CN102310264B - Ultraviolet laser applied optics system - Google Patents
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- 238000012545 processing Methods 0.000 claims abstract description 52
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- 230000005499 meniscus Effects 0.000 claims description 22
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- 238000003199 nucleic acid amplification method Methods 0.000 description 1
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Abstract
The invention is suitable for the field of laser processing and provides an ultraviolet laser applied optics system. The ultraviolet laser applied optics system consists of a laser processing subsystem and a monitoring subsystem coaxial with the laser processing subsystem. The laser processing subsystem is provided with a beam expander and a focus lens, wherein the beam expander consists of a double-concave lens and a crescent lens which are arranged sequentially along the incidence direction of light; and the focus lens consists of a crescent lens, a double-concave lens, a crescent lens and a crescent lens which are arranged sequentially along the incidence direction of the light. A first dichroic mirror is arranged between the beam expander and the focus lens. When the ultraviolet laser with the wavelength of 355nm is focused to a workpiece through the beam expander and the focus lens sequentially, the beam expander has the number of beam expanding times of 6 and the focus lens has the focus length of 20mm. In the invention, the processing condition of the workpiece is monitored in real time by the monitoring subsystem, so that the processing accuracy is improved and the superfine processing is realized. The ultraviolet laser applied optics system particularly can be applied to repair of an LCD (liquid crystal display).
Description
Technical field
The invention belongs to field of laser processing, relate in particular to a kind of Ultra-Violet Laser applied optics system.
Background technology
Along with the development of Laser Processing, need the medium kind of processing day by day to increase, the effect that requirement processes is also more and more meticulousr.Especially some special materials, they have special requirement to swashing light wavelength.Wavelength is the processing that the laser of 1064nm or 532nm has not been suitable for some material; Also some material enables to process with the laser that wavelength is 1064nm or 532nm, but processing effect is meticulous not, clear.
The Ultra-Violet Laser that a kind of wavelength rising is at present 355nm, the amplification that this Ultra-Violet Laser can adapt to some special media (material) absorbs.The laser that is 1064nm or 532nm with wavelength is compared, and the Ultra-Violet Laser that wavelength is 355nm has the resolution ratio of less blur circle and Geng Gao, and focal beam spot is minimum, and processing heat affected area is very little.Therefore, Ultra-Violet Laser can be accomplished retrofit, and the effect of workpiece processing is meticulousr, clear, and efficiency is higher.But existing Ultra-Violet Laser applied optics system machining accuracy is low.
Summary of the invention
The object of the embodiment of the present invention is to provide a kind of Ultra-Violet Laser applied optics system, is intended to solve the low problem of existing Ultra-Violet Laser applied optics system machining accuracy.
The embodiment of the present invention is achieved in that a kind of Ultra-Violet Laser applied optics system, comprising: Laser Processing subsystem and the Monitor And Control Subsystem coaxial with described Laser Processing subsystem;
Described Laser Processing subsystem has a beam expanding lens being made up of the first lens setting gradually along light incident direction and the second lens and a focus lamp being made up of the 3rd lens that set gradually along light incident direction, the 4th lens, the 5th lens and the 6th lens, is provided with the first dichroic mirror between described beam expanding lens and focus lamp;
Described first lens is double concave type lens, described the second lens and the 3rd lens are the meniscus lens of curved surface towards the bending of light incident direction, described the 4th lens are lenticular lens, and described the 5th lens and the 6th lens are curved surface carries the meniscus lens of light incident direction bending;
Wavelength be 355nm Ultra-Violet Laser first after in the time that described beam expanding lens and focus lamp focus on workpiece, the multiple that expands of described beam expanding lens is six times, the focal length of described focus lamp is 20mm.
The Ultra-Violet Laser applied optics system that the embodiment of the present invention provides forms by Laser Processing subsystem with the coaxial Monitor And Control Subsystem of Laser Processing subsystem, wherein Laser Processing subsystem has a beam expanding lens and being made up of the double concave type lens that set gradually along light incident direction and meniscus lens by the meniscus lens setting gradually along light incident direction, lenticular lens, the focus lamp that meniscus lens and meniscus lens form, Monitor And Control Subsystem is monitored in real time to the processing situation of workpiece, to improve machining accuracy, realize hyperfine processing, especially can be applicable to LCD repairs.
Brief description of the drawings
Fig. 1 is the structural representation of the Ultra-Violet Laser applied optics system that provides of the embodiment of the present invention;
Fig. 2 is the structural representation of the Laser Processing subsystem that provides of the embodiment of the present invention;
Fig. 3 is the disc of confusion figure of the Laser Processing subsystem that provides of the embodiment of the present invention;
Fig. 4 is the encircled energy figure of the Laser Processing subsystem that provides of the embodiment of the present invention;
Fig. 5 is the optical transfer function MTF figure of the Laser Processing subsystem that provides of the embodiment of the present invention;
Fig. 6 is the structural representation of the Monitor And Control Subsystem that provides of the embodiment of the present invention;
Fig. 7 is the disc of confusion figure of the Monitor And Control Subsystem that provides of the embodiment of the present invention;
Fig. 8 is the encircled energy figure of the Monitor And Control Subsystem that provides of the embodiment of the present invention;
Fig. 9 is the optical transfer function MTF figure of the Monitor And Control Subsystem that provides of the embodiment of the present invention.
Detailed description of the invention
In order to make object of the present invention, technical scheme and advantage clearer, below in conjunction with drawings and Examples, the present invention is further elaborated.Should be appreciated that specific embodiment described herein, only in order to explain the present invention, is not intended to limit the present invention.
The Ultra-Violet Laser applied optics system that the embodiment of the present invention provides forms by Laser Processing subsystem with the coaxial Monitor And Control Subsystem of Laser Processing subsystem, wherein Laser Processing subsystem has the beam expanding lens being made up of the double concave type lens that set gradually along light incident direction and meniscus lens and the focus lamp being made up of the meniscus lens setting gradually along light incident direction, lenticular lens, meniscus lens and meniscus lens, Monitor And Control Subsystem is monitored in real time to the processing situation of workpiece, to improve machining accuracy.
The Ultra-Violet Laser applied optics system that the embodiment of the present invention provides comprises Laser Processing subsystem and the Monitor And Control Subsystem coaxial with described Laser Processing subsystem; Described Laser Processing subsystem has a beam expanding lens being made up of the first lens setting gradually along light incident direction and the second lens and a focus lamp being made up of the 3rd lens that set gradually along light incident direction, the 4th lens, the 5th lens and the 6th lens, is provided with the first dichroic mirror between described beam expanding lens and focus lamp; Described first lens is double concave type lens, described the second lens and the 3rd lens are the meniscus lens of curved surface towards the bending of light incident direction, described the 4th lens are lenticular lens, and described the 5th lens and the 6th lens are curved surface carries the meniscus lens of light incident direction bending; Wavelength be 355nm Ultra-Violet Laser first after in the time that described beam expanding lens and focus lamp focus on workpiece, the multiple that expands of described beam expanding lens is six times, the focal length of described focus lamp is 20mm.
Below in conjunction with specific embodiment, realization of the present invention is described in detail.
Fig. 1 shows the structure of the Ultra-Violet Laser applied optics system that the present embodiment provides, and for convenience of explanation, only shows the part relevant to the present embodiment.
As shown in Figure 1, the Ultra-Violet Laser applied optics system that the embodiment of the present invention provides comprises Laser Processing subsystem and Monitor And Control Subsystem, and Monitor And Control Subsystem is coaxial with Laser Processing subsystem.Laser Processing subsystem has a beam expanding lens 1 being made up of the first lens 11 setting gradually along light incident direction and the second lens 12 and a focus lamp 2 being made up of the 3rd lens 23, the 4th lens 24, the 5th lens 25 and the 6th lens 26 that set gradually along light incident direction, is provided with the first dichroic mirror 3 between beam expanding lens 1 and focus lamp 2.
Refer to following table, following table is the optical parametric of each lens in Laser Processing subsystem, and wherein the tolerance of all parameter values is all no more than 5% of desired value separately.
| Curved surface S | Radius of curvature R (mm) | Face interval d (mm) | Material Nd/Vd |
| 1 | -19 | 1 | 1.46/68 |
| 2 | 4.2 | 11 | |
| 3 | -60 | 1.6 | 1.46/68 |
| 4 | -9.6 | ||
| 5 | -16 | 1.5 | 1.46/68 |
| 6 | -22 | 0.1 | |
| 7 | 56.5 | 1.5 | 1.46/68 |
| 8 | -48 | 0.1 | |
| 9 | 22 | 1.5 | 1.46/68 |
| 10 | 205 | 0.1 | |
| 11 | 14 | 1.5 | 1.46/68 |
| 12 | 30 |
Below the beam expanding lens being made up of first lens and the second lens is described in detail.
As shown in Figure 2, first lens 11 is for having the double concave type lens of first surface S1 and the second curved surface S2, the desired value of the radius of curvature R 1 of first surface S1 is-19mm, the desired value of the radius of curvature R 2 of the second curved surface S2 is 4.2mm, and the face interval of first surface S1 and the second curved surface S2 is that the desired value of the center thickness d1 of first lens 11 on optical axis is 1mm.The desired value of the material Nd1:Vd1 of first lens 11 is that 1.46/68 (Nd1 represents that the material of first lens 11 is in the refractive index at the d of wavelength X=355nm line place, Vd1 represents that the material of first lens 11 is at the Abbe number at the d of wavelength X=355nm line place), wherein the tolerance of radius of curvature R 1, radius of curvature R 2, center thickness d1 and material Nd1:Vd1 is all no more than 5% of desired value separately.The material Nd1:Vd1 refractive index of first lens 11 is high, also high to Ultra-Violet Laser transmissivity.
The second lens 12 are the meniscus lens of curved surface towards the bending of light incident direction, and it has the 3rd curved surface S3 and the 4th curved surface S4.The desired value of the radius of curvature R 3 of the 3rd curved surface S3 is-60mm that the desired value of the radius of curvature R 4 of the 4th curved surface S4 is-9.6mm that the face interval of the 3rd curved surface S3 and the 4th curved surface S4 i.e. desired value of the center thickness d3 of the second lens 12 on optical axis is 1.6mm.The desired value of the material Nd2:Vd2 of the second lens 12 is that 1.46/68 (Nd2 represents that the material of the second lens 12 is in the refractive index at the d of wavelength X=355nm line place, Vd2 represents that the material of the second lens 12 is at the Abbe number at the d of wavelength X=355nm line place), wherein the tolerance of radius of curvature R 3, radius of curvature R 4, center thickness d3 and material Nd2:Vd2 is all no more than 5% of desired value separately.The material Nd2:Vd2 refractive index of the second lens 12 is high, also high to Ultra-Violet Laser transmissivity.
The desired value of the face interval d2 of the second curved surface S2 and the 3rd curved surface S3 is 11mm, and the tolerance of face interval d2 is no more than 5% of its desired value.
In the embodiment of the present invention, the wavelength of incident laser is 355nm while being Ultra-Violet Laser, and the multiple that expands that above-mentioned each parameter is all got the made beam expanding lens 1 of desired value is six times, and the maximum incident light diameter of its permission is 1.5mm.
Should be appreciated that when above-mentioned first lens 11 and the second lens 12 form beam expanding lens 1, in order to protect exposed lens or can to increase the optical window being formed by flat-plate lens in any position on set of lenses light direction for other any object.
Below the focus lamp being made up of the 3rd lens, the 4th lens, the 5th lens and the 6th lens is described in detail.
The 3rd lens 23 are the meniscus lens of curved surface towards the bending of light incident direction, and it has the 5th curved surface S5 and the 6th curved surface S6.The desired value of the radius of curvature R 5 of the 5th curved surface S5 is-16mm that the desired value of the radius of curvature R 6 of the 6th curved surface S6 is-22mm that the face interval of the 5th curved surface S5 and the 6th curved surface S6 i.e. desired value of the center thickness d5 of the 3rd lens 23 on optical axis is 1.5mm.The desired value of the material Nd3:Vd3 of the 3rd lens 23 is that 1.46/68 (Nd3 represents that the material of the 3rd lens 23 is in the refractive index at the d of wavelength X=355nm line place, Vd3 represents that the material of the 3rd lens 23 is at the Abbe number at the d of wavelength X=355nm line place), wherein the tolerance of radius of curvature R 5, radius of curvature R 6, center thickness d5 and material Nd3:Vd3 is all no more than 5% of desired value separately.The material Nd3:Vd3 refractive index of the 3rd lens 23 is high, also high to Ultra-Violet Laser transmissivity.
The 4th lens 24 are for having the lenticular lens of the 7th curved surface S7 and the 8th curved surface S8, the desired value of the radius of curvature R 7 of the 7th curved surface S7 is 56.5mm, the desired value of the radius of curvature R 8 of the 8th curved surface S8 is-48mm that the face interval of the 7th curved surface S7 and the 8th curved surface S8 i.e. desired value of the center thickness d7 of the 4th lens 24 on optical axis is 1.5mm.The desired value of the material Nd4:Vd4 of the 4th lens 24 is that 1.46/68 (Nd4 represents that the material of the 4th lens 24 is in the refractive index at the d of wavelength X=355nm line place, Vd4 represents that the material of the 4th lens 24 is at the Abbe number at the d of wavelength X=355nm line place), wherein the tolerance of radius of curvature R 7, radius of curvature R 8, center thickness d7 and material Nd4:Vd4 is all no more than 5% of desired value separately.The material Nd4:Vd4 refractive index of the 4th lens 24 is high, also high to Ultra-Violet Laser transmissivity.
The 5th lens 25 are carried the meniscus lens of light incident direction bending for curved surface, and it has zigzag face S9 and the tenth curved surface S10.The desired value of the radius of curvature R 9 of zigzag face S9 is 22mm, and the desired value of the radius of curvature R 10 of the tenth curved surface S10 is 205mm, and the face interval of zigzag face S9 and the tenth curved surface S10 i.e. desired value of the center thickness d9 of the 5th lens 25 on optical axis is 1.5mm.The desired value of the material Nd5:Vd5 of the 5th lens 25 is that 1.46/68 (Nd5 represents that the material of the 5th lens 25 is in the refractive index at the d of wavelength X=355nm line place, Vd5 represents that the material of the 5th lens 25 is at the Abbe number at the d of wavelength X=355nm line place), wherein the tolerance of radius of curvature R 9, radius of curvature R 10, center thickness d9 and material Nd5:Vd5 is all no more than 5% of desired value separately.The material Nd5:Vd5 refractive index of the 5th lens 25 is high, also high to Ultra-Violet Laser transmissivity.
The 6th lens 26 are carried the meniscus lens of light incident direction bending for curved surface, and it has the 11 curved surface S11 and the 12 curved surface S12.The desired value of the radius of curvature R 11 of the 11 curved surface S11 is 14mm, the desired value of the radius of curvature R 12 of the 12 curved surface S12 is 30mm, and the face interval of the 11 curved surface S11 and the 12 curved surface S12 i.e. desired value of the center thickness d11 of the 6th lens 26 on optical axis is 1.5mm.The desired value of the material Nd6:Vd6 of the 6th lens 26 is that 1.46/68 (Nd6 represents that the material of the 6th lens 26 is in the refractive index at the d of wavelength X=355nm line place, Vd6 represents that the material of the 6th lens 26 is at the Abbe number at the d of wavelength X=355nm line place), wherein the tolerance of radius of curvature R 11, radius of curvature R 12, center thickness d11 and material Nd6:Vd6 is all no more than 5% of desired value separately.The material Nd6:Vd6 refractive index of the 6th lens 26 is high, also high to Ultra-Violet Laser transmissivity.
The desired value of the face interval d6 of the 6th curved surface S6 and the 7th curved surface S7 is 0.1mm, the desired value of the face interval d8 of the 8th curved surface S8 and zigzag face S9 is 0.1mm, the desired value of the face interval d10 of the tenth curved surface S10 and the 11 curved surface S11 is 0.1mm, and the tolerance of face interval d6, d8, d10 is all no more than 5% of desired value separately.Hence one can see that, and this focus lamp overall structure is very compact, is a kind of microminiature amasthenic lens, solves existing camera lens and occupy the excessive problem in space.
In the embodiment of the present invention, the wavelength of incident laser is 355nm while being Ultra-Violet Laser, and the focal distance f that above-mentioned each parameter is all got the made focus lamp 2 of desired value is 20mm, and entrance pupil diameter D is 10mm.
Be to be understood that; when above-mentioned the 3rd lens 23, the 4th lens 24, the 5th lens 25 and the 6th lens 26 form focus lamp 2, in order to protect exposed lens or can to increase the optical window being formed by flat-plate lens in any position on set of lenses light direction for other any object.
Above-mentioned focus lamp 2 is shared and is formed thus coaxial system by Laser Processing subsystem and Monitor And Control Subsystem.
As one embodiment of the present of invention, Monitor And Control Subsystem comprises monitoring light source 4, for the monitor optical sent of monitoring light source 4 being reflexed to the first dichroic mirror 3 and making the second coaxial dichroic mirror 5 of this monitor optical and Ultra-Violet Laser and for receiving the monitor optical returned and the image supervisory control device 6 coaxial with Ultra-Violet Laser, as shown in Fig. 1 and Fig. 6.
Above-mentioned monitoring light source 4 is green light LED, and it can send the green glow of 532nm.The second dichroic mirror 5 is the dichroic mirror of the green glow half-reflection and half-transmission to 532nm.The monitor screen that image supervisory control device 6 is electrically connected by CCD and with CCD forms.Wherein the first dichroic mirror 3 is thoroughly high to the green glow of 532nm, high anti-to the Ultra-Violet Laser of 355nm.The embodiment of the present invention adopts green light LED as monitoring light source, and its monitor optical of sending is coaxial with Ultra-Violet Laser, can further improve the machining accuracy of Ultra-Violet Laser to workpiece.
In embodiments of the present invention, between monitoring light source 4 and the second dichroic mirror 5, be provided with the first optical filter 7, so that the green glow filtering of the non-532nm that LED is sent does not affect monitor optical and focuses on workpiece.Between the second dichroic mirror 5 and image supervisory control device 6, be provided with the second optical filter 8, the second optical filters 8 by the veiling glare returning (as Ultra-Violet Laser, natural daylight etc.) filtering, eliminate the impact of veiling glare on CCD imaging.
As shown in Figure 3,4, Ultra-Violet Laser expands with focus lamp 2 focal beam spots minimum through above-mentioned beam expanding lens 1 first, concentration of energy, the live width that the Laser Processing subsystem being made up of this beam expanding lens 1 and focus lamp 2 depicts can reach 4 μ m, the clear patterns depicting, accurate.On axle, still off-axis aberration is all proofreaied and correct ideally, and the correction of all aberrations has reached desired resolution, has solved well the problems such as flat image planes and distortion.
Fig. 5 is the MTF figure of this Laser Processing subsystem integrated imaging quality evaluation, and the mtf value of each visual field is more consistent, illustrates that imaging is even on full visual field.
As shown in Figure 7,8, the light that monitoring light source sends is also little through above-mentioned focus lamp 2 focal beam spots, imaging clearly on monitor screen.When employing 1/3, " when CCD, the working range that can monitor is 0.5*0.5mm2.This Monitor And Control Subsystem alignment precision is very high, and precision is within μ m level, and resolution ratio has exceeded the requirement of CCD institute.Thereby the processing situation of monitoring laser processing subsystem to workpiece in real time, has greatly promoted the precision that Ultra-Violet Laser is processed.
Fig. 9 is the MTF figure of this Monitor And Control Subsystem integrated imaging quality evaluation, and the mtf value of each visual field is more consistent, illustrates that imaging is even on full visual field.
Ultra-Violet Laser is processed workpiece through this application optical system, no matter cuts or rules, and all can realize hyperfine processing.This Ultra-Violet Laser applied optics system will be widely used in hyperfine mark, cutting, special material mark and delineation etc.For example, mark on food, medical packaging material, (d≤10, aperture μ m) to beat micropore; Mark on flexible PCB plate, scribing; Remove metal or nonmetal coating; In silicon wafer, carry out micropore, blind hole processing etc.; Especially can be applicable to LCD repairs.
The Ultra-Violet Laser applied optics system that the embodiment of the present invention provides forms by Laser Processing subsystem with the coaxial Monitor And Control Subsystem of Laser Processing subsystem, wherein Laser Processing subsystem has a beam expanding lens and being made up of the double concave type lens that set gradually along light incident direction and meniscus lens by the meniscus lens setting gradually along light incident direction, lenticular lens, the focus lamp that meniscus lens and meniscus lens form, Monitor And Control Subsystem is monitored in real time to the processing situation of workpiece, to improve machining accuracy, realize hyperfine processing, especially can be applicable to LCD repairs.Meanwhile, adopt green light LED as monitoring light source, its monitor optical of sending is coaxial with Ultra-Violet Laser, can further improve machining accuracy.In addition, in focus lamp, the face interval of each lens is little, and overall structure is very compact, solves existing camera lens and occupies the excessive problem in space.
The foregoing is only preferred embodiment of the present invention, not in order to limit the present invention, all any amendments of doing within the spirit and principles in the present invention, be equal to and replace and improvement etc., within all should being included in protection scope of the present invention.
Claims (6)
1. a Ultra-Violet Laser applied optics system, comprising: Laser Processing subsystem and the Monitor And Control Subsystem coaxial with described Laser Processing subsystem, it is characterized in that,
Described Laser Processing subsystem has a beam expanding lens being made up of the first lens setting gradually along light incident direction and the second lens and a focus lamp being made up of the 3rd lens that set gradually along light incident direction, the 4th lens, the 5th lens and the 6th lens, is provided with the first dichroic mirror between described beam expanding lens and focus lamp;
Described first lens is double concave type lens, described the second lens and the 3rd lens are the meniscus lens of curved surface towards the bending of light incident direction, described the 4th lens are lenticular lens, and described the 5th lens and the 6th lens are curved surface carries the meniscus lens of light incident direction bending;
Wavelength be 355nm Ultra-Violet Laser first after in the time that described beam expanding lens and focus lamp focus on workpiece, the multiple that expands of described beam expanding lens is six times, the focal length of described focus lamp is 20mm;
Described first lens has first surface S1 and the second curved surface S2, and the desired value of the radius of curvature R 1 of described first surface S1 is-19mm that the desired value of the radius of curvature R 2 of described the second curved surface S2 is 4.2mm;
Described the second lens have the 3rd curved surface S3 and the 4th curved surface S4, and the desired value of the radius of curvature R 3 of described the 3rd curved surface S3 is-60mm that the desired value of the radius of curvature R 4 of described the 4th curved surface S4 is-9.6mm;
Described the 3rd lens have the 5th curved surface S5 and the 6th curved surface S6, and the desired value of the radius of curvature R 5 of described the 5th curved surface S5 is-16mm that the desired value of the radius of curvature R 6 of described the 6th curved surface S6 is-22mm;
Described the 4th lens have the 7th curved surface S7 and the 8th curved surface S8, and the desired value of the radius of curvature R 7 of described the 7th curved surface S7 is 56.5mm, and the desired value of the radius of curvature R 8 of described the 8th curved surface S8 is-48mm;
Described the 5th lens have zigzag face S9 and the tenth curved surface S10, and the desired value of the radius of curvature R 9 of described zigzag face S9 is 22mm, and the desired value of the radius of curvature R 10 of described the tenth curved surface S10 is 205mm;
Described the 6th lens have the 11 curved surface S11 and the 12 curved surface S12, and the desired value of the radius of curvature R 11 of described the 11 curved surface S11 is 14mm, and the desired value of the radius of curvature R 12 of described the 12 curved surface S12 is 30mm;
The tolerance of each radius of curvature is all no more than 5% of desired value separately;
The desired value of the center thickness d1 of described first lens on optical axis is 1mm, the desired value of the center thickness d3 of described the second lens on optical axis is 1.6mm, the desired value of the center thickness d5 of described the 3rd lens on optical axis is 1.5mm, the desired value of the center thickness d7 of described the 4th lens on optical axis is 1.5mm, the desired value of the center thickness d9 of described the 5th lens on optical axis is 1.5mm, the desired value of the center thickness d11 of described the 6th lens on optical axis is 1.5mm, and the tolerance of each center thickness is all no more than 5% of desired value separately;
The desired value of the face interval d2 of described the second curved surface S2 and the 3rd curved surface S3 is 11mm, the desired value of the face interval d6 of described the 6th curved surface S6 and the 7th curved surface S7 is 0.1mm, the desired value of the face interval d8 of described the 8th curved surface S8 and zigzag face S9 is 0.1mm, the desired value of the face interval d10 of described the tenth curved surface S10 and the 11 curved surface S11 is 0.1mm, and the tolerance at each interval is all no more than 5% of desired value separately.
2. Ultra-Violet Laser applied optics system as claimed in claim 1, is characterized in that, described Monitor And Control Subsystem comprises:
Monitoring light source;
Reflex to described the first dichroic mirror and make the second coaxial dichroic mirror of described monitor optical and Ultra-Violet Laser for the monitor optical that described monitoring light source is sent; And
For receiving the image supervisory control device of the monitor optical of returning;
Described the second dichroic mirror is to described monitor optical half-reflection and half-transmission, and described the first dichroic mirror is thoroughly high to described monitor optical, high anti-to described Ultra-Violet Laser.
3. Ultra-Violet Laser applied optics system as claimed in claim 2, is characterized in that, described monitoring light source is green light LED, and the monitor screen that described image supervisory control device is electrically connected by CCD and with described CCD forms.
4. Ultra-Violet Laser applied optics system as claimed in claim 3, is characterized in that, between described monitoring light source and the second dichroic mirror, is provided with the first optical filter, between described the second dichroic mirror and image supervisory control device, is provided with the second optical filter.
5. Ultra-Violet Laser applied optics system as claimed in claim 1, it is characterized in that, the desired value of the material Nd:Vd of each lens is 1.46/68, wherein Nd represents that the material of described lens is in the refractive index at the d of wavelength X=355nm line place, and Vd represents that the material of described lens is at the Abbe number at the d of wavelength X=355nm line place; The tolerance of the material of each lens is all no more than 5% of desired value separately.
6. Ultra-Violet Laser applied optics system as claimed in claim 1, is characterized in that, the maximum incident light diameter that described beam expanding lens allows is 1.5mm, and the entrance pupil diameter D of described focus lamp is 10mm.
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|---|---|---|---|---|
| DE102012218221A1 (en) | 2012-10-05 | 2014-04-10 | Carl Zeiss Smt Gmbh | Monitor system for determining orientations of mirror elements and EUV lithography system |
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| CN100999038A (en) * | 2006-12-22 | 2007-07-18 | 江苏大学 | Method and device of laser impact sheet metal mouldless shaping based on liquid crystal mask |
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