Photoglow boosting plasma Chemical heat-treatment stove
Technical field
The invention belongs to a kind of metal material surface ion chemical heat treatment device, more particularly it is a kind of ion chemical heat treatment device that has aura boosting function.
Background technology
Plasma Chemical heat-treatment comprises ionitriding, carburizing, carbonitriding, sulfurizing, metallic cementation, plasma activated chemical vapour deposition etc.It is that the workpiece that desire is handled is placed in the Vakuumkammer of plasma Chemical heat-treatment stove, and workpiece connects the negative pole of direct current glow discharge power supply, and body of heater connects positive pole.Under the DC electric field effect; Furnace gas generation photoglow; The surface of the positive ion bombardment negative electrode (workpiece) that generates is heated to needed thermo-chemical treatment temperature (generally between 400~600 ℃) with workpiece, and gas glow discharge has activated reactant gases simultaneously; At workpiece surface generation series of physical chemical reaction, reach the purpose that workpiece surface modification is handled.
In the starting stage of photoglow; Because the dirt that workpiece surface exists some not clean up inevitably, like cotton hair, greasy dirt, rust staining etc., it is very frequent that workpiece surface is beaten arc; Easy burn workpiece surface; The arc discharge of big electric current also damages the direct current glow discharge power supply easily, at this moment should take the way of low dc voltage, low vacuum chamber gas pressure intensity, the temperature of the workpiece that slowly raises.When workpiece be heated to about more than 350 ℃ after, beat the arc phenomenon and fade away, at this moment can raise volts DS and furnace gas pressure are heated rapidly to the needed temperature of plasma Chemical heat-treatment with workpiece.Sputter clearance time before the plasma Chemical heat-treatment depends on the degree of cleaning of the preceding workpiece surface of shove charge and the batch of workpiece, was generally several hours more than, and be the important factor that influences the plasma Chemical heat-treatment cycle.
In order to reduce workpiece sputter clearance time; Before strengthening shove charge the cleaning of workpiece surface; The plasma Chemical heat-treatment stove that has has been installed the resistance assisted heating device, like outer auxiliary heating type ion bombardment heat treatment furnace (Chinese patent 99217521.6) and interior auxiliary heating type ion nitriding furnace (http://www.whrcl.com).Before workpiece is connected direct supply generation photoglow; Utilization earlier is contained in the resistance assisted heating device that stove is outer or stove is interior workpiece is preheating to certain high temperature; Treat that the dirt baking of workpiece surface connects direct supply after clean again; At this moment workpiece surface just seldom can occur beating the arc phenomenon, has shortened the cycle of plasma Chemical heat-treatment greatly.
But the resistance boosting of plasma Chemical heat-treatment stove also has the some shortcomings part, low like the heating efficiency of outer auxiliary heating type plasma Chemical heat-treatment stove, furnace binding is complicated, difficult in maintenance; And interior auxiliary resistance heating unit will occupy effective working space bigger in the stove, and resistance heater needs the step-down transformer that power is bigger if directly adopt interchange three-phase 380V power supply dangerous when adopting the low-voltage and high-current power supply.Two kinds of resistance auxiliary heaters all will be equipped with special-purpose thermometric, temperature regulating device, have increased the cost of plasma Chemical heat-treatment stove greatly.
Summary of the invention
The objective of the invention is to provide a kind of direct current glow discharge power supply of ion chemical heat treatment appts that utilizes itself to carry out boosting, it can shorten the workpiece sputter clearance time of plasma Chemical heat-treatment starting stage effectively.
The objective of the invention is to realize like this: a steel thin-wall cylinder, the upper end closed of cylinder are placed in the position near the furnace wall in the Vakuumkammer of plasma Chemical heat-treatment stove.The workpiece that desire is handled is placed on the cylinder intermediary worktable; Mutually insulated between the body of heater of cylinder, worktable, plasma Chemical heat-treatment stove; The negative pole of the direct supply of the ion chemical heat treatment appts needs according to treatment process itself are connected on cylinder or the worktable; The positive pole of direct supply is connected on the body of heater shell, and ground protection.In the starting stage of plasma Chemical heat-treatment, the negative pole with direct supply is connected on the cylinder earlier, and cylinder begins photoglow and is heated.Under the thermal radiation effect of cylinder; Workpiece is heated to certain high temperature; Treat that the dirt baking of workpiece surface is connected to the negative pole of direct supply on the workpiece after clean again; Workpiece begins the photoglow heating, after workpiece is heated to the needed temperature of plasma Chemical heat-treatment, begins to carry out plasma Chemical heat-treatment.
In order to reduce the thermosteresis of aura boosting cylinder, can a thermoscreen be installed between furnace wall and cylinder, on-insulated between thermoscreen and the body of heater, be all the anode of photoglow.
In the plasma Chemical heat-treatment process, also can cylinder and worktable all be joined with the negative pole of direct supply, utilize the boosting function of cylinder to improve the room temps in the cylinder, improve the temperature homogeneity of workpiece.At this moment the thermopair of measuring workpieces temperature can change the room temps of measuring in the cylinder in the plasma Chemical heat-treatment stove, and needn't measure the workpiece temperature that has the negative high voltage electricity.
The steel cylinder also can be processed into the tubular reticulated structure with XPM, can reduce the surface-area of cylinder like this, reduces the electric current of cylinder direct current glow discharge heating.In addition, because the tabular cylinder of ratio of specific heats of netted cylinder is little, so the heat-up rate of netted cylinder is faster than tabular cylinder, the better effects if of boosting.
The present invention has following advantage: 1. because cylinder always is and is placed in the plasma Chemical heat-treatment stove that the surface is " totally " all the time, so dozen arc phenomenon can not take place in each build-up of luminance discharge.2. owing to reduced the arc discharge of plasma Chemical heat-treatment starting stage, shorten the production cycle, also avoided direct supply to damage because of frequent overcurrent.3. cylinder photoglow heating power supply and workpiece photoglow power supply are same set of direct supply, only need can realize cylinder heating and workpiece heating respectively through transfer lever, so the equipment of this boosting mode is fairly simple.4. after workpiece is heated to the temperature that can not beat arc; The negative pole of direct supply is switched on the workpiece from cylinder; Workpiece begins the photoglow heating; At this moment uncharged cylinder can be formed the double thermal insulation screen by original thermoscreen in stove, further improved the temperature homogeneity of workpiece and energy-conservation effect.5. in the plasma Chemical heat-treatment process; Cylinder and workpiece also can be simultaneously join with the negative pole of direct supply; At this moment cylinder can play the effect of boosting, has improved the temperature homogeneity of workpiece in the stove, and has solved the difficult problem of workpiece temperature measurement in the plasma Chemical heat-treatment stove.
Description of drawings
Fig. 1 is a structural representation of the present invention.
Specify concrete device details and the working condition that proposes according to the present invention below in conjunction with accompanying drawing.
(2) are the body of heater of plasma Chemical heat-treatment stove among Fig. 1, and a steel cylinder (4) is housed in the stove, and thermoscreen (3) is housed between inboard wall of furnace body and the cylinder, and are on-insulated between body of heater and the thermoscreen.The workpiece (5) that desire is handled is placed on the worktable (6), and cylinder covers on it wherein.The negative pole of the direct current glow discharge power supply (1) of plasma Chemical heat-treatment stove can join with cylinder and worktable respectively through transfer lever (8), and the positive pole of direct supply is connected on the body of heater, and ground protection.After vacuum pump (11) was extracted the vacuum room air out, the required working gas of plasma Chemical heat-treatment was sent in the Vakuumkammer through airing system (7).Vacuum-control(led) system (10) can guarantee that plasma Chemical heat-treatment is in certain pressure, to carry out, and the temperature of workpiece then is to be measured and control by temperature controlling system (9).
Embodiment
Embodiment 1: the body of heater internal diameter size of plasma Chemical heat-treatment stove of the present invention is 650 * 1200 millimeters of φ; Place the cylinder that usefulness 1 mm thick steel plate rolls in the stove; Be of a size of 550 * 900 millimeters of φ; Put the workpiece of 200 kilograms desire ionitriding processing on the worktable, with the working gas of ammonia as ionitriding.In the starting stage that ionitriding is handled, the negative pole with direct supply is connected on the cylinder earlier, and cylinder begins the photoglow heating, and this moment, volts DS was 750V, and galvanic current is 20A, and furnace gas pressure is 200Pa.When treating that workpiece is heated to 400 ℃, the negative pole of direct supply is switched on the worktable, at this moment workpiece begins the photoglow heating, and this moment, workpiece surface seldom had the phenomenon of beating arc, can use heat-up rate heated parts faster.
Embodiment 2: on the basis of embodiment 1; After workpiece is heated to 400 ℃, cylinder and worktable are all joined with the negative pole of direct supply, at this moment cylinder and workpiece produce photoglow simultaneously and are heated; When treating that workpiece is heated to 520 ℃, begin to get into the holding stage of ionitriding.After 1 hour, the room temps in the cylinder is 510 ℃, and is near the actual temperature of workpiece, higher approximately 100 ℃ than the room temps that does not have the photoglow boosting in ionitriding under this temperature.