CN101726987A - Mask cleaning device - Google Patents
Mask cleaning device Download PDFInfo
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- CN101726987A CN101726987A CN200810170183A CN200810170183A CN101726987A CN 101726987 A CN101726987 A CN 101726987A CN 200810170183 A CN200810170183 A CN 200810170183A CN 200810170183 A CN200810170183 A CN 200810170183A CN 101726987 A CN101726987 A CN 101726987A
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- mask
- cavity
- airtight chamber
- pressure
- diaphragm
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Abstract
The invention relates to a mask cleaning device, which at least comprises a cavity, a photoelectric element, a pump system and a controller. The cavity is provided with an airtight chamber, the airtight chamber is provided with a mask holder for bearing a mask, the mask is provided with a frame, and the frame is stuck with a layer of protective film; the photoelectric element is used for emitting a light beam to the protective film on the mask, receiving the light beam reflected from the protective film and transmitting a signal to represent fluctuating change of the protective film on the mask; the pump system is used for pumping off gases in the airtight chamber of the cavity to form negative pressure in the airtight chamber so as to separate contaminants on the mask; and the controller is used for receiving a signal of the photoelectric element, and the controller outputs another signal to stop operation of the pump system when the signal shows that the fluctuating change of the protective film on the mask is greater than a set value.
Description
Technical field
The present invention relates to a kind of mask cleaning device and clean method thereof,, and in process of cleaning, use a photovalve to monitor its height fluctuations of diaphragm on the mask particularly about a kind of cleaning device that utilizes vacuum mode to clean mask.
Background technology
In semiconductor fabrication process, can utilize little shadow equipment with the line pattern on the mask (reticle) usually, complete and accurately image in the photoresistance on the disk and expose.At the same time, can produce some pollutants (contaminant) or particulate (particles), and this pollutant or particulate can further pollute mask.Therefore, when cleaning,, all must clean efficient and completely, otherwise the mask of contaminated mistake can cause the heavy losses of product percent of pass (yield) in follow-up technology at mask surface residual organic matter, pollutant, chemical pollutant etc.
Please refer to Fig. 1, is the synoptic diagram of known a kind of mask cleaning device.This mask cleaning device 200 is to fix mask R by a horizontal mask fixed cell 220 that is arranged on the rotation platform 210, again by a movable washer jet 230, to produce powerful current or the surface of gas shock mask R.Yet, cleaning mode like this, it only can clean the back side of mask R; Because the front of mask R is to have a diaphragm, this diaphragm is the impact that can't bear this strong stream or air-flow.
In addition, also some cleaning device is to attempt utilizing vacuum or the mode of bleeding cleans mask R.But, because in forming the process of vacuum, cause the breaking of diaphragm of mask R top easily, therefore, still there is not the launch of this respect at present.
Summary of the invention
For solving the disappearance of prior art, main order of the present invention ground is providing a kind of mask cleaning device, and this cleaning device is to utilize the mode of bleeding, with particulate or the pollutant or the chemical pollutant removal of mask surface, to improve the qualification rate of semiconductor fabrication process.
Another fundamental purpose of the present invention is to provide a kind of mask cleaning device; the mode that this cleaning device utilizes malleation and negative pressure to replace mutually; with particulate or the pollutant or the chemical pollutant removal of mask surface, can avoid directly impacting the diaphragm on mask and the mask.
Another fundamental purpose again of the present invention is to provide a kind of mask cleaning device, and this cleaning device has a photovalve, and photovalve can be monitored the height fluctuations of mask upper protective film, can avoid diaphragm in process of cleaning thereby break.
A fundamental purpose more of the present invention is to provide a kind of mask cleaning device; this cleaning device forms negative pressure with the residing airtight chamber of mask; and utilize the height fluctuations of photovalve monitoring mask upper protective film; except the pollutant between mask and the diaphragm or chemical pollutant being removed, also can avoid diaphragm in process of cleaning thereby break.
For reaching above-mentioned purpose, technical solution of the present invention is:
A kind of mask cleaning device at first is provided, mainly comprises a cavity, a photovalve, a pumping system and a controller.Cavity has an airtight chamber, and airtight chamber is provided with a mask bearing, to carry a mask.Photovalve can be launched the diaphragm of a light beam to the mask, and receive from the diaphragm beam reflected, and can transmit a signal to represent the height fluctuations of diaphragm on mask.And pumping system can detach the gas in its airtight chamber of cavity, makes and forms negative pressure in the airtight chamber, so as to separating pollutant or the chemical pollutant on the mask.Controller then is used for receiving the signal of photovalve, and when signal showed the height fluctuations of diaphragm on mask greater than a setting value, controller can be exported another signal to stop the running of pumping system.
Then disclose a kind of mask clean method, comprising: provide a mask in an inside cavity, wherein dispose a diaphragm on the mask; One photovalve is provided, and this photovalve can be launched the diaphragm of a light beam to the mask, and receives from the diaphragm beam reflected with the height fluctuations of monitoring and protection film on mask; The gas of inside cavity is detached, so that inside cavity forms negative pressure, so as to separating pollutant or the chemical pollutant on the mask; Wherein, when photovalve monitors the height fluctuations of diaphragm on mask greater than a setting value, stop to detach the gas of inside cavity.
Advantage of the present invention is:
This cleaning device is to utilize the mode of bleeding, with particulate or the pollutant or the chemical pollutant removal of mask surface, to improve the qualification rate of semiconductor fabrication process; And the mode of utilizing malleation and negative pressure to replace mutually, with particulate or the pollutant or the chemical pollutant removal of mask surface, can avoid directly impacting the diaphragm on mask and the mask; Also have a photovalve, can monitor the height fluctuations of mask upper protective film, in process of cleaning, break to avoid diaphragm.
Description of drawings
Fig. 1 is the synoptic diagram of known a kind of mask cleaning device;
Fig. 2 A is the front elevation of a kind of mask cleaning device of the present invention;
Fig. 2 B is the side perspective view of a kind of mask cleaning device of the present invention;
Fig. 3 A is the front schematic view of a kind of its cavity of mask cleaning device of the present invention;
Fig. 3 B is the side schematic view of a kind of its cavity of mask cleaning device of the present invention;
Fig. 4 is the running synoptic diagram of its photovalve of mask cleaning device of the present invention;
Fig. 5 is its schematic flow sheet of mask clean method of the present invention.
The main element symbol description
10 cavitys
11 openings
12 chamber doors
13 airtight chamber
14 mask bearings
15 mask sensors
16 gas inlet and outlets
17 pipelines
18 frameworks
19 diaphragms
20 photovalves
21 optical transmitting sets
22 optical receivers
30 pumping systems
40 controllers
50 operation-interfaces
The R mask
The P pressure transducer
100 mask cleaning devices
Embodiment
For the technology contents, the goal of the invention that make the present invention use and the effect reached thereof have more complete and clearly disclose, now under describe it in detail, and see also accompanying drawing and figure number:
At first, seeing also shown in Fig. 2 A and Fig. 2 B, is the front elevation and the side perspective view of a kind of mask cleaning device of the present invention.And Fig. 3 A and Fig. 3 B are the front schematic view and the side schematic view of above-mentioned its cavity of mask cleaning device.The mask cleaning device 100 of this invention includes a cavity 10, a photovalve 20, a pumping system 30 and a controller 40, wherein, cavity 10 be have an opening 11 and one can with the opening 11 chamber door 12 of driving fit mutually, on chamber door 12, then have the unlatching that leader 121 is beneficial to chamber door 12.And are airtight chamber 13 in the inside of cavity 10; this airtight chamber 13 is provided with a mask bearing 14; in order to carry a mask R; and on mask bearing 14, also be provided with a mask sensor 15, whether have mask R to be carried on the mask bearing 14 or whether mask R is carried on the mask bearing 14 with diaphragm up with sensing in the periphery of mask R.Simultaneously, a pressure transducer P is also arranged in airtight chamber 13, with the pressure size of this airtight chamber 13 of sensing.
In addition, also have a gas inlet and outlet 16 in the airtight chamber 13 of above-mentioned cavity 10, this gas inlet and outlet 16 is to be provided with an air valve (not being shown among the figure) and to be connected with the pumping system 30 of cleaning device through a pipeline 17.This pumping system 30 can detach the gas in the airtight chamber 13 and pollutant or chemical pollutant via gas inlet and outlet 16, make airtight chamber's 13 pressure inside be lower than atmospheric pressure, i.e. a negative pressure state.Certainly, this pumping system 30 can also import to airtight chamber 13 by this identical pipeline 17 and gas inlet and outlet 16 with a gas, makes airtight chamber's 13 pressure inside revert to atmospheric pressure gradually, is beneficial to open chamber door 12 and output mask R.And above-mentioned gas can also be a clean gas, so as to the pollutant or the chemical pollutant of dilution airtight chamber 13; And the gas flow of importing can also make airtight chamber's 13 pressure inside greater than atmospheric pressure originally, to reach superior cleaning.
And shown in Fig. 2 B, Fig. 3 A and Fig. 3 B; mask cleaning device 100 of the present invention is to have a photovalve 20; this photovalve 20 is the tops that are positioned at cavity 10; photovalve 20 mainly is made up of an optical transmitting set 21 and an optical receiver 22; optical transmitting set 21 is diaphragms 19 that are used for launching mask R its top of a light beam to the mask bearing 14, and optical receiver 22 then is to be used for receiving the light beam that reflects from diaphragm 19.The purpose of photovalve 20 is; when pumping system 30 when airtight chamber 13 is carried out detaching and importing of gas; the variation that can cause diaphragm 19 on mask R, to have height to rise and fall; so need this photovalve 20 to come the upper-lower position of monitoring and protection film 19 to change, to avoid diaphragm 19 extensions excessively to damage or to break.Therefore; when photovalve 20 monitors diaphragm 19 dipping and heavings above a setting value (for example: 1mm or 3mm or 4mm); this photovalve 20 can transmit an electric signal in a controller 40; for example: program-controlled device (Programmable logic controller; PLC), make controller 40 (shown in Fig. 2 A and Fig. 2 B) export another electric signal and continue to detach or import gas to stop pumping system 30.And the light beam that above-mentioned optical transmitting set 21 is launched can be laser, visible or infrared light, and relatively, 22 of optical receivers are the light beams that can receive these specific wavelengths.And shown in Fig. 3 A and Fig. 3 B; this diaphragm 19 mainly is that the framework 18 by a hollow of mask R top is fixed on the mask R; and this framework 18 is to have at least one hole (not being shown among the figure); therefore; when said pump system 30 when airtight chamber 13 is carried out detaching of gas; its not only can with the pollutant of diaphragm 19 tops or chemical pollutant band from, also can be with the pollutant between diaphragm 19 and the mask R or the chemical pollutant hole band on framework 18 thus from airtight chamber 13.
Then, please refer to Fig. 4, is the running synoptic diagram of mask cleaning device 100 its photovalve 20 monitoring mask R upper protective films 19 of the present invention.At first, when mask R was placed in the inside of cavity 10 or airtight chamber 13 and closes upper chamber dooor 12, at this moment, the pressure of airtight chamber 13 was suitable with the pressure of cavity 10 outsides, is about an atmospheric pressure.At the same time, diaphragm 19 is to be affixed on the framework 18 of mask R top reposefully and optical transmitting set 21 its light beams of launching are to be a default angle with the light beam that reflects from diaphragm 19.And when pumping system 30 detached the gas in the airtight chamber 13, the pressure of airtight chamber 13 began to successively decrease, and also further caused diaphragm 19 up to rise and fall, and is wherein remarkable with diaphragm 19 its zones near central authorities again.This moment, diaphragm 19U presented upwards to expand or state protruding upward, therefore also caused optical transmitting set 21 its light beams launched and the angle of the light beam that reflects from diaphragm 19 to become big, and it is used for receiving catoptrical position and produces and change to make optical receiver 22.And when pumping system 30 is to import gas in airtight chamber 13, the pressure that makes airtight chamber 13 is during greater than a big pressure, 19 of said protection film can down rise and fall and be lower than the reference position of script.At this moment; this moment, diaphragm 19L presented downward expansion or to the state of lower recess; therefore optical transmitting set 21 its light beams of launching can diminish with the angle of the light beam that reflects from diaphragm 19, and it is used for optical receiver 22 receiving catoptrical position and and then produces again and change.Because optical receiver 22 is most light sensitive components, therefore, by receiving the position difference of catoptrical light sensitive component, can calculate diaphragm 19 in the height fluctuations on the mask R or on the framework 18.
In addition, as shown in Figure 5, the present invention can also be a mask clean method, comprising: the chamber door 12 (step S1) of opening mask cleaning device 100; Provide a mask R in cavity 10 inside, make mask R be fixed in (step S2) on the mask bearing 14; Photovalve 20 is provided, and this photovalve 20 can be launched the diaphragm 19 of a light beam to the mask R, and receives from diaphragm 19 beam reflected with the height fluctuations (step S3) of monitoring and protection film 19 on mask R; Close upper chamber dooor 12 and cavity 10 gas inside are detached, so that the cavity 10 inner negative pressure that form, so as to separating on mask R and the mask or near pollutant or chemical pollutant (step S4-1); When the negative pressure of cavity 10 inside or pressure are lower than a preset pressure value, suspend detaching of cavity 10 internal gas, make that cavity 10 is inner to keep stable negative pressure state (step S4-2); Import a gas in cavity 10 inside, make cavity 10 inside by negative pressure state get back to gradually at the beginning pressure or near atmospheric pressure (step S4-3); Continue to import gas in cavity 10 inside, make the cavity 10 inner malleations (step S4-4) that form; Open chamber door 12 and take out mask R, to finish the program (step S5) of mask R cleaning; Wherein, when above-mentioned photovalve 20 detects the height fluctuations of diaphragm 19 on mask R greater than a setting value, stop to detach or importing gas.This setting value is about 1～4mm, and just diaphragm 19 up expands or the 1～4mm that down expands, and is optimum value with 3mm or 4mm again.And default force value is about 0～5mmHg or 0～5 holder (Torr), is optimum value with 0.5mmHg or 1mmHg again wherein.
The above-mentioned variation that detects diaphragm 19 when photovalve 20 can transmit an electric signal in controller 40 during greater than setting value, and controller 40 further another electric signal of output to stop to detach or importing of this gas.And controller 40 just can be assigned another electric signal after a period of time is waited for, detaches or imports to recover gas originally.And above-mentioned importing gas is can avoid when opening chamber door 12 so that cavity 10 inside form the steps (step S4-4) of malleations, and the gas of cavity 10 outsides or pollutant or chemical pollutant enter cavity 10 inside in a large number.But in another implementation method, this imports gas so that the cavity 10 inner steps (step S4-4) that form malleation are omissible; When just recovering atmospheric pressure, just can take out mask in cavity 10 inside.And in another implementation method, after cavity 10 inner formation malleations (step S4-4), can also continue again cavity 10 gas inside to be detached, carry out next one circulation (step 4-1).Certainly, only also do not limit after forming malleation, just can carry out next one and circulate (step S4-1), when cavity 10 inside are to maintain a negative pressure (step S4-2) or during near atmospheric pressure (step S4-3), also can carry out detaching of gas.
And the employed mask cleaning device 100 of above-mentioned steps, it is to have an operation-interface 50 at least, this operation-interface 50 can allow the user to import various instructions or parameter, with the running of convenient whole flow process.In addition,, there is other user to open chamber door 12 because of carelessness for fear of carrying out gas when detaching or importing, thus can be provided with an opening-proof device at the handle 121 of chamber door 12 or chamber door 12, so that the present invention is more perfect.
Though the present invention discloses as above with aforesaid preferred embodiment; right its is not in order to limit the present invention; anyly have the knack of alike skill person; without departing from the spirit and scope of the present invention; when can doing a little change and retouching, therefore scope of patent protection of the present invention with the appended claim protection domain of this instructions the person of being defined be as the criterion.
Claims (23)
1. a mask cleaning device is characterized in that, comprising:
One cavity has an airtight chamber, and this airtight chamber is provided with a mask bearing, in order to carrying a mask, and disposes a diaphragm on this mask;
One photovalve in order to launching a light beam to this diaphragm, and receives from this diaphragm beam reflected; And
One pumping system is in order to detach the gas in this airtight chamber, so that this airtight chamber forms negative pressure, so as to separating the pollutant on this mask.
2. a mask cleaning device is characterized in that, comprises at least:
One cavity has an airtight chamber, and this airtight chamber is provided with a mask bearing, in order to carrying
One mask wherein has a framework and post layer protecting film on this framework on this mask;
One photovalve in order to launching a light beam this diaphragm to this mask, and receives from this diaphragm beam reflected, and can transmit a signal to represent the height fluctuations of this diaphragm on this mask;
One pumping system, in order to the gas in this airtight chamber of this cavity is detached, so that form negative pressure in this airtight chamber, so as to separating the pollutant on this mask; And
One controller, in order to receive the signal of this photovalve, when this signal showed the height fluctuations of this diaphragm on this mask greater than a setting value, this controller was exported another signal to stop the running of this pumping system.
3. mask cleaning device as claimed in claim 2 is characterized in that, described photovalve includes an optical transmitting set and an optical receiver.
4. mask cleaning device as claimed in claim 3 is characterized in that described optical transmitting set can be launched a light beam, and this light beam is to be selected by following group of families: laser, visible light and infrared light.
5. mask cleaning device as claimed in claim 2 is characterized in that, described cavity have an opening and can with a chamber door of this opening driving fit, be beneficial to the output and the input of this mask.
6. mask cleaning device as claimed in claim 2 is characterized in that, also has a pressure gauge in this airtight chamber of described cavity, to monitor this airtight chamber's pressure inside.
7. whether mask cleaning device as claimed in claim 2 is characterized in that, also has a mask sensor in this airtight chamber of described cavity, place on this mask bearing with this mask of sensing.
8. mask cleaning device as claimed in claim 2 is characterized in that, when described pumping system detaches the gas in the airtight chamber of this cavity, causes the pressure in this airtight chamber to be lower than atmospheric pressure.
9. mask cleaning device as claimed in claim 2 is characterized in that, described pumping system can further be squeezed into a gas in this airtight chamber of this cavity, so that the pressure in this airtight chamber reverts to atmospheric pressure.
10. mask cleaning device as claimed in claim 2 is characterized in that, described pumping system can further be squeezed into a gas in this airtight chamber of this cavity, so that the pressure in this airtight chamber is greater than atmospheric pressure.
11. mask cleaning device as claimed in claim 2 is characterized in that, when described photovalve monitored the height fluctuations of this diaphragm on this mask greater than 1mm, this pumping system can decommission.
12. a mask clean method is characterized in that, comprises the following steps: at least
Provide a mask in an inside cavity, wherein dispose a diaphragm on this mask;
One photovalve is provided, and this photovalve can be launched the diaphragm of a light beam to this mask, and receives from this diaphragm beam reflected with the height fluctuations of monitoring and protection film on this mask;
The gas of this inside cavity is detached, so that inside cavity forms negative pressure, so as to separating the pollutant on this mask; Wherein, when this photovalve monitors the height fluctuations of diaphragm on this mask greater than a setting value, stop to detach the gas of this inside cavity.
13. mask clean method as claimed in claim 12 is characterized in that, described photovalve includes an optical transmitting set and an optical receiver.
14. mask clean method as claimed in claim 12 is characterized in that, described inside cavity also has a mask bearing, to carry this mask.
15. mask clean method as claimed in claim 12 is characterized in that described inside cavity also has a pressure gauge, to monitor the pressure of this inside cavity.
16. mask clean method as claimed in claim 12 is characterized in that, when described pumping system detaches the gas of this inside cavity, causes the pressure of this inside cavity to be lower than atmospheric pressure.
17. mask clean method as claimed in claim 12 is characterized in that, described pumping system also can be squeezed into this inside cavity with a gas, so that the pressure of this inside cavity reverts to atmospheric pressure.
18. mask clean method as claimed in claim 12 is characterized in that, described pumping system also can be squeezed into this inside cavity with a gas, so that the pressure of this inside cavity is greater than atmospheric pressure.
19. mask clean method as claimed in claim 12 is characterized in that, when the pressure of described inside cavity is lower than a force value, stops to detach the gas of this inside cavity.
20. mask clean method as claimed in claim 19 is characterized in that, described force value is 1 millimeter mercury mmHg.
21. mask clean method as claimed in claim 19 is characterized in that, described force value is 0.5 millimeter mercury mmHg.
22. mask clean method as claimed in claim 12 is characterized in that, also comprises an aeration step, is that a gas is charged into this inside cavity, so that the pressure of this inside cavity reverts to atmospheric pressure.
23. mask clean method as claimed in claim 12 is characterized in that, also comprises an aeration step, is that a gas is charged into this inside cavity, so that the pressure of this inside cavity is greater than atmospheric pressure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200810170183A CN101726987A (en) | 2008-10-13 | 2008-10-13 | Mask cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200810170183A CN101726987A (en) | 2008-10-13 | 2008-10-13 | Mask cleaning device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101726987A true CN101726987A (en) | 2010-06-09 |
Family
ID=42448042
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200810170183A Pending CN101726987A (en) | 2008-10-13 | 2008-10-13 | Mask cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101726987A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104438226A (en) * | 2014-12-02 | 2015-03-25 | 京东方科技集团股份有限公司 | Mask plate cleaning system |
| CN104941972A (en) * | 2015-07-22 | 2015-09-30 | 上海华力微电子有限公司 | Mask plate surface micronic dust removal device and method |
| CN107209451A (en) * | 2015-02-03 | 2017-09-26 | Asml荷兰有限公司 | Mask assembly and associated method |
| CN111650405A (en) * | 2019-03-04 | 2020-09-11 | 东京毅力科创株式会社 | Cleaning method in inspection apparatus and inspection apparatus |
| CN116593497A (en) * | 2023-07-17 | 2023-08-15 | 合肥派拓智能科技有限公司 | High-precision OLED metal mask plate visual defect detection equipment |
-
2008
- 2008-10-13 CN CN200810170183A patent/CN101726987A/en active Pending
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104438226A (en) * | 2014-12-02 | 2015-03-25 | 京东方科技集团股份有限公司 | Mask plate cleaning system |
| CN107209451A (en) * | 2015-02-03 | 2017-09-26 | Asml荷兰有限公司 | Mask assembly and associated method |
| US11029595B2 (en) | 2015-02-03 | 2021-06-08 | Asml Netherlands B.V. | Mask assembly and associated methods |
| US11086213B2 (en) | 2015-02-03 | 2021-08-10 | Asml Netherlands B.V. | Mask assembly and associated methods |
| US11635681B2 (en) | 2015-02-03 | 2023-04-25 | Asml Netherlands B.V. | Mask assembly and associated methods |
| CN104941972A (en) * | 2015-07-22 | 2015-09-30 | 上海华力微电子有限公司 | Mask plate surface micronic dust removal device and method |
| CN111650405A (en) * | 2019-03-04 | 2020-09-11 | 东京毅力科创株式会社 | Cleaning method in inspection apparatus and inspection apparatus |
| CN111650405B (en) * | 2019-03-04 | 2023-04-28 | 东京毅力科创株式会社 | Cleaning method in inspection device and inspection device |
| CN116593497A (en) * | 2023-07-17 | 2023-08-15 | 合肥派拓智能科技有限公司 | High-precision OLED metal mask plate visual defect detection equipment |
| CN116593497B (en) * | 2023-07-17 | 2023-09-22 | 合肥派拓智能科技有限公司 | High-precision OLED metal mask plate visual defect detection equipment |
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Application publication date: 20100609 |