CN101928923B - Vacuum sputtering coating equipment with vacuum pump protecting structure - Google Patents
Vacuum sputtering coating equipment with vacuum pump protecting structure Download PDFInfo
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- CN101928923B CN101928923B CN2010101687677A CN201010168767A CN101928923B CN 101928923 B CN101928923 B CN 101928923B CN 2010101687677 A CN2010101687677 A CN 2010101687677A CN 201010168767 A CN201010168767 A CN 201010168767A CN 101928923 B CN101928923 B CN 101928923B
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- vacuum pump
- vacuum
- pump
- outer cover
- coating equipment
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Abstract
The invention discloses vacuum sputtering coating equipment with a vacuum pump protecting structure, which relates to the technical field of sputtering coating equipment and comprises a molecular pump, a box body, a vacuum cavity body and a vacuum pump, wherein the box body is internally provided with the vacuum cavity body. The vacuum sputtering coating equipment is characterized by also comprising an outer cover and an inner cover of the vacuum pump. The molecular pump is arranged on the upper part of the box body; the outer cover of the vacuum pump is arranged in the position where the molecular pump is connected with the box body; the outer cover of the vacuum pump is internally provided with the inner cover of the vacuum pump; the vacuum pump is communicated with the vacuum cavity body; and the inner cover of the vacuum pump covers on a blade of the vacuum pump. The invention solves the problem that a neutral target atom (or molecule) is deposited on a substrate to form a film and is deposited on the blade of the vacuum pump connected with the vacuum cavity body at the same time during target sputtering in the prior art, and provides the vacuum pump protecting structure capable of preventing the neutral target atom (or molecule) from depositing on the blade of the vacuum pump during target sputtering to cause failure of the vacuum pump.
Description
Technical field
The present invention relates to the sputtering coating equipment technical field, particularly relate to a kind of vacuum sputtering coating equipment with vacuum pump protecting structure.
Background technology
In vacuum apparatus utilization, vacuum pump extracts the equipment of gas molecule as a kind of from Vakuumkammer, and numerous in variety, mounting means has nothing in common with each other, and reaches one of parts of vacuum as equipment, and the status of property of crucial importance is arranged.In the actual use of relevant device at present; The film forming while also can be deposited on the blade of the vacuum pump that is connected with vacuum cavity neutral target atom (or molecule) on the substrate being deposited on during target as sputter; Cause the inefficacy of vacuum pump; Have influence on the quality of product, and cause the damage of being associated property equipment.
Summary of the invention
In order to solve in the prior art; During target as sputter; Neutral target atom (or molecule) also can be deposited on the problem on the blade of the vacuum pump that is connected with vacuum cavity being deposited on film forming while on the substrate, and a kind of vacuum pump safeguard structure with better defencive function is provided.
In order to achieve the above object, the technical scheme that the present invention adopted is:
A kind of vacuum sputtering coating equipment with vacuum pump protecting structure comprises molecular pump, casing; Vacuum cavity, vacuum pump is provided with vacuum cavity in casing; It is characterized in that: also comprise vacuum pump outer cover and vacuum pump inner cover, said molecular pump is arranged on the top of casing, is provided with the vacuum pump outer cover in the position that molecular pump is connected with casing; Be provided with the vacuum pump inner cover in vacuum pump outer cover the inside, said vacuum pump connects with vacuum cavity and is connected, and the vacuum pump inner cover covers vacuum pump vanes.
Aforementioned a kind of vacuum sputtering coating equipment with vacuum pump protecting structure is characterized in that: the base height of said vacuum pump outer cover is higher than the base height of vacuum pump inner cover.
The invention has the beneficial effects as follows: the present invention is designed with two layers of protection structure of vacuum pump outer cover and vacuum pump inner cover at the connecting portion of molecular pump and casing; Vacuum pump outer cover and vacuum pump inner cover are provided with the side baffle plate, and gas is extracted out with the below in the middle of the side baffle plate, and the target atom (or molecule) that splashes from side is covered by the side baffle plate; Can not directly be deposited on the vacuum pump vanes; Can avoid the inefficacy of vacuum pump, the existence of equipment unsafe factor has been avoided in the normal operation of maintenance facilities.The base height of vacuum pump outer cover is higher than the base height of vacuum pump inner cover simultaneously, and the length of side baffle plate is different, can form the protection structure that is rich in level, better vacuum pump vanes is protected.
Description of drawings
Fig. 1 is a vacuum pump outer cover vertical view of the present invention;
Fig. 2 is a vacuum pump outer cover right view of the present invention;
Fig. 3 is a vacuum pump inner cover vertical view of the present invention;
Fig. 4 is a vacuum pump inner cover right view of the present invention;
Fig. 5 is a structural representation of the present invention.
Embodiment
Below in conjunction with accompanying drawing the present invention is done further description.
As shown in the figure, a kind of vacuum sputtering coating equipment with vacuum pump protecting structure comprises molecular pump 1; Casing 2, vacuum cavity 3, vacuum pump; Vacuum pump outer cover 5 and vacuum pump inner cover 6 are provided with vacuum cavity 3 in casing 2, said molecular pump 1 is arranged on the top of casing 2; Be fixedly connected with box cover 4 through rivet; Below box cover 4, be provided with vacuum pump outer cover 5, be provided with vacuum pump inner cover 6 in vacuum pump outer cover 5 the insides, the base height of vacuum pump outer cover 5 is higher than the base height of vacuum pump inner cover 6.Vacuum pump and vacuum cavity 3 connects and is connected, and vacuum pump inner cover 6 covers vacuum pump vanes.
Vacuum pump outer cover 5 all is provided with side baffle plate 7 with vacuum pump inner cover 6; Vacuum pump is extracted gas out in the middle of side baffle plate 7 with the below; Simultaneously vacuum pump inner cover 6 covers vacuum pump vanes, and target is when sputter, and neutral target atom (or molecule) is covered by side baffle plate 7; Can not directly be deposited on the vacuum pump vanes, avoid the vacuum pump inefficacy.
Show and described ultimate principle of the present invention and principal character and advantage of the present invention.The technician of the industry should understand; The present invention is not restricted to the described embodiments; That describes in the foregoing description and the specification sheets just explains principle of the present invention; Under the prerequisite that does not break away from spirit and scope of the invention, the present invention also has various changes and modifications, and these variations and improvement all fall in the scope of the invention that requires protection.The present invention requires protection domain to be defined by appending claims and equivalent thereof.
Claims (1)
1. the vacuum sputtering coating equipment with vacuum pump protecting structure comprises molecular pump, casing; Vacuum cavity, vacuum pump is provided with vacuum cavity in casing; Said molecular pump is arranged on the top of casing, it is characterized in that: also comprise vacuum pump outer cover and vacuum pump inner cover, be provided with the vacuum pump outer cover in the position that molecular pump is connected with casing; Be provided with the vacuum pump inner cover in vacuum pump outer cover the inside; Said vacuum pump and vacuum cavity connect and are connected, and the vacuum pump inner cover covers vacuum pump vanes, and the base height of said vacuum pump outer cover is higher than the base height of vacuum pump inner cover.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010101687677A CN101928923B (en) | 2010-05-11 | 2010-05-11 | Vacuum sputtering coating equipment with vacuum pump protecting structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010101687677A CN101928923B (en) | 2010-05-11 | 2010-05-11 | Vacuum sputtering coating equipment with vacuum pump protecting structure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101928923A CN101928923A (en) | 2010-12-29 |
| CN101928923B true CN101928923B (en) | 2012-06-27 |
Family
ID=43368345
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010101687677A Active CN101928923B (en) | 2010-05-11 | 2010-05-11 | Vacuum sputtering coating equipment with vacuum pump protecting structure |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101928923B (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1417479A (en) * | 2001-10-31 | 2003-05-14 | 瞿斌 | Special rotary-vane vacuum pump |
| CN1594650A (en) * | 2003-12-19 | 2005-03-16 | 储继国 | Vacuum deposition equipment |
| CN1624191A (en) * | 2004-09-22 | 2005-06-08 | 吉林大学 | Vacuum film plating machine having orientation and self-control function |
| CN1670241A (en) * | 2005-03-03 | 2005-09-21 | 西华大学 | Method and device for producing membrane on magnetic refrigeration material surface |
| CN201704399U (en) * | 2010-05-11 | 2011-01-12 | 赫得纳米科技(昆山)有限公司 | Vacuum sputtering and coating equipment with vacuum pump protection structure |
-
2010
- 2010-05-11 CN CN2010101687677A patent/CN101928923B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1417479A (en) * | 2001-10-31 | 2003-05-14 | 瞿斌 | Special rotary-vane vacuum pump |
| CN1594650A (en) * | 2003-12-19 | 2005-03-16 | 储继国 | Vacuum deposition equipment |
| CN1624191A (en) * | 2004-09-22 | 2005-06-08 | 吉林大学 | Vacuum film plating machine having orientation and self-control function |
| CN1670241A (en) * | 2005-03-03 | 2005-09-21 | 西华大学 | Method and device for producing membrane on magnetic refrigeration material surface |
| CN201704399U (en) * | 2010-05-11 | 2011-01-12 | 赫得纳米科技(昆山)有限公司 | Vacuum sputtering and coating equipment with vacuum pump protection structure |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101928923A (en) | 2010-12-29 |
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| C10 | Entry into substantive examination | ||
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |