CN102645856A - Developer for direct plate-making by using 405nm laser - Google Patents
Developer for direct plate-making by using 405nm laser Download PDFInfo
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- CN102645856A CN102645856A CN2012101450641A CN201210145064A CN102645856A CN 102645856 A CN102645856 A CN 102645856A CN 2012101450641 A CN2012101450641 A CN 2012101450641A CN 201210145064 A CN201210145064 A CN 201210145064A CN 102645856 A CN102645856 A CN 102645856A
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Abstract
The invention belongs to the field of inorganic materials, relates to a developer for direct plate-making by using a 405nm laser and particularly discloses a developer for an ultraviolet-computer to plate (UV-CTP) plate with peak sensing wavelength being 405nm. The developer consists of the following components in parts by weight: 40-86 parts of deionized water, 5-18 parts of sodium hydroxide, 25-40 parts of silicate, 1-8 parts of buffering agent, 0.2-2 parts of photosensitive film protecting agent and 1-5 parts of development promoting agent. The developer provided by the invention has the advantages that the developer can rapidly dissolve exposed resin film layers and can well protect unexposed resin layers, the erosion of oxide layers of non-graphic and non-text parts is less, the press run is high, the reproducibility of small dots is good, the dots are fully reproduced and the developer is suitable for high-quality printing.
Description
Technical field
The invention belongs to field of inorganic materials, relating to the laser instrument is that scanning light source is directly made a plate and used developer, and being specifically related to a kind of wavelength photoreceptor peak value that is used for is that the UV-CTP version of 405nm is used developer.
Background technology
UV-CTP (UItraviolet-Computertoplate) technology is meant utilizes UV laser on the PS version, to carry out a kind of mode of CTP.Positive-type UV-CTP version is by photographic layer, and transition bed and support are formed, and photographic layer is that wavelength photoreceptor is the photodissociation type resin of 320-450nm; Its image-forming principle is to utilize the exposure of photodissociation type resin; After the exposure, the light accepting part branch dissolves in alkaline-based developer, and processing is removed through developing; Form image areas, hydrophilic.Light accepting part divides and in alkaline developer, not dissolve, and forms the non-graphic district, and is ink-receptive, thereby reaches ink-water balance and form printed matter.
What the photographic layer of UV-CTP version adopted is the photosensitive resin of high sense, and its sensitivity is 2-3 a times of conventional PS version, and the alkali resistance of high more its photosensitive resin of sensitivity of plate will be poor more usually.Little site with conventional developer solution processing UV-CTP version 1%, 2% can not obtain correct reduction.In addition; Its Grains of UV-CTP version that is used for the 405nm laser instrument is thin, coating thin; Therefore require developer to dissolve fast and unexposed resin bed is had good protective action, the oxide layer of non-graphic part is corroded few, preferably do not corrode the resin film layer that has made public.At present, the development of UV-CTP version is the used developer of PS version that follows conventional lines, and is difficult to reach above-mentioned requirements, is badly in need of the special-purpose developer of the new UV-CTP version of research and development and satisfies the printing market demand.
Summary of the invention
Use developer to the wavelength photoreceptor peak value for the 405nmUV-CTP version; The object of the invention is to research and develop this kind developer; It can be dissolved the resin film layer that has made public fast and unexposed resin bed is had good protective action; Oxide layer erosion to the non-graphic part is few, improves press quality.
Be to realize the object of the invention, 405nmUV-CTP version of the present invention is made up of following component with developer, and each component is in weight portion,
1, deionized water 40-86 part
2, NaOH 5-18 part
3, silicate 25-40 part
4, buffering agent 1-8 part
5, light-sensitive surface protective agent 0.2-2 part
6, imaging assistant 1-5 part
Described silicate is sodium silicate, one or both of potassium silicate.
Described buffering agent is one or more in phosphate, carbonate or the borate of potassium or sodium.Phosphate preferably phosphoric acid sodium, sodium phosphite, sodium metaphosphate, sodium dihydrogen phosphate, sodium hydrogen phosphate.One or both of the preferred sodium carbonate of carbonate, soda mint.The preferred sodium tetraborate of borate.
Described light-sensitive surface protective agent is dodecyl benzyl dimethyl ammonium chloride, DTAC, ethylene group two (dodecyl dimethyl ammonium bromide), wherein one or more of APES quaternary ammonium salt, two lauryl amine polyoxyethylene ether bi-quaternary ammonium salt, benzyltrimethylammonium chloride, benzyltrimethylammonium bromide, benzyl tributyl ammonium chloride.
Described imaging assistant is wherein a kind of of surfactant or polyvalent alcohol, ether compound or their potpourri.
Described surfactant is non-ionic surfactant, anionic surfactant, preferred alkyl glucosides, maleic acid di-sec-octyl sodium sulfonate.Described polyvalent alcohol be sorbierite, glycerine, monoethylene glycol, butylene glycol, Diethylene Glycol, neopentyl glycol wherein one or both.Described ether compound be diethylene glycol dimethyl ether, diethylene glycol ether, propylene glycol monomethyl ether, propylene-glycol ethyl ether, butyl glycol ether wherein one or both.
The preparation method:
Add deionized water in the agitated reactor, under agitation add NaOH, heated and stirred adds silicate; Then stir and be docile and obedient preface down at interval and add buffering agent, light-sensitive surface protective agent, imaging assistant, mix fully to material.
The present invention has added light-sensitive surface protective agent and auxiliary agent in prescription; Direct plate-making improves with developer formuia to the 405nmUV-CTP laser instrument, and it can dissolve fast the resin film layer that has made public and unexposed resin bed is had good protective action, and is few to the oxide layer erosion of non-graphic part; Press resistance rate is high; To the reproduction of little site well, dot reproduction is complete, is suitable for high-quality printing.
Embodiment
For the present invention is better explained, it is following to lift embodiment:
Instance 1
This routine developer composition is following, each ingredients weight parts meter,
The preparation method:
Remove 45 parts of ionized waters, under agitation add 10 parts in NaOH, as clear as crystal to liquid, when temperature rises to 65 ℃, under this temperature, add 25 parts of sodium silicate; Stirred 1 hour, when liquid as clear as crystal; Under agitation every interval was docile and obedient preface in 30 minutes and is added 1 part of sodium phosphate, 0.2 part of dodecyl dixylyl ammonium chloride, 0.1 part of maleic acid di-sec-octyl sodium sulfonate, 0.1 part of APG, 0.2 part of sorbierite, 0.05 part of diethylene glycol ether; Stir and mixed fully to material in 2 hours.
Instance two
Instance three
Instance four
Instance five
Instance six
Instance seven
Instance eight
During use with developer of the present invention and water with 1: 2 or ratio preparation in 1: 4, application result is following: the UV-CTP version that adopts Longma Aluminum group; Wavelength photoreceptor 405nm, sensitivity (mj/c m
2) 60; With the scanning of the thunder UV-4696 of section platemaking machine, laser power 50%; Imaging drum rotating speed 800.Development conditions: 25 ℃ of development temperatures, development time 30 seconds, magnitude of recruitment 60ml/mr, hairbrush rotating speed 80rpm records experimental data such as following table:
Adopt Switzerland's Lossen (Luscher Xpose) 230 platemaking machine, laser power 55%; Imaging drum rotating speed 680; Plate China light UV-P, magnificent rich UV-CTP, remittance reach HDP-UV, development conditions: 25 ℃ of development temperatures, development time 30 seconds; Hairbrush rotating speed 35rpm; Repeatedly print through certain printing company limited, use the forme of developer solution of the present invention can reach 8-12 ten thousand seals, use common developer solution to be 3-5 ten thousand seals.After using developer solution of the present invention higher press resistance rate is arranged.
Claims (5)
1. one kind is used for it is characterized in that with the direct developer of plate-making of 405nm laser instrument it is formulated by following component, and each component is in weight portion,
Described buffering agent is one or more in phosphate, carbonate or the borate of potassium or sodium; Described light-sensitive surface protective agent is dodecyl benzyl dimethyl ammonium chloride, DTAC, ethylene group two (dodecyl dimethyl ammonium bromide), wherein one or more of APES quaternary ammonium salt, two lauryl amine polyoxyethylene ether bi-quaternary ammonium salt, benzyltrimethylammonium chloride, benzyltrimethylammonium bromide, benzyl tributyl ammonium chloride; Described imaging assistant is wherein a kind of of non-ionic surfactant, anionic surfactant or polyvalent alcohol, ether compound or their potpourri.
2. the developer that is used for the direct plate-making of 405nm laser instrument as claimed in claim 1 is characterized in that described silicate is sodium silicate, one or both of potassium silicate.
3. the developer that is used for the direct plate-making of 405nm laser instrument as claimed in claim 1 is characterized in that described phosphate is sodium phosphate, sodium phosphite, sodium metaphosphate, sodium dihydrogen phosphate or sodium hydrogen phosphate; Carbonate is one or both of sodium carbonate, soda mint; Borate is a sodium tetraborate.
4. the developer that is used for the direct plate-making of 405nm laser instrument as claimed in claim 1 is characterized in that described surfactant is APG or maleic acid di-sec-octyl sodium sulfonate.
5. as claimed in claim 1 being used for is characterized in that with the direct developer of plate-making of 405nm laser instrument, described polyvalent alcohol be sorbierite, glycerine, monoethylene glycol, butylene glycol, Diethylene Glycol, neopentyl glycol wherein one or both; Described ether compound be diethylene glycol dimethyl ether, diethylene glycol ether, propylene glycol monomethyl ether, propylene-glycol ethyl ether, butyl glycol ether wherein one or both.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012101450641A CN102645856A (en) | 2012-05-11 | 2012-05-11 | Developer for direct plate-making by using 405nm laser |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012101450641A CN102645856A (en) | 2012-05-11 | 2012-05-11 | Developer for direct plate-making by using 405nm laser |
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| CN102645856A true CN102645856A (en) | 2012-08-22 |
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| CN2012101450641A Pending CN102645856A (en) | 2012-05-11 | 2012-05-11 | Developer for direct plate-making by using 405nm laser |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108303861A (en) * | 2017-12-29 | 2018-07-20 | 江苏乐彩印刷材料有限公司 | A kind of positive-type PS plate developer solution and preparation method thereof |
| CN108594605A (en) * | 2018-01-09 | 2018-09-28 | 东莞市耀辉化工科技有限公司 | A kind of environment-protecting clean developer solution of wiring board welding masking developing |
| US20220041518A1 (en) * | 2019-02-27 | 2022-02-10 | Zhan Yangdong | Nano modified silicate capillary crystalline material and use method thereof |
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| CN101149562A (en) * | 2006-09-22 | 2008-03-26 | 富士胶片株式会社 | Photosensitive composition, photosensitive film, permanent pattern forming method and printing circuit board |
| JP2008102486A (en) * | 2006-09-22 | 2008-05-01 | Fujifilm Corp | Photosensitive composition, photosensitive film, permanent pattern forming method and printed circuit board |
| CN101321727A (en) * | 2005-12-01 | 2008-12-10 | 西巴控股有限公司 | Oxime ester photoinitiators |
| CN101389476A (en) * | 2006-02-28 | 2009-03-18 | 爱克发印艺公司 | Method for making a lithographic printing plate |
| CN101443195A (en) * | 2006-05-12 | 2009-05-27 | 爱克发印艺公司 | Method for making a lithographic printing plate |
| CN102338986A (en) * | 2011-08-19 | 2012-02-01 | 中国科学院上海光学精密机械研究所 | Organic-inorganic composite laser thermal-etching film and micro-nano graph preparation method |
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2012
- 2012-05-11 CN CN2012101450641A patent/CN102645856A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101321727A (en) * | 2005-12-01 | 2008-12-10 | 西巴控股有限公司 | Oxime ester photoinitiators |
| CN101389476A (en) * | 2006-02-28 | 2009-03-18 | 爱克发印艺公司 | Method for making a lithographic printing plate |
| CN101443195A (en) * | 2006-05-12 | 2009-05-27 | 爱克发印艺公司 | Method for making a lithographic printing plate |
| CN101149562A (en) * | 2006-09-22 | 2008-03-26 | 富士胶片株式会社 | Photosensitive composition, photosensitive film, permanent pattern forming method and printing circuit board |
| JP2008102486A (en) * | 2006-09-22 | 2008-05-01 | Fujifilm Corp | Photosensitive composition, photosensitive film, permanent pattern forming method and printed circuit board |
| CN102338986A (en) * | 2011-08-19 | 2012-02-01 | 中国科学院上海光学精密机械研究所 | Organic-inorganic composite laser thermal-etching film and micro-nano graph preparation method |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108303861A (en) * | 2017-12-29 | 2018-07-20 | 江苏乐彩印刷材料有限公司 | A kind of positive-type PS plate developer solution and preparation method thereof |
| CN108594605A (en) * | 2018-01-09 | 2018-09-28 | 东莞市耀辉化工科技有限公司 | A kind of environment-protecting clean developer solution of wiring board welding masking developing |
| US20220041518A1 (en) * | 2019-02-27 | 2022-02-10 | Zhan Yangdong | Nano modified silicate capillary crystalline material and use method thereof |
| US11485688B2 (en) * | 2019-02-27 | 2022-11-01 | Yangdong ZHAN | Nano modified silicate capillary crystalline material and use method thereof |
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Application publication date: 20120822 |