CN101710210B - Electrowetting display panel - Google Patents
Electrowetting display panel Download PDFInfo
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- CN101710210B CN101710210B CN2009102652812A CN200910265281A CN101710210B CN 101710210 B CN101710210 B CN 101710210B CN 2009102652812 A CN2009102652812 A CN 2009102652812A CN 200910265281 A CN200910265281 A CN 200910265281A CN 101710210 B CN101710210 B CN 101710210B
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Abstract
The invention relates to an electrowetting display panel which comprises an active element array substrate, a dielectric layer, a baffle wall, a first liquid containing dye, a second liquid and a subtending substrate. The active element array substrate comprises a base plate, a plurality of scanning lines, a plurality of data wires and a plurality of pixels, wherein the pixels are respectively and electrically connected with one of the scanning lines and one of the data wires, each pixel comprises an active element, a transparent pixel electrode and a reflection layer, the transparent pixel electrode is electrically connected with the active element and is positioned above the reflection layer, and the reflection layer is provided with a convex-concave surface. The dielectric layer is configured on the active element array substrate, the baffle wall is configured on the dielectric layer, and the first liquid containing due is configured on the dielectric layer. The subtending substrate is configured above the active element array substrate, and the second liquid is positioned between the subtending substrate and the active element array substrate. The invention can increase the reflection rate of the electrowetting display panel to obtain better display quality.
Description
Technical field
The present invention relates to a kind of reflective flat-panel screens (reflective flat panel display), and be particularly related to a kind of Electrowetting display panel (electro-wetting display panel).
Background technology
In recent years, Electronic Paper (E-paper) and e-book (E-book) are just flourish, have gentlier, display thinner and the deflection characteristic will become following main Development Trend.Present Electronic Paper adopts the electrophoresis-type technology to carry out mostly.The Electronic Paper and the e-book of the overwhelming majority all are reflective, and in other words, through the reflect ambient light source, Electronic Paper and e-book can realize the demonstration of image, save the required electric power of being arranged so that of built-in light source and significantly reduce.
With the Electrowetting display panel is example, for the reflect ambient light source to let the user can watch image smoothly, the reflection horizon is one of indispensable member in Electrowetting display panel, as disclosing among the U.S. Patent Publication US 2007/0127108.In the open case of this piece patent, the reflecting surface in reflection horizon is a plane reflection face, yet the reflection efficiency in reflection horizon with plane reflection face is quite low when general the use.Therefore, the reflection efficiency that how to promote Electrowetting display panel has just like become one of gordian technique of making Electrowetting display panel.
In addition, because the response speed of Electrowetting display panel is relevant with the translational speed of liquid in the Electrowetting display panel, therefore, translational speed how to accelerate liquid in the Electrowetting display panel also is one of gordian technique of making Electrowetting display panel.
Summary of the invention
The present invention provides a kind of Electrowetting display panel, and the design of its pixel electrode can drive the mobile or increase aperture area of first liquid that contains dyestuff apace.
The present invention provides a kind of Electrowetting display panel, and it comprises that an active elements array substrates, a dielectric layer, a barricade, contain first liquid of dyestuff, one second liquid and a subtend substrate.Active elements array substrates comprises a substrate, multi-strip scanning line, many data lines and a plurality of pixel; Wherein each pixel respectively with sweep trace wherein and wherein a data line electrically connect; Wherein each pixel comprises an active component, a transparent pixels electrode and a reflection horizon; Transparent pixels electrode and active component electrically connect and are positioned at the top, reflection horizon, and the reflection horizon has a convex-concave surface (bumpy surface).Dielectric layer is disposed on the active elements array substrates, and barricade is disposed on the dielectric layer, and first liquid that contains dyestuff is disposed on the dielectric layer.In addition, the subtend substrate is disposed at the active elements array substrates top, and second liquid is between subtend substrate and active elements array substrates.
The present invention provides a kind of Electrowetting display panel in addition, and it comprises that an active elements array substrates, a dielectric layer, a barricade, contain first liquid of dyestuff, one second liquid and a subtend substrate.Active elements array substrates comprises a substrate, multi-strip scanning line, many data lines and a plurality of pixel; Wherein each pixel respectively with sweep trace wherein and wherein a data line electrically connect; Wherein each pixel comprises an active component, a transparent pixels electrode and a reflection horizon; Transparent pixels electrode and active component electrically connect and are positioned at the top, reflection horizon, and the reflection horizon has a convex-concave surface, and the convex-concave surface of part is not covered by the transparent pixels electrode at least.Dielectric layer is disposed on the active elements array substrates, and barricade is disposed on the dielectric layer, and first liquid that contains dyestuff is disposed on the dielectric layer.In addition, the subtend substrate is disposed at the active elements array substrates top, and second liquid is between subtend substrate and active elements array substrates.
In one embodiment of this invention, aforesaid active elements array substrates for example is a thin-film transistor array base-plate.In addition, aforesaid active component for example is amorphous silicon film transistor or polycrystalline SiTFT.
In one embodiment of this invention; Aforesaid active elements array substrates can further comprise an interlayer dielectric layer (inter-dielectric layer), a plurality of projection and a flatness layer; Wherein the interlayer dielectric layer covers active component; Projection is disposed on the interlayer dielectric layer, and the reflection horizon is disposed on the interlayer dielectric layer to cover projection.Flatness layer then is disposed on the interlayer dielectric layer to cover the reflection horizon, and wherein the transparent pixels electrode is disposed on the flatness layer, and dielectric layer is disposed on the flatness layer to cover the transparent pixels electrode.
In one embodiment of this invention, aforesaid each transparent pixels electrode has at least one opening, to expose the convex-concave surface of part at least.In addition, aforesaid opening for example is a strip opening or a circular open.
In one embodiment of this invention, aforesaid subtend substrate has a common electrode and a black matrix layer.
In one embodiment of this invention, aforesaid pixel comprises reflective pixel or semi-penetration, semi-reflective pixel.
In one embodiment of this invention, aforesaid dielectric layer has a hydrophobic surface, and wherein barricade is a water wettability, and first liquid that contains dyestuff is non-polar liquid, and polarity second liquid is the polarity conducting liquid.
In one embodiment of this invention, aforesaid dielectric layer has a hydrophilic surface, and wherein barricade is a hydrophobicity, and first liquid that contains dyestuff is the polarity conducting liquid, and second liquid is non-polar liquid.
The present invention provides a kind of Electrowetting display panel in addition; Comprise: an active elements array substrates; Comprise: a plurality of pixels; Wherein each said pixel comprises an active component, a transparent pixels electrode and a reflection horizon, and this transparent pixels electrode and this active component electrically connect and be positioned at this top, reflection horizon, and this reflection horizon has a convex-concave surface; One dielectric layer is disposed on this active elements array substrates; One liquid; And a subtend substrate, be disposed at this active elements array substrates top, wherein this liquid is between this subtend substrate and this active elements array substrates.
Based on above-mentioned, because the reflection horizon in the Electrowetting display panel of the present invention has convex-concave surface, so the present invention can promote the reflectivity of Electrowetting display panel, to obtain good display quality.In addition, part embodiment of the present invention can accelerate the response speed (response) of Electrowetting display panel through the design of pixel electrode.
For letting the above-mentioned feature and advantage of the present invention can be more obviously understandable, hereinafter is special lifts embodiment, and conjunction with figs. elaborates as follows.
Description of drawings
Fig. 1 and Fig. 1 ' are respectively in one embodiment of the invention the schematic top plan view of single pixel and diagrammatic cross-section in the Electrowetting display panel.
Fig. 2 A to Fig. 2 F and Fig. 1 are the manufacturing process schematic top plan view of Electrowetting display panel.
Fig. 2 A ' is the manufacturing process diagrammatic cross-section of Electrowetting display panel to Fig. 2 F ' and Fig. 1 '.
Fig. 3 and Fig. 3 ' are respectively in another embodiment of the present invention the schematic top plan view of single pixel and diagrammatic cross-section in the Electrowetting display panel.
Description of reference numerals in the above-mentioned accompanying drawing is following:
100: Electrowetting display panel
110: active elements array substrates
111: the interlayer dielectric layer
112: substrate
113: projection
114: sweep trace
115: flatness layer
116: data line
118: pixel
120: dielectric layer
120a: water wettability or hydrophobic surface
130: barricade
140: first liquid that contains dyestuff
150: the second liquid
160: the subtend substrate
162: common electrode
164: black matrix layer
166: substrate
TFT: active component
P: transparent pixels electrode
R: reflection horizon
B: convex-concave surface
AP: opening
PL: patterned polysilicon layer
GI: gate insulation layer
CH: channel region
S: source doping region
D: drain doping region
C: MM CAP district
Cst: holding capacitor
Com: common line
W1: contact hole
DCT: drain electrode contact conductor
Embodiment
Fig. 1 and Fig. 1 ' are respectively in one embodiment of the invention the schematic top plan view of single pixel and diagrammatic cross-section in the Electrowetting display panel, and wherein Fig. 1 ' is the shown diagrammatic cross-section of X-X ' profile line in Fig. 1.
Please be simultaneously with reference to Fig. 1 and Fig. 1 ', the Electrowetting display panel 100 of present embodiment comprises that an active elements array substrates 110, a dielectric layer 120, a barricade 130, contain first liquid 140, one second liquid 150 and a subtend substrate 160 of dyestuff.Active elements array substrates 110 comprises a substrate 112, multi-strip scanning line 114, many data lines 116 and a plurality of pixel 118; Wherein each pixel 118 respectively with sweep trace 114 wherein and wherein a data line 116 electrically connect; And each pixel 118 comprises an active component TFT, a transparent pixels electrode P and a reflection horizon R; Transparent pixels electrode P and active component TFT electrically connect and are positioned at reflection horizon R top, and reflection horizon R has a convex-concave surface B.Dielectric layer 120 is disposed on the active elements array substrates 110, and barricade 130 is disposed on the dielectric layer 120, and first liquid 140 that contains dyestuff is disposed on the dielectric layer 120.In addition, subtend substrate 160 is disposed at active elements array substrates 110 tops, and second liquid 150 is between subtend substrate 160 and active elements array substrates 110, and second liquid 150 is positioned on first liquid 140 that contains dyestuff.In one embodiment of this invention, the convex-concave surface B of part is not covered by transparent pixels electrode P at least.
Aforesaid active elements array substrates 110 for example is a thin-film transistor array base-plate; And the active component TFT on the thin-film transistor array base-plate for example is amorphous silicon film transistor or polycrystalline SiTFT; Meaning promptly; Active elements array substrates 110 can be a poly-silicon thin film transistor array substrate (of present embodiment), or an amorphous silicon film transistor array base palte (not shown).
Poly-silicon thin film transistor array substrate with present embodiment is an example; Except substrate 112, sweep trace 114, data line 116 and pixel 118; Active elements array substrates 110 also can further comprise an interlayer dielectric layer (inter-dielectric layer) 111, a plurality of projection 113 and a flatness layer 115; Wherein interlayer dielectric layer 111 covers active elements T FT, and projection 113 is disposed on the interlayer dielectric layer 111, and reflection horizon R is disposed on the interlayer dielectric layer 111 to cover projection 113.115 of flatness layers are disposed on the interlayer dielectric layer 111 to cover reflection horizon R, and wherein transparent pixels electrode P is disposed on the flatness layer 115, and dielectric layer 120 is disposed on the flatness layer 115 to cover transparent pixels electrode P.
In the present embodiment, aforesaid each transparent pixels electrode P has at least one opening AP, to expose the convex-concave surface B of part at least.In addition, according to the Different products design requirement, opening AP for example is a strip opening, a circular open or other suitable shaped aperture.It should be noted that in the present embodiment the opening AP general reference below of transparent pixels electrode P is distributed with reflection horizon R, but the zone of not covered by transparent pixels electrode P.
In the present embodiment, aforesaid subtend substrate 160 has a common electrode 162 and a black matrix layer 164.For example, common electrode 162 on the subtend substrate 160 and black matrix layer 164 for example are to be disposed on the substrate 166, and wherein common electrode 162 will be deceived matrix layer 164 coverings for example.
In the Electrowetting display panel 100 of present embodiment, the surface of dielectric layer 120 can be processed into hydrophobicity or hydrophilic surperficial 120a.Dielectric layer 120 is opposite each other with the close and distant water characteristic of barricade 130.When the surface of dielectric layer 120 is hydrophobic surface; Barricade 130 need be designed to water wettability; (for example: printing ink such as decane, silicon oil), and second liquid 150 for example is water or other polar liquid and first liquid 140 that contains dyestuff is required to be non-polar liquid.Otherwise when the surface of dielectric layer 120 was hydrophilic surface, barricade 130 need be designed to hydrophobicity, and first liquid 140 that contains dyestuff is required to be the conducting liquid of polarity, and second liquid 150 is required to be nonpolar liquid.
Fig. 2 A to Fig. 2 F and Fig. 1 are the manufacturing process schematic top plan view of Electrowetting display panel, and Fig. 2 A ' is the manufacturing process diagrammatic cross-section of Electrowetting display panel to Fig. 2 F ' and Fig. 1 '.
At first; Please with reference to Fig. 2 A and Fig. 2 A '; On a substrate 112, form a patterned polysilicon layer PL; This patterned polysilicon layer PL makes through low temperature polycrystalline silicon technology (LTPS process), ion doping technology (ion doping process) and Patternized technique (patterning process) to get, and wherein low temperature polycrystalline silicon technology for example is PRK thermal anneal process (excimer laser annealingprocess).In detail, this patterned polysilicon layer PL is divided into channel region CH, source doping region S, drain doping region D and MM CAP district C.After forming patterned polysilicon layer PL, then on substrate 112, form a gate insulation layer GI, to cover patterned polysilicon layer PL.
Please, after forming gate insulation layer GI, then go up and form multi-strip scanning line 114 and many common line Com, wherein can be regarded as grid with the overlapping sweep trace 114 of channel region CH in gate insulation layer GI with reference to Fig. 2 B and Fig. 2 B '.Can know from Fig. 2 B and Fig. 2 B '; Aforesaid grid, channel region CH, source doping region S and drain doping region D can constitute one have three terminals active component TFT, MM CAP district C, common line Com and the gate insulation layer GI between MM CAP district C and common line Com then constitute holding capacitor Cst.After forming common line Com and sweep trace 114, then go up and form interlayer dielectric layer 111, to cover common line Com and sweep trace 114 in gate insulation layer GI.
Please, in interlayer dielectric layer 111 and gate insulation layer GI, form a plurality of contact hole W1, to expose source doping region S and drain doping region D with reference to Fig. 2 C and Fig. 2 C '.
Please with reference to Fig. 2 D and Fig. 2 D '; After forming contact hole W1; Follow and on interlayer dielectric layer 111, form many data lines 116, many drain electrode connecting line DCT, a plurality of projection 113 and reflection horizon R, wherein data line 116 and drain electrode connecting line DCT are respectively through contact hole W1 and source doping region S and drain doping region D electric connection.For example, data line 116 is made with the Patternized technique that drain electrode connecting line DCT can pass through, and reflection horizon R then makes through another road Patternized technique.Certainly, reflection horizon R, data line 116 also can be made through same Patternized technique with drain electrode connecting line DCT.It should be noted that; Before making reflection horizon R; Need prior to producing the projection 113 with predetermined altitude and distribution density on the interlayer dielectric layer 111, this measure can be so that the reflection horizon R that follow-up conformal (conformally) is formed on the projection 113 has higher reflection efficiency.
Please with reference to Fig. 2 E and Fig. 2 E '; After the making of accomplishing data line 116, drain electrode connecting line DCT, projection 113 and reflection horizon R; Then form a flatness layer 115, to cover aforesaid data line 116, drain electrode connecting line DCT, projection 113 and reflection horizon R.Can know that by Fig. 2 E and 2E ' flatness layer 115 has contact hole W2, with the subregion exposure of the connecting line DCT that will drain.Then, on flatness layer 115, form transparent pixels electrode P, this transparent pixels electrode P electrically connects through contact hole W2 and drain electrode connecting line DCT.It should be noted that after the making of accomplishing transparent pixels electrode P, promptly accomplished the making of active elements array substrates 110.
After the making of accomplishing transparent pixels electrode P, then on flatness layer 115, form a dielectric layer 120, to cover transparent pixels electrode P.Surface that it should be noted that this dielectric layer 120 can be hydrophobic surface or hydrophilic surface.
Please with reference to Fig. 2 F and Fig. 2 F ', after forming dielectric layer 120, then on the surface of dielectric layer 120, form a barricade 130, this barricade 130 is in order to define the position of pixel 118.When the surface of dielectric layer 120 was hydrophobic surface, barricade 130 need be designed to water wettability.Otherwise when the surface of dielectric layer 120 was hydrophilic surface, 130 need of barricade were designed to hydrophobicity.
After accomplishing above-mentioned Fig. 2 A to Fig. 2 F and the processing step of Fig. 2 A ' to Fig. 2 F '; Then; The surface is provided with the active elements array substrates 110 and 160 pairs of groups of subtend substrate of dielectric layer 120 and barricade 130; And first liquid 140 and second liquid 150 that will contain dyestuff are formed between active elements array substrates 110 and the subtend substrate 160 making of promptly having accomplished Electrowetting display panel 100 like this.
Fig. 3 and Fig. 3 ' are respectively in another embodiment of the present invention the schematic top plan view of single pixel and diagrammatic cross-section in the Electrowetting display panel, and wherein Fig. 3 ' is the shown diagrammatic cross-section of Y-Y ' profile line in Fig. 3.The Electrowetting display panel 100 ' of present embodiment is similar with the Electrowetting display panel 100 among Fig. 1; The two main difference part is: projection 113 in the Electrowetting display panel 100 ' and reflection horizon R can not be distributed on all viewing areas, only are distributed on the viewing area of part.In other words, Electrowetting display panel 100 ' belongs to a kind of half-penetration half-reflexion type electric moistening type display panel, and the Electrowetting display panel 100 among Fig. 1 then belongs to reflective Electrowetting display panel.
Hold above-mentionedly, because the reflection horizon in the Electrowetting display panel of the present invention has convex-concave surface, so the present invention can promote the reflectivity of Electrowetting display panel, to obtain good display quality.In addition, part embodiment of the present invention can be through the suitable design of pixel electrode, to accelerate the response speed (response) of Electrowetting display panel.
Claims (9)
1. Electrowetting display panel comprises:
One active elements array substrates comprises:
One substrate;
The multi-strip scanning line;
Many data lines; And
A plurality of pixels; Each said pixel respectively with sweep trace wherein and wherein a data line electrically connect; Wherein each said pixel comprises an active component, a transparent pixels electrode and a reflection horizon, and this transparent pixels electrode and this active component electrically connect and be positioned at this top, reflection horizon, and this reflection horizon has a convex-concave surface; Wherein said transparent pixels electrode has at least one opening, to expose the convex-concave surface of part at least;
One dielectric layer is disposed on this active elements array substrates;
One barricade is disposed on this dielectric layer or this active array base plate;
One contains first liquid of dyestuff, is disposed on this dielectric layer;
One second liquid; And
One subtend substrate is disposed at this active elements array substrates top, and wherein this second liquid is between this subtend substrate and this active elements array substrates.
2. Electrowetting display panel as claimed in claim 1; Wherein this active elements array substrates comprises a thin-film transistor array base-plate; Wherein this subtend substrate has a common electrode and a black matrix layer, and wherein said a plurality of pixels comprise reflective pixel or semi-penetration, semi-reflective pixel.
3. Electrowetting display panel as claimed in claim 1, wherein this active elements array substrates also comprises:
One interlayer dielectric layer covers said a plurality of active component;
A plurality of projections are disposed on this interlayer dielectric layer, and wherein this reflection horizon is disposed on this interlayer dielectric layer to cover said a plurality of projection; And
One flatness layer is disposed on this interlayer dielectric layer to cover said a plurality of reflection horizon, and wherein said a plurality of transparent pixels electrodes are disposed on this flatness layer, and this dielectric layer is disposed on this flatness layer to cover said a plurality of transparent pixels electrode.
4. Electrowetting display panel as claimed in claim 1, wherein this dielectric layer has a hydrophobic surface, and this barricade is a water wettability, and this first liquid that contains dyestuff is non-polar liquid, and this second liquid is the polarity conducting liquid.
5. Electrowetting display panel as claimed in claim 1, wherein this dielectric layer has a hydrophilic surface, and this barricade is a hydrophobicity, and this first liquid that contains dyestuff is the polarity conducting liquid, and this second liquid is non-polar liquid.
6. Electrowetting display panel comprises:
One active elements array substrates comprises:
One substrate;
The multi-strip scanning line;
Many data lines; And
A plurality of pixels; Each said pixel respectively with sweep trace wherein and wherein a data line electrically connect; Wherein each said pixel comprises an active component, a transparent pixels electrode and a reflection horizon; This transparent pixels electrode and this active component electrically connect and are positioned at this top, reflection horizon, and wherein this reflection horizon has a convex-concave surface, and the convex-concave surface of part is not covered by this transparent pixels electrode at least;
One dielectric layer is disposed on this active elements array substrates;
One barricade is disposed on this dielectric layer;
One contains first liquid of dyestuff, is disposed on this dielectric layer;
One second liquid; And
One subtend substrate is disposed at this active elements array substrates top, and wherein this second liquid is between this subtend substrate and this active elements array substrates.
7. Electrowetting display panel as claimed in claim 6, wherein this dielectric layer has a hydrophobic surface, and this barricade is a water wettability, and this first liquid that contains dyestuff is non-polar liquid, and this second liquid is the polarity conducting liquid.
8. Electrowetting display panel as claimed in claim 6, wherein this dielectric layer has a hydrophilic surface, and this barricade is a hydrophobicity, and this first liquid that contains dyestuff is the polarity conducting liquid, and this second liquid is non-polar liquid.
9. Electrowetting display panel comprises:
One active elements array substrates comprises:
A plurality of pixels; Wherein each said pixel comprises an active component, a transparent pixels electrode and a reflection horizon; This transparent pixels electrode and this active component electrically connect and are positioned at above this reflection horizon; And this reflection horizon has a convex-concave surface, and wherein said transparent pixels electrode has at least one opening, to expose the convex-concave surface of part at least;
One dielectric layer is disposed on this active elements array substrates;
One liquid; And
One subtend substrate is disposed at this active elements array substrates top, and wherein this liquid is between this subtend substrate and this active elements array substrates.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009102652812A CN101710210B (en) | 2009-12-30 | 2009-12-30 | Electrowetting display panel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009102652812A CN101710210B (en) | 2009-12-30 | 2009-12-30 | Electrowetting display panel |
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| CN101710210A CN101710210A (en) | 2010-05-19 |
| CN101710210B true CN101710210B (en) | 2012-02-01 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US8599465B2 (en) | 2010-09-23 | 2013-12-03 | Incha Hsieh | Method for making an electrowetting device |
| CN103278922B (en) * | 2010-09-27 | 2016-05-18 | 薛英家 | There is the moistening element of electricity of hydrophobia barricade |
| GB201121928D0 (en) | 2011-12-20 | 2012-02-01 | Samsung Lcd Nl R & D Ct Bv | Driving of electrowetting display device |
| CN104330889B (en) * | 2014-09-03 | 2017-02-08 | 京东方科技集团股份有限公司 | Electrowetting display panel and manufacturing method thereof, and display device |
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