CN102330060A - Composite structural target for arc ion plating deposition magnetic material coating and application of composite structural target - Google Patents
Composite structural target for arc ion plating deposition magnetic material coating and application of composite structural target Download PDFInfo
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- CN102330060A CN102330060A CN201110288971A CN201110288971A CN102330060A CN 102330060 A CN102330060 A CN 102330060A CN 201110288971 A CN201110288971 A CN 201110288971A CN 201110288971 A CN201110288971 A CN 201110288971A CN 102330060 A CN102330060 A CN 102330060A
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Abstract
The invention belongs to the field of preparation of films, and in particular relates to a design of a composite structural target for an arc ion plating deposition magnetic material coating and application of the composite structural target. The composite structural target consists of a target shell and a magnetic material target, wherein the target shell is tightly fixed at the periphery of the magnetic material target and is a metal target shell with low saturation vapor pressure and low secondary electron emission yield, or is a target shell which is formed by attaching a ceramic phase material layer to a processable metal ring; the processable metal ring is tightly fixed at the periphery of the magnetic material target; and the ceramic phase material layer is attached to a surface of the processable metal ring in the direction parallel to a target surface of the magnetic material target. By the composite structural target and the application thereof, the problem that the magnetic material coating is difficult to deposit through arc ion plating, the problem that the target is difficult to apply industrially because the service life of the target is shortened when magnetic shielding is eliminated by adding a groove on the surface of a ferromagnetic target, and the like are solved, design thoughts of the composite structural target which makes a device simply manufactured and has low cost are provided, and the application range of the arc ion plating is expanded.
Description
Technical field
The invention belongs to the film preparation field, specifically a kind of design and application thereof that is used for the composite structure target of electric arc ion-plating deposition magneticsubstance coating.
Background technology
Arc ion plating (AIP) technology comes from the arc deposited coating phenomenon that 19th century middle and later periods Edison finds, vacuum system feeds argon gas to 1～10
-1During Pa, use between arc electrode and negative electrode and add that one triggers electricimpulse or makes both striking methods of short circuit mutually, initiation arc discharge and produce the high-density metal vapor plasma between the anode that negative electrode and Vakuumkammer that deposition material is processed form.Because electronics flies away from the cathodic area fast, near the positive charge density of cathode targets is increased.The arc spot is in stable etch stages, after the strength of electric field of positive ion formation is increased to threshold value, has constantly promoted the emission of cathode electronics, and the ohmic heating effect of electric current is increased, and has further improved target evaporation ionization level; Simultaneously, highfield is that the positive ion of bombarding cathode provides the bombardment that is enough to heated cathode ability, makes the local high temperature evaporation ionization rapidly of cathodic arc spot.Target metal positive ion deposits to the matrix surface film forming under the booster action of negative bias electric field.Arc ion plating is because it is simple in structure, and it is wide to plate material, sedimentation rate fast (0.1～50 μ m/min), advantages such as coating even compact, environmental protection, 20th century the eighties just be widely used in the industrial production, obtain fast-developing in recent years again.
Magneticsubstance is ancient and broad-spectrum functional materials, just is familiar with by people in the past as far back as 3000 and uses.Modem magnetic materials has been used among our life widely, and this wherein just comprises the magnetic function thin-film material.The magnetic function film is owing to have advantages such as high data storage capacities, magneticshielding function, high speed memory; Be widely used in making Computer Storage; Magneto-optic modulator in the optical communication, optoisolator and optical circulator etc.; Also be used as magnetic recording thin film medium and thin-film head, and magneto-optical recording etc.We can say that magneticthin film is closely related with the every aspect of informationization, robotization, electromechanical integration, national defence, national economy.
In the electrical arc ion plating deposition film process, the arc spot on the target is not having to do random motion at cathode surface under the externally-applied magnetic field condition; Under the axial magnetic field component effect perpendicular to cathode surface, the random motion of arc spot speeds up; The arc spot moves along the opposite direction of lorentz's force under the transverse magnetic field components effect that is parallel to cathode surface, promptly is the reversing motion (Retrograde motion) of contrary Ampere force, just (the I * B) in the opposite direction of heading and electric current power.Therefore, need influence negative electrode front space positive ion through control cathode target material surface Distribution of Magnetic Field and distribute, and then change the etching of cathode targets indirectly.But as shown in Figure 1, the ferromagnetic metal that below Tc, in the air 3, uses high magnetic permeability is during as target; Ferromagnetic substance target 2 is under permanent magnet 1 effect; The most of magneticflow that is produced by externally-applied magnetic field can be through target short circuit circulation, has disturbed cathode targets Surface field distribute (even produce magneticshielding); The ferromegnetism target always can not be stablized etching, arc and current interruption phenomenon occur running.Therefore, how to utilize ferromagnetic metal to become the bottleneck problem of the industry as arc ion plating target depositing magnetic film.
Also did some explorations with the behavior head it off both at home and abroad.As increasing groove (increase leakage field) on the ferromagnetic target surface, overcome the magneticshielding problem and the uneven problem of erosion back Distribution of Magnetic Field of magnetic target, realize the purpose of the even etching of ferromegnetism target, improved target utilization.Also there is the scholar to pass through to make more magneticflow pass target surface, changes target surface magneticline of force distribution purpose thereby reach, and then control the etching track of arc spot on the ferromegnetism target in target surface or the additional coupled magnetic field of matrix.Yet these solutions also have weak point: or reduced target work-ing life; Or added supernumerary structure or functional unit, structure is complicated more, is unfavorable for the industrial application popularization.
Summary of the invention
One of the object of the invention is to provide a kind of composite structure target and application of being used for electric arc ion-plating deposition magneticsubstance coating of simple in structure, with low cost, high service efficiency; When overcoming magneticshielding in order to solve ferromegnetism target surface increase groove; Target work-ing life, the problem that is difficult in industry, use have been reduced.
Another object of the present invention is to provide a kind of composite structure target and application that is used for electric arc ion-plating deposition magneticsubstance coating; Solved target surface magneticline of force distribution for a change, additional coupled magnetic field is brought in depositing system operation of equipment complicacy and cost increase problem.
To achieve these goals, technical scheme of the present invention is:
A kind of composite structure target that is used for electric arc ion-plating deposition magneticsubstance coating, composite structure target are that target shell and magneticsubstance target constitute, and it is peripheral that the target shell is anchored on the magneticsubstance target; Saturation vapour pressure and secondary electron emission yield all were lower than the metal of magneticsubstance target when wherein, the target shell was selected uniform temp for use; Perhaps, but the target shell that the target shell forms on the processing metal ring for the ceramic phase material layer depends on, but that the processing metal ring is anchored on the magneticsubstance target is peripheral, but the ceramic phase material layer depend on the processing metal ring with the face of the target surface parallel direction of magneticsubstance target on.
The described composite structure target that is used for electric arc ion-plating deposition magneticsubstance coating; The target shell adopts metals such as Ti, Mo, Nb or Pb, the ferromagnetic substance Co when its saturation vapour pressure and secondary electron emission yield generally are lower than uniform temp, Fe, Ni or its alloy.
The described composite structure target that is used for electric arc ion-plating deposition magneticsubstance coating, but the ceramic phase material layer through vapour deposition, spraying or vacuum hotpressing method be fixed in the processing metal ring with the face of target surface parallel direction on.
The described composite structure target that is used for electric arc ion-plating deposition magneticsubstance coating, but the processing metal ring can adopt metals such as Al, Cr, Cu, Ti or stainless steel.
The described composite structure target that is used for electric arc ion-plating deposition magneticsubstance coating, but the internal diameter of metallic target shell or processing metal ring is slightly larger than the external diameter of magneticsubstance target, but metallic target shell or processing metal ring and magneticsubstance target are fixed through screw thread; Perhaps, but metallic target shell or processing metal ring and magneticsubstance target are connected fixing through bolt.
A kind of application that utilizes said composite structure target in electric arc ion-plating deposition magneticsubstance coating; When adopting the composite structure target to be used to deposit the magneticsubstance coating; Metallic target shell or ceramic phase material layer are used to improve the magnet short-cut path of striking initial period magnetic target, and " the race arc " that occur when being used to avoid to be lower than the Tc of magnetic target.
Know-why of the present invention:
The present invention adopts the metal of low saturation vapour pressure and low secondary electron emission yield or pottery is made the target shell and the ferromegnetism target is compound; Retrain initial striking arc spot in the target surface etching; When treating that the ferromegnetism target is broken through its Tc; The foreign field magneticline of force of target short circuit circulation will pass the magnetic target surface, control spots moving track.
The present invention is according to ferromegnetism target Physics of Magnetism characteristics, breakthrough utilization the ferromegnetism of ferromagnetic substance when Tc change the paramagnetism characteristics into.When the self-heating effect in the arc spot etching process makes the magnetic target break through Curie-point temperature; Promptly having accomplished ferromegnetism changes to paramagnetism; The foreign field magneticline of force of target short circuit circulation will pass the magnetic target surface; Make the target material surface magnetic field configuration obtain redistribution and controlled (as shown in Figure 2), and then can control the movement locus of arc spot, realized magnetic target stable and uniform etching.Therefore, how initial striking arc spot being constrained in the target surface etching, and utilize self-heating effect to break through the magneticshielding restriction, make the ferromegnetism target reach Tc fast and use, is the key that solves the magnetisable coating stably depositing.
Advantage of the present invention and positively effect are:
1, the present invention proposes a kind of plan that is used for the composite structure target of electric arc ion-plating deposition magneticsubstance coating; Broken through the thinking restriction of tradition, overcome the shortcoming of prior art the deposition techniques magnetisable coating of the additional coupled magnetic field of target surface working groove and system.
2, composite structure target device of the present invention is made simply, and is with low cost, can thinking be provided for the magneticthin film of realizing the deposition different function requirements, expanded the range of application of arc ion plating.
3, composite structure target thinking of the present invention is applicable to the target of various size, need not reprocess target material surface, has improved target utilization greatly.
4, composite structure target of the present invention utilizes arc ion plating to break through Tc from the characteristics of heating; Need not additional outer heating and other device; Reduce influence to greatest extent to thin film deposition; Realized the magneticthin film of quick preparation difference in functionality, made electric arc ion-plating deposition magneticsubstance coatings industry change into and be possible.
5, the present invention proposes a kind of mentality of designing of making composite structure target simple, with low cost of installing, and has expanded the range of application of arc ion plating.
Description of drawings
Fig. 1 is Tc when following, the ANSYS finite element analogy result of ferromegnetism target Distribution of Magnetic Field under the permanent magnet effect.Wherein: a figure is the magneticline of force distribution plan, and b figure is the magneticflux-density vector diagram, and c figure is a b map logo zone target surface local enlarged view.
Fig. 2 is Tc when above, the ANSYS finite element analogy result of ferromegnetism target Distribution of Magnetic Field under the permanent magnet effect.Wherein, a figure is the magneticline of force distribution plan, and b figure is the magneticflux-density vector diagram, and c figure is a b map logo zone target surface local enlarged view.
Fig. 3 makes the target shell for the metal of low saturation vapour pressure and low secondary electron emission yield, and ferromagnetic substance is made the composite structure target synoptic diagram of target.
Fig. 4 makes the target shell for the top with the stainless steel of certain thickness pottery, and ferromagnetic substance is made the composite structure target synoptic diagram of target.
Fig. 5 is a titanium-cobalt alloy composite target material pictorial diagram among the embodiment.
Fig. 6 is zirconium white among the embodiment-cobalt-base alloy composite target material pictorial diagram.
Fig. 7 is a cobalt-base alloy target use video interception among the embodiment.
Fig. 8 is a titanium-cobalt alloy composite target material use video interception among the embodiment.
Fig. 9 is zirconium white among the embodiment-cobalt-base alloy composition target use video interception.
Figure 10 is surface topography and the power spectrum result who uses titanium-cobalt alloy composite target material deposited coatings among the embodiment.
Figure 11 is for using the surface topography and the power spectrum result of zirconium white-cobalt-base alloy composite target material deposited coatings among the embodiment.
Among the figure, 1 permanent magnet; 2 magneticsubstance targets (magnetic target); 3 air; 4 metallic target shells; 5 ceramic phase material layers; But 6 processing metal rings; 7 metal titanium targets shells; 8 cobalt-base alloy targets; 9 plasma spray are coated in the zirconia ceramics target shell on the stainless steel ring.
Embodiment
It is the bottleneck problem of the industry that the present invention utilizes electric arc ion-plating deposition magneticsubstance coating; Physical property according to the ferromegnetism target; Breakthrough utilization ferromagnetic substance ferromegnetism when Tc change paramagnetic characteristics into, designed a kind of arc ion plating ferromegnetism composite target material new texture and application thereof.Below in conjunction with accompanying drawing and embodiment the present invention is described further:
As shown in Figure 3, the present invention is used for the composite target material of electric arc ion-plating deposition magneticsubstance coating, can be made up of metallic target shell 4 and ferromagnetic substance target 2, and metallic target shell 4 is anchored on ferromagnetic substance target 2 peripheries.Wherein, Saturation vapour pressure and secondary electron emission yield all were lower than the metal of ferromagnetic substance target 2 when metallic target shell 4 was selected uniform temp for use, the metal of ferromagnetic substance Co, Fe, Ni or its alloy when generally being lower than uniform temp like saturation vapour pressures such as Ti, Mo, Nb or Pb and secondary electron emission yield.
As shown in Figure 4; The present invention is used for the composite target material of electric arc ion-plating deposition magneticsubstance coating; But also can depend on the target shell and the ferromagnetic substance target 2 that form on the processing metal ring 6 by ceramic phase material layer 5 constitutes; But processing metal ring 6 is positioned at ferromagnetic substance target 2 peripheries, but ceramic phase material layer 5 is positioned at processing metal ring 6 tops.But ceramic phase material layer 5 depend on processing metal ring 6 with the face of the target surface parallel direction of ferromagnetic substance target 2 on, but and this processing metal ring 6 is anchored on ferromagnetic substance target 2 peripheries.Wherein, but the processing metal ring can adopt metals such as Al, Cr, Cu, Ti or stainless steel.
But the internal diameter of said metallic target shell 4 or processing metal ring 6 is slightly larger than the external diameter of ferromagnetic substance target 2, and both fix through screw thread, also can composite target material two portions be fixed through bolt.
But said ceramic phase material layer 5 through vapour deposition, spraying or method such as vacuum hotpressing be fixed in processing metal ring 6 with the face of target surface parallel direction on.
Said metallic target shell 4 and ceramic phase material layer 5 solve and are used to improve a magnet short-cut path difficult problem, " the race arc " that has occurred when having overcome the Tc that is lower than ferromagnetic substance target 2 and the difficult problem that is difficult to deposit the magneticsubstance coating of striking initial period ferromagnetic substance target 2.
Adopt the method and the common magneticsubstance target deposited coatings of present embodiment to compare experiment, experiment situation and result are described below:
Embodiment 1:
As shown in Figure 5; Adopt the cobalt-base alloy target 8 (Si:3～5wt.% of metal titanium targets shell 7 and metal titanium targets shell 7 inboards; Fe:8～10wt.%; Co: the composite target material of surplus) being formed, metal titanium targets shell 7 and cobalt-base alloy target 8 are fixed through screw thread, compare with the use of the common target of identical component cobalt-base alloy.
Fig. 7 a-h is the common target use of a cobalt-base alloy video interception, after striking, moves to target limit etching rapidly by visible arc spot among the figure.Its reason is because during lesser temps (being lower than Tc); The transverse magnetic field at target edge intensive (seeing Fig. 1 a-c); And metal or ceramic target shell that the edge does not have low saturation vapour pressure and low secondary electron emission yield fetter the arc spot in magnetic target center etching, have caused " race arc " phenomenon.And the arc spot may concentrate the common magnetic target edges of etching a bit (to see Fig. 7 a), cause cathode targets edge local temperature rise too high, make it fusion, distortion and contact anode furnace shell on every side, cause power supply short circuit.
Shown in Fig. 2 a-c, the ferromagnetic metal that in air 3, uses high magnetic permeability is as target, and ferromagnetic substance target 2 is under permanent magnet 1 effect.When the self-heating effect in the arc spot etching process makes the magnetic target break through Curie-point temperature; Promptly having accomplished ferromegnetism changes to paramagnetism; The foreign field magneticline of force of target short circuit circulation will pass the magnetic target surface; Make the target material surface magnetic field configuration obtain redistribution and controlled, and then can control the movement locus of arc spot, realized magnetic target stable and uniform etching.
Fig. 8 a-h is a titanium-cobalt alloy composite target material use video interception, and by visible among the figure, under working temperature, the saturation vapour pressure of metal titanium and secondary electron emission yield all are lower than the saturation vapour pressure and the secondary electron emission yield of cobalt-base alloy.Therefore, compared to the titanium metal target shell, the arc spot is easier on the cobalt-base alloy target, stablize etching, produces thereby the arc spot obligated in the magnetic target center.After the self-heating effect of arc spot makes the magnetic target break through Tc, the foreign field magneticline of force of target short circuit circulation will pass the magnetic target surface, control spots moving track.
Figure 10 this shows that for using the surface topography and the power spectrum result of titanium-cobalt alloy composite target material deposited coatings coated component is the target composition, does not find the Ti elemental composition, and titanium target shell does not pollute coating.
Embodiment 2:
As shown in Figure 6; Adopt plasma spray to be coated in zirconia ceramics target shell 9 and plasma spray on the stainless steel ring and be coated in the inboard cobalt-base alloy target 8 (Si:3～5wt.% of zirconia ceramics target shell 9 on the stainless steel ring; Fe:8～10wt.%; Co: the zirconia ceramics target shell 9 that the composite target material of surplus) being formed, plasma spray are coated on the stainless steel ring is fixed composite target material two portions through bolt with cobalt-base alloy target 8, compares with the use of the common target of identical component cobalt-base alloy.
Fig. 9 a-h is zirconium white-cobalt-base alloy composite target material use video interception.Under working temperature, zirconia ceramics is an isolator, and the secondary electron emission yield is extremely low, and its saturation vapour pressure is also far below the saturation vapour pressure of cobalt-base alloy.Therefore, the arc spot is easier on the cobalt-base alloy target, stablize etching, produces thereby the arc spot obligated in the magnetic target center.After the self-heating effect of arc spot makes the magnetic target break through Tc, the foreign field magneticline of force of target short circuit circulation will pass the magnetic target surface, control spots moving track.
Figure 11 this shows that for using the surface topography and the power spectrum result of zirconium white-cobalt-base alloy composite target material deposited coatings coated component is the target composition, does not find Zr, O elemental composition, and zirconia ceramics does not pollute coating mutually.
Claims (7)
1. a composite structure target that is used for electric arc ion-plating deposition magneticsubstance coating is characterized in that, the composite structure target is that target shell and magneticsubstance target constitute, and it is peripheral that the target shell is anchored on the magneticsubstance target; Saturation vapour pressure and secondary electron emission yield all were lower than the metal of magneticsubstance target when wherein, the target shell was selected uniform temp for use; Perhaps, but the target shell that the target shell forms on the processing metal ring for the ceramic phase material layer depends on, but that the processing metal ring is anchored on the magneticsubstance target is peripheral, but the ceramic phase material layer depend on the processing metal ring with the face of the target surface parallel direction of magneticsubstance target on.
2. according to the described composite structure target that is used for electric arc ion-plating deposition magneticsubstance coating of claim 1; It is characterized in that; The target shell adopts Ti, Mo, Nb or Pb metal, the ferromagnetic substance Co when its saturation vapour pressure and secondary electron emission yield generally are lower than uniform temp, Fe, Ni or its alloy.
3. according to the described composite structure target that is used for electric arc ion-plating deposition magneticsubstance coating of claim 1; It is characterized in that, but the ceramic phase material layer through vapour deposition, spraying or vacuum hotpressing method be fixed in the processing metal ring with the face of target surface parallel direction on.
4. according to the described composite structure target that is used for electric arc ion-plating deposition magneticsubstance coating of claim 1, it is characterized in that, but the processing metal ring adopts Al, Cr, Cu, Ti or stainless steel metal.
5. according to the described composite structure target that is used for electric arc ion-plating deposition magneticsubstance coating of claim 1; It is characterized in that; But the internal diameter of metallic target shell or processing metal ring is slightly larger than the external diameter of magneticsubstance target, but metallic target shell or processing metal ring and magneticsubstance target are fixed through screw thread; Perhaps, but metallic target shell or processing metal ring and magneticsubstance target are connected fixing through bolt.
6. application that utilizes the said composite structure target of claim 1 in electric arc ion-plating deposition magneticsubstance coating.
7. according to the described application that is used for the composite structure target of electric arc ion-plating deposition magneticsubstance coating of claim 6; It is characterized in that; When adopting the composite structure target to be used to deposit the magneticsubstance coating; Metallic target shell or ceramic phase material layer are used to improve the magnet short-cut path of striking initial period magnetic target, and " the race arc " that occur when being used to avoid to be lower than the Tc of magnetic target.
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| CN 201110288971 CN102330060B (en) | 2011-09-27 | 2011-09-27 | Composite structural target for arc ion plating deposition magnetic material coating and application of composite structural target |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103074585A (en) * | 2013-01-10 | 2013-05-01 | 中国科学院金属研究所 | Design and application of composite target material used in arc ion plating magnetic material coating deposition |
| CN108531878A (en) * | 2018-07-23 | 2018-09-14 | 陕西师范大学 | A kind of method of magnetron sputtering deposition nickel film and nickel oxide film |
| CN108611617A (en) * | 2018-07-23 | 2018-10-02 | 陕西师范大学 | A kind of method of magnetron sputtering deposition cobalt film and cobalt oxide film |
| CN108611618A (en) * | 2018-07-23 | 2018-10-02 | 陕西师范大学 | A kind of method of magnetron sputtering deposition iron film and iron oxide film |
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| CN202226910U (en) * | 2011-09-27 | 2012-05-23 | 中国科学院金属研究所 | Composite structure target material for electric arc ion plating depositing magnetic material coating |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103074585A (en) * | 2013-01-10 | 2013-05-01 | 中国科学院金属研究所 | Design and application of composite target material used in arc ion plating magnetic material coating deposition |
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