CN102593309A - Chip type light-emitting device and packaging structure thereof - Google Patents

Chip type light-emitting device and packaging structure thereof Download PDF

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Publication number
CN102593309A
CN102593309A CN2011100047269A CN201110004726A CN102593309A CN 102593309 A CN102593309 A CN 102593309A CN 2011100047269 A CN2011100047269 A CN 2011100047269A CN 201110004726 A CN201110004726 A CN 201110004726A CN 102593309 A CN102593309 A CN 102593309A
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emitting device
type light
chip type
wavelength conversion
layer
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刘文煌
邓仲哲
张源孝
高弘任
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SemiLEDs Optoelectronics Co Ltd
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SemiLEDs Optoelectronics Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/85909Post-treatment of the connector or wire bonding area
    • H01L2224/8592Applying permanent coating, e.g. protective coating

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Abstract

The invention relates to a chip type light-emitting device and a packaging structure thereof. The chip-type light emitting device includes: one or more light emitting semiconductors; and one or more frames disposed over the top of the light emitting semiconductor. By utilizing the technical scheme provided by the invention, the manufacturing yield can be improved and the manufacturing cost can be reduced.

Description

芯片式发光装置及其封装结构Chip-type light-emitting device and its packaging structure

技术领域 technical field

本发明是关于一种发光装置,尤其是关于一种具有精密涂布的波长转换层的芯片式发光装置(chip-type light emitting device)及其封装结构。The present invention relates to a light emitting device, in particular to a chip-type light emitting device (chip-type light emitting device) with a precisely coated wavelength conversion layer and its packaging structure.

背景技术 Background technique

在已知发光二极管的结构中,为了转换发射光的波长,往往会在发光二极管上涂布荧光层,故此荧光层亦称为波长转换层。然而,由于荧光层的涂布量难以被精密控制,所以经常会导致荧光层的厚度过薄或者过厚,并因此造成发光二极管的制造成品率降低以及制造成本的浪费。因此,为了提升制造成品率并且降低制造成本,亟需一种具有精密涂布的波长转换层的发光装置。In the structure of known light-emitting diodes, in order to convert the wavelength of emitted light, a fluorescent layer is often coated on the light-emitting diodes, so the fluorescent layer is also called a wavelength conversion layer. However, since the coating amount of the fluorescent layer is difficult to be precisely controlled, the thickness of the fluorescent layer is often too thin or too thick, which reduces the manufacturing yield of the light emitting diode and wastes the manufacturing cost. Therefore, in order to improve the manufacturing yield and reduce the manufacturing cost, there is an urgent need for a light emitting device with a precisely coated wavelength conversion layer.

发明内容 Contents of the invention

依照本发明的一实施样态,提供一种芯片式发光装置,包括:一个或多个发光半导体;以及一个或多个框架,配置在该发光半导体的顶部上方。According to an embodiment of the present invention, a chip-type light emitting device is provided, comprising: one or more light emitting semiconductors; and one or more frames disposed above the top of the light emitting semiconductors.

依照本发明的另一实施样态,提供一种上述芯片式发光装置的封装结构,包括:一导线架;一附接层,设置在该导线架上;一衬底,设置在该附接层上;上述芯片式发光装置,耦合至该衬底;以及一个或多个焊垫,设置在该芯片式发光装置上。According to another embodiment of the present invention, there is provided a packaging structure of the above-mentioned chip-type light-emitting device, including: a lead frame; an attachment layer disposed on the lead frame; a substrate disposed on the attachment layer above; the above-mentioned chip-type light-emitting device, coupled to the substrate; and one or more pads, disposed on the chip-type light-emitting device.

利用本发明提供的技术方案,能够提升制造成品率并且降低制造成本。By using the technical solution provided by the invention, the manufacturing yield can be improved and the manufacturing cost can be reduced.

附图说明 Description of drawings

图1显示依照本发明的一实施例的芯片式发光装置的概略剖面图;FIG. 1 shows a schematic cross-sectional view of a chip-type light emitting device according to an embodiment of the present invention;

图2显示依照本发明的一实施例的芯片式发光装置的概略剖面图;FIG. 2 shows a schematic cross-sectional view of a chip-type light emitting device according to an embodiment of the present invention;

图3显示依照本发明的一实施例的芯片式发光装置的概略剖面图;3 shows a schematic cross-sectional view of a chip-type light emitting device according to an embodiment of the present invention;

图4显示依照本发明的一实施例的芯片式发光装置的概略剖面图;FIG. 4 shows a schematic cross-sectional view of a chip-type light emitting device according to an embodiment of the present invention;

图5显示依照本发明的一实施例的芯片式发光装置的概略剖面图;5 shows a schematic cross-sectional view of a chip-type light emitting device according to an embodiment of the present invention;

图6显示依照本发明的一实施例的芯片式发光装置的概略剖面图;6 shows a schematic cross-sectional view of a chip-type light emitting device according to an embodiment of the present invention;

图7显示依照本发明的一实施例的芯片式发光装置的概略剖面图;7 shows a schematic cross-sectional view of a chip-type light emitting device according to an embodiment of the present invention;

图8显示依照本发明的一实施例的芯片式发光装置的概略剖面图;FIG. 8 shows a schematic cross-sectional view of a chip-type light emitting device according to an embodiment of the present invention;

图9显示依照本发明的一实施例的芯片式发光装置的概略剖面图;FIG. 9 shows a schematic cross-sectional view of a chip-type light emitting device according to an embodiment of the present invention;

图10显示依照本发明的一实施例的芯片式发光装置的概略剖面图;FIG. 10 shows a schematic cross-sectional view of a chip-type light emitting device according to an embodiment of the present invention;

图11显示依照本发明的一实施例的芯片式发光装置的封装结构的概略剖面图;及11 shows a schematic cross-sectional view of a package structure of a chip-type light emitting device according to an embodiment of the present invention; and

图12为已知封装结构与本发明的封装结构的相关色温(CCT)分布比较图表。FIG. 12 is a chart comparing correlated color temperature (CCT) distributions of a known package structure and the package structure of the present invention.

附图标号Reference number

100芯片式发光装置100-chip light emitting device

101波长转换层101 wavelength conversion layer

102框架102 frames

103发光半导体103 light-emitting semiconductor

104导线104 wire

105焊垫105 pads

106衬底106 substrates

200芯片式发光装置200 chip type light emitting device

201波长转换层201 wavelength conversion layer

202框架202 frame

203发光半导体203 light-emitting semiconductor

204导线204 wire

205焊垫205 solder pads

206衬底206 substrate

300芯片式发光装置300 chip light emitting device

301波长转换层301 wavelength conversion layer

302框架302 frame

303发光半导体303 light emitting semiconductor

303an型半导体层303an type semiconductor layer

303b活化层303b activation layer

303cp型半导体层303cp type semiconductor layer

304a第一导线304a first wire

304b第二导线304b second wire

305a第一焊垫305a first welding pad

305b第二焊垫305b second welding pad

306衬底306 substrate

307反射层307 reflective layer

400芯片式发光装置400 chip type light emitting device

401波长转换层401 wavelength conversion layer

402框架402 frame

403发光半导体403 light-emitting semiconductor

403an型半导体层403an type semiconductor layer

403b活化层403b activation layer

403cp型半导体层403cp type semiconductor layer

404a第一焊垫404a first welding pad

404b第二焊垫404b second welding pad

405a第一接点405a first contact

405b第二接点405b second contact

406衬底406 substrate

407反射层407 reflective layer

408导电区域408 conductive area

500芯片式发光装置500 chip type light emitting device

501波长转换层501 wavelength conversion layer

502框架502 frame

503发光半导体503 light-emitting semiconductor

504导线504 wire

505焊垫505 welding pad

506衬底506 substrate

508粗糙化(图案化)表面508 roughened (patterned) surface

1100芯片式发光装置1100 chip type light emitting device

1101波长转换层1101 wavelength conversion layer

1102框架1102 frame

1103发光半导体1103 light-emitting semiconductor

1104导线1104 wire

1105焊垫1105 welding pad

1106衬底1106 substrate

1200芯片式发光装置1200 chip type light emitting device

1201a第一波长转换层1201a first wavelength conversion layer

1201b第二波长转换层1201b second wavelength conversion layer

1202a第一框架1202a First frame

1202b第二框架1202b Second frame

1203发光半导体1203 light emitting semiconductor

1204导线1204 wire

1205焊垫1205 welding pad

1206衬底1206 substrate

1300芯片式发光装置1300 chip type light emitting device

1301a第一波长转换层1301a first wavelength conversion layer

1301b第二波长转换层1301b second wavelength conversion layer

1302框架1302 frame

1303发光半导体1303 light-emitting semiconductor

1304导线1304 wire

1305焊垫1305 welding pad

1306衬底1306 substrate

1400芯片式发光装置1400 chip type light emitting device

1401a第一波长转换层1401a first wavelength conversion layer

1401b第二波长转换层1401b second wavelength conversion layer

1402框架1402 frame

1403发光半导体1403 light-emitting semiconductor

1404导线1404 wire

1405焊垫1405 welding pad

1406衬底1406 substrate

1500芯片式发光装置1500 chip light emitting devices

1501a第一波长转换层1501a first wavelength conversion layer

1501b第二波长转换层1501b second wavelength conversion layer

1502a第一框架1502a First Frame

1502b第二框架1502b second frame

1503a第一发光半导体1503a The first light-emitting semiconductor

1503b第二发光半导体1503b second light emitting semiconductor

1504a第一导线1504a first wire

1504b第二导线1504b Second wire

1505a第一焊垫1505a first pad

1505b第二焊垫1505b second pad

1506衬底1506 substrate

2100封装结构2100 package structure

2101波长转换层2101 wavelength conversion layer

2102框架2102 frame

2103发光半导体2103 Light emitting semiconductors

2104导线2104 wire

2105焊垫2105 welding pad

2106衬底2106 substrate

2110透明包覆层2110 transparent coating

2120附接层2120 Attachment layer

2130导线架2130 lead frame

具体实施方式 Detailed ways

本发明的其他实施样态以及优点可从以下与用以例示本发明原理范例的随附附图相结合的详细说明而更显明白。Other embodiments and advantages of the present invention will be more apparent from the following detailed description combined with the accompanying drawings to illustrate examples of the principles of the present invention.

图1显示依照本发明的一实施例的芯片式发光装置100的概略剖面图。图1的发光装置100为垂直式发光元件。如图1所示,发光装置100包括:发光半导体103;框架102,配置在发光半导体103的顶部上方;波长转换层101,施加在通过框架102所局限的发光半导体103。发光装置100被耦合至衬底106。然而,亦可在将于其上配置有框架102的发光半导体103先耦合至衬底106之后,再将波长转换层101施加在通过框架102所局限的发光半导体103,以下各实施例亦可具有此种特征。衬底106可为例如金属、陶瓷、或半导体的不透光衬底。在发光半导体103上设置焊垫105,并且使焊垫105与导线104连接。FIG. 1 shows a schematic cross-sectional view of a chip-type light emitting device 100 according to an embodiment of the present invention. The light emitting device 100 in FIG. 1 is a vertical light emitting element. As shown in FIG. 1 , the light emitting device 100 comprises: a light emitting semiconductor 103 ; a frame 102 disposed on top of the light emitting semiconductor 103 ; a wavelength conversion layer 101 applied on the light emitting semiconductor 103 confined by the frame 102 . Light emitting device 100 is coupled to substrate 106 . However, the wavelength conversion layer 101 can also be applied to the light-emitting semiconductor 103 confined by the frame 102 after the light-emitting semiconductor 103 on which the frame 102 is disposed is coupled to the substrate 106. The following embodiments can also have Such characteristics. The substrate 106 may be an opaque substrate such as metal, ceramic, or semiconductor. Pads 105 are provided on the light emitting semiconductor 103 , and the pads 105 are connected to the wires 104 .

可对波长转换层101进行热处理,而热处理的温度可介于约60℃与约300℃之间。波长转换层101是通过下列至少其中一种方法来施加:精密配送法、精密压印法、精密喷注法、以及网印法。波长转换层101可包括与一或多种有机化学品(例如硅酮树脂及/或环氧树脂)混合的荧光体颗粒。此外,在混合荧光体颗粒与有机化学品时,可加入例如甲苯、庚烷、正己烷、异丙醇等等的稀释剂。或者,波长转换层101可包括与玻璃混合的荧光体颗粒。此外,例如,荧光体颗粒比上有机化学品(或玻璃)的重量比为约

Figure BDA0000043461850000061
即,以重量计,荧光体颗粒的量∶
Figure BDA0000043461850000062
上述与玻璃混合的波长转换层是在具有约100℃至约500℃的范围的温度下被施加。波长转换层可具有例如但不限于凸面、凹面、平面、或角锥的形状,图1所示的波长转换层101即具有凸面形状。波长转换层101可具有约1微米至约200微米的厚度,较佳为约10微米至约100微米。发光装置100能够发射具有约200nm至约500nm的峰值波长范围的光。框架102是由一透明材料所制成,例如环氧树脂、硅酮树脂、聚酰亚胺树脂、玻璃、石英、压克力(acryl)树脂(例如聚甲基丙烯酸甲酯(PMMA,polymethylmethacrylate)等等)、聚碳酸酯(PC)树脂、SU-8光阻、BCB光阻、或聚对二甲苯(parylene)树脂。或者,框架102亦可为单一金属层或多重金属层。框架102可通过下列至少其中一种方法来配置:旋转涂布、浸渍涂布、化学气相沉积、热蒸发、以及电子束蒸发。框架102可具有约0.1微米至约200微米的厚度,较佳为约2微米至约100微米。此外,可将一光扩散层(未显示)配置在波长转换层101上。Heat treatment may be performed on the wavelength conversion layer 101, and the temperature of the heat treatment may be between about 60°C and about 300°C. The wavelength converting layer 101 is applied by at least one of the following methods: precision dispensing, precision embossing, precision jetting, and screen printing. The wavelength converting layer 101 may include phosphor particles mixed with one or more organic chemicals such as silicone resin and/or epoxy resin. In addition, when mixing phosphor particles and organic chemicals, diluents such as toluene, heptane, n-hexane, isopropanol, etc. may be added. Alternatively, the wavelength conversion layer 101 may include phosphor particles mixed with glass. In addition, for example, the weight ratio of phosphor particles to organic chemicals (or glass) is about
Figure BDA0000043461850000061
That is, the amount of phosphor particles by weight:
Figure BDA0000043461850000062
The aforementioned wavelength converting layer mixed with glass is applied at a temperature having a range from about 100°C to about 500°C. The wavelength conversion layer may have a shape such as but not limited to a convex surface, a concave surface, a plane, or a pyramid. The wavelength conversion layer 101 shown in FIG. 1 has a convex shape. The wavelength conversion layer 101 may have a thickness of about 1 micron to about 200 microns, preferably about 10 microns to about 100 microns. The light emitting device 100 is capable of emitting light having a peak wavelength range of about 200 nm to about 500 nm. The frame 102 is made of a transparent material, such as epoxy resin, silicone resin, polyimide resin, glass, quartz, acryl (acryl) resin (such as polymethylmethacrylate (PMMA, polymethylmethacrylate) etc.), polycarbonate (PC) resin, SU-8 photoresist, BCB photoresist, or parylene resin. Alternatively, the frame 102 can also be a single metal layer or multiple metal layers. The frame 102 can be configured by at least one of the following methods: spin coating, dip coating, chemical vapor deposition, thermal evaporation, and electron beam evaporation. The frame 102 may have a thickness of about 0.1 microns to about 200 microns, preferably about 2 microns to about 100 microns. In addition, a light diffusion layer (not shown) can be disposed on the wavelength conversion layer 101 .

如附图所示,在本发明的各种实施例中,框架除了可配置在发光半导体的顶部上方以外,更可延伸涵盖发光半导体的侧边部位。当框架延伸涵盖发光半导体的侧边部位时,波长转换层可或可不覆盖发光半导体的侧边部位,例如,在图1中,波长转换层是不覆盖发光半导体的侧边部位;而在图3-图5中,波长转换层是覆盖发光半导体的侧边部位。As shown in the drawings, in various embodiments of the present invention, the frame can not only be disposed on the top of the light emitting semiconductor, but also extend to cover the side portion of the light emitting semiconductor. When the frame extends to cover the side portions of the light emitting semiconductor, the wavelength conversion layer may or may not cover the side portions of the light emitting semiconductor, for example, in FIG. 1 , the wavelength conversion layer does not cover the side portions of the light emitting semiconductor; and in FIG. 3 - In Fig. 5, the wavelength converting layer covers the side portions of the light-emitting semiconductor.

图2显示依照本发明的一实施例的芯片式发光装置200的概略剖面图。图2的发光装置200亦是垂直式发光元件。如图2所示,发光装置200包括发光半导体203、框架202、以及波长转换层201。与波长转换层201相邻接的发光半导体203的表面可被粗糙化,以增加出光效率。发光装置200被耦合至衬底206,在发光半导体203上设置焊垫205,并且使焊垫205与导线204连接。在本发明的实施例中,焊垫可设置在框架之内的发光半导体上(例如图1所示),或设置在框架之外的发光半导体上(例如图2所示)。FIG. 2 shows a schematic cross-sectional view of a chip-type light emitting device 200 according to an embodiment of the present invention. The light emitting device 200 in FIG. 2 is also a vertical light emitting device. As shown in FIG. 2 , the light emitting device 200 includes a light emitting semiconductor 203 , a frame 202 , and a wavelength conversion layer 201 . The surface of the light emitting semiconductor 203 adjacent to the wavelength conversion layer 201 can be roughened to increase light extraction efficiency. The light emitting device 200 is coupled to a substrate 206 , a pad 205 is provided on the light emitting semiconductor 203 , and the pad 205 is connected to a wire 204 . In an embodiment of the present invention, the pads can be disposed on the light emitting semiconductor inside the frame (such as shown in FIG. 1 ), or on the light emitting semiconductor outside the frame (such as shown in FIG. 2 ).

在本发明的实施例中,亦可通过下列顺序来设置发光装置:先在发光半导体的顶部上方形成框架,然后将发光半导体耦合至衬底,接着将导线连接至发光半导体,最后再施加波长转换层。或者,亦可通过下列顺序来设置发光装置:先在发光半导体的顶部上方形成框架,然后将发光半导体耦合至衬底,接着施加波长转换层,最后再将导线连接至发光半导体。In an embodiment of the present invention, the light-emitting device can also be provided by the following sequence: first forming a frame over the top of the light-emitting semiconductor, then coupling the light-emitting semiconductor to the substrate, then connecting wires to the light-emitting semiconductor, and finally applying wavelength conversion layer. Alternatively, the light-emitting device can also be provided by first forming a frame over the top of the light-emitting semiconductor, then coupling the light-emitting semiconductor to the substrate, then applying a wavelength conversion layer, and finally connecting wires to the light-emitting semiconductor.

图3显示依照本发明的一实施例的芯片式发光装置300的概略剖面图。图3的发光装置300亦是水平式发光元件。如图3所示,发光装置300包括发光半导体303、框架302、以及波长转换层301。发光装置300被耦合至衬底306。在发光装置300的发光半导体303上设置第一焊垫305a(其是设置在n型半导体层303a上)以及第二焊垫305b(其是设置在p型半导体层303c上);并且分别使第一焊垫305a以及第二焊垫305b与第一导线304a以及第二导线304b连接。发光半导体303可包括:p型半导体层303c,与衬底306相邻接;活化层303b,配置在p型半导体层303c上;以及n型半导体层303a,配置在活化层303b上并且与波长转换层301相邻接。此外,可将反射层307配置在发光半导体303的底部上,即,配置在衬底306与发光装置300之间,具体而言,反射层307是位于衬底306与p型半导体层303c之间。反射层307亦适用于本发明的其他实施例。在本发明的其他实施例中的发光半导体亦可具有与图3所示的发光半导体303相同或相似的结构。FIG. 3 shows a schematic cross-sectional view of a chip-type light emitting device 300 according to an embodiment of the present invention. The light emitting device 300 in FIG. 3 is also a horizontal light emitting device. As shown in FIG. 3 , the light emitting device 300 includes a light emitting semiconductor 303 , a frame 302 , and a wavelength conversion layer 301 . Light emitting device 300 is coupled to substrate 306 . On the light emitting semiconductor 303 of the light emitting device 300, a first pad 305a (which is provided on the n-type semiconductor layer 303a) and a second pad 305b (which is provided on the p-type semiconductor layer 303c); A pad 305a and a second pad 305b are connected to the first wire 304a and the second wire 304b. The light emitting semiconductor 303 may include: a p-type semiconductor layer 303c adjacent to the substrate 306; an active layer 303b disposed on the p-type semiconductor layer 303c; and an n-type semiconductor layer 303a disposed on the active layer 303b and converting Layers 301 are contiguous. In addition, the reflective layer 307 can be disposed on the bottom of the light emitting semiconductor 303, that is, disposed between the substrate 306 and the light emitting device 300, specifically, the reflective layer 307 is located between the substrate 306 and the p-type semiconductor layer 303c . The reflective layer 307 is also applicable to other embodiments of the present invention. The light emitting semiconductor in other embodiments of the present invention may also have the same or similar structure as the light emitting semiconductor 303 shown in FIG. 3 .

图4显示依照本发明的一实施例的芯片式发光装置400的概略剖面图。图4的发光装置400为覆晶式发光元件。如图4所示,发光装置400包括发光半导体403、框架402、以及波长转换层401。发光半导体403包括p型半导体层403c、活化层403b、以及n型半导体层403a。在发光半导体403的底部(p型半导体层403c)上设置反射层407。将第一焊垫404a设置在反射层407上,以及将第二焊垫404b设置在n型半导体层403a上。发光装置400被耦合至衬底406,于其中,第一焊垫404a以及第二焊垫404b分别通过第一接点405a以及第二接点405b,而连接至位于衬底406上的导电区域408。在本实施例中,亦可通过下列顺序来设置发光装置:先将发光半导体倒装在衬底上,然后在发光半导体的顶部上方形成框架,最后再施加波长转换层。FIG. 4 shows a schematic cross-sectional view of a chip-type light emitting device 400 according to an embodiment of the present invention. The light emitting device 400 in FIG. 4 is a flip-chip light emitting device. As shown in FIG. 4 , the light emitting device 400 includes a light emitting semiconductor 403 , a frame 402 , and a wavelength conversion layer 401 . The light emitting semiconductor 403 includes a p-type semiconductor layer 403c, an activation layer 403b, and an n-type semiconductor layer 403a. A reflective layer 407 is provided on the bottom of the light emitting semiconductor 403 (p-type semiconductor layer 403c). The first pad 404a is provided on the reflective layer 407, and the second pad 404b is provided on the n-type semiconductor layer 403a. The light emitting device 400 is coupled to the substrate 406, wherein the first bonding pad 404a and the second bonding pad 404b are respectively connected to the conductive region 408 on the substrate 406 through the first contact 405a and the second contact 405b. In this embodiment, the light-emitting device can also be provided in the following order: first flip-chip the light-emitting semiconductor on the substrate, then form a frame on top of the light-emitting semiconductor, and finally apply a wavelength conversion layer.

图5显示依照本发明的一实施例的芯片式发光装置500的概略剖面图。图5的实施例是相似于图1的实施例,其差异在于:图5的波长转换层501是覆盖发光半导体503的侧边部位(当框架502延伸涵盖发光半导体503的侧边部位时),以及发光半导体503的表面被粗糙化而形成粗糙化(图案化)表面508。发光装置500被耦合至衬底506。在发光半导体503上设置焊垫505,并且使焊垫505与导线504连接。FIG. 5 shows a schematic cross-sectional view of a chip-type light emitting device 500 according to an embodiment of the present invention. The embodiment of FIG. 5 is similar to the embodiment of FIG. 1, the difference is that the wavelength conversion layer 501 of FIG. 5 covers the side portion of the light emitting semiconductor 503 (when the frame 502 extends to cover the side portion of the light emitting semiconductor 503), And the surface of the light emitting semiconductor 503 is roughened to form a roughened (patterned) surface 508 . Light emitting device 500 is coupled to substrate 506 . Pads 505 are provided on the light emitting semiconductor 503 , and the pads 505 are connected to the wires 504 .

图6显示依照本发明的一实施例的芯片式发光装置1100的概略剖面图。如图6所示,发光装置1100包括发光半导体1103、框架1102、以及波长转换层1101,其中波长转换层1101具有凹面的形状。发光装置1100被耦合至衬底1106。在发光半导体1103上设置焊垫1105,并且使焊垫1105与导线1104连接。FIG. 6 shows a schematic cross-sectional view of a chip-type light emitting device 1100 according to an embodiment of the present invention. As shown in FIG. 6 , the light emitting device 1100 includes a light emitting semiconductor 1103 , a frame 1102 , and a wavelength conversion layer 1101 , wherein the wavelength conversion layer 1101 has a concave shape. Light emitting device 1100 is coupled to substrate 1106 . Pads 1105 are provided on the light emitting semiconductor 1103 , and the pads 1105 are connected to wires 1104 .

图7显示依照本发明的一实施例的芯片式发光装置1200的概略剖面图。如图7所示,发光装置1200包括发光半导体1203、第一框架1202a、第二框架1202b、第一波长转换层1201a、以及第二波长转换层1201b。第一框架1202a被第二框架1202b所包围,在通过第一框架1202a所局限的发光半导体1203的区域上施加第一波长转换层1201a,而在通过第二框架1202b所局限的发光半导体1203的区域上施加第二波长转换层1201b,因此,位于第二框架1202b内的第二波长转换层1201b可覆盖位于第一框架1202a内的第一波长转换层1201a,即可形成多层(重叠)波长转换层。发光装置1200被耦合至衬底1206。在发光半导体1203上设置焊垫1205,并且使焊垫1205与导线1204连接。FIG. 7 shows a schematic cross-sectional view of a chip-type light emitting device 1200 according to an embodiment of the present invention. As shown in FIG. 7, the light emitting device 1200 includes a light emitting semiconductor 1203, a first frame 1202a, a second frame 1202b, a first wavelength conversion layer 1201a, and a second wavelength conversion layer 1201b. The first frame 1202a is surrounded by the second frame 1202b, the first wavelength conversion layer 1201a is applied on the area of the light emitting semiconductor 1203 bounded by the first frame 1202a, and the first wavelength converting layer 1201a is applied on the area of the light emitting semiconductor 1203 bounded by the second frame 1202b Therefore, the second wavelength conversion layer 1201b located in the second frame 1202b can cover the first wavelength conversion layer 1201a located in the first frame 1202a, thus forming a multi-layer (overlapped) wavelength conversion layer 1201b. layer. Light emitting device 1200 is coupled to substrate 1206 . Pads 1205 are provided on the light emitting semiconductor 1203 , and the pads 1205 are connected to wires 1204 .

图8显示依照本发明的一实施例的芯片式发光装置1300的概略剖面图。如图8所示,发光装置1300包括发光半导体1303、框架1302、第一波长转换层1301a、以及第二波长转换层1301b。图8的实施例是类似于图7的实施例,但图8的第一波长转换层1301a与第二波长转换层1301b是施加在同一框架(即,框架1302)内。第二波长转换层1301b是覆盖在第一波长转换层1301a上,即可形成多层(重叠)波长转换层。发光装置1300被耦合至衬底1306。在发光半导体1303上设置焊垫1305,并且使焊垫1305与导线1304连接。FIG. 8 shows a schematic cross-sectional view of a chip-type light emitting device 1300 according to an embodiment of the present invention. As shown in FIG. 8, the light emitting device 1300 includes a light emitting semiconductor 1303, a frame 1302, a first wavelength conversion layer 1301a, and a second wavelength conversion layer 1301b. The embodiment of FIG. 8 is similar to the embodiment of FIG. 7, but the first wavelength conversion layer 1301a and the second wavelength conversion layer 1301b of FIG. 8 are applied in the same frame (ie, frame 1302). The second wavelength conversion layer 1301b covers the first wavelength conversion layer 1301a, that is, multiple (overlapping) wavelength conversion layers can be formed. Light emitting device 1300 is coupled to substrate 1306 . Pads 1305 are provided on the light emitting semiconductor 1303 , and the pads 1305 are connected to wires 1304 .

图9显示依照本发明的一实施例的芯片式发光装置1400的概略剖面图。如图9所示,发光装置1400包括发光半导体1403、框架1402、第一波长转换层1401a、以及第二波长转换层1401b。配置在发光半导体1403的顶部上方的框架1402可将发光半导体1403分隔成两个区域,并且分别在此两区域内施加第一波长转换层1401a、第二波长转换层1401b,而在发光半导体1403上形成多层(并列)波长转换层。发光装置1400被耦合至衬底1406。在发光半导体1403上设置焊垫1405,并且使焊垫1405与导线1404连接。此外,在本发明的实施例中,波长转换层能够覆盖框架的一部分,而不溢出框架所局限的范围,例如,在图9中,第一波长转换层1401a可覆盖位于附图右侧的框架1402的一部分而不溢出框架1402。FIG. 9 shows a schematic cross-sectional view of a chip-type light emitting device 1400 according to an embodiment of the present invention. As shown in FIG. 9, the light emitting device 1400 includes a light emitting semiconductor 1403, a frame 1402, a first wavelength conversion layer 1401a, and a second wavelength conversion layer 1401b. The frame 1402 disposed on the top of the light emitting semiconductor 1403 can divide the light emitting semiconductor 1403 into two regions, and apply the first wavelength conversion layer 1401a and the second wavelength conversion layer 1401b in the two regions respectively, and on the light emitting semiconductor 1403 Multiple (parallel) wavelength conversion layers are formed. Light emitting device 1400 is coupled to substrate 1406 . Pads 1405 are provided on the light emitting semiconductor 1403 , and the pads 1405 are connected to wires 1404 . In addition, in the embodiment of the present invention, the wavelength conversion layer can cover a part of the frame without overflowing the limited range of the frame. For example, in FIG. 9, the first wavelength conversion layer 1401a can cover the frame located on the right side of the drawing 1402 without overflowing the frame 1402.

图10显示依照本发明的一实施例的芯片式发光装置1500的概略剖面图。如图10所示,发光装置1500包括:第一发光半导体1503a;第二发光半导体1503b;第一框架1502a,配置在第一发光半导体1503a的顶部上方;第二框架1502b,配置在第二发光半导体1503b的顶部上方;第一波长转换层1501a,施加在通过第一框架1502a所局限的第一发光半导体1503a上;以及第二波长转换层1501b,施加在通过第二框架1502b所局限的第二发光半导体1503b上。第一发光半导体1503a以及第二发光半导体1503b分别被耦合至衬底1506。第一焊垫1505a被设置在第一发光半导体1503a上;而第二焊垫1505b被设置在第二发光半导体1503b上。分别使第一焊垫1505a以及第二焊垫1505b与第一导线1504a以及第二导线1504b连接。在图10的实施例中,第一波长转换层1501a以及第二波长转换层1501b分别被施加至第一框架1502a以及第二框架1502b内,然而,亦可将图9的实施例应用在图10的实施例上,具体而言,可在图10的第一发光半导体1503a以及第二发光半导体1503b的上方分别设置图9的框架,而分别在第一发光半导体1503a以及第二发光半导体1503b上形成多层(并列)波长转换层;或者,可将图7或图8的实施例应用在图10的实施例上,而分别在第一发光半导体1503a以及第二发光半导体1503b上形成多层(重叠)波长转换层。然而,图10的实施例亦可包括图6所示的凹面波长转换层。又,可通过第一导线1504a以及第二导线1504b,将不同或相同的电流分别通入第一发光半导体1503a以及第二发光半导体1503b。FIG. 10 shows a schematic cross-sectional view of a chip-type light emitting device 1500 according to an embodiment of the present invention. As shown in FIG. 10 , the light emitting device 1500 includes: a first light emitting semiconductor 1503a; a second light emitting semiconductor 1503b; a first frame 1502a disposed above the top of the first light emitting semiconductor 1503a; a second frame 1502b disposed on the second light emitting semiconductor 1503b; a first wavelength conversion layer 1501a applied on the first light emitting semiconductor 1503a confined by the first frame 1502a; and a second wavelength conversion layer 1501b applied on the second light emitting semiconductor 1503a confined by the second frame 1502b on the semiconductor 1503b. The first light emitting semiconductor 1503a and the second light emitting semiconductor 1503b are respectively coupled to the substrate 1506 . The first bonding pad 1505a is disposed on the first light emitting semiconductor 1503a; and the second bonding pad 1505b is disposed on the second light emitting semiconductor 1503b. Connect the first pad 1505a and the second pad 1505b to the first wire 1504a and the second wire 1504b respectively. In the embodiment of FIG. 10, the first wavelength conversion layer 1501a and the second wavelength conversion layer 1501b are respectively applied to the first frame 1502a and the second frame 1502b, however, the embodiment of FIG. 9 can also be applied to FIG. 10 In the embodiment of FIG. 9 , specifically, the frames in FIG. 9 can be respectively set above the first light-emitting semiconductor 1503a and the second light-emitting semiconductor 1503b in FIG. Multiple (parallel) wavelength conversion layers; Alternatively, the embodiment of FIG. 7 or FIG. 8 can be applied to the embodiment of FIG. ) wavelength conversion layer. However, the embodiment of FIG. 10 may also include the concave wavelength conversion layer shown in FIG. 6 . In addition, different or the same currents can be passed through the first light-emitting semiconductor 1503a and the second light-emitting semiconductor 1503b through the first wire 1504a and the second wire 1504b respectively.

图11显示依照本发明的一实施例的芯片式发光装置的封装结构2100的概略剖面图。如图11所示,封装结构2100包括:导线架2130;附接层2120,设置在导线架2130上;衬底2106,设置在附接层2120上;芯片式发光装置,耦合至衬底2106;以及导线2104,用以使此芯片式发光装置与导线架2130电性连接。如上所述,此芯片式发光装置可包括发光半导体2103、框架2102、以及波长转换层2101。与波长转换层2101相邻接的发光半导体2103的表面可被粗糙化。在此芯片式发光装置的发光半导体2103上设置焊垫2105,并且将焊垫2105与导线2104连接,而使此芯片式发光装置与导线架2130电性连接。虽然在附图中仅显示一条导线,但可视实际情况而使用一或多条导线。可设置一透明包覆层2110,其用以覆盖波长转换层2101并且包覆此芯片式发光装置,俾能使波长转换层2101以及此芯片式发光装置不受到外界环境的影响。透明包覆层2110是由下列至少其中一种透明材料所制成:环氧树脂、硅酮树脂、聚酰亚胺树脂、玻璃、石英、压克力树脂(例如PMMA等等)、聚碳酸酯树脂、以及聚对二甲苯树脂。透明包覆层2110可具有凸面、凹面、平面、或角锥的形状。或者,透明包覆层2110可具有菲涅耳透镜(Fresnel lens)的特征。此外,可将一光扩散层(未显示)配置在透明包覆层2110上。FIG. 11 shows a schematic cross-sectional view of a package structure 2100 of a chip-type light emitting device according to an embodiment of the present invention. As shown in FIG. 11 , the package structure 2100 includes: a lead frame 2130; an attachment layer 2120 disposed on the lead frame 2130; a substrate 2106 disposed on the attachment layer 2120; a chip-type light emitting device coupled to the substrate 2106; And the wire 2104 is used to electrically connect the chip-type light emitting device with the lead frame 2130 . As mentioned above, this chip-type light emitting device may include a light emitting semiconductor 2103 , a frame 2102 , and a wavelength conversion layer 2101 . The surface of the light emitting semiconductor 2103 adjacent to the wavelength conversion layer 2101 may be roughened. A pad 2105 is provided on the light-emitting semiconductor 2103 of the chip-type light-emitting device, and the pad 2105 is connected to the wire 2104 , so that the chip-type light-emitting device is electrically connected to the lead frame 2130 . Although only one wire is shown in the drawings, one or more wires may be used depending on the actual situation. A transparent coating layer 2110 may be provided to cover the wavelength conversion layer 2101 and wrap the chip-type light emitting device, so that the wavelength conversion layer 2101 and the chip-type light-emitting device are not affected by the external environment. The transparent covering layer 2110 is made of at least one of the following transparent materials: epoxy resin, silicone resin, polyimide resin, glass, quartz, acrylic resin (such as PMMA, etc.), polycarbonate resin, and parylene resin. The transparent covering layer 2110 may have a shape of a convex surface, a concave surface, a plane, or a pyramid. Alternatively, the transparent cladding layer 2110 may feature a Fresnel lens. In addition, a light diffusion layer (not shown) can be disposed on the transparent coating layer 2110 .

在本发明的实施例中,第一波长转换层与第二波长转换层可为相同或不同的波长转换层。In an embodiment of the present invention, the first wavelength conversion layer and the second wavelength conversion layer may be the same or different wavelength conversion layers.

图12为已知封装结构与本发明的封装结构的相关色温(CCT,correlated colortemperature)分布比较图表。在图12中,是以图11的封装结构来与已知标准封装结构、已知均匀涂布封装结构作比较。如图12所示,可清楚观察到,相较于已知标准封装结构以及已知均匀涂布封装结构,本发明的封装结构可具有较佳的CCT分布均匀性。FIG. 12 is a comparison chart of correlated color temperature (CCT, correlated color temperature) distribution between a known package structure and the package structure of the present invention. In FIG. 12 , the package structure shown in FIG. 11 is compared with a known standard package structure and a known uniform coating package structure. As shown in FIG. 12 , it can be clearly observed that the packaging structure of the present invention has better CCT distribution uniformity than the known standard packaging structure and the known uniform coating packaging structure.

本发明所揭露的框架可作为在填入荧光体混合液时的溢流坝,以使荧光体混合液在填入后可被框架所局限,而不会溢流到其他不期望填入荧光体混合液的区域,并且通过框架内的荧光体转换出光后,可获得白光发光的效果、促进相关色温(CCT)的分布均匀性、提升相关色温的产生成品率、以及减少荧光体颗粒的使用量。The frame disclosed in the present invention can be used as an overflow dam when the phosphor mixture is filled, so that the phosphor mixture can be confined by the frame after filling, and will not overflow to other unwanted phosphors The area of the mixed liquid, and after the light is converted by the phosphor in the frame, the effect of white light can be obtained, the distribution uniformity of the correlated color temperature (CCT) can be promoted, the yield of the correlated color temperature can be improved, and the usage of phosphor particles can be reduced. .

虽然本发明已参考较佳实施例及附图详加说明,但本领域的技术人员可了解在不离开本发明的精神与范畴的情况下,可进行各种修改、变化以及等效替代,然而这些修改、变化以及等效替代仍落入本发明的权利要求的范围内。Although the present invention has been described in detail with reference to preferred embodiments and accompanying drawings, those skilled in the art can understand that various modifications, changes and equivalent substitutions can be made without departing from the spirit and scope of the present invention. These modifications, changes and equivalent substitutions still fall within the scope of the claims of the present invention.

Claims (42)

1. a chip type light-emitting device is characterized in that, said chip type light-emitting device comprises:
One or more emitting semiconductors; And
One or more frameworks are configured in the over top of said emitting semiconductor.
2. chip type light-emitting device as claimed in claim 1 is characterized in that, said chip type light-emitting device more comprises:
The one layer or more wavelength conversion layer is applied on the said emitting semiconductor that limits to through said one or more framework.
3. chip type light-emitting device as claimed in claim 1 is characterized in that, said framework can extend the side position of containing said emitting semiconductor.
4. chip type light-emitting device as claimed in claim 2 is characterized in that, said framework can extend the side position of containing said emitting semiconductor.
5. chip type light-emitting device as claimed in claim 4 is characterized in that, said wavelength conversion layer can cover the side position of said emitting semiconductor.
6. chip type light-emitting device as claimed in claim 2 is characterized in that, said chip type light-emitting device can be launched has the light of about 200nm to the peak wavelength scope of about 500nm.
7. chip type light-emitting device as claimed in claim 2 is characterized in that, said wavelength conversion layer is to apply through following one of them kind method: accurate dispensing method, accurate stamped method, accurate insufflation and wire mark method.
8. chip type light-emitting device as claimed in claim 2 is characterized in that said wavelength conversion layer comprises the phosphor particle that mixes with one or more organic chemicals.
9. chip type light-emitting device as claimed in claim 8; Its characteristic, said phosphor particle is about
Figure FDA0000043461840000011
than the weight ratio of the above organic chemicals
10. chip type light-emitting device as claimed in claim 8 is characterized in that, said organic chemicals is silicone resin and/or epoxy resin.
11. chip type light-emitting device as claimed in claim 2 is characterized in that said wavelength conversion layer comprises the phosphor particle that mixes with glass.
12. chip type light-emitting device as claimed in claim 11; It is characterized in that said phosphor particle is about
Figure FDA0000043461840000012
than the above weight of glass ratio
13. chip type light-emitting device as claimed in claim 11 is characterized in that, the said wavelength conversion layer that mixes with glass is to apply through following one of them kind method: accurate dispensing method, accurate stamped method, accurate insufflation and wire mark method.
14. chip type light-emitting device as claimed in claim 13 is characterized in that, the said wavelength conversion layer that mixes with glass is under the temperature with about 100 ℃ of extremely about 500 ℃ scopes, to be applied in.
15. chip type light-emitting device as claimed in claim 2 is characterized in that said wavelength conversion layer has the shape of convex surface, concave surface, plane or pyramid.
16. chip type light-emitting device as claimed in claim 1 is characterized in that, said framework is made by a transparent material.
17. chip type light-emitting device as claimed in claim 16; It is characterized in that said transparent material is epoxy resin, silicone resin, polyimide resin, glass, quartz, acryl resin, polycarbonate resin, SU-8 photoresistance, BCB photoresistance or Parylene resin.
18. chip type light-emitting device as claimed in claim 1 is characterized in that, said framework is to dispose through following one of them kind method: rotary coating, dip coated, chemical vapour deposition (CVD), thermal evaporation and electron beam evaporation.
19. chip type light-emitting device as claimed in claim 1 is characterized in that, said framework is single metal level or multi-metal layer.
20. chip type light-emitting device as claimed in claim 1 is characterized in that, said framework have about 0.1 micron to about 200 microns thickness.
21. chip type light-emitting device as claimed in claim 2 is characterized in that, said wavelength conversion layer have about 1 micron to about 200 microns thickness.
22. chip type light-emitting device as claimed in claim 2 is characterized in that, said chip type light-emitting device more comprises:
One light diffusion layer is configured on the said wavelength conversion layer.
23. chip type light-emitting device as claimed in claim 2 is characterized in that, with the surface of the adjacent said emitting semiconductor of said wavelength conversion layer by roughening.
24. chip type light-emitting device as claimed in claim 2 is characterized in that, said wavelength conversion layer is heat-treated.
25. chip type light-emitting device as claimed in claim 24 is characterized in that, said heat treated temperature is between about 60 ℃ and about 300 ℃.
26. chip type light-emitting device as claimed in claim 1 is characterized in that, said emitting semiconductor comprises:
One p type semiconductor layer;
One active layer is configured on the said p type semiconductor layer; And
One n type semiconductor layer is configured on the said active layer.
27. chip type light-emitting device as claimed in claim 2 is characterized in that said wavelength conversion layer can cover the part of said framework.
28. chip type light-emitting device as claimed in claim 1 is characterized in that, said chip type light-emitting device more comprises:
One reflector is configured on the bottom of said emitting semiconductor.
29. the encapsulating structure of a chip type light-emitting device is characterized in that, the encapsulating structure of said chip type light-emitting device comprises:
One lead frame;
One attachment layer is arranged on the said lead frame;
One substrate is arranged on the said attachment layer;
Chip type light-emitting device as claimed in claim 1 is coupled to said substrate; And
One or more weld pads are arranged on the said chip type light-emitting device.
30. the encapsulating structure of chip type light-emitting device as claimed in claim 29 is characterized in that, the encapsulating structure of said chip type light-emitting device more comprises:
The one layer or more wavelength conversion layer is applied on the said emitting semiconductor that said one or more framework limited to through said chip type light-emitting device.
31. the encapsulating structure of chip type light-emitting device as claimed in claim 29 is characterized in that, the encapsulating structure of said chip type light-emitting device more comprises:
One or many leads, be connected with said weld pad, and said chip type light-emitting device and said lead frame are electrically connected.
32. the encapsulating structure of chip type light-emitting device as claimed in claim 31 is characterized in that, the encapsulating structure of said chip type light-emitting device more comprises:
The one layer or more wavelength conversion layer is applied on the said emitting semiconductor that said one or more framework limited to through said chip type light-emitting device.
33. the encapsulating structure of chip type light-emitting device as claimed in claim 32 is characterized in that, the encapsulating structure of said chip type light-emitting device more comprises:
One transparent coating layer is in order to cover said wavelength conversion layer and to coat said chip type light-emitting device.
34. the encapsulating structure of chip type light-emitting device as claimed in claim 33; It is characterized in that said transparent coating layer is made by following one of them kind transparent material: epoxy resin, silicone resin, polyimide resin, glass, quartz, acryl resin, polycarbonate resin and Parylene resin.
35. the encapsulating structure of chip type light-emitting device as claimed in claim 33 is characterized in that, said transparent coating layer has the shape of convex surface, concave surface, plane or pyramid.
36. the encapsulating structure of chip type light-emitting device as claimed in claim 33 is characterized in that, said transparent coating layer has the characteristic of Fresnel lens.
37. the encapsulating structure of chip type light-emitting device as claimed in claim 33 is characterized in that, the encapsulating structure of said chip type light-emitting device more comprises:
One light diffusion layer is configured on the said transparent coating layer.
38. the encapsulating structure of chip type light-emitting device as claimed in claim 29 is characterized in that, said substrate is light tight.
39. the encapsulating structure of chip type light-emitting device as claimed in claim 38 is characterized in that, said substrate is metal, pottery or semiconductor.
40. the encapsulating structure of chip type light-emitting device as claimed in claim 39 is characterized in that, the encapsulating structure of said chip type light-emitting device more comprises:
One reflector is between said substrate and said chip type light-emitting device.
41. the encapsulating structure of chip type light-emitting device as claimed in claim 30 is characterized in that, the encapsulating structure of said chip type light-emitting device more comprises:
One light diffusion layer is configured on the said wavelength conversion layer.
42. the encapsulating structure of chip type light-emitting device as claimed in claim 32 is characterized in that, the encapsulating structure of said chip type light-emitting device more comprises:
One light diffusion layer is configured on the said wavelength conversion layer.
CN2011100047269A 2011-01-11 2011-01-11 Chip type light-emitting device and packaging structure thereof Pending CN102593309A (en)

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US20090014736A1 (en) * 2007-07-11 2009-01-15 Cree, Inc. Coating method utilizing phosphor containment structure and devices fabricated using same
US20090321758A1 (en) * 2008-06-25 2009-12-31 Wen-Huang Liu Led with improved external light extraction efficiency
CN101684933A (en) * 2008-09-28 2010-03-31 红蝶科技(深圳)有限公司 Encapsulation structure and encapsulation method of white light-emitting diode
CN201536114U (en) * 2009-10-27 2010-07-28 东莞市精航科技有限公司 Packaging structure of light emitting diode
US20100265737A1 (en) * 2009-04-17 2010-10-21 Samsung Electronics Co., Ltd. Light guiding plates and light emitting devices including the same

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101145594A (en) * 2006-09-12 2008-03-19 丰田合成株式会社 Light emitting device and manufacturing method thereof
US20090014736A1 (en) * 2007-07-11 2009-01-15 Cree, Inc. Coating method utilizing phosphor containment structure and devices fabricated using same
US20090321758A1 (en) * 2008-06-25 2009-12-31 Wen-Huang Liu Led with improved external light extraction efficiency
CN101684933A (en) * 2008-09-28 2010-03-31 红蝶科技(深圳)有限公司 Encapsulation structure and encapsulation method of white light-emitting diode
US20100265737A1 (en) * 2009-04-17 2010-10-21 Samsung Electronics Co., Ltd. Light guiding plates and light emitting devices including the same
CN201536114U (en) * 2009-10-27 2010-07-28 东莞市精航科技有限公司 Packaging structure of light emitting diode

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Application publication date: 20120718