CN101794635A - Radioactive gas isotope manufacturing apparatus - Google Patents
Radioactive gas isotope manufacturing apparatus Download PDFInfo
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- CN101794635A CN101794635A CN201010003232A CN201010003232A CN101794635A CN 101794635 A CN101794635 A CN 101794635A CN 201010003232 A CN201010003232 A CN 201010003232A CN 201010003232 A CN201010003232 A CN 201010003232A CN 101794635 A CN101794635 A CN 101794635A
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Abstract
The invention provides a radioactive gas isotope manufacturing apparatus, capable of seeking the pressure drawdown in the reaction chamber, and thinning the thickness of the irradiation window allowing the transmission of the charged particle beam. The radioactive gas isotope manufacturing apparatus has the following structure that it has a reaction chamber (20), having an irradiation window (21) making charged particle beam B transmitting indoor, and making the target gas performing a nuclear reaction; a gas circulation device (30), making the gas flowing out from the reaction chamber (20) inflowing inside the reaction chamber (20). Thus, the inside of the reaction chamber (20) can be cooled by cooling the gas in the circulation, and can try for pressure drop in the reaction chamber (20). As a result, the thickness of the irradiation window (21) can be thinned, the energy loss of the charged particle beam can be restrained, to increase the yield of RI gas.
Description
Technical field
The application advocates the right of priority based on the Japanese patent application of on January 16th, 2009 application 2009-007856 number.The full content of this application is quoted in this manual by reference.
The present invention relates to radioactive gas isotope manufacturing apparatus.
Background technology
For example being used in radioisotope labeled compound (RI compound) that PET checks that (PET (positron emission tomography) inspection) wait makes radioactive isotope (RI) and predetermined raw material reagent carry out synthesizing in the RI synthesizer of chemical reaction.As the known H of having of the radioactive gas isotope that is supplied in this RI synthesizer (RI gas)
11CN,
11CO2,
11CO,
11CH
4Deng.Disclose the technology of the manufacturing of relevant RI gas at non-patent literature 1,2.
Fig. 3 is the concise and to the point figure that represents RI gas manufacturing installation in the past.RI gas manufacturing installation 1 in the past shown in Figure 3 for example possesses the vacuum tank 2 of the charged particle beam B that outgoing is accelerated by cyclotron and irradiation from the charged particle beam of vacuum tank 2 outgoing and the target solid/liquid/gas reactions device 3 that makes it to carry out nuclear reaction.
Be provided with the paper tinsel 8,9 that makes the charged particle beam transmission at vacuum tank 2 and target solid/liquid/gas reactions device 3.And, connect cylinder 4 at target solid/liquid/gas reactions device 3 by inlet pipe arrangement 6, connect synthesizer 5 by outlet pipe arrangement 7.At inlet pipe arrangement 6 and outlet pipe arrangement 7 valve V is set,, can keeps the airtight conditions of target solid/liquid/gas reactions device 3 by closing these valves V.
When making RI gas, the target gas that becomes raw material is filled into target solid/liquid/gas reactions device 3 from cylinder 4, and shut-off valve V becomes airtight conditions in the target solid/liquid/gas reactions device 3.The paper tinsel 8 of charged particle beam B transmission vacuum tank 2, and the paper tinsel 9 of transmission target solid/liquid/gas reactions device 3 shine the target gas that is filled in the target solid/liquid/gas reactions device 3.Collision by charged particle beam B and target gas produces nuclear reaction, produces radioactive gas isotope.
And in RI gas manufacturing installation 1 in the past, by the outside surface winding-up cooling gas (for example He gas) at paper tinsel 8,9, the temperature that suppresses paper tinsel 8,9 rises.
Non-patent literature 1:DAVID R.CHRISTMAN, R.D.FINN, K.I.KARLSTROMand A.P.WOLF, " The Production of Ultra High Activity 11C-labeledHydrogenCyanide; Carbon Dioxide; Carbon Monoxide and Methane via the 14N (p, α) 11CReaction (XV) * ", International Journal of Applied RadiationandIsotopes, (Britain), Pergamon Press, 1975, Vol.26, pp.435-442
Non-patent literature 2:J.Noguchi, K.Suzuki, " Automated synthesis of the ultrahigh specificactivity of[11C] Ro15-4513and its application in an extremely lowconcentration region to an ARG study ", Nuclear Medicine ﹠amp; Biology, 2003, Vol.30, pp.335-343
Yet in above-mentioned prior art, because become high pressure by nuclear reaction in the target solid/liquid/gas reactions device 3, institute is so that the thickness increase of paper tinsel, thereby satisfies withstand voltage properties.If the paper tinsel thickening, then the energy loss of the charged particle beam after the paper tinsel transmission increases, so the problem that exists the output of RI gas to descend.And the energy loss of paper tinsel thickening and charged particle beam increases, thereby exists paper tinsel to become the problem of high temperature.
Summary of the invention
The present invention finishes in order to solve this problem, and its purpose is, a kind of radioactive gas isotope manufacturing apparatus is provided, and the pressure that can seek in the reaction chamber descends, and attenuate makes the thickness of the illumination window of charged particle beam transmission.
Radioactive gas isotope manufacturing apparatus according to the present invention is characterised in that to possess: have and make the illumination window of charged particle beam to indoor transmission, accept the irradiation of the charged particle beam of this illumination window of transmission, and make target gas carry out the reaction chamber of nuclear reaction; Make the target gas that flows out from reaction chamber flow into gas-recycling plant in the reaction chamber.
This radioactive gas isotope manufacturing apparatus is to possess gas is flowed out in the reaction chamber that carries out nuclear reaction, and make it to flow into once more the structure of the gas-recycling plant in the reaction chamber, so be cooled by gas in circulation, temperature in the reaction chamber is descended, and the pressure in the reaction chamber is descended.Thus, thickness that can the attenuate illumination window compared with the past.And, thickness that can the attenuate illumination window, thus the energy loss of the charged particle beam of transmission can be suppressed, and when can the indoor temperature of inhibitory reaction rising, the output of RI gas is increased.
At this, preferably make target gas flow into the interior target gas inflow portion of reaction chamber towards illumination window.Thus, can flow into target gas in the reaction chamber towards illumination window winding-up.Therefore, can carry out the cooling of illumination window with simple structure, so, can prevent that the temperature in the reaction chamber from rising and the pressure rising.
And, preferably between the reaction chamber of the light incident side of the vacuum of the exiting side of charged particle beam and charged particle beam, 1 illumination window only is set.Like this, only be made as 1, can reduce the number that is provided with of illumination window, the thickness of attenuate illumination window by the number that is provided with illumination window.Therefore, energy loss that can the inhibition zone beam of charged particles.
And gas-recycling plant preferably possesses makes target air cooling refrigeratory but.Thus, can by the refrigeratory cooling after the reaction chamber effluent air, make it again to flow in the reaction chamber, thus can suitably carry out the interior cooling of reaction chamber, and the pressure in the reaction chamber is further descended.
The invention effect
According to the present invention, the pressure that can seek in the reaction chamber descends, and can make the thickness of charged particle beam to the illumination window of indoor transmission by attenuate, so energy loss that can the inhibition zone beam of charged particles increases the output of RI gas.
Description of drawings
Fig. 1 is the brief configuration figure of the related RI gas manufacturing installation of embodiments of the present invention.
Fig. 2 is the longitudinal diagram of the target solid/liquid/gas reactions device among Fig. 1.
Fig. 3 is the brief configuration figure of RI gas manufacturing installation in the past.
Among the figure: 10-RI gas (radioactivity) manufacturing installation, 11-vacuum, 20-target solid/liquid/gas reactions device, 20a-reaction chamber, the 20b-sidewall, 20c-back face wall, 20d-target air-flow hand-hole (target gas inflow portion), the 21-paper tinsel, 22-inlet nozzle, 23-outlet nozzle, 24-chilled water nozzle, 30-gas-recycling plant, 31-pump, the 32-refrigeratory, 33-pipe arrangement, 34-unstrpped gas supplying tubing, 35-is communicated with pipe arrangement, 36-T-valve, B-charged particle beam.
Embodiment
Below, with reference to description of drawings preferred embodiment according to RI gas manufacturing installation of the present invention.Fig. 1 is the brief configuration figure of the related RI gas manufacturing installation of embodiments of the present invention, and Fig. 2 is the longitudinal diagram of the target solid/liquid/gas reactions device among Fig. 1.
RI gas manufacturing installation 10 shown in Figure 1 is devices of for example making the radioactive gas isotope (RI gas) that is used in radioisotope labeled compound (RI compound).RI gas manufacturing installation 10 possesses: the charged particle beam B that is accelerated is shone target gas, the target solid/liquid/gas reactions device 20 that nuclear reaction is taken place; Make the target gas that flows out from target solid/liquid/gas reactions device 20 flow into gas-recycling plant 30 in the target solid/liquid/gas reactions device 20.
Target solid/liquid/gas reactions device 20 is linked to the outgoing nozzle 11a of the vacuum 11 of the charged particle beam B that outgoing is accelerated by cyclotron (not shown).Target solid/liquid/gas reactions device 20 has the paper tinsel 21 (illumination window) that makes charged particle beam B transmission, the back face wall 20c that for example forms columniform sidewall 20b and cut out the end of columniform sidewall 20b.
Sidewall 20b and back face wall 20c for example can be formed by metal material of aluminium etc. etc.Become reaction chamber 20a by sidewall 20b and back face wall 20c region surrounded.And, dispose target solid/liquid/gas reactions device 20, so that the long side direction of reaction chamber 20a becomes the direction of illumination of charged particle beam B.
And, be formed with the cooling that is used to make the chilled water circulation in the inside of the wall of sidewall 20b and back face wall 20c with path (not shown).Import to chilled water in the cooling path by being discharged to the outside in the cooling path by the cooling jet 24 that imports chilled water.
And, be provided with at the sidewall 20b of target solid/liquid/gas reactions device 20 and make target gas flow into the inlet nozzle 22 in the reaction chamber 20a and make target gas in the reaction chamber 20a flow out to outlet nozzle 23 outside the reaction chamber 20a.Inlet nozzle 22 is configured in the face side (paper tinsel 21 sides) of target solid/liquid/gas reactions device 3, and outlet nozzle 23 is configured in the rear side of target solid/liquid/gas reactions device 3.
And target air-flow hand-hole (the target gas inflow portion) 20d that is communicated with inlet nozzle 22 and reaction chamber 20a is towards paper tinsel 21.That is, the long side direction that target air-flow hand-hole 20d forms with target solid/liquid/gas reactions device 20 forms predetermined angle, flow into the central authorities that target gas blowout in the reaction chamber 20a blows to the inner face side of paper tinsel 21 by target air-flow hand-hole 20d.In addition, the angle of the long side direction of the bearing of trend of target air-flow hand-hole 20d and reaction chamber formation is preferably 45 degree.
Gas-recycling plant 30 possesses to have to constitute makes the interior internal flow (target gas, reaction product) of reaction chamber 20a flow out the pipe arrangement 33 that also flow into the circulating path in the reaction chamber 20a again.Be connected with the pump 31 of the internal flow (recyclegas) that contains target gas of boosting and cooling refrigeratory (heat exchanger) 32 at pipe arrangement 33 by the boosted recyclegas of pump 31.That is, pipe arrangement 33 links successively outlet nozzle 23, pump 31, refrigeratory 32, inlet nozzle 22.
And, be connected with and fill the unstrpped gas supplying tubing 34 that the cylinder 4 that becomes the target of raw material gas (nitrogen) links at the pipe arrangement 33 that connects refrigeratory 32 and inlet nozzle 22.And, be connected with the synthesizer 5 of synthetic RI compound links at the pipe arrangement 33 that connects outlet nozzle 23 and pump 31 and be communicated with pipe arrangement 35.And the connection pipe arrangement 35 that T-valve 36, one sides are set at connection pipe arrangement 35 is connected with synthesizer 5, and the opposing party's connection pipe arrangement 35 is connected with obsolete equipment.
And, can exemplify stainless steel as the material of pipe arrangement 33～35.And, for example, generating
11During C (RI gas), if contain
12C, then as its function reduction of radiopharmaceutical agent, thus preferably shorten piping length, and by not containing
12The material of C (metal) constitutes the pipe arrangement path.In addition, the length that can exemplify the pipe arrangement 33 that constitutes circulating path for example is 5m, and the pipe arrangement internal diameter is 4mm.
And the material as the target solid/liquid/gas reactions device 20 that is exposed to target gas, pipe arrangement 33～35, pump 31, refrigeratory 32 for example can exemplify the material that does not contain O, C, F.
Then, the method that the RI gas manufacturing installation 10 that utilizes such formation is made RI gas describes.At first, discard the on-line cleaning that remains in the impurity in the pipe arrangement 33～35.Impurity in the pipe arrangement 33 goes out of use by pipe arrangement 35.
Secondly, carry out the interior on-line cleaning of pipe arrangement 33～35 with gas cylinders 4 encapsulation target gas from target gas.Impurity in the pipe arrangement 33 goes out of use by pipe arrangement 35.
Then, carry out the circulation of target gas from gas cylinders 4 encapsulation target gas.Target gas circulates in pipe arrangement 33, and successively in reaction chamber 20a, pump 31, refrigeratory 32 circulations.And the charged particle beam B that is accelerated by cyclotron passes through in the outgoing nozzle 11a of vacuum 11, and transmission paper tinsel 21 incides in the reaction chamber 20a.
Charged particle beam B shines the target gas in the reaction chamber 20a.Target gas is accepted the irradiation of charged particle beam B and is carried out nuclear reaction.Thus, produce positron and discharge radioactive isotope (RI gas).At this moment, carry out the circulation of gas according to gas-recycling plant 30, target gas that flows out from reaction chamber 20a and RI gas by pump 31 boosted after, be cooled by refrigeratory 32, and flow into again in the reaction chamber 20a.According to refrigeratory 32, turn back in the reaction chamber 20a by making the target gas and the RI gas that are cooled, thereby can suitably cool off in the reaction chamber 20a.
And, because pass through target air-flow hand-hole 20d, jet to the inner face of paper tinsel 21, so can cool off paper tinsel 21 reliably by the gas of inlet nozzle 22.Through after the preset time, the recovery of RI gas is carried out in the open loop path, and the RI gas that produces supplies to synthesizer 5.
In addition, when the round-robin gas flow descends in pipe arrangement 33, target gas is filled in the pipe arrangement 33 from gas cylinders 4.At this moment, can carry out the filling of target gas, the irradiation of charged particle beam B, the recovery of RI gas simultaneously.
In this RI gas manufacturing installation 10, because possess gas-recycling plant 30 is arranged, so can cool off after the interior gas of reaction chamber 20a, make it to flow into again in the reaction chamber 20a.Thus, cool off in the reaction chamber 20a, and the pressure that can seek in the reaction chamber 20a descends by the gas that in circulation, is cooled.Its result, thickness that can attenuate paper tinsel 21 compared with the past.And the thickness of paper tinsel 21 is thinned, so can suppress the energy loss of the charged particle beam B of transmission paper tinsel 21.Therefore, the output of RI gas is increased.And, by attenuate paper tinsel 21, energy loss is reduced, can prevent that the temperature in the reaction chamber 20a from rising.In addition, the running pressure of reaction chamber 20a can be made as 0.3MPa.
And the target gas blowout blows to the inner face side of paper tinsel 21, so do not need to be provided with in addition as in the past the cooling device from the exterior side of paper tinsel 21, can seek the simplification of apparatus structure.
And, because can carry out the filling of target gas, the manufacturing of RI gas and the recovery of RI gas simultaneously, discharge radioactive isotope so can make positron continuously.
More than, specifically understand the present invention based on this embodiment, but the invention is not restricted to above-mentioned embodiment.For example, also can be for not possessing the structure of refrigeratory 32.By by the chilled water of cooled target solid/liquid/gas reactions device 20 cooled target gas indirectly,, also can cool off in the reaction chamber 20a even do not possess the structure of refrigeratory 32.
And, also can be the structure that possesses 2 paper tinsels as in the past.In RI gas manufacturing installation of the present invention, because possess gas-recycling plant 30, so, the pressure in the reaction chamber is descended, and can use the low paper tinsel of withstand voltage properties by the gas that is cooled is flow in the reaction chamber.
Claims (4)
1. radioactive gas isotope manufacturing apparatus is characterized in that possessing:
Reaction chamber has and makes the illumination window of charged particle beam to indoor transmission, accepts the irradiation of the charged particle beam of this illumination window of transmission, and makes target gas carry out nuclear reaction; And
Gas-recycling plant makes from above-mentioned reaction chamber effluent air to flow in the above-mentioned reaction chamber.
2. radioactive gas isotope manufacturing apparatus as claimed in claim 1 is characterized in that,
Make target gas flow into the interior target gas inflow portion of reaction chamber towards above-mentioned illumination window.
3. radioactive gas isotope manufacturing apparatus as claimed in claim 1 or 2 is characterized in that,
Between the above-mentioned reaction chamber of the light incident side of the vacuum of the exiting side of charged particle beam and charged particle beam, 1 above-mentioned illumination window only is set.
4. as each the described radioactive gas isotope manufacturing apparatus in the claim 1 to 3, it is characterized in that,
The above-mentioned gas circulating device possesses makes target air cooling refrigeratory but.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009007856A JP2010164477A (en) | 2009-01-16 | 2009-01-16 | Radioactive gas isotope manufacture apparatus |
| JP007856/2009 | 2009-01-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101794635A true CN101794635A (en) | 2010-08-04 |
Family
ID=42580755
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201010003232A Pending CN101794635A (en) | 2009-01-16 | 2010-01-11 | Radioactive gas isotope manufacturing apparatus |
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| Country | Link |
|---|---|
| JP (1) | JP2010164477A (en) |
| CN (1) | CN101794635A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111164709A (en) * | 2017-10-31 | 2020-05-15 | 国立研究开发法人量子科学技术研究开发机构 | Method for producing radioisotope and radioisotope production apparatus |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6274689B1 (en) * | 2016-11-16 | 2018-02-07 | 株式会社京都メディカルテクノロジー | RI-labeled compound manufacturing apparatus and RI-labeled compound manufacturing method |
| JP7254586B2 (en) * | 2019-03-28 | 2023-04-10 | 住友重機械工業株式会社 | Target device |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6319837Y2 (en) * | 1981-03-18 | 1988-06-02 | ||
| JPS6388800U (en) * | 1986-11-29 | 1988-06-09 | ||
| JPH09113694A (en) * | 1995-10-13 | 1997-05-02 | N K K Plant Kensetsu Kk | Method for producing gas containing 15o as radioactive species |
-
2009
- 2009-01-16 JP JP2009007856A patent/JP2010164477A/en active Pending
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2010
- 2010-01-11 CN CN201010003232A patent/CN101794635A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111164709A (en) * | 2017-10-31 | 2020-05-15 | 国立研究开发法人量子科学技术研究开发机构 | Method for producing radioisotope and radioisotope production apparatus |
| CN111164709B (en) * | 2017-10-31 | 2023-10-31 | 国立研究开发法人量子科学技术研究开发机构 | Method and apparatus for producing radioisotope |
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| Publication number | Publication date |
|---|---|
| JP2010164477A (en) | 2010-07-29 |
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Application publication date: 20100804 |