CN102002676A - Vacuum shock protection method for process of feeding gas into ion source cavity - Google Patents
Vacuum shock protection method for process of feeding gas into ion source cavity Download PDFInfo
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- CN102002676A CN102002676A CN2009100906636A CN200910090663A CN102002676A CN 102002676 A CN102002676 A CN 102002676A CN 2009100906636 A CN2009100906636 A CN 2009100906636A CN 200910090663 A CN200910090663 A CN 200910090663A CN 102002676 A CN102002676 A CN 102002676A
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- gas
- ion source
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- feeding
- opening
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Abstract
The invention discloses a vacuum shock protection method for an ion implantation apparatus, which is used for a process of feeding a process gas into an ion source vacuum cavity. The method uses an ion source vacuum height gauge, a gas-feeding pipeline pressure sensor, a gas-feeding isolation valve, branch isolation valves and a mass flowmeter and belongs to the field of manufacturing of semiconductor devices. The method comprises the following steps: selecting an SDS low-pressure gas bottle specified by the process, setting the mass flowmeter to zero, opening the branch isolation valve corresponding to the gas bottle, opening the gas-feeding isolation valve for a while, closing the gas-feeding isolation valve for a while, monitoring the ion source vacuum height gauge in the opening and closing processes to avoid vacuum breaking of the ion source, repeating the opening and closing processes in such a manner until the detection value from the pressure sensor is less than the set value while opening the gas-feeding isolation valve, and setting the mass flowmeter to the initial value set in the process, and thus preventing residual gas in the gas-feeding pipeline and gas leaking out of the mass flowmeter from causing shock breakage on the ion source vacuum.
Description
Technical field
The present invention relates to a kind of vacuum cavity protecting against shock method of supplying gas, the vacuum surge guard method when especially designing the ion source vacuum cavity and sending into process gas belongs to field of manufacturing semiconductor devices.
Background technology
Need send into process gas to the ion source cavity during ion implanter work, general technology gas is more than 3 kinds, process gas uses SDS low pressure gas cylinder or factory to unify the induction pipe air feed, process gas is by the gate control of branch road air delivery valve, the gas flow of specifically sending into is by the mass flowmeter control of correspondence, because mass flowmeter does not possess by ability, so the new gas cylinder branch road pressure of selecting may reach 20psi, when supplying gas segregaion valve, the unlatching ion source can produce very big impact to vacuum cavity, even may destroy the ion source high vacuum, influence vacuum pump, in ionogenic work-ing life, need the impact fracture of a kind of reliable method reduction to vacuum.
Summary of the invention
The present invention is directed to the situation of the remaining process gas of pipeline to high vacuum formation impact fracture, propose a kind of ballistic valve opening method that prevents, simple to operate, effect is remarkable.
The present invention realizes by following technological method: the vacuum surge guard method when the ion source vacuum cavity that a kind of ion implanter is used is sent into process gas, used function uniies such as the high rule of ion source vacuum, aspirating pipeline pressure transmitter, the segregaion valve of supplying gas, branch road segregaion valve, mass flowmeter, method is as follows:
(1) vacuum surge guard method begins.
(2) the SDS low pressure gas cylinder of the specified process gas correspondence of selection process menu, the mass flowmeter (hereinafter to be referred as MFG) that the gas cylinder correspondence is set is zero, opens the branch road segregaion valve of gas cylinder correspondence.
(3) opening ion source supplies gas segregaion valve (hereinafter to be referred as Vs) for some time
(4) if the detected value of aspirating pipeline pressure transmitter (hereinafter to be referred as Sp) continues then means of defence finishes less than set(ting)value (is requirement so that high vacuum is formed impact fracture)
(5) close Vs for some time, recover higher vacuum values up to ion source
(6) repeat repeatedly, meet the demands up to the Sp detected value
(7) MFG is set at the process menu designated value
(8) vacuum surge guard method finishes.
The present invention has following remarkable advantage:
1: method is simple, practical, do not need to increase new hardware, easy handling.
2: effect is remarkable, thoroughly stops impact phenomenon.
Description of drawings
Fig. 1: the ion source structural representation of supplying gas
Fig. 2: vacuum surge guard method flow diagram
Embodiment
Below in conjunction with accompanying drawing 2, beam transfer control method of the present invention is further described.
The described control flow of Fig. 2 is finished automatically by computer, and concrete steps are as follows:
(1) vacuum surge guard method begins.
(2) the SDS low pressure gas cylinder of the specified process gas correspondence of selection process menu, the mass rate that the gas cylinder correspondence is set counts zero, opens the branch road segregaion valve of gas cylinder correspondence.
(3) the monitoring high rule of ion source vacuum (hereinafter to be referred as Gs) if ion source vacuum (hereinafter to be referred as Ps) is higher than set(ting)value Pon, then enters (5) otherwise enter (4).
(4) monitoring time is more than or equal to the high vacuum time-out time, then enters (11) otherwise returns (3).
(5) open the ion source segregaion valve (hereinafter to be referred as Vs) of supplying gas.
(6) monitoring Gs if Ps is lower than set(ting)value Poff, then enters (9) otherwise enters (7).
(7) the continuous opening time of Vs is more than or equal to the valve opening time set(ting)value, then enters (8) otherwise returns (6).
(8) detect aspirating pipeline pressure transmitter Sp, enter (9) if the pressure transmitter detected value, then enters (12) less than set(ting)value Pgasin.
(9) close the ion source segregaion valve Vs that supplies gas, repeat counter C1 adds 1.
(10) repeat counter C1 is greater than the multiplicity set(ting)value, then enters (11) otherwise enters (3).
(11) start to report to the police: the ion source vacuum protection mistake of supplying gas enters (13).
(12) MFG being set is specified set(ting)value in the process menu.
(13) vacuum surge guard method finishes.
Wherein because when opening Vs, Gs reaction and acquisition time are longer, and step (6) is mainly used in and prevents unforeseen circumstances, real protection judges and finished by step (7), and the valve opening time setting of (7) very little is generally at Millisecond.
Pon refers to ion source vacuum set(ting)value, if the ion source vacuum is higher than this set(ting)value, when then open the segregaion valve of supplying gas begin to send into gas this moment there are not destructive influences in the ion source high vacuum.
Poff refers to ion source vacuum set(ting)value, if the ion source vacuum is lower than this set(ting)value, then must close the segregaion valve of supplying gas this moment, otherwise the influence that the ion source high vacuum can being damaged property.
Pgasin refers to the set(ting)value of aspirating pipeline pressure transmitter, cleans out if aspirating pipeline pressure, is then represented the residual gas in the pipeline less than this set(ting)value, can continue to open.
Specific embodiment of the present invention has been done detailed explanation to principle of work of the present invention, range of application.For persons skilled in the art,, can not exceed the protection domain of present specification description and claims standard not deviating from principle of work of the present invention and using any conspicuous change of under the prerequisite it being done.
Claims (1)
1. vacuum surge guard method when the ion source vacuum cavity is sent into process gas that ion implanter is used, used function uniies such as the high rule of ion source vacuum, aspirating pipeline pressure transmitter, the segregaion valve of supplying gas, branch road segregaion valve, mass flowmeter, method is as follows:
(1) vacuum surge guard method begins;
(2) the SDS low pressure gas cylinder of the specified process gas correspondence of selection process menu, the mass flowmeter (hereinafter to be referred as MFG) that the gas cylinder correspondence is set is zero, opens the branch road segregaion valve of gas cylinder correspondence;
(3) opening ion source supplies gas segregaion valve (hereinafter to be referred as Vs) for some time;
(4) if the detected value of aspirating pipeline pressure transmitter (hereinafter to be referred as Sp) continues then means of defence finishes less than set(ting)value (is requirement so that high vacuum is formed impact fracture);
(5) close Vs for some time, recover higher vacuum values up to ion source;
(6) repeat repeatedly, meet the demands up to the Sp detected value;
(7) MFG is set at the process menu designated value;
(8) vacuum surge guard method finishes.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009100906636A CN102002676A (en) | 2009-09-03 | 2009-09-03 | Vacuum shock protection method for process of feeding gas into ion source cavity |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009100906636A CN102002676A (en) | 2009-09-03 | 2009-09-03 | Vacuum shock protection method for process of feeding gas into ion source cavity |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102002676A true CN102002676A (en) | 2011-04-06 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2009100906636A Pending CN102002676A (en) | 2009-09-03 | 2009-09-03 | Vacuum shock protection method for process of feeding gas into ion source cavity |
Country Status (1)
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| CN (1) | CN102002676A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113056962A (en) * | 2018-11-27 | 2021-06-29 | 东京毅力科创株式会社 | Gas supply device and gas supply method |
-
2009
- 2009-09-03 CN CN2009100906636A patent/CN102002676A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113056962A (en) * | 2018-11-27 | 2021-06-29 | 东京毅力科创株式会社 | Gas supply device and gas supply method |
| CN113056962B (en) * | 2018-11-27 | 2024-03-08 | 东京毅力科创株式会社 | Gas supply device and gas supply method |
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| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20110406 |