CN101768767A - Electroplating process for plasma coating - Google Patents
Electroplating process for plasma coating Download PDFInfo
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- CN101768767A CN101768767A CN201010034476A CN201010034476A CN101768767A CN 101768767 A CN101768767 A CN 101768767A CN 201010034476 A CN201010034476 A CN 201010034476A CN 201010034476 A CN201010034476 A CN 201010034476A CN 101768767 A CN101768767 A CN 101768767A
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Abstract
The invention provides an electroplating process for a plasma coating. In the electroplating process, a pre-plated metal workpiece is placed in prepared electroplating solution under the temperature of 40-90 DEG C, the pH value is stabilized within 7.0 to 9.0 in the electroplating process, and the current density is 2-20A/dm2. The steps of the preparation for the prepared electroplating solution are as follows: components of the electroplating solution are uniformly mixed according to the adding sequence of 30-90g/L of sodium tungstate, 20-80g/L of potassium sodium tartrate, 15-55g/L of citric acid, 10-45g/L of ferrous sulfate, 1-3g/L of ascorbic acid and 0-0.1g/L of sodium dodecyl sulfate at constant volume, and the pH value of the electroplating solution is adjusted to 7.0-9.0 by ammonia water. A chemical reagent used in the invention cannot pollute the environment; the components of the electroplating solution are simple, have good stability and strong covering as well as dispersing capabilities, and can be stored for a long time; the content of tungsten in an obtained tungsten alloy coating is up to more than 55wt%, and the coating is firmly combined with a matrix.
Description
Technical field
The invention belongs to the electroplating technology field, particularly a kind of towards the plasma coating electroplating technology.
Background technology
Towards plasma material (Plasma Facing Materials, PFMs), promptly in the nuclear fusion reaction device directly in the face of the first wall of plasma body (First Wall, FW) and the armor material of divertor (divertor) and slicer (limiter).Under normal operation condition, protect first wall, hurdle, hole and divertor block construction material to avoid the sputter effect of plasma body escape particle towards plasma material.Under unusual or transient condition, when plasma body for example taking place breaking incident, also provide protection to structured material.When the generation plasma body broke, whole energy of plasma body were deposited on these surfacings in the time of 0.1ms, avoided the damage to structured material.Owing to do not bear structure function, to the major requirement of material be: have low sputter rate, high thermal shocking drag, high heat load ability, low tritium amount retained, low activation radioactivity, low decay waste heat towards plasma material.
Because tungsten has good thermal characteristics, it is refractory metal, low-steam pressure, good heat-conductive characteristic, and reduce less with the rising heat-conductive characteristic of temperature, low stagnant Hydrogen Energy power, high physical sputtering energy threshold and low chemical sputtering activity make tungsten be considered to the armor material of ideal towards the plasma body element.
Summary of the invention
The object of the present invention is to provide a kind ofly, make the tungstenalloy coating that directly can obtain one deck even compact towards the material surface of plasma body towards the plasma coating electroplating technology.
A kind of towards the plasma coating electroplating technology, be that the metal works through the plating pre-treatment is placed in 40～90 ℃ of electroplate liquids that prepare, in electroplating process, keep pH value to be stabilized in 7.0～9.0 scopes, current density is 2～20A/dm
2The layoutprocedure of the described electroplate liquid for preparing is: the moiety of the electroplate liquid addition sequence according to sodium wolframate 30～90g/L, Seignette salt 20～80g/L, citric acid 15～55g/L, ferrous sulfate 10～45g/L, xitix 1～3g/L and sodium laurylsulfonate 0～0.1g/L is mixed, be diluted with water to the plating tank specified amount again, regulate plating bath pH value to 7.0～9.0 with ammoniacal liquor, be heated in 40～90 ℃ of scopes.
The preferred group of described electroplate liquid becomes: sodium wolframate 65g/L, Seignette salt 60g/L, citric acid 80g/L, ferrous sulfate 45g/L, xitix 2g/L and sodium laurylsulfonate 0.02g/L.
Form towards the electroplating technology step of plasma coating in the metallic surface and to be:
A. the preparation of electroplate liquid:
Add deionized water earlier, add sodium wolframate, Seignette salt, citric acid, ferrous sulfate, xitix and sodium laurylsulfonate again, according to must fully stirring behind every kind of material of listed order adding, it is dissolved fully, xitix and sodium laurylsulfonate add and fashionablely in beaker it are fully dissolved at first respectively, ammoniacal liquor is regulated plating bath pH value to 7.0～9.0, adds the deionized water constant volume, gets final product plating after the heating electroplate liquid;
B. the pre-treatment of plating piece:
According to the processing mode on common metal surface or according to following treatment step, metal works is put into 10% sodium hydroxide solution that boils, alkali cleaning 15min, with the dilute hydrochloric acid pickling 15min that again workpiece is put into 15% after the flushing with clean water, flushing with clean water, with mechanical means the activation of 10% dilute hydrochloric acid, washed with de-ionized water are cleaned in the defective removal back that the surface is difficult to remove in ultrasonic wave.
C. plating: after the plating piece pre-treatment, be put in the electroplate liquid of preparing among the step a and electroplate, bath temperature rises to 40～90 ℃, and current density is 2～20A/dm
2, after having plated, wash, dry up.
Electroplating used anode is stainless steel, and thickness of coating is tens to the hundreds of micron.
It is a kind of towards plasma coating that the present invention adopts above-mentioned electroplating technology to form in the metallic surface, and this coating has the non-crystal structure (see figure 1), and coating has premium propertiess (seeing Fig. 2, Fig. 3) such as bright and clean, even, densification and high rigidity.
The invention has the advantages that:
1) the present invention can on body materials such as carbon steel, steel alloy, copper and alloy thereof, electroplate obtain bright and clean even compact towards plasma body tungstenalloy coating.
2) various chemical reagent environmentally safes among the present invention, bath composition is simple, but the good prolonged preservation of bath stability, covering power and dispersive ability are good.
3) electroplating technology current density range of the present invention is wide, and temperature range is wide, makes that technology simply is easy to grasp.
4) W content accounts for more than the 55wt% in the tungstenalloy coating that the present invention obtained, and coating and matrix bond are firm.
Description of drawings
Fig. 1: ferrotungsten coating XRD figure.
Fig. 2: ferrotungsten coating surface morphology.
Fig. 3: ferrotungsten coating cross-section morphology.
Embodiment
Embodiment 1:
(1) metal works plates pre-treatment: according to the processing mode on common metal surface or according to following treatment step: metal works is put into 10% sodium hydroxide solution that boils, alkali cleaning 15min, with the dilute hydrochloric acid pickling 15min that again workpiece is put into 15% after the flushing with clean water, flushing with clean water, with mechanical means the defective removal back that the surface is difficult to remove is cleaned in ultrasonic wave, the activation of 10% dilute hydrochloric acid, washed with de-ionized water.
(2) preparation electroplate liquid: sodium wolframate 65g/L, Seignette salt 60g/L, citric acid 40g/L, ferrous sulfate 25g/L, xitix 2g/L and sodium laurylsulfonate 0.02g/L, mentioned component is got aequum fully to be dissolved in a certain amount of deionized water respectively in order, stir, add deionized water again to desired volume, transfer pH value to reach 8.0 with ammoniacal liquor then.
(3) electroplate implementation process: the electroplate liquid for preparing is warmed up to 70 ℃, keeps pH value to be stabilized in 8.0, current density 10A/dm in the electroplating process
2Anode is selected stainless material for use, electroplates 1h.
Form the tungstenalloy coating of even compact in the metallic surface, thickness of coating is 60～70 μ m.
Embodiment 2:
(1) with embodiment 1.
(2) preparation electroplate liquid: sodium wolframate 80g/L, Seignette salt 45g/L, citric acid 50g/L, ferrous sulfate 40g/L, xitix 1g/L and sodium laurylsulfonate 0.1g/L, mentioned component is got aequum fully to be dissolved in a certain amount of deionized water respectively in order, stir, add deionized water again to desired volume, transfer pH value to reach 7.5 with ammoniacal liquor then.
(3) electroplate implementation process: the electroplate liquid for preparing is warmed up to 80 ℃, keeps pH value to be stabilized in 7.5, current density 15A/dm in the galvanized process
2Anode is selected stainless material for use.Electroplate 1h.
Form the tungstenalloy coating of even compact in the metallic surface, thickness of coating is 75～90 μ m.
Embodiment 3:
(1) with embodiment 1.
(2) preparation electroplate liquid: sodium wolframate 40g/L, Seignette salt 75g/L, citric acid 30g/L, ferrous sulfate 15g/L, xitix 1.5g/L and sodium laurylsulfonate 0.05g/L, mentioned component is got aequum fully to be dissolved in a certain amount of deionized water respectively in order, stir, add deionized water again to desired volume, transfer pH value to reach 8.5 with ammoniacal liquor then.
(3) electroplate implementation process: the electroplate liquid for preparing is warmed up to 90 ℃, keeps pH value to be stabilized in 8.5, current density 5A/dm in the galvanized process
2Anode is selected stainless material for use.Electroplate 1h.
Form the tungstenalloy coating of even compact in the metallic surface, thickness of coating is 35～50 μ m.
Embodiment 4:
(1) with embodiment 1.
(2) preparation electroplate liquid: sodium wolframate 70g/L, Seignette salt 45g/L, citric acid 15g/L, ferrous sulfate 20g/L, xitix 1g/L and sodium laurylsulfonate 0.01g/L, mentioned component is got aequum fully to be dissolved in a certain amount of deionized water respectively in order, stir, add deionized water again to desired volume, transfer pH value to reach 9.0 with ammoniacal liquor then.
(3) electroplate implementation process: the electroplate liquid for preparing is warmed up to 75 ℃, keeps pH value to be stabilized in 9.0, current density 2A/dm in the galvanized process
2Anode is selected stainless material for use, electroplates 1h.
Form the tungstenalloy coating of even compact in the metallic surface, thickness of coating is 20～30 μ m.
Claims (3)
1. one kind towards the plasma coating electroplating technology, it is characterized in that being placed in 40～90 ℃ of electroplate liquids that prepare through the metal works of plating pre-treatment, keeps pH value to be stabilized in 7.0～9.0 scopes in electroplating process, and current density is 2～20A/dm
2The layoutprocedure of the described electroplate liquid for preparing is: with the moiety of electroplate liquid according to the addition sequence of sodium wolframate 30～90g/L, Seignette salt 20～80g/L, citric acid 15～55g/L, ferrous sulfate 10～45g/L, xitix 1～3g/L and sodium laurylsulfonate 0～0.1g/L mix, constant volume, regulate plating bath pH value to 7.0～9.0 with ammoniacal liquor.
2. according to claim 1 towards the plasma coating electroplating technology, it is characterized in that containing in the every premium on currency solution of consisting of of described electroplate liquid: sodium wolframate 65g, Seignette salt 60g, citric acid 80g, ferrous sulfate 45g, xitix 2g and sodium laurylsulfonate 0.02g.
3. according to claim 1 towards the plasma coating electroplating technology, it is characterized in that W content accounts for more than the 55wt% in the tungstenalloy coating of its acquisition.
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| CN201010034476A CN101768767A (en) | 2010-01-21 | 2010-01-21 | Electroplating process for plasma coating |
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| CN201010034476A CN101768767A (en) | 2010-01-21 | 2010-01-21 | Electroplating process for plasma coating |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106498462A (en) * | 2016-12-14 | 2017-03-15 | 珠海市椿田机械科技有限公司 | A kind of electroplating technology |
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- 2010-01-21 CN CN201010034476A patent/CN101768767A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106498462A (en) * | 2016-12-14 | 2017-03-15 | 珠海市椿田机械科技有限公司 | A kind of electroplating technology |
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Open date: 20100707 |