CN102296841A - Static-eliminating chemical factory - Google Patents
Static-eliminating chemical factory Download PDFInfo
- Publication number
- CN102296841A CN102296841A CN2011101551046A CN201110155104A CN102296841A CN 102296841 A CN102296841 A CN 102296841A CN 2011101551046 A CN2011101551046 A CN 2011101551046A CN 201110155104 A CN201110155104 A CN 201110155104A CN 102296841 A CN102296841 A CN 102296841A
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- Prior art keywords
- metallic conduction
- chemical industry
- factory building
- conduction plate
- plate
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Abstract
The invention provides a static-eliminating chemical factory which comprises a factory roof, a wall body and a floor, wherein a metal current-conducting plate is adhered on the inner wall surface of the bottom of the wall body, one end of the metal current-conducting plate is inserted into the floor; and a current-conducting layer is arranged on the floor, and the end edge of the current-conducting layer is in contact with the metal current-conducting plate on the wall body. The static-eliminating chemical factory has a simple structure and a better grounding effect, can immediately eliminate static in a production factory, and avoids safety accidents.
Description
Technical field
The present invention relates to the industrial production factory building, a kind of specifically chemical industry factory building that destatics.
Background technology
In Chemical Manufacture enterprise, need to store, use and make a large amount of inflammable and explosive raw materials, therefore, in its manufacturing process, all formulate strict working specification, need wear antistatic clothing, antistatic gloves etc., to reduce the generation of electrostatic phenomenon as operating personnel, but, be full of charged particle in the air, equipment also can gather static in running, if untimely elimination, will produce very serious security incident, influence the safety of personnel and enterprise.
Summary of the invention
At above the deficiencies in the prior art and defective, the object of the present invention is to provide a kind of chemical industry factory building that destatics.
The objective of the invention is by realizing by the following technical solutions:
A kind of chemical industry factory building that destatics comprises factory building roof, body of wall and ground, metal clad conductive plate on the interior metope of described body of wall bottom, and an end of this metallic conduction plate is inserted in the ground; Described ground is provided with conductive layer, and the end limit of this conductive layer contacts setting with metallic conduction plate on the body of wall.
As the preferred technical solution of the present invention, the degree of depth that an end of described metallic conduction plate is inserted in the ground is 1～2cm.
As the preferred technical solution of the present invention, the height of described metallic conduction plate is 10 cm.
As the preferred technical solution of the present invention, described metallic conduction plate is a copper plate.
As the preferred technical solution of the present invention, the conductive layer that is provided with on the described floor is made up of layer of metal conductive plate and one deck conductive rubber slab, and this conductive rubber slab is located at the top of metallic conduction plate.
As the preferred technical solution of the present invention, described metallic conduction plate is a copper plate.
As the preferred technical solution of the present invention, described conductive rubber slab surface-coated has one deck conductive agent
Compared with prior art, the present invention is simple in structure, has good ground connection effect, can in time eliminate the static in the factory, avoids the generation of security incident.
Description of drawings
The invention will be further described below in conjunction with accompanying drawing and specific embodiment:
The cross-sectional view of the chemical industry factory building that Fig. 1 destatics for the present invention.
Fig. 2 is the enlarged diagram in a zone among Fig. 1.
The specific embodiment
See also Fig. 1 and Fig. 2, be respectively the enlarged diagram in a zone among the cross-sectional view of the chemical industry factory building that the present invention destatics and Fig. 1.
The chemical industry factory building that this destatics, comprise factory building roof 101, body of wall 102 and ground 103, metal clad conductive plate 104 on the interior metope of described body of wall 102 bottoms (with the junction on ground 103), the height of this metallic conduction plate 104 is 10 cm, the one end is inserted in the ground 103, contact with the soil under the ground 103, the degree of depth that this end inserts is 1～2cm, to form the ground path of conducting.
Described ground 103 is provided with conductive layer, the end limit of this conductive layer contacts setting with metallic conduction plate 104 on the body of wall 102, this conductive layer is made up of layer of metal conductive plate 105 and one deck conductive rubber slab 106, this conductive rubber slab 106 is located at the top of metallic conduction plate 105, also be coated with one deck conductive agent (figure does not show) on the surface of this conductive rubber slab 106, to strengthen the electric conductivity of conductive rubber slab 106.For improving the performance that destatics of this chemical industry factory building, also can one plain conductor be set and be connected with other grounded screen at the metallic conduction plate 104 on the body of wall 102 or the conductive layer on the ground 103.
Metallic conduction plate 104,105 described in the present embodiment all adopts the good copper plate of electric conductivity, but is not limited thereto, but the also designing requirement of factory adopts other metallic conduction material to be substituted, as: iron, aluminium etc.
The above is preferred embodiment of the present invention only, is not to be used for limiting practical range of the present invention; Every according to equivalence variation and modification that the present invention did, all covered by the scope of claims of the present invention.
Claims (7)
1. a chemical industry factory building that destatics comprises factory building roof, body of wall and ground, it is characterized in that: metal clad conductive plate on the interior metope of described body of wall bottom, and an end of this metallic conduction plate is inserted in the ground; Described ground is provided with conductive layer, and the end limit of this conductive layer contacts setting with metallic conduction plate on the body of wall.
2. the chemical industry factory building that destatics according to claim 1 is characterized in that: the degree of depth that an end of described metallic conduction plate is inserted in the ground is 1～2cm.
3. the chemical industry factory building that destatics according to claim 1 is characterized in that: the height of described metallic conduction plate is 10 cm.
4. according to claim 1 or the 2 or 3 described chemical industry factory buildings that destatic, it is characterized in that: described metallic conduction plate is a copper plate.
5. the chemical industry factory building that destatics according to claim 1 is characterized in that: the conductive layer that is provided with on the described floor is made up of layer of metal conductive plate and one deck conductive rubber slab, and this conductive rubber slab is located at the top of metallic conduction plate.
6. the chemical industry factory building that destatics according to claim 5 is characterized in that: described metallic conduction plate is a copper plate.
7. the chemical industry factory building that destatics according to claim 5 is characterized in that: described conductive rubber slab surface-coated has one deck conductive agent.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011101551046A CN102296841A (en) | 2011-06-10 | 2011-06-10 | Static-eliminating chemical factory |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011101551046A CN102296841A (en) | 2011-06-10 | 2011-06-10 | Static-eliminating chemical factory |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102296841A true CN102296841A (en) | 2011-12-28 |
Family
ID=45357497
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011101551046A Pending CN102296841A (en) | 2011-06-10 | 2011-06-10 | Static-eliminating chemical factory |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102296841A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109281500A (en) * | 2018-10-12 | 2019-01-29 | 安徽优诺净化科技有限公司 | A kind of workshop improving cleanliness |
| CN111579275A (en) * | 2020-04-27 | 2020-08-25 | 深圳市瑞沃德生命科技有限公司 | Collecting tray and slicing machine with same |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62179541U (en) * | 1986-05-01 | 1987-11-14 | ||
| CN2720006Y (en) * | 2004-06-28 | 2005-08-24 | 解思亮 | Day-lighting heat-insulated light-steel factory building |
| CN101092849A (en) * | 2006-06-23 | 2007-12-26 | 罗辉 | Composite ground prepared from anti static, spark failure concrete |
-
2011
- 2011-06-10 CN CN2011101551046A patent/CN102296841A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62179541U (en) * | 1986-05-01 | 1987-11-14 | ||
| CN2720006Y (en) * | 2004-06-28 | 2005-08-24 | 解思亮 | Day-lighting heat-insulated light-steel factory building |
| CN101092849A (en) * | 2006-06-23 | 2007-12-26 | 罗辉 | Composite ground prepared from anti static, spark failure concrete |
Non-Patent Citations (1)
| Title |
|---|
| 李庆福: "地面防静电措施", 《工业建筑》 * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109281500A (en) * | 2018-10-12 | 2019-01-29 | 安徽优诺净化科技有限公司 | A kind of workshop improving cleanliness |
| CN111579275A (en) * | 2020-04-27 | 2020-08-25 | 深圳市瑞沃德生命科技有限公司 | Collecting tray and slicing machine with same |
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Legal Events
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|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C12 | Rejection of a patent application after its publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20111228 |