CN102107193A - Ion cleaning process for hardware - Google Patents
Ion cleaning process for hardware Download PDFInfo
- Publication number
- CN102107193A CN102107193A CN 201010598054 CN201010598054A CN102107193A CN 102107193 A CN102107193 A CN 102107193A CN 201010598054 CN201010598054 CN 201010598054 CN 201010598054 A CN201010598054 A CN 201010598054A CN 102107193 A CN102107193 A CN 102107193A
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- CN
- China
- Prior art keywords
- hardware
- cleaning
- handware
- ion solution
- cleaned
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
The invention discloses an ion cleaning process for hardware. The process comprises the following steps of: A, spraying hydroxyl ion solution onto hardware to be cleaned so as to purify the hardware to be cleaned or placing the hardware to be cleaned into an ion deoiling cleaning pool filled with the hydroxyl ion solution for immersing to purify the hardware to be cleaned, or spraying and then immersing, wherein the hydroxyl ion solution is prepared by preparing oxygen prepared by an oxygenerator system into O3 through an ozone generator, and mixing through a gas and liquid mixing device; and B, spraying pure water on the hardware to clean the hardware or immersing the hardware in the pure water to remove residual watermarks obtained in the steps, and entering the next process. By applying ions into a hardware cleaning process, the process has the technical effect and the economic effect which are different from those of the conventional cleaning mode; and the process can be widely applied to hardware, die castings, stamping parts, casting parts and the like, and has wide market value and huge market potential.
Description
Technical field
The present invention relates to oil stain rust stain and wait dirt cleaning technique field technology, specifically, it is a kind of handware ion cleaning.
Background technology
Handware is often to need contact to use in the middle of the daily productive life of people.But oil stain dirt or rust stain are often arranged in the working surface of handware or its slit, influence attractive in appearance and be unfavorable for production and processing again and preserve use.Traditional cleaning way has handware to be put into acid or alkali or soak to dash with oil displacement agent and drenches to reach the purpose of purification, but these modes are bigger to the corrosion of handware, bigger to the handware destructiveness, influence its service life, and cleaning process labour intensity is big, scavenging period long, water consumption power consumption is big, secondary pollution is serious, big to ambient influnence, be unfavorable for environmental protection and sustainable development, also dangerous to operating personnel, the cost of input is higher relatively.Therefore conventional clean technology can not satisfy the requirement of modern society's and environment-friendly and energy-saving emission-reduction more and more high-quality to handware.
Summary of the invention
The objective of the invention is by a kind of brand-new five metals ion cleaning, the handware cleaning technique idea of the complete abandoning tradition of this technology, hydroxide ion solution is applied to the cleaning of handware, can purify spot oil stain and rust stain in handware working surface or the slit effectively, not only can not damage handware itself, and convenient the cleaning, strong adhesion, energy consumption is low, need not to add chemicals, non-secondary pollution.
For achieving the above object, the technical solution adopted in the present invention is: a kind of handware ion cleaning may further comprise the steps:
A, the handware that will need to clean carry out the spray cleaning of hydroxide ion solution, or put into the ion oil removing service sink that hydroxide ion solution is housed and soak purification, or spray soaks again earlier, described hydroxide ion solution is the oxygen of oxygenerator systems produce, makes O through ozone generator
3, prepare through Liqiud-gas mixing device again;
B, after soak being removed residual water stain in the above-mentioned steps by the pure water spray Cleaning for High Capacity or by pure water, handware can enter next step operation again.
Compared with prior art, the invention has the beneficial effects as follows: because hydroxide ion solution has strong oxidizing property, so can impel spot oil stain or rust stain effectively decomposes from the handware metal surface and comes off, do not produce harmful substance, need not to add again chemicals, non-secondary pollution, adhesive force increases, reduced the consumption of water power, product is attractive in appearance and be easy to production and processing again and preserve use.The present invention is by being applied to ion the handware cleaning, have tangible technique effect of the conventional clean of being different from mode and economic effect, can be widely used in having market value and huge market potential widely on handware, die casting, stamping parts, the cast member etc.
The specific embodiment
Below the present invention is described in further detail:
Embodiment: a kind of handware ion of the present invention cleaning, may further comprise the steps,
A, the handware that will need to clean carry out the spray cleaning of hydroxide ion solution, or put into the ion oil removing service sink that hydroxide ion solution is housed and soak purification, or spray soaks again earlier, described hydroxide ion solution is the oxygen of oxygenerator systems produce, makes O through ozone generator
3, prepare through Liqiud-gas mixing device again;
B, after soak being removed residual water stain in the above-mentioned steps by the pure water spray Cleaning for High Capacity or by pure water, handware can enter next step operation again.
The above, it only is a kind of preferred embodiment of the present invention, be not that technical scope of the present invention is imposed any restrictions, every foundation technical spirit of the present invention all still belongs in the scope of the technology of the present invention any trickle modification, equivalent variations and modification that top embodiment did.
Claims (1)
1. handware ion cleaning is characterized in that: may further comprise the steps:
A, the handware that will need to clean carry out the spray cleaning of hydroxide ion solution, or put into the ion oil removing service sink that hydroxide ion solution is housed and soak purification, or spray soaks again earlier, described hydroxide ion solution is the oxygen of oxygenerator systems produce, makes O through ozone generator
3, prepare through Liqiud-gas mixing device again;
B, after soak being removed residual water stain in the above-mentioned steps by the pure water spray Cleaning for High Capacity or by pure water, handware can enter next step operation again.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201010598054 CN102107193A (en) | 2010-12-21 | 2010-12-21 | Ion cleaning process for hardware |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201010598054 CN102107193A (en) | 2010-12-21 | 2010-12-21 | Ion cleaning process for hardware |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102107193A true CN102107193A (en) | 2011-06-29 |
Family
ID=44171540
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201010598054 Pending CN102107193A (en) | 2010-12-21 | 2010-12-21 | Ion cleaning process for hardware |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102107193A (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1250224A (en) * | 1998-08-28 | 2000-04-12 | 三菱硅材料株式会社 | Method for cleaning semi-conductor substrate |
| US7163588B2 (en) * | 1997-05-09 | 2007-01-16 | Semitool, Inc. | Processing a workpiece using water, a base, and ozone |
| CN101283082A (en) * | 2005-10-25 | 2008-10-08 | 埃科莱布有限公司 | Methods for cleaning industrial equipment with pre-treatment |
| CN201139539Y (en) * | 2007-10-16 | 2008-10-29 | 秦彪 | Ozone water eluting apparatus |
-
2010
- 2010-12-21 CN CN 201010598054 patent/CN102107193A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7163588B2 (en) * | 1997-05-09 | 2007-01-16 | Semitool, Inc. | Processing a workpiece using water, a base, and ozone |
| CN1250224A (en) * | 1998-08-28 | 2000-04-12 | 三菱硅材料株式会社 | Method for cleaning semi-conductor substrate |
| CN101283082A (en) * | 2005-10-25 | 2008-10-08 | 埃科莱布有限公司 | Methods for cleaning industrial equipment with pre-treatment |
| CN201139539Y (en) * | 2007-10-16 | 2008-10-29 | 秦彪 | Ozone water eluting apparatus |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C12 | Rejection of a patent application after its publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20110629 |