CN102598423B - Processing method and equipment for chamfering press-connection regions of metal terminal - Google Patents
Processing method and equipment for chamfering press-connection regions of metal terminal Download PDFInfo
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- CN102598423B CN102598423B CN2010800135687A CN201080013568A CN102598423B CN 102598423 B CN102598423 B CN 102598423B CN 2010800135687 A CN2010800135687 A CN 2010800135687A CN 201080013568 A CN201080013568 A CN 201080013568A CN 102598423 B CN102598423 B CN 102598423B
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- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R43/00—Apparatus or processes specially adapted for manufacturing, assembling, maintaining, or repairing of line connectors or current collectors or for joining electric conductors
- H01R43/16—Apparatus or processes specially adapted for manufacturing, assembling, maintaining, or repairing of line connectors or current collectors or for joining electric conductors for manufacturing contact members, e.g. by punching and by bending
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Abstract
A processing method and an equipment for chamfering press-connection regions of a metal terminal are provided. The processing method includes transferring a metal terminal to an upper chamfering process position (301); performing the upper chamfering to the upper press-connection region of the metal terminal (302); transferring the metal terminal to a lower chamfering process position (303); and performing the lower chamfering to the lower press-connection region of the metal terminal (304). The processing method above can ensure that each round corner of the metal terminal appears smooth transition connection, so that the metal terminal is suitable for connecting with via holes of a PCB without piercing coatings of the PCB via holes, and the stability of the connection with the PCB is ensured.
Description
Technical field
The present invention relates to manufacture field, relate in particular to a kind of processing method and device of crimp region chamfering of metal terminal.
Background technology
A kind of crimp type metal terminal, to belong to the signal of crimping PCB type products or the Lead-through terminal of electricity, crimp type terminal and PCB hole are interference fit, matching part is exactly the crimp region of terminal, this crimp region is because matching with the pcb board circular hole, therefore the terminal surrounding will change into fillet by the wedge angle of contact area, when it is contacted with the pcb board aperture, can not puncture or stab the pcb board hole.At present, this chamfer angle technique is realized (as shown in Figure 1a) by metal stamping die.Scheme commonly used is that a special upper and lower chamfering station 101 is arranged on mould at present, its patrix chamfering workpiece 102, counterdie chamfering workpiece 103 on a station simultaneously to the metal terminal chamfering, patrix chamfering workpiece 102 chamfering thickness are less than or equal to metal terminal thickness half, and chamfering workpiece 103 thickness of counterdie are less than or equal to half metal terminal 104 thickness (as shown in Figure 1 b).But, when the thickness of metal terminal smaller, in the time of as 0.2mm, can cause occurring that chamfering is incomplete, not round and smooth connection transition (as shown in Fig. 1 c) between each chamfering, occur, not round connection transition (as shown in Fig. 1 d) even appears, have a strong impact on the chamfering effect, so that the shape of metal terminal and pcb board circular hole contact shape do not match, cause contact area little, contact unstablely, can not guarantee the stability electrically contacted.
Summary of the invention
The technical problem to be solved in the present invention is in prior art, owing to only adopting a station, use upper and lower chamfering workpiece simultaneously to the metal terminal chamfering, when the very thin thickness of metal terminal, can cause between each chamfering occurring not round and smooth connection transition, not round connection transition even appears, have a strong impact on the chamfering effect, therefore shape and the pcb board circular hole contact shape of metal terminal do not match, cause contact area little, contact unstable, can not guarantee contacted reliability, above-mentioned defect for prior art, a kind of processing method and device of crimp region chamfering of metal terminal are provided.
The technical solution adopted for the present invention to solve the technical problems is:
A kind of crimp region chamfer processing method of metal terminal, described crimp region is divided into crimp region, lower crimp region, described processing method comprises:
At upper chamfering station, use chamfering external member on first to carry out upper chamfering to the upper crimp region of described metal terminal, and
At lower chamfering station, use first time chamfering external member to carry out lower chamfering to the lower crimp region of described metal terminal, wherein, on described first, the chamfering external member comprises the first patrix chamfering workpiece and the first patrix counterpart, and described first time chamfering external member comprises the first counterdie chamfering workpiece and the first counterdie counterpart.
Preferably,
First carry out upper chamfering, after carry out lower chamfering; Or
First carry out lower chamfering, after carry out upper chamfering.
Preferably, described processing method also comprises:
Use upper and lower chamfering external member up and down simultaneously the chamfering station described metal terminal is carried out simultaneously on chamfering and lower chamfering, this upper and lower chamfering external member comprises chamfering external member on second, second time chamfering external member.
Preferably,
On described second, the chamfering external member comprises the second patrix chamfering workpiece, the second patrix counterpart;
Described second time chamfering external member comprises the second counterdie chamfering workpiece and the second counterdie counterpart;
Described processing method also comprises:
First on described the chamfering station carry out on chamfering, then at described lower chamfering station, carry out lower chamfering, finally up and down simultaneously the chamfering station carry out while chamfering up and down; Or
First on described the chamfering station carry out on chamfering, then up and down simultaneously the chamfering station carry out up and down chamfering simultaneously, last described lower chamfering station carries out lower chamfering; Or
First at described lower chamfering station, carry out lower chamfering, then on described the chamfering station carry out on chamfering, finally up and down simultaneously the chamfering station carry out up and down chamfering simultaneously; Or
First at described lower chamfering station, carry out lower chamfering, then up and down simultaneously the chamfering station carry out up and down chamfering simultaneously, finally on described the chamfering station carry out on chamfering; Or
First up and down simultaneously the chamfering station carry out up and down chamfering simultaneously, then at described lower chamfering station, carry out lower chamfering, finally on described the chamfering station carry out on chamfering; Or
First up and down simultaneously the chamfering station carry out up and down chamfering simultaneously, then on described the chamfering station carry out on chamfering, finally at described lower chamfering station, carry out lower chamfering.
Preferably,
The chamfered area height of described the first patrix chamfering workpiece is more than or equal to T/2, and is less than or equal to T;
The chamfered area height of described the first counterdie chamfering workpiece is more than or equal to T/2, and is less than or equal to T;
The chamfered area height of described the second patrix chamfering workpiece and described the second counterdie chamfering workpiece is less than or equal to T/2, and T is the thickness of metal terminal.
The present invention also provides a kind of device of realizing said method:
A kind of processing unit (plant) of crimp region chamfering of metal terminal, described crimp region comprises crimp region, lower crimp region, described processing unit (plant) comprises at least two chamfering stations, comprising the upper crimp region for to described metal terminal, carry out the upper chamfering station of upper chamfering and for the lower crimp region to described metal terminal, carry out the lower chamfering station of lower chamfering, for described metal terminal is sent to the delivery unit of another one station from a station;
Described upper chamfering station is provided with chamfering external member on first;
Described lower chamfering station is provided with the chamfering external member first time.
Preferably,
On described first, the chamfering external member comprises:
For described metal terminal being carried out to the first patrix chamfering workpiece of upper chamfering;
For coordinating described the first patrix chamfering workpiece described metal terminal to be carried out to the first patrix counterpart of upper chamfering;
Described first time chamfering external member comprises:
For described metal terminal being carried out to the first counterdie chamfering workpiece of lower chamfering;
For coordinating described the first counterdie chamfering workpiece described metal terminal to be carried out to the first counterdie counterpart of lower chamfering.
Preferably,
Described processing unit (plant) also comprises up and down chamfering station simultaneously, and the described chamfering station of while up and down is provided with the chamfering external member of while up and down of the crimp region of metal terminal being carried out to chamfering,
The described chamfering external member of while up and down comprises:
For to described metal terminal carry out upper chamfering second on the chamfering external member;
For described metal terminal being carried out to second time chamfering external member of lower chamfering, wherein,
On described second, the chamfering external member comprises:
For described metal terminal being carried out to the second patrix chamfering workpiece of upper chamfering;
For coordinating described the second patrix chamfering workpiece described metal terminal to be carried out to the second patrix counterpart of upper chamfering;
Described second time chamfering external member comprises:
For described metal terminal being carried out to the second counterdie chamfering workpiece of lower chamfering;
For coordinating described the second counterdie chamfering workpiece described metal terminal to be carried out to the second counterdie counterpart of lower chamfering.
Preferably,
Described upper chamfering station, lower chamfering station, up and down simultaneously the chamfering station put in order for:
Lower chamfering station, upper chamfering station, while chamfering station up and down; Or
Lower chamfering station, chamfering station simultaneously up and down, upper chamfering station; Or
Upper chamfering station, lower chamfering station, while chamfering station up and down; Or
Upper chamfering station, chamfering station simultaneously up and down, lower chamfering station; Or
Chamfering station simultaneously up and down, upper chamfering station, lower chamfering station; Or
Chamfering station simultaneously up and down, lower chamfering station, upper chamfering station.
Preferably,
The chamfered area height of described the first patrix chamfering workpiece is more than or equal to T/2, and is less than or equal to T;
The chamfered area height of described the first counterdie chamfering workpiece is more than or equal to T/2, and is less than or equal to T;
The chamfered area height of described the second patrix chamfering workpiece and the second counterdie chamfering workpiece all is less than or equal to T/2, and T is the thickness of metal terminal.
Implement technical scheme of the present invention, have following beneficial effect: the technical program is divided into the chamfering station, lower chamfering station, chamfering on upper chamfering station carries out the upper crimp region of this metal terminal, at lower chamfering station, the lower crimp region of this metal terminal is carried out to lower chamfering, each fillet that can effectively guarantee this metal terminal occurs that round and smooth transition connects, therefore with pcb board circular hole contact shape, conform to, contact area is large, contact stabilization, can not puncture the coating in pcb board hole, guarantee the stability of the contact of pcb board.
The accompanying drawing explanation
The invention will be further described below in conjunction with drawings and Examples, in accompanying drawing:
The invention will be further described below in conjunction with drawings and Examples;
Fig. 1 a is the flow process chart of prior art metal terminal, and Fig. 1 b is the work schematic diagram to the crimp region chamfering of metal terminal; Fig. 1 c and Fig. 1 d are the design sketch of prior art after chamfering;
Fig. 2 is the structural representation of processing unit (plant) of the crimp region chamfering of a kind of metal terminal of the present invention;
Fig. 3 is the flow chart of processing method of the crimp region chamfering of a kind of metal terminal of the present invention;
Fig. 4 is the structural representation of processing unit (plant) of crimp region chamfering of a kind of metal terminal of one embodiment of the invention;
Fig. 5 is the flow chart of processing method of crimp region chamfering of a kind of metal terminal of one embodiment of the invention;
Fig. 6 is the flow sheet of the metal terminal of the embodiment of the present invention 5;
Fig. 7 a is the effect schematic diagram that carries out metal terminal after lower rounding, and Fig. 7 b is the effect schematic diagram after metal terminal carries out lower chamfering, and Fig. 7 c is the effect schematic diagram after metal terminal carries out up and down chamfering simultaneously.
Embodiment
As shown in Figure 2, it is the structural representation of the crimp region chamfer processing method and device of a kind of metal terminal of the present invention, described crimp region is divided into crimp region, lower crimp region, described processing unit (plant) comprises at least two chamfering stations, comprising the crimp region for to described metal terminal, carry out the upper chamfering station 201 of upper chamfering and for the crimp region to described metal terminal, carry out the lower chamfering station 202 of lower chamfering, for described metal terminal is sent to the delivery unit (not shown) of another one station from a station; Described upper chamfering station 201 is provided with chamfering external member 2011 on first; Described lower chamfering station 202 is provided with chamfering external member 2,021 first time.
In metal terminal is carried out to the process of chamfering, delivery unit is sent to described upper chamfering station 201 by metal terminal, use the upper crimp region of 2011 pairs of these metal terminals of chamfering external member on described first to carry out chamfering, reach delivery unit metal terminal is sent to described lower chamfering station 202, use the lower crimp region of 2021 pairs of these metal terminals of described first time chamfering external member to carry out chamfering.
Fig. 3 is the flow chart of the crimp region chamfer processing method of a kind of metal terminal of the present invention, as shown in Figure 3, described crimp region is divided into crimp region, lower crimp region, in this metal terminal is carried out to the process of chamfering, in step 301, at first use the delivery unit (not shown) that metal terminal is sent to chamfering station 201 on this, in step 302, use the upper crimp region of 2011 pairs of these metal terminals of chamfering external member on first to carry out chamfering, then, in step 303, delivery unit will be sent to through the metal terminal of upper chamfering lower chamfering station 202, in step 304, the lower crimp region of 2021 pairs of these terminals of described first time chamfering external member is carried out chamfering.
In the present embodiment, can also first metal terminal be sent to lower chamfering station 202, the lower crimp region of 2021 pairs of these terminals of described first time chamfering external member is carried out chamfering, then metal terminal is sent to upper chamfering station 201, uses the upper crimp region of 2011 pairs of these metal terminals of chamfering external member on first to carry out chamfering.In the present embodiment, this metal terminal is carried out to the not strict restriction of sequencing of upper chamfering and lower chamfering, can first go up chamfering, more lower chamfering, or first carry out lower chamfering, after carry out upper chamfering.
As shown in Figure 4, the structural representation of the present invention with the crimp region chamfer processing method and device of a kind of metal terminal of embodiment, described crimp region is divided into crimp region, lower crimp region, wherein, described processing unit (plant) comprises three chamfering stations, be respectively: upper chamfering station 401, lower chamfering station 402, chamfering station 403 simultaneously up and down, wherein, described upper chamfering station 401 is provided with chamfering external member 4011 on first, described lower chamfering station 402 is provided with chamfering external member 4,021 first time, the described chamfering station of while up and down 403 is provided with up and down chamfering external member simultaneously, comprising chamfering external member 4031 and second time chamfering external member 4032 on second, this processing unit (plant) also comprises the delivery unit (not shown).
Particularly, chamfering external member 4011 comprises the first patrix chamfering workpiece 40111 and the first patrix counterpart on described first; Described first time chamfering external member 4021 comprises the first counterdie chamfering workpiece 40212 and the first counterdie counterpart 40211; On described second, chamfering external member 4031 comprises the second patrix chamfering workpiece 40312 and the second patrix chamfering counterpart 40311, and described second time chamfering external member 4032 comprises the second counterdie chamfering workpiece 40322 and the second counterdie chamfering counterpart 40321.
In the crimp region to this metal terminal, carry out in the process of chamfering, delivery unit is sent to upper chamfering station 401 by this metal terminal, use the upper crimp region of the first patrix chamfering workpiece 40112 and 40111 pairs of these metal terminals of the first patrix counterpart to carry out chamfering, then, delivery unit will be sent to through the metal terminal of upper chamfering lower chamfering station 402, use 40211 lower crimp region to this metal terminal of the first counterdie chamfering workpiece 40212 and the first counterdie counterpart to carry out lower chamfering, finally, delivery unit is sent to this up and down simultaneously in chamfering station 403 by this metal terminal, use simultaneously this second patrix chamfering external member 4031 and 4032 pairs of these metal terminals of the second counterdie chamfering external member to carry out chamfering, wherein this second patrix chamfering external member 4031 comprises the second patrix chamfering workpiece 40312 and the second patrix counterpart 40311, described the second counterdie chamfering external member 4032 comprises the second counterdie chamfering workpiece 40322 and the second counterdie counterpart 40321, particularly, use the upper crimp region of described the second patrix chamfering workpiece 40312 and 40311 pairs of these metal terminals of described the second patrix counterpart to carry out chamfering, and use simultaneously the lower crimp region of the second counterdie chamfering workpiece 40322 and 40321 pairs of these metal terminals of the second counterdie counterpart to carry out chamfering.
In the present embodiment, the putting in order as: upper chamfering station 401, lower chamfering station 402, chamfering station 403 simultaneously up and down of above-mentioned three chamfering stations;
Further, putting in order of above-mentioned three chamfering stations can also be:
Upper chamfering station 401, chamfering station 403 simultaneously up and down, lower chamfering station 402; Or lower chamfering station 402, upper chamfering station 401, while chamfering station 403 up and down; Or lower chamfering station 402, chamfering station 403 simultaneously up and down, upper chamfering station 401; Or chamfering station 403 simultaneously up and down, upper chamfering station 401, lower chamfering station 402; Or chamfering station 403 simultaneously up and down, lower chamfering station 402, upper chamfering station 402.
Fig. 5 is the flow chart of crimp region chamfer processing method of a kind of metal terminal of one embodiment of the invention, and described crimp region is divided into crimp region, lower crimp region.
In the present embodiment, institute's method is being carried out respectively on above-mentioned three chamfering stations, the order of described three stations is upper chamfering station 200, lower chamfering station 100, chamfering station 300 simultaneously up and down, as shown in Figure 6, in the production process of metal terminal, wherein label 1,2 and 3 means the chamfering station of the crimp region of this metal terminal, in the present embodiment, 1,2 and 3 be expressed as respectively lower chamfering station 100, upper chamfering station 200, while chamfering station 300 up and down.
In chamfer process, in step 501, delivery unit (not shown) metal terminal is sent in lower chamfering station 100, then in step 502, use the lower crimp region of described the first counterdie chamfering counterpart 40211 and 40212 pairs of these metal terminals of the first counterdie chamfering workpiece to carry out lower chamfering, as shown in Figure 7a, effect schematic diagram for metal terminal after carrying out lower chamfering at lower chamfering station 501, wherein, the chamfered area height of described the first counterdie chamfering workpiece 40211 is more than or equal to T/2, and being less than or equal to T, T is the thickness of metal terminal.
In step 503, the delivery unit (not shown) will be sent to through the metal terminal of lower chamfering upper chamfering station 200, in step 502, use the upper crimp region of the first patrix counterpart 40111 and 40112 pairs of these metals of the first patrix chamfering workpiece to carry out upper chamfering, as shown in Figure 7b, effect schematic diagram for the metal terminal after carrying out lower chamfering at upper chamfering station 501, wherein, the chamfered area height of described the first patrix chamfering workpiece 40112 is more than or equal to T/2, and being less than or equal to T, T is the thickness of metal terminal.
Then forward step 505 to, the delivery unit (not shown) is sent to up and down chamfering station 300 simultaneously by this metal terminal, in step 506, use simultaneously the second patrix chamfering counterpart 40311 and the second patrix chamfering workpiece 40312, and use simultaneously the second counterdie chamfering workpiece 40322 and 40321 pairs of these metal terminals of the second counterdie counterpart to carry out upper and lower chamfering, wherein, the upper crimp region of the second patrix chamfering workpiece 40311 and 40312 pairs of these metal terminals of the second patrix chamfering workpiece is carried out chamfering, the lower crimp region of the second counterdie chamfering workpiece 40322 and 40321 pairs of these metal terminals of the second counterdie chamfering counterpart is carried out chamfering, as shown in Figure 7 c, for the metal terminal effect schematic diagram after chamfering station 503 carries out upper and lower chamfering simultaneously up and down, wherein, the chamfered area height of described the second patrix chamfering workpiece 40311 and described the second patrix chamfering workpiece 40312 all is less than or equal to T/2, owing to having increased up and down chamfering station simultaneously, therefore can further carry out chamfering to this metal terminal, strengthened the effect of this metal terminal chamfering, make round-corner transition round and smooth.
In the present embodiment, the order of chamfering can also be:
First metal terminal is carried out to upper chamfering, then carry out up and down chamfering simultaneously, finally carry out lower chamfering; Perhaps, first metal terminal is carried out to lower chamfering, then carry out upper chamfering, finally carry out up and down chamfering simultaneously; Or be at first metal terminal first to be carried out to lower chamfering, then carry out up and down chamfering simultaneously, finally carry out upper chamfering; Perhaps at first metal terminal is carried out up and down to chamfering simultaneously, then carry out upper chamfering, finally carry out lower chamfering; Perhaps first metal terminal is carried out up and down to chamfering simultaneously, then carry out lower chamfering, finally carry out upper chamfering.It should be noted that no matter first carry out that in chamfering process in three, can guarantee the crimp region of metal terminal is carried out to intactly chamfering, and the fillet rounding off of metal terminal.
Wherein, Fig. 6 is total flow chart of realizing the present embodiment method, number in the figure 1,2 and 3 can be expressed as the chamfering station, lower chamfering station reaches up and down chamfering station simultaneously, and metal terminal, in transport process, can carry out the crimp region chamfering of above-mentioned station to metal terminal, owing to carrying out respectively upper chamfering, lower chamfering, reach up and down chamfering simultaneously, can guarantee like this rounding off of fillet.
The technical program is divided into the chamfering station, lower chamfering station, chamfering on upper chamfering station carries out the upper crimp region of this metal terminal, at lower chamfering station, the lower crimp region of this metal terminal is carried out to lower chamfering, can guarantee effectively that each fillet of this metal terminal occurs that round and smooth transition connects, so conform to pcb board circular hole contact shape, contact area is large, contact stabilization, can not puncture the coating in pcb board hole, guarantees the stability of the contact of pcb board.
Claims (8)
1. the crimp region chamfer processing method of a metal terminal, described crimp region is divided into crimp region, and lower crimp region, is characterized in that, and described processing method comprises:
At upper chamfering station, use chamfering external member on first to carry out upper chamfering to the upper crimp region of described metal terminal, and
At lower chamfering station, use first time chamfering external member to carry out lower chamfering to the lower crimp region of described metal terminal, wherein,
On described first, the chamfering external member comprises the first patrix chamfering workpiece and the first patrix counterpart, and described first time chamfering external member comprises the first counterdie chamfering workpiece and the first counterdie counterpart,
At chamfering station simultaneously up and down, use upper and lower chamfering external member to carry out simultaneously upper chamfering and lower chamfering to described metal terminal, this upper and lower chamfering external member comprises chamfering external member on second, second time chamfering external member.
2. method according to claim 1, is characterized in that,
First carry out upper chamfering, after carry out lower chamfering; Or
First carry out lower chamfering, after carry out upper chamfering.
3. method according to claim 1, is characterized in that, comprising:
On described second, the chamfering external member comprises the second patrix chamfering workpiece and the second patrix counterpart;
Described second time chamfering external member comprises the second counterdie chamfering workpiece and the second counterdie counterpart;
Described processing method also comprises:
First on described the chamfering station carry out on chamfering, then at described lower chamfering station, carry out lower chamfering, finally up and down simultaneously the chamfering station carry out while chamfering up and down; Or
First on described the chamfering station carry out on chamfering, then up and down simultaneously the chamfering station carry out up and down chamfering simultaneously, finally at described lower chamfering station, carry out lower chamfering; Or
First at described lower chamfering station, carry out lower chamfering, then on described the chamfering station carry out on chamfering, finally up and down simultaneously the chamfering station carry out up and down chamfering simultaneously; Or
First at described lower chamfering station, carry out lower chamfering, then up and down simultaneously the chamfering station carry out up and down chamfering simultaneously, finally on described the chamfering station carry out on chamfering; Or
First up and down simultaneously the chamfering station carry out up and down chamfering simultaneously, then at described lower chamfering station, carry out lower chamfering, finally on described the chamfering station carry out on chamfering; Or
First up and down simultaneously the chamfering station carry out up and down chamfering simultaneously, then on described the chamfering station carry out on chamfering, finally at described lower chamfering station, carry out lower chamfering.
4. processing method according to claim 3, is characterized in that, comprising:
The chamfered area height of described the first patrix chamfering workpiece is more than or equal to T/2, and is less than or equal to T; And
The chamfered area height of described the first counterdie chamfering workpiece is more than or equal to T/2, and is less than or equal to T; And
The chamfered area height of described the second patrix chamfering workpiece and described the second counterdie chamfering workpiece all is less than or equal to T/2, and T is the thickness of metal terminal.
5. the processing unit (plant) of the crimp region chamfering of a metal terminal, described crimp region comprises crimp region, lower crimp region, it is characterized in that, described processing unit (plant) comprises at least two chamfering stations, comprising the upper crimp region for to described metal terminal, carry out the upper chamfering station of upper chamfering and for the lower crimp region to described metal terminal, carry out the lower chamfering station of lower chamfering, for described metal terminal is sent to the delivery unit of another one station from a station;
Described upper chamfering station is provided with chamfering external member on first;
Described lower chamfering station is provided with the chamfering external member first time;
Described processing unit (plant) also comprises up and down chamfering station simultaneously, and the described chamfering station of while up and down is provided with the chamfering external member of while up and down of the crimp region of metal terminal being carried out to chamfering,
The described chamfering external member of while up and down comprises:
For to described metal terminal carry out upper chamfering second on the chamfering external member;
For described metal terminal being carried out to second time chamfering external member of lower chamfering, wherein,
On described second, the chamfering external member comprises:
For described metal terminal being carried out to the second patrix chamfering workpiece of upper chamfering;
For coordinating described the second patrix chamfering workpiece described metal terminal to be carried out to the second patrix counterpart of upper chamfering;
Described second time chamfering external member comprises:
For described metal terminal being carried out to the second counterdie chamfering workpiece of lower chamfering;
For coordinating described the second counterdie chamfering workpiece described metal terminal to be carried out to the second counterdie counterpart of lower chamfering.
6. processing unit (plant) according to claim 5, is characterized in that, comprising:
On described first, the chamfering external member comprises:
For described metal terminal being carried out to the first patrix chamfering workpiece of upper chamfering;
For coordinating described the first patrix chamfering workpiece described metal terminal to be carried out to the first patrix counterpart of upper chamfering;
Described first time chamfering external member comprises:
For described metal terminal being carried out to the first counterdie chamfering workpiece of lower chamfering;
For coordinating described the first counterdie chamfering workpiece described metal terminal to be carried out to the first counterdie counterpart of lower chamfering.
7. processing unit (plant) according to claim 6, is characterized in that, described upper chamfering station, lower chamfering station, up and down simultaneously the chamfering station put in order for:
Lower chamfering station, upper chamfering station, while chamfering station up and down; Or
Lower chamfering station, chamfering station simultaneously up and down, upper chamfering station; Or
Upper chamfering station, lower chamfering station, while chamfering station up and down; Or
Upper chamfering station, chamfering station simultaneously up and down, lower chamfering station; Or
Chamfering station simultaneously up and down, upper chamfering station, lower chamfering station; Or
Chamfering station simultaneously up and down, lower chamfering station, upper chamfering station.
8. processing unit (plant) according to claim 7, is characterized in that,
The chamfered area height of described the first patrix chamfering workpiece is more than or equal to T/2, and is less than or equal to T; And
The chamfered area height of described the first counterdie chamfering workpiece is more than or equal to T/2, and is less than or equal to T: and
The chamfered area height of described the second patrix chamfering workpiece and the second counterdie chamfering workpiece all is less than or equal to T/2, and wherein T is the thickness of metal terminal.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/CN2010/078207 WO2012055109A1 (en) | 2010-10-28 | 2010-10-28 | Processing method and equipment for chamfering press-connection regions of metal terminal |
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| Publication Number | Publication Date |
|---|---|
| CN102598423A CN102598423A (en) | 2012-07-18 |
| CN102598423B true CN102598423B (en) | 2013-11-27 |
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| CN2010800135687A Active CN102598423B (en) | 2010-10-28 | 2010-10-28 | Processing method and equipment for chamfering press-connection regions of metal terminal |
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| CN (1) | CN102598423B (en) |
| WO (1) | WO2012055109A1 (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103317348B (en) * | 2013-06-29 | 2016-01-20 | 四川瑞宝电子有限责任公司 | Terminal flake shape molding technique |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002361669A (en) * | 2001-06-12 | 2002-12-18 | Sunstar Group Engineering Inc | Press molding method for three-dimensional shaped product |
| JP2006019143A (en) * | 2004-07-01 | 2006-01-19 | Tps:Kk | Punching type contactor having round face at edge of pressure contact bump, and its manufacturing method |
| CN201868721U (en) * | 2010-10-28 | 2011-06-15 | 深圳盛凌电子股份有限公司 | Device for processing chamfer angle at crimping area of metal terminal |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0437860A (en) * | 1990-06-04 | 1992-02-07 | Konica Corp | Electrophotographic sensitive body |
| JP3019769B2 (en) * | 1996-02-29 | 2000-03-13 | 住友電装株式会社 | Terminal fitting for soldering and fixing |
-
2010
- 2010-10-28 CN CN2010800135687A patent/CN102598423B/en active Active
- 2010-10-28 WO PCT/CN2010/078207 patent/WO2012055109A1/en active Application Filing
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002361669A (en) * | 2001-06-12 | 2002-12-18 | Sunstar Group Engineering Inc | Press molding method for three-dimensional shaped product |
| JP2006019143A (en) * | 2004-07-01 | 2006-01-19 | Tps:Kk | Punching type contactor having round face at edge of pressure contact bump, and its manufacturing method |
| CN201868721U (en) * | 2010-10-28 | 2011-06-15 | 深圳盛凌电子股份有限公司 | Device for processing chamfer angle at crimping area of metal terminal |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2012055109A1 (en) | 2012-05-03 |
| CN102598423A (en) | 2012-07-18 |
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Address after: 518107 Guangdong Province, Shenzhen City Guangming high tech Zone East Road on the East Road No. eighteen South Sheng Ling Industrial Park Applicant after: Shenzhen Shinning Electronic Co., Ltd. Address before: 518108 Guangdong province Shenzhen Guangming New District Office of Gongming jade root road and Nanming Road Interchange Huahong ICT Industrial Park Building Applicant before: Shenzhen Shinning Electronic Co., Ltd. |
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