CN102208344B - Annealing device - Google Patents
Annealing device Download PDFInfo
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- CN102208344B CN102208344B CN201010580164.8A CN201010580164A CN102208344B CN 102208344 B CN102208344 B CN 102208344B CN 201010580164 A CN201010580164 A CN 201010580164A CN 102208344 B CN102208344 B CN 102208344B
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- load factor
- ventilation volume
- heater
- exchange system
- annealing device
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Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B5/00—Drying solid materials or objects by processes not involving the application of heat
- F26B5/16—Drying solid materials or objects by processes not involving the application of heat by contact with sorbent bodies, e.g. absorbent mould; by admixture with sorbent materials
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D17/00—Arrangements for using waste heat; Arrangements for using, or disposing of, waste gases
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D19/00—Arrangements of controlling devices
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D21/00—Arrangements of monitoring devices; Arrangements of safety devices
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D7/00—Forming, maintaining, or circulating atmospheres in heating chambers
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Molecular Biology (AREA)
- Furnace Details (AREA)
- Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
- Drying Of Solid Materials (AREA)
Abstract
Annealing device provided by the invention (10) comprises heater (20), with reference to load factor operational part (CPU (50)), ventilation volume adjusting portion (16) and ventilation volume control part (CPU (50)).It is inner that heater (20) is configured in body of heater (12), heats workpiece (18).With reference to the reference load factor of load factor operational part (CPU (50)) computing heater (20).The ventilation volume of ventilation volume adjusting portion (16) to air exchange system (11) regulates.Ventilation volume control part (CPU (50)), according to the operation result with reference to load factor operational part (CPU (50)), controls ventilation volume adjusting portion (16).Ventilation volume control part (CPU (50)) makes the ventilation volume of air exchange system (11) increase according to the increase of the reference load factor of heater (20), on the other hand, according to the minimizing with reference to load factor, the ventilation volume of air exchange system (11) is reduced.
Description
Technical field
The present invention relates to the annealing device had when heat-treating the workpiece being configured in furnace interior to the air exchange system that furnace interior is taken a breath.
Background technology
In the annealing device of in chromatic filter manufacturing process etc., the workpiece such as liquid crystal glass substrate being heat-treated, when heat-treating substrate, be coated on sublimability composition (the sublimability composition such as contained in the photoresist) gasification on substrate, because this sublimate causes the cleanliness factor of furnace interior to reduce.
Therefore, in annealing device in the past, in order to by the sublimate control of the concentration of furnace interior below setting, import air exchange system, this air exchange system utilizes pipeline etc. that the air of the furnace interior containing sublimate is discharged from furnace interior, and the outside air corresponding with discharge rate is drawn into furnace interior.Wherein, in order to reduce power consumption, there is a kind of ventilation volume that makes when furnace interior does not have workpiece than common few annealing device (such as with reference to patent documentation 1).
Patent documentation 1: No. 4273145th, Japan Patent.
, in the technology in the past comprising above-mentioned patent documentation 1, still exist and produce Hyperventilated problem.Its result, causes the thermal capacity of air inlet (adding Hot capacity) to increase, so often fully can not reduce power consumption because of excess emissions heat.Such as in the annealing device of above-mentioned patent documentation 1, the setting of ventilation volume is that imagination determines when furnace interior fills workpiece, even if only there is a small amount of workpiece in body of heater, and ventilation identical when also will carry out filling with workpiece.
On the other hand, determine that the most suitable ventilation volume corresponding to the amount of the workpiece loaded to furnace interior is very difficult.Such as, if want the piece count correctly grasping furnace interior, for determining most suitable ventilation volume, then when having the annealing device in work mounting s portion of multiple field, need to be configured for and detect each layer with or without the sensor of workpiece, cause making complex structure.
Summary of the invention
The object of this invention is to provide a kind of annealing device, simple structure can be utilized to carry out most suitable control to the ventilation volume of air exchange system.
Annealing device of the present invention has air exchange system, it is characterized in that, there is air exchange system, when heat-treating the workpiece being configured in furnace interior, described air exchange system is taken a breath to described furnace interior, described annealing device comprises: heater, is configured in described furnace interior, is heated described workpiece by the driving in heater-driven portion; Ventilation volume adjusting portion, regulates the ventilation volume of described air exchange system; And CPU, when described workpiece heat, carry out FEEDBACK CONTROL to described heater-driven portion, described CPU comprises: with reference to load factor operational part, the reference load factor of heater according to the value computing feeding back to described heater-driven portion; And ventilation volume control part, according to the described operation result with reference to load factor operational part, control described ventilation volume adjusting portion, described ventilation volume control part makes the ventilation volume of described air exchange system increase according to the described increase with reference to load factor, on the other hand, according to the described minimizing with reference to load factor, the ventilation volume of described air exchange system is reduced.
As the example of workpiece, can exemplify: the semiconductor wafer etc. used in the glass substrate of liquid crystal display or plasma display and semiconductor device.
Described annealing device comprises heating part, with reference to load factor operational part, ventilation volume adjusting portion and ventilation volume control part.Heating part is configured in furnace interior, heats workpiece.With reference to the reference load factor of load factor operational part computing heating part.Wherein, the so-called load factor referring to the heating part in order to carry out the reference of control institute to ventilation volume with reference to load factor, can utilize the operation method of general load factor to carry out computing.
The ventilation volume of ventilation volume adjusting portion to air exchange system regulates.Ventilation volume control part, according to the operation result with reference to load factor operational part, controls ventilation volume adjusting portion.Described ventilation volume control part makes the ventilation volume of air exchange system increase according to the increase with reference to load factor, on the other hand, according to the minimizing with reference to load factor, the ventilation volume of air exchange system is reduced.
Preferably: described annealing device also comprises: with reference to load factor correction portion, environmentally information and treatment situation information are revised the described reference load factor calculated with reference to load factor operational part.
In addition, preferably: described annealing device also comprises: recording unit, record represents the list of the corresponding relation of the ventilation volume of described reference load factor and described air exchange system.In described formation, the reference load factor (running rate) being conceived to heating part shows positive dependency relation with the generation of the sublimation gases produced from workpiece, utilizes and the reference load factor (reference running rate) of heating part of computing can carry out the adjustment of ventilation volume by control parts such as CPU.Therefore, the structure loading number for correctly grasping workpiece newly need not be set, just can determine the most suitable ventilation volume of air exchange system.
In the operation of annealing device, according to determined ventilation volume, the ventilation volume of air exchange system can be regulated at any time, so can prevent from carrying out excessive ventilation in annealing device and produce the extra heat of discharge.
According to the present invention, utilize simple structure most suitably can control the ventilation volume of air exchange system.
Accompanying drawing explanation
Fig. 1 (A) and Fig. 1 (B) is the figure representing annealing device overview of the present invention.
Fig. 2 is the figure of the hot air circulation state profile of the furnace interior represented at annealing device.
Fig. 3 is the figure of the air exchange system overview representing annealing device.
Fig. 4 is the block diagram representing annealing device overview.
Fig. 5 is the flow chart of an example of the CPU action step represented when controlling air exchange system.
Fig. 6 (A) ~ Fig. 6 (C) is an example of the description content of list (look-uptable).
Fig. 7 is an example of the description content of list.
Fig. 8 is an example of the description content of list.
Description of reference numerals
10-annealing device
11-air exchange system
12-body of heater
16-ventilation volume adjusting portion
18-workpiece
20-heater
22-circulating fan
162-air-breathing side self closing door
164-is vented side self closing door
166-air blast
Embodiment
Fig. 1 (A) and the basic comprising of Fig. 1 (B) to the annealing device 10 of embodiment of the present invention is used to be described.Annealing device 10 utilizes circulating air to heat the plate shaped workpiece 18 moved in body of heater 12.In this embodiment, annealing device 10 is for carrying out chromatic filter manufacturing process, but the scope of application of the present invention is not limited to chromatic filter manufacturing process.
The inside of body of heater 12 is provided with multiple frame member 28, workpiece 18 is supported to multilayer.In this embodiment, workpiece 18 is rectangular glass substrates, and the kind of the workpiece 18 that annealing device 10 processes is not limited thereto.
Before body of heater 12, be provided with door 26, this door 26 opens or closes when moving into and take out of workpiece 18.Door 26 is made up of the multiple baffle plates arranged in the vertical direction, and is configured to only corresponding with the layer distributing to the workpiece 18 that will move into or take out of baffle plate and opens or closes.
The side, the back side of body of heater 12 is provided with multiple heater 20, multiple circulating fan 22 and multiple pipeline 24.Heater 20, circulating fan 22 and pipeline 24 are configured in both sides across the central portion of the Width (left and right directions in Fig. 1 (A) and Fig. 1 (B)) of body of heater 12.Heater 20 heats the hot blast in body of heater 12 inner loop.Wherein, use sheathed heater (sheathheater) as heater 20, but the kind of heater is not limited thereto.
Circulating fan 22 produces circulated air in body of heater 12 inside, the hot blast by heater 20 is sucked, sends to pipeline 24.If make circulating fan 22 action, then produce the circulated air shown in Fig. 2 in body of heater 12 inside.In this embodiment, use Sirocco fan as circulating fan 22, but also can use the fan of other kind.
The two-end part (side, two sides) of body of heater 12 Width is provided with multiple resistance to heat filter 14.Resistance to heat filter 14, by trapping the particulate contained in the hot blast by pipeline 24, makes the hot blast blown on workpiece 18 become clean.In addition, the example as resistance to heat filter 14 can exemplify HEPA filter, but need not be defined in this.
In addition, annealing device 10 comprises air exchange system 11, and this air exchange system 11, when heat-treating the workpiece 18 being configured in body of heater 12 inside, is taken a breath to body of heater 12 inside.Specifically, as shown in Figure 3, at the position that body of heater 12 is prespecified, single or multiple exhaust outlet 30 and air entry 40 are set respectively.Discharge duct 32 is connected with exhaust outlet 30, and aspirating air pipe 42 is connected with air entry 40.Air exchange system 11 possesses ventilation volume adjusting portion 16, and this ventilation volume adjusting portion 16 can regulate the flow of discharge duct 32 and aspirating air pipe 42 respectively.Ventilation volume adjusting portion 16 is according to the sublimate adjustment of gas concentration ventilation volume (air displacement and inspiratory capacity) of body of heater 12 inside.
Ventilation volume adjusting portion 16 comprises: exhaust side self closing door 164, can regulate the flow of discharge duct 32; And air-breathing side self closing door 162, the flow of aspirating air pipe 42 can be regulated.In addition, ventilation volume adjusting portion 16 comprises the variable air blast of air quantity 166, and this air blast 166 is connected with discharge duct 32.In ventilation volume adjusting portion 16, by the air quantity of the aperture opening ratio (0 ~ 100%) and air blast 166 that regulate exhaust side self closing door 164 at least any one, regulate ventilation volume.Usually, the aperture opening ratio (0 ~ 100%) of air-breathing side self closing door 162 is set to identical with the aperture opening ratio being vented side self closing door 164, but the aperture opening ratio also can being arranged to both as required have difference.
Fig. 4 is the block diagram representing annealing device 10 overview.Annealing device 10 comprises CPU50, and this CPU50 is connected with ROM52, RAM54, sensor unit 56, I/F portion 58, fan driving section 60, heater-driven portion 62, door drive division 64, ventilation volume adjusting portion 16, ambient air temperature sensor 70, hard disk 72, operating portion 76 and display part 78 etc.
ROM52 stores the multiple programs required for CPU50 action.RAM54 is the volatile memory for CPU50 temporary storaging data.Sensor unit 56 is made up of the multiple metrical instruments for collecting the information such as body of heater 12 internal temperature and pressure.I/F portion 58 has the function with external device communication.
Fan driving section 60 drives multiple circulating fan 22 respectively according to the signal from CPU50.Heater-driven portion 62 drives multiple heater 20 respectively according to the signal from CPU50.Door drive division 64 opens or closes the action of multiple baffle plates of door 26 respectively according to the signal from CPU50.
Ventilation volume adjusting portion 16 is according to the Signal Regulation ventilation volume from CPU50.Ambient air temperature sensor 70 detects the outside air temperature of body of heater 12 outside.Hard disk 72 records list 74 described later.Operating portion 76 accepts the operation such as setting input operation, operation start/stop from operating personnel.Display part 78 notifies that operating personnel's process terminates, show warning content and other operating personnel operate required information.
CPU50, according to the program be stored in ROM52, controls the formation of each several part of annealing device 10 comprehensively.Such as, the temperature in the body of heater 12 that CPU50 detects according to sensor unit 56 and the difference of design temperature, carry out FEEDBACK CONTROL to heater-driven portion 62.In addition, CPU50 comprises the computing circuit with calculation function, can utilize the reference load factor (with reference to running rate) of this computing circuit computing heater.
The action step of Fig. 5 to the CPU50 when controlling air exchange system 11 is used to be described below.Wherein, showing ventilation volume necessary the generation of positive dependency relation, in addition sublimation gases and air exchange system 11 with the reference load factor (running rate) of heater and the generation of the sublimation gases produced from workpiece 18 in theory, also to show positive dependency relation be that front topic processes.
When annealing device 10 runs, CPU50 carries out FEEDBACK CONTROL to heater-driven portion 62, and computing heater is with reference to load factor (S1).Then, CPU50 is according to the information utilizing equipment to judge (treatment situation, useful variation (ユ ー テ ィ リ テ ィ become Move), environment temperature etc.) and the content of list 74, the value of the heater calculated with reference to load factor is revised (S2).
In the step revised with reference to load factor heater of S2, such as, as shown in Fig. 6 (A), the outside air temperature that CPU50 detects according to ambient air temperature sensor 70, the heater that increase or reduction calculate is with reference to load factor.When outside air temperature is low, heater is regulated to minimizing direction with reference to load factor, this is because according to the viewpoint of the adjustment ventilation volume as the object of the invention, when the situation (such as winter) that outside air temperature is low, the possibility that heater rises to more than the original value proportional with the thermal capacity that will heat (usually proportional with the quantity of workpiece 18 to be processed) with reference to load factor is large.On the other hand, when outside air temperature is high, heater is regulated to the direction increased with reference to load factor, this is because when the situation (such as summer) that outside air temperature is high, it is large that heater becomes the possibility less than the original value proportional with the thermal capacity that will heat with reference to load factor.
In addition, as shown in Fig. 6 (B), CPU50, according to the state of the blocking of discharge duct 32, suitably increases heater with reference to load factor.Such as according to the information between discharge duct 32 operating period, CPU50 can be exhausted the judgement of the state of the blocking of pipeline 32 automatically.Or also can input information about discharge duct 32 state by operating personnel by operating portion 74.Wherein, blocking along with discharge duct 32 becomes serious, increases heater with reference to load factor, this is because under the situation causing air displacement to reduce in the blocking because of discharge duct 32, the concentration of the sublimate gas of body of heater 12 inside raises, and needs the ventilation of more than ventilation volume when carrying out usual.
In addition, as shown in Fig. 6 (C), CPU50, according to the sublimate generation of per unit workpiece, suitably increases or reduces heater with reference to load factor.The sublimate generation of per unit workpiece is affected by the shape of workpiece, size and raw material, the composition of smears and the ratio etc. of smears and workpiece usually.Wherein, about the information of the sublimate generation of per unit workpiece by CPU50 from acquisitions such as processing methods (レ シ ピ), or can be inputted by operating portion 74 by operating personnel.In addition, when the sublimate generation of per unit workpiece is few, reducing heater is because in the few situation of the sublimate generation of per unit workpiece (being such as coated on the situation etc. that smears on workpiece is few) with reference to the reason of load factor, even if the quantity of workpiece 18 increases, also can the generation of sublimate be suppressed than usually few, so can reduce ventilation volume.
At this, at the heater calculated with reference to correction value load factor adding or deducts regulation, but addition and subtraction are not limited to the method that heater is revised with reference to load factor, also can use multiplication etc.In addition, the kind of correction value can also be made to increase, more subtly heater be revised with reference to load factor.
Such as, in the step of S2, when the heater calculated is 50% with reference to load factor, when outside air temperature be 13 DEG C, be 1 year half between the operating period of discharge duct 32, the estimated value of the sublimate generation of per unit workpiece be 2.5ppm, be 50-5+5+5=55 (revised heater with reference to load factor).In addition, in the step of S2, being revise the value of the heater loads rate of the reference for carrying out ventilation volume control, is not the load factor of in fact operate heater 20.
Then, CPU50 determines air displacement (S3) according to revised heater with reference to load factor.Specifically, CPU50, with reference to the list 74 shown in Fig. 7, determines the air displacement corresponding with revised heater reference load factor.
Then, CPU50 by the aperture opening ratio (0 ~ 100%) of adjustment exhaust side self closing door 164 and the air quantity of air blast 166 at least any one, the ventilation volume of air exchange system 11 is regulated (S4), to become the air displacement determined in the step of S3.Wherein, the aperture opening ratio (0 ~ 100%) of air-breathing side self closing door 162 is set to identical with the aperture opening ratio being vented side self closing door 164.
In addition, in the ventilation volume regulating step of S4, also can set the aperture opening ratio of exhaust side self closing door 164 and air-breathing side self closing door 162 with reference to the list 74 of Fig. 8, make the air quantity of air blast 166 certain, and corresponding with reference to load factor with revised heater.Or, also can carry out the frequency of taking a breath by regulating air exchange system 11, regulating ventilation volume.
And, CPU50 can repeatedly perform the step of above-mentioned S1 ~ S4 off and on continuously or during regulation in the operation of annealing device 10, monitor that heater is with reference to load factor, and according to the ventilation volume of heater with reference to the change adjustment air exchange system 11 of load factor.
In addition, in the above description, when the reference load factor of revised heater is zero, also the ventilation volume of air exchange system 11 is made to be zero, but also can as required, even if when the reference load factor of heater is zero, also keep MIN ventilation volume.
In addition, about adding to heater with reference to the influential principal element of load factor, to the method that heater is revised with reference to load factor, said method is only an example, can consider that other principal element is revised with reference to load factor heater widely.Such as, in other useful variation (variation in voltage, current variation etc.) in the influential situation of reference load factor of heater, preferably heater is suitably adjusted with reference to load factor, to eliminate the impact of so useful variation.
According to above-mentioned annealing device 10, owing to setting most suitable ventilation volume, so excess emissions heat can be suppressed and waste energy according to the situation disposed.Its result, can realize reducing production cost, and can reduce CO
2discharge capacity.
In addition, not only regulate ventilation volume according to the placement situation of workpiece, and can the variation (blocking because of blast pipe causes air displacement variation etc.) of response environment information (outside air temperature etc.) and treatment situation and other useful variation neatly, the ventilation volume of air exchange system 11 is regulated.Its result, in annealing device 10, can be held in suitable concentration the sublimate concentration of body of heater 12, and can prevent discharges heat meaninglessly, reduce power consumption significantly.
In the above-described embodiment, heated air circulation type annealing device 10 is illustrated, but technological thought of the present invention also goes in the apparatus for continous heat treatment such as annealing device and the roller hearth furnace with air exchange system of the FAR INFRARED HEATING with air exchange system.In addition, the example ventilation volume of air exchange system being carried out to multistage adjustment is illustrated, but also can regulate continuously ventilation volume.
The explanation of above-mentioned execution mode is all illustrate in all, should not be regarded as the content of restriction.Scope of the present invention is not represented by above-mentioned execution mode, but is represented by claim.In addition, scope of the present invention also comprises the content that is equal to claim and all changes in scope.
Claims (4)
1. an annealing device, is characterized in that, has air exchange system, and when heat-treating the workpiece being configured in furnace interior, described air exchange system is taken a breath to described furnace interior,
Described annealing device comprises:
Heater, is configured in described furnace interior, is heated described workpiece by the driving in heater-driven portion;
Ventilation volume adjusting portion, regulates the ventilation volume of described air exchange system; And
CPU, when described workpiece heat, carries out FEEDBACK CONTROL to described heater-driven portion,
Described CPU comprises:
With reference to load factor operational part, the reference load factor of heater according to the value computing feeding back to described heater-driven portion; And
Ventilation volume control part, according to the described operation result with reference to load factor operational part, controls described ventilation volume adjusting portion,
Described ventilation volume control part makes the ventilation volume of described air exchange system increase according to the described increase with reference to load factor, on the other hand, according to the described minimizing with reference to load factor, the ventilation volume of described air exchange system is reduced.
2. annealing device according to claim 1, is characterized in that, described annealing device also comprises: with reference to load factor correction portion, and environmentally information and treatment situation information are revised the described reference load factor calculated with reference to load factor operational part.
3. annealing device according to claim 2, is characterized in that,
Described treatment situation information be described air exchange system blocked state and/or from described workpiece sublimate generation.
4. annealing device according to any one of claim 1 to 3, is characterized in that, described annealing device also comprises: recording unit, and record represents the list of the corresponding relation of the ventilation volume of described reference load factor and described air exchange system.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010083463A JP5503376B2 (en) | 2010-03-31 | 2010-03-31 | Heat treatment equipment |
| JP2010-083463 | 2010-03-31 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102208344A CN102208344A (en) | 2011-10-05 |
| CN102208344B true CN102208344B (en) | 2016-03-30 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201010580164.8A Active CN102208344B (en) | 2010-03-31 | 2010-12-06 | Annealing device |
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| JP (1) | JP5503376B2 (en) |
| KR (2) | KR101737949B1 (en) |
| CN (1) | CN102208344B (en) |
| TW (2) | TWI577804B (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1782570A (en) * | 2004-11-30 | 2006-06-07 | 乐金电子(天津)电器有限公司 | Electromagnetic expansion valve control method of central air conditioner |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2003007594A (en) * | 2001-06-21 | 2003-01-10 | Dainippon Screen Mfg Co Ltd | Device for heat-treating substrate |
| JP4133929B2 (en) * | 2004-05-28 | 2008-08-13 | 新日本製鐵株式会社 | Furnace pressure control method for heating furnace |
| CN100532979C (en) * | 2004-11-30 | 2009-08-26 | 乐金电子(天津)电器有限公司 | Separated room load calculating method and electromagnetic expansion valve control method of central air conditioner |
| JP5202810B2 (en) * | 2006-02-06 | 2013-06-05 | 古河電気工業株式会社 | Graphite heating furnace and optical fiber manufacturing method |
| JP4273145B2 (en) * | 2006-09-13 | 2009-06-03 | エスペック株式会社 | Heat treatment equipment |
| JP4331784B2 (en) * | 2008-07-22 | 2009-09-16 | 株式会社フューチャービジョン | Supply and exhaust method for substrate firing furnace |
-
2010
- 2010-03-31 JP JP2010083463A patent/JP5503376B2/en not_active Expired - Fee Related
- 2010-11-04 KR KR1020100109326A patent/KR101737949B1/en active IP Right Grant
- 2010-12-06 CN CN201010580164.8A patent/CN102208344B/en active Active
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2011
- 2011-02-11 TW TW104117971A patent/TWI577804B/en active
- 2011-02-11 TW TW100104615A patent/TWI494438B/en active
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- 2017-04-27 KR KR1020170054420A patent/KR101914434B1/en active IP Right Grant
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1782570A (en) * | 2004-11-30 | 2006-06-07 | 乐金电子(天津)电器有限公司 | Electromagnetic expansion valve control method of central air conditioner |
Also Published As
| Publication number | Publication date |
|---|---|
| KR101914434B1 (en) | 2018-11-05 |
| CN102208344A (en) | 2011-10-05 |
| KR20170053157A (en) | 2017-05-15 |
| TWI494438B (en) | 2015-08-01 |
| KR20110109785A (en) | 2011-10-06 |
| TW201534735A (en) | 2015-09-16 |
| JP2011214777A (en) | 2011-10-27 |
| TW201139689A (en) | 2011-11-16 |
| JP5503376B2 (en) | 2014-05-28 |
| KR101737949B1 (en) | 2017-05-19 |
| TWI577804B (en) | 2017-04-11 |
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