CN102092946A - Method for preparing microcrystalline glass-ceramic composite decorating plate by using ceramic polishing waste - Google Patents
Method for preparing microcrystalline glass-ceramic composite decorating plate by using ceramic polishing waste Download PDFInfo
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Abstract
The invention discloses a method for preparing a microcrystalline glass-ceramic composite decorating plate by using ceramic polishing waste, belonging to the field of comprehensive resource utilization and material preparation. The method is realized by the following steps of: preparing microcrystalline glass base powder by using the ceramic polishing waste as a basic raw material and adding proper matched materials; performing sintering and water quenching on the microcrystalline glass base powder to obtain microcrystalline glass powder; and performing co-pressing molding and micro crystallization treatment on the microcrystalline glass powder and the ceramic powder to obtain the microcrystalline glass-ceramic composite decorating plate. Because the ceramic polishing waste is used as the raw material, local materials can be conveniently used; and the method has the advantages of low production cost, good product quality, simplicity in production operation, no secondary pollution and the like.
Description
Technical field
The invention belongs to comprehensive utilization of resources and technical field of material, be specifically related to a kind of method of utilizing ceramic polished waste material to prepare the microcrystal glass-ceramic compounded decorative plate material.
Background technology
The microcrystal glass-ceramic compounded decorative plate material is a kind of fine finishing material that rose in recent years.Have the color and luster gentleness, tone is pure, and pattern is adjustable, and water-intake rate is low, the intensity height, and plurality of advantages such as the wear-and corrosion-resistant performance is good is the external wall and the house decorative material of current fast sale.But there are two big defectives in the production of microcrystal glass-ceramic compounded decorative plate material; cause yield rate low; cause the market value of current microcrystal glass-ceramic dalle high, also influenced the mass-producing operation of microcrystal glass-ceramic dalle manufacturer simultaneously.
Because ceramic polished waste material granularity is thinner, stable components.In recent years, many researchers are engaged in ceramic polished comprehensive utilization of waste material work.Because polished waste material is mainly the mullite phase, belong to poor material, use also relatively difficulty at present, and utilization is little.The present invention is to be main raw material with ceramic polished waste material, large usage quantity.
This research is to prepare microcrystalline glass powder with ceramic polished waste material, again that microcrystalline glass powder is mutually compound with ceramic tile, because two phase compositions are comparatively suitable, the coefficient of expansion coincide better, make that the material property of preparation is stable, difficult drop-off, intensity is higher, thereby improving greatly is yield rate, the cost of the monolith articles of reduction.
Summary of the invention
The objective of the invention is at above-mentioned the deficiencies in the prior art, and provide the ceramic polished waste material of a kind of usefulness to prepare the method for microcrystal glass-ceramic compounded decorative plate material.This method is a basic material with ceramic polished waste material at first, and adds suitable admixtion, preparation devitrified glass basis powder; Again to devitrified glass basis powder burn till, shrend makes microcrystalline glass powder; Again that microcrystalline glass powder and ceramics powder is molded altogether, micritization is handled the microcrystal glass-ceramic compounded decorative plate material of making.
Concrete processing step is as described below:
1, at first ceramic polished waste material 50%-70%, the siliceous 20%-40% of admixtion and calcareous 5%-15% are dried 8～10h with 60 ℃ respectively.Levigate respectively to 180～250 orders, grind 1～3h more altogether, make devitrified glass basis powder.Oxide content in the powder of basis: silica content is 45%～65%, and sodium oxide content is 5%～15%, and calcium oxide content is 5%～15%, and content of magnesia is 1%～10%, and said components is weight %.
2, with the heat-up rate of devitrified glass basis powder with 8～12 ℃/min, be warming up to 1450～1550 ℃, insulation 1～3h pours shrend in the tank at once into.Again the powder after the shrend is dried 8～10h, and levigate to 180～250 orders, make the devitrified glass powder.
3, the powder after the polished tile granulation and the layering of devitrified glass powder are packed into metal die, compression moulding.Forming pressure is 15～30MPa.Again biscuit is dried 8～10h with 60 ℃.
4, with the base substrate for preparing with 60 ℃ of oven dry 6h after, change High Temperature Furnaces Heating Apparatus over to and burn till.The firing process parameter is: heat-up rate is the speed of 5～15 ℃/min, is warming up to 800～950 ℃ of coring, and is incubated 60～120min, is warming up to 1050～1250 ℃ of crystallization again.
5, the goods after micritization is handled had both got finished product through annealing rationally.Parameter and annealing is: cooling rate is 15～25 ℃/min, is cooled to 550～650 ℃, and is incubated 60～180min, cools to room temperature again with the furnace.
Advantages such as the present invention has that production cost is low, good product quality, production operation are simple, non-secondary pollution.
Embodiment
Embodiment one
1, at first ceramic polished waste material, admixtion are dried 8h with 60 ℃ respectively.Levigate respectively to 250 orders, grind 3h more altogether, make devitrified glass basis powder.
2, with the heat-up rate of devitrified glass basis powder with 8 ℃/min, be warming up to 1550 ℃, insulation 3h pours shrend in the tank at once into.Again the powder after the shrend is dried 8h, and levigate to 250 orders, make the devitrified glass powder.
3, the powder after the polished tile granulation and the layering of devitrified glass powder are packed into metal die, compression moulding.Forming pressure is 30MPa.Again biscuit is dried 10h with 60 ℃.
4, with the base substrate for preparing with 60 ℃ of oven dry 6h after, change High Temperature Furnaces Heating Apparatus over to and burn till.The firing process parameter is: heat-up rate is the speed of 15 ℃/min, is warming up to 950 ℃ of coring, and insulation 120min, is warming up to 1250 ℃ of crystallization again.
5, the goods after micritization is handled had both got finished product through annealing rationally.Parameter and annealing is: cooling rate is 25 ℃/min, is cooled to 650 ℃, and insulation 180min, cools to room temperature again with the furnace.
Embodiment two
1, at first ceramic polished waste material, admixtion are dried 8h with 60 ℃ respectively.Levigate respectively to 250 orders, grind 3h more altogether, make devitrified glass basis powder.
2, with the heat-up rate of devitrified glass basis powder with 8 ℃/min, be warming up to 1500 ℃, insulation 3h pours shrend in the tank at once into.Again the powder after the shrend is dried 8h, and levigate to 250 orders, make the devitrified glass powder.
3, the powder after the polished tile granulation and the layering of devitrified glass powder are packed into metal die, compression moulding.Forming pressure is 30MPa.Again biscuit is dried 10h with 60 ℃.
4, with the base substrate for preparing with 60 ℃ of oven dry 6h after, change High Temperature Furnaces Heating Apparatus over to and burn till.The firing process parameter is: heat-up rate is the speed of 15 ℃/min, is warming up to 950 ℃ of coring, and insulation 120min, is warming up to 1250 ℃ of crystallization again.
5, the goods after micritization is handled had both got finished product through annealing rationally.Parameter and annealing is: cooling rate is 25 ℃/min, is cooled to 650 ℃, and insulation 180min, cools to room temperature again with the furnace.
Embodiment three
1, at first ceramic polished waste material, admixtion are dried 8h with 60 ℃ respectively.Levigate respectively to 250 orders, grind 3h more altogether, make devitrified glass basis powder.
2, with the heat-up rate of devitrified glass basis powder with 8 ℃/min, be warming up to 1450 ℃, insulation 3h pours shrend in the tank at once into.Again the powder after the shrend is dried 8h, and levigate to 250 orders, make the devitrified glass powder.
3, the powder after the polished tile granulation and the layering of devitrified glass powder are packed into metal die, compression moulding.Forming pressure is 30MPa.Again biscuit is dried 10h with 60 ℃.
4, with the base substrate for preparing with 60 ℃ of oven dry 6h after, change High Temperature Furnaces Heating Apparatus over to and burn till.The firing process parameter is: heat-up rate is the speed of 15 ℃/min, is warming up to 950 ℃ of coring, and insulation 120min, is warming up to 1250 ℃ of crystallization again.
5, the goods after micritization is handled had both got finished product through annealing rationally.Parameter and annealing is: cooling rate is 25 ℃/min, is cooled to 650 ℃, and insulation 180min, cools to room temperature again with the furnace.
Embodiment four
1, at first ceramic polished waste material, admixtion are dried 8h with 60 ℃ respectively.Levigate respectively to 250 orders, grind 3h more altogether, make devitrified glass basis powder.
2, with the heat-up rate of devitrified glass basis powder with 8 ℃/min, be warming up to 1500 ℃, insulation 3h pours shrend in the tank at once into.Again the powder after the shrend is dried 8h, and levigate to 250 orders, make the devitrified glass powder.
3, the powder after the polished tile granulation and the layering of devitrified glass powder are packed into metal die, compression moulding.Forming pressure is 15MPa.Again biscuit is dried 10h with 60 ℃.
4, with the base substrate for preparing with 60 ℃ of oven dry 6h after, change High Temperature Furnaces Heating Apparatus over to and burn till.The firing process parameter is: heat-up rate is the speed of 15 ℃/min, is warming up to 950 ℃ of coring, and insulation 120min, is warming up to 1250 ℃ of crystallization again.
5, the goods after micritization is handled had both got finished product through annealing rationally.Parameter and annealing is: cooling rate is 25 ℃/min, is cooled to 650 ℃, and insulation 180min, cools to room temperature again with the furnace.
Embodiment five
1, at first ceramic polished waste material, admixtion are dried 8h with 60 ℃ respectively.Levigate respectively to 250 orders, grind 3h more altogether, make devitrified glass basis powder.
2, with the heat-up rate of devitrified glass basis powder with 8 ℃/min, be warming up to 1550 ℃, insulation 3h pours shrend in the tank at once into.Again the powder after the shrend is dried 8h, and levigate to 250 orders, make the devitrified glass powder.
3, the powder after the polished tile granulation and the layering of devitrified glass powder are packed into metal die, compression moulding.Forming pressure is 15MPa.Again biscuit is dried 10h with 60 ℃.
4, with the base substrate for preparing with 60 ℃ of oven dry 6h after, change High Temperature Furnaces Heating Apparatus over to and burn till.The firing process parameter is: heat-up rate is the speed of 15 ℃/min, is warming up to 950 ℃ of coring, and insulation 120min, is warming up to 1200 ℃ of crystallization again.
5, the goods after micritization is handled had both got finished product through annealing rationally.Parameter and annealing is: cooling rate is 25 ℃/min, is cooled to 650 ℃, and insulation 180min, cools to room temperature again with the furnace.
Embodiment six
1, at first ceramic polished waste material, admixtion are dried 8h with 60 ℃ respectively.Levigate respectively to 250 orders, grind 3h more altogether, make devitrified glass basis powder.
2, with the heat-up rate of devitrified glass basis powder with 8 ℃/min, be warming up to 1550 ℃, insulation 3h pours shrend in the tank at once into.Again the powder after the shrend is dried 8h, and levigate to 250 orders, make the devitrified glass powder.
3, the powder after the polished tile granulation and the layering of devitrified glass powder are packed into metal die, compression moulding.Forming pressure is 20MPa.Again biscuit is dried 10h with 60 ℃.
4, with the base substrate for preparing with 60 ℃ of oven dry 6h after, change High Temperature Furnaces Heating Apparatus over to and burn till.The firing process parameter is: heat-up rate is the speed of 15 ℃/min, is warming up to 900 ℃ of coring, and insulation 120min, is warming up to 1200 ℃ of crystallization again.
5, the goods after micritization is handled had both got finished product through annealing rationally.Parameter and annealing is: cooling rate is 25 ℃/min, is cooled to 650 ℃, and insulation 180min, cools to room temperature again with the furnace.
Embodiment seven
1, at first ceramic polished waste material, admixtion are dried 8h with 60 ℃ respectively.Levigate respectively to 250 orders, grind 3h more altogether, make devitrified glass basis powder.
2, with the heat-up rate of devitrified glass basis powder with 8 ℃/min, be warming up to 1550 ℃, insulation 3h pours shrend in the tank at once into.Again the powder after the shrend is dried 8h, and levigate to 250 orders, make the devitrified glass powder.
3, the powder after the polished tile granulation and the layering of devitrified glass powder are packed into metal die, compression moulding.Forming pressure is 15MPa.Again biscuit is dried 10h with 60 ℃.
4, with the base substrate for preparing with 60 ℃ of oven dry 6h after, change High Temperature Furnaces Heating Apparatus over to and burn till.The firing process parameter is: heat-up rate is the speed of 15 ℃/min, is warming up to 890 ℃ of coring, and insulation 90min, is warming up to 1200 ℃ of crystallization again.
5, the goods after micritization is handled had both got finished product through annealing rationally.Parameter and annealing is: cooling rate is 25 ℃/min, is cooled to 650 ℃, and insulation 180min, cools to room temperature again with the furnace.
Embodiment eight
1, at first ceramic polished waste material, admixtion are dried 8h with 60 ℃ respectively.Levigate respectively to 250 orders, grind 3h more altogether, make devitrified glass basis powder.
2, with the heat-up rate of devitrified glass basis powder with 8 ℃/min, be warming up to 1500 ℃, insulation 3h pours shrend in the tank at once into.Again the powder after the shrend is dried 8h, and levigate to 250 orders, make the devitrified glass powder.
3, the powder after the polished tile granulation and the layering of devitrified glass powder are packed into metal die, compression moulding.Forming pressure is 25MPa.Again biscuit is dried 10h with 60 ℃.
4, with the base substrate for preparing with 60 ℃ of oven dry 6h after, change High Temperature Furnaces Heating Apparatus over to and burn till.The firing process parameter is: heat-up rate is the speed of 15 ℃/min, is warming up to 950 ℃ of coring, and insulation 90min, is warming up to 1150 ℃ of crystallization again.
5, the goods after micritization is handled had both got finished product through annealing rationally.Parameter and annealing is: cooling rate is 25 ℃/min, is cooled to 650 ℃, and insulation 180min, cools to room temperature again with the furnace.
Performance index are as follows:
Conclusion as a result:
The raw material that the present invention adopts is ceramic polished waste material, be convenient to gather materials on the spot, transportation and acquisition cost had both been reduced, utilize polished waste material of this ceramics factory and the microcrystal glass-ceramic compounded decorative plate material that ceramics powder is produced simultaneously, can be good at improving the affinity of devitrified glass aspect and ceramic plate, thereby improve yield rate greatly, reduced production cost, improved the competitiveness of product in market.
In addition, the present invention is except that the fusing kiln, and other equipment all can use ceramics factory's existing installation to finish, thereby greatly reduce the equipment purchasing funds that investment is founded the factory, and is suitable for ceramic enterprise expansion product category, the management philosophy of exploitation high-end product.
Claims (10)
1. one kind prepares the method for microcrystal glass-ceramic compounded decorative plate material with ceramic polished waste material, it is characterized in that: be basic material with ceramic polished waste material at first, and add suitable admixtion, preparation devitrified glass basis powder; Again to devitrified glass basis powder burn till, shrend makes microcrystalline glass powder; Again that microcrystalline glass powder and ceramics powder is molded altogether, micritization is handled and is made the microcrystal glass-ceramic compounded decorative plate material.
2. the ceramic polished waste material of a kind of usefulness as claimed in claim 1 prepares the method for microcrystal glass-ceramic compounded decorative plate material, and this method realizes by following processing step:
(1) at first ceramic polished waste material 50%-70%, the siliceous 20%-40% of admixtion and calcareous 5%-15% are dried 8～10h with 60 ℃ respectively, levigate respectively to 180～250 orders, grind 1～3h more altogether, make devitrified glass basis powder;
(2) with the heat-up rate of devitrified glass basis powder with 8～20 ℃/min, be warming up to 1450～1550 ℃, insulation 1～3h pours shrend in the tank at once into, again with the oven dry of the powder after the shrend 8～10h, and levigate to 180～250 orders, make the devitrified glass powder;
(3) powder after the polished tile granulation and the layering of devitrified glass powder are packed into metal die, compression moulding, forming pressure is 15～30MPa, again with biscuit with 60 ℃ of oven dry 8～10h;
(4) with the base substrate for preparing with 60 ℃ of oven dry 6h after, change High Temperature Furnaces Heating Apparatus over to and burn till, the firing process parameter is: heat-up rate is the speed of 5～15 ℃/min, is warming up to 800～950 ℃ of coring, and is incubated 60～120min, is warming up to 1050～1250 ℃ of crystallization again;
(5) goods after micritization is handled had both got finished product through annealing rationally, and parameter and annealing is: cooling rate is 15～25 ℃/min, is cooled to 550～650 ℃, and is incubated 60～180min, cools to room temperature again with the furnace.
3. the ceramic polished waste material of a kind of usefulness as claimed in claim 2 prepares the method for microcrystal glass-ceramic compounded decorative plate material, in its described basic powder oxide content by weight % be: silica content is 45%～65%, sodium oxide content is 5%～15%, calcium oxide content is 5%～15%, content of magnesia is 1%～10%, and all the other are impurity.
4. the ceramic polished waste material of a kind of usefulness as claimed in claim 2 prepares the method for microcrystal glass-ceramic compounded decorative plate material, and step and processing condition that it is concrete are:
(1) at first ceramic polished waste material, admixtion are dried 8h with 60 ℃ respectively, levigate respectively to 250 orders, grind 3h more altogether, make devitrified glass basis powder;
(2) with the heat-up rate of devitrified glass basis powder with 8 ℃/min, be warming up to 1550 ℃, insulation 3h pours shrend in the tank at once into, again with the oven dry of the powder after shrend 8h, and levigate to 250 orders, make the devitrified glass powder;
(3) powder after the polished tile granulation and the layering of devitrified glass powder are packed into metal die, compression moulding, forming pressure is 30MPa, again with biscuit with 60 ℃ of oven dry 10h;
(4) with the base substrate for preparing with 60 ℃ of oven dry 6h after, change High Temperature Furnaces Heating Apparatus over to and burn till, the firing process parameter is: heat-up rate is the speed of 15 ℃/min, is warming up to 950 ℃ of coring, and insulation 120min, is warming up to 1250 ℃ of crystallization again;
(5) goods after micritization is handled had both got finished product through annealing rationally; Parameter and annealing is: cooling rate is 25 ℃/min, is cooled to 650 ℃, and insulation 180min, cools to room temperature again with the furnace.
5. the ceramic polished waste material of a kind of usefulness as claimed in claim 2 prepares the method for microcrystal glass-ceramic compounded decorative plate material, and step and processing condition that it is concrete are:
(1) at first ceramic polished waste material, admixtion are dried 8h with 60 ℃ respectively, levigate respectively to 250 orders, grind 3h more altogether, make devitrified glass basis powder;
(2) with the heat-up rate of devitrified glass basis powder with 8 ℃/min, be warming up to 1500 ℃, insulation 3h pours shrend in the tank at once into.Again the powder after the shrend is dried 8h, and levigate to 250 orders, make the devitrified glass powder;
(3) powder after the polished tile granulation and the layering of devitrified glass powder are packed into metal die, compression moulding, forming pressure is 30MPa, again with biscuit with 60 ℃ of oven dry 10h;
(4) with the base substrate for preparing with 60 ℃ of oven dry 6h after, change High Temperature Furnaces Heating Apparatus over to and burn till, the firing process parameter is: heat-up rate is the speed of 15 ℃/min, is warming up to 950 ℃ of coring, and insulation 120min, is warming up to 1250 ℃ of crystallization again;
(5) goods after micritization is handled had both got finished product through annealing rationally, and parameter and annealing is: cooling rate is 25 ℃/min, is cooled to 650 ℃, and insulation 180min, cooled to room temperature again with the furnace.
6. the ceramic polished waste material of a kind of usefulness as claimed in claim 2 prepares the method for microcrystal glass-ceramic compounded decorative plate material, and step and processing condition that it is concrete are:
(1) at first ceramic polished waste material, admixtion are dried 8h with 60 ℃ respectively, levigate respectively to 250 orders, grind 3h more altogether, make devitrified glass basis powder;
(2) with the heat-up rate of devitrified glass basis powder with 8 ℃/min, be warming up to 1450 ℃, insulation 3h pours shrend in the tank at once into, again with the oven dry of the powder after shrend 8h, and levigate to 250 orders, make the devitrified glass powder;
(3) powder after the polished tile granulation and the layering of devitrified glass powder are packed into metal die, compression moulding, forming pressure is 30MPa, again with biscuit with 60 ℃ of oven dry 10h;
(4) with the base substrate for preparing with 60 ℃ of oven dry 6h after, change High Temperature Furnaces Heating Apparatus over to and burn till, the firing process parameter is: heat-up rate is the speed of 15 ℃/min, is warming up to 950 ℃ of coring, and insulation 120min, is warming up to 1250 ℃ of crystallization again;
(5) goods after micritization is handled had both got finished product through annealing rationally, and parameter and annealing is: cooling rate is 25 ℃/min, is cooled to 650 ℃, and insulation 180min, cooled to room temperature again with the furnace.
7. the ceramic polished waste material of a kind of usefulness as claimed in claim 2 prepares the method for microcrystal glass-ceramic compounded decorative plate material, and step and processing condition that it is concrete are:
(1) at first ceramic polished waste material, admixtion are dried 8h with 60 ℃ respectively, levigate respectively to 250 orders, grind 3h more altogether, make devitrified glass basis powder;
(2) with the heat-up rate of devitrified glass basis powder with 8 ℃/min, be warming up to 1500 ℃, insulation 3h pours shrend in the tank at once into, again with the oven dry of the powder after shrend 8h, and levigate to 250 orders, make the devitrified glass powder;
(3) powder after the polished tile granulation and the layering of devitrified glass powder are packed into metal die, compression moulding, forming pressure is 15MPa, again with biscuit with 60 ℃ of oven dry 10h;
(4) with the base substrate for preparing with 60 ℃ of oven dry 6h after, change High Temperature Furnaces Heating Apparatus over to and burn till, the firing process parameter is: heat-up rate is the speed of 15 ℃/min, is warming up to 950 ℃ of coring, and insulation 120min, is warming up to 1250 ℃ of crystallization again;
(5) goods after micritization is handled had both got finished product through annealing rationally, and parameter and annealing is: cooling rate is 25 ℃/min, is cooled to 650 ℃, and insulation 180min, cooled to room temperature again with the furnace.
8. the ceramic polished waste material of a kind of usefulness as claimed in claim 2 prepares the method for microcrystal glass-ceramic compounded decorative plate material, and step and processing condition that it is concrete are:
(1) at first ceramic polished waste material, admixtion are dried 8h with 60 ℃ respectively, levigate respectively to 250 orders, grind 3h more altogether, make devitrified glass basis powder;
(2) with the heat-up rate of devitrified glass basis powder with 8 ℃/min, be warming up to 1550 ℃, insulation 3h pours shrend in the tank at once into, again with the oven dry of the powder after shrend 8h, and levigate to 250 orders, make the devitrified glass powder;
(3) powder after the polished tile granulation and the layering of devitrified glass powder are packed into metal die, compression moulding, forming pressure is 15MPa, again with biscuit with 60 ℃ of oven dry 10h;
(4) with the base substrate for preparing with 60 ℃ of oven dry 6h after, change High Temperature Furnaces Heating Apparatus over to and burn till, the firing process parameter is: heat-up rate is the speed of 15 ℃/min, is warming up to 950 ℃ of coring, and insulation 120min, is warming up to 1200 ℃ of crystallization again;
(5) goods after micritization is handled had both got finished product through annealing rationally, and parameter and annealing is: cooling rate is 25 ℃/min, is cooled to 650 ℃, and insulation 180min, cooled to room temperature again with the furnace.
9. the ceramic polished waste material of a kind of usefulness as claimed in claim 2 prepares the method for microcrystal glass-ceramic compounded decorative plate material, and step and processing condition that it is concrete are:
(1) at first ceramic polished waste material, admixtion are dried 8h with 60 ℃ respectively, levigate respectively to 250 orders, grind 3h more altogether, make devitrified glass basis powder;
(2) with the heat-up rate of devitrified glass basis powder with 8 ℃/min, be warming up to 1550 ℃, insulation 3h pours shrend in the tank at once into, again with the oven dry of the powder after shrend 8h, and levigate to 250 orders, make the devitrified glass powder;
(3) powder after the polished tile granulation and the layering of devitrified glass powder are packed into metal die, compression moulding, forming pressure is 20MPa, again with biscuit with 60 ℃ of oven dry 10h;
(4) with the base substrate for preparing with 60 ℃ of oven dry 6h after, change High Temperature Furnaces Heating Apparatus over to and burn till, the firing process parameter is: heat-up rate is the speed of 15 ℃/min, is warming up to 900 ℃ of coring, and insulation 120min, is warming up to 1200 ℃ of crystallization again;
(5) goods after micritization is handled had both got finished product through annealing rationally, and parameter and annealing is: cooling rate is 25 ℃/min, is cooled to 650 ℃, and insulation 180min, cooled to room temperature again with the furnace.
10. the ceramic polished waste material of a kind of usefulness as claimed in claim 2 prepares the method for microcrystal glass-ceramic compounded decorative plate material, and step and processing condition that it is concrete are:
(1) at first ceramic polished waste material, admixtion are dried 8h with 60 ℃ respectively, levigate respectively to 250 orders, grind 3h more altogether, make devitrified glass basis powder;
(2) with the heat-up rate of devitrified glass basis powder, be warming up to 1550 ℃ with 8 ℃/min,
Insulation 3h pours shrend in the tank at once into, again with the oven dry of the powder after shrend 8h, and levigate to 250 orders, make the devitrified glass powder;
(3) powder after the polished tile granulation and the layering of devitrified glass powder are packed into metal die, compression moulding, forming pressure is 15MPa, again with biscuit with 60 ℃ of oven dry 10h;
(4) with the base substrate for preparing with 60 ℃ of oven dry 6h after, change High Temperature Furnaces Heating Apparatus over to and burn till, the firing process parameter is: heat-up rate is the speed of 15 ℃/min, is warming up to 890 ℃ of coring, and insulation 90min, is warming up to 1200 ℃ of crystallization again;
(5) goods after micritization is handled had both got finished product through annealing rationally, and parameter and annealing is: cooling rate is 25 ℃/min, is cooled to 650 ℃, and insulation 180min, cooled to room temperature again with the furnace.
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
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| CN107555799A (en) * | 2017-09-26 | 2018-01-09 | 东北大学 | A kind of method for preparing glass ceramics using discarded polishing powder from rare earth |
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| CN110655327A (en) * | 2019-11-04 | 2020-01-07 | 江西九岭新能源有限公司 | Preparation method of ceramic tile with microcrystalline stone plate and ceramic tile |
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