CN102508327A - Method for preparing aluminum and silicon carbide composite material reflector with high volume fraction - Google Patents

Method for preparing aluminum and silicon carbide composite material reflector with high volume fraction Download PDF

Info

Publication number
CN102508327A
CN102508327A CN2011103425442A CN201110342544A CN102508327A CN 102508327 A CN102508327 A CN 102508327A CN 2011103425442 A CN2011103425442 A CN 2011103425442A CN 201110342544 A CN201110342544 A CN 201110342544A CN 102508327 A CN102508327 A CN 102508327A
Authority
CN
China
Prior art keywords
mirror base
silicon carbide
composite material
reflector
grinding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN2011103425442A
Other languages
Chinese (zh)
Other versions
CN102508327B (en
Inventor
舒阳会
刘韵妍
万绍平
胡娟
海春英
王长青
张晓武
宋军
苏蓉
刘金峰
何芳
胡盛青
李彬
谭春林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hunan Hangtian Chengyuan Precision Machinery Co Ltd
Original Assignee
Hunan Hangtian Chengyuan Precision Machinery Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hunan Hangtian Chengyuan Precision Machinery Co Ltd filed Critical Hunan Hangtian Chengyuan Precision Machinery Co Ltd
Priority to CN201110342544.2A priority Critical patent/CN102508327B/en
Publication of CN102508327A publication Critical patent/CN102508327A/en
Application granted granted Critical
Publication of CN102508327B publication Critical patent/CN102508327B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Polishing Bodies And Polishing Tools (AREA)

Abstract

The invention discloses a method for preparing an aluminum and silicon carbide composite material reflector with a high volume fraction. The method comprises the following steps of: (1) preparing a reflector blank by using an aluminum and silicon carbide composite material with the volume fraction of 70 percent; (2) roughly grinding by using a 180-mesh diamond grinding wheel on a planar grinding machine; (3) performing primary thermal treatment on the reflector blank; (4) finely grinding the reflector blank, namely finely grinding a reference surface and the other surface of the reflector blank by using a 200-mesh diamond grinding wheel on the planar grinding machine; (5) performing stabilization treatment; (6) regrinding the reflector blank; (7) chemically plating a nickel and phosphor alloy on the reflector blank; (8) performing secondary thermal treatment, preserving the temperature of 350+-20 DEG C for 60 minutes, and cooling in a furnace; and (9) optically grinding the reflector blank to until the surface roughness is Ra0.012 mu m. The reflectivity of the reflector prepared by the method is 97 percent; the surface of the reflector does not have a diaphragm; the thermal expansion coefficient of the reflector is less than 7.5*10<-6>/k; and the thermal conductivity is 180 W/m.k.

Description

The preparation method of the aluminum silicon carbide composite material catoptron of high-volume fractional
Technical field
The present invention relates to a kind of preparation method of aluminum silicon carbide composite material catoptron of high-volume fractional.Especially the grinding of aluminum silicon carbide composite material mirror base, the control of coating rate of sedimentation and mirror mirror optical grinding technology.
Background technology
Characteristics such as aluminum silicon carbide composite material has light weight, thermal conductivity is high, thermal expansivity is low, specific strength height are widely used in Electronic Packaging and the manufacturing of exact instrument critical component.The optical mirror of existing report adopts the report of the aluminum silicon carbide composite material catoptron base chemical nickel phosphorus plating of 36% volume-fraction carborundum, is to adopt behind secondary soaking zinc, the alkaline chemical nickel-plating acid chemical plating nickel phosphorus again.Behind the chemical plating nickel-phosphorus alloy, characteristics such as coating has acidproof, alkaline-resisting, wear-resisting and hardness height, but this process is complicated.Catoptron is to be processed into by the aluminum silicon carbide composite material of low volume fraction, and its thermal expansivity is 10 * 10 -6About/k.General Ginding process is used for the aluminum silicon carbide composite material nickel-phosphorus coating and grinds, and the coating surface cut is many, and mirror surface is prone to produce aperture.Its range of application is less, can not be applicable to the mirror surface that auto industry and space technology are used.Auto industry and space technology development at present presses for a kind of thermal expansivity less than 8.5 * 10 rapidly -6/ k, reflectivity are 96%, and mirror surface does not have aluminum matrix composite (aluminum silicon carbide composite material that the is called for short high-volume fractional) catoptron of the high-volume fractional silicon-carbide particle enhancing of aperture.The one Chinese patent application that the applicant has applied for numbers 201110101412.0 discloses the aluminium base silicon carbide particle reinfored composite material method of a kind of preparation high-volume fractional and 201110259096.X discloses a kind of aluminum silicon carbide composite material chemical plating nickel-phosphorus alloy on surface technology, but does not also report the preparation method of the aluminum silicon carbide composite material catoptron of whole high-volume fractional at present.
The object of the present invention is to provide a kind of volume fraction is the preparation method of 70% aluminum silicon carbide composite material catoptron.To realize that its thermal expansivity is less than 8.0 * 10 -6/ k; Can make the face deformation shape of catoptron minimum, roughness is low, and the reflectivity that makes catoptron is that mirror surface does not have aperture more than 96%; Applied widely, can be applicable to the catoptron that auto industry and space technology are used.
Technical scheme of the present invention is: may further comprise the steps:
(1) using volume fraction is that 70% aluminum silicon carbide composite material prepares the mirror base, and its thermal expansivity is 7.5 * 10 -6/ k;
(2) corase grind of mirror base: roughly grind with 180 order skives at surface grinding machine; If with being higher than 180 order skives corase grind, then emery wheel is prone to stop up; Be lower than 180 order skives corase grind, then roughness does not reach requirement, for the subsequent fine grinding belt comes difficulty;
(3) thermal treatment first time of mirror base is 300~350 ℃ of insulations 60 minutes in temperature, cools off with stove; Otherwise the crystal grain of aluminum silicon carbide composite material can be grown up, and thermal expansivity increases;
(4) correct grinding of mirror base: at the reference field and the another side of surface grinding machine with 2000 order skives correct grinding mirror base;
(5) stabilization processes of mirror base:
1. the mirror base is put into heating furnace,, be incubated 3~5 hours at 150~250 ℃;
2. fast the mirror base is taken out and put into heat-preserving container, add-180~220 ℃ of liquid nitrogen, and high appearance base top 25~40mm, be incubated 1~3 hour;
3. take out the mirror base and put into heating furnace again,, be incubated 3~5 hours at 150~250 ℃;
4. according to 2. going on foot and 3. going on foot repetitive operation once, cool off with stove;
(6) grinding again of mirror base: with the Al of muller and 0.5~1 μ m 2O 3Abrasive material grinds the mirror base, makes flatness reach 0.008~0.01 mm, and surfaceness reaches Ra0.02 μ m;
(7) chemical plating nickel-phosphorus alloy of mirror base, control PH is 3.5~4.0, and plating temperature is 80~85 ℃, and plating speed is 3.5~5.0 μ m/hr; Reach coating 100~120 μ m;
(8) thermal treatment for the second time 350 ± 20 ℃ of insulations of temperature 60 minutes, is cooled off with stove;
(9) optical grinding: the Al that adopts muller and 0.3~0.5 μ m 2O 3Abrasive material grinds mirror coating, reaches Ra0.012 μ m.
Said catoptron is of a size of 150 * 150 * 10mm.
The present invention is that 70% aluminum silicon carbide composite material mirror base grinds processing to volume fraction, thermal treatment, and correct grinding grinds again, guarantees mirror plane degree and roughness; Through the pH value and the plating temperature of control plating bath, it is tiny to reach the crystallization of coating nickel-phosphorus alloy; Coating thermal treatment is increased coating hardness, be convenient to optical grinding; Prepared volume fraction is that 70% aluminum silicon carbide composite material reflectance of reflector reaches 97%, and mirror surface does not have aperture; Thermal expansivity is 7.5 * 10 -6/ k, thermal conductivity is 180W/m.K.Simple, the easy to operate cost of technology of the present invention is low, widely applicable, can realize suitability for industrialized production.
Embodiment
Below in conjunction with instance the present invention is described further.
Embodiment 1
(1) selecting volume fraction for use is that 70% aluminium base silicon carbide particle reinfored composite material prepares the mirror base: the mirror base is of a size of 150 * 150 * 10mm;
(2) corase grind of mirror base: roughly grind Ra0.2 μ m at surface grinding machine with 180 order skives;
(3) thermal treatment for the first time 300 ℃ of insulations of temperature 60 minutes, is cooled off with stove;
(4) correct grinding: with surface grinding machine and 2000 order skives correct grinding reference field and another side, reach Ra0.02 μ m again;
(5) 1. the stabilization processes of mirror base puts into heating furnace with the mirror base, is warming up to 190 ℃, is incubated after 4 hours; 2. fast the mirror base is taken out and puts into heat-preserving container, add liquid nitrogen (196 ℃) from the bottom of heat-preserving container, the high appearance base of liquid nitrogen peak 30mm, protect 2 hours in this state after; 3. take out the mirror base and put into heating furnace and be warming up to 190 ℃ again, be incubated 4 hours; 4. again the mirror base is taken out, put into heat-preserving container, according to 2. going on foot and 3. going on foot repetitive operation once; Cool off with stove
(6) grinding again of mirror base: with the Al of muller and 1 μ m 2O 3Abrasive material grinds the mirror base, makes flatness reach 0.008 mm, and surfaceness reaches Ra0.02 μ m;
(7) chemical plating nickel-phosphorus alloy of mirror base, control PH is 4.0, and plating temperature is 85 ℃, and plating speed is 3.5 μ m/hr; Reach coating 120 μ m;
(8) thermal treatment for the second time 350 ℃ of insulations of temperature 60 minutes, is cooled off with stove;
(9) optical grinding: the Al that adopts muller and 0.5 μ m 2O 3Abrasive material grinds mirror coating, and reaching flatness is 0.008 mm, Ra0.012 μ m.
Through the aluminum silicon carbide composite material catoptron of above step preparation, coating is incubated shrend after 60 minutes through 400 ℃, and coating does not come off, and does not also crack and bubbles; The physical property of sampling and measuring aluminum silicon carbide composite material, thermal expansivity are 7.5 * 10 -6/ k, thermal conductivity is 180W/m.K.Through practical application, reflectivity reaches 97%, and mirror surface does not have aperture.

Claims (2)

1. the preparation method of the aluminum silicon carbide composite material catoptron of high-volume fractional is characterized in that, may further comprise the steps:
(1) using volume fraction is that 70% aluminum silicon carbide composite material prepares the mirror base;
(2) corase grind of mirror base: roughly grind with 180 order skives at surface grinding machine;
(3) thermal treatment first time of mirror base is 300~350 ℃ of insulations 60 minutes in temperature, cools off with stove;
(4) correct grinding of mirror base: at the reference field and the another side of surface grinding machine with 2000 order skives correct grinding mirror base;
(5) stabilization processes of mirror base:
1. the mirror base is put into heating furnace,, be incubated 3~5 hours at 150~250 ℃;
2. fast the mirror base is taken out and put into heat-preserving container, add-180~220 ℃ of liquid nitrogen, and high appearance base top 25~40mm, be incubated 1~3 hour;
3. take out the mirror base and put into heating furnace again,, be incubated 3~5 hours at 150~250 ℃;
4. according to 2. going on foot and 3. going on foot repetitive operation once, cool off with stove;
(6) grinding again of mirror base: with the Al of muller and 0.5~1 μ m 2O 3Abrasive material grinds the mirror base, makes flatness reach 0.008~0.01 mm, and surfaceness reaches Ra0.02 μ m;
(7) chemical plating nickel-phosphorus alloy of mirror base, control PH is 3.5~4.0, and plating temperature is 80~85 ℃, and plating speed is 3.5~5.0 μ m/hr; Reach coating 100~120 μ m;
(8) thermal treatment for the second time 350 ± 20 ℃ of insulations of temperature 60 minutes, is cooled off with stove;
(9) optical grinding: the Al that adopts muller and 0.3~0.5 μ m 2O 3Abrasive material grinds mirror coating, reaches Ra0.012 μ m.
2. the preparation method of the aluminum silicon carbide composite material catoptron of high-volume fractional according to claim 1 is characterized in that, the stabilization processes of said mirror base comprises: 1. the mirror base is put into heating furnace, be warming up to 190 ℃, be incubated after 4 hours; 2. fast the mirror base is taken out and puts into heat-preserving container, add liquid nitrogen (196 ℃) from the bottom of heat-preserving container, the high appearance base of liquid nitrogen peak 30mm, protect 2 hours in this state after; 3. take out the mirror base and put into heating furnace and be warming up to 190 ℃ again, be incubated 4 hours; 4. again the mirror base is taken out, put into heat-preserving container, according to 2. going on foot and 3. going on foot repetitive operation once; Cool off with stove
3. the preparation method of the aluminum silicon carbide composite material catoptron of high-volume fractional according to claim 1 is characterized in that, said catoptron is of a size of 150 * 150 * 10mm.
CN201110342544.2A 2011-11-03 2011-11-03 Method for preparing aluminum and silicon carbide composite material reflector with high volume fraction Active CN102508327B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201110342544.2A CN102508327B (en) 2011-11-03 2011-11-03 Method for preparing aluminum and silicon carbide composite material reflector with high volume fraction

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201110342544.2A CN102508327B (en) 2011-11-03 2011-11-03 Method for preparing aluminum and silicon carbide composite material reflector with high volume fraction

Publications (2)

Publication Number Publication Date
CN102508327A true CN102508327A (en) 2012-06-20
CN102508327B CN102508327B (en) 2014-03-19

Family

ID=46220432

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201110342544.2A Active CN102508327B (en) 2011-11-03 2011-11-03 Method for preparing aluminum and silicon carbide composite material reflector with high volume fraction

Country Status (1)

Country Link
CN (1) CN102508327B (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107419148A (en) * 2017-05-05 2017-12-01 安徽彩晶光电有限公司 Al-alloy for liquid crystal television bracket
CN107500774A (en) * 2017-09-05 2017-12-22 西安明科微电子材料有限公司 A kind of aluminium silicon carbide material speculum preparation method
CN114988907A (en) * 2022-05-31 2022-09-02 华中科技大学 High-specific-component gradient aluminum-based silicon carbide composite material reflector and preparation method thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1580832A (en) * 2004-05-20 2005-02-16 中国科学院上海技术物理研究所 Heavy-cabiber light composite material mirror and its preparing method
CN101315435A (en) * 2007-06-01 2008-12-03 哈尔滨工业大学 High reflection film of silicon carbide reflection mirror within visible light wave range, and its production method
CN102191398A (en) * 2011-04-22 2011-09-21 湖南航天诚远精密机械有限公司 Preparation method of carborundum particle reinforced aluminum matrix composite material with high volume fraction

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1580832A (en) * 2004-05-20 2005-02-16 中国科学院上海技术物理研究所 Heavy-cabiber light composite material mirror and its preparing method
CN101315435A (en) * 2007-06-01 2008-12-03 哈尔滨工业大学 High reflection film of silicon carbide reflection mirror within visible light wave range, and its production method
CN102191398A (en) * 2011-04-22 2011-09-21 湖南航天诚远精密机械有限公司 Preparation method of carborundum particle reinforced aluminum matrix composite material with high volume fraction

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
姚志雄等: "航天反射镜材料SiC", 《红外》 *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107419148A (en) * 2017-05-05 2017-12-01 安徽彩晶光电有限公司 Al-alloy for liquid crystal television bracket
CN107500774A (en) * 2017-09-05 2017-12-22 西安明科微电子材料有限公司 A kind of aluminium silicon carbide material speculum preparation method
CN114988907A (en) * 2022-05-31 2022-09-02 华中科技大学 High-specific-component gradient aluminum-based silicon carbide composite material reflector and preparation method thereof
CN114988907B (en) * 2022-05-31 2023-01-06 华中科技大学 High-specific-component gradient aluminum-based silicon carbide composite material reflector and preparation method thereof

Also Published As

Publication number Publication date
CN102508327B (en) 2014-03-19

Similar Documents

Publication Publication Date Title
CN102465222B (en) Aluminium alloy base plate for magnetic disk and manufacture method thereof
WO2020261711A1 (en) Chemically strengthened glass and manufacturing method therefor
CN102513944A (en) Resin-bonded grinding tool for processing sapphire crystals and preparation method for resin-bonded grinding tool
CN103709993B (en) Self-sharpening diamond abrasive material and preparation method thereof
US8512868B2 (en) Hybrid silicon wafer
CN113698082B (en) Method for producing glass-ceramic molded body
CN102508327B (en) Method for preparing aluminum and silicon carbide composite material reflector with high volume fraction
WO2020097046A1 (en) Methods of making three dimensional glass ceramic articles
WO2014015751A1 (en) High cutting force diamond micropowder and preparation method thereof
CN102699811A (en) Infusible metal alloy foil part with high surface smoothness and preparation method thereof
CN108453619A (en) The thinned grinding wheel of Sapphire Substrate
CN109290853A (en) A kind of preparation method of ultra-thin sapphire sheet
CN109824248A (en) A kind of precision machining method of ultra-thin quartz plate
CN106232845B (en) Aluminum-diamond system complex and the thermal component for using it
CN105856085A (en) Method for preparing grinding disc with boron carbide
CN102797022B (en) Insulation shielding method in grinding head plating process and coating
KR102347861B1 (en) Glass coated cbn abrasives and method of making them
CN103419142A (en) self-lubricating grinding wheel
US8663781B2 (en) Ceramic article and method for making same, and electronic device using same
CN109868439B (en) Multi-burr diamond and preparation method thereof
JP2019038720A (en) Method of producing sintered body of cesium tungsten oxide, sintered body of cesium tungsten oxide, and oxide target
CN110744443A (en) Wax-free pad for polishing and production method thereof
JP2014114473A (en) Flat plate type sputtering target and production method thereof
US20140090309A1 (en) Cubic boron nitride particles having a unique morphology
CN106882807B (en) A kind of preparation method of boron carbide powder

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant