CN102426502B - Monolithic capacitance touch screen with low-interference decorative metal pattern - Google Patents
Monolithic capacitance touch screen with low-interference decorative metal pattern Download PDFInfo
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- CN102426502B CN102426502B CN201110331476.XA CN201110331476A CN102426502B CN 102426502 B CN102426502 B CN 102426502B CN 201110331476 A CN201110331476 A CN 201110331476A CN 102426502 B CN102426502 B CN 102426502B
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Abstract
The invention relates to a monolithic capacitance touch screen with a low-interference decorative metal pattern. The monolithic capacitance touch screen comprises a substrate and a sensing electrode layer, a covering layer, a plurality of peripheral connecting wires and a decorative metal layer, which are arranged at the inner side of the substrate, wherein the decorative metal layer forms the decorative metal pattern, and the peripheral connecting wires pass through a corresponding area at the inner side of the decorative metal layer. The monolithic capacitance touch screen is characterized in that the decorative metal layer is provided with at least one first segmenting line along the arrangement direction of the peripheral connecting wires, the at least one first segmenting line segments the decorative metal layer into at least two small independent unit blocks, and the unit blocks are not electrically connected with each other; therefore, the plurality of peripheral connecting wires which are respectively coincident with different unit blocks cannot form coupling capacitance channel through the decorative metal layer, and the interference among the peripheral connecting wires, which is caused by the decorative metal pattern, can be reduced.
Description
Technical field
The present invention relates to a kind of touch-screen, particularly relate to a kind of monolithic capacitive touch screen with low interference metallic decorative pattern.
Background technology
In recent years, along with fast development and the application of infotech, wireless mobile communication and information household appliances, the dependence of people to electronic product grows with each passing day.In order to reach more convenient, volume is more lightly changed and more humane object, many electronic products by traditional keyboard or mouse as input media, change into and use the touch-screen before being arranged on display screen as input media.Existing touch-screen is broadly divided into the types such as condenser type, resistance-type, photosensitizing type.Wherein, capacitance touch screen has been widely applied to each electronic product, as in mobile phone, panel computer.It is high and touch and exert pressure and need not exert oneself that the feature of capacitance touch screen is through rate, and detect while can also realizing multiple touch point during work, operation use is humanized.
As shown in Figure 1, Figure 2, Figure 3 and Figure 4, capacitance touch screen generally comprises a photic zone 01, and be arranged on the occlusion regions 02 of photic zone 01 periphery, traditional capacitance touch screen generally comprises interior substrate 03 and outer substrate 04, its occlusion regions 02 is covered by the coverage layer 05 be arranged on inside outer substrate 04 and is formed, interior substrate 03 is then provided with sensing electrode layer 06, and it is made up of multiple induction electrode 07, to realize touch sensing function; In occlusion regions 02, interior substrate 03 is also provided with periphery line 08, is connected to by each sensing electrode 07 in the external connection end 09 being arranged on interior substrate 03 edge; And outside substrate 04 being often provided with the metallic decorative pattern 010 of trade mark and so on, metallic decorative pattern 010 comprises the decorative metal layer 011 that one deck can conduct electricity, and interior substrate 03 is fitted by adhesive-layer 012 with outer substrate 04.
As depicted in figs. 1 and 2, for the capacitance touch screen of bilayer laminating, generally interior substrate 03 can be designed to be less than outer substrate 04, interior substrate 03 does not cover on metallic decorative pattern 010, its periphery line 08 just can be connected in external connection end 09 without the need to the respective regions inside decorative metal layer 011, therefore, coupled interference can not be there is by the electric capacity formed between respective and decorative metal layer 011 between multiple periphery line 08.
In addition, as shown in Figure 3 and Figure 4, for the capacitance touch screen of bilayer laminating, two pieces of substrates are fitted by certain adhesive-layer 012, there is larger interval (> 50 μm), therefore, even if multiple periphery line 08 needs the respective regions be designed to inside decorative metal layer 011, also intercoupled by respective formed minimum electric capacity overlapping with decorative metal layer 011 hardly, form the mutual interference between periphery line 08.
Along with the lightening development of electronic product, it requires that the capacitance touch screen assembled is more and more frivolous, so there is people to propose the capacitance touch screen only adopting a plate base, i.e. monolithic capacitive touch screen.As shown in Figure 5 and Figure 6, for monolithic capacitive touch screen, decorative metal layer 021, sensing electrode 022, periphery line 023, external connection end 024, cover the back side that layer 025 is all arranged on substrate 026, wherein decorative metal layer 021, periphery line 022, external connection end 024 is all arranged on occlusion regions, occlusion regions is formed by covering layer 025, external connection end 024 is generally arranged on the edge of substrate 026, therefore, when the respective regions of periphery line 023 inside decorative metal layer 021, the interval of periphery line 023 and decorative metal layer 021 is less (< 5 μm), each periphery line 023 can form larger electric capacity with decorative metal layer 021 and be formed and intercouple, produce larger mutual interference.
Certainly, in order to avoid the generation of this interference, periphery line can be designed to walk around decorative metal layer, but for occlusion regions narrower some design, owing to being limited to the area size of cabling, the difficulty in design can be brought.
Summary of the invention
The technical problem to be solved in the present invention is to provide a kind of monolithic capacitive touch screen with low interference metallic decorative pattern, and this monolithic capacitive touch screen with low interference metallic decorative pattern can reduce between periphery line by mutual interference that metallic decorative pattern realizes.The technical scheme adopted is as follows:
A kind of monolithic capacitive touch screen with low interference metallic decorative pattern, comprise substrate, and be arranged on sensing electrode layer inside substrate, cover layer, multiple periphery line and decorative metal layer, decorative metal layer forms metallic decorative pattern, the respective regions of periphery line inside decorative metal layer, it is characterized in that: described decorative metal layer is provided with the first cut-off rule of at least one peripherally line direction of routing, and decorative metal layer is divided at least two independently cell blocks by the first cut-off rule.
The side of close operator is outside, and the side away from operator is inner side.
The generation type of above-mentioned metallic decorative pattern can be: decorative metal layer directly forms metallic decorative pattern, and be namely that decorative metal layer is located at the outside of covering layer, and be directly patterned into metallic decorative pattern, metallic decorative pattern is close on the medial surface of substrate; The generation type of metallic decorative pattern also can be: cover the void region that layer is provided with metallic decorative pattern profile, decorative metal layer is located at the inner side of covering layer, and decorative metal layer forms metallic decorative pattern through void region.
The direction of routing of periphery line is not fixing a direction, and by the restriction of covering layer and external connection end arrangement, the direction of routing of same periphery line needs repeatedly bending sometimes.
Decorative metal layer is cut at least two less separate unit blocks by the first cut-off rule, cell block is not electrically connected each other, therefore, many overlapping with different units block respectively periphery cablings, coupling capacitance passage cannot be formed by decorative metal layer, reduce between periphery line by mutual interference that metallic decorative pattern realizes.
As preferred version of the present invention, it is characterized in that: the first cut-off rule is arranged in the gap of two adjacent peripheral lines.First cut-off rule is arranged in two adjacent peripheral line gaps, makes two cell blocks be split to form by each cut-off rule, line overlap can not be walked with same periphery, thus improve the utilization factor of cut-off rule.
As the further preferred version of the present invention, it is characterized by: in the gap of every two adjacent peripheral lines, be all provided with the first cut-off rule.In the gap of every two adjacent peripheral lines, be all provided with the first cut-off rule, make any two adjacent periphery lines, all can not form coupling capacitance passage, can not mutually disturb.
Because the first cut-off rule on decorative metal layer must be consistent with periphery direction of routing, therefore, metallic decorative pattern is cut off in dividing of the first cut-off rule, may form the figure the same with periphery cabling, cause metallic decorative pattern unsightly.In order to make metallic decorative pattern attractive in appearance, as preferred version of the present invention, it is characterized in that: described decorative metal layer is also provided with the second cut-off rule, decorative metal layer is divided into cell block of uniform size by the first cut-off rule and the second cut-off rule.Decorative metal layer is split into cell block of uniform size, improves the aesthetic property of metallic decorative pattern.
As further preferred version of the present invention, it is characterized in that: the part of described periphery cabling and decorative metal ply, its direction of routing in X direction or Y-direction.Due in part equitant with decorative metal layer, periphery cabling is designed to by X or Y-direction cabling, therefore, first cut-off rule is also according to X-direction or Y-direction cabling, second cut-off rule can be set accordingly according to Y-direction or X-direction cabling, make the cell block be cut in conjunction with the second cut-off rule by the first cut-off rule can be rectangle.Further preferred cell block is square, and the metallic decorative pattern be made up of square, has higher aesthetic property.In addition, second cut-off rule also can not according to X-direction or Y-direction cabling, make that the cell block that is split to form by the first cut-off rule, the second cut-off rule is triangular in shape, figure that sexangle etc. is in the same size or basically identical, also can reduce the interference that capacitive coupling causes, and there is aesthetic.
The beneficial effect that the present invention contrasts prior art is: in monolithic capacitive touch screen, by arranging the first cut-off rule of peripherally direction of routing on the decorative metal layer forming decorative pattern, decorative metal layer is cut into multiple independently comparatively junior unit block, cell block is not electrically connected each other, therefore, many overlapping with different units block respectively periphery cablings, coupling capacitance passage cannot be formed by decorative metal layer, reduce between periphery line by mutual interference that metallic decorative pattern realizes.
Accompanying drawing explanation
Fig. 1 is in prior art, the schematic diagram of the capacitance touch screen of double-deck laminating, and wherein, substrate does not cover decorative metal layer;
Fig. 2 is the layer structure schematic diagram of Fig. 1;
Fig. 3 is in prior art, the schematic diagram of the capacitance touch screen of double-deck laminating, and wherein, substrate covers decorative metal layer;
Fig. 4 is the layer structure schematic diagram of Fig. 3;
Fig. 5 is in prior art, the schematic diagram of monolithic capacitive touch screen, and wherein periphery line is through the situation of decorative metal layer;
Fig. 6 is the layer structure schematic diagram of Fig. 5;
Fig. 7 is the schematic diagram of the embodiment of the present invention one;
Fig. 8 is the partial enlarged drawing of part A in Fig. 7;
Fig. 9 is the cut-open view of Fig. 8 along A-A;
Figure 10 is the schematic diagram of the embodiment of the present invention two;
Figure 11 is the partial enlarged drawing of part B in Figure 10;
Figure 12 is the cut-open view of Figure 11 along B-B;
Figure 13 is the cut-open view of Figure 11 along B-B, and it represents the situation not having insulation course.
Embodiment
Be described further below in conjunction with accompanying drawing and the preferred embodiment of the present invention.
Embodiment one
As Fig. 7, shown in Fig. 8 and Fig. 9, this monolithic capacitive touch screen with low interference metallic decorative pattern, comprise substrate 1, and the sensing electrode layer 2 be arranged on inside substrate 1, cover layer 3, multiple periphery line 4, decorative metal layer 5 and insulation course 6, cover layer 3 and be provided with void region 7, decorative metal layer 5 forms metallic decorative pattern through void region 7, the respective regions of periphery line 4 inside decorative metal layer 5, insulation course 6 is between decorative metal layer 5 and periphery line 4 (being formed by cabling metallic layer graphic), decorative metal layer 5 is provided with the first cut-off rule 8 of many peripherally line 4 direction of routing, the first cut-off rule 8 is all provided with in the gap of every two adjacent peripheral lines 4, decorative metal layer 5 is divided into multiple independently cell block 9 by the first cut-off rule 8.
Embodiment two
As shown in Figure 10, Figure 11 and Figure 12, when other situation is all identical with embodiment one, its difference is:
Decorative metal layer 5 is located at the outside of covering layer 3, and decorative metal 5 is until be patterned into metallic decorative pattern, and decorative metal layer 5 is close on the medial surface of substrate 1; The part that periphery cabling 4 is overlapping with decorative metal layer 5, its direction of routing is along Y-direction; Decorative metal layer 5 is also provided with the second cut-off rule 10, first cut-off rule 8 and decorative metal layer 5 is divided into square 11 of uniform size by the second cut-off rule 10.
As shown in figure 13, in the present embodiment, the insulation course 6 between decorative metal layer 5 and periphery line 4 can also be removed.
Claims (2)
1. one kind has the monolithic capacitive touch screen of low interference metallic decorative pattern, comprise substrate, and the sensing electrode layer be arranged on inside substrate, cover layer, multiple periphery line, insulation course and decorative metal layer, decorative metal layer forms metallic decorative pattern, the respective regions of periphery line inside decorative metal layer, it is characterized in that: described insulation course is between decorative metal layer and periphery line, decorative metal layer is provided with the first cut-off rule of many peripherally line direction of routing, the first cut-off rule is all provided with in the gap of every two adjacent peripheral lines, decorative metal layer is divided into multiple independently cell block by the first cut-off rule.
2. monolithic capacitive touch screen as claimed in claim 1, it is characterized in that: described decorative metal layer is also provided with the second cut-off rule, decorative metal layer is divided into cell block of uniform size by the first cut-off rule and the second cut-off rule.
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CN102426502B true CN102426502B (en) | 2015-01-07 |
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KR20150092725A (en) * | 2014-02-05 | 2015-08-13 | (주)삼원에스티 | Transparent cover for electronic apparatus |
CN106664810B (en) * | 2014-04-01 | 2019-10-11 | 三元St株式会社 | Electronic equipment rear cover |
CN115113766B (en) * | 2022-06-24 | 2024-10-18 | 京东方科技集团股份有限公司 | Touch display substrate and touch display device |
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CN101893975A (en) * | 2010-07-08 | 2010-11-24 | 汕头超声显示器(二厂)有限公司 | Capacitive touch screen and manufacturing method thereof |
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JP2006243579A (en) * | 2005-03-07 | 2006-09-14 | Seiko Epson Corp | Electro-optical device and manufacturing method,and electronic equipment |
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CN101893975A (en) * | 2010-07-08 | 2010-11-24 | 汕头超声显示器(二厂)有限公司 | Capacitive touch screen and manufacturing method thereof |
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