CN102415981A - Rhodiola rosea beauty facial mask - Google Patents

Rhodiola rosea beauty facial mask Download PDF

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Publication number
CN102415981A
CN102415981A CN2011104074710A CN201110407471A CN102415981A CN 102415981 A CN102415981 A CN 102415981A CN 2011104074710 A CN2011104074710 A CN 2011104074710A CN 201110407471 A CN201110407471 A CN 201110407471A CN 102415981 A CN102415981 A CN 102415981A
Authority
CN
China
Prior art keywords
radix rhodiolae
facial mask
rhodiola rosea
percent
beauty
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2011104074710A
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Chinese (zh)
Inventor
刘慧�
Original Assignee
张庆之
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 张庆之 filed Critical 张庆之
Priority to CN2011104074710A priority Critical patent/CN102415981A/en
Publication of CN102415981A publication Critical patent/CN102415981A/en
Pending legal-status Critical Current

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Abstract

The invention relates to the field of health-care and skin-care products, in particular to a rhodiola rosea beauty facial mask. The formula of the rhodiola rosea beauty facial mask comprises 20 to 28 percent of rhodiola rosea, 10 to 20 percent of tea oil, 5 to 15 percent of honey, 15 to 35 percent of banana skin and 10 to 25 percent of safflower. Combining natural materials and Chinese medicinal materials, the rhodiola rosea beauty facial mask has good beauty effect and strong anti-radiation effect; meanwhile, the facial mask can effectively regulate nervous system and resist fatigue, anoxia and aging.

Description

The Radix Rhodiolae beauty mask
Technical fieldThe present invention relates to the health-care and skin-care beauty treatment fields, concrete relate to a kind of Radix Rhodiolae beauty mask.
Background technologyFacial film has been general welcome cosmetic skincare product in people's daily life.Because people's routine work, that academic environment receives radiation effect is bigger, long-term accumulation all be harmful to people's skin and healthy, and therefore, it is particularly important that selection has the facial film of radiation-resisting functional.Yet the existing facial film of existing market is of a great variety, and beauty treatment, opsonic action generally possess, and still, the facial film with radiation-resisting functional is also ruthless rare; And existing facial film price comparison is expensive, has also added a large amount of chemical constituents, has brought bigger negative effect to health.
Summary of the inventionThe present invention is in order to remedy the defective that above-mentioned technology exists, a kind of Radix Rhodiolae beauty mask with radiation-resisting functional to be provided, and this facial film cosmetic result is good, also has the specially good effect of pore refining.
Technical scheme of the present invention is: Radix Rhodiolae beauty mask, prescription are to be made up of Radix Rhodiolae, Oleum Camelliae, Mel, Pericarpium Musae, Flos Carthami, and its proportioning is Radix Rhodiolae 20-28%, Oleum Camelliae 10-20%, Mel 5-15%, Pericarpium Musae 15-35%, Flos Carthami 10-25%.
The Radix Rhodiolae beauty mask, method for preparing is following:
Get Radix Rhodiolae, Pericarpium Musae, Flos Carthami in proportion respectively and remove foreign material, clean, oven dry;
The above-mentioned batching of pulverize separately is crossed 80 to 120 mesh sieves, mixed material;
Oleum Camelliae and Mel mixed according to the above ratio together adding stirs in the mixed material gets final product.
Beneficial effect of the present invention is: adopt natural materials to mix with Chinese crude drug, cosmetic result is good, has very strong radiation-resisting functional; Simultaneously, this facial film can effectively be regulated nervous system, resisting fatigue, anti-hypoxia, defying age.
The specific embodiment
Radix Rhodiolae beauty mask, prescription are to be made up of Radix Rhodiolae, Oleum Camelliae, Mel, Pericarpium Musae, Flos Carthami, and its proportioning is Radix Rhodiolae 25%, Oleum Camelliae 17%, Mel 10%, Pericarpium Musae 30%, Flos Carthami 18%.
The Radix Rhodiolae beauty mask, method for preparing is following:
Get Radix Rhodiolae, Pericarpium Musae, Flos Carthami in proportion respectively and remove foreign material, clean, oven dry;
The above-mentioned batching of pulverize separately is crossed 80 to 120 mesh sieves, mixed material;
Oleum Camelliae and Mel mixed according to the above ratio together adding stirs in the mixed material gets final product.
During use, after cleaning skin, directly facial film is applied in the surface with cotton pads or finger, smear evenly after, give the massage with hands, thereby make facial film all spread out and absorb, after 15 minutes the skin surface facial film is washed off with clear water.

Claims (2)

1. the Radix Rhodiolae beauty mask is characterized in that prescription is to be made up of Radix Rhodiolae, Oleum Camelliae, Mel, Pericarpium Musae, Flos Carthami, and its proportioning is Radix Rhodiolae 20-28%, Oleum Camelliae 10-20%, Mel 5-15%, Pericarpium Musae 15-35%, Flos Carthami 10-25%.
2. Radix Rhodiolae beauty mask according to claim 1 is characterized in that method for preparing is following: get Radix Rhodiolae, Pericarpium Musae, Flos Carthami in proportion respectively and remove foreign material, clean, oven dry; The above-mentioned batching of pulverize separately is crossed 80 to 120 mesh sieves, mixed material; Oleum Camelliae and Mel mixed according to the above ratio together adding stirs in the mixed material gets final product.
CN2011104074710A 2011-12-09 2011-12-09 Rhodiola rosea beauty facial mask Pending CN102415981A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2011104074710A CN102415981A (en) 2011-12-09 2011-12-09 Rhodiola rosea beauty facial mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2011104074710A CN102415981A (en) 2011-12-09 2011-12-09 Rhodiola rosea beauty facial mask

Publications (1)

Publication Number Publication Date
CN102415981A true CN102415981A (en) 2012-04-18

Family

ID=45940785

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2011104074710A Pending CN102415981A (en) 2011-12-09 2011-12-09 Rhodiola rosea beauty facial mask

Country Status (1)

Country Link
CN (1) CN102415981A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102920645A (en) * 2012-11-29 2013-02-13 昆明然华生物科技有限公司 Cosmetic composition with functions of moisture preservation and wrinkle resistance
CN103446037A (en) * 2013-06-24 2013-12-18 苏州神林堂中医药研究所 Formula of whitening and freckle-removing traditional Chinese medicine mask and preparation method of whitening and freckle-removing traditional Chinese medicine mask
CN111888380A (en) * 2020-09-18 2020-11-06 新疆新兴源农业有限公司 Application of safflower honey in preparation of anti-radiation product

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102920645A (en) * 2012-11-29 2013-02-13 昆明然华生物科技有限公司 Cosmetic composition with functions of moisture preservation and wrinkle resistance
CN103446037A (en) * 2013-06-24 2013-12-18 苏州神林堂中医药研究所 Formula of whitening and freckle-removing traditional Chinese medicine mask and preparation method of whitening and freckle-removing traditional Chinese medicine mask
CN103446037B (en) * 2013-06-24 2016-03-02 苏州神林堂中医药研究所 Moisten white freckle removing facial mask made of Chinese medicine and preparation method
CN111888380A (en) * 2020-09-18 2020-11-06 新疆新兴源农业有限公司 Application of safflower honey in preparation of anti-radiation product

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C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20120418