CN102168208A - Method for manufacturing ZnSn sputtering target for glass coating - Google Patents
Method for manufacturing ZnSn sputtering target for glass coating Download PDFInfo
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- CN102168208A CN102168208A CN 201110087932 CN201110087932A CN102168208A CN 102168208 A CN102168208 A CN 102168208A CN 201110087932 CN201110087932 CN 201110087932 CN 201110087932 A CN201110087932 A CN 201110087932A CN 102168208 A CN102168208 A CN 102168208A
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- sputtering target
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Abstract
The invention discloses a method for manufacturing a ZnSn sputtering target for glass coating. In the method, zinc metal blocks and tin metal blocks are taken as raw materials; and the method comprises the following steps of: baking a casting pattern, smelting alloy, casting, cooling a cast ingot, and machining to obtain a finished product. The alloy comprises the following components in percentage by weight: 50 to 95 percent of Zn, and 5 to 50 percent of Sn. The casting temperature is 40 to 80 DEG C above liquidus in the smelting process, and the baking temperature of the casting pattern is 100 to 250 DEG C. By the method, process parameters are easy to control, microstructures are uniform, the finished product has no defects such as loose, pores, cracks and the like, and the yield is high.
Description
Technical field
The present invention relates to the preparation technology of alloy, specifically a kind of manufacture method of ZnSn sputtering target material.
Background technology
Save energy, protection environment are the themes of 21 century, various countries' finance is all supported energy-saving and emission-reduction as emphasis direction.Large-area coating film glass obtains the support energetically of countries in the world as the important channel that the room building energy conservation reduces discharging.The target that large-area coating film glass needs has many types, and the ZnSn sputtering target material is wherein a kind of.
At present, the manufacturing glass coating mainly contains two kinds with the method for ZnSn plane sputtering target material:
1, ordinary casting method:
This method is that raw material is heated melting, adopts the template model to cast, and obtains an ingot blank that thickness is bigger slightly than desired product thickness, then blank is machined to finished product.
The advantage of this method is: technical process is shorter, and technology is simple.The shortcoming of this method is: the finished product rate is low, and loose, the shrinkage cavity of product inside can't be eliminated fully.
2, pressure casting method:
This method is that raw material is heated melting, treat that alloy melts fully after, adopt pressure casting machine to carry out pressure die casting, naturally cooling is processed into finished product with pig moulding machine at last.
The advantage of this method is: product is than first method lumber recovery height, do not have casting flaws such as loose, shrinkage cavity.The shortcoming of this method is: the requirement to the pressure die casting capacity of equipment is very high, and one-time investment is too big.
Summary of the invention
At the problem that above-mentioned prior art exists, the purpose of this invention is to provide that a kind of processing parameter is easy to control, microtexture evenly, finished product do not have the manufacture method of the high glass coating of defective such as loose pore crackle, yield rate with the ZnSn sputtering target material.
For achieving the above object, technical scheme provided by the present invention is the manufacture method of a kind of glass coating with the ZnSn sputtering target material, may further comprise the steps:
(1) at first prepares burden, take by weighing Zn metal block and Sn metal block according to Zn, Sn weight percent Zn 50～95%, Sn5～50% in the ZnSn alloy;
(2) then foundry pattern is toasted, be heated to 100 ℃～250 ℃, use when waiting to cast;
(3) metal block in the step (1) is smelted, refining time is 5～10 minutes, casts when the alloy molten fluid temperature reaches more than the liquidus line 40～80 ℃;
(4) casting was finished postcooling 20-40 minute, took out the ingot casting air cooling then to room temperature;
(5) ingot casting that is cooled to room temperature is carried out machining according to dimensional requirement, be processed into the ZnSn sputtering target material that meets dimensional precision.
The purity of described Zn metal block (element wt per-cent) is more than 99.95%, and the purity of described Sn metal block is also more than 99.95%.
Described foundry pattern is a cast on top formula foundry pattern, can make the product microtexture be evenly distributed, not have defectives such as loose pore crackle like this.
Beneficial effect: processing parameter of the present invention is controlled easily, and microtexture is evenly distributed, and crystal grain is tiny; Do not have defectives such as loose pore crackle, material is closely knit fully; The no cold shut in ingot casting surface, splash, alloy liquid is full of the precision casting model fully, product lumber recovery height.
Embodiment
Below in conjunction with specific embodiment, further illustrate the present invention, present embodiment is being to implement under the prerequisite with the technical solution of the present invention, should understand these embodiment and only be used to the present invention is described and be not used in and limit the scope of the invention.
Embodiment one: a kind of glass coating manufacture method of ZnSn sputtering target material may further comprise the steps:
(1) at first prepares burden, choose purity and be 99.95% Zn metal block and purity and be 99.95% Sn metal block, take by weighing Zn metal block and Sn metal block according to Zn, Sn weight percent Zn 95%, Sn 5% in the ZnSn alloy;
(2) then cast on top formula foundry pattern is carried out heated baking with resistance furnace, be heated to 250 ℃, use when waiting to cast;
(3) metal block in the step (1) is smelted, refining time is 6 minutes, casts when the alloy molten fluid temperature reaches more than the liquidus line 80 ℃;
(4) casting was finished postcooling 40 minutes, took out the ingot casting air cooling then to room temperature;
(5) ingot casting that is cooled to room temperature is carried out machining according to 400 * 120 * 10mm, be processed into the ZnSn sputtering target material that meets dimensional precision.
Embodiment two: a kind of glass coating manufacture method of ZnSn sputtering target material may further comprise the steps:
(1) at first prepares burden, choose purity and be 99.96% Zn metal block and purity and be 99.97% Sn metal block, take by weighing Zn metal block and Sn metal block according to Zn, Sn weight percent Zn 90%, Sn 10% in the ZnSn alloy;
(2) then cast on top formula foundry pattern is carried out heated baking with induction furnace, be heated to 200 ℃, use when waiting to cast;
(3) metal block in the step (1) is smelted, refining time is 7 minutes, casts when the alloy molten fluid temperature reaches more than the liquidus line 70 ℃;
(4) casting was finished postcooling 35 minutes, took out the ingot casting air cooling then to room temperature;
(5) ingot casting that is cooled to room temperature is carried out machining according to 310 * 120 * 10mm, be processed into the ZnSn sputtering target material that meets dimensional precision.
Embodiment three: a kind of glass coating manufacture method of ZnSn sputtering target material may further comprise the steps:
(1) at first prepares burden, choose purity and be 99.97% Zn metal block and purity and be 99.97% Sn metal block, take by weighing Zn metal block and Sn metal block according to Zn, Sn weight percent Zn 85%, Sn 15% in the ZnSn alloy;
(2) then cast on top formula foundry pattern is carried out heated baking with induction furnace, be heated to 180 ℃, use when waiting to cast;
(3) metal block in the step (1) is smelted, refining time is 8 minutes, casts when the alloy molten fluid temperature reaches more than the liquidus line 60 ℃;
(4) casting was finished postcooling 30 minutes, took out the ingot casting air cooling then to room temperature;
(5) ingot casting that is cooled to room temperature is carried out machining according to 310 * 120 * 10mm, be processed into the ZnSn sputtering target material that meets dimensional precision.
Embodiment four: a kind of glass coating manufacture method of ZnSn sputtering target material may further comprise the steps:
(1) at first prepares burden, choose purity and be 99.98% Zn metal block and purity and be 99.96% Sn metal block, take by weighing Zn metal block and Sn metal block according to Zn, Sn weight percent Zn 80%, Sn 20% in the ZnSn alloy;
(2) then cast on top formula foundry pattern is carried out heated baking with induction furnace, be heated to 150 ℃, use when waiting to cast;
(3) metal block in the step (1) is smelted, refining time is 5 minutes, casts when the alloy molten fluid temperature reaches more than the liquidus line 50 ℃;
(4) casting was finished postcooling 25 minutes, took out the ingot casting air cooling then to room temperature;
(5) ingot casting that is cooled to room temperature is carried out machining according to 310 * 120 * 10mm, be processed into the ZnSn sputtering target material that meets dimensional precision.
Embodiment five: a kind of glass coating manufacture method of ZnSn sputtering target material may further comprise the steps:
(1) at first prepares burden, choose purity and be 99.95% Zn metal block and purity and be 99.97% Sn metal block, take by weighing Zn metal block and Sn metal block according to Zn, Sn weight percent Zn 60%, Sn 40% in the ZnSn alloy;
(2) then cast on top formula foundry pattern is carried out heated baking with induction furnace, be heated to 120 ℃, use when waiting to cast;
(3) metal block in the step (1) is smelted, refining time is 6 minutes, casts when the alloy molten fluid temperature reaches more than the liquidus line 40 ℃;
(4) casting was finished postcooling 20 minutes, took out the ingot casting air cooling then to room temperature;
(5) ingot casting that is cooled to room temperature is carried out machining according to 310 * 120 * 10mm, be processed into the ZnSn sputtering target material that meets dimensional precision.
Embodiment six: a kind of glass coating manufacture method of ZnSn sputtering target material may further comprise the steps:
(1) at first prepares burden, choose purity and be 99.98% Zn metal block and purity and be 99.98% Sn metal block, take by weighing Zn metal block and Sn metal block according to Zn, Sn weight percent Zn 50%, Sn 50% in the ZnSn alloy;
(2) then cast on top formula foundry pattern is carried out heated baking with induction furnace, be heated to 100 ℃, use when waiting to cast;
(3) metal block in the step (1) is smelted, refining time is 10 minutes, casts when the alloy molten fluid temperature reaches more than the liquidus line 50 ℃;
(4) casting was finished postcooling 25 minutes, took out the ingot casting air cooling then to room temperature;
(5) ingot casting that is cooled to room temperature is carried out machining according to 310 * 120 * 10mm, be processed into the ZnSn sputtering target material that meets dimensional precision.
Six embodiment of the present invention are raw materials used as shown in table 1 with processing step, processing parameter and prior art Comparative Examples, defect situation and yield rate that six embodiment of the present invention are compared with the prior art routine product contrast as shown in table 2, wherein numbering 1-6 is the embodiment of the invention one to six, numbering 7-9 is the Comparative Examples of pressure casting method in the prior art, and numbering 10-12 is the Comparative Examples of ordinary casting method in the prior art:
Table 1
Table 2 is the defect situation and the yield rate contrast table of each product in the table 1:
Table 2
Claims (5)
1. a glass coating is characterized in that may further comprise the steps with the manufacture method of ZnSn sputtering target material:
(1) at first prepares burden, take by weighing Zn metal block and Sn metal block according to Zn, Sn weight percent Zn 50～95%, Sn5～50% in the ZnSn alloy;
(2) then foundry pattern is toasted, be heated to 100 ℃～250 ℃, use when waiting to cast;
(3) metal block in the step (1) is smelted, refining time is 5～10 minutes, casts when the alloy molten fluid temperature reaches more than the liquidus line 40～80 ℃;
(4) casting was finished postcooling 20～40 minutes, took out the ingot casting air cooling then to room temperature;
(5) ingot casting that is cooled to room temperature is carried out machining according to dimensional requirement, be processed into the ZnSn sputtering target material material that meets dimensional precision.
2. according to the manufacture method of the described a kind of glass coating of claim 1 with the ZnSn sputtering target material, it is characterized in that: the purity of described Zn metal block is more than 99.95%, and the purity of described Sn metal block is also more than 99.95%.
3. according to the manufacture method of the described a kind of glass coating of claim 1 with the ZnSn sputtering target material, it is characterized in that: in the described step (2) foundry pattern being toasted employed baking method is process furnace baking or oxygen, acetylene torch baking.
4. according to the manufacture method of the described a kind of glass coating of claim 3 with the ZnSn sputtering target material, it is characterized in that: described process furnace is resistance furnace or induction furnace.
5. according to the manufacture method of the described a kind of glass coating of claim 1 with the ZnSn sputtering target material, it is characterized in that: described foundry pattern is a cast on top formula foundry pattern.
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| Application Number | Priority Date | Filing Date | Title |
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| CN 201110087932 CN102168208A (en) | 2011-04-08 | 2011-04-08 | Method for manufacturing ZnSn sputtering target for glass coating |
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| CN 201110087932 CN102168208A (en) | 2011-04-08 | 2011-04-08 | Method for manufacturing ZnSn sputtering target for glass coating |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012172428A2 (en) * | 2011-06-14 | 2012-12-20 | Ingot Metal Company Limited | Method for producing lead-free copper-bismuth alloys and ingots useful for same |
| CN109706345A (en) * | 2019-03-18 | 2019-05-03 | 绍兴市天龙锡材有限公司 | A kind of rotary target material alloy and its processing method |
| CN113308672A (en) * | 2021-04-15 | 2021-08-27 | 基迈克材料科技（苏州）有限公司 | ZnSn alloy target material and preparation method thereof |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1050150A (en) * | 1990-07-03 | 1991-03-27 | 新疆昌吉市城乡建设综合开发股份有限总公司 | Zn-sn alloy solder |
| CN1300327A (en) * | 1998-05-08 | 2001-06-20 | Ppg工业俄亥俄公司 | Zinc-tin alloy sputtering target |
| CN101809183A (en) * | 2008-03-24 | 2010-08-18 | 株式会社久保田 | Pipe provided with corrosion prevention layer on the outside surface, process for production of the same, and process for production of alloy wires to be used for corrosion prevention of outside surface of the pipe |
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2011
- 2011-04-08 CN CN 201110087932 patent/CN102168208A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1050150A (en) * | 1990-07-03 | 1991-03-27 | 新疆昌吉市城乡建设综合开发股份有限总公司 | Zn-sn alloy solder |
| CN1300327A (en) * | 1998-05-08 | 2001-06-20 | Ppg工业俄亥俄公司 | Zinc-tin alloy sputtering target |
| CN101809183A (en) * | 2008-03-24 | 2010-08-18 | 株式会社久保田 | Pipe provided with corrosion prevention layer on the outside surface, process for production of the same, and process for production of alloy wires to be used for corrosion prevention of outside surface of the pipe |
Non-Patent Citations (1)
| Title |
|---|
| 《特种铸造及有色合金》 20071231 钱国统 等 锡锌合金水平连铸技术的探讨 全文 1-5 第27卷, 第11期 * |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012172428A2 (en) * | 2011-06-14 | 2012-12-20 | Ingot Metal Company Limited | Method for producing lead-free copper-bismuth alloys and ingots useful for same |
| WO2012172428A3 (en) * | 2011-06-14 | 2013-03-14 | Ingot Metal Company Limited | Method for producing lead-free copper-bismuth alloys and ingots useful for same |
| US9050651B2 (en) | 2011-06-14 | 2015-06-09 | Ingot Metal Company Limited | Method for producing lead-free copper—bismuth alloys and ingots useful for same |
| CN109706345A (en) * | 2019-03-18 | 2019-05-03 | 绍兴市天龙锡材有限公司 | A kind of rotary target material alloy and its processing method |
| CN113308672A (en) * | 2021-04-15 | 2021-08-27 | 基迈克材料科技（苏州）有限公司 | ZnSn alloy target material and preparation method thereof |
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Application publication date: 20110831 |