CN101907829B - Positive heat-sensitive planographic plate and manufacturing method thereof - Google Patents
Positive heat-sensitive planographic plate and manufacturing method thereof Download PDFInfo
- Publication number
- CN101907829B CN101907829B CN2009100595285A CN200910059528A CN101907829B CN 101907829 B CN101907829 B CN 101907829B CN 2009100595285 A CN2009100595285 A CN 2009100595285A CN 200910059528 A CN200910059528 A CN 200910059528A CN 101907829 B CN101907829 B CN 101907829B
- Authority
- CN
- China
- Prior art keywords
- infrared
- positive thermal
- sensitive
- offset element
- imaging
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000003384 imaging method Methods 0.000 claims abstract description 52
- 229920000642 polymer Polymers 0.000 claims abstract description 38
- 238000000576 coating method Methods 0.000 claims abstract description 34
- 239000011248 coating agent Substances 0.000 claims abstract description 33
- 239000000126 substance Substances 0.000 claims abstract description 25
- AYCJDMKDOHPCJG-UHFFFAOYSA-N n-ethenylbenzenesulfonamide Chemical group C=CNS(=O)(=O)C1=CC=CC=C1 AYCJDMKDOHPCJG-UHFFFAOYSA-N 0.000 claims abstract description 23
- 238000000034 method Methods 0.000 claims description 51
- 239000000975 dye Substances 0.000 claims description 31
- -1 hydroxybenzene amine Chemical class 0.000 claims description 28
- 239000000470 constituent Substances 0.000 claims description 27
- 239000003513 alkali Substances 0.000 claims description 23
- 239000006096 absorbing agent Substances 0.000 claims description 22
- 235000013824 polyphenols Nutrition 0.000 claims description 22
- 239000000203 mixture Substances 0.000 claims description 21
- 239000000178 monomer Substances 0.000 claims description 19
- 230000008569 process Effects 0.000 claims description 19
- 229910052782 aluminium Inorganic materials 0.000 claims description 17
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 17
- FDDDEECHVMSUSB-UHFFFAOYSA-N sulfanilamide Chemical group NC1=CC=C(S(N)(=O)=O)C=C1 FDDDEECHVMSUSB-UHFFFAOYSA-N 0.000 claims description 16
- 229940124530 sulfonamide Drugs 0.000 claims description 15
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 claims description 12
- 239000002585 base Substances 0.000 claims description 12
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Natural products OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 10
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 10
- 239000000758 substrate Substances 0.000 claims description 8
- 150000002894 organic compounds Chemical class 0.000 claims description 7
- ABDMRYUHBFSJKH-UHFFFAOYSA-N 4-aminobenzenesulfonamide styrene Chemical compound S(=O)(C1=CC=C(C=C1)N)(=O)N.C=CC1=CC=CC=C1 ABDMRYUHBFSJKH-UHFFFAOYSA-N 0.000 claims description 6
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 claims description 6
- 125000003368 amide group Chemical group 0.000 claims description 6
- 229960003742 phenol Drugs 0.000 claims description 6
- JEVGKYBUANQAKG-UHFFFAOYSA-N victoria blue R Chemical compound [Cl-].C12=CC=CC=C2C(=[NH+]CC)C=CC1=C(C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 JEVGKYBUANQAKG-UHFFFAOYSA-N 0.000 claims description 6
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 claims description 5
- 239000003086 colorant Substances 0.000 claims description 5
- 239000007787 solid Substances 0.000 claims description 5
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 claims description 4
- JHXGTIXTWZPIKQ-UHFFFAOYSA-N (sulfamoylamino)ethene Chemical compound NS(=O)(=O)NC=C JHXGTIXTWZPIKQ-UHFFFAOYSA-N 0.000 claims description 3
- VMSBGXAJJLPWKV-UHFFFAOYSA-N 2-ethenylbenzenesulfonic acid Chemical class OS(=O)(=O)C1=CC=CC=C1C=C VMSBGXAJJLPWKV-UHFFFAOYSA-N 0.000 claims description 3
- XNFNIVJDVQGJHL-UHFFFAOYSA-N 2-ethenylbenzenesulfonic acid hydrochloride Chemical compound Cl.OS(=O)(=O)c1ccccc1C=C XNFNIVJDVQGJHL-UHFFFAOYSA-N 0.000 claims description 3
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 claims description 3
- 238000010521 absorption reaction Methods 0.000 claims description 3
- 235000011114 ammonium hydroxide Nutrition 0.000 claims description 3
- 230000004888 barrier function Effects 0.000 claims description 3
- 239000013078 crystal Substances 0.000 claims description 3
- JVICFMRAVNKDOE-UHFFFAOYSA-M ethyl violet Chemical compound [Cl-].C1=CC(N(CC)CC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 JVICFMRAVNKDOE-UHFFFAOYSA-M 0.000 claims description 3
- FDZZZRQASAIRJF-UHFFFAOYSA-M malachite green Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](C)C)C=C1 FDZZZRQASAIRJF-UHFFFAOYSA-M 0.000 claims description 3
- 229940107698 malachite green Drugs 0.000 claims description 3
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 claims description 3
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 claims description 3
- 238000010526 radical polymerization reaction Methods 0.000 claims description 3
- LLWJPGAKXJBKKA-UHFFFAOYSA-N victoria blue B Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)N(C)C)=C(C=C1)C2=CC=CC=C2C1=[NH+]C1=CC=CC=C1 LLWJPGAKXJBKKA-UHFFFAOYSA-N 0.000 claims description 3
- 239000001000 anthraquinone dye Substances 0.000 claims 2
- ZXJXZNDDNMQXFV-UHFFFAOYSA-M crystal violet Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1[C+](C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 ZXJXZNDDNMQXFV-UHFFFAOYSA-M 0.000 claims 2
- 239000006185 dispersion Substances 0.000 claims 2
- 239000001008 quinone-imine dye Substances 0.000 claims 2
- 230000003647 oxidation Effects 0.000 claims 1
- 238000007254 oxidation reaction Methods 0.000 claims 1
- 239000010410 layer Substances 0.000 abstract description 38
- 238000011161 development Methods 0.000 abstract description 13
- 229920002521 macromolecule Polymers 0.000 abstract description 2
- 239000002356 single layer Substances 0.000 abstract 2
- 239000010408 film Substances 0.000 description 26
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 23
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 18
- 238000002360 preparation method Methods 0.000 description 17
- 238000007639 printing Methods 0.000 description 17
- 239000000243 solution Substances 0.000 description 17
- HEMHJVSKTPXQMS-UHFFFAOYSA-M sodium hydroxide Inorganic materials [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 16
- 239000004094 surface-active agent Substances 0.000 description 16
- 239000000047 product Substances 0.000 description 15
- 229920005989 resin Polymers 0.000 description 15
- 239000011347 resin Substances 0.000 description 15
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 12
- 239000004411 aluminium Substances 0.000 description 12
- 239000003795 chemical substances by application Substances 0.000 description 12
- 239000000463 material Substances 0.000 description 12
- 206010070834 Sensitisation Diseases 0.000 description 10
- 230000008313 sensitization Effects 0.000 description 10
- 238000003756 stirring Methods 0.000 description 10
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
- 239000003921 oil Substances 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 8
- 238000012545 processing Methods 0.000 description 8
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 7
- 239000002253 acid Substances 0.000 description 7
- 230000007797 corrosion Effects 0.000 description 7
- 238000005260 corrosion Methods 0.000 description 7
- 239000000976 ink Substances 0.000 description 7
- ORFSSYGWXNGVFB-UHFFFAOYSA-N sodium 4-amino-6-[[4-[4-[(8-amino-1-hydroxy-5,7-disulfonaphthalen-2-yl)diazenyl]-3-methoxyphenyl]-2-methoxyphenyl]diazenyl]-5-hydroxynaphthalene-1,3-disulfonic acid Chemical compound COC1=C(C=CC(=C1)C2=CC(=C(C=C2)N=NC3=C(C4=C(C=C3)C(=CC(=C4N)S(=O)(=O)O)S(=O)(=O)O)O)OC)N=NC5=C(C6=C(C=C5)C(=CC(=C6N)S(=O)(=O)O)S(=O)(=O)O)O.[Na+] ORFSSYGWXNGVFB-UHFFFAOYSA-N 0.000 description 7
- 238000011282 treatment Methods 0.000 description 7
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 6
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 6
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 238000010276 construction Methods 0.000 description 6
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 239000012530 fluid Substances 0.000 description 6
- 239000011737 fluorine Substances 0.000 description 6
- 229910052731 fluorine Inorganic materials 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid group Chemical group S(O)(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- 101100108891 Arabidopsis thaliana PRMT11 gene Proteins 0.000 description 5
- 101100484946 Petunia hybrida VPY gene Proteins 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 230000008859 change Effects 0.000 description 5
- 239000002131 composite material Substances 0.000 description 5
- 150000002148 esters Chemical class 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 239000012528 membrane Substances 0.000 description 5
- 101150091418 pam1 gene Proteins 0.000 description 5
- 238000006116 polymerization reaction Methods 0.000 description 5
- 238000010992 reflux Methods 0.000 description 5
- 238000007788 roughening Methods 0.000 description 5
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical compound SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 description 5
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 4
- 108700038250 PAM2-CSK4 Proteins 0.000 description 4
- 101100206155 Schizosaccharomyces pombe (strain 972 / ATCC 24843) tbp1 gene Proteins 0.000 description 4
- REDXJYDRNCIFBQ-UHFFFAOYSA-N aluminium(3+) Chemical compound [Al+3] REDXJYDRNCIFBQ-UHFFFAOYSA-N 0.000 description 4
- 239000005667 attractant Substances 0.000 description 4
- 230000003196 chaotropic effect Effects 0.000 description 4
- 230000031902 chemoattractant activity Effects 0.000 description 4
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 239000005457 ice water Substances 0.000 description 4
- 239000005011 phenolic resin Substances 0.000 description 4
- 238000005498 polishing Methods 0.000 description 4
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 4
- 239000008247 solid mixture Substances 0.000 description 4
- 239000007921 spray Substances 0.000 description 4
- 238000010189 synthetic method Methods 0.000 description 4
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 4
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 239000004115 Sodium Silicate Substances 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 239000003518 caustics Substances 0.000 description 3
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 3
- 239000003792 electrolyte Substances 0.000 description 3
- JOXWSDNHLSQKCC-UHFFFAOYSA-N ethenesulfonamide Chemical compound NS(=O)(=O)C=C JOXWSDNHLSQKCC-UHFFFAOYSA-N 0.000 description 3
- 239000003292 glue Substances 0.000 description 3
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical class O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 3
- 239000011259 mixed solution Substances 0.000 description 3
- VIKNJXKGJWUCNN-XGXHKTLJSA-N norethisterone Chemical compound O=C1CC[C@@H]2[C@H]3CC[C@](C)([C@](CC4)(O)C#C)[C@@H]4[C@@H]3CCC2=C1 VIKNJXKGJWUCNN-XGXHKTLJSA-N 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 229910052911 sodium silicate Inorganic materials 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- 230000000007 visual effect Effects 0.000 description 3
- VBICKXHEKHSIBG-UHFFFAOYSA-N 1-monostearoylglycerol Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCC(O)CO VBICKXHEKHSIBG-UHFFFAOYSA-N 0.000 description 2
- JLZIIHMTTRXXIN-UHFFFAOYSA-N 2-(2-hydroxy-4-methoxybenzoyl)benzoic acid Chemical compound OC1=CC(OC)=CC=C1C(=O)C1=CC=CC=C1C(O)=O JLZIIHMTTRXXIN-UHFFFAOYSA-N 0.000 description 2
- SGZOTQPYJLDQRT-UHFFFAOYSA-N 2-ethenylbenzenesulfonic acid;sodium Chemical compound [Na].OS(=O)(=O)C1=CC=CC=C1C=C SGZOTQPYJLDQRT-UHFFFAOYSA-N 0.000 description 2
- MLLLIDBFMWYDQL-UHFFFAOYSA-N 2-ethenylbenzenesulfonyl chloride Chemical compound ClS(=O)(=O)C1=CC=CC=C1C=C MLLLIDBFMWYDQL-UHFFFAOYSA-N 0.000 description 2
- XLLXMBCBJGATSP-UHFFFAOYSA-N 2-phenylethenol Chemical class OC=CC1=CC=CC=C1 XLLXMBCBJGATSP-UHFFFAOYSA-N 0.000 description 2
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- 239000005696 Diammonium phosphate Substances 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- 239000005639 Lauric acid Substances 0.000 description 2
- ZVAVRBUTFWLEBK-UHFFFAOYSA-N NC1=CC(=C(C=C1)S)C1=CC=CC=C1 Chemical compound NC1=CC(=C(C=C1)S)C1=CC=CC=C1 ZVAVRBUTFWLEBK-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 2
- 150000003973 alkyl amines Chemical class 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 238000002048 anodisation reaction Methods 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 150000004982 aromatic amines Chemical class 0.000 description 2
- 239000000987 azo dye Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 238000005202 decontamination Methods 0.000 description 2
- 230000003588 decontaminative effect Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical compound [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 description 2
- 229910000388 diammonium phosphate Inorganic materials 0.000 description 2
- 235000019838 diammonium phosphate Nutrition 0.000 description 2
- 229940043279 diisopropylamine Drugs 0.000 description 2
- 238000005868 electrolysis reaction Methods 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 229920002313 fluoropolymer Polymers 0.000 description 2
- 239000004811 fluoropolymer Substances 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 150000007529 inorganic bases Chemical class 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- CXKWCBBOMKCUKX-UHFFFAOYSA-M methylene blue Chemical compound [Cl-].C1=CC(N(C)C)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 CXKWCBBOMKCUKX-UHFFFAOYSA-M 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- PCMORTLOPMLEFB-ONEGZZNKSA-N sinapic acid Chemical compound COC1=CC(\C=C\C(O)=O)=CC(OC)=C1O PCMORTLOPMLEFB-ONEGZZNKSA-N 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 235000019795 sodium metasilicate Nutrition 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 2
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 2
- KMOUUZVZFBCRAM-UHFFFAOYSA-N 1,2,3,6-tetrahydrophthalic anhydride Chemical compound C1C=CCC2C(=O)OC(=O)C21 KMOUUZVZFBCRAM-UHFFFAOYSA-N 0.000 description 1
- HMXQIFUGFZEJEO-UHFFFAOYSA-N 1,2-dihydropyrrol-3-one Chemical compound O=C1CNC=C1 HMXQIFUGFZEJEO-UHFFFAOYSA-N 0.000 description 1
- HXKKHQJGJAFBHI-UHFFFAOYSA-N 1-aminopropan-2-ol Chemical compound CC(O)CN HXKKHQJGJAFBHI-UHFFFAOYSA-N 0.000 description 1
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 description 1
- VVAKEQGKZNKUSU-UHFFFAOYSA-N 2,3-dimethylaniline Chemical compound CC1=CC=CC(N)=C1C VVAKEQGKZNKUSU-UHFFFAOYSA-N 0.000 description 1
- PIINGYXNCHTJTF-UHFFFAOYSA-N 2-(2-azaniumylethylamino)acetate Chemical class NCCNCC(O)=O PIINGYXNCHTJTF-UHFFFAOYSA-N 0.000 description 1
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 1
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 description 1
- DAUAQNGYDSHRET-UHFFFAOYSA-N 3,4-dimethoxybenzoic acid Chemical compound COC1=CC=C(C(O)=O)C=C1OC DAUAQNGYDSHRET-UHFFFAOYSA-N 0.000 description 1
- QZYCWJVSPFQUQC-UHFFFAOYSA-N 3-phenylfuran-2,5-dione Chemical compound O=C1OC(=O)C(C=2C=CC=CC=2)=C1 QZYCWJVSPFQUQC-UHFFFAOYSA-N 0.000 description 1
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 1
- NPFYZDNDJHZQKY-UHFFFAOYSA-N 4-Hydroxybenzophenone Chemical compound C1=CC(O)=CC=C1C(=O)C1=CC=CC=C1 NPFYZDNDJHZQKY-UHFFFAOYSA-N 0.000 description 1
- WFCQTAXSWSWIHS-UHFFFAOYSA-N 4-[bis(4-hydroxyphenyl)methyl]phenol Chemical compound C1=CC(O)=CC=C1C(C=1C=CC(O)=CC=1)C1=CC=C(O)C=C1 WFCQTAXSWSWIHS-UHFFFAOYSA-N 0.000 description 1
- VRRCYIFZBSJBAT-UHFFFAOYSA-N 4-methoxybutanoic acid Chemical class COCCCC(O)=O VRRCYIFZBSJBAT-UHFFFAOYSA-N 0.000 description 1
- BTJIUGUIPKRLHP-UHFFFAOYSA-N 4-nitrophenol Chemical compound OC1=CC=C([N+]([O-])=O)C=C1 BTJIUGUIPKRLHP-UHFFFAOYSA-N 0.000 description 1
- LPEKGGXMPWTOCB-UHFFFAOYSA-N 8beta-(2,3-epoxy-2-methylbutyryloxy)-14-acetoxytithifolin Natural products COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 1
- OZAIFHULBGXAKX-VAWYXSNFSA-N AIBN Substances N#CC(C)(C)\N=N\C(C)(C)C#N OZAIFHULBGXAKX-VAWYXSNFSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 description 1
- 229910000013 Ammonium bicarbonate Inorganic materials 0.000 description 1
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical compound C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- AISIBHCKGCJEOE-UHFFFAOYSA-N C=O.NC(=O)N.CC=1C(=C(C=CC1)O)C Chemical compound C=O.NC(=O)N.CC=1C(=C(C=CC1)O)C AISIBHCKGCJEOE-UHFFFAOYSA-N 0.000 description 1
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 1
- 208000000655 Distemper Diseases 0.000 description 1
- 206010016275 Fear Diseases 0.000 description 1
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 1
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- CKRZKMFTZCFYGB-UHFFFAOYSA-N N-phenylhydroxylamine Chemical class ONC1=CC=CC=C1 CKRZKMFTZCFYGB-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- BHHGXPLMPWCGHP-UHFFFAOYSA-N Phenethylamine Chemical compound NCCC1=CC=CC=C1 BHHGXPLMPWCGHP-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 229920001665 Poly-4-vinylphenol Polymers 0.000 description 1
- IYFATESGLOUGBX-YVNJGZBMSA-N Sorbitan monopalmitate Chemical compound CCCCCCCCCCCCCCCC(=O)OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O IYFATESGLOUGBX-YVNJGZBMSA-N 0.000 description 1
- 239000004147 Sorbitan trioleate Substances 0.000 description 1
- PRXRUNOAOLTIEF-ADSICKODSA-N Sorbitan trioleate Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)OC[C@@H](OC(=O)CCCCCCC\C=C/CCCCCCCC)[C@H]1OC[C@H](O)[C@H]1OC(=O)CCCCCCC\C=C/CCCCCCCC PRXRUNOAOLTIEF-ADSICKODSA-N 0.000 description 1
- 239000005864 Sulphur Substances 0.000 description 1
- GPVDHNVGGIAOQT-UHFFFAOYSA-N Veratric acid Natural products COC1=CC=C(C(O)=O)C(OC)=C1 GPVDHNVGGIAOQT-UHFFFAOYSA-N 0.000 description 1
- IJCWFDPJFXGQBN-RYNSOKOISA-N [(2R)-2-[(2R,3R,4S)-4-hydroxy-3-octadecanoyloxyoxolan-2-yl]-2-octadecanoyloxyethyl] octadecanoate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OC[C@@H](OC(=O)CCCCCCCCCCCCCCCCC)[C@H]1OC[C@H](O)[C@H]1OC(=O)CCCCCCCCCCCCCCCCC IJCWFDPJFXGQBN-RYNSOKOISA-N 0.000 description 1
- SHGZCNIYZYMHFG-UHFFFAOYSA-N [Cl].C1(C=C/C(=O)O1)=O Chemical compound [Cl].C1(C=C/C(=O)O1)=O SHGZCNIYZYMHFG-UHFFFAOYSA-N 0.000 description 1
- GPSAAQWVJOVCBK-UHFFFAOYSA-N [K].[K].[K].OC(=O)CC(O)(C(O)=O)CC(O)=O Chemical compound [K].[K].[K].OC(=O)CC(O)(C(O)=O)CC(O)=O GPSAAQWVJOVCBK-UHFFFAOYSA-N 0.000 description 1
- SGGPVBOWEPPPEH-UHFFFAOYSA-N [K].[Zr] Chemical compound [K].[Zr] SGGPVBOWEPPPEH-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 238000005270 abrasive blasting Methods 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000002671 adjuvant Substances 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 235000012538 ammonium bicarbonate Nutrition 0.000 description 1
- PRKQVKDSMLBJBJ-UHFFFAOYSA-N ammonium carbonate Chemical compound N.N.OC(O)=O PRKQVKDSMLBJBJ-UHFFFAOYSA-N 0.000 description 1
- 239000001099 ammonium carbonate Substances 0.000 description 1
- 235000012501 ammonium carbonate Nutrition 0.000 description 1
- 229910000148 ammonium phosphate Inorganic materials 0.000 description 1
- ZRIUUUJAJJNDSS-UHFFFAOYSA-N ammonium phosphates Chemical compound [NH4+].[NH4+].[NH4+].[O-]P([O-])([O-])=O ZRIUUUJAJJNDSS-UHFFFAOYSA-N 0.000 description 1
- 239000002280 amphoteric surfactant Substances 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 235000010323 ascorbic acid Nutrition 0.000 description 1
- 239000011668 ascorbic acid Substances 0.000 description 1
- 229960005070 ascorbic acid Drugs 0.000 description 1
- 150000001540 azides Chemical class 0.000 description 1
- 238000005815 base catalysis Methods 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- 229940106691 bisphenol a Drugs 0.000 description 1
- 229910021538 borax Inorganic materials 0.000 description 1
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 125000005626 carbonium group Chemical group 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000007385 chemical modification Methods 0.000 description 1
- HGAZMNJKRQFZKS-UHFFFAOYSA-N chloroethene;ethenyl acetate Chemical compound ClC=C.CC(=O)OC=C HGAZMNJKRQFZKS-UHFFFAOYSA-N 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- LVTYICIALWPMFW-UHFFFAOYSA-N diisopropanolamine Chemical compound CC(O)CNCC(C)O LVTYICIALWPMFW-UHFFFAOYSA-N 0.000 description 1
- 229940043276 diisopropanolamine Drugs 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 1
- 229940060296 dodecylbenzenesulfonic acid Drugs 0.000 description 1
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- CCIVGXIOQKPBKL-UHFFFAOYSA-N ethanesulfonic acid Chemical compound CCS(O)(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-N 0.000 description 1
- PSOUOKYUENGTOA-UHFFFAOYSA-N ethene;dihydrochloride Chemical compound Cl.Cl.C=C PSOUOKYUENGTOA-UHFFFAOYSA-N 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- LCDFWRDNEPDQBV-UHFFFAOYSA-N formaldehyde;phenol;urea Chemical compound O=C.NC(N)=O.OC1=CC=CC=C1 LCDFWRDNEPDQBV-UHFFFAOYSA-N 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000003205 fragrance Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 229940075507 glyceryl monostearate Drugs 0.000 description 1
- 235000013905 glycine and its sodium salt Nutrition 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- MUTGBJKUEZFXGO-UHFFFAOYSA-N hexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21 MUTGBJKUEZFXGO-UHFFFAOYSA-N 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000002563 ionic surfactant Substances 0.000 description 1
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 description 1
- 229940059939 kayexalate Drugs 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- DEAKWVKQKRNPHF-UHFFFAOYSA-N methyl 2-methylprop-2-enoate;prop-2-enenitrile;styrene Chemical compound C=CC#N.COC(=O)C(C)=C.C=CC1=CC=CC=C1 DEAKWVKQKRNPHF-UHFFFAOYSA-N 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- JFTBTTPUYRGXDG-UHFFFAOYSA-N methyl violet Chemical compound Cl.C1=CC(=NC)C=CC1=C(C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 JFTBTTPUYRGXDG-UHFFFAOYSA-N 0.000 description 1
- 229960000907 methylthioninium chloride Drugs 0.000 description 1
- 239000001788 mono and diglycerides of fatty acids Substances 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical class C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- GSGDTSDELPUTKU-UHFFFAOYSA-N nonoxybenzene Chemical compound CCCCCCCCCOC1=CC=CC=C1 GSGDTSDELPUTKU-UHFFFAOYSA-N 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- RNVCVTLRINQCPJ-UHFFFAOYSA-N o-toluidine Chemical compound CC1=CC=CC=C1N RNVCVTLRINQCPJ-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 229940053834 phenol / resorcinol Drugs 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- PHEDXBVPIONUQT-RGYGYFBISA-N phorbol 13-acetate 12-myristate Chemical compound C([C@]1(O)C(=O)C(C)=C[C@H]1[C@@]1(O)[C@H](C)[C@H]2OC(=O)CCCCCCCCCCCCC)C(CO)=C[C@H]1[C@H]1[C@]2(OC(C)=O)C1(C)C PHEDXBVPIONUQT-RGYGYFBISA-N 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- 150000003016 phosphoric acids Chemical class 0.000 description 1
- 238000006303 photolysis reaction Methods 0.000 description 1
- 230000015843 photosynthesis, light reaction Effects 0.000 description 1
- 229920001467 poly(styrenesulfonates) Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 239000001508 potassium citrate Substances 0.000 description 1
- 229960002635 potassium citrate Drugs 0.000 description 1
- QEEAPRPFLLJWCF-UHFFFAOYSA-K potassium citrate (anhydrous) Chemical compound [K+].[K+].[K+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O QEEAPRPFLLJWCF-UHFFFAOYSA-K 0.000 description 1
- 235000011082 potassium citrates Nutrition 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000010731 rolling oil Substances 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000013049 sediment Substances 0.000 description 1
- PCMORTLOPMLEFB-UHFFFAOYSA-N sinapinic acid Natural products COC1=CC(C=CC(O)=O)=CC(OC)=C1O PCMORTLOPMLEFB-UHFFFAOYSA-N 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- 239000012265 solid product Substances 0.000 description 1
- 239000001570 sorbitan monopalmitate Substances 0.000 description 1
- 235000011071 sorbitan monopalmitate Nutrition 0.000 description 1
- 229940031953 sorbitan monopalmitate Drugs 0.000 description 1
- 235000019337 sorbitan trioleate Nutrition 0.000 description 1
- 229960000391 sorbitan trioleate Drugs 0.000 description 1
- 239000001589 sorbitan tristearate Substances 0.000 description 1
- 235000011078 sorbitan tristearate Nutrition 0.000 description 1
- 229960004129 sorbitan tristearate Drugs 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- SFXOHDOEOSCUCT-UHFFFAOYSA-N styrene;hydrochloride Chemical compound Cl.C=CC1=CC=CC=C1 SFXOHDOEOSCUCT-UHFFFAOYSA-N 0.000 description 1
- KYGTUEJMVMRMKQ-UHFFFAOYSA-N styrene;sulfamide Chemical compound NS(N)(=O)=O.C=CC1=CC=CC=C1 KYGTUEJMVMRMKQ-UHFFFAOYSA-N 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 150000003455 sulfinic acids Chemical class 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- 125000003698 tetramethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000010257 thawing Methods 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- WYXIGTJNYDDFFH-UHFFFAOYSA-Q triazanium;borate Chemical compound [NH4+].[NH4+].[NH4+].[O-]B([O-])[O-] WYXIGTJNYDDFFH-UHFFFAOYSA-Q 0.000 description 1
- RKBCYCFRFCNLTO-UHFFFAOYSA-N triisopropylamine Chemical compound CC(C)N(C(C)C)C(C)C RKBCYCFRFCNLTO-UHFFFAOYSA-N 0.000 description 1
- WUUHFRRPHJEEKV-UHFFFAOYSA-N tripotassium borate Chemical compound [K+].[K+].[K+].[O-]B([O-])[O-] WUUHFRRPHJEEKV-UHFFFAOYSA-N 0.000 description 1
- 229910000404 tripotassium phosphate Inorganic materials 0.000 description 1
- 235000019798 tripotassium phosphate Nutrition 0.000 description 1
- BSVBQGMMJUBVOD-UHFFFAOYSA-N trisodium borate Chemical compound [Na+].[Na+].[Na+].[O-]B([O-])[O-] BSVBQGMMJUBVOD-UHFFFAOYSA-N 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 210000002700 urine Anatomy 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
Landscapes
- Materials For Photolithography (AREA)
- Printing Plates And Materials Therefor (AREA)
Abstract
The invention discloses two infrared positive heat-sensitive planographic elements, wherein one of the infrared positive heat-sensitive planographic elements is a single-layer coating while the other one is a double-layer coating. An imaging layer of the single-layer coating and a bottom layer of the imaging layer of the double-layer coating both contain a macromolecule polymer with an ethenyl benzene sulfonamide structure; thereby anti-chemical product property and abrasion-proof performance of the planographic elements are obviously improved to obtain high tolerance of development operation and high development film remaining ratio.
Description
Technical field
The invention belongs to the photo-thermal field of functional materials, relate to the positive heat-sensitive planographic plate that the imaging constituent of making infrared positive thermal-sensitive CTP (CTP) galley and the constituent that forms images are thus made.
Background technology
Light-sensitive composition and imaging element have been widely used in printed circuit board (PCB) (PCB) and lithographic plate, and representative way is that these photosensitive materials are coated on the substrate, and drying and/or slaking then makes it form thin film.When using suitable radiation source or particle beam to shine, be irradiated to the film of scope and have different attributes with the film that is not irradiated to scope.Compare with the film that is not irradiated to scope, the film generation physical change that is irradiated to scope in some cases can be removed or melt at an easy rate; And be irradiated to the film generation chemical change of scope in other cases and more or less be dissolved in the suitable liquid, perhaps make itself and some liquid for example ink, oil, water or Bailer liquid have affinity because of the film that is irradiated to scope changes in some cases.
Lithography is current maximum a kind of mode of printing that uses, and it relates to and on suitable lithographic plate, makes printing and non--printing zone.Lithography process is that some scope has the ability to accept lithographic ink or oil from ready especially lithographic plate surface, however other scope, and the water of only having the ability to accept will not accepted ink or oil.The part of accepting ink or oil forms the printed image scope, and does not accept the part formation background scope of ink or oil.Through using printing and the non--printing zone that suitable radiation source or particle beam shine formation can arrange publish picture picture and background, these images and background and ink and water or Bailer liquid have different affinity.When the film that is not irradiated to scope forms last printed images, lithographic plate is called as the positive version.Otherwise when the film that is irradiated to scope forms last printed images, lithographic plate is called as negative engraving.
In the process of traditional preparation lithographic plate or printed circuit board (PCB), the film with original image is placed on the photographic layer, and ultraviolet ray and/or visible light pass the film irradiation photographic layer of original image.This very consuming time and consumption worker of method who prepares lithographic plate or printed circuit board (PCB).In the nearest more than ten years, laser direct imaging method (LDI) is developed widely and is used in the process of preparation lithographic plate or printed circuit board (PCB).The data that computing machine obtains in this process need not take a picture film pilot process and directly be transferred on lithographic plate or the printed circuit board (PCB).LDI provides many advantages, for example line mass, fast prepare process, make output, the cost that eliminate to use film and other interests of generally acknowledging efficiently.
The photographic layer of traditional PS sun version mainly comprises O-naphthoquinones disazo compound and alkali soluble resin, and the solubleness of alkali soluble resin in aqueous slkali receives the inhibition of O-naphthoquinones disazo compound.Under ultraviolet light emission, O-naphthoquinones disazo compound resolves into the indenes carboxylic acid with photochemistry, causes resistance dissolubility forfeiture recited above, thereby causes the dissolubility of photographic layer in alkali lye obviously to improve.This has explained that the imaging mechanism of the positive version photographic layer that comprises O-naphthoquinones disazo compound and alkali soluble resin is attributable to because the chemical modification of top description causes exposed portion and the non-exposed portion solubility difference in alkali lye.
The photosensitive composite of O-naphthoquinones disazo compound and alkali soluble resin is known to be widely used on preparation positive galley, and ultraviolet light is worn and penetrated silver salt original image film galley is made public, and in alkali lye, develops then to form positive domain and resemble.Sensitivity yet photographic layer comprises O-naphthoquinones disazo compound and alkali soluble resin traditional PS sun version to ultraviolet light has the shortcoming that must under sodium yellow, manipulate; They also have the unstable and lower resolution problem of storage in addition, thereby thermo-responsive lithographic plate replaces photosensitive lithographic plate just gradually.
Jap.P. JP-A-60-61 752 has put down in writing a kind of original image film directly prepares galley from computer data trial of cancelling.Because photographic layer is enough inresponsive to the laser of direct exposure, is applied one deck silver halogen compound above it.The silver halogen compound can be directly exposed to and rely under the computer-controlled laser, and silver-colored then halogen compound layer is developed, and on photographic layer, forms silver-colored image, and silver-colored image plays a part a mask in the process that photographic layer is made public.After photographic layer was made public, silver-colored image was removed, and photographic layer is developed.Such method has too complicacy and the shortcoming that needs to use too much developer solution.
It is on photographic layer, to cover layer of metal layer or carbon black layer that another one is attempted, and relies on laser this metal level of thawing or carbon black layer on photographic layer, to obtain the image face mask layer then, and ultraviolet light passes image face mask photographic layer is made public.After removing image face mask, photographic layer is developed acquisition galley.This method is documented in 492 070 li of BrP GB-1.But this method still has the shortcoming that will remove the image face mask process.
U.S. Pat 5,340,699 have put down in writing the imaging key element of negative infrared laser record.The infrared-sensitive layer comprises phenolics, Bu Shi acid and infrared absorption thing, and it is very poor that the print result of the lithographic plate that obtains after exposure and the development is in the news.
European patent EP 784233 has been put down in writing a kind of negative chemical amplifying type sensitization complex; It comprises alkali soluble resin; For example phenolics or polyvinyl phenol, amino-compound that can cross-linked resin has the infrared absorbing agents and the light-sour conversion agent of special construction.The practical effect of this technology possibly be inappropriate.For example, when making negative planographic printing plate, exposure need be heat-treated later, and the acid that exposure produces is considered to play catalyst action, and the cross-linking reaction that helps heat treatment process is to form the negative image.Yet in such imaging process, because the variation of heat-treat condition, the stability of picture quality may not be satisfactory.On the other hand; The positive photosensitive material does not need such exposure after-baking, but exposed portion and not the contrast of exposed portion not be very abundant, thereby non-image part just is not easy to remove just; Perhaps the film of image section is not easy to keep for a long time, and pressrun just possibly reduce.
U.S. Pat 4,708,925, US5,372,907, US 5,491,046, US 5,840,467, US 5,962,192 and US 6,037,085 put down in writing the preparation method of laser positive lithographic plate.But these methods all relate to the phenol resin that uses ultraviolet, visible light and/or infrared ray responsive.
U.S. Pat 4,708,925 have put down in writing and have had the photosensitive printing version that comprises phenol resin and salt photosensitive layer, and the solubility that phenol resin self has is restored after photolysis salt.This sensitization complex also possibly optionally comprise infrared emulsion.After ultraviolet, visible light and/or infrared ray exposure, the sensitization complex is developed and obtains positive or negative galley.The print result of the lithographic plate of this method preparation it is reported it also is unfavorable.
U.S. Pat 5,372,907 have put down in writing with U.S. Pat 5,491,046 and a kind ofly to be particularly suitable for preparing to ultraviolet all responsive and can form the sensitization complex of the lithographic plate of positive or negative with infrared ray.This sensitization complex comprises phenolics, Bu Shi acid and infrared absorbing agents.After exposure and preheating, the solubility of the sensitization complex of exposed portion in aqueous slkali reduces, and do not have the solubility of sensitization complex in aqueous slkali of exposed portion to obtain increasing.The print result of the lithographic plate of this method preparation it is reported it also is unfavorable.
When the sensitization complex of the positive lithographic plate of development a new generation, people trend towards selecting can form inner hydrogen bond perhaps and the condensate of other additives formation hydrogen bonds.The formation of hydrogen bond can reduce the dissolubility of condensate in aqueous slkali.But when the sensitization complex was illuminated, hydrogen bond was interrupted, and condensate at least temporarily can become and be dissolved in the developer solution more.Light-thermal cross over agent might be added into to change absorbing wavelength, and other resistance solvents also possibly be added into and change the baseline that process is dissolved in resistance simultaneously.
U.S. Pat 5,840,467 have described a kind of sensitization complex of positive lithographic plate, and it comprises the hot degradable substance of binder resin, light-thermal cross over agent and the material dissolves property of having the ability to reduce in fact.Hot degradable substance with special-effect comprises diazo salt and O-naphthoquinones disazo compound.The binder resin of specific example comprises phenolic group, acrylic and polyamine ester base resin.Various pigments and dyestuff also are used as potential light-thermal cross over material, comprising specific cyanines colouring substance.U.S. Pat 5,962,192 and 6,037,085 to have described a kind of be master's thermal laser sensitive material with the Azide material, the dyestuff composition is added into to improve susceptibility.
In the videograph process of positive lithographic plate, improving membrane left rate is an important challenge.Cause the low main cause of membrane left rate still because the serious dissolving of unexposed portion in developer solution.In order to improve membrane left rate, people utilize exposure with taking every caution against error and do not have exposed portion to the recently intensity and the development time of balance developer solution.The main cause that produces this phenomenon is based on a fact, and promptly the positive lithographic plate depends on exposure on basically and do not have the difference of condensate solubleness in aqueous slkali of exposed portion.
In the use of positive lithographic plate, the low chemical resistance of galley is an important challenge.Low chemical resistance has seriously influenced the compatibility of the chemicals that galley and some printing process must use, and then reduces the functions of use of galley.In order to overcome these shortcomings, certain methods for example adds suitable crosslinking chemical and aftertreatment such as thermal treatment and ultraviolet lighting processing or other processing procedures and all was used in photosensitive material.
Obviously, still need in the printing process a kind of do not have pre-service with aftertreatment but the lithographic plate that can long-range prints.Also need the lithographic plate that a kind of chemical resistance is good and membrane left rate is high simultaneously.Better light-sensitive composition of performance and imaging element are the prerequisites of the better lithographic plate of obtained performance.For on solving the heat-sensitive CTP plate of various reports all have various weak points, the spy has invented a kind of high molecular polymer of special construction, and prepares infrared thermosensitive CTP imaging constituent thus, obtains individual layer or double-deck coating positive thermosensitive CTP version.
Summary of the invention
The object of the present invention is to provide two kinds of infrared positive thermal-sensitive offset plates, realize that this technological process comprises:
1, a kind of high molecular polymer with following special vinyl benzene sulfonamide structure that obtains through chemosynthesis, the water that this polymkeric substance has is insoluble, alkali solubility matter.
Wherein, R represents hydrogen, alkyl, phenyl, alkane phenyl, phenylol, benzenesulfonamido group, benzenethiol base
2, use this polymer formulation infrared positive thermal-sensitive imaging composition.
3, the single coated positive heat-sensitive galley or the double-deck coating positive heat-sensitive galley that make by infrared positive thermal-sensitive imaging composition.
The infrared positive thermal-sensitive offset plate that is made by infrared positive thermal-sensitive constituent of the present invention has good chemical resistance, advantages of good abrasion property, high sensitive, high membrane left rate and stronger development tolerance.
The basic composition thing of infrared positive thermal-sensitive imaging composition of the present invention comprises: the high molecular polymer of special construction, alkali solubility phenolics, infrared absorbing agents, illuminating colour.Can selectivity add other adjuvant (comprising surfactant, solvent etc.).At first obtain having the high molecular polymer of above-mentioned special vinyl benzene sulfonamide structure, prepare infrared positive thermal-sensitive imaging composition then, make a plate and Performance Detection through chemosynthesis.Respectively each composition in the imaging constituent is described below.
1, special vinyl benzene sulfonamide structure high molecular polymer
The used special construction high molecular polymer of the present invention has the vinyl benzene sulfonamide structure; The acquisition of this polymkeric substance is through chloride vinylbenzenesulfonic acid or vinylbenzenesulfonic acid salt; And then react with the amido compounds and to obtain the vinyl sulfamide monomer; Use this monomer separately or use this monomer and the organic compound that contains the unsaturated double-bond class to carry out free radical polymerization, obtain the vinyl benzene sulfonamides high molecular polymer of required special construction.A kind of in addition method is through direct chloride polyvinylbenzenesulfonic acid sodium, and the polymkeric substance and the amine compound of process chloride react the high molecular polymer that obtains having similar special construction under base catalysis.
The operable unsaturated double-bond class organic compound that contains includes, but are not limited to following compound:
(a) acrylic acid or esters of acrylic acid, like acrylic acid, methacrylic acid, (methyl) acrylic acid first (second, third, fourth) ester, phenyl methacrylate, methacrylic acid benzene methyl;
(b) acrylic amide is like (methyl) acrylic amide, NMA;
(c) phenylethylene, like styrene, hydroxy styrenes;
(d) vinyl cyanide is like vinyl cyanide, methacrylonitrile;
(e) maleic anhydride class, like maleic anhydride, N-phenylmaleimide
The example of first-selected unsaturated link monomer comprises: acrylic acid, methyl methacrylate, vinyl cyanide, NMA, styrene or hydroxy styrenes.
Operable amido compounds comprises ammoniacal liquor, alkyl amine, arylamine class.Alkyl amine such as methylamine, ethamine, ethylenediamine, diisopropylamine, triethylamine, triethanolamine etc.Arylamine such as aniline, phenyl ethylamine, to () hydroxyanilines, sulfanilamide (SN), P-nethoxyaniline, 2-aminotoluene, xylidin, 4-tert-butyl group aniline, paranitroanilinum, to amido thiophenol etc.
Special vinyl benzene sulfonamide structure high molecular polymer of the present invention has mean molecular weight and is preferably 3000-150, and 000, be particularly suitable for being 5000-50,000.Molecular weight dispersity is 1.1-10.In this vinyl benzene sulfonamide structure high molecular polymer, the quality of vinyl benzene sulfamide monomer unit at 10%-100%, is preferably 20%-90% than content.Can contain unreacted monomer in the high molecular polymer, the quality in high molecular polymer of these monomers, is preferably in below 1% below 5% than content.
Use this vinyl benzene sulfonamide structure high molecular polymer to be mixed with the picture constituent, and then can make individual layer or double-coated infrared positive thermal-sensitive offset plate.
For single coated is made printing heat-sensitive lithographic printing planography, use this vinyl benzene sulfonamide structure high molecular polymer, red place absorbing agent and illuminating colour to be mixed with the picture constituent.Also can in the imaging constituent, add alkali solubility phenolics and obtain higher development tolerance.Vinyl benzene sulfonamide structure high molecular polymerization body burden is generally at 10-90% in the imaging solid constituent.When being used for double-deck coating, generally be that this vinyl benzene sulfonamide structure high molecular polymer is used for the bottom coating fluid, also alternative infrared absorbing agents and the illuminating colour of adding in this external bottom coating fluid.Double-coated top layer coating imaging layer generally comprises alkali solubility phenolics, infrared absorbing agents and illuminating colour.
2, alkali solubility phenolics
The used alkali solubility phenolics of the present invention is under acid condition, to carry out condensation reaction by phenol or phenol analog derivative and formaldehyde to obtain.Typical example comprises that phenolics, (to, neighbour) cresol-novolak resin, mixed phenol urea formaldehyde, tert butyl phenolic resin, dimethyl phenol urea formaldehyde, phenol/resorcinol mix the phenolics that obtains with formaldehyde condensation.The phenolics that uses has weight-average molecular weight between 2000-15000.
3, infrared absorbing agents
Infrared absorbing agents is also referred to as the photo-thermal transformation substance, anyly knownly can absorb ultrared dyestuff and can be used, and absorbing wavelength requires the infra-red range at 700-1300nm.Special dyestuff example has metallic complex salt azo dyes, pyrrolinone azo dyes, fears the quinone dyestuff, phthalocyanine dyestuff, carbonium dye, quinone imido dyestuff, methine dyes, cyanine dye etc.U.S. Pat 4912083, US4942141, US4948778, US4950639, US4950640, US4952552, US4973572, US5036040, US5166024 have reported the preparation technology of these dyestuffs, and wherein useful especially infrared absorbing agents is a cyanine dye.Commercially available infrared absorbing agents has: 1, the Epolite-178 of Epolin company, Epolite-62B, Epolite-130, Epolite-125; 2, ADS-830A, ADS-1064 (American Dye Source, Montreal, near infrared absorbent Canada); 3, EC2117 (FEW, Wolfen, Germany); 4, CYASORB IR99, CYASORB IR165 IR dyes (GlendaleProtect, Technology); 5, Spectra IR 830A, Spectra IR 840A infrared dye (Spectra ColorsCorp); 6, the ST798 IR dyes (Syntec, Germany); 7, Trump dye 830nm IR dyes (Eastman Kodak); 8, Projet 825808nm IR dyes (Avecia).
Useful especially infrared absorbing agents such as figure below, the infrared absorbing agents that uses of positive thermal-sensitive imaging composition is one of commercially available infrared absorbing agents or two kinds in the present invention, infrared addition is for the best 0.2～7.0wt% of total solid composition of imaging constituent.
4, surfactant
Among the present invention, the surfactant that the imaging constituent of infrared positive thermal-sensitive CTP uses is two kinds: the surfactant, the planar surfactant of improvement coating that improve imaging.
The surfactant that the surfactant of improvement imaging has non-ionic surfactant, amphoteric surfactant, siloxane-based compound surfactant, fluorine-containing monomer-polymer to form.Ionic surfactant pack is drawn together sorbitan tristearate, sorbitan monopalmitate, sorbitan trioleate, glyceryl monostearate, PVF nonyl phenyl ether etc., specifically gathers aminoethyl glycine salt like alkyl two (aminoethyl) glycocoll, alkyl.Silicone type surface active agent; Preferably dimethyl siloxane and the bulk polymer that gathers the alkylene oxide gather alkylene oxide sex change silicone like DBE-224, DBE-621, DBE-712, DBP-732, DBP-534, only Tego society system, Tego Glide 100 etc.Fluorine is a monomer-polymer class surfactant, the fluoropolymer that obtains like the fluorine-containing acrylic acid series polymeric compounds in the JP11-288063 communique and the fluorine-containing acrylic monomer in the JP2000-187318 communique and acrylic monomers copolymerization arbitrarily etc.The molecular weight of fluoropolymer, the most handy weight-average molecular weight be more than 2000, and number-average molecular weight is more than 1000.Better use weight-average molecular weight to be 2000-250000 as 5000-300000, number-average molecular weight.Wherein improving preferably fluorine-containing in the surfactant of imaging is surfactant, and commercially available article have big Japan (IN) chemical industry (strain) system (MEGAFAC) MCF312 etc.
Improving the planar surfactant of coating, can to use commercially available be surfactant like (MEGAFAC) F-171, F-173, F-176, F-183, F-184 fluorine.
In order to be modified into the imaging of picture constituent on the version base and the planar performance of coating better; The present invention will use two kinds of surfactants simultaneously; Add up to addition for the total solid composition of imaging constituent with 0.05～15wt%, better add with 0.5～5wt%.
5, development chaotropic agent
The development chaotropic agent refers to be present in the compound that is prone to be dissolved in the alkali developing solution that exists in the exposure region, generally uses the high molecular polymer that self is prone to be dissolved in the compound of alkaline developer or has the development facilitation.
The compound that self is prone to be dissolved in alkaline developer refers to contain the compound of the sulfonic acid of acidic-group, carboxylic acid, phenolic hydroxyl group, phosphate group; Can increase the dissolubility of developer solution and improve susceptibility; Comprise the compound that contains sulfonic acid, carboxylic acid, phenolic hydroxyl group, phosphate group, like fragrance bunch sulfonic acid such as U.S. Pat 4933682 report p-toluenesulfonic acid, naphthalene sulfonic acids; The spherical anhydrides of U.S. Pat 4115128 reports such as phthalic anhydride, THPA, HHPA, 3,6-end oxygen-Δ 4-THPA, maleic anhydride, chlorine maleic anhydride, α-phenyl maleic anhydride, succinic anhydride, PMA; Phenols comprises bisphenol-A, p-nitrophenol, right-ethoxy phenol, 2,4,4 '-dihydric benzophenone, 4-hydroxyl benzophenone, 4,4 ', 4 "-trihydroxy triphenyl methane, 4,4 ', 3 ", 4 "-tetrahydroxy-3,5,3 ', 5 '-tetramethyl triphenyl methane etc.; Organic acid comprises sulfonic acid class, sulfinic acid class, alkyl sulfonic acid class, phosphoric acid class, phosphoric acid ester and carboxylic acids; Like p-toluenesulfonic acid, dodecylbenzene sulfonic acid, right-toluenesulfinic acid, ethylsulfonic acid, phosphenylic acid, phenyl hypophosphorous acid, phenyl phosphate ester, diphenyl phosphoester, benzoic acid, 4-cyclohexene-1; 2-dicarboxylic acid, sinapic acid, lauric acid, ascorbic acid, 3; 4; 5-trimethoxybenzoic acid, 3,4-dimethoxybenzoic acid, phthalic acid, lauric acid etc., addition is preferably 0.10～10wt%.
Polymerization development chaotropic agent macromolecular compound refers to the not high phenolics of the degree of polymerization, super molecular compound that alkali solubility is strong etc.The phenolics product that the commercially available degree of polymerization is not high comprises DURITE SD126A, DURITE PD427A, DURITE PD390, DURITEPL1526 (from Bordenchem.INC); ALNOVOL SPN560, ALNOVOL SPN564, ALNOVOL SPN564 (fromClariant Gmbh.), HRJ 2606 (from Schnectady international Inc.), AV LITE resin SP1006N, AV LITE resin PAPS-PN1, AV LITE resin PAPS-PN2, AV LITE resin PAPS-PN3 (from SIEBERHEGNER).
The development chaotropic agent that uses in the present invention,, adds with 0.5～3wt% ratio well especially better with 0.1～15wt% with 0.05～20wt% for the total solid composition of imaging constituent.
6, illuminating colour
In order to improve visual visibility, visual colorant can also possibly be added into coating composition of the present invention.Pigment or dyestuff can use as visual colorant.The example of first-selected dyestuff includes but not limited to salt-dye, oil-soluble dyes and basic-dyeable fibre.Example has oil-yellow #101, oil yellow look #103, the red #312 of oil-bound distemper, glossy dark green look BG, oil blue look BOS, oil blue look #603, glossy black look BS, glossy black look T-505, Victoria's pure blue BO, the borofluoride that alkali is blue.Special example comprises ethyl violet, methyl violet, crystal violet, malachite green, bright green, victoria blue B, victoria blue R, Victoria blue 130, Victoria's ethereal blue, methylene blue (CI52015) etc.With 0.01～10wt%, preferably the ratio with 0.1～5wt% adds these illuminating colours, helps adjusting the color of imaging layer, distinguishes imaging moiety and non-imaging moiety in the imaging process for the total solid composition of imaging constituent.
7, solvent
Be suitable for the imaging constituent of the inventive method, need the dissolving of use appropriate solvent, be coated on suitable version base then and go up the plate that the formation printshop needs.As the solvent that uses this moment; Ethene dichloride, cyclohexanone, methyl ethyl ketone, methyl alcohol, ethanol, propyl alcohol, ethylene glycol monoethyl ether, 1-methoxyl-2-propyl alcohol, 2-methoxyethyl acetic acid esters, 1-methoxyl-2-propyl-acetic acid ester, dimethoxy ethane, methyl lactate, ethyl lactate, N are arranged; N-dimethyl acetamide, N; Dinethylformamide, tetramethyl urine, N-Methyl pyrrolidone, dimethyl sulfoxide (DMSO), sulphur alkane, gamma-butyrolacton, toluene etc.; But only for scheduling these, these solvents can not use or mix use separately.
In the coating imaging constituent, above-mentioned solvent proportion is 60～97wt%, better is 70～97wt%, and good especially is 75～95wt%.
In addition, after the coating drying, the coating weight (solid constituent) of imaging constituent is 0.5～3.0g/m on the gained version base
2, be preferably 1.2～2.5g/m
2Be lower than 0.5g/m in the heat sensing layer
2The time, film forming characteristics and imaging characteristic reduce; Surpass 3.0g/m
2The time, might sensitivity reduce.
But in order to make imaging element of the present invention, the components dissolved of composition in appropriate solvent, is filtered (if essential wanting), with solution coat on the base version.Coating process comprises the method that all are known, for example: the coating of bar type spreader, rotary coating, injection coating, the coating of curtain formula, dip coated, airblade coating, board-like coating, the coating etc. of rolling.
8, version base preparation
As the version base that uses among the present invention, need the plate object of necessary strength, good endurance and dimensionally stable, polyester film or aluminium sheet are advisable, optimal selection be printing plate special-purpose aluminum substrate, thickness is 0.1～0.6mm, better 0.15～0.4mm.Need carry out following surface treatment: (a) utilize alkaline agent to carry out corrosion treatment; (b) crude removal is handled; (c) surface coarsening is handled; (d) caustic corrosion is handled; (e) removing dirt handles; (f) anodized; (g) surface-sealing is handled.
Before aluminium sheet forms uneven surface, carry out ungrease treatment with surfactant, organic solvent or alkaline aqueous solution etc.Remove surperficial pressure rolling oil.The surface roughening of aluminium sheet is handled and can be adopted the whole bag of tricks like method of roughening, the galvanochemistry method of roughening of machinery.The method of roughening of machinery comprises known method such as ball polishing, brush polishing, abrasive blasting method, polishing polishing.Electrochemical roughening method is in hydrochloric acid or nitric acid electrolytic solution, to utilize interchange or direct current to carry out asperities to handle.Also can two kinds of methods be carried out to closing disclosed method in the for example Japanese JP54-63902 communique with both combinations.The aluminium sheet of surface coarsening need be implemented anodized and improve surperficial water-retaining property and mar proof after carry out caustic corrosion processing and decontamination processing like this.Can form porous oxide film in the aluminium sheet anodized, electrolyte generally is sulfuric acid, phosphoric acid, oxalic acid, chromic acid or their acid mixture, and electrolytical concentration can suitably be confirmed according to electrolytical kind.
Because anodised treatment conditions have various variations with used electrolyte, electrolytical concentration is generally the solution of 1-80wt%, and fluid temperature is 5～70 ℃, and strength of current is 5～60A/dm
2, voltage is 1～100V, electrolysis time 10 seconds～5 minutes.The amount of anode oxide film is less than 1.0g/m
2The time, printability resistance is insufficient, and non-image part is easy to sustain damage, and when printing, is prone to adhere to printing ink, produces " damage is polluted ".
After implementing anodized; Need implement water wettability to the aluminium surface handles; Multiple water wettability disposal route is arranged; Report enforcement dip treating or electrolytic treatments in sodium silicate aqueous solution like U.S. Pat 2714066, US3181461, US3280734 and US3902734, reported the method for use tygon phosphate processing etc. among the Jap.P. JP36-22063 among report use fluoridizing potassium zirconium and U.S. Pat 3276868, US4153461, the US4689272B.
The present invention makes public to using and has the infrared light supply near infrared to the region of ultra-red emission wavelength.After carrying out infrared exposure, need to implement development treatment.The present invention uses alkaline developer and has " the silicate developer solution " of the organic compound of buffer action as principal ingredient, and pH is preferably 12.5～13.5, the effect that can suppress to damage, and obtain the image section zero defect, good lithographic plate.
The alkali that uses in the developer solution of the present invention has inorganic bases such as sodium metasilicate, NaOH, potassium hydroxide, lithium hydroxide, tertiary sodium phosphate, tripotassium phosphate, triammonium phosphate, disodium hydrogen phosphate, dikalium phosphate, Diammonium phosphate (DAP), sodium carbonate, sal tartari, hartshorn salt, soda mint, saleratus, ammonium bicarbonate, sodium borate, potassium borate, ammonium borate, potassium citrate, citric acid tri potassium, sodium citrate, or organic alkaline agent such as single methylamine, dimethylamine, trimethylamine, mono aminoethane, diethylamine, triethylamine, single isopropylamine, diisopropylamine, tri-isopropyl amine, n-butylamine, monoethanolamine, diethanolamine, triethanolamine, monoisopropanolamine, diisopropanolamine, aziridine, ethylene diamine, pyridine.These alkaline agents can use separately, also can two or more combinations use.
Wherein inorganic base preferably uses sodium metasilicate, NaOH, potassium hydroxide.
Embodiment
In order to realize the object of the invention; Carry out illustrated in greater detail from aspects such as the preparation of synthetic, the infrared positive thermal-sensitive CTP version imaging constituent of version base preparation, special vinyl benzene sulfonamides high molecular polymer and Performance Detection thereof respectively below, the raw material that relates to, ratio and polymkeric substance etc. comprise but not limited by instance.
1, version base preparation
Use the special-purpose aluminum substrate of printing plate, carry out following surface treatment.
(1) utilizing alkaline agent to remove greasy dirt handles
With naoh concentration 3.6wt%, aluminium ion 1.5wt%, 60 ℃ of solution of temperature are through the spray mode and with 6g/m
2Carry out the dissolved corrosion aluminium sheet, then the water hydro-peening.
(2) electrochemical asperities processing
Employing is that 30 ℃ 1wt% electrolysis of hydrochloric acid liquid (containing the 0.5wt% aluminium ion), the alternating voltage of 50Hz, peak current density is 30A/dm
2, the summation electric weight is 130c/dm
2Carry out the processing of galvanochemistry asperities continuously, spray washing then.
(3) the caustic corrosion decontamination is handled
With NaOH 2wt%, under the aluminium ion 0.5wt%, 32 ℃, aluminium sheet is sprayed corrosion treatment, with 0.20g/m
2Dissolving aluminium sheet, the hydrate of aluminium that the interchange that the removal leading portion is used generates when carrying out the galvanochemistry asperities are as the dirt composition of main body, and a dissolving generation point pit edge part, form the smooth edges part, spray washing then.
(4) anodized
Use sulfuric acid as electrolyte, sulfuric acid concentration is 17wt% (containing the 0.5wt% aluminium ion), and temperature is 35 ℃.Through the 30V effect of DC, the final oxide film amount that forms is 3g/m
2
(5) alkali silicate is handled
With the aluminium support body that utilizes anodized to obtain, at 30 ℃ 1.5wt%, in the water glass solution of modulus 3, in processing layer, flooded for 30 seconds, carry out alkali silicate and handle.Spray washing then.
2, special vinyl benzene sulfonamide structure high molecular polymer is synthetic
(1) vinyl benzene sulfonamides monomer synthetic method one
Be reflected in the airtight fuming cupboard and carry out.In being furnished with the 1000mL there-necked flask of mechanical raking, thermometer, reflux condenser and constant pressure funnel; Add 130g to vinylbenzenesulfonic acid sodium 300ml dry toluene, stir into the slurries shape, add 220ml thionyl chloride and 0.8ml dimethyl formamide then; At room temperature stirred 40 hours; Product poured in the 3L frozen water separate out, filter and, obtain vinyl benzene sulfonic acid chloride solid with the low amounts of water washing.
In being furnished with the 1000mL there-necked flask of mechanical raking, thermometer, reflux condenser and constant pressure funnel; Listed article of according to the form below and consumption add medicine; Dissolve with the 300ml acetonitrile; The 200ml acetonitrile solution that under condition of stirring, slowly adds the synthetic vinyl benzene sulfonic acid chloride that obtains in 99.8g front is warming up to 70 ℃ and continues reaction 1h.Product poured in the 5L frozen water separate out, filter and, obtain the synthetic reaction that canescence vinyl benzene sulfonamides monomer is used for the back with the low amounts of water washing.
(2) vinyl benzene sulfonamides monomer synthetic method two
Be reflected in the airtight fuming cupboard and carry out.In being furnished with the 1000mL there-necked flask of mechanical raking, thermometer, reflux condenser and constant pressure funnel; Add 104g to vinylbenzenesulfonic acid sodium; 118.4g two (trichloromethyl) carbonic esters and 500ml acetonitrile place ice-water bath to stir, and in 1h, drip the 200ml acetonitrile solution of 80.8g triethylamine.After being added dropwise to complete, remove ice-water bath, continue at room temperature to stir 1h.
Product is removed by filter insolubles, obtain the vinyl benzene chloride solution.
Under condition of stirring, in above-mentioned reactant liquor, slowly add following material:
A. para hydroxybenzene amine 87.2g products therefrom is labeled as M1
B. sulfanilamide (SN) 137.6g products therefrom is labeled as M2
C. aniline 74.4g products therefrom is labeled as M3
D. p-aminophenyl thiophenol 100.0g products therefrom is labeled as M4
E. ammonia (28%) 105ml products therefrom is labeled as M5
F. ethamine 36g products therefrom is labeled as M6
After adding, water-bath is heated to 75 ℃, continues stirring reaction 1h, makes to react completely.Product is separated out in the 5L frozen water, filters, and with the low amounts of water washing, obtains the pale solid product, and is dry down in 60 ℃ of drying conditions.
(3) synthetic method of polymers one
In the 500mL there-necked flask of being furnished with mechanical raking, logical nitrogen pipe, thermometer, reflux condenser, the according to the form below consumption adds reaction monomers, adds 300ml DMF solvent again; Start and stir and feed the N2 protection; Warming-in-water to 60 ℃ adds 2g AIBN, keeps reaction 6 hours.Resulting product poured in the 10L frozen water separate out, filter and dry.
| The polymkeric substance numbering | The particular monomers title | The particular monomers consumption | Methyl methacrylate | Vinyl cyanide | Styrene |
| PAM1 | M1 | 59.7g | 9.0g | 6.4g | 9.4g |
| PAM2 | M2 | 94.3g | 6.0g | 6.4g | 6.2g |
| PAM3 | M3 | 65.9g | 6.0g | 6.4g | 6.2g |
| PAM4 | M4 | 58.1g | 9.0g | 8.0g | 9.4g |
| PAM5 | M5 | 38.2g | 6.0g | 6.4g | 6.2g |
| PAM6 | M6 | 31.9g | 6.0g | 6.4g | 6.2g |
(4) synthetic method of polymers two
Be reflected in the airtight fuming cupboard and carry out.In the 1000mL there-necked flask of being furnished with mechanical raking, logical nitrogen pipe, thermometer, reflux condenser and constant pressure funnel; Add 117g kayexalate (molecular weight 70000); 133.2g two (trichloromethyl) carbonic esters and 500ml acetonitrile; Place ice-water bath to stir, in 1h, drip the 200ml acetonitrile solution of 90.9g triethylamine.After being added dropwise to complete, remove ice-water bath, continue at room temperature to stir 1h.Product is removed by filter insolubles,
In above-mentioned reactant liquor, slowly add following material
A. para hydroxybenzene amine 98.1g gained high molecular polymer is labeled as PM1
B. sulfanilamide (SN) 154.8g gained high molecular polymer is labeled as PM2
C. aniline 83.7g gained high molecular polymer is labeled as PM3
D. p-aminophenyl thiophenol 112.5g gained high molecular polymer is labeled as PM4
E. ammonia (28%) 120ml gained high molecular polymer is labeled as PM5
F. ethamine 40.5g gained high molecular polymer is labeled as PM6
After adding, water-bath is heated to 75 ℃, continues stirring reaction 1h, makes to react completely.Product is separated out in the 10L frozen water, filters to isolate sediment, and product is dry down in 60 ℃ of drying conditions.
3, implement illustration
Instance 1
In this example, the polymeric chemical resistance of special vinyl benzene sulfonamide of the present invention and other common alkali soluble polymeric bodies compare, and list composition each item composition and content below:
Title material content
Condensate 9.70g
IR dyes ADS830A 0.15g
Victoria's pure blue B OH:0.15g
MEK 10g
Ethylene glycol monoethyl ether 80g
The test of chemical resistance is in following three kinds of mixed solutions, to carry out: mixed solution one: 80%DAA (diketone alcohol) and 20% water; Three: 80% isopropyl alcohols of mixed solution and 20% water.Coating was write down and is listed in the following table by the time of corrosion fully.
Table one: contain the chemical resistance comparison test one of special vinyl polymerization body and other common alkali soluble polymeric bodies
| Condensate | 80% diketone alcohol | 80% isopropyl alcohol |
| Phenolics PF6564LB | 20 seconds | 15 seconds |
| Phenolics 0744LB01 | 25 seconds | 15 seconds |
| Phenolics 6866LB02 | 25 seconds | 30 seconds |
| PAM1 | 320 seconds | 500 seconds |
| PAM2 | ＞60min | ＞60min |
| PAM3 | ＞60min | ＞60min |
| PAM4 | 240 seconds | 360 seconds |
| PAM5 | ＞60min | ＞60min |
| PAM6 | ＞60min | ＞60min |
| PM1 | 200 seconds | 415 seconds |
| PM2 | ＞60min | ＞60min |
| PM3 | ＞60min | ＞60min |
| PM4 | 150 seconds | 230 seconds |
| PM5 | ＞60min | ＞60min |
| PM6 | ＞60min | ＞60min |
The above results discloses uses special vinyl benzene sulfanilamide (SN) topology convergence body to compare with using common alkali dissolubility phenolics, and chemical resistance significantly improves.
Instance 2
Listed various material proportionings below pressing, preparation photosensitive imaging constituent, filter the dissolving back fully, is coated in the water wettability aluminum substrate surface of handling through electrolytic anodization with method of spin coating.In the baking oven of 110 degree dry 5 minutes, the dry film weight that obtains be 1.6 grams/square metre.
Photosensitive composite 14
Infrared ray is inhaled bow agent ADS830A 0.15g
Special vinyl benzene sulfanilamide (SN) condensate PAM 19.7g
Victoria's pure blue B OH 0.15g
MEK 10g
Ethylene glycol monoethyl ether 80g
Resulting version is installed in Creo Trendsetter 800 enterprising line scanning exposures; The imaging energy density is 300 milli Jiao/square centimeters, and the resolution of using is per inch 200 lines, and the version after the scanning is placed in 4% potassium hydroxide solution soaked 45 seconds; Up to obtaining background clearly; Water cleans, oven dry, and the film loss rate is recorded is lower than 10%.
Adopt and use the same method, use synthetic vinyl sulfonamide condensate PAM4, PM1, PM4 to replace PAM1 preparation photosensitive composition respectively.Carry out exposure imaging by same method and handle, obtain essentially identical effect.
Instance 3
Listed various material proportionings below pressing, preparation photosensitive imaging constituent, filter the dissolving back fully, is coated in the water wettability aluminum substrate surface of handling through electrolytic anodization with method of spin coating.In the baking oven of 110 degree dry 5 minutes, the dry film weight that obtains be 1.6 grams/square metre.
Photosensitive composite 15
Infrared ray attractant ADS830A 0.15g
Special vinyl benzene sulfanilamide (SN) condensate PAM1 6.2g
Phenolics PF6564LB 3.5g
Victoria's pure blue B OH 0.15g
MEK 10g
Ethylene glycol monoethyl ether 80g
Resulting version is installed in Creo Trendsetter 800 enterprising line scanning exposures; The imaging energy density is 150 milli Jiao/square centimeters, and the resolution of using is per inch 200 lines, and the version after the scanning is placed in 4% potassium hydroxide solution soaked 45 seconds; Up to obtaining background clearly; Water cleans, oven dry, and the film loss rate is recorded is lower than 5%.
Adopt and use the same method, use synthetic vinyl sulfonamide condensate PAM4, PM1, PM4 to replace PAM1 preparation photosensitive composition respectively.Carry out exposure imaging by same method and handle, obtain essentially identical effect.
Instance 4:
Below listed photosensitive composite bottom and top sole formula prepare each portion of glue, filtration treatment respectively.Re-use method of spin coating barrier coating glue on the anodised aluminium substrate surface, in the baking oven of 130 degree dry 5 minutes, the book film dry weight that obtains be 1.0 grams/square metre.Making uses the same method scribbles on the space of a whole page of bottom coating further coating top layer glue in front, in the baking oven of 110 degree dry 5 minutes, the top layer book film dry weight that obtains be 0.4 gram/square metre.
Photosensitive composite solution 16
The bottom coating fluid:
Infrared ray attractant ADS830A 0.1g
Special vinyl benzene sulfanilamide (SN) condensate PAM2 6.1g
Victoria's pure blue B OH 0.1g
DMF 30g
MEK 20g
Ethylene glycol monoethyl ether 40g
The top layer coating fluid:
Infrared ray attractant ADS830A 0.05g
Phenolics 6866LB02 3.0g
Victoria's pure blue B OH 0.05g
MEK 20g
Ethylene glycol monoethyl ether 70g
Resulting version is installed in Creo Trendsetter 800 enterprising line scanning exposures, and the imaging energy density is 120 milli Jiao/square centimeters, and the resolution of using is per inch 200 lines; Version after the scanning is placed in 6% potassium hydroxide solution soaked 35 seconds; Up to obtaining background clearly, water cleans, oven dry; The film loss rate is recorded, and to be lower than 5%, 1% site complete.The forme that obtains behind the process exposure imaging is installed on Hamada Splendor 452 printing machines and prints, and after accomplishing 10,000 printed sheets, does not find the degradation of any printing quality.
Adopt and use the same method, use synthetic vinyl sulfonamide condensate PAM3, PAM5, PAM6, PM2, PM3, PM5, PM6 to replace PAM2 preparation substrate constituent respectively.Carry out exposure imaging by same method and handle, obtain essentially identical effect.
Instance 5:
According to the method same with instance 4, just remove infrared ray attractant ADS830A and Victoria's pure blue B OH in the imaging constituent bottom coating fluid, obtain the result similar with instance 4.
Claims (12)
1. infrared positive thermal-sensitive offset element is characterized in that: on the version base through hydrophilic treated, be coated with a kind of positive thermal-sensitive imaging composition, this imaging constituent comprises:
(A) has the high molecular polymer of vinyl benzene sulfanilamide (SN) structure; This polymkeric substance is by chloride vinylbenzenesulfonic acid or vinylbenzenesulfonic acid salt; Warp reacts with the amido compounds and obtains the vinyl sulfamide monomer, and this monomer carries out free radical polymerization with the organic compound that contains the unsaturated double-bond class again and obtains then;
(B) infrared absorbing agents;
(C) illuminating colour;
Said amido compounds is selected from ammoniacal liquor, aniline, ethamine, para hydroxybenzene amine or sulfanilamide (SN);
The said organic compound that contains the unsaturated double-bond class is selected from methyl methacrylate, vinyl cyanide or styrene;
The mean molecular weight that said high molecular polymer with vinyl benzene sulfonamide structure has is 3000-150000;
Said dispersion degree with high molecular polymer molecular weight of vinyl benzene sulfonamide structure is 1.1-10, the quality of vinyl benzene sulfonamide structure unit wherein than content at 10%-100%.
2. infrared positive thermal-sensitive offset element according to claim 1 is characterized in that: said infrared absorbing agents is the light absorbing dyestuff of absorption region in 700～1300nm.
3. infrared positive thermal-sensitive offset element according to claim 1 and 2 is characterized in that: the addition of said infrared absorbing agents accounts for 1.0～6wt% of imaging constituent total solid weight.
4. infrared positive thermal-sensitive offset element according to claim 1 and 2 is characterized in that: said infrared absorbing agents is selected from a kind of in anthraquinone dye, phthalocyanine dyestuff, quinoneimine dye, methine dyes or the cyanine dye.
5. infrared positive thermal-sensitive offset element according to claim 1 is characterized in that: said illuminating colour comprises one or both illuminating colours in ethyl violet, methyl violet, crystal violet, malachite green, bright green, victoria blue B, victoria blue R, Victoria blue 130, Victoria's ethereal blue.
6. positive thermal-sensitive offset element that uses the infrared laser scan exposure, it is characterized in that: this element is made up of following several parts:
(A) version base;
(B) barrier coating; Contain high molecular polymer with vinyl benzene sulfanilamide (SN) structure; This polymkeric substance is by chloride vinylbenzenesulfonic acid or vinylbenzenesulfonic acid salt; Warp reacts with the amido compounds and obtains the vinyl sulfamide monomer, and this monomer carries out free radical polymerization with the organic compound that contains the unsaturated double-bond class again and obtains then;
(C) the coating top layer is made up of alkali solubility phenolics, infrared absorbing agents and illuminating colour;
Said amido compounds is selected from ammoniacal liquor, aniline, ethamine, para hydroxybenzene amine or sulfanilamide (SN);
The said organic compound that contains the unsaturated double-bond class is selected from methyl methacrylate, vinyl cyanide or styrene;
The mean molecular weight that said high molecular polymer with vinyl benzene sulfonamide structure has is 3000-150000;
Said dispersion degree with high molecular polymer molecular weight of vinyl benzene sulfonamide structure is 1.1-10, the quality of vinyl benzene sulfonamide structure unit wherein than content at 10%-100%.
7. the positive thermal-sensitive offset element of use infrared laser scan exposure according to claim 6 is characterized in that: said infrared absorbing agents is the light absorbing dyestuff of absorption region in 700～1300nm.
8. according to the positive thermal-sensitive offset element of claim 6 or 7 described use infrared laser scan exposures, it is characterized in that: the addition of said infrared absorbing agents accounts for 1.0～6wt% of imaging constituent total solid weight.
9. according to the positive thermal-sensitive offset element of claim 6 or 7 described use infrared laser scan exposures, it is characterized in that: said infrared absorbing agents is selected from a kind of in anthraquinone dye, phthalocyanine dyestuff, quinoneimine dye, methine dyes or the cyanine dye.
10. the positive thermal-sensitive offset element of use infrared laser scan exposure according to claim 6 is characterized in that: said illuminating colour comprises one or both illuminating colours in ethyl violet, methyl violet, crystal violet, malachite green, bright green, victoria blue B, victoria blue R, Victoria blue 130, Victoria's ethereal blue.
11. the positive thermal-sensitive offset element of use infrared laser scan exposure according to claim 6 is characterized in that: said version base is the aluminum substrate that process electrolytic oxidation and surface hydrophilic were handled.
12. the positive thermal-sensitive offset element of use infrared laser scan exposure according to claim 6 is characterized in that: said barrier coating selectivity is added with infrared absorbing agents and illuminating colour.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009100595285A CN101907829B (en) | 2009-06-08 | 2009-06-08 | Positive heat-sensitive planographic plate and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009100595285A CN101907829B (en) | 2009-06-08 | 2009-06-08 | Positive heat-sensitive planographic plate and manufacturing method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101907829A CN101907829A (en) | 2010-12-08 |
| CN101907829B true CN101907829B (en) | 2012-07-04 |
Family
ID=43263325
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2009100595285A Expired - Fee Related CN101907829B (en) | 2009-06-08 | 2009-06-08 | Positive heat-sensitive planographic plate and manufacturing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101907829B (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102540728A (en) * | 2010-12-30 | 2012-07-04 | 乐凯华光印刷科技有限公司 | Positive image thermosensitive lithographic printing plate |
| CN102566280A (en) * | 2010-12-30 | 2012-07-11 | 乐凯华光印刷科技有限公司 | Positive thermosensitive lithographic printing plate containing photo-acid generator in bottom resin layer |
| CN105223778A (en) * | 2015-10-29 | 2016-01-06 | 成都华维印刷器材有限公司 | A kind of dual-layer heat-sensitive lithographic plate and preparation method thereof |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1232549A (en) * | 1996-10-02 | 1999-10-20 | 三洋化成工业株式会社 | Photosensitive composition and use thereof |
| US6143464A (en) * | 1997-07-28 | 2000-11-07 | Fuji Photo Film Co., Ltd. | Positive-working photosensitive composition for use with infrared laser |
| CN1334492A (en) * | 2000-07-07 | 2002-02-06 | 富士胶片株式会社 | Method for making lithographic plate |
| CN1512268A (en) * | 2002-12-27 | 2004-07-14 | ��ʿ��Ƭ��ʽ���� | Infrared sensitive lithographic printing plate |
| EP1462251A1 (en) * | 2003-03-28 | 2004-09-29 | Fuji Photo Film Co., Ltd. | Method for making lithographic printing plate |
-
2009
- 2009-06-08 CN CN2009100595285A patent/CN101907829B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1232549A (en) * | 1996-10-02 | 1999-10-20 | 三洋化成工业株式会社 | Photosensitive composition and use thereof |
| US6143464A (en) * | 1997-07-28 | 2000-11-07 | Fuji Photo Film Co., Ltd. | Positive-working photosensitive composition for use with infrared laser |
| CN1334492A (en) * | 2000-07-07 | 2002-02-06 | 富士胶片株式会社 | Method for making lithographic plate |
| CN1512268A (en) * | 2002-12-27 | 2004-07-14 | ��ʿ��Ƭ��ʽ���� | Infrared sensitive lithographic printing plate |
| EP1462251A1 (en) * | 2003-03-28 | 2004-09-29 | Fuji Photo Film Co., Ltd. | Method for making lithographic printing plate |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101907829A (en) | 2010-12-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101122745B (en) | Positive printing heat-sensitive lithographic printing planography and its preparation method | |
| BRPI0708379A2 (en) | positive heat sensitive lithographic printing plate precursor, method of manufacturing a lithographic printing plate and use of an alkaline soluble polymer | |
| CN101287601A (en) | Dual-layer heat-sensitive imageable elements with a polyvinyl acetal top layer | |
| CN104742492B (en) | A kind of double coating positive-printing heat-sensitive CTP plate materials | |
| CN102114725A (en) | Positive image thermosensitive lithographic plate forebody and plate-making method thereof | |
| CN103885286B (en) | A kind of positive heat-sensitive photosensitive composition and its application | |
| CN101907829B (en) | Positive heat-sensitive planographic plate and manufacturing method thereof | |
| CN101907826B (en) | Positive thermosensitive imaging composition | |
| DE60124154T2 (en) | Lithographic printing plate | |
| CN1690850B (en) | Negative thermosensitive offset matrix | |
| CN101762972B (en) | Infrared positive thermal-sensitive imaging composition | |
| CN100448669C (en) | Imageable element comprising sulfated polymers | |
| CN112693212B (en) | Environment-friendly single-layer thermosensitive plate and preparation method and application method thereof | |
| CN101762982B (en) | Infrared positive thermal-sensitive offset plate | |
| CN102285290B (en) | Positive thermo-sensitive lithographic plate precursor | |
| CN102566280A (en) | Positive thermosensitive lithographic printing plate containing photo-acid generator in bottom resin layer | |
| JP4243884B2 (en) | Photosensitive composition, printing plate precursor, and image forming method | |
| CN102248845B (en) | Positive thermo-sensitive lithographic printing plate precursor | |
| EP2086763B1 (en) | Multilayer imageable elements having good solvent resistance | |
| JP2002049147A (en) | Planographic printing plate | |
| CN105652592B (en) | Photosensitive composition of urethane-modified phenolic resin | |
| EP4261203B1 (en) | Iodonium salt initiator and processing-free thermally sensitive plate precursor containing thereof, and processing-free thermally sensitive plate and use thereof | |
| WO2005010613A1 (en) | Photosensitive lithography plate and method for producing same | |
| JP2002370467A (en) | Plate for offset lithographic printing | |
| JP4515730B2 (en) | Photosensitive composition and photosensitive lithographic printing plate |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| ASS | Succession or assignment of patent right |
Owner name: CHENGDU XINGRAPHICS CO., LTD. Free format text: FORMER OWNER: CHENGDU XINGRAPHICS PRINTING TECHNOLOGY CO., LTD. Effective date: 20120323 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 610063 CHENGDU, SICHUAN PROVINCE TO: 610500 CHENGDU, SICHUAN PROVINCE |
|
| TA01 | Transfer of patent application right |
Effective date of registration: 20120323 Address after: 610500, No. 79, Torch Road, two south section of Industrial Development Zone, Xindu District, Sichuan, Chengdu Applicant after: Chengdu Xingraphics Co.,Ltd. Address before: 610063, Chengdu, Chengdu, Jinjiang Industrial Park, three color road, No. 269 torch power port, B District, 8 blocks, Sichuan Applicant before: Chengdu Xintu Printing Technology Co.,Ltd. |
|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: Positive heat-sensitive planographic plate and manufacturing method thereof Effective date of registration: 20200420 Granted publication date: 20120704 Pledgee: China Minsheng Banking Corp Chengdu branch Pledgor: Chengdu Xingraphics Co.,Ltd. Registration number: Y2020980001620 |
|
| PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120704 |