CN101905916A - Device and method for processing organic wastewater by using plasma technology - Google Patents
Device and method for processing organic wastewater by using plasma technology Download PDFInfo
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- CN101905916A CN101905916A CN 201010266970 CN201010266970A CN101905916A CN 101905916 A CN101905916 A CN 101905916A CN 201010266970 CN201010266970 CN 201010266970 CN 201010266970 A CN201010266970 A CN 201010266970A CN 101905916 A CN101905916 A CN 101905916A
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Abstract
The invention discloses a method for processing wastewater by using a plasma technology, which comprises the following steps: providing an incline surface; forming a water film on the incline surface by sewage; arranging a positive pole with emission stab above the water film and taking the incline surface as a negative pole; and applying a voltage capable of exciting a plasma between the positive pole and the negative pole to form the plasma so as to achieve the aim of purifying impurities in the sewage. The invention has the advantage that radicals such as OH, HO2, O and the like and O3 with extremely strong oxidability in the low-temperature plasma are adopted to replace chemical agents in the prior art, and the organic content in the waste water is removed by the strong oxidability; and in the whole process of the invention, only electric energy is consumed and the device of the invention is a clean and cheap sewage treatment unit.
Description
[technical field]
The present invention relates to relate to a kind of device and method that adopts lower temperature plasma technology to handle high concentrated organic wastewater, relate in particular to a kind of with trade effluent form moisture film by the discharge of plasma in low temperature device to remove the method and the device of organic content.
[background technology]
Along with improving constantly of process of industrialization, environmental consciousness becomes the emphasis of people's growing interest.A large amount of trade effluents directly enter rivers and lakes causes environmental pollution serious day by day, some compositions are simple, the industrial organic waste water of readily biodegradable all is able to effective processing by materialization, anaerobism, conventional combination technology such as aerobic, but for the organic waste water of high toxicity, the difficult biodegrade of high density (as: more than the COD50000PPM), the trade effluent that produces as industries such as medication chemistry, coking, fuel then fails to find an ideal treatment process because of technology and economic cause.Therefore, the trade effluent technology of seeking effective processing high density, difficult degradation becomes the research focus of domestic and international academia.
At present, the general industrial wastewater treatment is with an oxidation+anaerobism+oxygen+aerobic built-up type purification process that waits,
Oxygenant commonly used has hydrogen peroxide, liquid chlorine, Losantin etc., in use is prone to problems such as oxidation effectiveness is undesirable, working cost height, and this becomes the Root of Clark Clematis of this class wastewater treatment all the time, is a great problem of environment protection treating.
[summary of the invention]
Technical problem to be solved by this invention is, provide a kind of high energy particle that produces by lower temperature plasma technology that high-concentration industrial-water is administered front-end processing and carry out the method and the device thereof of oxidation by force, and possess two significant advantages thus with strong oxidizing property; 1) raising is to the oxidisability of waste water, 2) reduction running cost.
In order to address the above problem, the invention provides a kind of method of using plasma technical finesse organic waste water, comprise the steps: to provide an inclined surface; Make sewage on inclined surface, form moisture film; Above moisture film, be provided with the positive pole of emission thorn, and be negative pole with described inclined surface; Between positive pole and negative pole, apply can activated plasma voltage, to form plasma body, reach aim of purifying.
The present invention further provides the device that a kind of using plasma carries out sewage disposal, having comprised: a negative plate, described negative plate is obliquely installed; One positive plate is arranged on the negative plate top, and a plurality of emission thorns are being set on the surface of negative plate; One tank is arranged on the higher side of negative plate, and the water outlet of tank is towards the surface of negative plate; One power supply is connected with negative plate electricity with positive plate, with produce can activated plasma voltage.
As optional technical scheme, described device also comprises an inclination adjusting device, is arranged on a certain end of negative plate, can adjust the height of this end of negative plate, thereby adjusts the flow velocity of the inclined degree of negative plate with control surface.
As optional technical scheme, described device also comprises a water reservoir and a water pump, the water-in of described water reservoir and negative plate are than a low side UNICOM, and described water pump connects water reservoir and tank, are used for water reservoir through carrying out circularly purifying in the water introducing tank that purifies.Comprise that also one is arranged on the upflow tube between tank and the water reservoir, the maximum of upflow tube corresponding tank in the position of tank split shed allows water level, and the effect of this upflow tube is to prevent that the tank median water level from overflowing.
As optional technical scheme, described device comprises that also one is arranged on the baffle plate at tank water outlet place, and the lower end of described baffle plate is surperficial parallel with negative plate, and can move up and down, and described baffle plate can be adjusted the aquifer yield of tank.
The invention has the advantages that, adopt a large amount of OH in the low-temperature plasma, HO
2, free radical and the extremely strong O of oxidisability such as O
3Replace chemical agent of the prior art, remove organic content in the waste water by strong oxidizing property, the entire treatment process is consumed power only, is a kind of clean cheap method of wastewater treatment and device.
[description of drawings]
It shown in the accompanying drawing 1 the apparatus structure synoptic diagram of the specific embodiment of the present invention.
Accompanying drawing 2 is accompanying drawing 1 described device synoptic diagram after having installed loam cake additional.
Accompanying drawing 3 is accompanying drawing 2 sectional views along the AA direction.
[embodiment]
Next introduce using plasma of the present invention in conjunction with the accompanying drawings in detail and carry out the method for wastewater treatment and the embodiment of device thereof.
Be the apparatus structure synoptic diagram of present embodiment shown in the accompanying drawing 1, comprise: a negative plate that is obliquely installed 10; One is arranged on the positive plate 20 of negative plate 10 tops, and a plurality of emissions thorns 21 are being set on the surface of the positive plate 20 of negative plate 10; One is arranged on the tank 30 of negative plate 10 higher sides, and the water outlet 31 of tank 30 is towards the surface of negative plate 10; The one power supply (not shown) that is connected with negative plate 10 electricity with positive plate 20, with produce can activated plasma voltage.This device further is provided with following selectable unit (SU): one is arranged on the inclination adjusting device 40 of negative plate 10 higher ends; One water reservoir 50; One water pump 60; One is arranged on the upflow tube 70 between tank 30 and the water reservoir 50.
Accompanying drawing 2 is accompanying drawing 1 described device synoptic diagram after having installed loam cake 90 additional.The positive plate 20 and the negative plate 10 of device are sealed in loam cake 90 inside, can prevent that like this plasma body is directly exposed to the danger that causes electric shock in the environment.
Accompanying drawing 3 is accompanying drawing 2 sectional views along the AA direction, from then on can see a plurality of porcelain insulators 80 in the sectional view.Porcelain insulator 80 is used for positive plate 20 liftings are fixed on the upper surface of negative plate 10, and can guarantee that between negative plate 10 and the positive plate 20 be insulating.Accompanying drawing 3 is the structural representation shown in the respective figure 1 along the section of BB direction.
With reference to figures 1 through accompanying drawing 3, this device provides a surface that tilts by the negative plate 10 that is obliquely installed.When filtering sewage, sewage is flowed out from the water outlet of tank 30, on the surface that tilts, form moisture film.Owing to be provided with the positive pole that has emission thorn above moisture film, and this inclined surface is as negative pole, by power supply between positive pole and negative pole, apply can activated plasma voltage, promptly can form plasma body.Water molecules (H in the sewage
2O) under the effect of plasma excitation condition, can decomposite a large amount of OH, HO
2, free radical and the extremely strong O of oxidisability such as O
3, these materials all have strong oxidizing property, so the organism in the sewage etc. can be by rapid oxidation under the effect of impurity at plasma body, thereby reach aim of purifying.Here adopt the high energy particle in the low-temperature plasma to replace chemical agent of the prior art with strong oxidizing property, remove organic content in the decontaminated water by strong oxidizing property, the entire treatment process is consumed power only, therefore is a kind of cheap waste disposal plant that cleans.
This device further is provided with following selectable unit (SU)s.
One is arranged on the inclination adjusting device 40 of negative plate 10 higher ends, can adjust the height of negative plate 10 higher ends, thereby adjusts the flow velocity of the inclined degree of negative plate 10 with control surface.The height of rising inclination adjusting device 40 can improve the inclined degree of negative plate 10.Described inclination adjusting device 40 can adopt common lifting device in any mechanical field, for example can be that an end is fixed on negative plate 10 back sides, and the connecting rod that the other end can move up and down along a draw-in groove of vertical negative plate 10, also can be have screw thread can be along push rod that moves up and down perpendicular to negative plate 10 directions etc.Inclination adjusting device 40 also can be arranged on the lower end of negative plate, can improve the inclined degree of negative plate 10 by the height that reduces this end.Obviously, the inclined degree of negative plate 10 is more little, and the speed of current is just slow more, and is also just high more to the elite efficient of sewage, and the purpose of therefore adjusting negative plate 10 thickness is to adjust the degree of purification of sewage.The inclined degree that can reduce negative plate 10 for messy sewage is with the raising degree of purification, and for relative not too dirty sewage, the inclined degree that can suitably increase negative plate 10 is to improve the water purification amount of unit time.
One water reservoir 50, the low side UNICOM of the water-in of this water reservoir 50 and negative pole 10 plates; One water pump 60,60 water-ins of water pump are connected to water reservoir 50, and water outlet is connected to tank 30, is used for water reservoir 50 through carrying out circularly purifying in the water introducing tank 30 that purifies.Obviously the volume of water reservoir 50 is more preferably greater than the volume of tank 30, can hold more recirculation water.
Under the situation that is provided with water reservoir 50 and tank 30, upflow tube 70 between tank 30 and water reservoir 50 can also optionally be set, the maximum of upflow tube 70 corresponding tank 30 in the position of tank 30 split sheds allows water level, and the effect of this upflow tube 70 is to prevent that tank 30 median water level from overflowing.In case the water of tank 30 is higher than the maximum water level that allows, the water that exceeds will be back to water reservoir 50 by this upflow tube 70.Because water pump 60 can not be in full accord to the drainage speed of the water storage speed of tank 30 and tank 30, in case water pump 60 is slightly larger than tank 30 water displacement to the pondage of tank 30, this upflow tube 70 can prevent that water stopping trough overflows, and avoids the maintenance personnel at any time tank 30 to be monitored.
This device can also comprise that one is arranged on the baffle plate (not shown) at tank water outlet place.The lower end of described baffle plate is surperficial parallel with negative plate, and can move up and down, and described baffle plate can be adjusted the aquifer yield of tank, thereby is adjusted at the thickness of the moisture film that negative plate 10 surface currents cross.Obviously, water film thickness is thin more, and is high more to the elite efficient of sewage, and the purpose of therefore adjusting the thickness of moisture film is to adjust the degree of purification of sewage.The thickness that can reduce moisture film for messy sewage is with the raising degree of purification, and for relative not too dirty sewage, the thickness that can suitably increase moisture film is to improve the water purification amount of unit time.
The previously described preferred implementation of the present invention is in order to illustrate and to describe purpose of the present invention.Should not limit the present invention within the disclosed content, also might be by coming from the enlightenment in the above-mentioned record content and practice of the present invention being obtained adjustment of the present invention and change.Therefore, the given embodiment of the present invention is not restriction but explains technical spirit of the present invention that protection scope of the present invention is not limited by embodiment.Protection scope of the present invention should be determined by claim, is equal to replacement and also should be considered as not exceeding protection scope of the present invention of the present invention.
Claims (6)
- A using plasma technical finesse organic waste water method, it is characterized in that, comprise the steps:One inclined surface is provided;Make sewage on inclined surface, form moisture film;Above moisture film, be provided with the positive pole of emission thorn, and be negative pole with described inclined surface;Between positive pole and negative pole, apply can activated plasma voltage, to form plasma body, reach aim of purifying.
- 2. the device of a using plasma technical finesse organic waste water is characterized in that, comprising:One negative plate, described negative plate is obliquely installed;One positive plate is arranged on the negative plate top, and a plurality of emission thorns are being set on the surface of negative plate;One tank is arranged on the higher side of negative plate, and the water outlet of tank is towards the surface of negative plate;One power supply is connected with negative plate electricity with positive plate, with produce can activated plasma voltage.
- 3. device according to claim 2 is characterized in that, also comprises an inclination adjusting device, is arranged on a certain end of negative plate, can adjust the height of this end of negative plate, thereby adjusts the flow velocity of the inclined degree of negative plate with control surface.
- 4. device according to claim 2 is characterized in that, also comprises a water reservoir and a water pump, the low side UNICOM of the water-in of described water reservoir and negative plate, and described water pump connects water reservoir and tank,Be used for water reservoir through carrying out circularly purifying in the water introducing tank that purifies.
- 5. device according to claim 4, it is characterized in that, comprise that also one is arranged on the upflow tube between tank and the water reservoir, the maximum of upflow tube corresponding tank in the position of tank split shed allows water level, and the effect of this upflow tube is to prevent that the tank median water level from overflowing.
- 6. device according to claim 2 is characterized in that, comprises that also one is arranged on the baffle plate at tank water outlet place, and the lower end of described baffle plate is surperficial parallel with negative plate, and can move up and down, and described baffle plate can be adjusted the aquifer yield of tank.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201010266970 CN101905916A (en) | 2010-08-27 | 2010-08-27 | Device and method for processing organic wastewater by using plasma technology |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201010266970 CN101905916A (en) | 2010-08-27 | 2010-08-27 | Device and method for processing organic wastewater by using plasma technology |
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| CN101905916A true CN101905916A (en) | 2010-12-08 |
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| CN 201010266970 Pending CN101905916A (en) | 2010-08-27 | 2010-08-27 | Device and method for processing organic wastewater by using plasma technology |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102351282A (en) * | 2011-08-12 | 2012-02-15 | 宁波大学 | Device and method for treating difficultly degraded organic waste water by plasma technology |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201071317Y (en) * | 2007-07-11 | 2008-06-11 | 大连理工大学 | Corona discharge plasma body device for treatment of water |
| CN101215027A (en) * | 2007-12-26 | 2008-07-09 | 南京大学 | Method and device for treating waste water by employing low-temperature plasma technique |
-
2010
- 2010-08-27 CN CN 201010266970 patent/CN101905916A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201071317Y (en) * | 2007-07-11 | 2008-06-11 | 大连理工大学 | Corona discharge plasma body device for treatment of water |
| CN101215027A (en) * | 2007-12-26 | 2008-07-09 | 南京大学 | Method and device for treating waste water by employing low-temperature plasma technique |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102351282A (en) * | 2011-08-12 | 2012-02-15 | 宁波大学 | Device and method for treating difficultly degraded organic waste water by plasma technology |
| CN102351282B (en) * | 2011-08-12 | 2013-04-24 | 宁波大学 | Device and method for treating difficultly degraded organic waste water by plasma technology |
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Open date: 20101208 |