CN102591153B - Light-sensitive resin as well as preparation method and application thereof - Google Patents
Light-sensitive resin as well as preparation method and application thereof Download PDFInfo
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- CN102591153B CN102591153B CN201210039600XA CN201210039600A CN102591153B CN 102591153 B CN102591153 B CN 102591153B CN 201210039600X A CN201210039600X A CN 201210039600XA CN 201210039600 A CN201210039600 A CN 201210039600A CN 102591153 B CN102591153 B CN 102591153B
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Abstract
The invention discloses a light-sensitive resin as well as a preparation method and an application of the light-sensitive resin. The light-sensitive resin comprises the following components: an alkaline soluble resin, a photo-polymerization monomer, a pigment, a photo-polymerization initiator, an additive, an antioxidant and a solvent. According to the invention, the technical problem in the preparation of the light-sensitive resin in the prior art is solved, and the light-sensitive resin which realizes developing property with low exposure, has the characteristics of excellent heat resistance and chemical property resistance, uniform thickness, low surface roughness and high adhesiveness, and is favorable for contrast, is provided; and the light-sensitive resin is in particular suitable for the preparation of a colorful filter and has important application value.
Description
Technical field
The present invention relates to a kind of photoresist and preparation method thereof and application.
Background technology
Colored filter is used for the optical filtering film of liquid crystal display device, camera etc., and color has redness, green, blueness.This kind of coloring film made by methods such as decoration method, print process, electrochemical plating, Pigments methods usually.Current this method is applied in the middle of the LCD manufactures such as mobile phone, notebook computer, display, TV.
For colouring method, after forming and there is chromatic figure with the natural photoresists such as gel, modified polyvinyl alcohol, denaturing acrylamide resin etc. in advance in glass, utilize direct pigment dyeing and form film.But, while on same substrate, forming the multiple color film, when each changes colour, all will carry out resist printing processing, so complex process and long problem of time are arranged.Though and the distinctiveness of the general pigment used and resin self and dispersed good, its photostability, moisture-proof and most important poor heat resistance.
For print process, after using the ink disperseed to be printed, with heat or photo-hardening, thereby form coloring film in thermoplasticity or photoplasticity resin.This method is compared with other method, although can save fee of material, and the shortcoming such as formation high precision figure in distress and formed film are inhomogeneous.
For the electrochemical plating by the electrodeposition method, it can form accurate colored net, also, because using pigment, the outstanding characteristics of thermotolerance and photostability is arranged.But if during the situation high for pixel precision, that electrode pattern is fine and closely woven, its two ends there will be painted speckle or its painted thickness thickening caused because of electrical impedance, for the colored filter that high-precision requirement is arranged, be difficult to applicable.
And the Pigments method is: apply on the transparent material in the black net and contain the optical polymerism component, after mode is on demand exposed, repeatedly by the territory, non-exposed area with removal of solvents and carry out thermmohardening, thereby form coloured film.Pigments method advantage is: can improve thermotolerance and the permanance of colored filter most important properties, and can make the homogeneity of film consistent.
The coloring phototonus resin used in different Pigments methods, its component generally is comprised of alkali soluble resin, photopolymerization monomer, optical polymerism initiating agent, epoxy resin, solvent and other adjuvant etc.
Its application of Pigments method with These characteristics is active in the LCD manufacture views such as mobile phone, notebook computer, display, TV.But the colored filter resin Composition of making for the Pigments method with multiple advantage in recent years, not only require outstanding graphics feature, require higher performance simultaneously.In order to realize excellent image quality, the colored filter component, not only will have high-contrast, also will possess the exposure technology of short time and can obtain outstanding graphics feature simultaneously.
So, can form the figure with low surface roughness and hard film by few exposure, the effective colored filter resin Composition to the bad improvement of alignment film, become current development requires.
Summary of the invention
The purpose of this invention is to provide a kind of photoresist, comprise following component: alkali soluble resin, photo polymerization monomer, pigment, Photoepolymerizationinitiater initiater, adjuvant, antioxidant and solvent.
Above-mentioned photoresist also can only be comprised of said components.
Wherein, described alkali soluble resin is by containing the monomer of vinyl acid group with do not contain the monomer copolymerization of vinyl acid group and obtain;
Wherein, the described monomer containing the vinyl acid group is selected from least one in acrylic acid, methacrylic acid, itaconic acid, maleic acid, fumaric acid, vinyl acetate, vinyl acetate acid anhydrides, 2-acryl ethoxy phthalic ester, 2-acryl propoxyl group phthalic ester and 2-acryl propoxyl group hexahydrophthalic acid ester;
The described monomer that is not acid group containing ethene is selected from isobutyl acrylate, the 2-butyl acrylate, the lauryl alcohol acrylate, alkyl acrylate, octadecyl acrylate, cyclohexyl acrylate, isobornyl acrylate, alkyl acrylate, the 2-hydroxy acrylate, front three butylacrylic acid ester, second carbitol acrylate, acrylic acid benzene ethoxylated ester, 4-hydroxybutyl acrylate, the phenoxy group polyethylene glycol acrylate, the 2-hydroxy ethyl methacrylate, the 2-hydroxypropyl acrylate, 2-acryl ethoxy-propoxyl phthalic ester, 2-hydroxyl-3-phenoxy propyl acrylate, 2-hydroxyl-3-phenoxymethyl acrylate, 3-perfluoroalkyl acrylate ethyl ester, 4-fluoropropyl acrylate, at least one in 4-fluoropropyl methyl methacrylate and 4-fluoropropyl methacrylate.
Described monomer containing the vinyl acid group and described containing the mass ratio of vinyl acid group monomer, be not 10～40: 60～90, preferably 15～35: 65-85.Described during not containing the mass percent less than 60% of vinyl acid group monomer, the gained photoresist can reduce the stickability with substrate in follow-up video picture operation, increases the weight of the phenomenon that bubble appears in substrate, and formed substrate flatness also can worsen; And its mass percent is while surpassing 90%, the gained photoresist can reduce the dissolution velocity to the alkali imaging liquid when video picture, increases development time.
The weight-average molecular weight of described alkali soluble resin is 10,000～100,000, preferably 15,000～80, and 000, pH value is 10.5-11.5.The weight average molecular weight of this photoresist is less than at 10,000 o'clock, and the danger that has figure formation ability to reduce surpasses at 100,000 o'clock, and the development capability of alkalescence may reduce.
The quality of described alkali soluble resin accounts for the 5-40% of described photoresist gross weight, and preferably 15-35%, be specially 10%; During its mass percent less than 5%, the gained photoresist possibly can't develop at alkaline-based developer, and while surpassing 40%, the gained photoresist can produce because bridging property is not enough the phenomenon that surfaceness increases.
Described photopolymerization monomer is selected from least one in butanediol diacrylate, diacrylate dibutyl ester, ethylene glycol diacrylate, tetramethylol methane tetraacrylate, triethylene glycol diacrylate, polyethyleneglycol diacrylate, dipentaerythritol diacrylate, D-sorbite triacrylate, bisphenol a diacrylate, trimethylolpropane triacrylate, pentaerythrite polypropylene and methacrylate.
The quality of described photo polymerization monomer accounts for the 5-30% of described photoresist gross weight, specifically can be 18%; If mass percent less than 5% can not fully be hardened after figure forms, there will be the edge as figure totally not wait Drawing Problems; If surpass 30%, not only the viscosity of resin Composition is too high, and adhesion is too poor, thereby may cause being developed the phenomenon that liquid develops.
Described Photoepolymerizationinitiater initiater is selected from least one in triazine based compound, acetophenone based compound, thioxanthone based compound, Benzophenone based compound, styrax based compound and imidazole compound, wherein, described triazine based compound is selected from 2, 4, 6-tri-ring-S-triazines, 2-phenyl-4, 6-bis-(trichloromethyl)-S-triazine, 2-(3 ', 4 '-dimethoxy-styryl)-4, 6-bis-(trichloromethyl)-S-triazine, 2-2-(4 '-the methoxyl naphthyl)-4, 6-bis-(trichloromethyl)-S-triazine, 2-(p-methoxyphenyl)-4, 6-bis-(chloromethyl)-S-triazine, 2-biphenyl-4, two (the trichloromethyl)-S-triazines of 6-, two (trichloromethyl)-6-styryls-S-triazine, at least one in 2-4-trichloromethyl (piperonyl)-6-triazine (being also 2-4-trichloro methyl (pyperonyl)-6-triazine) and 2-4-trichloromethyl (4 '-methoxy styrene)-6-triazine, described acetophenone based compound is selected from 2,2 '-diethoxy cupric acetate, 2,2 '-dibutoxy cupric acetate, to tert-butyl group trichloroacetophenone, to tert-butyl group dichloroacetophenone, benzophenone, 4-chloro-acetophenone, 4,4 '-dimethylamino benzophenone, 4,4 '-dichloro benzophenone, 3,3 '-the chloro-4-metaphenoxy acetophenone of dimethyl-2-methoxy benzophenone, 2,2 '-bis-, 2-methyl isophthalic acid-(4-(methyl mercapto) phenyl)-mono-polyphenyl aldehyde of 2-and 2-benzyl-2-dimethylamino-1-4-mopolyn phenyl) at least one in butane-1-alcohol, described thioxanthone based compound is selected from thioxanthone, 2-methyl thioxanthone, 4-isopropyl thioxanthone, 2,4-diethyl thioxanthone, 2, at least one in 4-diisopropyl base thioxanthone and the chloro-thioxanthone of 2-, described Benzophenone based compound is selected from Benzophenone, benzoic acid, benzoyl benzoic acid, 4-phenyl Benzophenone, Viosorb 110,4, at least one in 4-dimethylamine Benzophenone and 4,4-dimethylamine Benzophenone, described styrax based compound is selected from least one in styrax, styrax methyl ether, benzoin isopropyl ether, benzoin isobutyl ether and dimethyl Bian Ji ketone, described imidazole compound is selected from 2,2 '-bis-(2-chlorphenyls)-4,4 ', 5,5 '-tetraphenyl-1,2 '-bisglyoxaline (be called for short BCIM), tetraphenyl-1,1 ', 2,2 '-bis-imidazoles and 2,2 '-bis-(2,4,6-tricyano phenyl)-4,4 ', 5,5 '-tetraphenyl-1, at least one in the two imidazoles of 2-,
The quality of described Photoepolymerizationinitiater initiater accounts for the 0.5-15% of described photoresist gross weight, is specially 10% or 14% or 7%;
Described adjuvant is that silicon is adjuvant; Dimethyl silicon oil 350) and polyglycol dimethyl polysiloxane (trade name: at least one dimethyl silicon oil 350) described silicon is that adjuvant specifically is selected from dimethyl polysiloxane (trade name:; The quality of described adjuvant accounts for the 0.1-3% of described photoresist gross weight;
Described pigment is organic pigment or inorganic pigment, from thermotolerance and color emissivity angle, and preferred organic pigment; Wherein, specifically according to colour rendering index [color index], in dyeing association of man (The Society of Dyers and Colourists), to be classified as the compound of pigment be example to described organic and inorganic pigment.Specifically comprise: C.I.pigment yellow 1, C.I.pigment yellow 3, C.I.pigment yellow 12, C.I.pigment yellow 13, C.I.pigment yellow14, C.I.pigment yellow 15, C.I.pigment yellow 16, C.I.pigment yellow 17, C.I.pigment yellow 20, C.I.pigment yellow 24, C.I.pigment yellow 31, C.I.pigment yellow 53, C.I.pigment yellow 83, C.I.pigment yellow 86, C.I pigment yellow 93, C.I.pigment yellow 94, C.I.pigment yellow 109, C.I.pigment yellow 110, C.I.pigment yellow 117, C.I.pigment yellow 125, C.I.pigment yellow 128, C.I.pigment yellow 137, C.I.pigment yellow 138, C.I.pigment yellow 139, C.I pigment yellow 147, C.I.pigment yellow 148, C.I.pigment yellow150, C.I.pigment yellow 153, C.I.pigment yellow 154, C.I.pigment yellow 166, C.I.pigment yellow 173, C.I.pigment yellow 194, C.I.pigment yellow 214 yellow uitramarines such as grade, C.I.pigment orange 13, C.I.pigment orange 31, C.I pigment orange 36, C.I.pigment orange 38, C.I.pigment orange 40, C.I.pigment orange 42, C.I.pigment orange 43, C.I.pigment orange 51, C.I.pigment orange 55, C.I.pigment orange 59, C.I.pigment orange 61, C.I.pigment orange 64, C.I.pigment orange 65, C.I.pigment orange 71, C.I.pigment orange 73 orange pigments such as grade, C.I.pigment red 9, C.I.pigment red 97, C.I.pigment red 105, C.I.pigment red 122, C.I.pigment red 123, C.I.pigment red 144, C.I.pigment red 149, C.I.pigment red166, C.I.pigment red 168, C.I.pigment red 176, C.I.pigment red 177, C.I.pigment red 180, C.I.pigment red 192, C.I.pigment red 209, C.I.pigment red 215, C.I.pigment red 216, C.I.pigment red 224, C.I.pigment red 242, C.I.pigment red 254, C.I.pigment red 264, the red pigments such as C.I.pigment red 265, C.I.pigment blue 15, C.I.pigment blue 15:3, C.I pigment blue 15:4, C.I.pigment blue 15:6, C.I.pigment blue 60 blue pigments such as grade, C.I.pigment violet 1, C.I.pigment violet 19, C.I.pigment violet 23, C.I.pigment violet 29, C.I.pigment violet 32, C.I.pigment violet 36, the bluish violet pigment such as C.I.pigment violet 38, C.I.pigment green 7, C.I.pigment green 36 viridine greens such as grade, C.I.pigment brown 23, C.I.pigment brown 25 browns such as grade, C.I.pigment black 1, C.I.pigment black 7 black pigments such as grade, C.I.pigment yellow 138, C.I.pigment yellow 139, C.I.pigment yellow 150, C.I.pigment red 177, C.I.pigment red 209, C.I.pigment red 254, C.I.pigment redviolet 23, C.I.pigment blue 15:6 or C.I.pigment green 36.Described organic and inorganic pigment can be used alone or mix 2 kinds and above use, and for example: the red pixel recommendation contains C.I.pigment red 209 and C.I.pigment yellow 139; At least one in green pixel recommendation C.I.pigment green 36 and C.I.pigment yellow 150 and C.I.pigment yellow l38; The pigment that the blue pixel recommendation contains C.I.pigment blue 15:6.
Organic pigment in above-mentioned pigment, can use as required surface of pigments graphite treatment that abietic resin processed, used the surface treatment of acidic group or base pigment growth etc., utilizes macromolecular compound etc. to carry out, utilize the micronize of sulfuric acid particulate method etc. process or for the cleaning treatment of removing organic solvent that impurity carries out or water etc., use the Transformatin method of ion exchange process etc. etc.
The quality of described pigment accounts for the 10-60% of described photoresist gross weight, specifically can be 25%; If mass percent less than 10%, coloring effect is not remarkable; If surpass 60%, developing performance sharply descends.
Described antioxidant is selected from 2,2 '-thiobis (4-methyl-6-tert-butylphenol), 2,6-bis--tert-butyl phenol, pentaerythrite four (two-T-butylhydroxy hydrocinnamic acid) ester and with three (2,4-di-tert-butyl-phenyl) phosphate ester polymer at least one; The quality of described antioxidant accounts for the 0.01-10% of described photoresist gross weight, specifically can be 4% or 6%.If its mass percent less than 0.01%,, because of the impact of high light sensitivity, at substrate, forms in technique and chain reaction sharply occurs, thereby live width increases, and can cause the variation of blocking the exposure technologys such as base openings section.On the contrary, if surpass 10%, when exposure, photopolymerization is insufficient, has the disadvantageous problem of the rectilinearity of substrate.
Described solvent is selected from least one in glycol monoethyl ether acetate, propylene glycol monomethyl ether, 1-Methoxy-2-propyl acetate, propylene glycol monomethyl ether acetate, diethylene glycol dimethyl ether, diethylene glycol ethylmethyl ether, cyclohexanone, 3-methoxy propyl acetoacetic ester, 3-methoxy propyl acid methyl, 3-ethoxyl ethyl propionate, MEK, isopropyl alcohol, ethanol and methyl alcohol.Surplus is described solvent.When above-mentioned solvent use amount is very few, the coating difficulty of resin Composition self; And if excessive,, in thickness surpasses the film of 3 μ m, be difficult to keep flatness.
The method of the above-mentioned photoresist of preparation provided by the invention, comprise the steps: aforementioned each component is mixed to rear filtration, obtains described photoresist.
In the described filtration step of said method, the filter opening diameter is the 450-550 order, preferably 500 orders.
The application of the photoresist that the invention described above provides in preparing colored filter, also belong to protection scope of the present invention.
The present invention has overcome the existing technical matters existed in photoresist for preparing, provide a kind of to hang down that exposure realizes that developability, thermotolerance, chemically-resistant excellent and even thickness, low surface roughness and tack are high and the photoresist that is conducive to contrast, this resin especially is suitable for preparing colored filter, has important using value.
Embodiment
Below in conjunction with specific embodiment, the present invention is further elaborated, but the present invention is not limited to following examples.Described method is conventional method if no special instructions.Described material all can obtain from open commercial sources if no special instructions.
Embodiment 1
By photo polymerization monomer bisphenol a diacrylate (the pH value is 10.5-11.5) 8 weight portions, (weight average molecular weight is 18 to the polymkeric substance of alkali soluble resin acrylic acid benzene ethoxylated ester/methacrylic acid/maleic acid (weight ratio is 70: 20: 10), 000) 10 weight portions, photo polymerization monomer dipentaerythritol diacrylate 10 weight portions, pigment diketone-pyrrolo--pyrroles (C.I.pigment red 254) 25 weight portions, Photoepolymerizationinitiater initiater BCIM 5 weight portions, Photoepolymerizationinitiater initiater 907 (Ciba Specialty Chemicals manufacture) 3 weight portions, Photoepolymerizationinitiater initiater 4, 4 '-dimethylamino benzophenone 2 weight portions, solvent 1-Methoxy-2-propyl acetate 30 weight portions, antioxidant 2, 6-bis--tert-butyl phenol (Ciba Specialty Chemicals manufacture) 4 weight portions and silicon are that (trade name: dimethyl silicon oil 350) 3 weight portions were blended in stirring at normal temperature after 2 hours to the adjuvant dimethyl polysiloxane, filter and remove impurity in 500 order filtrators, obtain photoresist provided by the invention.
Wherein, (weight average molecular weight is 18 to the polymkeric substance of described macromolecule resin acrylic acid benzene ethoxylated ester/methacrylic acid/maleic acid (weight ratio is 70: 20: 10), 000) be prepared as follows and obtain: add acrylic acid benzene ethoxylated ester 70g in the 500mL there-necked flask, keep 90 ℃ of constant temperature and stirring.At the uniform velocity drip methacrylic acid 20g, the mixed solution of maleic acid 10g, drip the 2g azoisobutyronitrile simultaneously, be heated to 120 ℃ after reaction 4h, insulation 1h, the cooling polymkeric substance (weight average molecular weight is 18,000) that obtains described macromolecule resin acrylic acid benzene ethoxylated ester/methacrylic acid/maleic acid (weight ratio is 70: 20: 10).
Embodiment 2
According to the identical step of embodiment 1, only Photoepolymerizationinitiater initiater is replaced with to BCIM 10 weight portions.
Embodiment 3
According to the identical step of embodiment 1, only Photoepolymerizationinitiater initiater is replaced with to BCIM 2 weight portions, antioxidant 6 weight portions.
Comparative example 1
According to the identical step of embodiment 1, only do not add antioxidant, solvent replaces with 33 weight portions.
Comparative example 2
According to the identical step of embodiment 1, only not adding antioxidant and silicon is adjuvant, solvent replaces with 36 weight portions.
Evaluation of physical property, contrast evaluation and the surfaceness evaluation of the photoresist component of embodiment 1～3 and comparing embodiment 1～2 made are done to following evaluation, the results are shown in table 1～3.
[substrate evaluation of physical property]
Apply the thick previous embodiment of 2 μ m and prepare the gained photoresist on the 1mm of cleaning by degreasing glass substrate, in heating plate, 80 ℃ of dryings obtained film after 120 seconds, placement light shield on film, utilize the high-pressure mercury-vapor lamp exposure of 365nm wavelength, carry out again the development-washing-drying process of 150 seconds under 30 ℃, normal pressure by the 1.33%KOH aqueous solution after, in the heated air circulation type drying oven in 235 ℃ the baking 25 minutes after, with contact Membrane probing instrument and observation by light microscope, acquired results is shown in table 1.
-metewand
Zero: exposure is at 30～80mj/cm
2Within, the situation that diaphragm live width and rectilinearity are outstanding;
△: exposure is at 80～130mj/cm
2Within, the situation that diaphragm live width and rectilinearity are good;
*: exposure is at 130mj/cm
2The situation above, that diaphragm live width and rectilinearity are bad.
The evaluation of physical property of table 1, photoresist component, contrast evaluation and surfaceness evaluation
[contrast evaluation]
On the glass substrate that is 1mm at the thickness of cleaning and degreasing, apply previous embodiment with the coating condition of target colour and prepare the gained photoresist, in heating plate with 80 ℃ of dryings after 120 seconds film.Then on this film, use the high-pressure mercury-vapor lamp of 365nm wavelength, with 80mj/cm
2The exposure blanket exposure after, the heated air circulation type drying oven in 235 ℃ the baking 25 minutes, obtain coloring film, with the contrast tester, estimated, the results are shown in table 2.
-metewand
Zero: contrast outstanding-1000～1200;
△: contrast good-800～1000;
*: contrast is bad-below 800.
Table 2, contrast evaluation
| Classification | Embodiment 1 | Embodiment 2 | Embodiment 3 | Comparative example 1 | Comparative example 2 |
| Contrast | ?○ | ?○ | ?○ | ?△ | ?△ |
[surfaceness evaluation]
On the glass substrate that is 1mm at the thickness of cleaning and degreasing, apply the thick resin of 1～2 μ m, in heating plate with 80 ℃ of dryings after 150 seconds film.Then on film, place light shield, high-pressure mercury-vapor lamp exposure with the 365nm wavelength, using the 1.33%KOH aqueous solution, and carried out the development-washing-drying process of 150 seconds under 30 ℃, normal pressure after, in 235 ℃ of bakings 25 minutes, obtain diaphragm at the heated air circulation type drying oven, after impurity residual in substrate is removed in ashing, observe its roughness with atomic force microscope, evaluation criterion is shown in table 3.
-metewand
Zero: surfaceness is outstanding-2～6nm;
△: surfaceness is good-6～10nm;
*: surfaceness is bad-more than 10nm.
Table 3, surfaceness evaluation
In table 1～3, can find out, the photoresist that embodiment of the present invention 1-3 provides is than comparative example 1～2, because the former has used antioxidant, therefore excellent characteristic is arranged on profile pattern, and because having used silicon, be adjuvant, the homogeneity effect of its diaphragm is better.
Claims (3)
1. a photoresist, comprise following component: alkali soluble resin, photo polymerization monomer, pigment, Photoepolymerizationinitiater initiater, adjuvant, antioxidant and solvent;
Described alkali soluble resin is by containing the monomer of vinyl acid group with do not contain the monomer copolymerization of vinyl acid group and obtain;
Wherein, the described monomer containing the vinyl acid group is selected from least one in acrylic acid, methacrylic acid, itaconic acid, maleic acid, fumaric acid, vinyl acetate acid anhydrides, 2-acryl ethoxy phthalic ester, 2-acryl propoxyl group phthalic ester and 2-acryl propoxyl group hexahydrophthalic acid ester;
The described monomer that is not acid group containing ethene is selected from isobutyl acrylate, the 2-butyl acrylate, the lauryl alcohol acrylate, octadecyl acrylate, cyclohexyl acrylate, isobornyl acrylate, the 2-hydroxy acrylate, front three butylacrylic acid ester, second carbitol acrylate, acrylic acid benzene ethoxylated ester, 4-hydroxybutyl acrylate, the phenoxy group polyethylene glycol acrylate, the 2-hydroxy ethyl methacrylate, the 2-hydroxypropyl acrylate, 2-acryl ethoxy-propoxyl phthalic ester, 2-hydroxyl-3-phenoxy propyl acrylate, 2-hydroxyl-3-phenoxymethyl acrylate, 3-perfluoroalkyl acrylate ethyl ester, at least one in 4-fluoropropyl acrylate and 4-fluoropropyl methyl methacrylate,
The weight-average molecular weight of described alkali soluble resin is 15,000～80, and 000, pH value is 10.5-11.5;
The described monomer containing the vinyl acid group and the described mass ratio that does not contain vinyl acid group monomer are 15～35:65-85;
Described photopolymerization monomer is selected from least one in butanediol diacrylate, diacrylate dibutyl ester, ethylene glycol diacrylate, tetramethylol methane tetraacrylate, triethylene glycol diacrylate, polyethyleneglycol diacrylate, dipentaerythritol diacrylate, D-sorbite triacrylate, bisphenol a diacrylate, trimethylolpropane triacrylate, pentaerythrite polypropylene and methacrylate;
Described Photoepolymerizationinitiater initiater is selected from least one in triazine based compound, acetophenone based compound, thioxanthone based compound, Benzophenone based compound, styrax based compound and imidazole compound, wherein, described triazine based compound is selected from 2, 4, 6-tri-ring-S-triazines, 2-phenyl-4, 6 – bis-(trichloromethyl)-S-triazine, 2-(3', the 4'-dimethoxy-styryl)-4, 6 – bis-(trichloromethyl)-S-triazine, 2-2-(4'-methoxyl naphthyl)-4, 6 – bis-(trichloromethyl)-S-triazine, the 2-(p-methoxyphenyl)-4, 6-bis-(chloromethyl)-S-triazine, 2-biphenyl-4, two (the trichloromethyl)-S-triazines of 6-, two (trichloromethyl)-6-styryls-S-triazine, at least one in 2-4-trichloromethyl (piperonyl)-6-triazine and 2-4-trichloromethyl (4'-methoxy styrene)-6-triazine, described acetophenone based compound is selected from 2,2'-diethoxy cupric acetate, 2,2'-dibutoxy cupric acetate, to tert-butyl group trichloroacetophenone, to tert-butyl group dichloroacetophenone, benzophenone, 4-chloro-acetophenone, 4,4'-dimethylamino benzophenone, 4,4'-dichloro benzophenone, 3,3'-dimethyl-2-methoxy benzophenone, 2, the chloro-4-metaphenoxy acetophenone of 2'-bis-and 2-methyl isophthalic acid-(4-(methyl mercapto) phenyl) at least one in-mono-polyphenyl aldehyde of 2-, described thioxanthone based compound is selected from thioxanthone, 2-methyl thioxanthone, 4-isopropyl thioxanthone, 2,4-diethyl thioxanthone, 2, at least one in 4-diisopropyl base thioxanthone and the chloro-thioxanthone of 2-, described Benzophenone based compound is selected from Benzophenone, benzoic acid, benzoyl benzoic acid, 4-phenyl Benzophenone, Viosorb 110,4, at least one in 4-dimethylamine Benzophenone and 4,4-dimethylamine Benzophenone, described styrax based compound is selected from least one in styrax, styrax methyl ether, benzoin isopropyl ether, benzoin isobutyl ether and dimethyl Bian Ji ketone, described imidazole compound is selected from two (the 2-chlorphenyls)-4 of 2,2'-, 4', 5,5'-tetraphenyl-1,2'-bisglyoxaline, tetraphenyl-1,1', the two imidazoles of 2,2'-and 2,2' – bis-(2,4,6-tricyano phenyl)-4,4', 5,5'-tetraphenyl-1, at least one in the two imidazoles of 2-,
Described adjuvant is that silicon is adjuvant; Described silicon is that adjuvant specifically is selected from least one in dimethyl polysiloxane and polyglycol dimethyl polysiloxane;
Described antioxidant is selected from 2,2'-thiobis (4-methyl-6-tert-butylphenol), 2,6-bis--tert-butyl phenol, pentaerythrite four (two-T-butylhydroxy hydrocinnamic acid) ester and with three (2,4 – di-tert-butyl-phenyl) phosphate ester polymer at least one;
Described solvent is selected from least one in glycol monoethyl ether acetate, propylene glycol monomethyl ether, 1-Methoxy-2-propyl acetate, propylene glycol monomethyl ether acetate, diethylene glycol dimethyl ether, diethylene glycol ethylmethyl ether, cyclohexanone, 3-methoxy propyl acetoacetic ester, 3-methoxy propyl acid methyl, 3-ethoxyl ethyl propionate, MEK, isopropyl alcohol, ethanol and methyl alcohol;
The quality of described alkali soluble resin accounts for the 15-35% of described photoresist gross weight;
The quality of described photo polymerization monomer accounts for the 5-30% of described photoresist gross weight;
The quality of described pigment accounts for the 10-60% of described photoresist gross weight;
The quality of described Photoepolymerizationinitiater initiater accounts for the 0.5-15% of described photoresist gross weight;
The quality of described adjuvant accounts for the 0.1-3% of described photoresist gross weight;
The quality of described antioxidant accounts for the 0.01-10% of described photoresist gross weight;
Surplus is described solvent.
2. a method for preparing the described photoresist of claim 1, comprise the steps: each component claimed in claim 1 is mixed, and obtains described photoresist.
3. the application of the described photoresist of claim 1 in preparing colored filter.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201210039600XA CN102591153B (en) | 2012-02-21 | 2012-02-21 | Light-sensitive resin as well as preparation method and application thereof |
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| CN201210039600XA CN102591153B (en) | 2012-02-21 | 2012-02-21 | Light-sensitive resin as well as preparation method and application thereof |
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| CN102591153A CN102591153A (en) | 2012-07-18 |
| CN102591153B true CN102591153B (en) | 2013-12-04 |
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| KR101608292B1 (en) * | 2008-02-22 | 2016-04-01 | 후지필름 가부시키가이샤 | Colored curable composition, colored pattern, color filter and method of manufacturing the same, and liquid crystal display device |
| JP5540519B2 (en) * | 2009-02-13 | 2014-07-02 | 東洋インキＳｃホールディングス株式会社 | Coloring composition for color filter and color filter |
| JP5617177B2 (en) * | 2009-03-27 | 2014-11-05 | 東洋インキＳｃホールディングス株式会社 | Coloring composition for color filter and color filter |
| CN101613276B (en) * | 2009-06-23 | 2012-12-26 | 苏州苏大欧罗新材料科技有限公司 | Color photoresist for color filter |
| TWI444441B (en) * | 2009-09-25 | 2014-07-11 | Toyo Ink Mfg Co | Coloring composition and color filter |
| TWI422559B (en) * | 2009-12-01 | 2014-01-11 | Toyo Ink Mfg Co | Blue coloring composition for color filter, color filter and color display |
| CN102193311A (en) * | 2010-03-08 | 2011-09-21 | 京东方科技集团股份有限公司 | Colored photosensitive resin compound |
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Effective date of registration: 20190604 Address after: 621000 Sanjiang Avenue 327 Jingkai District, Mianyang City, Sichuan Province Patentee after: Mianyang Exax Electronic Materials Co., Ltd. Address before: 621000 No. 7 standard workshop of No. 1 Mechanical and Electrical Industrial Park, Mianyang City, Sichuan Province Patentee before: Mianyang Truly Electronics Mfg Ltd. |