CN101906654B - Method for purifying copper electrolyte with minimal chemical reacting dose - Google Patents

Method for purifying copper electrolyte with minimal chemical reacting dose Download PDF

Info

Publication number
CN101906654B
CN101906654B CN 201010230354 CN201010230354A CN101906654B CN 101906654 B CN101906654 B CN 101906654B CN 201010230354 CN201010230354 CN 201010230354 CN 201010230354 A CN201010230354 A CN 201010230354A CN 101906654 B CN101906654 B CN 101906654B
Authority
CN
China
Prior art keywords
copper
dearsenification
decopper
ing
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN 201010230354
Other languages
Chinese (zh)
Other versions
CN101906654A (en
Inventor
许健
陈德岩
杨洪光
郭天立
任书伟
未立清
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
HULUDAO ZINC INDUSTRY Co Ltd
Original Assignee
HULUDAO ZINC INDUSTRY Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by HULUDAO ZINC INDUSTRY Co Ltd filed Critical HULUDAO ZINC INDUSTRY Co Ltd
Priority to CN 201010230354 priority Critical patent/CN101906654B/en
Publication of CN101906654A publication Critical patent/CN101906654A/en
Application granted granted Critical
Publication of CN101906654B publication Critical patent/CN101906654B/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Electrolytic Production Of Metals (AREA)

Abstract

The invention relates to a method for purifying copper electrolyte, which belongs to the technical field of wet-process metallurgy. High-purity cathode copper, crude copper sulphate, black copper and nickel are obtained by the following steps of: removing copper by electro-deposition; evaporating and condensing liquid in vacuum after copper removal; crystallizing condensate after the copper removal to obtain copper sulfate; preparing electrolyte from which arsenic is removed; removing arsenic by the electro-deposition; and performing filter pressing on black copper slurry. Due to the adoption of the method of the invention, the electrolyte can be purified during copper electro-deposition and the arsenic is removed in the form of an arsenic-copper alloy, so that the production of hydrogen arsenide is controlled and the technical problem of realizing the purification of the copper electrolyte is solved. The method has the advantages of capability of preventing invalid removal of the copper and effectively controlling the separation of polluting AsH3, simple operation, low energy consumption and suitability for copper electrolytic purification process.

Description

A kind of method for purifying copper electrolyte
Technical field
What the present invention relates to is a kind of method for purifying copper electrolyte of technical field of wet metallurgy.
Background technology
The method of electrodeposition is mostly adopted in the at home purification dearsenification of electrolytic solution in the cupric electrolysis production process.
Early stage normal operation extremely takes off method, two sections dearsenification methods.The characteristics of these two kinds of methods are that copper is preferentially separated out, and when copper ion concentration was reduced to a certain degree, arsenic just began to separate out, and produced a large amount of AsH 3Gas.Because low, a large amount of copper of dearsenification efficient is disabled and removes, power consumption is high, a large amount of AsH 3The reasons such as γ-ray emission, so these two kinds of methods are eliminated in larger smeltery.
Introduced revulsion from Japan afterwards, domestic well-known large smeltery is these methods of using at present more.Although this method dearsenification efficient increases, but still exist a certain amount of copper be disabled remove, power consumption is high, electrolyzer needs the shortcomings such as peculiar set-up, thereby inevitably increased the dearsenification cost.
The several method that also has in addition domestic rare application: periodic reverse current electrodeposition dearsenification method, limit current density electrodeposition dearsenification method, control cathode electromotive force electrodeposition dearsenification method.This several method exists needs the shortcoming that specific installation disposes, current density is low, the process parameter control accuracy requirement high, power consumption is high, therefore is not widely used.
In recent years, method of dearsenic by parallel circulating continuous electric formation has been invented by certain smeltery, and is more advanced.But any one behind the copper sulfate mother liquor that its two sections copper liberation cell bulking liquors are unspecified element, the decopper(ing) in liquid, the electrolytic solution, the part groove is the terminal point groove, still exists copper and is disabled the shortcoming that removes.
In sum, present employed arsenic removing method in various degree exist copper to be disabled to remove, power consumption height and AsH 3The problem of γ-ray emission.
Summary of the invention
Be disabled and remove and produce AsH in order to overcome electrolyte purification process copper 3Shortcoming, the present invention proposes a kind of method for purifying copper electrolyte.The method is obtained cathode copper, thick copper sulfate, black copper and nickel by electrodeposition decopper(ing) and dearsenification step from copper electrolytic process, solve simultaneously the technical problem of cleaning copper electrolyte.
The scheme that technical solution problem of the present invention adopts is:
1, electrodeposition decopper(ing) step 1: in cuprum-doffing electrolytic tank, inject the copper electrolyte that comes from potroom, make anode with stereotype, as negative electrode, between anode and negative electrode, pass into direct current with stainless steel plate, electrolyte temperature is controlled between 45-65 ℃, and current density is controlled at 190-330A/m 2Between.Under the effect of electric current, cupric ion is deposited on the stainless steel cathode, the fine copper of deposition cupric 99.9935%, arsenic, nickel impurity metal reside in the electrolytic solution, in electrolytic solution, also have the existence of cupric ion, liquid behind the generation decopper(ing), the liquid copper ion concentration is down to 38-40g/L behind the decopper(ing).
2, liquid vacuum evaporation step 2 behind the decopper(ing): liquid behind the decopper(ing) is joined in the vacuum-evaporator, and heating, makes the evaporation of the part moisture in the liquid behind the decopper(ing), make decopper(ing) after liquid concentrated, form concentrated solution behind the decopper(ing).
3, concentrated solution cupric sulfate crystals step 3 behind the decopper(ing): concentrated solution behind the decopper(ing) is joined in the water mold, and the crystallization control liquid temp is between 425-31 ℃, cupric sulphate crystal in the decopper(ing) concentrated solution, form thick copper sulfate and cupric sulfate crystals mother liquor, the copper arsenic in the cupric sulfate crystals mother liquor is than being 1.7-2.5: 1.
4, dearsenification electrolyte quota step 4: the cupric sulfate crystals mother liquor is joined in the dearsenification electrolyte quota groove, and mix with liquid after the dearsenification, be equipped to copper ion concentration at 5-7g/l, ω Cu: ω AsBe 1.7-2.5: 1 dearsenification electrolytic solution.
5, electrodeposition dearsenification step: dearsenification electrolytic solution is injected in the dearsenification electrolyzer, makes anode with stereotype, as negative electrode, pass into electric current with stainless steel plate between anode and negative electrode, electrolyte temperature is controlled at 58-65 ℃, and current density is controlled at 160-330A/m 2, under the effect of electric current, the copper in the electrolytic solution and arsenic form the copper arsenic alloy, are called black copper.Isolate black copper and carry out the black copper treatment process, and after the dearsenification after liquid and the press filtration liquid partly enter the nickel treatment process, part is sent potroom back to.Wherein liquid partly is sent in the dearsenification electrolyte quota groove after the dearsenification, is used for being mixed with dearsenification electrolytic solution with the cupric sulphate crystal mother liquor.
6, black copper slurry press filtration step: isolate black copper through the black copper slurry that produces after the electrodeposition dearsenification through press filtration, liquid is sent potroom back to after the press filtration.
Positively effect adopts the inventive method, can purify electrolytic solution in electro deposited copper, and arsenic is removed in the mode of arsenical copper, controls the generation of hydrogen arsenide with this, realizes the cleaning copper electrolyte technical problem with minimum chemical reaction amount.Can avoid the invalid of copper to remove, effectively control the AsH with contaminative 3Separate out, energy consumption simple to operate is low.Suit in the cleaning copper electrolyte process, to use.
Description of drawings:
Fig. 1 is schema of the present invention.
Among the figure, 1. electrodeposition decopper(ing), 2. vacuum-evaporation, 3. water-cooled crystallization, 4. dearsenification electrolyte quota, 5. electrodeposition dearsenification, 6. press filtration.
Embodiment
The blister copper plate obtains fine copper by electrolysis, and in electrolytic process, transfer is deposited as high-purity copper from anode to negative electrode on electrode along with copper.Because contain the foreign metals such as arsenic, nickel in the blister copper, in electrolytic process, these impurity reside in the electrolytic solution, along with the accumulation of impurity, cause power consumption high, chemical ingredients and Quality Down, the chemical reaction amount is large.Based on this state, the present invention adopts following method and step, with the chemical reacting weight of minimum copper electrolyte is purified.
The below is elaborated with technical process shown in Figure 1
1, electrodeposition decopper(ing) step 1: in cuprum-doffing electrolytic tank, inject the copper electrolyte that comes from potroom, make anode with stereotype, as negative electrode, between anode and negative electrode, pass into direct current with stainless steel plate, the control electrolyte temperature is between 45-65 ℃, and the control current density is 190-330A/m 2Between.Under the effect of electric current, the cupric ion in the electrolytic solution is deposited on the stainless steel cathode, forms Cu-CATH-1, arsenic, nickel impurity metal reside in the electrolytic solution, in electrolytic solution, also have a small amount of cupric ion to exist, liquid behind the generation decopper(ing), the liquid copper ion concentration is down to 38-40g/L behind the decopper(ing).
2, liquid vacuum evaporation step 2 behind the decopper(ing): liquid behind the decopper(ing) is joined in the vacuum-evaporator, and heating, makes the evaporation of the part moisture in the liquid behind the decopper(ing), make decopper(ing) after liquid concentrated, form concentrated solution behind the decopper(ing).
3, concentrated solution cupric sulfate crystals step 3 behind the decopper(ing): concentrated solution behind the decopper(ing) is joined in the water mold, and the crystallization control liquid temp is between 5-10 ℃, cupric sulphate crystal in the decopper(ing) concentrated solution, form thick copper sulfate and cupric sulfate crystals mother liquor, the copper arsenic in the cupric sulfate crystals mother liquor is than being 1.7-2.5: 1.
4, dearsenification electrolyte quota step 4: the cupric sulfate crystals mother liquor is joined in the dearsenification electrolyte quota groove, and mix with liquid after the dearsenification, be equipped to copper ion concentration at 5-7g/l, ω Cu: ω AsBe 1.7-2.5: 1 dearsenification electrolytic solution.
5, electrodeposition dearsenification step: dearsenification electrolytic solution is injected in the dearsenification electrolyzer, makes anode with stereotype, as negative electrode, pass into electric current with stainless steel plate between anode and negative electrode, electrolyte temperature is controlled at 58-65 ℃, and current density is controlled at 160-330A/m 2, under the effect of electric current, the copper in the electrolytic solution and arsenic form the copper arsenic alloy and are called black copper.Isolate black copper and carry out the black copper treatment process, and after the dearsenification after liquid and the press filtration liquid partly enter the nickel treatment process, part is sent potroom back to.Wherein liquid partly is sent in the dearsenification electrolyte quota groove after the dearsenification, is used for being mixed with dearsenification electrolytic solution with the cupric sulphate crystal mother liquor.
6, black copper slurry press filtration step: isolate black copper through the black copper slurry that produces after the electrodeposition dearsenification through press filtration, liquid is sent potroom back to after the press filtration.
By control bulking liquor internal circulating load and current density, make press filtration after the liquid copper ion concentration be controlled at 0.5-2g/L, establishment AsH 3In the situation about separating out, arsenic is efficiently removed with the form of arsenical copper, and generate Cu as much as possible 2As.
In electrodeposition dearsenification step, under the effect of electric current, part copper is combined with arsenic and is formed arsenical copper, thereby has removed arsenic in electrolytic solution, and prevents that arsenic is combined the generation hydrogen arsenide with hydrogen ion.
In decopper(ing) and dearsenification process, used chemical substance is minimum, the chemical reaction amount is minimum, thereby reaction thoroughly, and idle work consumes little, under the prerequisite that does not add other cleaning copper electrolyte material, by the cupric ion of self and effective combination of arsonium ion in the electrolytic solution, deviate from copper and arsenic wherein, copper electrolyte has been purified, and can reuses.
Dearsenification electrolyzer used in the present invention is the terminal point groove.
Advantage of the present invention:
1, because the present invention follows minimum chemical reacting weight principle, invalid in the dearsenification process, low validity response is reached minimize, the product minimum number has avoided the invalid of copper to remove to greatest extent, thereby effectively reduces dearsenification power consumption and cost.
2, the advantage that the present invention has efficiently, throughput is large, current density can be up to 330A/m 2, dearsenification efficient reaches more than 90%.In the same process situation, required dearsenification electrolyzer is minimum.
3, the present invention can by effective fixed action of copper arsenic alloy, effectively control the AsH with contaminative 3Separate out.
4, the processing parameter of control required for the present invention is few, and is simple to operate.
5, electrolytic solution feed liquid way of the present invention can reduce concentration polarization, improves current density

Claims (2)

1. method for purifying copper electrolyte is characterized in that:
1), electrodeposition decopper(ing) step 1: in cuprum-doffing electrolytic tank, inject the copper electrolyte that comes from potroom, make anode with stereotype, as negative electrode, between anode and negative electrode, pass into direct current with stainless steel plate, the control electrolyte temperature is controlled between 45-65 ℃, and the control current density is 190-330A/m 2Between, under the effect of electric current, cupric ion is deposited on the stainless steel cathode, form 99.9935% cathode copper, arsenic, nickel impurity metal reside in the electrolytic solution, also have the existence of cupric ion in electrolytic solution, liquid behind the generation decopper(ing), the liquid copper ion concentration is down to 38-40g/L behind the decopper(ing);
2), liquid vacuum evaporation step 2 behind the decopper(ing): liquid behind the decopper(ing) is joined in the vacuum-evaporator, and heating, makes the part moisture evaporation in the liquid behind the decopper(ing), make decopper(ing) after liquid concentrated, form concentrated solution behind the decopper(ing);
3), concentrated solution cupric sulfate crystals step 3 behind the decopper(ing): concentrated solution behind the decopper(ing) is joined in the water mold, and the crystallization control liquid temp is between 25-31 ℃, cupric sulphate crystal in the decopper(ing) concentrated solution, form thick copper sulfate and cupric sulfate crystals mother liquor, the copper arsenic in the cupric sulfate crystals mother liquor is than being 1.7-2.5: 1;
4), dearsenification electrolyte quota step 4: the cupric sulfate crystals mother liquor is joined in the dearsenification electrolyte quota groove, and mix with liquid after the dearsenification, be equipped to copper ion concentration at 5-7g/l, ω Cu: ω AsBe 1.7-2.5: 1 dearsenification electrolytic solution;
5), electrodeposition dearsenification step: dearsenification electrolytic solution is injected in the dearsenification electrolyzer, makes anode with stereotype, as negative electrode, pass into electric current with stainless steel plate between anode and negative electrode, electrolyte temperature is controlled at 58-65 ℃, and current density is controlled at 160-330A/m 2Under the effect of electric current, copper in the electrolytic solution and arsenic form the copper arsenic alloy and are called black copper, isolate black copper and carry out the black copper treatment process, and after the dearsenification after liquid and the press filtration liquid partly enter the nickel treatment process, part is sent potroom back to, and wherein liquid partly is sent in the dearsenification electrolyte quota groove after the dearsenification, is used for being mixed with dearsenification electrolytic solution with the cupric sulphate crystal mother liquor;
6), black copper slurry press filtration step: isolate black copper through the black copper slurry that produces after the electrodeposition dearsenification through press filtration, liquid is sent potroom back to after the press filtration.
2. a kind of method for purifying copper electrolyte according to claim 1, it is characterized in that: the dearsenification electrolyzer is the terminal point groove.
CN 201010230354 2010-07-19 2010-07-19 Method for purifying copper electrolyte with minimal chemical reacting dose Expired - Fee Related CN101906654B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 201010230354 CN101906654B (en) 2010-07-19 2010-07-19 Method for purifying copper electrolyte with minimal chemical reacting dose

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 201010230354 CN101906654B (en) 2010-07-19 2010-07-19 Method for purifying copper electrolyte with minimal chemical reacting dose

Publications (2)

Publication Number Publication Date
CN101906654A CN101906654A (en) 2010-12-08
CN101906654B true CN101906654B (en) 2013-02-13

Family

ID=43262232

Family Applications (1)

Application Number Title Priority Date Filing Date
CN 201010230354 Expired - Fee Related CN101906654B (en) 2010-07-19 2010-07-19 Method for purifying copper electrolyte with minimal chemical reacting dose

Country Status (1)

Country Link
CN (1) CN101906654B (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102181668B (en) * 2011-03-02 2013-01-30 广西壮族自治区地质矿产测试研究中心 Method for jointly extracting arsenic from high-arsenic manganese ore tailings
CN102345143B (en) * 2011-10-09 2014-01-15 中南大学 Method for separating copper, arsenic and nickel and purifying copper electrolyte
CN102633392A (en) * 2012-05-04 2012-08-15 山东建筑大学 Cyclic utilization of waste liquor in small sulfate copper plating process test
CN103147094B (en) * 2013-02-07 2015-07-01 李东 Process for deep copper removal through electrodeposition
CN106521184A (en) * 2016-11-04 2017-03-22 金少平 Process for extracting copper sulfate through waste copper scraps
CN109252189A (en) * 2018-10-30 2019-01-22 金川集团股份有限公司 A kind of method that high purity copper is extracted in waste solution of copper electrolysis purification
CN110938842A (en) * 2019-12-06 2020-03-31 中国瑞林工程技术股份有限公司 Copper electrolyte purification method
CN112662879A (en) * 2020-12-11 2021-04-16 广西金川有色金属有限公司 Efficient method for extracting nickel sulfate from copper electrolysis waste liquid
CN112725844B (en) * 2020-12-21 2023-04-07 万载志成实业有限公司 Electrolyte purification method for electrolytic copper production process
CN115074784A (en) * 2021-03-10 2022-09-20 中国科学院过程工程研究所 Method for efficiently removing arsenic through electrolysis in refined copper electrolyte

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1560289A (en) * 2004-02-27 2005-01-05 云南铜业股份有限公司 Method of dearsenic by parallel circulating continuous electric formation
CN101717960A (en) * 2009-12-07 2010-06-02 郑雅杰 Method for purifying copper electrolyte by using chemical reduction method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1560289A (en) * 2004-02-27 2005-01-05 云南铜业股份有限公司 Method of dearsenic by parallel circulating continuous electric formation
CN101717960A (en) * 2009-12-07 2010-06-02 郑雅杰 Method for purifying copper electrolyte by using chemical reduction method

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
丁昆等.铜电解净液过程中砷的脱除.《有色冶炼》.2003,(第5期),全文. *
吴文明.金隆电积脱铜脱砷生产实践.《有色冶炼》.2000,第29卷(第4期),全文. *
陈白珍等.电积法脱铜脱砷的现状与进展.《有色金属(冶炼部分)》.1998,(第3期),全文. *

Also Published As

Publication number Publication date
CN101906654A (en) 2010-12-08

Similar Documents

Publication Publication Date Title
CN101906654B (en) Method for purifying copper electrolyte with minimal chemical reacting dose
CN109763143B (en) Resource recycling method for waste lead-acid batteries
CN1186478C (en) Waste lead battery lead recovery process
CN109803924A (en) The preparation method of lithium compound
CN102031380A (en) Method and device for recovering metallic lead from lead plaster of waste lead-acid storage battery
CN113957459A (en) Method for producing bromine and caustic soda by electrolyzing sodium bromide through ion membrane
CN101353727A (en) Method for reclaiming silver and copper in silver-copper alloy scrap
CN107699918A (en) A kind of production technology of L cysteine hydrochlorides
CN108018582A (en) A kind of preparation method of electron level sulfamic acid stannous
CN203200349U (en) Diaphragm electrolytic cell for preparing high-purity cobalt
CN104694978A (en) Waste electrolyte treatment method and device
CN102367577A (en) Method for preparing Na2[Pb(OH)4] solution and method for recycling lead from lead-containing waste
CN109536982A (en) Preparation method of nano tin dioxide
JPH02213492A (en) Electrode for electrolytic cell for recovering metal from metal-containing ore or concentrate and its manufacture
CN102094215A (en) Horizontal movement type continuous electrolytic method and device of lead in regenerative lead-containing material
CN109179801B (en) Treatment method of trivalent chromium electroplating waste liquid
US3406108A (en) Regeneration of spent ammonium persulfate etching solutions
CN113584529B (en) Method and equipment for non-equipotential solid-phase electrowinning of metallic lead powder from waste lead battery paste
CN113652717B (en) Recovery process of ITO waste target material
CN114016034A (en) Recycling treatment method of etching waste liquid mixed acid
Liu et al. Pulse cyclone electrowinning of gallium recovery for higher current efficiency and lower energy consumption
CN114016047A (en) Copper sulfate pentahydrate crystal and preparation method thereof
CN112941565B (en) Preparation method of high-purity tin
CN216891256U (en) Metallurgical ion-exchange membrane electrolytic cell
CN106854765A (en) The process that waste cell melt is reclaimed in a kind of fluorine gas production process

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20130213

Termination date: 20190719