CN102540738A - Method for compensating unparallel angles among light beams - Google Patents
Method for compensating unparallel angles among light beams Download PDFInfo
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- CN102540738A CN102540738A CN2010105922939A CN201010592293A CN102540738A CN 102540738 A CN102540738 A CN 102540738A CN 2010105922939 A CN2010105922939 A CN 2010105922939A CN 201010592293 A CN201010592293 A CN 201010592293A CN 102540738 A CN102540738 A CN 102540738A
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Abstract
The invention provides a method for compensating unparallel angles among light beams. The method is applied to a photoetching machine system. The photoetching machine system comprises a base table, a first direction interferometer and a second direction interferometer vertical to a first direction. The method comprises the following steps that: the base table moves step by step along the first direction, and the first direction interferometer and the second direction interferometer are used for measuring the unparallel angles among the light beams of the first direction interferometer synchronously; the base table moves step by step along a second direction, and the first direction interferometer and the second direction interferometer are used for measuring the unparallel angles among the light beams of the second direction interferometer synchronously; and the unparallel angles among the light beams of the first and second direction interferometers are compensated respectively. The unparallel angles among the light beams of the interferometers are compensated, so that a correct elongated mirror surface shape is obtained, and a measurement position is subjected to surface shape compensation; and therefore, the position control accuracy of the base table is improved, and the precision of the photoetching machine system is improved.
Description
Technical field
The present invention relates to the application of litho machine system, relate in particular to the compensation method of not parallel angle between a kind of interferometer beam.
Background technology
In the front end manufacturing equipment of large-scale SIC (semiconductor integrated circuit), litho machine be the most complicated, require the highest equipment, especially accuracy requirement almost to reach the limit to the litho machine system.Yet; In the litho machine system; Be installed in the rectangular mirror on the base station,, still can have defective inevitably in its surface although passed through accurate machining, polishing; Even have only the defect point of a few nanometer sizes, also can make the precision of litho machine system produce sizable error.For reducing above-mentioned error as much as possible, must before exposure, carry out sweep test to rectangular mirror surface, obtain the measurement data of its surperficial face shape image, then to surface imperfection, carry out correction-compensation, thereby satisfy the high-precision requirement of litho machine system.
U.S. Pat 5790253 utilizes controlling level to measure rectangular minute surface shape to the interferometer of position; Promptly when the base station of litho machine system along X during to (Y to) stepping; Measured to the diaxon interferometer of (X to) position to Y by controlling level, Model Calculation obtains the face shape on rectangular mirror surface.Like mistake! Do not find Reference source.Shown in, X is attached on the base station 100 to rectangular mirror 102 with Y to rectangular mirror 101, utilizes Y can measure the face shape of Y to rectangular mirror 102 to interferometer 103.Yet after the installation of litho machine system, because the installation accuracy restriction, Y is to the light beam l of interferometer 103
y1 and l
y2 can exist not parallel angle [alpha]
y, like this when base station 100 along Y during to stepping, like mistake! Do not find Reference source.Shown in; For the anglec of rotation that guarantees the base station 100 that the measuring position is corresponding invariable; Actual base platform 100 is according to the parabolic path shown in the calculated curve among Fig. 21 motion, the Y that calculates to 102 shapes of rectangular mirror between scope [500nm, 300nm]; So just cause result of calculation incorrect, for example work as the not parallel angle [alpha] of interferometer 103 light beams 1 and 2 existence
yDuring about 200 μ rad, shown in the true curve 2 of Fig. 2, actual real face shape is merely [20nm, 30nm].In like manner, base station 100 can obtain wrong result of calculation when the stepping equally along X.
The present invention proposes a kind of method of calculating not parallel angle between interferometer beam of measuring.Through the not parallel angle between compensating interferometer appearance light beam, obtain correct rectangular minute surface shape, and then surface shape compensation is carried out in the measuring position, improve base station control position accuracy, improve the precision of litho machine system.
Summary of the invention
The technical matters that the present invention solved is to provide a kind of method of calculating not parallel angle between interferometer beam of measuring, and obtains correct rectangular minute surface shape, and then improves the precision of litho machine system.
In order to solve the problems of the technologies described above; The present invention provides the compensation method of not parallel angle between a kind of light beam; This method is applied to the litho machine system, and this litho machine system comprises base station, first direction interferometer and the second direction interferometer vertical with this first direction, comprising:
This base station by this first, second direction interferometer synchro measure, obtains not parallel angle between this first direction interferometer beam along this first direction stepping;
This base station by this first, second direction interferometer synchro measure, obtains not parallel angle between this second direction interferometer beam along this second direction stepping;
Compensate not parallel angle between this first direction interferometer and this second direction interferometer beam respectively.
Further, the said method that obtains not parallel angle between this first direction interferometer beam is:
This base station is along this first direction stepping, and this second direction interferometer control self second direction moves and is steady state value in the stepping process, and this first direction interferometer control self rotates to be steady state value;
This base station first when the stepping, reads this first direction measuring position by this first direction interferometer along this, and this second direction interferometer reads the measurement anglec of rotation corresponding with this first direction measuring position;
Obtain not parallel angle between this first direction interferometer beam by this first direction measuring position of reading and the corresponding measurement anglec of rotation.
Further, carry out the first-order linear match by this first direction measuring position of reading and the corresponding measurement anglec of rotation, obtain not parallel angle between this first direction interferometer beam, computing formula does
R
zy(i)＝K
x*X(i)+b，
Wherein, X (i) is this first direction measuring position, R
Zy(i) be the corresponding anglec of rotation, K
x, b
xBe fitting coefficient, α
xBe the not parallel angle that exists between these first direction interferometer two light beams, dx does not consider not parallel angle [alpha] between light beam between these first direction interferometer two light beams
xThe time distance.
Light beam light path compensating gage when further, compensating the not parallel angle of this first direction interferometer is calculated formula:
l
x1＝X
C-dx*R
zy；l
x2＝X
C-0.5*X
C*α
x 2+dx*R
zy
Wherein, l
x1, l
x2 are respectively the corresponding light path of these first direction interferometer two light beams, X
C, R
ZyFor this base station along current this first direction measuring position that this first direction steps to and the corresponding anglec of rotation, α
xBe the not parallel angle that exists between these first direction interferometer two light beams, dx does not consider not parallel angle [alpha] between light beam between these first direction interferometer two light beams
xThe time distance.
Further, the said method that obtains not parallel angle between this second direction interferometer beam is:
This base station is along this second direction stepping, and this first direction interferometer control self first direction moves and is steady state value in the stepping process, and this second direction interferometer control self rotates to be steady state value;
This base station reads this second direction measuring position by this second direction interferometer during along this second direction stepping, and this first direction interferometer reads the measurement anglec of rotation corresponding with this second direction measuring position;
Obtain not parallel angle between this second direction interferometer beam by this second direction measuring position of reading and the corresponding measurement anglec of rotation.
Further, carry out the first-order linear match by this second direction measuring position of reading and the corresponding measurement anglec of rotation, obtain not parallel angle between this second direction interferometer beam, computing formula does
R
zx(i)＝K
y*Y(i)+d
y，
Wherein, Y (i) is this second direction measuring position, R
Zx(i) be the corresponding anglec of rotation, K
y, b
yBe fitting coefficient, α
yBe the not parallel angle that exists between these second direction interferometer two light beams, dy does not consider not parallel angle [alpha] between light beam between these second direction interferometer two light beams
yThe time distance.
Light beam light path compensating gage when further, compensating the not parallel angle of this second direction interferometer is calculated formula:
l
y1＝Y
C-dy*R
zx；l
y2＝Y
C-0.5*Y
C*α
y 2+dy*R
zx；
Wherein, l
y1, l
y2 are respectively the corresponding light path of these second direction interferometer two light beams, Y
C, R
ZxFor this base station along current this second direction measuring position that second direction steps to and the corresponding anglec of rotation, α
yBe the not parallel angle that exists between these second direction interferometer two light beams, dy does not consider not parallel angle [alpha] between light beam between these second direction interferometer two light beams
yThe time distance.
Mode through this first, second direction interferometer beam of firmware adjustment when further, compensating the not parallel angle of this first direction interferometer and this second direction interferometer respectively realizes.
Compared with prior art; The measuring position and the corresponding anglec of rotation when the present invention uses orthogonal first direction interferometer and second direction interferometer the control measurement base station is along this first/second direction stepping respectively simultaneously, and then obtain the not parallel angle between above-mentioned two interferometer beam respectively.Through the not parallel angle between compensating interferometer appearance light beam, obtain correct rectangular minute surface shape, and then surface shape compensation is carried out in the measuring position, improve base station control position accuracy, improve the precision of litho machine system.
Description of drawings
Fig. 1 is that the interferometer beam under the prior art exists not parallel angle synoptic diagram;
Fig. 2 is rectangular minute surface shape and the real rectangular minute surface shape synoptic diagram that light beam parallelism obtains between interferometer of not considering under the prior art;
Fig. 3 is the used litho machine system architecture of a present invention synoptic diagram;
Fig. 4 is the compensation process flow diagram of not parallel angle between light beam of the present invention.
Embodiment
Below in conjunction with accompanying drawing and specific embodiment further explain is done in the compensation method of not parallel angle between the light beam of the present invention's proposition.According to following explanation and claims, advantage of the present invention and characteristic will be clearer.What need explanation is, accompanying drawing all adopts the form of simplifying very much, only is used for conveniently, the purpose of the aid illustration embodiment of the invention lucidly.
The present invention provides the compensation method of not parallel angle between a kind of light beam, is applied to the litho machine system, and this litho machine system comprises base station, first direction interferometer and the second direction interferometer vertical with this first direction.As shown in Figure 3; The litho machine system that present embodiment uses comprises: illuminator 301, the mask platform 303 of carrying mask 302; The projection objective 304 that is used for the mask imaging; The base station 306 of bearing basement 305 is attached at the rectangular mirror 307 of base station side, X to interferometer 308 (first to interferometer) and vertical with it Y to interferometer 309 (second to interferometer).Wherein, X can simultaneously measure base station 306 rotations with Y to interferometer 309 to interferometer 308.Below all setting " X to " in the explanation is " first direction ", and " Y to " is " second direction ".
As shown in Figure 4, this method is by S401～S403 totally 3 steps completion.Below in conjunction with 3 steps shown in S401～S403 of litho machine system shown in Figure 3 and Fig. 4, the compensation method of not parallel angle between above-mentioned light beam is explained in detail.
S401, base station along this first to stepping, by this first, second to the interferometer synchro measure, obtain not parallel angle between this first direction interferometer beam.
With reference to litho machine system shown in Figure 3; Base station 306 along X to stepping; Y is steady state value to interferometer 309 controls self Y to moving in the stepping process; X self rotates to be steady state value to interferometer 308 controls; Y is 0 to interferometer 309 controls self Y to moving in this stepping process of present embodiment, and X self rotates to be 0 to interferometer 308 controls;
Read X to the measuring position by X to interferometer 308, Y reads the corresponding anglec of rotation in measuring position to interferometer 309;
Carry out first-order linear match to measuring position and Y to the anglec of rotation that interferometer 309 reads to the X that interferometer 308 reads by X, obtain X not parallel angle between interferometer beam, computing formula does
R
zy(i)＝K
x*X(i)+b，
Wherein, the X that X (i) reads to interferometer 308 for X is to the measuring position, R
ZyThe anglec of rotation of the correspondence that (i) reads to interferometer 309 for Y, K
x, b
xBe fitting coefficient, α
xBe the not parallel angle that X exists between interferometer two light beams, dx is that X does not consider not parallel angle [alpha] between light beam between interferometer two light beams
xThe time distance.
S402, base station by first, second direction interferometer synchro measure, obtains not parallel angle between this second direction interferometer beam along the second direction stepping.
With reference to litho machine system shown in Figure 3; Base station 306 along Y to stepping; X is steady state value to interferometer 308 controls self X to moving in the stepping process; Y self rotates to be steady state value to interferometer 309 controls, and X is 0 to interferometer 308 controls self X to moving in this stepping process of present embodiment, and Y self rotates to be 0 to interferometer 309 controls; Read Y to the measuring position by Y to interferometer 309, X reads the corresponding measurement anglec of rotation in this measuring position to interferometer 308;
Carry out first-order linear match to measuring position and X to the anglec of rotation that interferometer 308 reads to the Y that interferometer 309 reads by Y, obtain Y not parallel angle between interferometer 309 light beams, computing formula does
R
zx(i)＝K
y*Y(i)+d
y，
Wherein, the Y that Y (i) reads to interferometer 309 for Y is to the measuring position, R
Zx(i) anglec of rotation that reads to interferometer 308 for X, K
y, b
yBe fitting coefficient, α
yBe the not parallel angle that Y exists between interferometer two light beams, dy is that Y does not consider not parallel angle [alpha] between light beam between interferometer two light beams
yThe time distance.
S403 compensates not parallel angle between this first direction interferometer and second direction interferometer beam respectively.
With reference to litho machine system shown in Figure 3, compensation X realizes through the software compensation mode also that when interferometer 308 not parallel angles light beam light path compensating gage is calculated formula and is:
l
x1＝X
C-dx*R
zy；l
x2＝X
C-0.5*X
C*α
x 2+dx*R
zy
Wherein, l
x1, l
x2 correspond to X respectively to interferometer two light beam light paths, X
C, R
ZyFor base station 306 along X to the current X that steps to the measuring position and the corresponding anglec of rotation, α
xBe the not parallel angle that X exists between 308 liang of light beams of interferometer, dx is that X does not consider not parallel angle [alpha] between light beam between 308 liang of light beams of interferometer
xThe time distance.
Compensation Y realizes through the software compensation mode that when interferometer 309 not parallel angles light beam light path compensating gage is calculated formula and is:
l
y1＝Y
C-dy*R
zx；l
y2＝Y
C-0.5*Y
C*α
y 2+dy*R
zx；
Wherein, l
y1, l
y2 are respectively X to the corresponding light path of interferometer two light beams, Y
C, R
ZxFor base station 306 along Y to the current Y that steps to the measuring position and the corresponding anglec of rotation, α
yBe the not parallel angle that Y exists between 309 liang of light beams of interferometer, dy is that Y does not consider not parallel angle [alpha] between light beam between 309 liang of light beams of interferometer
yThe time distance.
In other specific embodiments of the present invention, can also realize through the mode of firmware adjustment interferometer beam when compensating the not parallel angle of this first direction interferometer and second direction interferometer respectively.
In sum; The measuring position and the corresponding anglec of rotation when the present invention uses orthogonal first, second direction interferometer respectively the control measurement base station is along this first/second direction stepping simultaneously, and then obtain the not parallel angle between above-mentioned two interferometer beam respectively.Through the not parallel angle between compensating interferometer appearance light beam, obtain correct rectangular minute surface shape, and then surface shape compensation is carried out in the measuring position, improve base station control position accuracy, improve the precision of litho machine system.
Obviously, those skilled in the art can carry out various changes and modification to invention and not break away from the spirit and scope of the present invention.Like this, belong within the scope of claim of the present invention and equivalent technologies thereof if of the present invention these are revised with modification, then the present invention also is intended to comprise these changes and modification interior.
Claims (8)
1. the compensation method of not parallel angle between a light beam, this method is applied to the litho machine system, and this litho machine system comprises base station, first direction interferometer and the second direction interferometer vertical with this first direction, it is characterized in that, comprising:
This base station by this first, second direction interferometer synchro measure, obtains not parallel angle between this first direction interferometer beam along this first direction stepping;
This base station by this first, second direction interferometer synchro measure, obtains not parallel angle between this second direction interferometer beam along this second direction stepping;
Compensate not parallel angle between this first direction interferometer and this second direction interferometer beam respectively.
2. the compensation method of not parallel angle is characterized in that between light beam as claimed in claim 1, and the said method that obtains not parallel angle between this first direction interferometer beam is:
This base station is along this first direction stepping, and this second direction interferometer control self second direction moves and is steady state value in the stepping process, and this first direction interferometer control self rotates to be steady state value;
This base station first when the stepping, reads this first direction measuring position by this first direction interferometer along this, and this second direction interferometer reads the measurement anglec of rotation corresponding with this first direction measuring position;
Obtain not parallel angle between this first direction interferometer beam by this first direction measuring position of reading and the corresponding measurement anglec of rotation.
3. the compensation method of not parallel angle between light beam as claimed in claim 2; It is characterized in that; Carry out the first-order linear match by this first direction measuring position of reading and the corresponding measurement anglec of rotation, obtain not parallel angle between this first direction interferometer beam, computing formula does
R
zy(i)＝K
x*X(i)+b，
Wherein, X (i) is this first direction measuring position, R
Zy(i) be the corresponding anglec of rotation, K
x, b
xBe fitting coefficient, α
xBe the not parallel angle that exists between these first direction interferometer two light beams, dx does not consider not parallel angle [alpha] between light beam between these first direction interferometer two light beams
xThe time distance.
4. the compensation method of not parallel angle is characterized in that between light beam as claimed in claim 3, and the light beam light path compensating gage when compensating the not parallel angle of this first direction interferometer is calculated formula and is:
l
x1＝X
C-dx*R
zy；l
x2＝X
C-0.5*X
C*α
x 2+dx*R
zy
Wherein, l
x1, l
x2 are respectively the corresponding light path of first direction interferometer two light beams, X
C, R
ZyFor this base station along current this first direction measuring position that this first direction steps to and the corresponding anglec of rotation, α
xBe the not parallel angle that exists between these first direction interferometer two light beams, dx does not consider not parallel angle [alpha] between light beam between these first direction interferometer two light beams
xThe time distance.
5. the compensation method of not parallel angle is characterized in that between light beam as claimed in claim 1, and the said method that obtains not parallel angle between this second direction interferometer beam is:
This base station is along this second direction stepping, and this first direction interferometer control self first direction moves and is steady state value in the stepping process, and this second direction interferometer control self rotates to be steady state value;
This base station reads this second direction measuring position by this second direction interferometer during along this second direction stepping, and this first direction interferometer reads the measurement anglec of rotation corresponding with this second direction measuring position;
Obtain not parallel angle between this second direction interferometer beam by this second direction measuring position of reading and the corresponding measurement anglec of rotation.
6. the compensation method of not parallel angle between light beam as claimed in claim 5; It is characterized in that; Carry out the first-order linear match by this second direction measuring position of reading and the corresponding measurement anglec of rotation, obtain not parallel angle between this second direction interferometer beam, computing formula does
R
zx(i)＝K
y*Y(i)+b
y，
Wherein, Y (i) is this second direction measuring position, R
Zx(i) be the corresponding anglec of rotation, K
y, b
yBe fitting coefficient, α
yBe the not parallel angle that exists between these second direction interferometer two light beams, dy does not consider not parallel angle [alpha] between light beam between these second direction interferometer two light beams
yThe time distance.
7. the compensation method of not parallel angle is characterized in that between light beam as claimed in claim 6, and the light beam light path compensating gage when compensating the not parallel angle of this second direction interferometer is calculated formula and is:
l
y1＝Y
C-dy*R
zx；l
y2＝Y
C-0.5*Y
C*α
y 2+dy*R
zx；
Wherein, l
y1, l
y2 are respectively the corresponding light path of these second direction interferometer two light beams, Y
C, R
ZxFor this base station along current this second direction measuring position that second direction steps to and the corresponding anglec of rotation, α
yBe the not parallel angle that exists between these second direction interferometer two light beams, dy does not consider not parallel angle [alpha] between light beam between these second direction interferometer two light beams
yThe time distance.
8. the compensation method of not parallel angle between light beam as claimed in claim 1; It is characterized in that the mode through this first, second direction interferometer beam of firmware adjustment when compensating the not parallel angle of this first direction interferometer and this second direction interferometer respectively realizes.
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|---|---|---|---|
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|---|---|---|---|
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|---|---|---|---|---|
| US5790253A (en) * | 1996-04-05 | 1998-08-04 | Nikon Corporation | Method and apparatus for correcting linearity errors of a moving mirror and stage |
| US5995225A (en) * | 1995-12-04 | 1999-11-30 | Nikon Corporation | Method for measuring orthogonality in a stage of an exposure apparatus |
| CN1371028A (en) * | 2001-02-15 | 2002-09-25 | 佳能株式会社 | Exposure equipment with interferometer system |
| CN1538245A (en) * | 2003-04-17 | 2004-10-20 | Asml | Lithographic apparats, apparatus manufacturing method and computer program |
| US7321432B2 (en) * | 2002-09-09 | 2008-01-22 | Zygo Corporation | Measurement and compensation of errors in interferometers |
| CN101276151A (en) * | 2008-05-14 | 2008-10-01 | 上海微电子装备有限公司 | Method and apparatus for measuring wafer surface flatness |
| CN101634810A (en) * | 2008-07-21 | 2010-01-27 | 财团法人工业技术研究院 | Stepping arrangement type interference microlithography and system thereof |
-
2010
- 2010-12-16 CN CN201010592293.9A patent/CN102540738B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5995225A (en) * | 1995-12-04 | 1999-11-30 | Nikon Corporation | Method for measuring orthogonality in a stage of an exposure apparatus |
| US5790253A (en) * | 1996-04-05 | 1998-08-04 | Nikon Corporation | Method and apparatus for correcting linearity errors of a moving mirror and stage |
| CN1371028A (en) * | 2001-02-15 | 2002-09-25 | 佳能株式会社 | Exposure equipment with interferometer system |
| US7321432B2 (en) * | 2002-09-09 | 2008-01-22 | Zygo Corporation | Measurement and compensation of errors in interferometers |
| CN1538245A (en) * | 2003-04-17 | 2004-10-20 | Asml | Lithographic apparats, apparatus manufacturing method and computer program |
| CN101276151A (en) * | 2008-05-14 | 2008-10-01 | 上海微电子装备有限公司 | Method and apparatus for measuring wafer surface flatness |
| CN101634810A (en) * | 2008-07-21 | 2010-01-27 | 财团法人工业技术研究院 | Stepping arrangement type interference microlithography and system thereof |
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