CN102278893B - Temperature control method for temperature control system of high-temperature furnace - Google Patents
Temperature control method for temperature control system of high-temperature furnace Download PDFInfo
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- CN102278893B CN102278893B CN 201110178198 CN201110178198A CN102278893B CN 102278893 B CN102278893 B CN 102278893B CN 201110178198 CN201110178198 CN 201110178198 CN 201110178198 A CN201110178198 A CN 201110178198A CN 102278893 B CN102278893 B CN 102278893B
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Abstract
The invention relates to a temperature control method for a temperature control system of a high-temperature furnace. The temperature control method comprises the following steps of: controlling output voltage of controlled silicon by a programmable logic controller (PLC) so as to control the temperature rising speed of the high-temperature furnace by a transformer; and detecting the temperature of the high-temperature furnace in real time by a temperature sensor and feeding back to the PLC to regulate a signal which is output to the controlled silicon by the PLC, so that the working temperature of the high-temperature furnace is monitored in real time. By a gradient temperature control method that a target temperature is divided into different temperature sections from a low temperature value to a high temperature value and the temperature rising rate is gradually reduced along with increase of the temperature inside the furnace, in a low temperature stage, the temperature is quickly raised, efficiency is ensured, and non-uniform heating can be effectively prevented; and in a high temperature stage, the temperature is slowly raised, temperature control precision of the high-temperature furnace and stability of the temperature are obviously improved, and failures of a heating furnace caused by heating too fast are avoided. The temperature control method is particularly applicable to the high-temperature smelting industry with a working temperature of more than 1,700 DEG C.
Description
Technical field
The present invention relates to control field, in particular to a kind of temperature-controlled process for temperature control system of high temperature furnace.
Background technology
In the manufacturing and processing work of product, a lot of links need accurately to control temperature to guarantee product quality, and for example in metallurgical industry, the temperature of heating furnace is controlled the metal product quality that directly impact is smelted; In the semiconductor microactuator processing technology, the temperature of heating furnace is controlled the performance that directly affects silicon chip or semiconductor devices.Therefore, the detection of temperature and control technology are requisite technological means in industrial production.Traditional temperature control equipment generally adopts the Control technology, namely adopts the hardware of link to realize the various logic ordinal relation, and its shortcoming is: the huge floor space that causes of (1) system is excessive, and wayward; (2) fault rate is high, can not guarantee safe production; (3) the not high and poor stability of temperature-controlled precision, can not satisfy process requirements; (4) power consumption is large, is unfavorable for energy-saving and emission-reduction.
Especially for the large high-temperature furnace apparatus, above drawback is more obvious, is unfavorable for the application of large-scale industrial production.For example, the patent No. is a kind of method that the patent of ZL200810118616.3 discloses preparing metallic titanium with high temperature fused salt electrolysis of titanium dioxide, and its product titanium is in liquid bottom discharge.Because titanium belongs to rare refractory metal, its fusing point is 1668 ℃, be molten state, guarantee simultaneously normally carrying out of electrolysis, the temperature of titanium high-temperature electrolysis stove need reach 1800 ℃, in order to guarantee the high-quality titanium dioxide of electrolysis, at high temperature controls most important to the temperature of electrolytic furnace.
Therefore, need to a kind ofly can control to precise and safety the method for high temperature furnace temperature.
Summary of the invention
For addressing the above problem, the invention provides a kind of temperature-controlled process for temperature control system of high temperature furnace, described temperature control system of high temperature furnace comprises PLC, controllable silicon, transformer, high temperature furnace and temperature sensor, wherein, described high temperature furnace comprises heating bath, heater element, heat screen, comprises the heat-insulation layer of graphite cotton and mineral wool, with the furnace shell of water collar with the bell of water collar, described temperature-controlled process comprises the following steps:
Step 1: target setting temperature SP on PLC, then to the transformer energising, it is that s1 and pulsewidth are the first trigger impulse Q1 of w1 that PLC controls utmost point output amplitude to silicon controlled;
Step 2: controllable silicon conducting under the effect of the first trigger impulse Q1, the angle of flow is θ (0≤θ≤180 degree), controllable silicon output dc voltage V1 is so that for transformer provides excitation voltage, and the output voltage V 2 of transformer puts on the heater element of high temperature furnace, and the heating rate of high temperature furnace is designated as v
1
Step 3: the temperature value T of temperature sensor Real-time Collection high temperature furnace, and the temperature value T that gathers is transferred to PLC;
Step 4:PLC is with the temperature value T that receives and the first order temperature threshold T that presets
1Compare:
If T＜T
1, continue controllable silicon output the first trigger impulse Q1, and repeating step 2-4 is until T 〉=T
1
If T 〉=T
1, be that s2 and pulsewidth are the second trigger impulse Q2 of w2 to the controllable silicon output amplitude, s1=s2, w2＜w1;
Step 5: controllable silicon is adjusted its conduction angle so that it reduces under the effect of the second trigger impulse Q2, and then adjusts its output voltage V 1 and reduce, and namely the excitation voltage of transformer reduces, and the output voltage V 2 of transformer reduces, and is v thereby make the heating rate of high temperature furnace
2, v
2＜v
1
Step 6: the temperature value T of temperature sensor Real-time Collection high temperature furnace, and the temperature value T that gathers is transferred to PLC;
Step 7:PLC is with the temperature value T that receives and the second level temperature threshold T that presets
2Compare, wherein T
2＞T
1:
If T
1≤ T＜T
2, continue controllable silicon 20 output the second trigger impulse Q2, and
Repeating step 5-7 is until T 〉=T
2
If T 〉=T
2, be that s3 and pulsewidth are the 3rd trigger impulse Q3 of w3 to the controllable silicon output amplitude, s2=s3, w3＜w2;
……
By that analogy, according to the default temperature threshold T that raises step by step
nReduce step by step the heating rate v of high temperature furnace
n+1(n 〉=1) is until the temperature value T of high temperature furnace reaches target temperature SP;
Step 8: when temperature T is increased to or during higher than target temperature SP, PLC stops to controllable silicon output trigger impulse Q, making the silicon controlled conduction angle is zero, and controllable silicon turn-offs, thereby the heater element of high temperature furnace is quit work.
Temperature-controlled process of the present invention is by utilizing PLC to replace traditional relay, adopt simultaneously thyristor transformer to realize stepless voltage regulation, the FPGA control technology of maturation is combined with the electron electric power technology, significantly improved the temperature-controlled precision of high temperature furnace, realize the temperature control that economical and efficient is stable, especially be fit to be applied to the above pyrolytic semlting industry of 1700 degree.
The aspect that the present invention adds and advantage part in the following description provide, and part will become obviously from the following description, or recognize by practice of the present invention.
Description of drawings
Above-mentioned and/or the additional aspect of the present invention and advantage will become from the following description of the accompanying drawings of embodiments and obviously and easily understand, and accompanying drawing of the present invention is schematically, does not therefore draw in proportion.Wherein:
Fig. 1 is the structural representation of temperature control system of high temperature furnace;
Fig. 2 is the structure chart of high temperature furnace;
Fig. 3 is the control principle drawing of temperature control system of high temperature furnace;
Fig. 4 is the hardware structure diagram of the PLC in temperature control system of high temperature furnace;
Fig. 5 controls the method flow diagram of high temperature furnace temperature for being used for temperature control system of high temperature furnace.
The specific embodiment
The invention provides a kind of temperature control system of high temperature furnace, this temperature-controlling system aims at a kind of operating temperature and designs at the Large Titanium high-temperature electrolysis stove more than 1700 ℃.Figure 1 shows that the structure chart of this temperature control system, this system comprises: PLC10, controllable silicon 20, transformer 30, high temperature furnace 40 and temperature sensor 50.
The structure of high temperature furnace 40 is with reference to Fig. 2, mainly comprise heating bath 1, heater element 2, heat screen 3, comprise the heat-insulation layer of graphite cotton 4 and mineral wool 5, with the furnace shell 6 of water collar with the bell 7 of water collar, body of heater is cuboid, longly is 3m, wide is 1.5m, and height is 2m.Refractory brick 8 is laid in the high temperature furnace bottom.For improving the uniformity of temperature field in furnace, heating bath 1 is divided into four district's temperature controls, and formation closed loop loop, every district is carried out temperature and controlled.Be to reduce the heat loss of furnace wall, at the surrounding of the heating 2 three layers of graphite heat screen 3 that be arranged in parallel, and be filled with successively graphite cotton 4 and mineral wool 5 as heat-insulation layer between the outermost layer of heat screen 3 and furnace shell 6.For reducing the molten bath to the heat radiation of bell 7, three layers of molten bath cover plate 9 are set above the molten bath, on bell 7, graphite electrode 13, charge pipe 11 and discharge nozzle 12 are inserted in sealing.
Wherein, the output signal of PLC10 inputs to controllable silicon 20, controllable silicon 20 changes output quantity and inputs to transformer 30 according to input signal, transformer 30 changes thus output voltage and is applied to the heater element 2 of high temperature furnace 40, the temperature of temperature sensor 50 Real-time Collection high temperature furnaces 40, and the temperature signal that gathers is fed back to PLC10, PLC10 changes output signal according to the variation of temperature, and then change the magnitude of voltage that is applied on heater element 2, thereby make the one-way circulation system of a sealing of five parts formations of this system.
The control principle drawing that this system controls the high temperature furnace temperature by PLC10 as shown in Figure 3.at first Offered target temperature SP on PLC10, the PLC system calculates to export to target temperature SP to be had the tentering value and decides the trigger impulse Q of pulsewidth to the control utmost point of controllable silicon 20, controllable silicon 20 is switched on, its angle of flow is θ (0≤θ≤180 degree), controllable silicon 20 output dc voltage V1 to transformer 30 as its excitation voltage, the output voltage V 2 of transformer 30 puts on the heater element 2 in high temperature furnace 40, thereby adjust heating rate and the temperature of high temperature furnace 40, the temperature T of temperature sensor 50 Real-time Collection high temperature furnaces 40 and it is fed back to PLC10, PLC10 carries out difference relatively with actual temperature T and target temperature SP, the signal of exporting to controllable silicon 20 to adjust it.Circulate with this, thereby realization is to the real-time control of the temperature of high temperature furnace 40.In said process, controllable silicon 20 be batch (-type) ground output dc voltage to transformer 30, cause that the electromagnetic induction of transformer inside changes, thereby produce output voltage.
PLC10 in the embodiment of the present invention adopts Siemens S7-200 system, and its hardware configuration comprises as shown in Figure 4: CPU, data signal input/output module (DI/DO), analog signal input/output module (AI/AO).Wherein, CPU is the control core of PLC, and it is configured to CPU226CN, and preferred type is CPU226-2BD23-OXA8, and it is 24/16 that its I/O counts; DI/DO is configured to EM223 or EM221, wherein, the preferred type of EM223 is EM 223-1PM22-OXA8,32 input 24VDC/32 relay outputs, and EM 223-1PL22-OXA, 16 input 24VDC/16 relay outputs, the preferred type of EM221 is EM221-1BH22-OXA8,16 input 24VDC output; AI/AO is configured to EM231 or EM232, and the preferred type of EM231 is EM231-OHC22-OXA8, and the AI figure place is 4 * 12, and the preferred type of EM232 is 232-OHD22-OXA8, and the AO figure place is 4 * 12.
Preferably, the physical characteristic of the PPI interface of S7-200 is RS-485, can work under PPI, MPI and free interface communication mode, for the communication that realizes PLC and host computer provides multiple choices.
Alternatively, PLC10 also comprises display screen, the touching display screen of Eview500 series for example, to realize good in interactive function, specifically comprise: display system state, failure condition, the real-time change situation and the tendency chart that show main control parameters (high temperature furnace heating rate and temperature value) are revised the functions such as parameter, make the control operation easily row directly perceived of PLC.
Alternatively, PLC10 also comprises ethernet module, CP243-1 for example, and its effect is that PLC directly is connected into Ethernet, carries out remote swap data by Ethernet, carries out transfer of data with other PLC, communication is based on TCP/IP, and is easy for installation, simple.
PLC is the core apparatus of temperature control system provided by the invention, it is by adopting the modularized design concept, realize temperature simulation amount, Digital Control, high due to fast operation, the precision of PLC, accurately and reliably, thus reliability, anti-interference and the temperature-controlled precision of a whole set of temperature control system of high temperature furnace improved.And, PLC have advantages of compatible good, autgmentability by force, intuitively easy to operate, easy to maintenance.
Transformer 30 can be adjusted its output voltage according to loading demand, is preferably the magnetic transformer with Adjustable magnetic; Be used for the high temperature furnace of superelevation heating-up temperature (more than 1700 degree) in view of temperature-controlling system provided by the invention, therefore preferably adopt low voltage heavy current transformer, for example model is the transformer of TSH-485/0.5.
Utilize the method for this system's control high temperature furnace temperature as shown in Figure 5, comprise the following steps:
Step 1: target setting temperature SP on PLC10, then to transformer 30 energisings, PLC10 is that s1 and pulsewidth are the first trigger impulse Q1 of w1 to the control utmost point output amplitude of controllable silicon 20.
Step 2: controllable silicon 20 conducting under the effect of the first trigger impulse Q1, the angle of flow is θ (0≤θ≤180 degree), controllable silicon 20 output dc voltage V1 are in order to provide excitation voltage for transformer 30, the output voltage V 2 of transformer 30 puts on the heater element 2 of high temperature furnace 40, and the heating rate of high temperature furnace 40 is designated as v
1
Step 3: the temperature value T of temperature sensor 50 Real-time Collection high temperature furnaces 40, and the temperature value T that gathers is transferred to PLC10.
Step 4:PLC10 is with the temperature value T that receives and the first order temperature threshold T that presets
1Compare:
If T＜T
1, continue controllable silicon 20 output the first trigger impulse Q1, and repeating step 2-4 is until T 〉=T
1
If T 〉=T
1, be that s2 and pulsewidth are the second trigger impulse Q2 of w2 to controllable silicon 20 output amplitudes, s1=s2, w2＜w1.
Step 5: controllable silicon 20 is adjusted its conduction angle so that it reduces under the effect of the second trigger impulse Q2, and then adjust its output voltage V 1 and reduce, the excitation voltage that is transformer 30 reduces, and the output voltage V 2 of transformer 30 reduces, and is v thereby make the heating rate of high temperature furnace 40
2, v
2＜v
1
Step 6: the temperature value T of temperature sensor 50 Real-time Collection high temperature furnaces 40, and the temperature value T that gathers is transferred to PLC10.
Step 7:PLC10 is with the temperature value T that receives and the second level temperature threshold T that presets
2Compare, wherein T
2＞T
1:
If T
1≤ T＜T
2, continue controllable silicon 20 output the second trigger impulse Q2, and repeating step 5-7 is until T 〉=T
2
If T 〉=T
2, be that s3 and pulsewidth are the 3rd trigger impulse Q3 of w3 to controllable silicon 20 output amplitudes, s2=s3, w3＜w2.
……
By that analogy, according to the default temperature threshold T that raises step by step
nReduce step by step the heating rate v of high temperature furnace 40
n+1(n 〉=1) is until the temperature value T of high temperature furnace 40 reaches target temperature SP.
Step 8: when temperature T is increased to or during higher than target temperature SP, PLC10 stops to controllable silicon 20 output trigger impulse Q, the conduction angle that makes controllable silicon 20 is zero, and controllable silicon 20 turn-offs, thereby the heater element 2 of high temperature furnace 40 is quit work.
In preferred embodiment of the present invention, get n=1, namely in two steps high temperature furnace is heated up.When the temperature of high temperature furnace 40 lower than first order temperature threshold T
1, for example 1000 spend, and the heating rate that PLC10 controls high temperature furnace 40 is 4.0-6.5 degrees/min, and preferred value is 5.5 degrees/mins; When the temperature of high temperature furnace 40 reaches or surpasses first order temperature threshold T
1, the heating rate that PLC10 controls high temperature furnace is 0.5-4.0 degrees/min, preferred value is 2.1 degrees/mins.
The present invention is about to target temperature and is divided into different temperature sections from low to high by taking method of temperature-control by step by step, along with the rising of temperature in stove reduces heating rate gradually.Thereby realize being rapidly heated at low thermophase, not only guaranteed efficiency but also can effectively prevent from heating inhomogeneous; Slowly heat up at hot stage, effectively improve the stability of temperature-controlled precision and temperature, and avoid heating the too fast heating furnace fault that causes.Utilize said method that temperature-controlled precision is reached in 3/1000ths, be significantly increased than the temperature-controlled precision of 5 percent traditional left and right.The present invention especially is fit to be applied to the above pyrolytic semlting industry of 1700 degree.
Although illustrated and described embodiments of the invention, for the ordinary skill in the art, be appreciated that without departing from the principles and spirit of the present invention and can carry out multiple variation, modification, replacement and modification to these embodiment, scope of the present invention is by claims and be equal to and limit.
Claims (4)
1. temperature-controlled process that is used for temperature control system of high temperature furnace, described temperature control system of high temperature furnace comprises PLC, controllable silicon, transformer, high temperature furnace and temperature sensor, wherein, described high temperature furnace comprises heating bath, heater element, heat screen, comprises the heat-insulation layer of graphite cotton and mineral wool, with the furnace shell of water collar with the bell of water collar, described temperature-controlled process comprises the following steps:
Step 1: target setting temperature SP on PLC, then to the transformer energising, it is that s1 and pulsewidth are the first trigger impulse Q1 of w1 that PLC controls utmost point output amplitude to silicon controlled;
Step 2: controllable silicon conducting under the effect of the first trigger impulse Q1, the angle of flow is θ (0≤θ≤180 degree), controllable silicon output dc voltage V1 is so that for transformer provides excitation voltage, and the output voltage V 2 of transformer puts on the heater element of high temperature furnace, and the heating rate of high temperature furnace is designated as v
1
Step 3: the temperature value T of temperature sensor Real-time Collection high temperature furnace, and the temperature value T that gathers is transferred to PLC;
Step 4:PLC is with the temperature value T that receives and the first order temperature threshold T that presets
1Compare:
If T＜T
1, continue controllable silicon output the first trigger impulse Q1, and repeating step 2-4 is until T 〉=T
1
If T 〉=T
1, be that s2 and pulsewidth are the second trigger impulse Q2 of w2 to the controllable silicon output amplitude, s2=s1, w2＜w1;
Step 5: controllable silicon is adjusted its conduction angle so that it reduces under the effect of the second trigger impulse Q2, and then adjusts its output voltage V 1 and reduce, and namely the excitation voltage of transformer reduces, and the output voltage V 2 of transformer reduces, and is v thereby make the heating rate of high temperature furnace
2, v
2＜v
1
Step 6: the temperature value T of temperature sensor Real-time Collection high temperature furnace, and the temperature value T that gathers is transferred to PLC;
Step 7:PLC compares the temperature value T that receives and the second level temperature threshold T2 that presets, wherein T
2＞T
1:
If T
1≤ T＜T
2, continue controllable silicon output the second trigger impulse Q2, and repeating step 5-7 is until T 〉=T
2
If T 〉=T
2, be that s3 and pulsewidth are the 3rd trigger impulse Q3 of w3 to the controllable silicon output amplitude, s2=s3, w3＜w2;
……
By that analogy, according to the default temperature threshold T that raises step by step
nReduce step by step the heating rate v of high temperature furnace
n+1(n 〉=1) is until the temperature value T of high temperature furnace reaches target temperature SP;
Step 8: when temperature T is increased to or during higher than target temperature SP, PLC stops to controllable silicon output trigger impulse Q, making the silicon controlled conduction angle is zero, and controllable silicon turn-offs, thereby the heater element of high temperature furnace is quit work;
Wherein, when n=1, namely in two steps high temperature furnace is heated up: when the temperature of high temperature furnace lower than first order temperature threshold T
1=1000 when spending, and PLC controls the heating rate v of high temperature furnace
1Be 4.0-6.5 degrees/min; When the temperature of high temperature furnace reaches or surpasses first order temperature threshold T
1, PLC controls the heating rate v of high temperature furnace
2Be 0.5-4.0 degrees/min.
2. temperature-controlled process according to claim 1, wherein, refractory brick is laid in the bottom of described high temperature furnace; Heating bath is divided into four district's temperature controls, and formation closed loop loop, every district is carried out temperature and controlled; At the surrounding of the heating three layers of graphite heat screen that be arranged in parallel, and be filled with successively the cotton and mineral wool of graphite as heat-insulation layer between the outermost layer of heat screen and furnace shell; Three layers of molten bath cover plate are set above the molten bath, and on bell, graphite electrode, charge pipe and discharge nozzle are inserted in sealing.
3. temperature-controlled process according to claim 2, wherein, the body of heater of described high temperature furnace is cuboid, longly is 3m, and wide is 1.5m, and height is 2m.
4. according to claim 2 or 3 described temperature-controlled process, wherein, described high temperature furnace is applicable to the 1700 above pyrolytic semlting techniques of degree.
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| CN102607288A (en) * | 2012-01-06 | 2012-07-25 | 山西太钢不锈钢股份有限公司 | Pulse type kiln temperature dynamic control method |
| CN102662420B (en) * | 2012-05-04 | 2015-09-02 | 武汉大学 | A kind of creep testing machine temperature automatic regulating and controlling device and control method thereof |
| CN104626460A (en) * | 2015-02-09 | 2015-05-20 | 东莞市瀛通电线有限公司 | Double-color spiral strip injection machine based on PLC control and strip injection method for double-color spiral strip injection machine |
| CN106643194B (en) * | 2016-12-30 | 2019-04-23 | 四川航天拓鑫玄武岩实业有限公司 | Basalt electric boosting kiln temperature control system and method |
| CN108919739B (en) * | 2018-07-25 | 2020-08-21 | 嘉兴市合一工业电炉有限公司 | Industrial electric furnace control system |
| CN109270972A (en) * | 2018-10-11 | 2019-01-25 | 中国船舶重工集团公司第七〇九研究所 | A kind of thermostatically-controlled equipment |
| CN113236702A (en) * | 2021-05-11 | 2021-08-10 | 中国第一汽车股份有限公司 | Low-temperature compensation method and assembly of magnetorheological damper, vehicle and storage medium |
| CN113625801B (en) * | 2021-09-03 | 2022-12-27 | 罗定职业技术学院 | Temperature control method of heating furnace |
| CN114872291A (en) * | 2022-03-31 | 2022-08-09 | 浙江凯华模具有限公司 | Constant-temperature control system and method for garbage can injection mold |
| CN115308324A (en) * | 2022-07-28 | 2022-11-08 | 天津国科医工科技发展有限公司 | Transmission line and device for combined use of gas chromatograph and mass spectrometer, temperature control transmission line and method |
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| JP2005308267A (en) * | 2004-04-20 | 2005-11-04 | Matsushita Electric Ind Co Ltd | Heating furnace temperature control method and its device |
| CN2886630Y (en) * | 2005-09-28 | 2007-04-04 | 湖北大学 | Control device for thermal treatment high temperature furnace |
| CN200993527Y (en) * | 2006-12-07 | 2007-12-19 | 刘剑飞 | High temperature resistance sintering furnace |
| CN101671781B (en) * | 2008-09-10 | 2012-05-30 | 贵阳铝镁设计研究院有限公司 | Temperature control method and device of titanium reduction distilling furnace |
| CN201335993Y (en) * | 2008-12-15 | 2009-10-28 | 中国电子科技集团公司第四十八研究所 | Precision temperature-control system |
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