CN102154671A - Electrochemical equipment for preparing single-side thin film of solar cell - Google Patents
Electrochemical equipment for preparing single-side thin film of solar cell Download PDFInfo
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- CN102154671A CN102154671A CN2010106225617A CN201010622561A CN102154671A CN 102154671 A CN102154671 A CN 102154671A CN 2010106225617 A CN2010106225617 A CN 2010106225617A CN 201010622561 A CN201010622561 A CN 201010622561A CN 102154671 A CN102154671 A CN 102154671A
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract
The invention discloses electrochemical equipment for preparing a single-side thin film of a solar cell. The electrochemical equipment comprises a strong acid and alkali resistant container (1), a power supply (2), positive and negative electrodes (3), a power line (9), a blowing pipe (4), a silicon slice bracket (5) and two fixed slots (6), wherein the two fixed slots (6) are formed on two sides of the strong acid and alkali resistant container (1) respectively and are fixed at the bottom of the strong acid and alkali resistant container (1); the upper surfaces of the fixed slots (6) are provided with slots; the positive and the negative electrodes (3) are inserted in the slots of the fixed slots (6); the silicon slice bracket (5) is positioned between the positive and the negative electrodes (3); four bracket feet of the silicon slice bracket (5) are inserted into the slots of the fixed slots (6) to be fixed; slots are formed on two inner sides of the silicon slice bracket (5); and silicon slices are fixed in the slots on the two inner sides of the silicon slice bracket (5). The electrochemical equipment can be used for preparing the single-side thin films in batches.
Description
Technical field
The present invention relates to a kind of electrochemical appliance, particularly a kind of electrochemical preparation equipment for preparing the solar cell single-sided film.
Background technology
Reducing production cost of cells is the main path that reduces the solar cell cost.In the conventional batteries production process, in order to reduce the surface reflection loss, simultaneously battery is carried out surface passivation to improve the life-span of minority carrier, the photovoltaic cell production line generally uses the PECVD legal system to be equipped with the SiNx film as antireflective coating and passivation layer.Film compactness, the passive behavior of this method preparation are generally preferable, but prepare the thin-film technique complexity, produce with maintenance cost very high.The electrochemical production film is a kind of novel method in present photovoltaic field, and it is low that it has a cost, and passivation is better than the characteristics of SiNx film.Simultaneously, electrochemical preparation technology's simple controllable is easy to realize that the battery cost is significant for reducing.In electrochemical process, electrochemical cell is the equipment of electrochemical process most critical.Electrochemical cell mainly comprises two electrodes type, three electrode types and four electrode type (VolkerLehmannza, " Electrochemistry of Silicon " (Electrochemistry of Silicon:Instrumentation, Science, Materials and Applications, Wiley-VCH Verlag GmbH, 2002).Three electrodes and four electrode type device complexity are difficult to realize large-area single-sided film preparation, more difficult realization film preparation in batches.Conventional two electrodes electrochemical appliance mainly contains single grooved and dual-trench type.Robert L.Heimann et al is at " Flectrolyticprocess for treating a conductive suface and products formed thereby " (US statespatent application publication.No.:US 2002/0012804A1) a kind of single grooved electrochemical appliance that should be mentioned that.Utilize this device to carry out anodic oxidation, often at first steam layer of metal behind at silicon chip, anode directly is added on the silicon chip.This device subsequent operations is simple, but early-stage preparations are as the evaporated metal film, cumbersome.And this device can bring the pollution between metal or silicon chip and the electrode zone of action.The more important thing is that this device can't be realized producing in batches.J.E.A.M.van den Meerakker et al is at " Etching of Deep Macropores in 6 in.Si Wafers " (Journal of The Electrochemical Society, 147 (7), 2000:2757-2761) should be mentioned that a kind of two electrodes type double flute electrochemical apparatus.This equipment mainly is made up of two grooves, and wafer chuck is between two grooves.This equipment has avoided will steaming at the silicon chip back side before the anodic oxidation shortcoming that metal and silicon chip and electrode directly contact, still, and this operation of equipment relative complex, and, can't realize that equally the batch single face prepares film.
Summary of the invention
Main purpose of the present invention is to overcome that conventional electrochemical apparatus exists complicated operating process, electrode and silicon chip zone of action to exist to pollute and yield rate is crossed problems such as low, proposes a kind of simple and preparation thin film electrochemistry device of can be used for producing in batches.
Use electrochemical appliance of the present invention to prepare film, easy and simple to handle, can produce in batches, do not exist owing to electrode contacts the potentially contaminated problem that causes with silicon chip.The film of this method preparation is directly applied to the photovoltaic cell field, do not have equipment and battery production technology incompatibility problem, the film of preparation is even, and thin film passivation, anti-reflection quality are all preferable.
Electrochemical appliance of the present invention comprises with lower member:
(1) strong alkali-acid resistance container;
(2) power supply;
(3) positive and negative electrode;
(4) aspiration tube;
(5) silicon chip support;
(6) two pickup grooves of positive and negative electrode and silicon chip support;
(7) supply lead.
In the described parts, the electrochemical apparatus of strong alkali-acid resistance container, power supply, supply lead and existing preparation film is identical.The two ends of power supply are connected with positive and negative electrode by supply lead.
The width of described silicon chip support is more bigger than silicon chip width, hollow out in the middle of the silicon chip support, two inboards have groove, groove act as fixedly silicon chip, the width of groove is more bigger than the thickness of silicon chip, the number of the groove silicon chip quantity of plated film is according to actual needs determined.There are four stent foots at the two ends of silicon chip support.The width of the pickup groove of described positive and negative electrode and silicon chip support is more bigger than the width of silicon chip support, the upper surface of pickup groove has a series of groove, pickup groove is four pin that are used for fixing electrode and silicon chip support, can be used to regulate two distance between electrodes simultaneously, the width of groove is more bigger than thickness of electrode and silicon chip stent foot thickness.Described pickup groove is fixed on the both sides of strong alkali-acid resistance container, and places the bottom of strong alkali-acid resistance container; Described silicon chip props up and is placed between the described positive and negative electrode; Described aspiration tube is inserted in the strong alkali-acid resistance container, is positioned at strong acid and strong base container both sides sidewall; In the present device, except that power supply, supply lead, described positive and negative electrode, aspiration tube, silicon chip support, pickup groove all place container.
The making material of described electrode is platinized platinum or graphite flake or silicon chip; Described positive and negative electrode is flat or cylindricality formula or array.
The technology that use the present invention prepares the solar cell single-sided film is as follows:
(1) silicon chip with some amount is fixed on the silicon chip support, then silicon chip support and electrode is fixed on the pickup groove simultaneously, adjusts the angle of silicon chip support and positive and negative electrode;
(2) in the strong alkali-acid resistance container, add the ionogen for preparing film, in the strong alkali-acid resistance container, advertise N with aspiration tube simultaneously
2
(3) switch on for some time on electrode, after reaction finishes silicon chip is taken out, deionized water rinsing dries up, and promptly obtains having the silicon chip of single-sided film.
The angle of described silicon chip support and positive and negative electrode is 0-90 °; Described electrolyte solution is an acidic solution, and basic solution, or salt, solvent are deionized water or alcohols.
The present invention can prepare multi-disc silicon chip film simultaneously.
Description of drawings
Fig. 1 is electrochemical appliance one-piece construction figure of the present invention, among the figure: pickup groove, 7 electrolytic solution, 8 silicon chips, 9 supply leads of 1 strong alkali-acid resistance container, 2 power supplys, 3 positive and negative electrodes, 4 aspiration tube, 5 silicon chip supports, 6 fixed electordes and silicon chip support;
Fig. 2 is the shape of electrode, and among the figure: A is flat, B column type formula, C array.
Embodiment
As shown in Figure 1, electrochemical appliance of the present invention comprises: pickup groove 6, the supply lead 9 of strong alkali-acid resistance container 1, power supply 2, positive and negative electrode 3, aspiration tube 4, the support 5 of putting silicon chip, fixed electorde and silicon chip support.The two ends of power supply 2 are connected with positive and negative electrode 3 by supply lead 9.Described two pickup grooves 6 place the both sides of strong alkali-acid resistance container 1 respectively, and are fixed on the bottom of strong alkali-acid resistance container 1.Pickup groove 6 width are more bigger than the width of silicon chip support 5, and the upper surface of pickup groove 6 has a series of groove, and described positive and negative electrode 3 inserts in the groove of pickup grooves 6, regulate distance between the positive and negative electrode by the position that changes the groove of electrode in pickup groove.Described silicon chip support 5 places strong alkali-acid resistance container 1, and silicon chip support 5 is between positive and negative electrode, and four stent foots of silicon chip support 5 insert in the groove of pickup groove 6.The width of silicon chip support 5 is more bigger than silicon chip width, hollow outs in the middle of the silicon chip support 5, two inboards have groove, groove act as fixedly silicon chip, the width of groove is more bigger than the thickness of silicon chip, the number of the groove silicon chip quantity of plated film is according to actual needs determined.There are four stent foots at the two ends of silicon chip support.
As shown in Figure 2, electrode of the present invention comprises: flat A, column type formula B, array C.
The process that apparatus of the present invention are used to prepare film is as described in the embodiment:
1, select the material of platinized platinum as positive and negative electrode 3 for use, the electrode pattern is flat A, and 2 silicon chips are fixed on the silicon chip support 5, then silicon chip support 5 and positive and negative electrode 3 is fixed on the pickup groove 6 simultaneously, and silicon chip support 5 is adjusted into 0 ° with the angle of positive and negative electrode 3;
2, the mixing solutions of preparation acetic acid and deionized water is as the electrolytic solution of electrochemical preparation thin-film technique use, and the volume ratio of acetic acid and deionized water is 1: 10, in the strong acid and strong base container 1 that injects the electrolyte into, advertises N with aspiration tube 4 in container 1
2
3, on electrode 3, switch on for some time, after question response finishes silicon chip support 5 is taken out, use deionized water rinsing, N
2Air-blowing is done, the silicon chip that promptly obtains having single-sided film.
Embodiment 2-5 is identical with embodiment 1, and the number of different is silicon chip is 5, and 10,20.
Embodiment 6-9 is identical with embodiment 1, and different is that electrolytic solution is respectively salpeter solution, sulphuric acid soln or potassium hydroxide solution, and cyanogen solution, solvent is deionized water.
Embodiment 10 is identical with embodiment 1, and different is that electrolytic solution is respectively hydrazine solution (N
2H
4), solvent is an ethanol.
Embodiment 11 is identical with embodiment 1, and different is that electrolytic solution is (CH
3)
3-Si-NH-Si-(CH
3)
3Solution, solvent are ethanol.
Embodiment 12-13 is identical with embodiment 1, and different is that the electrode pattern is respectively cylindricality formula B, array C.
Case study on implementation 14-15 is identical with embodiment 1 said process, and different is silicon chip support 5 is 45 ° with the angle of positive and negative electrode 3,90 °.
Case study on implementation 16-17 is identical with embodiment 1, and different is that positive electrode material is respectively graphite flake, silicon chip.
Case study on implementation 18-19 is identical with embodiment 1, and different is that negative electrode material is respectively graphite flake, silicon chip.
Claims (5)
1. electrochemical apparatus for preparing the solar cell single-sided film, comprise strong alkali-acid resistance container (1), power supply (2), positive and negative electrode (3), supply lead (9), be placed with electrolytic solution (7) in the strong alkali-acid resistance container (1), it is characterized in that described electrochemical preparation equipment also comprises aspiration tube (4), silicon chip support (5) and two pickup grooves (6); Described two pickup grooves (6) place the both sides of strong alkali-acid resistance container (1) respectively, and pickup groove (6) is fixed on the bottom of strong alkali-acid resistance container (1); The upper surface of pickup groove (6) has groove, and described positive and negative electrode (3) inserts in the groove of pickup groove (6); Described silicon chip support (5) is positioned between the positive and negative electrode (3), and fixing in the groove of four stent foots insertion pickup grooves (6) of silicon chip support (5), aspiration tube (4) is inserted in the strong alkali-acid resistance container (1), is positioned at strong acid and strong base container (1) both sides sidewall.
2. according to the electrochemical apparatus of the described preparation solar cell of claim 1 single-sided film, it is characterized in that the middle hollow out of described silicon chip support (5), two inboards of silicon chip support (5) have groove, and described groove is used for fixing silicon chip.
3. according to the electrochemical apparatus of the described preparation solar cell of claim 1 single-sided film, it is characterized in that the distance between the described positive and negative electrode (3) is regulated in the position in the hole of pickup groove (6) by changing described positive and negative electrode (3).
4. according to the described a kind of electrochemical apparatus of realizing preparing the solar cell single-sided film of claim 1, the making material that it is characterized in that described positive and negative electrode (3) is platinized platinum or graphite flake or silicon chip.
5. according to the described a kind of electrochemical apparatus for preparing the solar cell single-sided film of claim 1, it is characterized in that described positive and negative electrode (3) is flat or cylindricality formula or array.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010106225617A CN102154671B (en) | 2010-12-28 | 2010-12-28 | Electrochemical equipment for preparing single-side thin film of solar cell |
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| CN2010106225617A CN102154671B (en) | 2010-12-28 | 2010-12-28 | Electrochemical equipment for preparing single-side thin film of solar cell |
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| CN102154671A true CN102154671A (en) | 2011-08-17 |
| CN102154671B CN102154671B (en) | 2012-07-25 |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0649686A (en) * | 1992-08-05 | 1994-02-22 | Hitachi Ltd | Manufacture of thin film semiconductor element |
| CN101866843A (en) * | 2010-05-07 | 2010-10-20 | 武汉理工大学 | Electrochemical corrosion method for large-distance silicon-based three-dimensional structure |
| CN101880907A (en) * | 2010-07-07 | 2010-11-10 | 厦门大学 | Electrochemical levelling and polishing processing method with nanometer precision and device thereof |
-
2010
- 2010-12-28 CN CN2010106225617A patent/CN102154671B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0649686A (en) * | 1992-08-05 | 1994-02-22 | Hitachi Ltd | Manufacture of thin film semiconductor element |
| CN101866843A (en) * | 2010-05-07 | 2010-10-20 | 武汉理工大学 | Electrochemical corrosion method for large-distance silicon-based three-dimensional structure |
| CN101880907A (en) * | 2010-07-07 | 2010-11-10 | 厦门大学 | Electrochemical levelling and polishing processing method with nanometer precision and device thereof |
Non-Patent Citations (2)
| Title |
|---|
| 《Journal of The Electrochemical Society》 20001231 J. E. A. M. van den Meerakker et al. Etching of Deep Macropores in 6 in. Si Wafers 第2757-2761页 1-5 第147卷, 第7期 2 * |
| 《压电与声光》 20031231 田斌等 多孔硅制备方法新进展及在微传感器中的应用 第521-524页 1-5 第25卷, 第6期 2 * |
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