein the effect of alkali soluble constituent is unexposed photosensitive material to be dissolved come off in developer solution.The alkali soluble constituent content of the above-mentioned photosensitive material 1 that is used to form chock insulator matter is different with the alkali soluble constituent content of the photosensitive material that is used to form chock insulator matter 2; Therefore the speed that dissolving is peeled off in developer solution is different; The alkali soluble resin content that is used to form the photosensitive material 2 of chock insulator matter is used to form the alkali soluble resin content height of the photosensitive material 1 of chock insulator matter; Dissolution velocity is fast in developer solution, therefore can form the shape of the chock insulator matter of " up-narrow and down-wide ".
In an application scenarios, as shown in Figure 2, said colored filter substrate comprises: the glass-based flaggy 10 that sets gradually from top to bottom, black matrix and chromatic filter layer 20, flatness layer 30 and conductive layer 40; Accordingly, step 12 is specially: on said conductive layer 40, apply one deck first photosensitive material.
For example; For TN pattern ((twisted nematic liquid crystal mode; Using the liquid crystal molecule twist angle is the liquid crystal mode of the nematic liquid crystal of 90 degree), behind the ITO of the colored filter substrate that completes layer, with 1 spin coating of chock insulator matter photosensitive material or blade coating on the ITO layer; Through overbaking, can toast 20s～350s down at 50 ℃～150 ℃; Photosensitive material 2 spin coatings or the blade coating that will be used to form chock insulator matter then are on the coating of the photosensitive material that is used to form chock insulator matter 1; Again through once baking; Can toast 20s～350s down at 50 ℃～150 ℃, promptly obtain chock insulator matter 50 through single exposure, developing process afterwards.Said ledge structure comprises: get out of a predicament or an embarrassing situation 51 with top bar 52, said 51 the width of getting out of a predicament or an embarrassing situation is greater than said 52 the width of topping bar.Wherein, said getting out of a predicament or an embarrassing situation 51 can be trapezium structure, and said topping bar 52 is trapezium structure.
In the Another application scene, as shown in Figure 3, said colored filter substrate comprises: the conductive layer 40 that sets gradually from top to bottom, glass-based flaggy 10, black matrix and chromatic filter layer 20 and flatness layer 30; Accordingly, step 12 is specially: on said flatness layer 30, apply one deck first photosensitive material.
For example; For FFS (fringing field switching) pattern; Behind the flatness layer of colored filter substrate that completes, with the photosensitive material that is used to form chock insulator matter 1 spin coating or blade coating on flatness layer, behind overbaking; With the photosensitive material that is used to form chock insulator matter 2 spin coatings or blade coating on the photosensitive material that is used to form chock insulator matter 1, again through once baking.Promptly obtain chock insulator matter 50 through single exposure, developing process afterwards.Said ledge structure comprises: get out of a predicament or an embarrassing situation 51 with top bar 52, said 51 the width of getting out of a predicament or an embarrassing situation is greater than said 52 the width of topping bar.Wherein, said getting out of a predicament or an embarrassing situation 51 can be trapezium structure, and said topping bar 52 is trapezium structure.
The present invention provides a kind of color filter making method; Comprise: with homemade photosensitive material 1 spin coating that is used to form chock insulator matter or blade coating in the surface of colored filter substrate; After preceding baking (prebake); Again with homemade photosensitive material 2 spin coatings that are used to form chock insulator matter or blade coating on 1 layer of photosensitive material, again through baking before once.Make public afterwards, develop, get final product chock insulator matter.That is to say, through with twice coating of two kinds of homemade photosensitive materials (spin coating or blade coating) on colored filter substrate, the single exposure technology of developing, prepare chock insulator matter layer with " up-narrow and down-wide " structure.
The chock insulator matter structure of colored filter of the present invention, up-narrow and down-wide, and have step.Shape that should " up-narrow and down-wide " can guarantee the stability of chock insulator matter, prevents that chock insulator matter from toppling over when box or liquid crystal display are received extruding.In addition, in the technology, spherical chock insulator matter Ball Spacer is distributed in pixel region, can reduce aperture opening ratio now.Chock insulator matter stationkeeping of the present invention, and can be distributed in the top of TFT device, grid line and data line, therefore, can not reduce aperture opening ratio.
The present invention also provides a kind of colored filter; Comprise: colored filter substrate be arranged on the chock insulator matter on the said colored filter substrate; Said chock insulator matter is a ledge structure, and the width of getting out of a predicament or an embarrassing situation of said ledge structure is greater than the width of topping bar of said ledge structure.Optional, said getting out of a predicament or an embarrassing situation can be ladder-shaper structure, said topping bar can be ladder-shaper structure.
The present invention also provides a kind of display device; Said display device comprises colored filter; Colored filter comprises: colored filter be arranged on the chock insulator matter on the colored filter; Said chock insulator matter is a ledge structure, and the width of getting out of a predicament or an embarrassing situation of said ledge structure is greater than the width of topping bar of said ledge structure.Optional, said getting out of a predicament or an embarrassing situation can be ladder-shaper structure, said topping bar can be ladder-shaper structure.
The above is a preferred implementation of the present invention; Should be pointed out that for those skilled in the art, under the prerequisite that does not break away from principle according to the invention; Can also make some improvement and retouching, these improvement and retouching also should be regarded as protection scope of the present invention.
Claims (10)
1. a color filter making method is characterized in that, comprising:
Obtain a colored filter substrate;
On said colored filter substrate, apply one deck first photosensitive material, form the coating of first photosensitive material;
On the coating of said first photosensitive material, apply second photosensitive material, form the coating of second photosensitive material;
The coating of said first photosensitive material on the said colored filter substrate, the coating of said second photosensitive material are made public, developed, on said colored filter substrate, form chock insulator matter; Wherein, said chock insulator matter is a ledge structure, and the width of getting out of a predicament or an embarrassing situation of said first photosensitive material formation is greater than the width of topping bar of said second photosensitive material formation.
2. color filter making method according to claim 1 is characterized in that,
Said first photosensitive material and said second photosensitive material are negative photoresist, and the ratio of the alkali soluble resin in said second photosensitive material is higher than the ratio of the alkali soluble resin in said first photosensitive material.
3. color filter making method according to claim 1 is characterized in that,
Said getting out of a predicament or an embarrassing situation is ladder-shaper structure, and said topping bar is ladder-shaper structure.
4. color filter making method according to claim 1 is characterized in that,
Said one deck first photosensitive material that on said colored filter substrate, applies forms after the step of coating of first photosensitive material, and said method also comprises: the colored filter substrate to applying said first photosensitive material toasts;
Said second photosensitive material that on the coating of said first photosensitive material, applies forms after the step of coating of second photosensitive material, and said method also comprises: the colored filter substrate to applying said second photosensitive material toasts.
5. color filter making method according to claim 4 is characterized in that,
The said step that the colored filter substrate that applies said first photosensitive material is toasted is specially: the colored filter substrate to applying said first photosensitive material toasts 20s～350s down at 50 ℃～150 ℃;
The said step that the colored filter substrate that applies said second photosensitive material is toasted is specially: the colored filter substrate to applying said second photosensitive material toasts 20s～350s down at 50 ℃～150 ℃.
6. color filter making method according to claim 1 is characterized in that,
Said first photosensitive material comprises: percentage by weight is that the alkali soluble resin of 0.05%-50%, the unsaturated vinyl monomer that percentage by weight is 5%-35%, the epoxy resin that percentage by weight is 0.05%-10%, the solvent that percentage by weight is 20%-70%, light initiator, the percentage by weight that percentage by weight is 0.05%-10% are the adjuvant of 0.01%-2%;
Said second photosensitive material comprises: percentage by weight is that alkali soluble resin, the percentage by weight of 10%-65% is that 10%～20% acrylic resin, the unsaturated vinyl monomer that percentage by weight is 2%-35%, the epoxy resin that percentage by weight is 0.05%-10%, the solvent that percentage by weight is 20%-75%, light initiator, the percentage by weight that percentage by weight is 0.05%-10% are the adjuvant of 0.01%-2%.
7. color filter making method according to claim 6 is characterized in that,
Said unsaturated vinyl monomer is multi-functional acrylate's monomer; Said adjuvant comprises: levelling agent, planarization agent and/or silane coupling agent.
8. color filter making method according to claim 1 is characterized in that,
Said colored filter substrate comprises: the glass-based flaggy that sets gradually from top to bottom, black matrix and chromatic filter layer, flatness layer and conductive layer; Said step at coating one deck first photosensitive material on the said colored filter substrate is specially: on said conductive layer, apply one deck first photosensitive material;
Perhaps, said colored filter substrate comprises: the conductive layer that sets gradually from top to bottom, glass-based flaggy, black matrix and chromatic filter layer and flatness layer; Said step at coating one deck first photosensitive material on the said colored filter substrate is specially: on said flatness layer, apply one deck first photosensitive material.
9. colored filter; Comprise: colored filter substrate be arranged on the chock insulator matter on the said colored filter substrate; It is characterized in that said chock insulator matter is a ledge structure, and the width of getting out of a predicament or an embarrassing situation of said ledge structure is greater than the width of topping bar of said ledge structure.
10. display device; Comprise: colored filter substrate be arranged on the chock insulator matter on the said colored filter substrate; It is characterized in that said chock insulator matter is a ledge structure, and the width of getting out of a predicament or an embarrassing situation of said ledge structure is greater than the width of topping bar of said ledge structure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110340280.7A CN102707356B (en) | 2011-11-01 | 2011-11-01 | Method for manufacturing color filter, color filter and display device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110340280.7A CN102707356B (en) | 2011-11-01 | 2011-11-01 | Method for manufacturing color filter, color filter and display device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102707356A true CN102707356A (en) | 2012-10-03 |
| CN102707356B CN102707356B (en) | 2014-05-21 |
Family
ID=46900284
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201110340280.7A Active CN102707356B (en) | 2011-11-01 | 2011-11-01 | Method for manufacturing color filter, color filter and display device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102707356B (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103364989A (en) * | 2013-05-22 | 2013-10-23 | 华映视讯（吴江）有限公司 | Manufacturing method of color filter substrate |
| CN103499895A (en) * | 2013-10-12 | 2014-01-08 | 北京京东方光电科技有限公司 | Display panel, display device and manufacturing method of display panel |
| CN103970392A (en) * | 2014-04-18 | 2014-08-06 | 京东方科技集团股份有限公司 | Touch screen and display device |
| WO2014127567A1 (en) * | 2013-02-20 | 2014-08-28 | 北京京东方光电科技有限公司 | Method for manufacturing spacer on substrate |
| CN104062845A (en) * | 2014-05-23 | 2014-09-24 | 京东方科技集团股份有限公司 | Lower substrate, manufacturing method of lower substrate and liquid crystal lens |
| CN104658906A (en) * | 2013-11-22 | 2015-05-27 | 上海和辉光电有限公司 | Manufacturing method of semiconductor planarization layer |
| CN104950600A (en) * | 2014-03-27 | 2015-09-30 | 第一毛织株式会社 | Method of manufacturing black column spacer, black column spacer and color filter |
| CN105974654A (en) * | 2016-07-22 | 2016-09-28 | 京东方科技集团股份有限公司 | Preparation method of display substrate, display substrate and display device |
| CN107065314A (en) * | 2017-03-03 | 2017-08-18 | 京东方科技集团股份有限公司 | Spacer material and preparation method thereof, display panel |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004302464A (en) * | 2003-03-28 | 2004-10-28 | Samsung Electronics Co Ltd | Liquid crystal display device |
| CN1928669A (en) * | 2005-09-08 | 2007-03-14 | 中华映管股份有限公司 | Liquid crystal display panel and method for producing colorful filtering substrate |
| US20070070286A1 (en) * | 2005-09-28 | 2007-03-29 | Lg. Philips Lcd Co., Ltd. | Liquid crystal display device, method for manufacturing the same and spacer structure |
| CN101398571A (en) * | 2007-09-26 | 2009-04-01 | 北京京东方光电科技有限公司 | Liquid crystal display panel |
| CN101889221A (en) * | 2007-12-07 | 2010-11-17 | 大日本印刷株式会社 | Color filter and method for producing color filter |
-
2011
- 2011-11-01 CN CN201110340280.7A patent/CN102707356B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004302464A (en) * | 2003-03-28 | 2004-10-28 | Samsung Electronics Co Ltd | Liquid crystal display device |
| CN1928669A (en) * | 2005-09-08 | 2007-03-14 | 中华映管股份有限公司 | Liquid crystal display panel and method for producing colorful filtering substrate |
| US20070070286A1 (en) * | 2005-09-28 | 2007-03-29 | Lg. Philips Lcd Co., Ltd. | Liquid crystal display device, method for manufacturing the same and spacer structure |
| CN101398571A (en) * | 2007-09-26 | 2009-04-01 | 北京京东方光电科技有限公司 | Liquid crystal display panel |
| CN101889221A (en) * | 2007-12-07 | 2010-11-17 | 大日本印刷株式会社 | Color filter and method for producing color filter |
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014127567A1 (en) * | 2013-02-20 | 2014-08-28 | 北京京东方光电科技有限公司 | Method for manufacturing spacer on substrate |
| CN103364989A (en) * | 2013-05-22 | 2013-10-23 | 华映视讯（吴江）有限公司 | Manufacturing method of color filter substrate |
| CN103499895A (en) * | 2013-10-12 | 2014-01-08 | 北京京东方光电科技有限公司 | Display panel, display device and manufacturing method of display panel |
| CN104658906A (en) * | 2013-11-22 | 2015-05-27 | 上海和辉光电有限公司 | Manufacturing method of semiconductor planarization layer |
| CN104658906B (en) * | 2013-11-22 | 2017-09-01 | 上海和辉光电有限公司 | A kind of preparation method of semiconductor planarization layer |
| CN104950600A (en) * | 2014-03-27 | 2015-09-30 | 第一毛织株式会社 | Method of manufacturing black column spacer, black column spacer and color filter |
| CN104950600B (en) * | 2014-03-27 | 2019-12-06 | 第一毛织株式会社 | Method of manufacturing black column spacer, black column spacer and color filter |
| CN103970392A (en) * | 2014-04-18 | 2014-08-06 | 京东方科技集团股份有限公司 | Touch screen and display device |
| US9823789B2 (en) | 2014-04-18 | 2017-11-21 | Boe Technology Group Co., Ltd. | Touch display panel and display device |
| CN103970392B (en) * | 2014-04-18 | 2019-10-01 | 京东方科技集团股份有限公司 | A kind of touch screen and display device |
| CN104062845A (en) * | 2014-05-23 | 2014-09-24 | 京东方科技集团股份有限公司 | Lower substrate, manufacturing method of lower substrate and liquid crystal lens |
| WO2015176436A1 (en) * | 2014-05-23 | 2015-11-26 | 京东方科技集团股份有限公司 | Lower substrate and manufacturing method thereof, and liquid crystal lens |
| CN105974654A (en) * | 2016-07-22 | 2016-09-28 | 京东方科技集团股份有限公司 | Preparation method of display substrate, display substrate and display device |
| US10274779B2 (en) | 2016-07-22 | 2019-04-30 | Boe Technology Group Co., Ltd. | Method for manufacturing display substrate, display substrate, and display device |
| CN107065314A (en) * | 2017-03-03 | 2017-08-18 | 京东方科技集团股份有限公司 | Spacer material and preparation method thereof, display panel |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102707356B (en) | 2014-05-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102707356B (en) | Method for manufacturing color filter, color filter and display device | |
| US8988642B2 (en) | Liquid crystal display devices and methods of manufacturing liquid crystal display devices | |
| CN106526990A (en) | Display panel, method for manufacturing same and display device | |
| CN103869526B (en) | Display substrate, manufacturing method thereof, display panel and display device | |
| CN203337948U (en) | Color-film substrate and display device | |
| CN206363059U (en) | Display panel and display device | |
| CN107193150B (en) | Color membrane substrates, display panel | |
| CN104749674A (en) | Light filter manufacturing method and exposure mask plate | |
| CN108873495A (en) | A kind of liquid crystal display substrate and preparation method thereof, liquid crystal display device | |
| CN106773263A (en) | Display panel and its manufacture method, display device | |
| CN109239984A (en) | A kind of liquid crystal display panel and liquid crystal display device | |
| CN104317094B (en) | Black matrix structure, mask plate, color membrane substrates and display device | |
| US9513413B2 (en) | Display device, color filter substrate and manufacturing method thereof | |
| CN104298009A (en) | Spacer, display panel, display device and manufacturing method of display panel | |
| JP2012234180A (en) | Color filter substrate, and manufacturing method and apparatus for the same | |
| TW594423B (en) | A color filter manufacturing method for a plastic substrate | |
| CN108663855A (en) | A kind of production method and display panel of display panel | |
| CN106501992A (en) | A kind of color membrane substrates and display floater | |
| CN104597647A (en) | Liquid crystal display panel and manufacturing method thereof | |
| CN110168436A (en) | Colored filter, display device and the method for preparing colored filter | |
| WO2014176904A1 (en) | Display device, color film substrate and manufacturing method thereof | |
| CN103412446B (en) | Base board, manufacturing method of base board and display device | |
| CN203204269U (en) | Filter and display device | |
| CN102654593B (en) | Color filter, display device and preparation method of color filter | |
| CN106773350A (en) | Liquid crystal display panel and method for manufacturing the same |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |