CN101901660A - Amorphous wire-containing electromagnetic-wave absorbing material and preparation method theroef - Google Patents
Amorphous wire-containing electromagnetic-wave absorbing material and preparation method theroef Download PDFInfo
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- CN101901660A CN101901660A CN200910238377XA CN200910238377A CN101901660A CN 101901660 A CN101901660 A CN 101901660A CN 200910238377X A CN200910238377X A CN 200910238377XA CN 200910238377 A CN200910238377 A CN 200910238377A CN 101901660 A CN101901660 A CN 101901660A
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- amorphous wire
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Abstract
The invention relates to an amorphous wire-containing electromagnetic-wave absorbing material and a preparation method theroef, in particular relating to an electromagnetic-wave absorbing material, which is characterized by comprising an amorphous wire and a matrix material, wherein the amorphous wire is utilized as a wave absorbing component. The invention also relates to the preparation method of the electromagnetic-wave absorbing material, comprising the steps of (1) preparing the amorphous wire and (2) arranging the amorphous wire on the matrix material by a coiling mode.
Description
Technical field
The invention belongs to field of magnetic material, relate to a kind of electromagnetic wave absorbent material that contains the amorphous wire material and preparation method thereof.
Background technology
At present, with mobile phone, notebook computer and Digital Video etc. be the novel mobile electronic product of representative to the development of small-sized, multifunctional direction, the key technology of wherein taking is high frequencyization, digitlization and integrated.Yet consequent electromagnetic interference is on the rise and has produced many-sided negative effect.The effect of absorption-type electromagnetic shielding material is by various loss mechanism incident electromagnetic wave to be converted to heat energy or other forms of energy, makes electromagnetic wave neither to outside transmission, also not to internal reflection, is a kind of method of effective inhibition electromagnetic interference.Electromagnetic wave absorbent material commonly used usually with ferrite or amorphous powder as wave absorbing agent, with compound type or the coating type absorbing material of laminating of polymer.
Ferrite Material has ferromagnetic resonance and absorbs and the magnetic permeability scattering effect, and self-resistance rate height is good wave absorbing agent, is widely used in the stealth technology field.Owing to be difficult to be combined into the high-absorbility sheet type absorbing material of thickness, it be very limited in mobile phone, notebook computer and portable digital product less than 1mm.
Amorphous powdered alloy has good soft magnet performance and higher resistivity, is the preferred material of high-frequency electromagnetic wave absorbent.Hitachi Metals is developed " ABSORSHIELD K-E " serial electromagnetic wave absorbent material, adopts the single roller rapid quenching method to prepare amorphous thin ribbon, by the method for mechanical alloying strip is pulverized, simultaneously with SiO again
2Be coated on the amorphous powder, be pressed into sheet, make absorbing material.Alps electrical equipment Co., Ltd. develops " LIQUALLOY " serial electromagnetic wave absorbent material, adopt water atomization or aerosolization method to prepare amorphous powdered alloy, by high energy ball mill method powder is ground to form the flat powder of thickness 1-2 micron again, sneak into and make the sheet absorbing material in the basis material.
Amorphous powder is bigger for the influence of its absorbing property at the orientation of sheet absorbing material, the included angle of amorphous powder length direction and thickness direction is 90 when spending in theory, the absorbing property of material is best, reason owing to amorphous powder form and absorbing material preparation technology, the existing preparation technology only can be controlled at angle between 80≤φ≤90 degree, has limited the further raising of absorbing property.In order to improve absorptivity, the shared volume ratio of its amorphous powder meets or exceeds 50%, causes the density of absorbing material bigger.
In addition, the absorbing property that adopts the absorbing material that amorphous powder makes along with thickness reduce decline to a great extent, thickness is that the following absorbing material performance of 0.2mm is relatively poor.Above-mentioned reason causes the weight of the absorbing material that adopts the amorphous powder preparation and thickness can't satisfy the development trend of existing electronic product to miniaturization, lightness direction.
Summary of the invention
In order to overcome the defective of prior art, the purpose of this invention is to provide a kind of with the amorphous wire material as electromagnetic wave absorbent material of wave absorbing agent and preparation method thereof, by improving the orientation of wave absorbing agent, reduce the thickness and the density of absorbing material, prepare the absorbing material of performance height, thin thickness, light weight.
Concrete, the present invention relates to a kind of electromagnetic wave absorbent material, it is characterized in that described electromagnetic wave absorbent material comprises amorphous wire material and basis material, wherein said amorphous wire material is as wave absorbing agent.
In a preferred embodiment of the invention, the length direction of wherein said amorphous wire material is vertical substantially with the thickness direction of electromagnetic wave absorbent material.
In a preferred embodiment of the invention, the included angle of the length direction of wherein said amorphous wire material and the thickness direction of electromagnetic wave absorbent material is in 85≤φ≤90 scopes, preferably in 89≤φ≤90 scopes.
In a preferred embodiment of the invention, wherein said electromagnetic wave absorbent material in the form of sheets, its thickness is no more than 1 millimeter, preferably is no more than 0.5 millimeter, more preferably no more than 0.15 millimeter.
In a preferred embodiment of the invention, wherein said amorphous wire material is to be selected from glass to coat at least a in amorphous wire and the naked silk of amorphous.
In a preferred embodiment of the invention, wherein said amorphous wire material is the silk material that length is not less than 1mm.
In a preferred embodiment of the invention, wherein said basis material is an insulating material, be preferably be selected from rubber, resin, PC film and glued membrane one or more.
In a preferred embodiment of the invention, wherein the amorphous wire material is distributed in the surface of basis material, or embeds in the middle of the basis material, or in the interlayer of basis material.
In a preferred embodiment of the invention, the density of wherein said electromagnetic wave absorbent material is less than 5g/cm
3, preferably less than 3g/cm
3, be more preferably less than 1.5g/cm
3
In a preferred embodiment of the invention, the wherein said amorphous wire material attitude of quenching, or annealed processing.
Further, the invention still further relates to the preparation method of described electromagnetic wave absorbent material, this method comprises the steps:
(1) preparation amorphous wire material;
(2) mode by coiling is arranged in the amorphous wire material on the basis material.
In a preferred embodiment of the invention, wherein adopt the Taylor spin processes to prepare glass and coat amorphous wire, thereby prepare described amorphous wire material.
In a preferred embodiment of the invention, wherein spin method or melt and quench and follow the example of the naked silk of preparation amorphous, thereby prepare described amorphous wire material by interior round water.
In a preferred embodiment of the invention, wherein adopt glass is coated the method that the amorphous wire glassy layer peels off to prepare the naked silk of amorphous, thereby prepare described amorphous wire material.
In a preferred embodiment of the invention, the step that wherein prepares the amorphous wire material comprises the step of described silk material being carried out annealing in process.
In a preferred embodiment of the invention, wherein said annealing in process is that isothermal annealing is handled or direct current joule annealing in process.
In a preferred embodiment of the invention, wherein in the process of annealing in process on the silk material stress application or magnetic field.
In a preferred embodiment of the invention, the mode of described coiling is to make to put the winding mode of silk device with respect to described basis material rotation and translation.
In a preferred embodiment of the invention, the mode of described coiling is as follows: described basis material is fixed, described put silk device and put silk in, described put silk device around described basis material with a fixing axle uniform rotation and along this axial uniform translation.
In a preferred embodiment of the invention, the mode of described coiling is as follows: the described silk device of putting is fixed, described put silk device and put silk in, described basis material is around a fixing axle uniform rotation and axially at the uniform velocity mobile along this.
In a preferred embodiment of the invention, the mode of described coiling is as follows: described put silk device and put silk in, described basis material is around a fixing axle uniform rotation and described to put silk device axially at the uniform velocity mobile along this.
In a preferred embodiment of the invention, described winding mode is as follows: described put silk device and put silk in, described put silk device around described basis material with a fixing axle uniform rotation, and described basis material is along this axial uniform translation.
Description of drawings:
Fig. 1 coats the stereoscan photograph (180 times) of amorphous wire material for glass.
Fig. 2 is the stereoscan photograph (50 times) of the naked silk of amorphous material.
Fig. 3 is the absorbing material schematic diagram.
Fig. 4 is absorbing material monolithic preparation method.
Fig. 5 is the continuous preparation method of absorbing material.
Fig. 6 is absorbing material performance test philosophy figure.
Fig. 7 is an absorbing material transmission characteristic S11 test result.
Fig. 8 is an absorbing material transmission characteristic S21 test result.
Fig. 9 is an absorbing material loss Rtp result of calculation.
Embodiment:
In the present invention, the preparation of amorphous wire material can be adopted the known several different methods of prior art, wherein mainly contains following several:
1, glass coats spin processes: it is that foundry alloy is placed on the glass tube bottom that glass coats spin processes, utilizes the mode of induction heating that the foundry alloy in the glass tube is melted.Heat after the foundry alloy fusing is transmitted to glass tube, makes the glass tube bottom softening.Pull out a capillary glass tube by tensile machine from the glass tube bottom, filling alloy wire in the capillary.Spray cooling fluid continuously to capillary by nozzle, make alloy rapid solidification wherein, form glass and coat amorphous wire.In addition, the mode that can adopt hydrofluoric acid solution to dissolve, the glassy layer that glass is coated amorphous wire is peeled off, and obtains the naked silk of amorphous.It is to adopt glass to coat the silk material that spin processes prepares that glass shown in Fig. 1 coats the amorphous wire material, has promptly coated the composite construction of one deck glassy layer outside metal-cored.
2, interior round water spins method: it is to add cooling water in the drum of high speed rotating that interior round water spins method, and under action of centrifugal force, cooling water rotates synchronously at the inwall formation ring tank of drum and with rotating drum.Foundry alloy is put into quartz nozzle, utilize induction heating mode fusing foundry alloy.Charge into gases at high pressure again and make fusion foundry alloy liquid spray into chilling in the water along a side following current of drum in quartz ampoule, the continuous interior round water that obtains rapid solidification spins the naked silk of amorphous.In addition, this kind silk material diameter can carry out cold-drawn to it as required about 100 microns, thereby reduces silk material diameter, increases silk material length.The naked silk of amorphous shown in Fig. 2 material is that circle water spins the method preparation in adopting.
3, melt czochralski method: the melt czochralski method utilizes the mode of induction heating, adopt taper induction coil fusing foundry alloy, the surface tension of the magnetic suspension force that induction coil produces, fusing foundry alloy, the gravity three of foundry alloy self reach balance, form a stable weld pool in the foundry alloy upper end.Feed foundry alloy by guider, cool off foundry alloy at the position that utilizes guider to be connected with foundry alloy simultaneously, prevents foundry alloy top partial melting in addition.There is the circular copper wheel of a high speed rotating weld pool top, and the copper wheel edge is taper, and the foundry alloy that melts is cut, and obtains the naked silk of amorphous.
Absorbing material amorphous wire material among the present invention attitude of can quenching also can be annealed processing.Described annealing in process is that isothermal annealing is handled or direct current joule annealing in process.Isothermal annealing is handled and to be meant the amorphous wire material is put into annealing furnace, is heated to temperature requiredly, and keeps certain hour.The processing of direct current joule is meant on the amorphous wire material and applies direct current, and keeps certain hour.
In above-mentioned annealing in process process, stress application or magnetic field on the amorphous wire material as required.Stress application can adopt the mode that hangs counterweight or weight on the amorphous wire material; Also can adopt spring to connect amorphous wire material and strain gauge,, thereby keep constant stress according to strain gauge measured value regulating spring degree of tightness.Applying magnetic field can put into the silk material in the middle of the solenoid, applies direct current and produce D.C. magnetic field on solenoid, the amorphous wire material is vertically placed along magnetic direction get final product; Also can with the amorphous wire material on the column type jig, place a long straight conductor, on lead, apply D.C. magnetic field, around lead, form toroidal magnetic field, magnetic direction and amorphous wire material vertical consistency like this in the jig center.
Above-mentioned preparation method and method for annealing are the method that those skilled in the art understand, and those skilled in the art can select suitable technological parameter according to specific circumstances.
In a preferred embodiment of the invention, amorphous wire material of the present invention can be an amorphous wire material as described below, this amorphous wire material is to comprise metal-cored and composite material glassy layer, wherein this glassy layer coats that this is metal-cored, wherein said metal-cored be that amorphous material and its composition comprise by mass percentage:
The Fe of 1-15 quality %;
The Si of 2-12 quality %;
Total amount is one or more elements among B, Nb, Cu, Mn, Mo, Ni, Cr and the Al of being selected from of 2-25 quality %; And
The Co of surplus.
In another embodiment of the invention, amorphous wire material of the present invention is by having the naked silk of the above-mentioned metal-cored amorphous of forming that constitutes.
Fig. 3 is the absorbing material schematic diagram, and the amorphous wire material is evenly arranged between matrix film and the double faced adhesive tape.
In one embodiment of the invention, absorbing material monolithic preparation method schematic diagram at first, is fixed on the matrix film on the column type jig as shown in Figure 4; Then, the silk head with the amorphous wire material is fixed on matrix film right side one end; Then, uniform rotation column type jig simultaneously, is put the silk device uniform translation, with the surface of amorphous wire material around the matrix film; Column type jig and put silk device stop motion simultaneously when once more, the amorphous wire material is aligned to matrix film left side one end; Then, double faced adhesive tape is pasted the matrix film contain on the surface of amorphous wire material one side, and be covered with strippable paper; At last, the electromagnetic wave absorbent material that will contain the amorphous wire material cuts down from the column type jig, has promptly finished the preparation process of monolithic absorbing material.
In another embodiment of the invention, the continuous preparation method's schematic diagram of absorbing material as shown in Figure 5, at first, with both sides matrix film overlay horizontal positioned; Then, the silk head with the amorphous wire material is fixed on matrix film one end; Then, at the uniform velocity spur the matrix film, simultaneously, put silk device around the uniform rotation of matrix film, with the surface of amorphous wire material around the matrix film; Once more, double faced adhesive tape is pasted two matrix films contain on the surface of amorphous wire material one side, and be covered with strippable paper; At last, shear, and two electromagnetic wave absorbent materials that contain the amorphous wire material are batched respectively, promptly finished the preparation process of continuous absorbing material along the edge of matrix film.
By the electromagnetic wave absorbent material that method for preparing goes out, its absorbing property adopts in the IEC62333 international standard, and the method for microstrip line is tested.Fig. 6 is the test philosophy figure of absorbing property, and wherein Reference numeral 41 is an absorbing material, the 42nd, and microstrip line, the 43rd, network analyzer.When test, absorbing material is lain on the microstrip line, measure the S11 and the S21 parameter of absorbing material by network analyzer.
Embodiment 1:
Adopt glass coating spin processes to prepare the attitude glass that to quench and coat amorphous wire, composition is Co
72Fe
5Si
8B
15, the metal-cored diameter of silk material is 16 microns, glassy layer thickness is 3 microns.
The attitude of quenching glass coats amorphous wire and handles through isothermal annealing, 400 ℃ of treatment temperatures, 1 hour processing time.
Absorbing material preparation method schematic diagram at first, is fixed on the PC film on the column type jig as shown in Figure 4; Then, the amorphous wire material is bonded at PC film right side; Then, uniform rotation column type jig, 2 revolutions per seconds of rotating speeds; Simultaneously, put the silk device uniform translation, point-to-point speed 1.6mm/ second; Then, the amorphous wire material is aligned to PC film when left side column type jig and puts silk device stop motion simultaneously; At last, double faced adhesive tape is pasted the top that the PC film has amorphous wire material one side, and it is sheared.
Resulting absorbing material schematic diagram as shown in Figure 3, the amorphous wire material is clipped in the centre of PC film and double faced adhesive tape.The amorphous wire material adopts the mode of coiling to be ordered on the PC film surface, and amorphous wire material spacing 0.8mm pastes double faced adhesive tape amorphous wire material top again.
Above-mentioned absorbing material, the included angle of amorphous wire material length direction and electromagnetic wave absorbent material thickness direction is in 89≤φ≤90 scopes; Its thickness is 0.12 millimeter; Its density is 1.3g/cm
3
Comparative example 1
The absorbing material that adopts amorphous powder to make as wave absorbing agent, amorphous powder consist of Co
72Fe
5Si
8B
15By above-mentioned amorphous powder is clipped in the middle of the PC film and double faced adhesive tape identical with embodiment 1, preparing included angle is that 0.5 millimeter, density are 3.8g/cm at 80≤φ≤90 scopes, thickness
3Absorbing material.
Fig. 7 represents the transmission characteristic parameter S11 that reflects when being positioned on the microstrip line for electromagnetic wave absorbent material, as seen from the figure, embodiments of the invention 1 are compared with comparative example 1, when 2GHz is following, the S11 parameter is approaching, when being higher than 2GHz, the S11 parameter of embodiments of the invention 1 is starkly lower than comparative example, illustrates that the reflection of embodiments of the invention 1 is lower than comparative example.
Fig. 8 represents the transmission characteristic parameter S21 of transmission when being positioned on the microstrip line for electromagnetic wave absorbent material, as seen from the figure, embodiments of the invention 1 are compared with comparative example 1, and the S21 parameter of embodiments of the invention 1 is starkly lower than comparative example 1, illustrate that the transmission of embodiments of the invention 1 is lower than comparative example 1.
Fig. 9 is the electromagnetic wave absorbent material loss characteristic curve Rtp by calculating, as seen from the figure, embodiments of the invention 1 are compared with comparative example 1, the Rtp parameter of embodiments of the invention 1 is starkly lower than comparative example 1, illustrate that embodiments of the invention 1 compare with comparative example 1 and have higher transmission attenuation, promptly show better electromagnetic noise and suppress effect.
Claims (22)
1. an electromagnetic wave absorbent material is characterized in that, described electromagnetic wave absorbent material comprises amorphous wire material and basis material, and wherein said amorphous wire material is as inhaling the ripple component.
2. the described electromagnetic wave absorbent material of claim 1, the length direction of wherein said amorphous wire material is vertical substantially with the thickness direction of electromagnetic wave absorbent material.
3. the described electromagnetic wave absorbent material of claim 2, the included angle of the length direction of wherein said amorphous wire material and the thickness direction of electromagnetic wave absorbent material is in 85≤φ≤90 scopes, preferably in 89≤φ≤90 scopes.
4. as any one described electromagnetic wave absorbent material among the claim 1-3, wherein said electromagnetic wave absorbent material in the form of sheets, its thickness is no more than 1 millimeter, preferably is no more than 0.5 millimeter, more preferably no more than 0.15 millimeter.
5. as any one described electromagnetic wave absorbent material among the claim 1-3, wherein said amorphous wire material is to be selected from glass to coat at least a in amorphous wire and the naked silk of amorphous.
6. electromagnetic wave absorbent material as claimed in claim 5, wherein said amorphous wire material are that length is not less than 1 millimeter silk material.
7. as any one described electromagnetic wave absorbent material among the claim 1-3, wherein said basis material is an insulating material, be preferably be selected from rubber, resin, PC film and glued membrane one or more.
8. as any one described electromagnetic wave absorbent material among the claim 1-3, wherein the amorphous wire material is distributed in the surface of basis material, or embeds in the middle of the basis material, or in the interlayer of basis material.
9. as any one described electromagnetic wave absorbent material among the claim 1-3, the density of wherein said electromagnetic wave absorbent material is less than 5g/cm
3, preferably less than 3g/cm
3, be more preferably less than 1.5g/cm
3
10. as any one described electromagnetic wave absorbent material among the claim 1-3, the wherein said amorphous wire material attitude of quenching, or annealed processing.
11. the preparation method of any one described electromagnetic wave absorbent material among the claim 1-10, this method comprises the steps:
(1) preparation amorphous wire material;
(2) mode by coiling is arranged in the amorphous wire material on the basis material.
12. method as claimed in claim 11 wherein adopts the Taylor spin processes to prepare glass and coats amorphous wire, thereby prepares described amorphous wire material.
13. method as claimed in claim 11 is wherein spun method or melt by interior round water and is quenched and follow the example of the naked silk of preparation amorphous, thereby prepares described amorphous wire material.
14. method as claimed in claim 11 wherein adopts glass is coated the method that the amorphous wire glassy layer peels off to prepare the naked silk of amorphous, thereby prepares described amorphous wire material.
15. method as claimed in claim 11, the step that wherein prepares the amorphous wire material comprises the step of described silk material being carried out annealing in process.
16. being isothermal annealing, method as claimed in claim 15, wherein said annealing in process handle or direct current joule annealing in process.
17. method as claimed in claim 16, wherein in the process of annealing in process on the silk material stress application or magnetic field.
18. as any one described method of claim 11-17, the mode of wherein said coiling is to make to put the winding mode of silk device with respect to described basis material rotation and translation.
19. method as claimed in claim 18, the mode of wherein said coiling is as follows: described basis material is fixed, described put silk device and put silk in, described put silk device around described basis material with a fixing axle uniform rotation and along this axial uniform translation.
20. method as claimed in claim 18, the mode of wherein said coiling is as follows: the described silk device of putting is fixed, described put silk device and put silk in, described basis material is around a fixing axle uniform rotation and axially at the uniform velocity mobile along this.
21. method as claimed in claim 18, the mode of wherein said coiling is as follows: described put silk device and put silk in, described basis material is around a fixing axle uniform rotation and described to put silk device axially at the uniform velocity mobile along this.
22. method as claimed in claim 18, wherein said winding mode is as follows: described put silk device and put silk in, described put silk device around described basis material with a fixing axle uniform rotation, and described basis material is along this axial uniform translation.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104532174A (en) * | 2014-12-31 | 2015-04-22 | 哈尔滨工业大学 | Method for obtaining adjustable and controllable impedance linear response range of amorphous microwire |
| CN107949261A (en) * | 2017-11-15 | 2018-04-20 | 中国科学院宁波材料技术与工程研究所 | A kind of electromagnetic wave absorbent material and preparation method thereof |
| CN113480972A (en) * | 2021-06-30 | 2021-10-08 | 军事科学院系统工程研究院军需工程技术研究所 | Wave-absorbing material with glass coated with amorphous wires |
-
2009
- 2009-12-02 CN CN200910238377XA patent/CN101901660A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104532174A (en) * | 2014-12-31 | 2015-04-22 | 哈尔滨工业大学 | Method for obtaining adjustable and controllable impedance linear response range of amorphous microwire |
| CN107949261A (en) * | 2017-11-15 | 2018-04-20 | 中国科学院宁波材料技术与工程研究所 | A kind of electromagnetic wave absorbent material and preparation method thereof |
| CN107949261B (en) * | 2017-11-15 | 2020-03-03 | 中国科学院宁波材料技术与工程研究所 | Electromagnetic wave absorbing material and preparation method thereof |
| CN113480972A (en) * | 2021-06-30 | 2021-10-08 | 军事科学院系统工程研究院军需工程技术研究所 | Wave-absorbing material with glass coated with amorphous wires |
| CN113480972B (en) * | 2021-06-30 | 2023-11-07 | 军事科学院系统工程研究院军需工程技术研究所 | Wave absorbing material of glass-coated amorphous wire |
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Application publication date: 20101201 |