CN102522282B - Optical fiber waveguide type light-modulated field-emission nanometer cathode and preparation method thereof - Google Patents
Optical fiber waveguide type light-modulated field-emission nanometer cathode and preparation method thereof Download PDFInfo
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- CN102522282B CN102522282B CN201110384129.3A CN201110384129A CN102522282B CN 102522282 B CN102522282 B CN 102522282B CN 201110384129 A CN201110384129 A CN 201110384129A CN 102522282 B CN102522282 B CN 102522282B
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Abstract
The invention discloses an optical fiber waveguide type light-modulated field-emission nanometer cathode and a preparation method thereof. The light-modulated field-emission nanometer cathode refers to preparing a field-emission nanometer cathode on the surface of an optical fiber, and the laser transmits the light energy to the field-emission cathode during the process of transmitting along the optical fiber to start a nanometer cold cathode near the field-emission threshold under the action of a light field so as to realize a light-modulated field-emission cold cathode. Therefore, the invention provides a novel electron source of miniature high-frequency light pulse-modulated field-emission cold cathodes for microwave components and ultrafast electron diffraction systems or ultrafast electron microscopy technology.
Description
Technical field:
The invention belongs to cathode electronics field, relate to field-transmitting cathode and the manufacture method thereof of the modulation of a kind of light field, especially a kind of mode by fibre-optic waveguide, light field being coupled to Flied emission nanometer cathode.
Background technology:
Vacuum electron device, due to its irreplaceable advantage in high power, high-frequency, is still generally used in satellite communication, the fields such as national defence.Electron source is the indispensable vitals of all kinds of vacuum electron device.Current hot cathode is more and more difficult to the more high power adapting to the proposition of novel microwave device, higher frequency, the requirement of lightweight compact.Due to the moment opening feature and high current density providing capability of field emission cold-cathode, field emission cold-cathode is adopted to be counted as following high frequency, the trend of high power vacuum electron device development.
In HIGH-POWERED MICROWAVES devices field, usually require that device exports transient high power, this requires that electron source is operated in pulse heavy current pattern.Current heavy current beam pulse encourages traditional hot cathode to produce by high-voltage pulse usually.But high-voltage pulse is due to the high voltage pulse coordinative composition of equipments needing the scale of construction huge, is unfavorable for the miniaturization of device; Hot cathode used also limits the further raising of its current output capability to a certain extent.If pulse laser can be adopted to excite field emission cold-cathode, then not only may export high Flied emission electric current within the extremely short time, and greatly can reduce the volume of device or equipment.
Another important application of laser excitation emitting cathode is ultrafast electric diffraction and ultrafast electron microscope technique.What traditional transmission electron microscope adopted is the exposure of continuous electronic bundle, obtain micro-image and to have no time the resolution of axle.In order to study solid material the Middle molecule even ultrafast process of atomic level, as formation or the fracture of valence link, a kind of ultrafast electron microscope (ultrafast electron microscopy) is just causing material, the showing great attention to of biological and chemical field.The key of ultrafast electron microscope is ultrafast pulse electron beam, in order to obtain enough exposure doses in ultra-narrow pulse, requires that negative electrode is obtaining high current density instantaneously.Hot cathode and traditional field-transmitting cathode are all difficult to meet the demands, and the field-transmitting cathode that ultrafast laser excites is hopeful to meet a kind of Pulse Electric component that ultrafast electron microscope requires most.Therefore propose the Flied emission nanometer cold negative electrode of a kind of light pulse modulation, namely optical fiber waveguide type light-modulated field-emission negative electrode promotes the development of ultrafast electron microscopic imaging, high power pulse microwave device technology.
Summary of the invention:
Problem to be solved by this invention is, proposes a kind of implementation method of new laser excitation Flied emission nanometer cold negative electrode.Thus provide a kind of novel microminiaturized high frequency light pulse modulation field emission cold-cathode electronic source for microwave device and following ultrafast electric diffraction system or ultrafast electron microscope technique.Thus promote the development of high performance microwave vacuum electron device and ultrafast electronic analysis technology.
To achieve these goals, the technical solution used in the present invention is:
A kind of optical fiber waveguide type light-modulated field-emission nanometer cathode, comprises fibre-optic waveguide and the nanometer cold negative electrode being coated on fibre-optic waveguide surface; Layer of transparent conductive layer is provided with between described nanometer cold negative electrode and fibre-optic waveguide; Described fibre-optic waveguide is made up of fibre core and covering; The clad section of described fibre-optic waveguide is removed;
Described fibre-optic waveguide is silica fiber, polymer optical fiber or other material optical fiber.
Described nanometer cold negative electrode can be single 1-dimention nano negative electrode, many 1-dimention nano negative electrodes, 1-dimention nano cathode array, single two-dimensional nano negative electrode or multi-disc two-dimensional nano negative electrode, two-dimensional nano cathode arrays.
Described single 1-dimention nano negative electrode is single-root carbon nano-tube, single zinc oxide nanowire or single piece of metal nano wire; Described many 1-dimention nano negative electrodes are many carbon nano-tube, many zinc oxide nanowires or many metal nanometer lines; Described single two-dimensional nano negative electrode is nano graphite flakes; Described multi-disc two-dimensional nano negative electrode is multi-disc nano graphite flakes.
Described layer of transparent conductive layer is the conductive layer be connected to form by contacting with each other bottom nanometer cathode or the transparency conducting layer made separately.
Described layer of transparent conductive layer is coated on the optical fiber surface partly or entirely removing covering.
The transparency conducting layer of described independent making at least comprises and is selected from ITO, FTO, AZO, YZO or Graphene.
Described 1-dimention nano cathode array at least comprises the carbon nano pipe array aligned and the zinc oxide nano-wire array aligned; Described multi-disc two-dimension graphite sheet at least comprises the array of the nano graphite flakes aligned that they are formed.
The preparation method of described optical fiber waveguide type light-modulated field-emission nanometer cathode, by the clad section on fibre-optic waveguide or all remove, makes light part when this section is propagated to overflow waveguide surface; Then nanometer field emission cold-cathode array is integrated in this section surface of fibre-optic waveguide, thus realizes the coupling of laser to field-transmitting cathode tip; When exciting light is incorporated into Flied emission nanometer cold cathode point by optical fiber, the nanometer cold negative electrode being in Flied emission Near Threshold is opened under the effect of light field, thus obtain Flied emission nanometer cold negative electrode.
A preparation method for optical fiber waveguide type light-modulated field-emission nanometer cathode, comprises the steps:
(1) the thinning or clad section removed on fibre-optic waveguide;
(2) transparency electrode is made on fibre-optic waveguide surface;
(3) Flied emission nanometer cathode is prepared;
(4) optical fiber waveguide type light-modulated field-emission nanometer cathode fibre core being coated with transparency electrode having Flied emission nanometer cathode is achieved.
The present invention adopts a kind of optical fiber waveguide type light-modulated field-emission negative electrode, realizes laser excitation Flied emission nanometer cold negative electrode.The electron source of this nanometer cathode structure has following significant advantage: 1. the speed-altitude of electron emission is consistent, without the need to velocity modulation to density modulation transition zone between, thus whole device overall dimension is reduced greatly; 2. being separated of power emitter and electron collector can be realized; 3. the omission of speed governing part, power output pole all can make device efficiency significantly improve with being separated of collector; 4. can be integrated with semiconductor laser device, thus the less microwave device of volume can be realized.
Accompanying drawing illustrates:
Fig. 1 optical fiber structure schematic diagram;
The optical fiber interlude covering that Fig. 2 removes coat removes the thinning schematic diagram of two ends covering;
The optical fiber interlude covering removal two ends covering that Fig. 3 removes coat subtracts vertical view;
Part of clad, the fibre core of Fig. 4 optical fiber are coated with ELD;
The part of clad of Fig. 5 optical fiber, fibre core are coated with ELD vertical view;
Fig. 6 is coated with the nano wire that the optical fiber of transparency electrode grows;
Fig. 7 is coated with the nano wire vertical view that the optical fiber of transparency electrode grows;
Fig. 8 optical fiber waveguide type light-modulated field-emission cathode construction schematic diagram;
Wherein: 1 is fibre core; 2 is covering; 3 is transparency electrode; 4 is nano wire; 5 is coat.
Embodiment:
Below in conjunction with accompanying drawing, the present invention is described in further detail:
With reference to accompanying drawing 1-8, specific embodiment of the invention scheme is as follows:
Embodiment 1:
1) the thinning or removal of fiber cladding.What this scheme was selected is Silica-Based Optical Fibers, and the main component of its fibre core and covering mixes the SiO of refractive index different dopant
2, coat is macromolecule resin polymer acrylate.Structure as shown in Figure 1.First with blade or peeling plier or with hot sulfuric acid corrosion removing coat, and use propyl alcohol, the ultrasonic cleaning of alcohol organic solvent clean dry more respectively.Then covering is corroded with hydrofluoric acid HF.The buffered etch liquid that corrosive liquid is made up of by 3: 1 ammoniacal liquor and HF acid.Observe extent of corrosion under a scanning electron microscope, take out when covering erodes to general with core diameter size in corrosive liquid, finally use deionized water ultrasonic cleaning clean.
Or adopt the writing of indictments, appeals, etc. to remove coat and the covering of optical fiber.Used in experiment in order there to be the writing of indictments, appeals, etc. of handle of a knife, the blade sharper of head is small and exquisite, grinds and scrapes, can make covering and fibre core natural separation through carefulness.
2) optical fiber surface sputtering ITO.Sputter target material is ITO target, In
2o
3: SnO
2mass ratio be 90%: 10%, purity is 99.99%.Above-mentioned 1) optical fiber prepared in is as substrate.The ultrasonic cleaning of substrate acetone, alcohol difference after 10 minutes, then uses washed with de-ionized water 10 minutes, cleans totally dry under nitrogen protection.During sputtering chamber sputter coating, the distance of ITO range substrate is 7.0cm.Background vacuum is 3.0 × 10
-6pa, ar pressure is 0.3Pa, argon flow amount 12.0cm
3/ min, sputtering power is 150w, and the plated film time is 10min.
Or adopt sol-gel method to prepare ito thin film.With InCl
34H
2o and SnCI
45H
2o is predecessor, is dissolved in absolute ethyl alcohol, and adds appropriate distilled water, is made into homogeneous phase solution, and forms vitreosol after at room temperature leaving standstill 48h through stirring.Collosol concentration is taken as 1%, and indium tin ratio is 4: 1, gets rid of film speed 1500r/min, gets rid of film time 20 ~ 30s.Through the fiber core of ultrasonic cleaning cleaning as substrate, get rid of the substrate after film and be placed in tube furnace immediately and heat-treat, make 1) in preparation fiber core on obtain ito thin film.Heat treatment initial temperature 400 DEG C, heat treatment temperature 450 DEG C, heat treatment time 20min, plated film 8 times.
Or adopt MOCVD method to prepare ito thin film at optical fiber surface.Select indium, tin organo-metallic compound as former material, produce ito thin film by metallorganic chemical vapor deposition method (MOCVD).With Indium Tris acetylacetonate [In (C
5h
7o
2)
3] and tetramethyl tin [(CH
3)
4sn] be raw material, at 300 DEG C, produce ito thin film by the thermal decomposition in chemical vapor deposition processes and in-situ oxidation, its reaction equation is:
2ln (C
5h
7o
2)
3(gas)+36O
2(gas) → In
2o
3(Gu)+30CO
2(gas)+21H
2o (gas) (1)
(CH
3)
4sn (gas)+8O
2(gas)-SnO
2(Gu)+4CO
2(gas)+6H
2o (gas) (2)
3) ZnO is sputtered brilliant.With rf magnetron sputtering making ZnO inculating crystal layer.Sinter in 1200 DEG C of air after target ZnO powder pressure target and form.Above-mentioned 2) in, the optical fiber being covered with transparency electrode of preparation is as substrate.99.99%O
2mix as reacting gas according to 1: 1 ratio with Ar.Base vacuum is 10
-4pa, operating pressure is that 3.0Pa. underlayer temperature and sputtering power are respectively 380
DEG C and 100W. sputtered film thickness in sputtering chamber be that the ZnO film prepared is placed in 750 DEG C of air 1h that anneals and makes ZnO seed crystal by 120nm..
4) aqua-solution method growing ZnO nano-wire.The molar concentration 20mmol zinc acetate (Zn (CH such as preparation
3cOO)
22H
2and hexa (C O)
6h
12n
4) aqueous solution, and add the ammonium hydroxide that concentration is 28%, then by 3) in vertically place in the solution with the optical fiber of ZnO inculating crystal layer, 16h is left standstill in 95 DEG C of constant temperature water baths, after growth terminates, also dry by ethanol, rinsed with deionized water, obtain Flied emission nanometer cathode material ZnO nano-wire.
Embodiment 2:
1) the thinning or removal of fiber cladding.Select Silica-Based Optical Fibers, the main component of its fibre core and covering is SiO
2, coat is macromolecule resin polymer acrylate.Structure as shown in Figure 1.First remove optical fiber coating.The optical fiber acetone organic solvent cleaned up is soaked, removes totally until surface coating layer and take out from organic solvent, then carefully clean the residue on naked fine surface.Or use laser ablation optical fiber coating.Select that wavelength is 10.6 μm, repetition rate is 2Hz, umber of pulse is 20, and pulse energy density is 250mJ/cm
2infrared TEA CO
2laser; Or with wavelength be 248nm, repetition rate is 1000Hz, umber of pulse is 800, and pulse energy density is 452mJ/cm
2krF excimer laser remove fiber coating.Fiber cladding is removed again with optical fiber stripper.First optical fiber is placed on calcination on alcolhol burner, covering is charred grey shape, and then soak with highly purified alcoholic solution and then clean, last remaining charcoal ash residue blade just can be removed.
2) optical fiber surface makes FTO transparency electrode.Sol-gel method is adopted to prepare FTO film.Get SnCl
2, H
2o is dissolved in absolute ethyl alcohol, doping F: Sn (mol) ratio 0.26, at 80 DEG C of backflow 3 ~ 5h.Slowly drip water and alcohol mixeding liquid in proportion, water: alcohol (volume), than being 0.75, at 80 DEG C of backflow 1 ~ 3h, in the scope of adjust ph to 1.5 ~ 3, adding formamide, adds NH
4the F aqueous solution, the solution left standstill 24h prepared is stand-by.With 1) in the optical fiber for preparing be substrate, after distilled water cleaning, soak with aqueous acetone solution and clean 10 ~ 30min in supersonic wave cleaning machine, for subsequent use after drying.Substrate is fixed on and gets rid of on film machine, get rid of film with the rotating speed of 1400r/min, then dry 15min in 100 DEG C of vacuum drying chambers, then put into Muffle furnace, slowly heat to 600 DEG C and constant temperature 10min.Get rid of membrane process 2-4 times more than repeating, finally prepare FTO transparency electrode at optical fiber surface.
Or adopt spray pyrolysis to prepare FTO film.Take ethanol as solvent, adopt spray bottle to be atomising device, 1) in transparency electrode FT0 film prepared by the optical fiber for preparing.Take 14.2g SnCI respectively
45H
2o, is ultrasonicly dissolved in the dense HCl of 5mL; By 2.83g NH
4f is dissolved in 22mL ultra-pure water, then joins in above-mentioned solution, is diluted to 50mL with ethanol, can obtain SnCI
4concentration is 0.81mol/L, NH
4f concentration is the spray pyrolysis liquid of 1.53mol/L.Using 1) in the optical fiber for preparing as substrate, use propyl alcohol, alcohol and deionized water rinsing clean successively, then in electric heating constant-temperature blowing drying box after 105 DEG C of dry 10min, electric hot plate be heated to 350 ~ 500 DEG C.To spray bottle for atomising device, nozzle distance substrate is about 20cm and sprays.Spray 20 times, interval 10 ~ 15s is answered in adjacent twice spraying.The FTO film prepared, after naturally cooling to room temperature.
3) RF plasma deposited method method carbon nano-tube.Adopt RF plasma deposited method method (RFPECVD) 2) in carried out transparency electrode optical fiber on carbon nano-tube.To carry out the optical fiber of transparency electrode as substrate, ultrasonic cleaning 20min in acetone and ethanol is also dry.Ni (the NO of compound concentration 1mol/L respectively
3)
2solution, substrate is used sol evenning machine with the speed spin coating Ni (NO of 5krpm
3)
2solution, then toasts 1h in constant temperature 100 DEG C of vacuum bakeout casees, obtains surface containing Ni (NO
3)
2the substrate of catalyst.The substrate prepared is put into heated filament and radio frequency plasma composite chemical gas-phase deposition system, reative cell is evacuated to 10
-3pa, passes into N
2gas, under nitrogen atmosphere by silicon to 500 DEG C, passes into H after heating 30min again
2gas reduces, H
2and N
2ratio is 1: 4, and the recovery time is 60min.Subsequently under the underlayer temperature of maintenance 500 DEG C, pass into CH
4gas, makes gas ratio be CH
4: H
2: N
2=5: 1: 1, reaction pressure is 28Pa, and open radio-frequency power supply, power setting is 150W, at N after reaction 45min
2be cooled to normal temperature in gas, obtain the long optical fiber waveguide type light-modulated field-emission nanometer cathode having carbon nano-tube of substrate surface.
Embodiment 3:
1) the thinning or removal of fiber cladding.This scheme selects sulfur selenium tellurium compound optical fiber, polyamide coat, S-Se covering, and As-Se-Te fibre core.Remove polyamide coat.Except polyamide coat can select organic solvent methyl alcohol, acetone, carbon tetrachloride, wherein best solvent is four neoprene one alcohol.Optical fiber is immersed in four neoprene one alcoholic solvents, takes out after 3 ~ 4min, ultrasonic cleaning at once after taking out is also dry; Remove S-Se covering.The above-mentioned optical fiber eliminating coat is immersed in the NaOH solution of 0.2mol/L, at room temperature takes out after about 18h and just can wash off S-Se covering.
2) optical fiber surface makes AZO transparency electrode.Adopt magnetron sputtering method 1) in the optical fiber surface for preparing prepare AZO transparency electrode.Shielding power supply is DC power supply, and adopt invariable power pattern, sputtering power is 6400W, and power density is 5.86W/cm
2.Sputtering target material is that the ZnO of purity 99.95% is mixed with 2%Al
2o
3(wt%) target.The distance of target and substrate is 80mm.Sputtering chamber base vacuum 1.0 × 10
-3pa, working gas is high-purity argon gas 85%Ar and 15%H
2gaseous mixture, operating pressure maintains 0.5Pa.Substrate is 1) in the optical fiber for preparing, after organic solvent and washed with de-ionized water are totally dried, be placed on substrate swivel mount, after isolation ward 200 DEG C of preheatings, at the uniform velocity enter sputtering chamber deposition AZO rete.
Or make YZO transparency electrode at optical fiber surface.Adopt radio-frequency magnetron sputter method MIS-500B type superhigh vacuum magnetron sputtering and ion beam sputtering combination plant 1) in YZO film prepared by ready optical fiber.Target is ZnO: Y
2o
3ceramic target, target diameter 76.2cm, thickness 5mm, Y
2o
3doping be 3.0% (mass fraction), Y
2o
399.95% is with the purity of ZnO.Substrate is 1) in the optical fiber for preparing, substrate through acetone, alcohol and deionized water ultrasonic cleaning, and is placed in baking box and dries.The distance of substrate and target is 4.5cm.The base vacuum of sputtering chamber is 1.5 × 10
-4pa.Before thin film deposition, first pre-sputtering 30min is to remove the impurity on target surface.Sputter gas is 99.999% high-purity argon gas, and argon flow amount is 30mL/min, and sputtering pressure excursion is 2Pa, and sputtering power is 50W.
3) vapour deposition process prepares carbon nano-tube.This scheme selects rated temperature to be the tube type resistance furnace of 1000 DEG C, 2) optical fiber prepared in is the growth substrate of carbon nano-tube.Taking 5g catalyst ferrocene crystal is dissolved in 100ml mono-toluene, leaves standstill more than 24 hours.Substrate ultrasonic cleaning 30min is also dried, and pushes constant temperature position, tube type resistance furnace quartz reaction chamber.Pass into nitrogen, flow is 100ml/min, is warming up to 800 DEG C.Adjust nitrogen flow again to 1000ml/min, and pass into hydrogen, hydrogen flowing quantity is 400ml/min.The dimethylbenzene reactant liquor prepared is placed in reaction bulb, inserts woven hose and the other end of woven hose inserted in the conduit of carrier gas pipe nitrogen, and adjust flux 10/min.After reaction 30min, stop passing into hydrogen, turn nitrogen flow down, make reaction under nitrogen protection gas, be cooled to normal temperature and take out, so far achieve be coated with transparency electrode fibre core on have the optical fiber waveguide type light-modulated field-emission nanometer cathode of carbon nano-tube.
Present invention achieves a kind of Laser pulse modulator Flied emission nanometer cold negative electrode, promote the development of high performance microwave vacuum electron device and ultrafast electronic analysis technology.The great emerging applications such as ultrafast electron microscopic imaging, high power pulse microwave device are just being limited to the development of burst pulse electron source technology.Current burst pulse (< nS) adopts high-voltage pulse to excite to produce usually.Because high-voltage pulse power source is bulky, its application is extremely restricted.Light pulse exciting field emitting cathode is a new thinking, and principle has the advantage of easy modulation, high efficiency and ultra-high frequency.For this problem, the present invention proposes the Flied emission nanometer cold negative electrode of a kind of light pulse modulation, to realizing a kind of high efficiency compact burst pulse field emitting electronic source.Promote the development of ultrafast pulse field emission electron source technology.
The above, it is only preferred embodiment of the present invention, not any pro forma restriction is done to the present invention, although the present invention discloses as above with preferred embodiment, but and be not used to limit the present invention, any those skilled in the art, do not departing within the scope of technical solution of the present invention, when the method and technology contents that can utilize above-mentioned announcement are made a little change or be modified to the Equivalent embodiments of equivalent variations, in every case be the content not departing from technical solution of the present invention, according to any simple modification that technical spirit of the present invention is done above embodiment, equivalent variations and modification, still belong in the scope of technical solution of the present invention.
Claims (4)
1. an optical fiber waveguide type light-modulated field-emission nanometer cathode, is characterized in that: comprise fibre-optic waveguide and the nanometer cold negative electrode being coated on fibre-optic waveguide surface; Layer of transparent conductive layer is provided with between described nanometer cold negative electrode and fibre-optic waveguide; Described fibre-optic waveguide is made up of fibre core and covering; The clad section of described fibre-optic waveguide is removed;
Described nanometer cold negative electrode is single 1-dimention nano negative electrode, many 1-dimention nano negative electrodes, 1-dimention nano cathode array, single two-dimensional nano negative electrode or multi-disc two-dimensional nano negative electrode, two-dimensional nano cathode arrays;
Described layer of transparent conductive layer is the conductive layer be connected to form by contacting with each other bottom nanometer cathode or the transparency conducting layer made separately;
Described layer of transparent conductive layer is coated on the optical fiber surface partly or entirely removing covering;
The transparency conducting layer of described independent making at least comprises and is selected from ITO, FTO, AZO, YZO or Graphene;
Described single 1-dimention nano negative electrode is single-root carbon nano-tube, single zinc oxide nanowire or single piece of metal nano wire; Described many 1-dimention nano negative electrodes are many carbon nano-tube, many zinc oxide nanowires or many metal nanometer lines; Described single two-dimensional nano negative electrode is nano graphite flakes; Described multi-disc two-dimensional nano negative electrode is multi-disc nano graphite flakes;
Described 1-dimention nano cathode array at least comprises the carbon nano pipe array aligned and the zinc oxide nano-wire array aligned; Described multi-disc nano graphite flakes at least comprises the array of the nano graphite flakes aligned that they are formed.
2. optical fiber waveguide type light-modulated field-emission nanometer cathode as claimed in claim 1, is characterized in that: described fibre-optic waveguide is silica fiber, polymer optical fiber or other material optical fiber.
3. the preparation method of optical fiber waveguide type light-modulated field-emission nanometer cathode as claimed in claim 1 or 2, it is characterized in that: by the clad section on fibre-optic waveguide or all remove, make light upload sowing time part at the fibre-optic waveguide of removal unit subcontract layer or whole coverings and to overflow waveguide surface; Then nanometer field emission cold-cathode array is integrated in the surface that fibre-optic waveguide eliminates part of clad or whole covering, thus realizes the coupling of laser to field-transmitting cathode tip; When exciting light is incorporated into Flied emission nanometer cold cathode point by optical fiber, the nanometer cold negative electrode being in Flied emission Near Threshold is opened under the effect of light field, thus obtain Flied emission nanometer cold negative electrode.
4. a preparation method for optical fiber waveguide type light-modulated field-emission nanometer cathode as claimed in claim 3, is characterized in that, comprises the steps:
(1) the thinning or clad section removed on fibre-optic waveguide;
(2) transparency electrode is made on fibre-optic waveguide surface;
(3) Flied emission nanometer cathode is prepared;
(4) optical fiber waveguide type light-modulated field-emission nanometer cathode fibre core being coated with transparency electrode having Flied emission nanometer cathode is achieved.
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| Laser irradiation effect on electron field emission properties of carbon nanotubes;Hsiu-Fung cheng;《Diamond and Related Materials 》;20040412;第13卷(第4期);1004-1007 * |
| Optical Fiber/Nanowire Hybrid Structures for Efficient Three-Dimensional Dye-Sensitized Solar Cells;Weintraub B;《Angewandte Chemie》;20091022;第121卷(第47期);9143-9147 * |
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