CN101788694B - Reflecting mirror with protective film and preparation method thereof - Google Patents

Reflecting mirror with protective film and preparation method thereof Download PDF

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Publication number
CN101788694B
CN101788694B CN 200910189038 CN200910189038A CN101788694B CN 101788694 B CN101788694 B CN 101788694B CN 200910189038 CN200910189038 CN 200910189038 CN 200910189038 A CN200910189038 A CN 200910189038A CN 101788694 B CN101788694 B CN 101788694B
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reflective mirror
mirror matrix
preparation
diaphragm
reflective
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CN101788694A (en
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周明杰
王省伟
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Oceans King Lighting Science and Technology Co Ltd
Shenzhen Oceans King Lighting Science and Technology Co Ltd
Shenzhen Oceans King Lighting Engineering Co Ltd
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Oceans King Lighting Science and Technology Co Ltd
Shenzhen Oceans King Lighting Engineering Co Ltd
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Abstract

The invention relates to a reflecting mirror with a protective film and a preparation method thereof. The preparation method comprises the following steps: performing pretreatment, namely cleaning and drying a reflecting mirror substrate; plating a silicon monoxide transition protective film, namely plating the silicon monoxide transition protective film on the pre-treated reflecting mirror substrate by adopting a method for performing vapor deposition on the silicon monoxide in high vacuum at a high deposition speed; and plating a magnesium fluoride friction resistant protective film, namely further plating an MgF2 protective film on the reflecting mirror substrate plated with the silicon monoxide transition protective film by adopting an ion-assisted deposition method. The reflecting mirror with the protective film prepared by the method comprises the reflecting mirror substrate and the silicon monoxide transition protective film and the magnesium fluoride friction resistant protective film which are laminated on a reflecting surface of the reflecting mirror substrate in turn. The reflecting mirror prepared by the preparation method has high reflection rate and excellent friction resistance.

Description

Has reflective mirror of diaphragm and preparation method thereof
Technical field
The present invention relates to a kind of reflective mirror and preparation method thereof, more particularly, relate to a kind of reflective mirror and preparation method thereof with diaphragm.
Background technology
Mirror application is in light fixture, can effectively converge the light that the light source of light fixture sends, and plays the effect that reduces energy loss.Directly use behind the most aluminizer of reflective mirror of light fixture at present, because the poor-performing of aluminium film self antioxidant anticorrosive, and under hot conditions, understand the oxidation flavescence, thereby can cause the reduction of light fixture optical property.Existing improving one's methods is electroplating surface silicon monoxide or the magnesium fluoride diaphragm at reflective mirror; The transmittance of silicon monoxide is superior to silicon dioxide; Yet it is unstable in air, further is oxidized to silicon dioxide easily, influences the reflecting rate of reflective mirror; And adopt the crocking resistance of the magnesium fluoride diaphragm that traditional vacuum deposition method is coated with bad, can influence the reflecting rate of reflective mirror after the wiping.
Summary of the invention
The technical matters that the present invention will solve is, the shortcoming to the preparation method of above-mentioned existing reflective mirror exists provides a kind of preparation method with reflective mirror of diaphragm, and the reflective mirror that is coated with has good reflecting rate and crocking resistance.
Another technical matters that the present invention will solve is that the shortcoming to above-mentioned existing reflective mirror exists provides a kind of reflective mirror with diaphragm, has good reflecting rate and crocking resistance.
The present invention solves the technical scheme that its technical matters adopts: a kind of preparation method with reflective mirror of diaphragm is provided, comprises the steps:
Pre-service: the reflective mirror matrix is cleaned and dries;
Plating silicon monoxide over current protection film: adopt the method for high deposition rate vapor deposition silicon monoxide under the high vacuum on pretreated reflective mirror matrix, to be coated with silicon monoxide over current protection film;
Plating magnesium fluoride rub resistance diaphragm: adopt the method for ion assisted deposition further on the reflective mirror matrix that is coated with silicon monoxide over current protection film, to be coated with MgF 2Diaphragm.
In the preparation method of the reflective mirror with diaphragm of the present invention, in said pre-treatment step, adopt cleaning fluid to carry out ultrasonic cleaning earlier to the reflective mirror matrix, clean with pure water then.
In the preparation method of the reflective mirror with diaphragm of the present invention, further comprise the steps: between said pre-treatment step and the plating silicon monoxide over current protection film step
Priming: in spraying on the reflective mirror matrix or soak corresponding priming paint, solidify then, dry according to the material behavior of reflective mirror matrix;
The plating reflective membrane: will on have the reflective mirror matrix of priming paint to put into vacuum chamber vapor deposition reflective membrane;
High-pressure ion bombardment: the reflective membrane on the reflective mirror matrix is carried out the high-pressure ion bombardment.
In the preparation method of the reflective mirror with diaphragm of the present invention, said reflective membrane is aluminium film or silverskin.
In the preparation method of the reflective mirror with diaphragm of the present invention; The bombardment of said high-pressure ion is in the nitrogen atmosphere of 2～5Pa, DC voltage in addition on the reflective mirror matrix, voltage 2000～3500V; Electric current 2～4A; Produce stable glow discharge, produce plasma jet, plasma jet bombardment reflective membrane surface 200～300s under stable glow discharge condition.
In the preparation method of the reflective mirror with diaphragm of the present invention, the pressure that method adopted of high deposition rate vapor deposition silicon monoxide is 1 * 10 under the said high vacuum -3～10 -5Pa, with
Figure G2009101890387D00021
Deposited at rates 8～10s.
In the preparation method of the reflective mirror with diaphragm of the present invention, said ion assisted deposition is in vacuum chamber, is negative electrode with the reflective mirror matrix, with MgF 2Be anode, vacuum chamber is evacuated to 1～3 * 10 -2Pa fills the argon gas with 1Pa then, again the reflective mirror matrix is applied a high negative potential, makes argon gas ionization, produces glow discharge, and argon ion bombardment reflective mirror matrix makes it to be able to cleaning, and the time is 10～20 minutes, treat the reflective mirror cleaning after, with monocrystalline MgF 2Put into the heating molybdenum crucible, make monocrystalline MgF 2Melt and evaporation, work as MgF 2When steam passed through the argon plasma region of discharge, the part steam produced ionization, is deposited on the reflective mirror matrix and forms MgF 2Diaphragm.
In the preparation method of the reflective mirror with diaphragm of the present invention, the ion energy of said ion assisted deposition is 125～250eV, and the ion beam current density at reflective mirror matrix surface place is 5～70 μ A/cm 2Ion gun is operated in 1～3 * 10 -4Under the vacuum tightness of Pa, vacuum chamber argon gas body molecule pressure is 1～3 * 10 -2Pa, MgF 2Ion with
Figure G2009101890387D00031
Rate of sedimentation be deposited on the room temperature reflective mirror matrix at 30～50cm place, evaporation source top, deposit 15～20s.
The present invention solves another technical scheme that its technical matters adopts: a kind of reflective mirror with diaphragm is provided; Adopt aforesaid preparation method to be made, comprising: the reflective mirror matrix, be cascadingly set on silicon monoxide over current protection film and magnesium fluoride rub resistance diaphragm on the reflective mirror matrix reflecting surface.
In the reflective mirror with diaphragm of the present invention, prime coat and reflective membrane also have been cascading between said reflective mirror matrix and the silicon monoxide over current protection film; Said reflective membrane is aluminium film or silverskin.
Embodiment of the present invention can be brought following beneficial effect: adopt the prepared reflective mirror with diaphragm of preparation method of the present invention, not only can effectively keep the reflective function of reflective membrane, prolong the serviceable life of reflective mirror; But also can carry out repeatedly wiping to reflective mirror, and can not influence the reflectivity of reflective mirror, can effectively improve the maintainability performance of reflective mirror; And, because before protective film coating, reflective membrane is through the high-pressure ion bombardment; Increased the compactness of reflective membrane; Improved the reflecting rate of reflective membrane, promoted the optical property of reflective mirror, the reflectivity through the prepared reflective mirror of preparation method of the present invention can reach more than 92%.
Description of drawings
To combine accompanying drawing and embodiment that the present invention is described further below, in the accompanying drawing:
Shown in Figure 1 is preparation method's process flow diagram of the reflective mirror with diaphragm of the embodiment of the invention;
Fig. 2 is the reflective mirror basal body structure synoptic diagram of the embodiment of the invention;
Fig. 3 is the mirror construction synoptic diagram with diaphragm of the embodiment of the invention.
Embodiment
Shown in Figure 1 is the preparation method's process flow diagram with reflective mirror of diaphragm of the present invention, and the preparation method with reflective mirror of diaphragm of the present invention comprises the steps:
Step 1 pre-service: select suitable cleaning fluid to carry out ultrasonic cleaning according to the pollution condition of reflective mirror matrix, clean and oven dry with pure water then.
Step 2 priming: in spraying on the reflective mirror matrix or soak corresponding priming paint, solidify then, dry according to the material behavior of reflective mirror matrix.
Step 3 plating reflective membrane: will on have the reflective mirror matrix of priming paint to put into vacuum chamber vapor deposition reflective membrane, said reflective membrane can be aluminium film or silverskin, notes keeping the cleaning of reflective mirror matrix, this technology is common process.
Step 4 high-pressure ion bombardment: reflective membrane is carried out the high-pressure ion bombardment, charge into nitrogen 2～5Pa, in nitrogen atmosphere, DC voltage in addition on reflective mirror; Voltage 2000～3500V, electric current 2～4A produces stable glow discharge; Glow discharge produces plasma jet, under stable glow discharge condition, and plasma jet bombardment reflective membrane surface 200～300s; The reflective membrane of process high-pressure ion bombardment can strengthen the adhesion of reflective membrane, increases its compactness, improves reflecting rate.
Step 5 plating silicon monoxide over current protection film: adopt the method preparation of high deposition rate vapor deposition silicon monoxide under the high vacuum, pressure is 1 * 10 -3～10 -5Pa, with
Figure G2009101890387D00041
Deposited at rates 8～10s.High deposition rate vapor deposition silicon monoxide is exactly under higher relatively vacuum state under the high vacuum; On the reflective mirror matrix, be coated with silicon monoxide over current protection film with higher rate of sedimentation; Itself and common vapor deposition do not have essential distinction; Thereby can adopt the equipment of conventional vacuum vapor deposition to carry out, and divide according to the vacuum of JIS (JIS), be in 10 -1～10 -5The Pa pressure be high vacuum, the vacuum range of this step is 10 -3～10 -5Pa be in the scope of high vacuum, and its speed range does
Figure G2009101890387D00042
The scope that belongs to high deposition rate.
Step 6 plating magnesium fluoride rub resistance diaphragm: adopt the method for ion assisted deposition on the reflective mirror matrix that is coated with silicon monoxide over current protection film, to be coated with MgF 2Diaphragm.Ion assisted deposition is the continuous action by a small amount of energetic ion and a large amount of high-energy neutrons, metal vapors is deposited on a kind of treatment process of surface of the work.Specifically, ion assisted deposition is a negative electrode with the reflective mirror matrix, with plated metal (MgF 2) be anode, precipitation equipment is a vacuum chamber, is connected with a vacuum pump, treats that the reflective mirror matrix packs into behind the vacuum chamber, and vacuum chamber is evacuated to 1～3 * 10 -2Pa fills the argon gas with 1Pa then, again the reflective mirror matrix is applied a high negative potential, makes argon gas ionization, produces glow discharge, and argon ion bombardment reflective mirror matrix makes it to be able to cleaning, and the time is 10～20 minutes; After treating the cleaning of reflective mirror matrix, with monocrystalline MgF 2Put into the resistance heated molybdenum crucible, make its thawing and evaporation, work as MgF 2When steam passed through the argon plasma region of discharge, the part steam produced ionization, is deposited on the reflective mirror matrix and forms MgF 2Diaphragm.Wherein, ion energy is 125～250eV, and the ion beam current density at reflective mirror matrix surface place is 5～70 μ A/cm 2Ion gun is operated in 1～3 * 10 -4Under the vacuum tightness of pa, the vacuum chamber ar pressure is 1～3 * 10 -2Pa, MgF 2Ion with
Figure G2009101890387D00043
Rate of sedimentation be deposited on the room temperature reflective mirror matrix at 30～50cm place, evaporation source top deposition 15～20s, the MgF that employing ion assisted deposition method is coated with 2The diaphragm physical strength is big, adhesion good, crocking resistance is good.
Be that example specifies below with embodiment:
Embodiment 1
Be illustrated in figure 2 as the structural representation before the reflective mirror matrix protective film coating, shown in Figure 3ly be coated with the structural representation behind the diaphragm for the reflective mirror matrix.Consult Fig. 1, said reflective mirror matrix 1 adopts the BMC material to form, and roughly is the semiellipsoid shape; Its lower end is provided with perforate 11, and said perforate 11 is rounded, is used for light source is fixed on reflective mirror matrix 1 from this perforate 11; Its upper end is provided with rim of a cup 12, and said rim of a cup 12 is rounded, and the light that is used to light source is sent penetrates from this rim of a cup 12; Its inner surface is provided with reflecting surface 13, is used for reflection ray.
Adopt the preparation method with diaphragm reflective mirror of embodiments of the invention 1 to handle reflective mirror matrix 1, specifically comprise the steps:
Step 1.1 pre-service: the reflective mirror matrix is put into the ultrasonic unit that cleaning fluid is housed clean 15min, after cleaning with pure water again, put into 60 ℃ the dry 2h of drying cupboard.
Step 1.2 priming: on the reflecting surface of reflective mirror matrix, spray priming paint, then curing, drying.
Step 1.3 AM aluminum metallization film: the reflective mirror matrix of first-class priming paint is put into vacuum chamber AM aluminum metallization film.
Step 1.4 vapor deposition silicon monoxide diaphragm: before the plating silicon monoxide, charge into the nitrogen of 5Pa, voltage is added to 3500V; Electric current is about 4A, produces stable glow discharge, and glow discharge produces plasma jet; Under stable glow discharge condition; Plasma jet bombardment reflective membrane surface 300s emits nitrogen then, and vacuum is evacuated to 1 * 10 -5Under the Pa, evaporation rate is transferred to Deposition 8s.
Step 1.5 vapor deposition magnesium fluoride hard films: adopt the ion assisted deposition method on the reflective mirror matrix that is coated with silicon monoxide over current protection film, to be coated with MgF 2Diaphragm, ion energy are 250eV, and the ion beam current density at reflective mirror matrix surface place is 70 μ A/cm 2Ion gun is operated in 1 * 10 -4Under the vacuum tightness of pa, the vacuum chamber ar pressure is 10 -2Pa, MgF 2Ion with
Figure G2009101890387D00052
Rate of sedimentation be deposited on the room temperature reflective mirror matrix at 30cm place, evaporation source top deposition 20s, the MgF that employing ion assisted deposition method is coated with 2The diaphragm physical strength is big, adhesion good, crocking resistance is good.
Consult Fig. 3, adopt the prepared reflective mirror of preparation method of embodiment 1 to comprise: reflective mirror matrix 1, be cascadingly set on prime coat 2, aluminium film 3, SiO over current protection film 4 and MgF on the reflecting surface 13 of reflective mirror matrix 1 with diaphragm 2 Rub resistance diaphragm 5.
Embodiment 2
Adopt the preparation method of the reflective mirror with diaphragm of the embodiment of the invention 2 to handle reflective mirror matrix 1, specifically comprise the steps:
Step 2.1 pre-service: the reflective mirror matrix is put into the ultrasonic unit that cleaning fluid is housed clean 20min, after cleaning with pure water again, put into 80 ℃ the dry 1h of drying cupboard.
Step 2.2 priming: on the reflecting surface of reflective mirror matrix, spray priming paint, then curing, drying.
Step 2.3 AM aluminum metallization film: the reflective mirror matrix of first-class priming paint is put into vacuum chamber vapor deposition silverskin.
Step 2.4 vapor deposition silicon monoxide diaphragm: before the plating silicon monoxide, charge into the nitrogen of 2Pa, voltage is added to 2000V; Electric current is about 2A, produces stable glow discharge, and glow discharge produces plasma jet; Under stable glow discharge condition; Plasma jet bombardment reflective membrane surface 200s emits nitrogen then, and vacuum is evacuated to 1 * 10 -3Under the pa, evaporation rate is transferred to
Figure G2009101890387D00061
Deposition 10s.
Step 2.5 vapor deposition magnesium fluoride hard films: adopt the ion assisted deposition method on the reflective mirror matrix that is coated with silicon monoxide over current protection film, to be coated with MgF 2Diaphragm, ion energy are 125eV, and the ion beam current density at reflective mirror matrix surface place is 5 μ A/cm 2Ion gun is operated in 3 * 10 -4Under the vacuum tightness of pa, the vacuum chamber ar pressure is 3 * 10 -2Pa, MgF 2Ion with
Figure G2009101890387D00062
Rate of sedimentation be deposited on the room temperature reflective mirror matrix at 50cm place, evaporation source top deposition 15s, the MgF that employing ion assisted deposition method is coated with 2The diaphragm physical strength is big, adhesion good, crocking resistance is good.
Adopt the prepared reflective mirror of preparation method of the foregoing description 2, comprising: the reflective mirror matrix, be cascadingly set on prime coat, silverskin, SiO over current protection film and MgF on the reflecting surface of reflective mirror matrix with diaphragm 2The rub resistance diaphragm.
Embodiment 3
Adopt the preparation method of the reflective mirror with diaphragm of embodiments of the invention 3 to handle reflective mirror matrix 1, specifically comprise the steps:
Step 3.1 pre-service: the reflective mirror matrix is put into the ultrasonic unit that cleaning fluid is housed clean 25min, after cleaning with pure water again, put into 70 ℃ the dry 2h of drying cupboard.
Step 3.2 priming: on the reflecting surface of reflective mirror matrix, spray priming paint, then curing, drying.
Step 3.3 AM aluminum metallization film: the reflective mirror matrix of first-class priming paint is put into vacuum chamber vapor deposition silverskin.
Step 3.4 vapor deposition silicon monoxide diaphragm: before the plating silicon monoxide, charge into the nitrogen of 3Pa, voltage is added to 3000V; Electric current is about 3A, produces stable glow discharge, and glow discharge produces plasma jet; Under stable glow discharge condition; Plasma jet bombardment reflective membrane surface 250s emits nitrogen then, and vacuum is evacuated to 1 * 10 -4Under the pa, evaporation rate is transferred to
Figure G2009101890387D00071
Deposition 9s.
Step 3.5 vapor deposition magnesium fluoride hard films: adopt the ion assisted deposition method on the reflective mirror matrix that is coated with silicon monoxide over current protection film, to be coated with MgF 2Diaphragm, ion energy are 200eV, and the ion beam current density at reflective mirror matrix surface place is 35 μ A/cm 2Ion gun is operated in 2 * 10 -4Under the vacuum tightness of Pa, the vacuum chamber ar pressure is 2 * 10 -2Pa, MgF 2Ion with
Figure G2009101890387D00072
Rate of sedimentation be deposited on the room temperature reflective mirror matrix at 40cm place, evaporation source top deposition 18s, the MgF that employing ion assisted deposition method is coated with 2The diaphragm physical strength is big, adhesion good, crocking resistance is good.
Adopt the prepared reflective mirror of preparation method of the foregoing description 3, comprising: the reflective mirror matrix, be cascadingly set on prime coat, silverskin, SiO over current protection film and MgF on the reflecting surface of reflective mirror matrix with diaphragm 2The rub resistance diaphragm.
Confirm through overtesting: adopt the prepared reflective mirror of preparation method of the foregoing description 1-3, not only can effectively keep the reflective function of reflective membrane, prolong the serviceable life of reflective mirror with diaphragm; But also can carry out repeatedly wiping to reflective mirror, and can not influence the reflectivity of reflective mirror, improve the maintainability performance of reflective mirror; And, because before protective film coating, reflective membrane is through the high-pressure ion bombardment; Increased the compactness of reflective membrane; Improved the reflecting rate of reflective membrane, promoted the optical property of reflective mirror, the reflectivity of the reflective mirror of preparation can reach more than 92% by the way.
The above; Be merely the preferable embodiment of the present invention, but protection scope of the present invention is not limited thereto, any technician who is familiar with the present technique field is in the technical scope that the present invention discloses; The variation that can expect easily or replacement all should be encompassed within protection scope of the present invention.Therefore, protection scope of the present invention should be as the criterion with the protection domain of claim.

Claims (7)

1. the preparation method with reflective mirror of diaphragm is characterized in that, comprises the steps:
Pre-service: the reflective mirror matrix is cleaned and dries;
Plating silicon monoxide over current protection film: adopt the method for high deposition rate vapor deposition silicon monoxide under the high vacuum on pretreated reflective mirror matrix, to be coated with silicon monoxide over current protection film;
Plating magnesium fluoride rub resistance diaphragm: adopt the method for ion assisted deposition further on the reflective mirror matrix that is coated with silicon monoxide over current protection film, to be coated with MgF 2Diaphragm;
Wherein, the ion energy of said ion assisted deposition is 125～250eV, and the ion beam current density at reflective mirror matrix surface place is 5～70 μ A/cm 2Ion gun is operated in 1～3 * 10 -4Under the vacuum tightness of Pa, the vacuum chamber ar pressure is 1～3 * 10 -2Pa, MgF 2Ion with
Figure FDA0000134532340000011
Rate of sedimentation be deposited on the room temperature reflective mirror matrix at 30～50cm place, evaporation source top, deposit 15～20s.
2. the preparation method with reflective mirror of diaphragm according to claim 1 is characterized in that, in said pre-treatment step, adopts cleaning fluid to carry out ultrasonic cleaning earlier to the reflective mirror matrix, cleans with pure water then.
3. the preparation method with reflective mirror of diaphragm according to claim 1 is characterized in that, further comprises the steps: between said pre-treatment step and the plating silicon monoxide over current protection film step
Priming: in spraying on the reflective mirror matrix or soak corresponding priming paint, solidify then, dry according to the material behavior of reflective mirror matrix;
The plating reflective membrane: will on have the reflective mirror matrix of priming paint to put into vacuum chamber vapor deposition reflective membrane;
High-pressure ion bombardment: the reflective membrane on the reflective mirror matrix is carried out the high-pressure ion bombardment.
4. the preparation method with reflective mirror of diaphragm according to claim 3 is characterized in that, said reflective membrane is aluminium film or silverskin.
5. the preparation method with reflective mirror of diaphragm according to claim 3 is characterized in that, said high-pressure ion bombardment is in the nitrogen atmosphere of 2～5Pa; DC voltage in addition on the reflective mirror matrix; Voltage 2000～3500V, electric current 2～4A produces stable glow discharge; Glow discharge produces plasma jet, plasma jet bombardment reflective membrane surface 200～300s under stable glow discharge condition.
6. the preparation method with reflective mirror of diaphragm according to claim 1 is characterized in that, the pressure that method adopted of high deposition rate vapor deposition silicon monoxide is 1 * 10 under the said high vacuum -3～10 -5Pa, with
Figure FDA0000134532340000021
Deposited at rates 8～10s.
7. the preparation method with reflective mirror of diaphragm according to claim 1 is characterized in that said ion assisted deposition is in vacuum chamber, is negative electrode with the reflective mirror matrix, with MgF 2Be anode, vacuum chamber is evacuated to 1～3 * 10 -2Pa fills the argon gas with 1Pa then, again the reflective mirror matrix is applied a high negative potential, makes argon gas ionization, produces glow discharge, and argon ion bombardment reflective mirror matrix makes it to be able to cleaning, and the time is 10～20 minutes, treat the reflective mirror cleaning after, with monocrystalline MgF 2Put into the heating molybdenum crucible, make monocrystalline MgF 2Melt and evaporation, work as MgF 2When steam passed through the argon plasma region of discharge, the part steam produced ionization, is deposited on the reflective mirror matrix and forms MgF 2Diaphragm.
CN 200910189038 2009-12-17 2009-12-17 Reflecting mirror with protective film and preparation method thereof Expired - Fee Related CN101788694B (en)

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CN102707350B (en) * 2012-06-19 2014-01-15 宜兴市晶科光学仪器有限公司 Ultraviolet visible band high-reflectance high-stability reflecting mirror and preparation method thereof

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US6939018B2 (en) * 2002-11-19 2005-09-06 Fujinon Corporatioin Reflecting mirror
CN1707329A (en) * 2004-06-11 2005-12-14 鸿富锦精密工业（深圳）有限公司 Light conducting plate
CN101126487A (en) * 2006-08-16 2008-02-20 林吉雄 LED nano energy-saving environment-friendly road lamp
CN101132662A (en) * 2006-08-24 2008-02-27 康宁股份有限公司 A light emitting device including anti-reflection layer(s)
CN101202198A (en) * 2006-12-13 2008-06-18 陈宗烈 New type non-filament florescent lamp working in brightness arc transition zone
CN201093362Y (en) * 2007-10-23 2008-07-30 蔡弘翊 Lamp body with optical reflex illumination device
CN101490143A (en) * 2006-06-09 2009-07-22 埃克阿泰克有限责任公司 Self-illuminating glazing panels

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1327162A (en) * 2000-06-05 2001-12-19 富士写真光机株式会社 Aluminium reflector and its preparing method
US6939018B2 (en) * 2002-11-19 2005-09-06 Fujinon Corporatioin Reflecting mirror
CN1707329A (en) * 2004-06-11 2005-12-14 鸿富锦精密工业（深圳）有限公司 Light conducting plate
CN101490143A (en) * 2006-06-09 2009-07-22 埃克阿泰克有限责任公司 Self-illuminating glazing panels
CN101126487A (en) * 2006-08-16 2008-02-20 林吉雄 LED nano energy-saving environment-friendly road lamp
CN101132662A (en) * 2006-08-24 2008-02-27 康宁股份有限公司 A light emitting device including anti-reflection layer(s)
CN101202198A (en) * 2006-12-13 2008-06-18 陈宗烈 New type non-filament florescent lamp working in brightness arc transition zone
CN201093362Y (en) * 2007-10-23 2008-07-30 蔡弘翊 Lamp body with optical reflex illumination device

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