CN102275390B - Laser marking method for reflective film and marking apparatus therefor - Google Patents
Laser marking method for reflective film and marking apparatus therefor Download PDFInfo
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- CN102275390B CN102275390B CN2011101574211A CN201110157421A CN102275390B CN 102275390 B CN102275390 B CN 102275390B CN 2011101574211 A CN2011101574211 A CN 2011101574211A CN 201110157421 A CN201110157421 A CN 201110157421A CN 102275390 B CN102275390 B CN 102275390B
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Abstract
The present invention relates to a laser marking method for a reflective film and a marking apparatus therefor. The marking method comprises the steps as follows: a laser beam passes through a character die with a marking pattern after being expended, the laser beam is focused through a focusing mirror, the reflective film is disposed in front of or at the back of the focus, the laser beam including the marking pattern information is printed on the reflective film once and for all, and a mark same to the marking pattern is formed on the reflective film. The marking apparatus comprises a main stand one side of which is provided with a focusing mirror support, a color indicating light source arranged on the main stand, a resonant cavity total reflective mirror, a Q switch, a single lamp condensing cavity, a resonant cavity half reflective mirror, a double lamp condensing cavity, a beam expanding lens, a character die disposed on the main stand or the focusing mirror support, and a light transforming mirror and a focusing mirror disposed in the focusing mirror support. The advantages lie in that the marking speed for reflective material is greatly increased, and the structure of the marking apparatus is substantially simplified.
Description
Technical field
The present invention relates to laser marking method and device, relate in particular to reflective membrane laser marking method and marking device thereof.
Background technology
The reflective membrane of making matrix with tiny glass beads is to apply reflectorized material extremely widely, this class material is except a large amount of road indication, roadside direction boards that are used for transportation industry, outside automotive license plate, also be used as the making material of anti-fake mark, manufacturer is anti-counterfeiting, stamps laser anti-counterfeit tag on its commodity of reflectorized material.
The making of existing anti-fake mark is to make anti-fake mark with laser scanning methods at reflectorized material, the method is that the scanning formula that will form indicia patterns is compiled into software input computer, control laser head by computer and reflectorized material is carried out the scanning of pointwise, finally forming on reflective material: displayable indicia patterns on a reflection direction.This indicia patterns is comprised of several scanning elements, and each scanning element spot diameter is about 0.1mm, as scanning a diameter, is the 23mm indicia patterns, needs the time of cost about 1 minute.This is for the anti-fake mark that is provided to typical products in mass production, and such speed of production obviously its efficiency is low.
Summary of the invention
The object of the invention is to overcome the deficiency of prior art, provide a kind of production efficiency very high reflective membrane laser marking method and marking device thereof.It is achieved through the following technical solutions:
Described marking method is, it adopts a solid mask that is designed with the mark pattern, allow the laser beam that is produced by laser generator expand through beam expanding lens, the spot diameter of laser beam is extended at 16～45mm, allow the laser beam after expanding pass described solid mask, formation contains the laser beam of mark pattern-information, this laser beam line focus mirror focuses on, form focus C, reflective membrane is placed in front side or the rear side of focus C, described disposable the beating on reflective membrane of laser beam of containing the mark pattern-information, form the mark identical with the mark pattern on reflective membrane.
The further design of described marking method is, described solid mask is to make the mark pattern on the substrate made from quartz glass.
The further design of described marking method is, described mark pattern setting is in substrate one side, and this mark pattern is formed by light transmission good light glassy zone and poor frosted glass zone or the coat of metal zone of light transmission.
Described smooth marking device, comprise main support, be placed in the main support front wallboard outside and with main support UNICOM the focus lamp support, be placed in turning light microscopic and focus lamp and being placed in the laser generator that mainly by color indication light modulation source, resonator total reflective mirror, Q-switch, single lamp laser pump cavity, resonator half anti-mirror, two lamp laser pump cavity, is formed on main support in the focus lamp support, also comprise beam expanding lens and solid mask; Beam expanding lens is placed on the interior position corresponding to described pair of lamp laser pump cavity outgoing laser beam of main support; The solid mask is placed in the beam expanding lens rear end or is placed in the focus lamp support on the light path position that turns between light microscopic and focus lamp; Described color indication light modulation source, resonator total reflective mirror, Q-switch, single lamp laser pump cavity, resonator half anti-mirror and beam expanding lens, two lamp laser pump cavity and beam expanding lens are sequentially arranged in main support, the light microscopic that turns in the focus lamp support is positioned at a side of focus lamp, and turn the center of the incidence angle of light microscopic corresponding to beam expanding lens or solid mask, angle of reflection is corresponding to the center of described solid mask or focus lamp.Side, and turn the center of the incidence angle of light microscopic corresponding to beam expanding lens or solid mask, angle of reflection is corresponding to the center of described solid mask or focus lamp.
The further design of described marking device is, described color indication light modulation source, resonator total reflective mirror, Q-switch, single lamp laser pump cavity resonant cavity half anti-mirror and beam expanding lens and two lamp laser pump cavity divide two rows to be sequentially arranged in main support along the main support length direction respectively, resonator half anti-mirror laser beam output and two lamp laser pump cavity laser beam input correspondence position of this two rows, one end are respectively equipped with 45 ° of speculums, reflex to the input of two lamp laser pump cavities in order to the laser beam that will reflect resonator half anti-mirror output.
The further design of described marking device is, described color indication light modulation source is the He-Ne lamp.
The present invention is by adopting the solid mask and laser beam being expanded, form larger-diameter light beam, its light beam can reach 40 mm, just can form complete indicia patterns on reflectorized material like this in the single pass of laser, form following beneficial effect fruit: 1) the mark speed on reflectorized material has improved 10 times, has greatly improved mark production efficiency; 2) owing to having adopted the solid mask, the shaping of mark pattern no longer need computer control laser scanning head movement locus form, the formation of marking device is simplified greatly, marking device of the present invention is simple for structure thus, simple to operate, the production cost of product anti-fake mark is reduced.
Description of drawings
Fig. 1 is the structural representation of marking device one embodiment of the present invention.
Fig. 2 is the structural representation of another embodiment of marking device of the present invention.
In figure, 1. He-Ne lamp, 2. resonator total reflective mirror, 3. Q-switch, 4. single lamp laser pump cavity, 5 resonators, half anti-mirror, 7. speculum, 8. pair lamp laser pump cavity, 9. beam expanding lens, 10. solid mask, 11 turn light microscopic, 12 focus lamps, 20 main supports, 21 front wallboards, 30 focus lamp supports, 40. reflective membrane, 41. marks.
The specific embodiment
Embodiment one
The present embodiment is the scheme of comparative optimization, its device up to standard as shown in Figure 1, mainly by main support 20, focus lamp support 30, beam expanding lens 9, solid mask 10, turn light microscopic 11, focus lamp 12 and laser generator and form.Laser generator mainly is comprised of He-Ne lamp 1, resonator total reflective mirror 2, Q-switch 3, single lamp laser pump cavity 4, resonator half anti-mirror 5, two lamp laser pump cavity 8, and the present embodiment adopts the He-Ne lamp that sends ruddiness as color indication light modulation source.In order to dwindle the length of main support 20, the relevant components and parts on main support 20 are arranged in two rows: He-Ne lamp 1, resonator total reflective mirror 2, Q-switch 3, single lamp laser pump cavity 4 resonant cavity half anti-mirror 5 and beam expanding lens 9 and two lamp laser pump cavity 8 optical cavities divide two rows to be arranged in from left to right in main support 20 successively along the main support length direction respectively.The laser beam output of the resonator half anti-mirror 5 of this two rows components and parts right part and two lamp laser pump cavity laser beam input correspondence position are respectively equipped with 45 ° and turn light microscopic 7, reflex to the input of two lamp laser pump cavities 8 in order to the laser beam with resonator half anti-mirror 5 outputs.Focus lamp support 30 is connected on the front wallboard 21 of main support 20, and and main support 20 between be provided with light path.Turning light microscopic 11, solid mask 10 and focus lamp 12 is placed in focus lamp support 30, solid mask 10 and focus lamp 12 are placed according to order from the close-by examples to those far off a side that turns light microscopic 11, turn the position of light microscopic 11 corresponding to beam expanding lens 9, its incidence angle is by being provided with the center of light path corresponding to beam expanding lens between focus lamp support 30 and main support 20, angle of reflection is corresponding to the center of solid mask 10.
When above-mentioned reflective membrane laser marking apparatus carried out mark work, the He-Ne lamp that sends ruddiness was entered in light path by resonator total reflective mirror 2 as colorful indication light source, and light beam is thereafter taken on a red color.The light that pumping lamp in single lamp laser pump cavity sends focuses in laser crystal and goes, YAG produces laser with excitation Gong Zuo Wu Quality neodymium-doped yttrium-aluminum garnet, carry out the back reflective vibration in the reflection channel of the laser beam that produces between resonator total reflective mirror and resonator half anti-mirror, the energy of laser beam is constantly assembled, and controlled the frequency range of laser pulse by Q-switch, to obtain the laser beam of certain pulse width and light intensity radiation.In above-mentioned reflection channel, laser intense radiation with certain energy sees through resonator half anti-mirror and forms laser beam A, the spot diameter of this laser beam A is about 4～7mm, through two 45 ° of mirror reflects, 180 ° of inputs that enter two lamp laser pump cavities of laser beam A refraction, through the incentive action of two lamp laser pump cavities, the stronger laser beam B of the output of two lamp laser pump cavities output energy, the spot diameter of this laser beam B approximately increases by 1 mm.Laser beam B expands through beam expanding lens 9, spot diameter enlarges, generally enlarge 2～8 times at 16～45mm, form laser beam D, laser beam D turns light microscopic 11 by 45 ° and reflexes on the type matrix 10 with mark pattern, formation contains the laser beam E of mark pattern-information, this laser beam line focus mirror 12 focuses on, and forms focus C, and reflective membrane 40 is placed in the front side of focus C, disposable the beating on reflective membrane 40 of laser beam E of containing the mark pattern-information, form the mark 41 identical with the mark pattern on reflective membrane 40.Be greatly improved with this kind method mark production efficiency, can reach 50m/min.
Embodiment two
As shown in Figure 2, the components and parts of its composition are identical with marking device shown in Figure 1 for the marking device of the present embodiment, and the arrangement connected mode of components and parts is also basic identical.Difference is that the placement location of solid mask 10 is different.In the present embodiment, solid mask 10 is placed on the rear side correspondence position of the beam expanding lens 9 on main support 20.Only be equipped with in focus lamp support 30 and turn light microscopic 11 and focus lamp 12, focus lamp 12 is placed in a side that turns light microscopic 11, turn the position of light microscopic 11 corresponding to solid mask 10, its incidence angle is by being provided with the center of light path corresponding to solid mask 10 between focus lamp support 30 and main support 20, angle of reflection is corresponding to the center of focus lamp 12.
The present embodiment marking device and marking method are same as the previously described embodiments, its the course of work is also basic identical, slightly different is, the laser beam D that expands through beam expanding lens 9 first passes through solid mask 10, after formation contains the laser beam E of mark pattern-information, then through turning light microscopic 11, reflexes to focus lamp 12 focusing, form focus C, reflective membrane 40 is placed in the rear side of focus C, contains disposable the beating on reflective membrane 40 of laser beam E of mark pattern-information, forms the mark identical with the mark pattern on reflective membrane 40.
Claims (6)
1. reflective membrane laser marking method, it is characterized in that adopting a type matrix that is designed with the mark pattern, allow the laser beam that is produced by laser generator expand through beam expanding lens, the spot diameter of laser beam is enlarged, allow the laser beam after expanding pass described type matrix, described type matrix is to make the mark pattern on the substrate made from quartz glass, formation contains the laser beam of mark pattern-information, this laser beam line focus mirror focuses on, form focus C, reflective membrane is placed in front side or the rear side of focus C, described disposable the beating on reflective membrane of laser beam of containing the mark pattern-information, form the mark identical with the mark pattern on reflective membrane.
2. reflective membrane laser marking method according to claim 1, is characterized in that described mark pattern setting in substrate one side, and this mark pattern is formed by light transmission good light glassy zone and poor frosted glass zone or the coat of metal zone of light transmission.
3. reflective membrane laser marking method according to claim 1, is characterized in that described spot diameter enlarges 2～8 times extremely at 16～45mm.
4. the reflective membrane laser marking apparatus of reflective membrane laser marking method as claimed in claim 1, comprise main support, be placed in the main support front wallboard outside and with the focus lamp support of main support UNICOM, be placed in turning light microscopic and focus lamp and being placed in the laser generator that mainly by color indication light modulation source, resonator total reflective mirror, Q-switch, single lamp laser pump cavity, resonator half anti-mirror, two lamp laser pump cavity, is formed on main support in the focus lamp support, characterized by further comprising beam expanding lens and type matrix; Beam expanding lens is placed on the interior position corresponding to described pair of lamp laser pump cavity outgoing laser beam of main support; Type matrix is placed in the beam expanding lens rear end or is placed in the focus lamp support on the light path position that turns between light microscopic and focus lamp; Described color indication light modulation source, resonator total reflective mirror, Q-switch, single lamp laser pump cavity, resonator half anti-mirror and beam expanding lens, two lamp laser pump cavity and beam expanding lens are sequentially arranged in main support; the light microscopic that turns in the focus lamp support is positioned at a side of focus lamp; and turn the center of the incidence angle of light microscopic corresponding to beam expanding lens or type matrix, angle of reflection is corresponding to the center of described type matrix or focus lamp.
5. reflective membrane laser marking apparatus according to claim 4, it is characterized in that described color indication light modulation source, resonator total reflective mirror, Q-switch, single lamp laser pump cavity resonant cavity half anti-mirror and beam expanding lens and two lamp laser pump cavity divide two rows to be sequentially arranged in main support along the main support length direction respectively, resonator half anti-mirror laser beam output and two lamp laser pump cavity laser beam input correspondence position of this two rows, one end are respectively equipped with 45 ° of speculums, reflex to the input of two lamp laser pump cavities in order to the laser beam that will reflect resonator half anti-mirror output.
6. reflective membrane laser marking apparatus according to claim 5, is characterized in that described color indication light modulation source is the He-Ne lamp.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011101574211A CN102275390B (en) | 2011-06-13 | 2011-06-13 | Laser marking method for reflective film and marking apparatus therefor |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011101574211A CN102275390B (en) | 2011-06-13 | 2011-06-13 | Laser marking method for reflective film and marking apparatus therefor |
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| CN102275390A CN102275390A (en) | 2011-12-14 |
| CN102275390B true CN102275390B (en) | 2013-11-20 |
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| CN2011101574211A Expired - Fee Related CN102275390B (en) | 2011-06-13 | 2011-06-13 | Laser marking method for reflective film and marking apparatus therefor |
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Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN104361956A (en) * | 2014-11-21 | 2015-02-18 | 淮南新光神光纤线缆有限公司 | Aviation fluorine-containing polymer insulated wire and cable surface laser character printing method |
| CN109290676B (en) * | 2018-11-21 | 2023-11-14 | 浙江龙游道明光学有限公司 | Anti-fake hyperbola marking device for retroreflective product |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1456944A (en) * | 2002-05-10 | 2003-11-19 | 三星电子株式会社 | Colour laser printers |
| CN202115117U (en) * | 2011-06-13 | 2012-01-18 | 南京中南激光设备有限公司 | Reflective membrane laser marking apparatus |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0422573A (en) * | 1990-05-18 | 1992-01-27 | Tamura Seisakusho Co Ltd | Hot air reflow device |
| JPH09222573A (en) * | 1995-12-12 | 1997-08-26 | Fuji Photo Film Co Ltd | Color space light modulator |
| CN201143798Y (en) * | 2008-01-16 | 2008-11-05 | 俞国麟 | Laser marker |
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1456944A (en) * | 2002-05-10 | 2003-11-19 | 三星电子株式会社 | Colour laser printers |
| CN202115117U (en) * | 2011-06-13 | 2012-01-18 | 南京中南激光设备有限公司 | Reflective membrane laser marking apparatus |
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