CN101804969A - Low-carbon environment friendly production method for extra high-purity H2O2 - Google Patents
Low-carbon environment friendly production method for extra high-purity H2O2 Download PDFInfo
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- CN101804969A CN101804969A CN 201010141163 CN201010141163A CN101804969A CN 101804969 A CN101804969 A CN 101804969A CN 201010141163 CN201010141163 CN 201010141163 CN 201010141163 A CN201010141163 A CN 201010141163A CN 101804969 A CN101804969 A CN 101804969A
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Abstract
The invention relates to a low-carbon environment friendly fabrication method for extra high-purity H2O2. The method comprises the following steps: First processing the industrial-level H2O2 water solution which contains a large amount of impurities by the resin-membrane separating system to remove the organic matter and zwitterions; then pumping the H2O2 water solution into the EDI system to eliminate the microscale metal ions; and finally, pumping the H202 water solution through the membrane filtration membrane to remove the granulate substances with a scale over 0.01 micrometer to obtain the extra high-purity H2O2 that is up to the SEMI-C12 quality standard of the Semiconductor Equipment and Materials International(SEMI).
Description
Technical field
The present invention relates to the high-purity H of a kind of low-carbon environment-friendly super clean
2O
2Production method.
Background technology
Super-clean high-purity H
2O
2Obligato important electron chemistry cleaning products and the corrosive agent of microelectronics, semiconductor, super large-scale integration (IC) and Aero-Space precision instrument and equipment.This is because H
2O
2Purity and cleanliness factor the yield rate of super large-scale integration (IC), the reliability of electrical property are had earth shaking impact.Along with improving constantly of super large-scale integration (IC) storage, its capacity is also constantly increasing, and it is thinner that its oxide film also becomes.But be to use the electron chemistry cleaning product of IC and the alkali metal impurity in the etching reagent, picture calcium (Ca), sodium impurity such as (Na) can circulate and go in the oxide film, thereby cause the decline of the anti-insulativity of IC, and then make on beavy metal impurity such as cupric ion (Cu), iron ion (Fe), complex ion (Cr), negatively charged ion the surfaces such as (Ag) attached to silicon wafer, with the proof voltage of P-N knot is reduced greatly, directly influence the qualification rate and the storage capacity of product.
Super-clean high-purity H
2O
2Normally with technical grade H
2O
2For raw material is made, present technical grade H
2O
2The most of employing of production technology is anthraquinone, so technical grade H
2O
2Contain a large amount of organic matters, each metal ion species and nonmetallic inclusion, anthraquinone derivative, 2-alkyl-anthraquinone for example, trioctyl phosphate etc.Therefore need to be to technical grade H
2O
2The aqueous solution is implemented various purifications and refining.
Present known purifying industrial grade H
2O
2Method quartz towers distillation under vacuum, membrane filtration method of purification, absorption and ion-exchange are arranged.
1) H of quartz towers distillation under vacuum purification
2O
2Aqueous solution purity can only reach analytically pure product standard, and the raw material output capacity is very low, only has about 75%, if having a plurality of towers to circulate purify to produce, production cost is very high, has not only expended a large amount of electric power energies in the production process, and also non-constant of security.
2) membrane filtration method of purification, technical grade H
2O
2H by the purification of membrane reverse osmosis system
2O
2Aqueous products, purity is to high-purity H
2O
2Requirement, but the raw material output capacity only has below 60%, and the service life of membrane reverse osmosis equipment very of short duration, so production cost will exceed much than other several methods.
3) adion exchange process, though the method can be produced the higher product of purity, cost is also lower, the as easy as rolling off a log generation of production process H
2O
2Resin with also regenerating and lose efficacy with acid, alkali behind the peril of resin decomposition explosion, the especially efficiency lost resin causes the very big pollution to environment.
Chinese patent CN1699144A discloses a kind of purification continuous production process for high-purity hydrogen peroxide, with the technical grade hydrogen peroxide is raw material, utilize macroporous adsorptive resins absorption organic carbon (TOC), after the single ion exchange column of yin, yang carries out ion-exchange, again through the ion-exchange of zwitterion mixing column, remove the yin, yang ionic impurity,, remove dust granules at last by millipore filter (PVDF material).Can produce the product of the SEMI-C8 that meets semiconductor equipment and material structure formulation according to reporting of this patent, (hereinafter to be referred as SEMI-C12) but this quality product and purity do not reach the quality product requirement of SEMI-C12, production process also will be discharged spent acid, waste lye, causes the pollution of environment.
Chinese patent CN1330035A discloses the method that a kind of high-purity hydrogen peroxide is produced, its technology is simple, the purification efficiency height, but resin is easily by hydrogen peroxide oxidation, and the blast that the decomposition of hydrogen peroxide causes happens occasionally: owing to have the impurity moisture that a large amount of pre-treatment are stayed in the resin method, therefore, the initial concentration of hydrogen peroxide raw material usually need be up to more than the 35-40%, high density and density unevenness quicken the oxidation of resin usually, and the way of resin method inhibited oxidation and decomposition is to adopt 5 ℃ or following low temperature process, but what low temperature brought is that facility investment is big, and energy consumption reaches complicated operation greatly.In the production process to environment equally without any improvement and slow down.
Chinese patent CN1919724 discloses a kind of preparation method of ultra-pure hydrogen phosphide, take the technical grade hydrogen peroxide as raw material, pass through earlier ion-exchange or way of distillation preliminary treatment, adopt again large aperture adsorption resin to remove organic carbon, remove foreign ion through two sections ion-exchanges of ion exchange resin column, membrane filtration is removed dust granules.Can obtain the product of high purity hydrogen dioxide aqueous solution according to the production technique of above open report, but all inevitably have the discharging of the spent acid waste lye of the hidden danger of the danger of hiding and contaminate environment in process of production.
Summary of the invention
The objective of the invention is to overcome defective and the deficiency of above prior art, provide a kind of and can under normal temperature environment, finish the purification super-clean high-purity H that safety in production, technology are simple, environment not have pollution
2O
2The production method of the aqueous solution.
The present invention includes following processing step:
1) at first with impure more technical grade H
2O
2The aqueous solution is through the resin molding piece-rate system, to remove organic matter harmonizing yinyang ion;
2) again with step 1) H after the separation and purification
2O
2The aqueous solution pumps into the EDI system, to remove the metal ion of trace;
3) last, will be through step 2) H after the separation and purification
2O
2The aqueous solution pumps into NF membrane and filters, the particulate material that filtering 0.01um is above; Thereby obtain the H of super-clean high-purity
2O
2, its quality reaches the quality standard of the SEMI-C12 of semiconductor equipment and material structure formulation.
Described step 1) work the separation assembly of removing the ionization of organic matter harmonizing yinyang in the resin molding piece-rate system in, mainly be include with corrosion-resistant, resistance to oxidation, acid and alkali-resistance the resin molding of fluorine resin making; The negative resin film in the above, middle one deck separation net (PDVF material), positive resin molding below, each negative resin film, separation net and positive resin molding three be common to consist of a discrete group; With the fluorine resin film production of corrosion-resistant, resistance to oxidation, acid and alkali-resistance, the advantage of resin molding is: such resin molding and working solution H
2O
2Can not decompose the reaction that discharges oxygen during contact, so also just overcome dangerous explosion accident, also just avoided the dangerous accident of in the process of purification, blasting, also avoid the discharging of resin regeneration liquid contaminated environment, provide a very promising production super-clean high-purity H for being conducive to the market sustainable development
2O
2Production technology.
Described resin molding needs to carry out following pre-treatment before use: earlier 10% the nitric acid dousing resin molding that dissolves in order to pure water is 8 hours; Put 8% the salt acid soak that dissolves with pure water after the cleaning into 8 hours, and cleaned up and dry and to use; Its effect that separates the effect of zwitterion and resin is the same, and reason but maximum advantage is without acid-alkali regeneration liquid regenerating resin film can reduce the discharging of acid-alkali regeneration liquid so in a large number, especially environment is not had too big pollution basically.
The preferred Zhengguang Resin Co., Ltd. of described resin produces, and the resin specifications and models are the special-purpose macropore strong acid sun of the mixed bed of ZGC151MB resin, the special-purpose macroporous strong basic negative resin of the mixed bed of ZGA351.
Generally, described thickness of resin film exists respectively; Negative resin film 0.8mm-1.5mm, positive thick resin film be at 0.5mm-1.8mm, the negative resin film in the above, the separation net of middle one deck 0.3mm-1.8mm (PDVF material), positive resin molding below.
Key equipment in the described resin molding separation system is made up of diaphragm is folded mutually layer by layer to 1000 discrete group a pair of diaphragm (negative resin, positive resin film).
The condition of described resin molding separation system equipment work is: operating pressure is at 0.2Mpa～0.4Mpa; Temperature is controlled at normal temperature 10-28 ℃; Working flow liquid (working fluid flow velocity) is controlled at 400m
3/ h～500m
3/ h.
That filling is negative and positive fluorine resin Amberjet UP6150 manufacturer in the described EDI system equipment: U.S.'s ROHM AND HAAS), and the negative and positive fluorine resin volume ratio of filling 3: 2, optimum resin volume 0.05m
3-0.3m
3
The condition of the work of described EDI system is: voltage 40v-90v; EDI purification system operating pressure is at 0.2Mpa-0.5Mpa.
Described nanofiltration membrane filtering system operating pressure is at 0.2Mpa-0.5Mpa; Nanofiltration membrane membrane pore size 0.01um.
Beneficial effect
Purification technology of the present invention has following advantage and development prospect compared with prior art;
(1) safe and simple: this method is safe, simple, easy to operate, H can not take place in the production process
2O
2With separate and the equipment for purifying decomposition reaction, therefore safe and reliable;
(2) reduce discharging: avoided the step with acid-alkali regeneration in this method, so there has not been the discharging of spent acid alkaline regeneration solution, avoided the pollution of environment, saved a large amount of energy, greatly reduce the discharge capacity of carbon dioxide, adapt to very much the low-carbon emission technology of current international trend;
(3) save cost: because without resin regeneration liquid, saved the water resource of a large amount of pipe blow-throughs and equipment, by 1 ton of super-clean high-purity H of every production
2O
2Use 5m
3Ultra-pure water water calculates, and a year output is 5000 tons of super-clean high-purity H
2O
2Process units, can save 25000 tons of ultra-pure waters of ultra-pure water, 50000 tons of running water, 10 tons of acid, alkali 10 tons (resin regeneration liquid) are saved electric energy 70,000 ten thousand degree, save manually 10,000, reduce altogether CO2 emissions the whole year greatly about about the 7500-10000 ton, save cost units up to a million.
Embodiment
Embodiment 1
At first with impure more technical grade H
2O
2The aqueous solution is through the resin molding piece-rate system, to remove organic matter harmonizing yinyang ion; Again with the H after the upper step separation and purification
2O
2The aqueous solution pumps into the EDI system, to remove the metal ion of trace; At last, will be through the H after the upper step separation and purification
2O
2The aqueous solution pumps into NF membrane and filters, the particulate material that filtering 0.01um is above;
Work the separation assembly of removing the ionization of organism regulating YIN and YANG in the described resin molding separation system, be with corrosion-resistant, resistance to oxidation, acid and alkali-resistance the resin molding made of fluorine resin; The negative resin film in the above, middle one deck separation net (PDVF material), positive resin molding below, each negative resin film, separation net and positive resin molding three be common to constitute a discrete group; Described resin molding needs to carry out following pre-treatment before use: earlier 10% the nitric acid dousing resin molding that dissolves in order to pure water is 8 hours; Put 8% the salt acid soak that dissolves with pure water after the cleaning into 8 hours, and cleaned up and dry and to use; The effect of its separation zwitterion is the same with the effect of resin, and described resin has selected for use Zhengguang Resin Co., Ltd. to produce, and the resin specifications and models are that ZGC151MB mixes the special-purpose macropore strong acid sun of a bed resin, the special-purpose macroporous strong basic negative resin of the mixed bed of ZGA351.Described thickness of resin film exists respectively; Negative resin film 0.8mm, positive thick resin film be at 1.8mm, the negative resin film in the above, the separation net of middle one deck 0.3mm (PDVF material), positive resin molding below.Key equipment in the described resin molding piece-rate system is stacked layer by layer diaphragm by 400 discrete group and forms.
The condition of described resin molding separation system equipment work is: operating pressure is at 0.2MpaMpa; Temperature is controlled at 10～23 ℃; Working flow liquid (working fluid flow velocity) is controlled at 500m
3/ h.Filling is negative and positive fluorine resin (ROHM AND HAAS) in the described EDI system equipment, the negative and positive fluorine resin ratio of filling 3: 2, resin volume 0.05m
3-0.3m
3The condition of the work of described EDI system is: voltage 40v; Electric current 0.5A; EDI purification system operating pressure is at 0.2Mpa.Described nanofiltration membrane filtering system operating pressure is at 0.3Mpa; Nanofiltration membrane membrane pore size 0.01um.
Experimental data:
The technical grade H of the resin molding system that flows through
2O
2Concentration of aqueous solution can obtain the H of super-clean high-purity 36%
2O
2Concentration 31.5%.The H that purification is produced
2O
2The aqueous solution meets semiconductor equipment and material structure SEMI-12 quality standard fully, and detailed data sees Table 1.
Embodiment 2
At first with impure more technical grade H
2O
2The aqueous solution is through the resin molding piece-rate system, to remove organic matter harmonizing yinyang ion; Again with the H after the upper step separation and purification
2O
2The aqueous solution pumps into the EDI system, to remove the metal ion of trace; At last, will be through the H after the upper step separation and purification
2O
2The aqueous solution pumps into NF membrane and filters, the particulate material that filtering 0.01um is above;
Work the separation assembly of removing the ionization of organism regulating YIN and YANG in the described resin molding separation system, be with corrosion-resistant, resistance to oxidation, acid and alkali-resistance the resin molding made of fluorine resin; The negative resin film in the above, middle one deck separation net (PDVF material), positive resin molding below, each negative resin film, separation net and positive resin molding three be common to constitute a discrete group; Described resin molding needs to carry out following pre-treatment before use: earlier 10% the nitric acid dousing resin molding that dissolves in order to pure water is 8 hours; Put 8% the salt acid soak that dissolves with pure water after the cleaning into 8 hours, and cleaned up and dry and to use; The effect of its separation zwitterion is the same with the effect of resin, and described resin has selected for use Zhengguang Resin Co., Ltd. to produce, and the resin specifications and models are that ZGC151MB mixes the special-purpose macropore strong acid sun of a bed resin, the special-purpose macroporous strong basic negative resin of the mixed bed of ZGA351.Described thickness of resin film exists respectively; Negative resin film 1.5mm, positive thick resin film be at 0.5mm, the negative resin film in the above, the separation net of middle one deck 1.8mm (PDVF material), positive resin molding below.Key equipment in the described resin molding piece-rate system is stacked layer by layer diaphragm by 1000 discrete group and forms.The condition of described resin molding separation system equipment work is: operating pressure is at 0.4Mpa; Temperature is controlled at 18 ℃～28 ℃; Working flow liquid (working fluid flow velocity) is controlled at 400m
3/ h.Filling is negative and positive fluorine resin (ROHM AND HAAS) in the described EDI system equipment, the negative and positive fluorine resin ratio of filling 3: 2, optimum resin volume 0.05m
3-0.3m
3The condition of the work of described EDI system is: voltage 90v; EDI purification system operating pressure is at 0.5Mpa.Described nanofiltration membrane filtering system operating pressure is at 0.5Mpa; Nanofiltration membrane membrane pore size 0.01um.
Experimental data:
The technical grade H of the resin molding system that flows through
2O
2Concentration of aqueous solution obtains the H of super-clean high-purity 38%
2O
2Concentration 31.5%.The H that purification is produced
2O
2The aqueous solution meets semiconductor equipment and material structure SEMI-12 quality standard fully, and detailed data sees Table 1.
Table 1 ultra-clean high-purity hydrogen peroxide examining report unit: ppb
| Sequence number | Project name | SEMI-C12 | Implement 1 | Implement 2 |
| 1 | H 2O 2Content (%) | 30.0-32.0% | 31.5% | 31.5% |
| 2 | Particle 〉=0.2um≤o.5um/ml, max | TBD | 4 | 6 |
| Sequence number | Project name | ??SEMI-C12 | Implement 1 | Implement 2 |
| ??3 | Colourity; APHA, max | ??10 | ??7 | ??5 |
| ??4 | Residue on evaporation ppm, max | ??1.0 | ??0.6 | ??0.45 |
| ??5 | Total organic carbon (TOC) ppm | ??0.8 | ??0.78 | |
| ??6 | Muriate (NO 3)ppm | ??50 | ??16 | ??18 |
| ??7 | Vitriol (SO 4)ppm | ??50 | ??12 | ??17 |
| ??8 | Nitrate (NO 3)ppm | ??50 | ??16 | ??13 |
| ??9 | Phosphoric acid salt (PO 4)ppm | ??50 | ??0.002 | ??0.004 |
| ??10 | Calcium Ca | ??0.1 | ??0.08 | ??0.06 |
| ??11 | Cobalt Co | ??0.1 | ??0.09 | |
| ??12 | Chrome Cr | ??0.1 | ??0.058 | ??0..62 |
| ??13 | Caesium Cs | ??0.016 | ??0.02 | |
| ??14 | Copper Cu | ??0.1 | ??0.06 | ??0.03 |
| ??15 | Iron Fe | ??0.1 | ??0.01 | ??0.056 |
| ??16 | Germanium Ge | ??0.021 | ??0.04 | |
| ??17 | Mercury Hg | ??0.001 | ??0.002 | |
| ??18 | Indium In | ??0.005 | ??0.004 | |
| ??19 | Potassium K | ??0.1 | ??0.081 | ??0.05 |
| ??20 | Lithium Li | ??0.1 | ??0.024 | ??0.062 |
| ??21 | Magnesium Mg | ??0.1 | ??0.069 | ??0.013 |
| ??22 | Manganese Mn | ??0.1 | ??0.097 | ??0.050 |
| ??23 | Molybdenum Mo | ??0.004 | ??0.008 |
| Sequence number | Project name | ??SEMI-C12 | Implement 1 | Implement 2 |
| ??24 | Sodium Na | ??0.1 | ??0.082 | ??0.034 |
| ??25 | Nickel | ??0.1 | ??0.012 | ??0.01 |
| ??26 | Gallium Ga | ??0.1 | ??0.009 | ??0.085 |
| ??27 | Plumbous Pb | ??0.1 | ??0.029 | ??0.043 |
| ??28 | Beryllium Be | ??0.036 | ??0.027 | |
| ??29 | Silicon Si | ??0.002 | ??0.004 | |
| ??30 | Tin Sn | ??0.1 | ??0.032 | ??0.028 |
| ??31 | Strontium Sr | ??0.1 | ??0.04 | |
| ??32 | Platinum Pt | ??0.012 | ??0.032 | |
| ??33 | Antimony Se | ??0.1 | ??0.042 | ??0.051 |
| ??34 | Zinc Zn | ??0.1 | ??0.071 | ??0.071 |
| ??35 | Titanium Ti | ??0.1 | ??0.078 | ??0.051 |
| ??36 | Vanadium V | ??0.1 | ??0.026 | ??0.031 |
| ??37 | Tungsten W | ??0.009 | ??0.007 | |
| ??38 | Cadmium Cd | ??0.015 | ??0.01 | |
| ??39 | Boron | ??0.1 | ??0.059 | ??0.072 |
| ??40 | Silver Ag | ??0.012 | ??0.025 | |
| ??41 | Aluminium Al | ??0.1 | ??0.016 | ??0.028 |
| ??42 | Arsenic As | ??0.1 | ??0.016 | ??0.065 |
| Sequence number | Project name | SEMI-C12 | Implement 1 | Implement 2 |
| 43 | Gold Au | 0.007 | 0.003 |
In above data, organic carbon adopts the analysis of TOC analyzer, super-clean high-purity H
2O
2Analyze and adopt chemical method, H in the product
2O
2Content adopts gas chromatographic analysis, and anion adopts ion chromatography, and cation adopts ICP-MS to analyze, and dust granules adopts the laser calculating instrument to measure.
Claims (7)
1. high-purity H of low-carbon environment-friendly super clean
2O
2Production method, may further comprise the steps:
1) at first with impure more technical grade H
2O
2The aqueous solution is through the resin molding piece-rate system, to remove organic matter harmonizing yinyang ion;
2) again with step 1) H after the separation and purification
2O
2The aqueous solution pumps into the EDI system, to remove the metal ion of trace;
3) last, will be through step 2) H after the separation and purification
2O
2The aqueous solution pumps into NF membrane and filters, the particulate material that filtering 0.01um is above;
Work the separation assembly of removing the ionization of organism regulating YIN and YANG in the described step 1) in the resin molding separation system, comprise with corrosion-resistant, resistance to oxidation, acid and alkali-resistance the resin molding made of fluorine resin; The negative resin film in the above, middle one deck separation net (PDVF material), positive resin molding below, each negative resin film, separation net and positive resin molding three be common to constitute a discrete group;
Described resin molding needs to carry out following pre-treatment before use: earlier 10% the nitric acid dousing resin molding that dissolves in order to pure water is 8 hours; Put 8% the salt acid soak that dissolves with pure water after the cleaning into 8 hours, and cleaned up and dry and to use;
The condition of described resin molding separation system equipment work is: operating pressure is at 0.2Mpa～0.4Mpa; Temperature is controlled at normal temperature 10-28 ℃; Working flow liquid (working fluid flow velocity) is controlled at 400kg/h～500kg/h.
2. the high-purity H of a kind of low-carbon environment-friendly super clean according to claim 1
2O
2Production method, it is characterized in that: described resin is that Zhengguang Resin Co., Ltd. produces, the resin specifications and models are the special-purpose macropore strong acid sun of the mixed bed of a ZGC151MB resin, the special-purpose macroporous strong basic negative resin of the mixed bed of ZGA351.
3. the high-purity H of a kind of low-carbon environment-friendly super clean according to claim 1
2O
2Production method, it is characterized in that: the thickness of described its resin molding is respectively negative resin film 0.8mm-1.5mm, positive resin molding 0.5mm-1.8mm, separation net 0.3mm-1.8mm.
4. according to claim 1 or the high-purity H of 2 or 3 described a kind of low-carbon environment-friendly super cleans
2O
2Production method, it is characterized in that: the key equipment in the described resin molding piece-rate system is stacked layer by layer diaphragm by 1 to 1000 discrete group and forms.
5. the high-purity H of a kind of low-carbon environment-friendly super clean according to claim 1
2O
2Production method, it is characterized in that: in the described EDI system equipment filling be the negative and positive fluorine resin (Amberjet UP6150 manufacturer: U.S.'s ROHM AND HAAS), filling negative and positive fluorine resin ratio 3: 2.
6. the high-purity H of a kind of low-carbon environment-friendly super clean according to claim 1 or 5
2O
2Production method, it is characterized in that: the condition of the work of described EDI system is: voltage 40v-90v electric current 0.1A-1.5A; EDI purification system operating pressure is at 0.2Mpa-0.5Mpa.
7. the high-purity H of a kind of low-carbon environment-friendly super clean according to claim 1
2O
2Production method, it is characterized in that: described nanofiltration membrane filtering system operating pressure 0.2Mpa-0.5Mpa; Nanofiltration membrane membrane pore size 0.01um.
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| CN109205572A (en) * | 2017-06-30 | 2019-01-15 | 中国石油化工股份有限公司 | A method of purifying hydrogen peroxide |
| CN109911858A (en) * | 2019-04-24 | 2019-06-21 | 广州市天夫美新材料科技有限公司 | The production equipment of One-step production super-clean high-purity microelectronics grade hydrogen peroxide |
| CN109941967A (en) * | 2019-04-24 | 2019-06-28 | 广州市天夫美新材料科技有限公司 | The production technology of One-step production super-clean high-purity microelectronics grade hydrogen peroxide |
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| CN113942979A (en) * | 2021-11-11 | 2022-01-18 | 河南慧泽生物工程有限公司 | Preparation method of ultra-pure hydrogen peroxide |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08231208A (en) * | 1994-11-22 | 1996-09-10 | Ube Ind Ltd | Production of high purity hydrogen peroxide aqueous solution |
| CN1328956A (en) * | 2000-06-21 | 2002-01-02 | 三德化学工业株式会社 | Method and equipment for preparation of purified hydrogen peroxide aqueous solution |
| US6911481B2 (en) * | 2000-06-21 | 2005-06-28 | Santoku Chemical Industries Co., Ltd. | Method of regenerating ion exchange resin |
| CN1919724A (en) * | 2006-08-18 | 2007-02-28 | 上海华谊微电子化学品有限公司 | Process for preparation of ultrapure hydrogen peroxide |
| CN101249953A (en) * | 2008-04-01 | 2008-08-27 | 苏州市晶协高新电子材料有限公司 | Technique and equipment for manufacturing super-clean high-pure electronic grade hydrogen peroxide |
-
2010
- 2010-04-02 CN CN 201010141163 patent/CN101804969A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08231208A (en) * | 1994-11-22 | 1996-09-10 | Ube Ind Ltd | Production of high purity hydrogen peroxide aqueous solution |
| CN1328956A (en) * | 2000-06-21 | 2002-01-02 | 三德化学工业株式会社 | Method and equipment for preparation of purified hydrogen peroxide aqueous solution |
| US6911481B2 (en) * | 2000-06-21 | 2005-06-28 | Santoku Chemical Industries Co., Ltd. | Method of regenerating ion exchange resin |
| CN1919724A (en) * | 2006-08-18 | 2007-02-28 | 上海华谊微电子化学品有限公司 | Process for preparation of ultrapure hydrogen peroxide |
| CN101249953A (en) * | 2008-04-01 | 2008-08-27 | 苏州市晶协高新电子材料有限公司 | Technique and equipment for manufacturing super-clean high-pure electronic grade hydrogen peroxide |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN109941967A (en) * | 2019-04-24 | 2019-06-28 | 广州市天夫美新材料科技有限公司 | The production technology of One-step production super-clean high-purity microelectronics grade hydrogen peroxide |
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