CN101792320A - Method for sintering high-dielectric CaCu3Ti4O12 ceramics by using spark plasma - Google Patents
Method for sintering high-dielectric CaCu3Ti4O12 ceramics by using spark plasma Download PDFInfo
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- 238000005245 sintering Methods 0.000 title claims abstract description 58
- 238000000034 method Methods 0.000 title claims abstract description 19
- 239000000919 ceramic Substances 0.000 title abstract description 16
- 229910002966 CaCu3Ti4O12 Inorganic materials 0.000 title 1
- 229910004247 CaCu Inorganic materials 0.000 claims abstract description 12
- 239000000843 powder Substances 0.000 claims abstract description 6
- 238000000137 annealing Methods 0.000 claims description 20
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 5
- 229910002804 graphite Inorganic materials 0.000 claims description 4
- 239000010439 graphite Substances 0.000 claims description 4
- 238000001816 cooling Methods 0.000 claims description 3
- 238000003980 solgel method Methods 0.000 claims description 2
- 238000005255 carburizing Methods 0.000 claims 2
- 238000009413 insulation Methods 0.000 claims 2
- 230000006837 decompression Effects 0.000 claims 1
- 238000010792 warming Methods 0.000 claims 1
- 238000002490 spark plasma sintering Methods 0.000 abstract description 8
- 238000005259 measurement Methods 0.000 abstract description 2
- 238000002360 preparation method Methods 0.000 description 9
- 238000010586 diagram Methods 0.000 description 8
- 238000005265 energy consumption Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
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Abstract
一种利用放电等离子体烧结(SPS)高介电陶瓷CaCu3Ti4O12(简称CCTO)的方法。将纯CCTO粉末装入模具内再将该模具放入SPS烧结腔里的上下电极间;关闭烧结腔并将其抽真空,升温,加压,保温;再随炉冷却,减压并关真空泵;等温度降至一定程度后,将产品从烧结腔里取出。其烧结的产品的XRD结果显示样品为纯相,使用SEM可以观察到其形貌比较致密,介电性能测量显示样品在室温下具有较高的相对介电常数和较低的损耗。
A method of using spark plasma sintering (SPS) high dielectric ceramics CaCu 3 Ti 4 O 12 (abbreviated as CCTO). Put the pure CCTO powder into the mold and put the mold between the upper and lower electrodes in the SPS sintering cavity; close the sintering cavity and vacuumize it, heat up, pressurize, and keep warm; then cool with the furnace, depressurize and turn off the vacuum pump; After the temperature drops to a certain level, the product is taken out from the sintering chamber. The XRD results of the sintered product show that the sample is a pure phase, and the SEM can be used to observe that its morphology is relatively dense. The measurement of the dielectric properties shows that the sample has a high relative permittivity and low loss at room temperature.
Description
技术领域:Technical field:
本发明涉及一种高介电CaCu3Ti4O12陶瓷的烧结方法。The invention relates to a sintering method of high dielectric CaCu 3 Ti 4 O 12 ceramics.
背景介绍:Background introduction:
CaCu3Ti4O12(CCTO)是一种目前研究比较热门的高介电电子材料,其室温低频段的相对介电常数高达104~105,且介电性能在较宽的温度范围内(100-300K)比较稳定,因此,CCTO材料在微电子方面具有较好的应用前景。CaCu 3 Ti 4 O 12 (CCTO) is a high-dielectric electronic material that is currently being researched. Its relative permittivity at room temperature and low frequency range is as high as 10 4 to 10 5 , and its dielectric properties are in a wide temperature range. (100-300K) is relatively stable, therefore, CCTO materials have good application prospects in microelectronics.
CCTO陶瓷的传统烧结方法是用普通压片机在一定压力下(一般高达几十甚至几百兆帕斯卡)将CCTO粉末压制成片后在马弗炉中高温烧结。为了获得较为致密的陶瓷,需要经过较长的烧结时间(一般要几十小时)。因此,能耗较大。The traditional sintering method of CCTO ceramics is to press CCTO powder into tablets under a certain pressure (generally up to tens or even hundreds of megapascals) with an ordinary tablet press, and then sinter at high temperature in a muffle furnace. In order to obtain denser ceramics, a longer sintering time (generally tens of hours) is required. Therefore, the energy consumption is large.
放电等离子体烧结(SPS)是一种可以通过短时间烧结即可获得较致密片状材料的烧结方法,它在制备各种合金和陶瓷材料中已有广泛应用。但由于CCTO的特殊性能,目前SPS烧结还没有在CCTO陶瓷的生产上使用。Spark plasma sintering (SPS) is a sintering method that can obtain denser flake materials through short-time sintering. It has been widely used in the preparation of various alloys and ceramic materials. However, due to the special properties of CCTO, SPS sintering has not been used in the production of CCTO ceramics at present.
发明内容:Invention content:
本发明的目的就是根据CCTO的特殊性能提供一种能够利用SPS烧结CCTO陶瓷的方法,既能相对现有方法大大减少高温烧结时间以有效降低能耗,又能保有或增加CCTO的高介电性能。The purpose of the present invention is to provide a method that can use SPS to sinter CCTO ceramics according to the special properties of CCTO, which can not only greatly reduce the high-temperature sintering time to effectively reduce energy consumption compared with existing methods, but also maintain or increase the high dielectric properties of CCTO .
本发明的技术方案由以下步骤组成:Technical scheme of the present invention is made up of the following steps:
1.将纯CaCu3Ti4O12粉末装入模具并将该模具放入放电等离子体烧结腔里的上下电极间;1. Put pure CaCu 3 Ti 4 O 12 powder into a mold and place the mold between the upper and lower electrodes in the discharge plasma sintering chamber;
2.关闭烧结腔,开启真空泵,对烧结腔抽真空;2. Close the sintering chamber, turn on the vacuum pump, and evacuate the sintering chamber;
3.对烧结腔升温加压,待升温至800-980摄氏度时加压强至20-70兆帕,保温5-60分钟,而后随炉冷却并随温减压,关真空泵;3. Increase the temperature and pressurize the sintering chamber. When the temperature rises to 800-980 degrees Celsius, pressurize to 20-70 MPa, keep it warm for 5-60 minutes, then cool down with the furnace and depressurize with the temperature, and turn off the vacuum pump;
4.等温度降到100℃以下时,将产品从烧结腔里取出。4. When the temperature drops below 100°C, take the product out of the sintering chamber.
上述纯CaCu3Ti4O12粉末可用溶胶-凝胶法制得。The above pure CaCu 3 Ti 4 O 12 powder can be prepared by sol-gel method.
在上述升温加压过程中,压强大小应随温度升高而逐步加大,在低温时应只加少许压力。而在上述随炉冷却过程中可将压力减至最小。In the above-mentioned heating and pressurizing process, the pressure should gradually increase as the temperature rises, and only a little pressure should be added at low temperatures. However, the pressure can be minimized during the above furnace cooling process.
如果上述模具为石墨模具,则利用上述技术方案所得陶瓷的表面会出现一定厚度的渗碳层,为了除去渗入的碳需要将烧结好的样品再在马弗炉中进行500-900℃,保温2小时以上的退火处理,而后再将退火后所得陶瓷表面由于渗碳而分解的部分打磨掉并抛光。If the above-mentioned mold is a graphite mold, a carburized layer with a certain thickness will appear on the surface of the ceramic obtained by using the above-mentioned technical solution. In order to remove the infiltrated carbon, the sintered sample needs to be sintered in a muffle furnace at 500-900 ° C for 2 Hours of annealing treatment, and then the part of the ceramic surface obtained after annealing that is decomposed due to carburization is ground off and polished.
根据本发明烧结的CCTO陶瓷,其烧结的产品的XRD结果显示样品为纯相,使用SEM可以观察到其形貌比较致密,介电性能测量显示样品在室温下具有较高的相对介电常数和较低的损耗。According to the sintered CCTO ceramics of the present invention, the XRD result of its sintered product shows that the sample is a pure phase, and it can be observed that its morphology is relatively compact using SEM, and the dielectric property measurement shows that the sample has a higher relative permittivity and lower loss.
附图说明:Description of drawings:
附图1为本发明烧结的CCTO的断面扫描电镜形貌图;Accompanying drawing 1 is the cross-sectional scanning electron microscope topography figure of the CCTO sintered of the present invention;
附图2为本发明不同烧结温度的CCTO的介电性能。其中图2-1为相对介电常数比较图,图2-2为损耗比较图;Accompanying drawing 2 is the dielectric property of the CCTO of different sintering temperatures of the present invention. Among them, Figure 2-1 is a comparison diagram of relative permittivity, and Figure 2-2 is a comparison diagram of loss;
附图3为本发明不同烧结保温时间的CCTO的介电性能。其中图3-1为相对介电常数比较图,图3-2为损耗比较图;Accompanying
附图4为本发明不同烧结压力的CCTO的介电性能。其中图4-1为相对介电常数比较图,图4-2为损耗比较图;Accompanying drawing 4 is the dielectric property of the CCTO of different sintering pressures of the present invention. Among them, Figure 4-1 is a comparison diagram of relative permittivity, and Figure 4-2 is a comparison diagram of loss;
附图5为本发明不同退火温度的CCTO的介电性能。其中图5-1为相对介电常数比较图,图5-2为损耗比较图;Accompanying
附图6为本发明退火保温时间为2小时和10小时的CCTO的介电性能。其中图6-1为相对介电常数比较图,图6-2为损耗比较图;Accompanying drawing 6 shows the dielectric properties of CCTO with annealing and holding time of 2 hours and 10 hours according to the present invention. Among them, Figure 6-1 is a comparison chart of relative permittivity, and Figure 6-2 is a comparison chart of loss;
附图7为放电等离子烧结和普通烧结的介电性能。其中图7-1为相对介电常数比较图,图7-2为损耗比较图;Accompanying drawing 7 is the dielectric property of spark plasma sintering and common sintering. Among them, Figure 7-1 is a comparison diagram of relative permittivity, and Figure 7-2 is a comparison diagram of loss;
上述附图中:F-频率;ε′-相对介电常数;tanδ-损耗。In the above drawings: F-frequency; ε'-relative permittivity; tanδ-loss.
具体实施方式Detailed ways
下面以石墨模具为例,结合附图对本发明作进一步的介绍:Taking the graphite mold as an example below, the present invention will be further introduced in conjunction with the accompanying drawings:
实施例一:Embodiment one:
制备条件为:烧结保温时间为5分钟,烧结温度为980摄氏度,烧结压力为51兆帕,退火温度为600摄氏度,退火保温时间为2小时。The preparation conditions are as follows: the sintering holding time is 5 minutes, the sintering temperature is 980 degrees Celsius, the sintering pressure is 51 MPa, the annealing temperature is 600 degrees Celsius, and the annealing holding time is 2 hours.
从附图1可知,经短时间烧结后,所得到的样品非常致密。It can be seen from accompanying drawing 1 that after sintering for a short time, the obtained sample is very dense.
实施例二;Embodiment two;
制备条件为:烧结保温时间为5分钟,烧结压强为51兆帕,退火温度为600摄氏度,退火保温时间为10小时,但烧结温度却是一个为800摄氏度另一个为980摄氏度。The preparation conditions are as follows: the sintering holding time is 5 minutes, the sintering pressure is 51 MPa, the annealing temperature is 600 degrees Celsius, the annealing holding time is 10 hours, but the sintering temperature is 800 degrees Celsius and the other is 980 degrees Celsius.
从附图2-1和附图2-2可知:相应陶瓷在10000Hz下的相对介电常数前者为:3.0×103,后者为7.0×103,在这一频率下的损耗前者为:0.12,后者为:0.12;From attached drawings 2-1 and 2-2, it can be known that the relative dielectric constant of the corresponding ceramics at 10000Hz is: 3.0×10 3 , the latter is 7.0×10 3 , and the loss at this frequency is: 0.12, the latter is: 0.12;
实施例三:Embodiment three:
制备条件为:烧结温度为980摄氏度,烧结压强为51兆帕,退火温度为600摄氏度,退火保温时间为10小时,但烧结保温时间一个为5分钟另一个为60分钟。The preparation conditions are as follows: the sintering temperature is 980 degrees Celsius, the sintering pressure is 51 MPa, the annealing temperature is 600 degrees Celsius, and the annealing holding time is 10 hours, but the sintering holding time is 5 minutes and the other is 60 minutes.
从附图3-1和附图3-2可知:相应陶瓷在10000Hz下的相对介电常数前者为:7.0×103,后者为2.0×104,在这一频率下的损耗前者为:0.10,后者为:0.18;From attached drawings 3-1 and 3-2, it can be seen that the relative dielectric constant of the corresponding ceramics at 10000Hz is: 7.0×10 3 , the latter is 2.0×10 4 , and the loss at this frequency is: 0.10, the latter is: 0.18;
实施例四:Embodiment four:
制备条件为:烧结温度为980摄氏度,烧结保温时间为5分钟,退火温度为600摄氏度,退火保温时间为10小时,但烧结压强一个为20兆帕;另一个为70兆帕。The preparation conditions are as follows: the sintering temperature is 980 degrees Celsius, the sintering holding time is 5 minutes, the annealing temperature is 600 degrees Celsius, the annealing holding time is 10 hours, but the sintering pressure is 20 MPa for one and 70 MPa for the other.
从附图4-1和附图4-2可知:相应陶瓷在10000Hz下的相对介电常数前者为:8.0×103,后者为8.0×103,在这一频率下的损耗前者为:0.09,后者为:0.09;From attached drawings 4-1 and 4-2, it can be seen that the relative dielectric constant of the corresponding ceramics at 10000Hz is: 8.0×10 3 , the latter is 8.0×10 3 , and the loss at this frequency is: 0.09, the latter is: 0.09;
实施例五:Embodiment five:
制备条件为:烧结温度为980摄氏度,烧结保温时间为5分钟,烧结压强为51兆帕,退火保温时间为10小时,但退火温度一个为500摄氏度另一个为900摄氏度。The preparation conditions are as follows: the sintering temperature is 980 degrees Celsius, the sintering holding time is 5 minutes, the sintering pressure is 51 MPa, and the annealing holding time is 10 hours, but one annealing temperature is 500 degrees Celsius and the other is 900 degrees Celsius.
从附图5-1和附图5-2可知:相应陶瓷在10000Hz下的相对介电常数前者为:7.0×102,后者为7.0×104,在这一频率下的损耗前者为:0.50,后者为:0.27;From attached drawings 5-1 and 5-2, it can be seen that the relative permittivity of the corresponding ceramics at 10000Hz is 7.0×10 2 , the latter is 7.0×10 4 , and the loss at this frequency is: 0.50, the latter is: 0.27;
实施例六:Embodiment six:
制备条件为:烧结温度为980摄氏度,烧结保温时间为5分钟,烧结压强为51兆帕,退火温度为600摄氏度,退火保温时间为2小时和10小时。The preparation conditions are as follows: the sintering temperature is 980 degrees Celsius, the sintering holding time is 5 minutes, the sintering pressure is 51 MPa, the annealing temperature is 600 degrees Celsius, and the annealing holding time is 2 hours and 10 hours.
从附图6-1和附图6-2可知:相应陶瓷在10000Hz下前者的相对介电常数为:7×102,后者为2×104,在这一频率下前者的损耗为:0.07,后者为0.16。It can be seen from attached drawings 6-1 and 6-2 that the relative dielectric constant of the corresponding ceramics at 10000Hz is 7×10 2 and 2×10 4 at 10,000 Hz. The loss of the former at this frequency is: 0.07, the latter is 0.16.
实施例七:Embodiment seven:
放电等离子烧结的制备条件为:烧结温度为980℃,烧结保温时间为5分钟,烧结压力为51兆帕,退火温度为600℃,退火保温时间为:2小时,普通烧结制备条件为:烧结温度为1035℃保温3小时。前一种烧结方式的耗电量约:12Kw.h,后一种烧结方式的耗电量约为:58Kw.h.The preparation conditions of spark plasma sintering are as follows: sintering temperature is 980°C, sintering holding time is 5 minutes, sintering pressure is 51 MPa, annealing temperature is 600°C, annealing holding time is 2 hours, the general sintering preparation conditions are: sintering temperature Incubate at 1035°C for 3 hours. The power consumption of the former sintering method is about 12Kw.h, and the power consumption of the latter sintering method is about 58Kw.h.
从附图7-1和附图7-2可知:相应陶瓷在10000Hz下的相对介电常数前者为:7.0×103,后者为7.0×102,在这一频率下的损耗前者为:0.07后者为:0.04.因此用放电等离子烧结出来的样品和普通烧结所得的样品相比,损耗比较接近,但相对介电常数却比普通烧结出来的样品大10倍,且耗电量为普通烧结耗电量的五分之一。From attached drawings 7-1 and 7-2, it can be seen that the relative permittivity of the corresponding ceramics at 10000 Hz is: 7.0×10 3 , the latter is 7.0×10 2 , and the loss at this frequency is: 0.07 The latter is: 0.04. Therefore, compared with the sample obtained by ordinary sintering, the loss of the sample obtained by spark plasma sintering is relatively close, but the relative dielectric constant is 10 times larger than that of the ordinary sintered sample, and the power consumption is ordinary One-fifth of the power consumption of sintering.
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
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CN105568383A (en) * | 2016-01-06 | 2016-05-11 | 中国科学院上海光学精密机械研究所 | Synthesis method of CaCu3Ti4O12 crystal growth raw material and method for preparing CaCu3Ti4O12 crystal |
CN109912305A (en) * | 2019-04-25 | 2019-06-21 | 重庆大学 | A high potential gradient, low dielectric loss CaCu3Ti4O12 varistor ceramic and preparation method thereof |
CN112521166A (en) * | 2020-12-14 | 2021-03-19 | 江西科技学院 | Low dielectric loss CaCu3Ti4O12Negative pressure sintering method of ceramic |
CN113773055A (en) * | 2021-10-15 | 2021-12-10 | 中国船舶重工集团公司第七二五研究所 | Preparation method of metal oxide coating electrode |
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2010
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Non-Patent Citations (1)
Title |
---|
《JOURNAL OF APPLIED PHYSICS》 20091117 Ming Li et al. Origin(s) of the apparent high permittivity in CaCu3Ti4O12 ceramics: clarification on the contributions from internal barrier layer capacitor and sample-electrode contact effects 104106 1-8 1-5 第106卷, 2 * |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105568383A (en) * | 2016-01-06 | 2016-05-11 | 中国科学院上海光学精密机械研究所 | Synthesis method of CaCu3Ti4O12 crystal growth raw material and method for preparing CaCu3Ti4O12 crystal |
CN109912305A (en) * | 2019-04-25 | 2019-06-21 | 重庆大学 | A high potential gradient, low dielectric loss CaCu3Ti4O12 varistor ceramic and preparation method thereof |
CN109912305B (en) * | 2019-04-25 | 2022-03-04 | 重庆大学 | A high potential gradient, low dielectric loss CaCu3Ti4O12 varistor ceramic and preparation method thereof |
CN112521166A (en) * | 2020-12-14 | 2021-03-19 | 江西科技学院 | Low dielectric loss CaCu3Ti4O12Negative pressure sintering method of ceramic |
CN113773055A (en) * | 2021-10-15 | 2021-12-10 | 中国船舶重工集团公司第七二五研究所 | Preparation method of metal oxide coating electrode |
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