CN102313920A - Wide spectrum metal multilayer dielectric grating based on non-normalized film structure - Google Patents
Wide spectrum metal multilayer dielectric grating based on non-normalized film structure Download PDFInfo
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- CN102313920A CN102313920A CN201110259841A CN201110259841A CN102313920A CN 102313920 A CN102313920 A CN 102313920A CN 201110259841 A CN201110259841 A CN 201110259841A CN 201110259841 A CN201110259841 A CN 201110259841A CN 102313920 A CN102313920 A CN 102313920A
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Abstract
The invention relates to a wide spectrum metal multilayer dielectric grating based on a non-normalized film structure, especially to a wide spectrum metal multilayer dielectric grating used for a 1053 nanometer femto second laser pulse amplification system. According to the invention, a thickness of a high reflective film employs a non-normalized film structure; when a grating period is 1480 line/ millimeters, an etching depth is 400 nanometers, the thickness of a residual film is 200 nanometers, a duty ratio is 0.2, and an incident angle is 58 degrees, with regard to a TE wave with a central wave length of 1053 nanometers, the wide spectrum metal multilayer dielectric grating provided in the invention is superior in a range of from 980 nanometers to 1140 nanometers of a -1 level diffraction efficiency and an effective working bandwidth reaches 160 nanometers. Besides, the grating provided in the invention can be manufactured by an optical holographic and ion beam etching technology. According to the invention, the grating has an important application value on improvement of a performance of a chirped-pulse amplification system.
Description
Technical field
The present invention relates to a kind of metal dielectric-coating grating that is applied to the femto-second laser pulse amplification system; Relate in particular to a kind of wide spectrum metal dielectric-coating grating that is used for 1053 nanometer femto-second laser pulse amplification systems, belong to the diffraction grating technical field based on non-regular film layer structure.
Background technology
Development and application demand along with laser technology; The acquisition of peak value, ultrashort laser pulse becomes the important means of exploring light and matter interaction gradually; Chirped pulse amplification system (Chirped-Pulse Amplification; CPA) decisive role in the procurement process of peak value ultrashort pulse; (Pulse Compression Grating PCG) should have and has high as far as possible diffraction efficiency, threshold for resisting laser damage and spectral range as the pulsewidth of CPA system core element compression grating.
Multi-Layer Dielectric Film Pulse Compression Gratings (Multi-layer Dielectric Grating, MDG) owing to have high-diffraction efficiency, a flexible design, advantage such as high damage threshold and obtain primary study and widespread use.
Yet along with the increase grating internal stress of the membrane stack inner membrance number of plies also increases accordingly, make photogate be vulnerable to physical injury, cause the grating diffration performance stable inadequately.
Ultrashort laser pulse is because dispersion interaction requires pulsewidth compression grating to have wideer spectral range, and MDG can't satisfy the bandwidth demand of ultrashort laser pulse.
Metal dielectric-coating grating (Metal Multilayer Dielectric Grating; MMDG) then can combine the broadband performance of metal and the high diffraction property of deielectric-coating grating; Make it have the prefect dielectric film grating bandwidth that is beyond one's reach, also have the high-diffraction efficiency that the metal film grating can't be realized.
Summary of the invention
The purpose of this invention is to provide a kind of wide spectrum metal dielectric-coating grating based on non-regular film layer structure; The mode that promptly adopts metal film and deielectric-coating to combine; In guaranteeing wide spectral range, has high reflectance; Make it under the TE of 1053 nanometers pattern service condition, realize wide spectrum high-diffraction efficiency; Further reduce the number of media coating, and then reduce the inner stress of membrane stack, make grating have more stable performance.
Technical scheme of the present invention is following:
A kind of wide spectrum metal dielectric-coating grating based on non-regular film layer structure is characterized in that: this wide spectrum metal dielectric-coating grating comprises substrate, Metal Cr film, metal A g film, high index of refraction TiO
2Deielectric-coating, low-refraction SiO
2Deielectric-coating, residue rete and band gap structure; Described metal A g film, TiO
2Deielectric-coating and SiO
2Deielectric-coating is formed highly reflecting films; Described residue rete and band gap structure are HfO
2Material; The cycle of grating is 1480 lines/mm, and etching depth is 400 nanometers, and the thickness of residue rete is 200 nanometers, and dutycycle is 0.2, and incident angle is 58 °, and the polarization of incident light attitude is the TE pattern.
Highly reflecting films of the present invention adopt non-ordered structure, and wherein the thickness of metal A g film is 87.5nm, TiO
2The thickness of deielectric-coating is 171nm, SiO
2The thickness of deielectric-coating is 111nm.
Wide spectrum metal dielectric-coating grating based on non-regular film layer structure provided by the invention is the TE ripple of 1053 nanometers for centre wavelength, and-1 order diffraction efficient is superior to 97% in the 980nm-1140nm scope, and effective bandwidth reaches 160nm.Between surface structure grating and metal medium reflectance coating, introduce the residue rete, this tunic is top layer HfO
2Residue rete after the etching, its effect are the structural parameters that can effectively regulate grating, the overall characteristic of equilibration period, dutycycle and film layer structure.While is satisfying in order to ensure grating-1 grade high-diffraction efficiency condition also.
Description of drawings
Fig. 1 is the structural drawing of the wide spectrum metal dielectric-coating grating based on non-regular film layer structure of the present invention.
Fig. 2 uses the metallic reflective coating spectral pattern for the wide spectrum pulsewidth compression of the present invention grating.
Fig. 3 is the wide spectrum metal medium of a present invention grating spectrum family curve.
The 1-band gap structure; 2-remains rete; 3-low-refraction SiO
2Deielectric-coating; 4-high index of refraction TiO
2Deielectric-coating; 5-metal A g rete; 6-Metal Cr film; The 7-substrate; The 8-highly reflecting films.
Embodiment:
The wide spectrum metal dielectric-coating optical grating construction that the present invention proposes is as shown in Figure 1, and this wide spectrum metal dielectric-coating grating comprises substrate 7, Metal Cr film 6, metal A g film 5, high index of refraction TiO from bottom to up successively
2Deielectric-coating 4, low-refraction SiO
2Deielectric-coating 3, residue rete 2 and band gap structure 1; Described metal A g film 5, high index of refraction TiO
2Deielectric-coating 4 and low-refraction SiO
2Deielectric-coating 3 is formed highly reflecting films 8; Described residue rete 2 is HfO with band gap structure
2Material.
Metal A g film, high index of refraction TiO
2Deielectric-coating and low-refraction SiO
2The highly reflecting films that deielectric-coating is formed can provide high reflectivity in enough wide spectral range, to guarantee that incident light can be by whole reflection diffractions.Grating adopts sub-wavelength (cycle of grating is less than incident wavelength) structure, with guarantee to have only behind the optical grating reflection diffraction 0 grade with-1 grade, and then realize high-diffraction efficiency.In order to guarantee that the light behind the diffraction does not overlap with incident light, is prone to select for use wide-angle incident form.
Be that the wide spectrum metal dielectric-coating grating of 1053 nanometers is that example is explained main contents of the present invention with centre wavelength below.Consider the preparation technology and the service condition of grating, the cycle of choosing grating is 1480 lines/mm, and grating incident polarization attitude is the TE pattern; Etching depth is 400 nanometers, and the thickness of residue rete is 200 nanometers, and dutycycle is 0.2, and incident angle is 58 °.
Highly reflecting films adopt non-ordered structure (thicknesses of layers is non-quarter-wave); Made full use of the high reflection characteristic of the wide spectrum and the deielectric-coating of metal; Its structure is G/CrAgTL, and wherein G is substrate, and the thickness of Metal Cr film is 67nm; The thickness of metal A g rete is 87.5nm, the high index of refraction TiO of T representative
2The thickness of film is 171nm, the low-refraction SiO of L representative
2The thickness of film is 111nm.Reflectance spectrum curve by metal film and media coating are formed is as shown in Figure 2.
The groove depth variation range of grating is 10-500nm among the design, and the variation in thickness scope of residue rete is 1-300nm, and the variation range of dutycycle is 0.2-0.5, and the variation range of incident angle is 40 °-60 °.
Utilize the rigorous coupled wave theory that the structure of grating is optimized design, thickness, dutycycle and the incident angle of the etching depth that grating is corresponding when obtaining spectral bandwidth and being 160nm, residue rete are respectively 400nm, 200nm, 0.2,58 °.
Fig. 3 concerns with wavelength change for optical grating reflection-1 order diffraction efficient under institute's counter structure parameter after the above-mentioned optimization.Can find out that by the curve of spectrum diffraction efficiency is all more than 97% in the 980nm-1150nm scope; Consider that angle of diffraction and incident angle need separating of certain angle; The high-diffraction efficiency wavelength of maximum is chosen as 1140nm; Can obtain this moment diffraction light according to the analysis of grating equation has 1 ° angle separate with incident light, so works as incident wavelength incident ray in the 980nm-1140nm scope and can not exert an influence to diffracted ray.
Comprehensive above the analysis and the instance explanation, the metal dielectric-coating based on non-scale film layer structure that the present invention proposes widens the spectral range optical grating construction and Optimization Design is correct.The metal dielectric-coating grating that the present invention is based on non-regular film layer structure design is the TE ripple of 1053 nanometers for centre wavelength, and-1 order diffraction efficient is superior to 97% effective spectral range and reaches 160nm.
Claims (2)
1. wide spectrum metal dielectric-coating grating based on non-regular film layer structure, it is characterized in that: this wide spectrum metal dielectric-coating grating comprises substrate (7), Metal Cr film (6), metal A g film (5), TiO from bottom to up successively
2Deielectric-coating (4), SiO
2Deielectric-coating (3), residue rete (2) and band gap structure (1); Described metal A g film (5), TiO
2Deielectric-coating (4) and SiO
2Deielectric-coating (3) is formed highly reflecting films (8); Described residue rete (2) and band gap structure are HfO
2Material; The cycle of grating is 1480 lines/mm, and etching depth is 400 nanometers, and the thickness of residue rete is 200 nanometers, and dutycycle is 0.2, and incident angle is 58 °, and the polarization of incident light attitude is the TE pattern.
2. according to the described a kind of wide spectrum metal dielectric-coating grating based on non-regular film layer structure of claim 1, it is characterized in that: described highly reflecting films adopt non-ordered structure, and its structure is G/CrAgTL, and wherein G is substrate, and T represents TiO
2Deielectric-coating, L represents SiO
2Deielectric-coating, the thickness of Metal Cr film are 67nm, and the thickness of metal A g film is 87.5nm, TiO
2The thickness of deielectric-coating is 171nm, SiO
2The thickness of deielectric-coating is 111nm.
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102289014A (en) * | 2011-09-16 | 2011-12-21 | 中国科学院上海光学精密机械研究所 | Metal dielectric film reflection polarization beam splitting grating for waveband of 1,053 nanometers |
| CN103235417A (en) * | 2013-04-23 | 2013-08-07 | 太原理工大学 | Thin film type optical collimator on basis of surface plasmon polaritons |
| CN104777532A (en) * | 2015-04-03 | 2015-07-15 | 中国科学院上海光学精密机械研究所 | Ultra-narrow-band TE (transverse electric) polarizing spectrum selective absorber based on cascaded fiber grating structure |
| CN104880755A (en) * | 2015-06-02 | 2015-09-02 | 中国科学院上海技术物理研究所 | Sub-wavelength metal grating polarizing film monolithically integrated on high-refractive-index substrate |
| CN111007585A (en) * | 2019-12-06 | 2020-04-14 | 武汉大学 | Super surface sine grating for eliminating zero level and design method thereof |
| CN112578490A (en) * | 2019-09-30 | 2021-03-30 | 南开大学 | Low-refractive-index large-angle deflection sparse grating for 3D printing |
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| US5907436A (en) * | 1995-09-29 | 1999-05-25 | The Regents Of The University Of California | Multilayer dielectric diffraction gratings |
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| CN101887140A (en) * | 2010-05-26 | 2010-11-17 | 中国科学院上海光学精密机械研究所 | Broadband all-dielectric multilayer-film reflective diffraction grating and design method thereof |
| WO2011073554A1 (en) * | 2009-12-17 | 2011-06-23 | Ecole Polytechnique | Optimized dielectric reflective diffraction grating |
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2011
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102289014A (en) * | 2011-09-16 | 2011-12-21 | 中国科学院上海光学精密机械研究所 | Metal dielectric film reflection polarization beam splitting grating for waveband of 1,053 nanometers |
| CN103235417A (en) * | 2013-04-23 | 2013-08-07 | 太原理工大学 | Thin film type optical collimator on basis of surface plasmon polaritons |
| CN103235417B (en) * | 2013-04-23 | 2015-07-22 | 太原理工大学 | Thin film type optical collimator on basis of surface plasmon polaritons |
| CN104777532A (en) * | 2015-04-03 | 2015-07-15 | 中国科学院上海光学精密机械研究所 | Ultra-narrow-band TE (transverse electric) polarizing spectrum selective absorber based on cascaded fiber grating structure |
| CN104880755A (en) * | 2015-06-02 | 2015-09-02 | 中国科学院上海技术物理研究所 | Sub-wavelength metal grating polarizing film monolithically integrated on high-refractive-index substrate |
| CN104880755B (en) * | 2015-06-02 | 2017-08-25 | 中国科学院上海技术物理研究所 | A kind of sub-wave length metal grating polarizer for being monolithically integrated in high index of refraction substrate |
| CN112578490A (en) * | 2019-09-30 | 2021-03-30 | 南开大学 | Low-refractive-index large-angle deflection sparse grating for 3D printing |
| CN111007585A (en) * | 2019-12-06 | 2020-04-14 | 武汉大学 | Super surface sine grating for eliminating zero level and design method thereof |
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| CN102313920B (en) | 2013-06-05 |
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