CN101724848A - Etching solution - Google Patents

Etching solution Download PDF

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Publication number
CN101724848A
CN101724848A CN200810194466A CN200810194466A CN101724848A CN 101724848 A CN101724848 A CN 101724848A CN 200810194466 A CN200810194466 A CN 200810194466A CN 200810194466 A CN200810194466 A CN 200810194466A CN 101724848 A CN101724848 A CN 101724848A
Authority
CN
China
Prior art keywords
etching solution
phenol
hydrochloric acid
percentage
mixed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN200810194466A
Other languages
Chinese (zh)
Inventor
何永红
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to CN200810194466A priority Critical patent/CN101724848A/en
Publication of CN101724848A publication Critical patent/CN101724848A/en
Pending legal-status Critical Current

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Abstract

The invention discloses etching solution, which is prepared by mixing 37 percent hydrochloric acid, acetic acid, glyoxal and phenol. The etching solution has the advantages of reasonable formula, good working performance, convenient production and use and low production cost.

Description

Etching solution
Technical field:
The present invention relates to a kind of etching solution.
Background technology:
In the prior art, etching solution before the soldering of using in the production of electronic components, its handling property is undesirable, the production cost height.
Summary of the invention:
The object of the present invention is to provide a kind of prescription reasonable, make the etching solution of favorable working performance.
Technical solution of the present invention is:
A kind of etching solution is characterized in that: be mixed and made into by following component in percentage by weight:
37% hydrochloric acid 30~50%
Oxalic dialdehyde 20~30%
Phenol 30~50%.
Described etching solution is mixed and made into by following component in percentage by weight:
37% hydrochloric acid 35%
Oxalic dialdehyde 30%
Phenol 35%.
The present invention fills a prescription rationally, and favorable working performance is produced easy to usely, and production cost is low.
The invention will be further described below in conjunction with embodiment.
Embodiment:
Embodiment 1:
A kind of etching solution is mixed and made into by following component in percentage by weight:
37% hydrochloric acid 35%
Oxalic dialdehyde 30%
Phenol 35%.
Embodiment 2:
A kind of etching solution is mixed and made into by following component in percentage by weight:
37% hydrochloric acid 45%
Oxalic dialdehyde 25%
Phenol 30%.

Claims (2)

1. etching solution is characterized in that: be mixed and made into by following component in percentage by weight:
37% hydrochloric acid 30~50%
Oxalic dialdehyde 20~30%
Phenol 30~50%.
2. etching solution according to claim 1 is characterized in that: be mixed and made into by following component in percentage by weight:
37% hydrochloric acid 35%
Oxalic dialdehyde 30%
Phenol 35%.
CN200810194466A 2008-10-24 2008-10-24 Etching solution Pending CN101724848A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN200810194466A CN101724848A (en) 2008-10-24 2008-10-24 Etching solution

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN200810194466A CN101724848A (en) 2008-10-24 2008-10-24 Etching solution

Publications (1)

Publication Number Publication Date
CN101724848A true CN101724848A (en) 2010-06-09

Family

ID=42446383

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200810194466A Pending CN101724848A (en) 2008-10-24 2008-10-24 Etching solution

Country Status (1)

Country Link
CN (1) CN101724848A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102418107A (en) * 2011-12-09 2012-04-18 上海锅炉厂有限公司 Cleaning agent for high-temperature fracture surface of heat-resistant steel and application thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102418107A (en) * 2011-12-09 2012-04-18 上海锅炉厂有限公司 Cleaning agent for high-temperature fracture surface of heat-resistant steel and application thereof
CN102418107B (en) * 2011-12-09 2013-06-26 上海锅炉厂有限公司 Cleaning agent for high-temperature fracture surface of heat-resistant steel and application thereof

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Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication

Open date: 20100609