CN101696339B - Materials of electronic paper micro-cup and preparation method - Google Patents
Materials of electronic paper micro-cup and preparation method Download PDFInfo
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- CN101696339B CN101696339B CN 200910218653 CN200910218653A CN101696339B CN 101696339 B CN101696339 B CN 101696339B CN 200910218653 CN200910218653 CN 200910218653 CN 200910218653 A CN200910218653 A CN 200910218653A CN 101696339 B CN101696339 B CN 101696339B
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Abstract
The invention relates to materials of an electronic paper micro-cup manufactured on a flexible or rigid substrate and a method for preparing the electronic paper micro-cup. In part by weight, the raw materials of the electronic paper micro-cup comprise 10 to 30 parts of solvents, 15 to 40 parts of resin, 3 to 6 parts of active components, 20 to 70 parts of glass filler and 1 to 4 parts of dispersant; and the coatings can further comprise 1 to 2 parts of defoamer dimethyl polysiloxane in part by weight. The method for preparing the electronic paper micro-cup comprises 1) a base material pretreating process, 2) a coating process, 3) a prebaking process, 4) a masking and exposing process, 5) a developing process and 6) a solidifying process. The method can manufacture a micro-cup figure with high resolution, also can simplify the manufacturing processes and reduce the preparation cost of the micro-cup, and is quite suitable for the manufacturing of the electronic paper micro-cup.
Description
Technical field
The present invention relates to adopt on flexibility or rigid substrates material of making electric paper micro-cup and preparation method thereof, especially the strong solubility solvent such as a kind of anti-zellon and with little glass of material of base plate bonding photoetching type closely and use its preparation method.
Background technology
Electrophoresis showed (Electrophoretic, E-Paper) is called for short Electronic Paper, compares with other display technique, electrophoretic techniques has that energy consumption is low, daylight readable high, production cost is low, be fit to the characteristics such as flexible display technologies.Its technology becomes due to the advantage that combines plain paper and electronic console the technology that most probable is realized the electronic paper industrialization.
The electrophoresis showed ultimate principle is that under direct-current drive between two electrodes (transparency electrode, drive electrode), charged particulate (granules of pigments or filler) electrophoretic migration occurs and shows corresponding color in tiny area (microcapsules or little cup).There are the manufacturers such as Polymer Vision under U.S. E-Ink and SiPix company, Britain Plastic Logic, Dutch Philip, day Hitachi, Seiko Epson, Samsung of Korea S and LPL (LPL) in the enterprise that drops at present the electrophoretic techniques exploitation.Wherein the most representative with the technology of E-Ink and SiPix company.What E-Ink adopted is that microstructure (Micro Structure) belongs to microcapsules (Microcapsules), the size of each display element is uneven and arrange scattered, because adopting the two particles of black and white, light reflectivity is preferably its advantage, can reach approximately 35%～40% left and right, sensation during reading is more pressed close to real paper, and shortcoming is firm not tough, can't bear weight.The microstructure that SiPix company adopts is the little glass of array (Microcup-Array) of patent, and display element in the same size and with array mode marshalling has better machinery and electrical specification, bears weight and also can not damage.And little glass of structure of arrays largest benefit is to use continuous rolling bar formula (Roll to Roll; R2R) processing procedure can be realized large quantities of volume productions, and production cost is lower; And therefore the microcapsule structure of E-Ink can't carry out the R2R processing procedure of producing in the impression mode due to firm not, can only produce with higher cost ink-jetting style manufacturing.Therefore the needs of producing along with technology, little glass of technology has been subject to paying close attention to widely.And making and the encapsulation of little glass, SiPix company are based on the basis of precision die, if change little cup-shaped looks or size, need again to make precision die, and cost is large, the mould making process difficulty is high.In addition little cup structure also exist frangible, containing the problem that easily reacts in the electrophoresis liquid system of zellon.
Summary of the invention
One of purpose of the present invention is to provide little glass of material of a kind of photoetching type, can be used in photoetching process and makes the electric paper micro-cup figure.
Another object of the present invention is to provide a kind of method for preparing the electric paper micro-cup figure, provide a kind of new silk screen print method to coordinate the manufacturing technology of exposure imaging processing procedure, can produce thus high little glass of figure of resolving, processing procedure is simplified, little glass of preparation cost reduces, and is highly suitable for the making of electric paper micro-cup.
The objective of the invention is to be achieved through the following technical solutions, is coating by acidic resins, glass filler, solvent, light trigger, spreading agent for the preparation of the material of the electric paper micro-cup of anti-the solvent, it is characterized in that comprising in parts by weight:
Solvent 10-30
Resin 15-40
Active ingredient 3-6
Glass filler 20-70
Spreading agent 1-2.
Also further comprise a kind of defoamer (dimethyl polysiloxane) in above-mentioned coating, in weight portion 1-2;
Solvent described in above-mentioned coating is Texanol ester alcohol (2,2,4-trimethyl-1.3 pentanediol mono isobutyrate); Described resin is methacrylate; Described glass filler is by baryta BaO, boron oxide B
2O
3, zinc paste ZnO, sodium oxide molybdena Na
2O and kali K
2O is one or more granules of making through the fusing pulverizing wherein, and its particle diameter is less than 10 μ m; Described active ingredient is 2-methyl isophthalic acid-[4-methyl mercapto phenyl]-2-morpholinyl-1-acetone; Described spreading agent is one or more in BYK410, BYK171, BYK180, BYK140, BYK2025.
The preparation method of the electric paper micro-cup of anti-solvent the of the present invention is photoetching process, its preparation process is the above-mentioned photoetching type coating of preparation, coat on pretreated base material, preliminary drying, add under the mask ultraviolet light exposure, with developing liquid developing, re-expose (flexible substrates) or high temperature sintering (rigid substrate), dry and namely get the required electric paper micro-cup of anti-solvent structure.
The method comprises the following steps:
1) base material pretreating process: with rigidity or flexible parent metal rinse in treating fluid, ultrasonic, dry, obtain the clean rigidity of cleaning surfaces or flexible parent metal; Treating fluid used is one or more in deionized water, isopropyl alcohol, acetone, ethanol;
2) photoetching type paper micro-cup coating is coated on base material after grinding rolling; Its painting method can be the methods such as ink-jet, roller coating, spin coating, printing, slot coated;
3) surface that preliminary drying technique: with step 2) obtains is to toast 8-30 minute under 90-100 ℃ (according to coating method and coating solid content difference with the base material of electric paper micro-cup material in temperature, single layer coating thickness is 5-20 μ m, can according to little cup body thickness is required repeating step 2 and step 3, adjust thickness to desirable value;
4) mask exposure technique: add on the electric paper micro-cup material of the base material that obtains of step 3 and be with figuratum mask, certain hour exposes under uviol lamp; Uviol lamp used is a kind of in high pressure tribute lamp, low pressure tribute lamp, and exposure is 50-500mJ/cm
2
5) developing process: in developer solution to step 4) develop with the base material of electric paper micro-cup material after exposure: developer solution used is aqueous sodium carbonate, its concentration is 0.2-2wt%, development time is 10-30 second, obtains the electric paper micro-cup structure on base material;
6) curing process: if flexible parent metal carries out without the mask re-expose figure, carry out afterwards dry 70-130 ℃, figure is solidified fully; For rigid substrate, figure is carried out high temperature sintering (500-600 ℃ of insulation 20min), make little glass of figure with the base material combination fully, intensity also is able to abundant raising.
Described base material can be rigid substrate: silicon substrate, glass baseplate; Or flexible parent metal: any one in polyethylene terephthalate vinegar (PET) base material, Polyvinylchloride (PVC) base material or poly-carbonic acid enzyme (PC) base material.
The present invention's method used is simple, equipment is cheap: adopt photocuring and normal optical lithography, be applicable to multiple base material, as simple glass, quartz glass, polyethylene terephthalate vinegar (PET) film; Only need the common lithographic equipments such as ultraviolet source and mask plate, can realize little cup structure, be convenient to large-scale production; Add glass filler in photoresist in addition when using rigid substrate, by high temperature sintering, little cup of making thus can be bonding firmly with the below base material, and this little cup structure also can not react with the strong electrophoresis liquid of dissolubility simultaneously.The method is simple, and is with low cost.
Description of drawings
Fig. 1 is exposure imaging step schematic diagram.
Embodiment
Below by specific embodiment, the present invention is described in further detail.
Embodiment 1
Following process is adopted in the preparation of photoetching type electric paper micro-cup material: get glass dust baryta (BaO) 50 grams and pour in mortar, add Texanol ester alcohol (2,2,4-trimethyl-1.3 pentanediol mono isobutyrate) 20g, polymethyl methacrylate resin 25 grams, active ingredient light trigger 2-methyl isophthalic acid-[4-methyl mercapto phenyl]-2-morpholinyl-1-acetone 3g, dispersant B YK2025 2g ground 5-15 minute.
Above-mentioned glass dust can be the granule of making through the fusing pulverizing, and its particle diameter less than the glass dust of 10 μ m, can also be the glass dust preparation of adopting through directly buying.Lower same.
Use the following process of method that little glass of material of above-mentioned photoetching type made little glass of figure:
1) with polyethylene terephthalate vinegar (PET) base material with washed with de-ionized water after low temperature drying (60 ℃ baking 10min);
2) first above-mentioned little glass of materials, printed on is coated on the substrate of electrode pattern with screen printing mode;
3) through 100 ℃ of bakings 20 minutes, make the coat film-forming, thickness is 15 μ m;
4) excite the generation uviol lamp with uviol lamp high pressure tribute lamp, and coordinate required mask to expose, exposure is 70mJ/cm
2, make required graphics field carry out the light reaction chemical bonds;
5) adopting massfraction is that 0.4% sodium carbonate liquor develops, and development time is 15s, development pressure 1.5kgf/cm
2
6) with step 5) the little glass of figure of making block to place under uviol lamp high pressure tribute lamp without mask and carry out re-expose, and exposure is 500mJ/cm
2, make little glass of figure with the base material combination fully, intensity also is able to abundant raising;
7) figure of step 6 being produced carries out heat curing, 120 ℃ of baking 20min.
The above-mentioned little glass of figure that can obtain making by lithography on flexible substrates.
Embodiment 2
Following process is adopted in the preparation of photoetching type electric paper micro-cup material: get glass dust boron oxide (B
2O
3) 22 grams pour in mortar, add Texanol ester alcohol (2,2,4-trimethyl-1.3 pentanediol mono isobutyrate) 30g, polymethyl methacrylate resin 40 grams, active ingredient light trigger 2-methyl isophthalic acid-[4-methyl mercapto phenyl]-2-morpholinyl-1-acetone 4g, dispersant B YK140 4g ground 5-15 minute.
Use the following process of method that little glass of material of above-mentioned photoetching type made little glass of figure:
1) glass baseplate cleans with the ultrasonic rear employing isopropyl alcohol of clear water;
2) first above-mentioned little glass of materials, printed on is coated on the substrate of electrode pattern with ink-jetting style;
3) through 90 ℃ of bakings 30 minutes, make the coat film-forming, thickness is 10 μ m;
4) continue little glass of material of ink-jet one deck on the plate of baking film forming;
5) 100 ℃ of bakings made second layer baking film forming in 20 minutes again, and two layers of thickness is 15-30 μ m;
6) excite the generation uviol lamp with uviol lamp low pressure tribute lamp, and coordinate required mask to expose, exposure is 150mJ/cm
2, make required graphics field carry out the light reaction chemical bonds;
7) adopting massfraction is that 0.4% sodium carbonate liquor develops, and development time is 30s, development pressure 1.5kgf/cm
2
8) the little glass of figure of step 7 being produced carries out high temperature sintering (570 ℃ of insulation 20min).
The above-mentioned little glass of figure that can obtain making by lithography on stiff base.
Following process is adopted in the preparation of photoetching type electric paper micro-cup material: get glass dust zinc paste (Zn0) 56 grams and pour in mortar, add Texanol ester alcohol (2,2,4-trimethyl-1.3 pentanediol mono isobutyrate) 10g, polymethyl methacrylate resin 15 grams, active ingredient light trigger 2-methyl isophthalic acid-[4-methyl mercapto phenyl]-2-morpholinyl-1-acetone 4g, dispersant B YK180 2g, defoamer dimethyl polysiloxane 2g ground 5-15 minute.
Use the following process of method that little glass of material of above-mentioned photoetching type made little glass of figure:
1) glass baseplate cleans with the ultrasonic rear employing acetone of clear water;
2) first above-mentioned little glass of materials, printed on is coated on the substrate of electrode pattern in the roller coating mode;
3) through 100 ℃ of bakings 8 minutes, make the coat film-forming, thickness is 5 μ m;
4) continue little glass of material of roller coating one deck on the plate of baking film forming;
5) 100 ℃ of bakings made second layer baking film forming in 20 minutes again, and two layers of thickness is 15-30 μ m;
6) excite the generation uviol lamp with uviol lamp high pressure tribute lamp, and coordinate required mask to expose, exposure is 150mJ/cm
2, make required graphics field carry out the light reaction chemical bonds;
7) adopting massfraction is that 0.4% sodium carbonate liquor develops, and development time is 30s, development pressure 1.5kgf/cm
2
8) the little glass of figure of step 7 being produced carries out high temperature sintering (500 ℃ of insulation 20min).
The above-mentioned little glass of figure that can obtain making by lithography on stiff base.
Embodiment 4
Following process is adopted in the preparation of photoetching type electric paper micro-cup material: get glass dust sodium oxide molybdena (Na
2O) 70 grams are poured in mortar, add Texanol ester alcohol (2,2,4-trimethyl-1.3 pentanediol mono isobutyrate) 30g, polymethyl methacrylate resin 15 grams, active ingredient light trigger 2-methyl isophthalic acid-[4-methyl mercapto phenyl]-2-morpholinyl-1-acetone 3g, dispersant B YK171 1g, defoamer dimethyl polysiloxane 1g ground 5-15 minute.
Use the following process of method that little glass of material of above-mentioned photoetching type made little glass of figure:
1) silicon substrate cleans with the ultrasonic rear employing ethanol of clear water;
2) first above-mentioned little glass of materials, printed on is coated on the substrate of electrode pattern in the spin coating mode;
3) through 100 ℃ of bakings 30 minutes, make the coat film-forming, thickness is 20 μ m;
4) continue little glass of material of spin coating one deck on the plate of baking film forming;
5) 100 ℃ of bakings made second layer baking film forming in 20 minutes again, and two layers of thickness is 15-30 μ m;
6) excite the generation uviol lamp with uviol lamp low pressure tribute lamp, and coordinate required mask to expose, exposure is 50mJ/cm
2, make required graphics field carry out the light reaction chemical bonds;
7) adopting massfraction is that 0.2% sodium carbonate liquor develops, and development time is 10s, development pressure 1.5kgf/cm
2
8) the little glass of figure of step 7 being produced carries out high temperature sintering (600 ℃ of insulation 20min).
The above-mentioned little glass of figure that can obtain making by lithography on stiff base.
Embodiment 5
Following process is adopted in the preparation of photoetching type electric paper micro-cup material: get glass dust kali (K
2O) 20 grams are poured in mortar, add Texanol ester alcohol (2,2,4-trimethyl-1.3 pentanediol mono isobutyrate) 30g, polymethyl methacrylate resin 40 grams, active ingredient light trigger 2-methyl isophthalic acid-[4-methyl mercapto phenyl]-2-morpholinyl-1-acetone 6g, dispersant B YK410 2g, defoamer dimethyl polysiloxane 2g ground 5-15 minute.
Use the following process of method that little glass of material of above-mentioned photoetching type made little glass of figure:
1) Polyvinylchloride (PVC) the base material ultrasonic rear employing washed with de-ionized water of clear water;
2) first above-mentioned little glass of materials, printed on is coated on the substrate of electrode pattern in the slot coated mode;
3) through 100 ℃ of bakings 20 minutes, make the coat film-forming, thickness is 10 μ m;
4) continue little glass of material of slot coated one deck on the plate of baking film forming;
5) 100 ℃ of bakings made second layer baking film forming in 20 minutes again, and two layers of thickness is 15-30 μ m;
6) excite the generation uviol lamp with uviol lamp low pressure tribute lamp, and coordinate required mask to expose, exposure is 150mJ/cm
2, make required graphics field carry out the light reaction chemical bonds;
7) adopting massfraction is that 2% sodium carbonate liquor develops, and development time is 10s, development pressure 1.5kgf/cm
2
8) with step 7) the little glass of figure of making block to place under uviol lamp high pressure tribute lamp without mask and carry out re-expose, and exposure is 500mJ/cm
2
9) the little glass of figure of step 8 being produced carries out 130 ℃ of dryings, and insulation 20min
The above-mentioned little glass of figure that can obtain making by lithography on flexible substrates.
Embodiment 6
Following process is adopted in the preparation of photoetching type electric paper micro-cup material: get glass dust zinc paste (ZnO) and kali (K
2O) granule 50 grams of making through the fusing pulverizing are poured in mortar, the granule particle diameter is less than 10 μ m, then add Texanol ester alcohol (2,2,4-trimethyl-1.3 pentanediol mono isobutyrate) 20g, polymethyl methacrylate resin 21 grams, active ingredient light trigger 2-methyl isophthalic acid-[4-methyl mercapto phenyl]-2-morpholinyl-1-acetone 4g, dispersant B YK140 and BYK20252g, defoamer dimethyl polysiloxane 2g ground 5-15 minute.
Use the following process of method that little glass of material of above-mentioned photoetching type made little glass of figure:
1) poly-carbonic acid enzyme (PC) the base material ultrasonic rear employing washed with de-ionized water of clear water;
2) first above-mentioned little glass of materials, printed on is coated on the substrate of electrode pattern with screen printing mode;
3) through 100 ℃ of bakings 20 minutes, make the coat film-forming, thickness is 10 μ m;
4) continue little glass of material of printing one deck on the plate of baking film forming;
5) 100 ℃ of bakings made second layer baking film forming in 20 minutes again, and two layers of thickness is 15-30 μ m;
6) excite the generation uviol lamp with the uviol lamp low pressure mercury lamp, and coordinate required mask to expose, exposure is 500mJ/cm
2, make required graphics field carry out the light reaction chemical bonds;
7) adopting massfraction is that 0.4% sodium carbonate liquor develops, and development time is 30s, development pressure 1.5kgf/cm
2
8) with step 7) the little glass of figure of making block to place under uviol lamp high pressure tribute lamp without mask and carry out re-expose, and exposure is 500mJ/cm
2
9) the little glass of figure of step 7 being produced carries out 70 ℃ of dryings and is incubated 20min;
The above-mentioned little glass of figure that can obtain making by lithography on flexible substrates.
Embodiment 7
Following process is adopted in the preparation of photoetching type electric paper micro-cup material: get glass dust baryta (BaO) and boron oxide (B
2O
3) pour in mortar through melting granule 40 grams of pulverizing and making, the granule particle diameter is less than 10 μ m, then add Texanol ester alcohol (2,2,4-trimethyl-1.3 pentanediol mono isobutyrate) 25g, polymethyl methacrylate resin 25 grams, active ingredient light trigger 2-methyl isophthalic acid-[4-methyl mercapto phenyl]-2-morpholinyl-1-acetone 6g, dispersant B YK410 and BYK180 2g, defoamer dimethyl polysiloxane 2g ground 5-15 minute.
Use the following process of method that little glass of material of above-mentioned photoetching type made little glass of figure:
1) glass baseplate cleans with the ultrasonic rear employing isopropyl alcohol of acetone;
2) first above-mentioned little glass of materials, printed on is coated on the substrate of electrode pattern with screen printing mode;
3) through 100 ℃ of bakings 20 minutes, make the coat film-forming, thickness is 10 μ m;
4) continue little glass of material of printing one deck on the plate of baking film forming;
5) 100 ℃ of bakings made second layer baking film forming in 20 minutes again, and two layers of thickness is 15-30 μ m;
6) excite the generation uviol lamp with the uviol lamp low pressure mercury lamp, and coordinate required mask to expose, exposure is 150mJ/cm
2, make required graphics field carry out the light reaction chemical bonds;
7) adopting massfraction is that 0.4% sodium carbonate liquor develops, and development time is 30s, development pressure 1.5kgf/cm
2
8) the little glass of figure of step 7 being produced carries out high temperature sintering (570 ℃ of insulation 20min).
The above-mentioned little glass of figure that can obtain making by lithography on stiff base.
Embodiment 8
Following process is adopted in the preparation of photoetching type electric paper micro-cup material: get glass dust zinc paste (ZnO) and sodium oxide molybdena (Na
2O) and baryta (BaO) pulverize and granule 60 grams made are poured in mortar through fusing, the granule particle diameter is less than 10 μ m, then add Texanol ester alcohol (2,2,4-trimethyl-1.3 pentanediol mono isobutyrate) 17g, polymethyl methacrylate resin 15 grams, active ingredient light trigger 2-methyl isophthalic acid-[4-methyl mercapto phenyl]-2-morpholinyl-1-acetone 4g, dispersant B YK171 and BYK2025 and BYK1802g, defoamer dimethyl polysiloxane 2g ground 5-15 minute.
Use the following process of method that little glass of material of above-mentioned photoetching type made little glass of figure:
1) the I glass baseplate ultrasonic rear employing washed with de-ionized water of clear water;
2) first above-mentioned little glass of materials, printed on is coated on the substrate of electrode pattern with screen printing mode;
3) through 100 ℃ of bakings 20 minutes, make the coat film-forming, thickness is 10 μ m;
4) continue little glass of material of printing one deck on the plate of baking film forming;
5) 100 ℃ of bakings made second layer baking film forming in 20 minutes again, and two layers of thickness is 15-30 μ m;
6) excite the generation uviol lamp with the uviol lamp high-pressure sodium lamp, and coordinate required mask to expose, exposure is 150mJ/cm
2, make required graphics field carry out the light reaction chemical bonds;
7) adopting massfraction is that 0.4% sodium carbonate liquor develops, and development time is 30s, development pressure 1.5kgf/cm
2
8) the little glass of figure of step 7 being produced carries out high temperature sintering (570 ℃ of insulation 20min).
The above-mentioned little glass of figure that can obtain making by lithography on stiff base.
The method of little glass of figure of little glass of material making of photoetching type of the present invention is shown in Figure 1, on through the base material 2 after cleaning, above-mentioned photosensitive material coat film 1 printing is coated on the substrate of electrode pattern; After the aforesaid substrate oven dry, adopt mask plate to cover aforesaid substrate, exposed portion forms figure 5 under the radiation of ultraviolet light 3; With staying the crosslinked figure 6 of generation, i.e. required little glass of figure under action of ultraviolet light after developing liquid developing.
The method that the present invention has adopted photoetching process to make little glass of figure, and add glass filler in photosensitive pulp, make the method (step 8) that can adopt high temperature sintering when making little glass on rigid substrate, can make little glass of figure and base material fully bonding, and not be subject to the impact of other technique and material.
Little cup structure that the present invention makes is firm tough, can bear weight; And cost of manufacture is low, mould making process is simple.Also can not react with the strong electrophoresis liquid of dissolubility containing in the electrophoresis liquid system of zellon.The method is simple, and is with low cost.
Claims (2)
1. the preparation method of an electric paper micro-cup, it is characterized in that: the method comprises the following steps:
1) base material pretreating process: with rigidity or flexible parent metal rinse in treating fluid, ultrasonic, dry, obtain the clean rigidity of cleaning surfaces or flexible parent metal; Treating fluid used is one or more in deionized water, isopropyl alcohol, acetone, ethanol;
2) electric paper micro-cup coating is coated on base material after grinding rolling; Its painting method is ink-jet, roller coating, spin coating, printing, slot coated method;
3) surface that preliminary drying technique: with step 2) obtains is to toast 8-30 minute under 90-100 ℃ with the base material of electric paper micro-cup coating in temperature, and single layer coating thickness is 5-20 μ m;
4) mask exposure technique: add on the electric paper micro-cup coating of the base material that step 3) obtains and be with figuratum mask, expose under uviol lamp; Uviol lamp used is a kind of in high pressure tribute lamp, low pressure tribute lamp, and exposure is 50-500mJ/cm
2
5) developing process: in developer solution to step 4) develop with the base material of electric paper micro-cup coating after exposure: developer solution used is aqueous sodium carbonate, its concentration is 0.2-2wt%, development time is 10-30 second, obtains the electric paper micro-cup structure on base material;
6) curing process: if flexible parent metal carries out carrying out 70-130 ℃ of drying without after the mask re-expose to figure, make figure solidify fully; If rigid substrate carries out high temperature 500-600 ℃ sintering with figure, and insulation 20min;
The coating of described electric paper micro-cup is according to comprising in following portions by weight:
Also further comprise a kind of defoamer dimethyl polysiloxane in above-mentioned coating, in weight portion 1-2;
Solvent described in above-mentioned coating is Texanol ester alcohol (2,2,4-trimethyl-1.3 pentanediol mono isobutyrate);
Described resin is methacrylate;
Described glass filler is by baryta BaO, boron oxide B
2O
3, zinc paste ZnO, sodium oxide molybdena Na
2O and kali K
2O is one or more granules of making through the fusing pulverizing wherein, and its particle diameter is less than 10 μ m;
Described active ingredient is 2-methyl isophthalic acid-[4-methyl mercapto phenyl]-2-morpholinyl-1-acetone;
Spreading agent described in above-mentioned coating is one or more in BYK410, BYK171, BYK180, BYK140, BYK2025.
2. the preparation method of a kind of electric paper micro-cup according to claim 1, it is characterized in that: described base material is rigid substrate: silicon substrate, glass baseplate, or flexible parent metal: any in polyethylene terephtalate base material, polyvinylchloride base material or polycarbonate base material.
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| CN102681285B (en) | 2011-06-02 | 2016-08-10 | 京东方科技集团股份有限公司 | The preparation method of micro-cup substrate and display device |
| CN103852948B (en) * | 2012-12-04 | 2016-12-21 | 汉王科技股份有限公司 | A kind of method preparing fexible film interlayer substrate |
| CN104332394B (en) * | 2014-10-20 | 2017-04-19 | 深圳市华星光电技术有限公司 | Method of manufacturing flexible substrate |
| JP2018087956A (en) * | 2016-04-26 | 2018-06-07 | Jsr株式会社 | Method for manufacturing color hardening film, and method for forming pixel pattern of color filter |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1730572A (en) * | 2005-08-02 | 2006-02-08 | 天津大学 | Yellow electronic ink microcapsule preparation method |
| CN101441381A (en) * | 2007-11-19 | 2009-05-27 | 中国科学院理化技术研究所 | Method for preparing solvent resistance agent electronic paper micro-cup and material for preparing solvent resistance agent electric paper micro-cup |
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2009
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1730572A (en) * | 2005-08-02 | 2006-02-08 | 天津大学 | Yellow electronic ink microcapsule preparation method |
| CN101441381A (en) * | 2007-11-19 | 2009-05-27 | 中国科学院理化技术研究所 | Method for preparing solvent resistance agent electronic paper micro-cup and material for preparing solvent resistance agent electric paper micro-cup |
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