CN101670743A - Bicolor basal plate and method for preparing same - Google Patents
Bicolor basal plate and method for preparing same Download PDFInfo
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- CN101670743A CN101670743A CN200810141898A CN200810141898A CN101670743A CN 101670743 A CN101670743 A CN 101670743A CN 200810141898 A CN200810141898 A CN 200810141898A CN 200810141898 A CN200810141898 A CN 200810141898A CN 101670743 A CN101670743 A CN 101670743A
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Abstract
The invention provides a bicolor basal plate and a method for preparing the same. The bicolor basal plate comprises a base material and a film layer covered on the base material, wherein the base material is provided with a protruding area and a non-protruding area; the film layer comprises at least one layer of film; due to the difference between the thicknesses of the film layers on the protruding area and the non-protruding area, the protruding area and the non-protruding area show different colors; and the film layers covered on the protruding area and the non-protruding are made of same materials. The preparation method comprises: processing the base material by one of the processing methods such as chemical etching, punching and die cast so as to form the protruding area and the non-protruding area on the surface of the base material; and performing spluttering treatment on the surface of the base material with the protruding area and the non-protruding area at least once so as to make the thicknesses of the film layers on the protruding area and the non-protruding area differ. The bicolor basal plate has the advantages that: the color selectivity of the product is rich, theanti-wearing property of the color film layer of the product is good, the bonding force of the color film layer to the base material is good, and the method for preparing the bicolor basal plate is simple.
Description
Technical field
The present invention relates to the invention belongs to technical field of surface, relate generally to a kind of bicolor basal plate and preparation method thereof.
Background technology
Trade mark, button etc. are one of surperficial accessories of electronic products such as mobile phone, digital camera, computer, have played important decoration function.Often increase the purpose that film reaches incrustation at present on the surface of electronic product, the available technology adopting multilayer coating is as at substrate surface splash-proofing sputtering metal and metal oxide layer, according to the interference of light principle, control the thickness of metal oxide layer, prepared the metalized substrate of multiple color.But the thickness of this certain metal oxide layer of method can only corresponding a kind of color, can't once obtain the base material of surface for double-colored (two kinds of colors).
For the surface at electronic product reaches double-colored (two kinds of colors) effect; the general vacuum plating that adopts is earlier handled; obtain first kind of color coating; by obedient gummed paper; spray paint or print corresponding figure is carried out covering protection; base material is carried out strip to be handled; make the first kind of color coating that takes off in the zone that do not have covering protection; again base material is carried out the i.e. plating of second kind of color of different colours; obtain second kind of color coating taking off the zone that coating exposes base material like this; remove obedient gummed paper; spray paint or print the zone that corresponding figure is obtained having first kind of color coating, so just obtained bicolor basal plate.But this method needs strip, twice plated film, covering protection, and technology is loaded down with trivial details, and causes the increase of cost.Simultaneously the adhesion of the wearability of product, two kinds of color intersections and base material is relatively poor.
Summary of the invention
The object of the present invention is to provide a kind of bicolor basal plate and preparation method thereof, the color of this bicolor basal plate is selected abundant, the good bonding strength of the wearability of the color rete of this base material, color rete and base material simultaneously, and the preparation method of this substrate is simple simultaneously.
The invention provides a kind of bicolor basal plate, comprise base material and cover rete on the base material, the district of protrusion and non-protruding district are arranged on the described base material, described rete is at least a skim, the thicknesses of layers in described protrusion district makes to protrude to distinguish with non-protruding district with the thicknesses of layers difference in non-protruding district and presents different colors, and the described protrusion that covers is distinguished identical with the film material that covers non-protruding district.
The present invention has adopted interference of light principle well known in the art, promptly when illumination was mapped on the substrate, the absorptivity difference of the reflectivity of base material or film material or light caused interference of light to take place, present colour on the substrate thereby make, the thickness of control rete can obtain different colors.
The preparation method of above-mentioned bicolor basal plate, adopt a kind of processing method in chemical etching, punching press, the die cast to handle to base material, substrate surface is formed protrude district and non-protruding district, carry out sputter process at least one time to containing the substrate surface that protrudes district and non-protruding district, sputter process makes the thicknesses of layers that protrudes the district different with the thicknesses of layers in non-protruding district, the thicknesses of layers that protrusion is distinguished makes to protrude to distinguish with non-protruding district with the thicknesses of layers difference in non-protruding district and presents different colors, and the described protrusion that covers is distinguished identical with the film material that covers non-protruding district.
The present inventor is divided into bicolor basal plate protrudes district and non-protruding district, when carrying out sputter process, protruding the district is the different of target-substrate distance with non-protruding offset from the distance of the used target of sputter, thereby cause sputter material different with the sedimentation rate in non-protruding district in the protrusion district, thereby the sputtered layer thickness that protrudes the district is different with the sputtered layer thickness in non-protruding district, therefore, the thicknesses of layers in protrusion district is different with the thicknesses of layers in non-protruding district.
Product colour of the present invention is selected abundant, and the adhesion of the wearability of product colour rete, color rete and base material is good, and the preparation method of this substrate is simple, and a sputter can form double-colored, and manufacturing cost reduces greatly.
The specific embodiment
The invention provides a kind of bicolor basal plate, comprise base material and cover rete on the base material, the district of protrusion and non-protruding district are arranged on the described base material, described rete is at least a skim, the thicknesses of layers in described protrusion district makes to protrude to distinguish with non-protruding district with the thicknesses of layers difference in non-protruding district and presents different colors, and the described protrusion that covers is distinguished identical with the film material that covers non-protruding district.
The present inventor finds through a large amount of experiments, protruding district and non-protruding offset is that the gap of target-substrate distance is big more from the distance of the used target of sputter, the thickness difference of the sputtered layer that causes is big more, the difference of two kinds of colors is obvious more, can distinguish this two kinds of colors more, when protruding the extrude depth of district than non-protruding district is during greater than 1mm, and product surface concavo-convex too obvious is not suitable for surperficial appearance requirement high product.When protruding the extrude depth of district than non-protruding district is during less than 0.1mm, and the thickness difference of the sputtered layer that causes is too small, and the difference of two kinds of colors is less, can not obviously distinguish this two kinds of colors.Therefore, preferably, when this bicolor basal plate of preparation, adopt a sputter to obtain protruding the rete in district and non-protruding district, the thicknesses of layers that protrudes the district makes to protrude to distinguish with non-protruding district with the thicknesses of layers difference in non-protruding district and presents different colors, and the thickness that protrude than non-protruding district in described protrusion district is 0.1-1mm.
When described rete is a skim, described base material is an extinction material, just can make between base material and the rete to produce interference of light, thereby obtain double-colored base material.
When described rete is at least two tunics, the refractive index difference of the material of adjacent two tunics when controlling diaphragm layer thickness and refractive index, makes light in the optical path difference of whole rete upper and lower surface during for the integral multiple of the wavelength of certain color, and rete promptly is shown as this color.Except the rete that sputter obtains, the rete that the rete of other layer can obtain for common film plating process such as sputter or plating.
Described rete is two tunics, and this two tunic is a kind of in metal level and metal oxide layer, metal level and the nonmetal oxide layer.
Described metal is a kind of in titanium, aluminium, silicon, chromium, the stainless steel, and described metal oxide is a kind of in titanium dioxide, the alundum (Al, and nonmetal oxide is a silica.
Described base material is plastics or metal, and when described base material adopted plastics, described plastics were the common various plastics in this area, as PC, ABS.When described base material adopted metal, used metal was the common various metals in this area, as aluminium alloy, magnesium alloy, stainless steel etc.
A kind of preparation method of bicolor basal plate, adopt a kind of processing method in chemical etching, punching press, the die cast to handle to base material, substrate surface is formed protrude district and non-protruding district, carry out the coating surface processing to containing the base material that protrudes district and non-protruding district, form rete on base material, the protrusion district of containing the base material of rete makes than the extrude depth in non-protruding district protrudes the district and presents different colors with non-protruding district.
Described chemical etching, punching press, die cast are the common chemical etching in this area, punching press, die cast, as long as can form sharply marginated protrusion district and non-protruding district.
Only adopt the common magnetron sputtering in this area as an example summary of the invention of the present invention to be described among the present invention.
Adopt medium frequency magnetron sputtering ion plating equipment (Shenzhen shake Industrial Co., Ltd. of Hengchang 800 types) to realize the plating rete.
According to preparation method provided by the invention, in the preferred case, in order to improve the adhesion of rete and base material, the preparation method of described Coating Materials can also comprise base material is carried out before the magnetic controlled sputtering ion plating cleaning and clean activation, described clear be ultrasonic wave cleaning treatment well known in the art; The method of described cleaning activation comprises, under the condition of cleaning activation, bombards described base material with the ion of inert gas.
Described coating process step air pressure is 1 * 10
-1-2.0 handkerchiefs are preferably 2 * 10
-1-1.0 handkerchiefs.
Described coating process adopts permanent power mode, and the power of described intermediate frequency power supply is the steady state value in the 1-50 kilowatt of scope, is preferably the steady state value in the 5-30 kilowatt of scope, more preferably the 10-20 kilowatt of steady state value that scope is interior.
Described target can be titanium, aluminium, silicon, chromium, stainless steel etc.; Described oxide can be metal oxide and nonmetal oxide, and metal oxide can be titanium dioxide, alundum (Al, and nonmetal oxide is a silica.
When the metal lining oxide membranous layer, in magnetron sputtering apparatus, feed reacting gas, described reacting gas is an oxygen, the flow of described oxygen is 100-800sccm, is preferably 200-600sccm.
The described plated film time is the common plated film time of this area, is generally 1-100 minute;
This technology can obtain the two-color effect of multiple colour match according to the collocation of different metal layer and metal oxide layer or nonmetal oxide layer, and lucuriant in design, metal-like is strong, and adhesion is good.
With the metal level is that titanium and metal oxide layer are that titanium dioxide is example, obtains a series of colors, as shown in table 1:
Table 1
The present invention is described in more detail below by specific embodiment
Embodiment 1
The stainless steel substrate B1 that adopts the process chemical etching and cleaned carries out medium frequency magnetron sputtering ion plating the present invention is described.
The thickness that protrude than non-protruding district in the protrusion district of the base material of described stainless steel substrate B1 is 0.7mm.Described rete is two tunics, layer of titanium metal and titanium dioxide layer.Selected target is the titanium target of purity 99.99%.
B1 is put into vacuum drying oven, close fire door, open vavuum pump and find time, be evacuated to 3.0 * 10
-2Handkerchief, feeding argon gas adjustment vacuum is 2.0 handkerchiefs, and bias voltage is 600 volts, and dutycycle 50% is carried out plasma bombardment and is cleaned activation, and the time is 10 minutes.
Feed the working gas argon gas, making vacuum is 3.5 * 10
-1Handkerchief is opened the titanium target power supply, and power is 16kW, and bias voltage is 200V, and dutycycle is 50%, and the time is 6 minutes; Obtain layer of titanium metal.
Feed reacting gas oxygen, making argon gas and oxygen proportion is 1: 2.5, and adjusting titanium target power supply power is 14kW, and bias voltage is 150V, and dutycycle is 40%, and the time is 18 minutes, obtains titanium dioxide layer.
Layer of titanium metal the effect here is to form a film system with silicon dioxide layer, and it mainly plays the effect of delustring and reflection.
Close the titanium target power supply, close grid bias power supply, stop to feed argon gas and oxygen, cool off and came out of the stove in 10 minutes, non-protruding district of product and protrusion district color are respectively yellow and orange, the Alpha step instrument that adopts U.S. Tencor company to produce is measured, and the thickness of non-protruding district and protrusion district titanium oxide film layer is respectively 116.8nm and 128.2nm, is designated as D1.
Embodiment 2
Employing is carried out medium frequency magnetron sputtering ion plating through over etching and the aluminum alloy base material B2 that cleaned the present invention is described.
The thickness that protrude than non-protruding district in the protrusion district of described aluminum alloy base material B2 is 0.8mm.Described rete is two tunics, layer of titanium metal and silicon dioxide layer.Selected target is the titanium target and the silicon target of purity 99.99%.
B2 is put into vacuum drying oven, close fire door, open vavuum pump and find time, be evacuated to 3.0 * 10
-2Handkerchief, feeding argon gas adjustment vacuum is 2.0 handkerchiefs, and bias voltage is 600 volts, and dutycycle 50% is carried out plasma bombardment and is cleaned activation, and the time is 10 minutes.
Feed the working gas argon gas, making vacuum is 3.2 * 10
-1Handkerchief is opened the titanium target power supply, and power is 14kW, and bias voltage is 200V, and dutycycle is 50%, and the time is 7 minutes; Obtain layer of titanium metal.
Close the titanium target power supply, feed reacting gas oxygen, making argon gas and oxygen proportion is 1: 2, opens the silicon target power supply, and oxygen and silicon target reaction form silica, and power is 12kW, and bias voltage is 150V, and dutycycle is 40%, and the time is 44 minutes, forms silicon dioxide layer.
Close the silicon target power supply, close grid bias power supply, stop to feed argon gas and oxygen, cool off and came out of the stove in 10 minutes, non-protruding district of product and protrusion district color are respectively orange and purplish red, the Alpha step instrument that adopts U.S. Tencor company to produce is measured, and the thickness of non-protruding district and protrusion district silica coating is respectively 198.3nm and 219.5nm, is designated as D2.
Embodiment 3
The plastic basis material B3 that adopts the process punching press and cleaned carries out medium frequency magnetron sputtering ion plating the present invention is described.
The thickness that protrude than non-protruding district in the protrusion district of described plastic basis material B3 is 0.7mm, and described film is the combination of alundum (Al and titanium.Selected target is the titanium target and the aluminium target of purity 99.99%.
B3 is put into vacuum drying oven, close fire door, open vavuum pump and find time, be evacuated to 3.0 * 10
-2Handkerchief, feeding argon gas adjustment vacuum is 2.0 handkerchiefs, and bias voltage is 600 volts, and dutycycle 50% is carried out plasma bombardment and is cleaned activation, and the time is 10 minutes.
Feed the working gas argon gas, making vacuum is 3.5 * 10
-1Handkerchief is opened the titanium target power supply, and power is 12kW, and bias voltage is 200V, and dutycycle is 40%, and the time is 8 minutes; Obtain layer of titanium metal.
Close the titanium target power supply, feed reacting gas oxygen, making argon gas and oxygen proportion is 1: 3, opens the aluminium target power supply, oxygen and aluminium target response form alundum (Al, and power is 10kW, and bias voltage is 150V, dutycycle is 30%, and the time is 21 minutes, generates the alundum (Al layer.
Close the aluminium target power supply, close grid bias power supply, stop to feed argon gas and oxygen, cool off and came out of the stove in 10 minutes, non-protruding district of product and protrusion district color are respectively pink and purplish red, the Alpha step instrument that adopts U.S. Tencor company to produce is measured, and the thickness of non-protruding district and protrusion district alundum (Al floor is respectively 199.6nm and 210.2nm, is designated as D3.
Embodiment 4
Embodiment 4 is 28 minutes for only changing the TiO 2 coating film time on the technology basis among the embodiment 1, want for a long time than the 18 minutes reaction time clock time of embodiment 1, non-protruding district of the base material that plated film is thick and protrusion district color are respectively blue and green, the Alpha step instrument that adopts U.S. Tencor company to produce is measured, the thickness of non-protruding district and protrusion district titanium dioxide layer is respectively 176.7nm and 191.8nm, is designated as D4.
Embodiment 5
Embodiment 5 is 1.05mm for the protrusion district that changes base material on the technology basis among the embodiment 1 than the extrude depth in non-protruding district.The Alpha step instrument that adopts U.S. Tencor company to produce is measured, and the thickness of non-protruding district and protrusion district titanium dioxide layer is respectively 107.6nm and 127.3nm, is designated as D5.
Embodiment 6
Embodiment 6 is that technology is identical among the embodiment 1, and difference is that the rete of sputter is a skim, and the composition of this tunic is a titanium dioxide, and described base material is a titanium alloy.The Alpha step instrument that adopts U.S. Tencor company to produce is measured, and the thickness of non-protruding district and protrusion district titanium dioxide layer is respectively 118.4nm and 128.1nm, is designated as D6.
Comparative Examples 1
Adopt present main double-colored trailing to carry out plated film.
1) stainless steel substrate that will clean carries out the vacuum plating processing, and film material is a titanium carbide, and the base material after the plating presents black.
Described vacuum plating black thin film adopts the method for medium frequency magnetron sputtering ion-plating deposition titanium carbide to realize that selected target is the titanium target of purity 99.99%.
Metallic article is put into vacuum drying oven, close fire door, open vavuum pump and find time, be evacuated to 3.0 * 10
-2Handkerchief, feeding argon gas adjustment vacuum is 2.0 handkerchiefs, and bias voltage is 600 volts, and dutycycle 50% is carried out plasma bombardment and is cleaned activation, and the time is 10 minutes.
Adjust argon flow amount, making vacuum is 4.0 * 10
-1Handkerchief, feed reacting gas acetylene, the initial flow of acetylene gas is 20 standard ml/min, open the titanium target power supply, power is 13kW, and bias voltage is 200V, dutycycle is 40%, adopt incremental manner progressively to increase the acetylene flow, the final flow of acetylene is 100 standard ml/min, and the time is 20 minutes.Close the titanium target, close bias voltage, stop to feed argon gas and acetylene, cool off and come out of the stove after 10 minutes, can obtain black, promptly obtain the base material of first kind of color coating.
2) pattern is as required electroplated protection printing ink (Jia, Shenzhen City virtue sufacing Co., Ltd) to the part of above-mentioned black matrixes by the serigraphy color separation, and corresponding pattern part is protected.
3) base material with above-mentioned processing immerses in the decoating liquid well known in the art, and described moving back crossed liquid as long as can strip and fall titanium carbide, make do not protect partly take off titanium carbide coating, and clean.
4) vacuum plating that base material is different from the step 1) color is handled, and makes the metal surface of not protection part present second kind of color coating, and second kind of color coating is titanium nitride.
Base material is put into stove, close fire door, open vavuum pump and find time, be evacuated to 5.0 * 10
-3Handkerchief feeds argon gas, and making vacuum is 3.0 * 10
-1Handkerchief feeds reacting gas nitrogen, and flow is 60 standard ml/min, opens the titanium target power supply, and power is 16kW, and bias voltage is 150V, and dutycycle is 30%, and the time is 25 minutes.Close the titanium target, close bias voltage, stop to feed argon gas and nitrogen, cool off and come out of the stove after 10 minutes, can make not protection part present yellow.
5) wash the protection printing ink of protected part surface, substrate surface forms the overlay coating with black and yellow two kinds of different colours thus.
As can be seen, the resulting product sequence of embodiments of the invention is very simple from the foregoing description and Comparative Examples, and coating process is simple, and just can reach the effect of two kinds of different colours by plated film.Than the method that obtains bicolor basal plate in the prior art by twice quality; not only technology is loaded down with trivial details; and Comparative Examples 1 when secondary film coating in order to protect the performance of last rete; can not adopt ion bombardment activating surface; cause the adhesion of two retes and base material relatively poor, the wearability of rete is also relatively poor than the wearability of embodiment rete simultaneously.Comparatively speaking, the product technology of gained of the present invention is simple, and color combination is abundant, and beautiful in colour, performance is more stable.
Performance test
1, chromatic value is measured:
Adopt the colourity of SP60 series integrating sphere type spectrophotometer test products, obtain L, a, b data.Wherein, L is a luminance component, also can be described as brightness.A, b are chromatic component.
2, wearability test:
Use the RCA paper tape wear resistant instrument of model, have surface that color decorates till expose matrix material, the number of turns that the record rubber wheel rotates in that friction under 175 gram forces is above-mentioned as F350008.
3, adhesion is measured
On the plated film on Coating Materials surface, draw 100 1 millimeter * 1 millimeter square lattice with drawing the lattice device, the model of producing with Minnesota Mining and Manufacturing Company is 600 smooth being bonded on these grids of adhesive tape, do not stay a space, fast this adhesive tape is vertically uncovered, whether the rete of observing cut edge has comes off then.Testing standard is that the demoulding amount is 5B between 0-5%, is 4B between 5-10%, is 3B between 10-20%, is 2B between 20-30%, is 1B between 30-50%, is being 0B more than 50%.
The resulting Coating Materials of embodiment 1-8 is tested according to the method described above, and the results are shown in Table 2 for gained.
Table 2
From the test result of table 2 as can be seen, substrate product according to the present invention is by the combination of different metal and different oxides, can obtain the double-colored combination of decorations of more different colours, lucuriant in design, the adhesion of wearability, rete and base material all increases simultaneously, can be widely used in the decoration of electronic product.
Claims (13)
1, a kind of bicolor basal plate, comprise base material and cover rete on the base material, the district of protrusion and non-protruding district are arranged on the described base material, described rete is at least a skim, the thicknesses of layers in described protrusion district makes to protrude to distinguish with non-protruding district with the thicknesses of layers difference in non-protruding district and presents different colors, and the described protrusion that covers is distinguished identical with the film material that covers non-protruding district.
2, the described bicolor basal plate of a kind of claim 1, the thickness that protrude than non-protruding district in described protrusion district is 0.1-1mm.
3, the described bicolor basal plate of a kind of claim 1, described rete is a skim, described base material is an extinction material.
4, the described bicolor basal plate of a kind of claim 1, described rete is at least two tunics, the refractive index difference of the material of adjacent two tunics.
5, the described bicolor basal plate of a kind of claim 4, described rete is two tunics, this two tunic is a kind of in metal level and metal oxide layer, metal level and the nonmetal oxide layer.
6, the described bicolor basal plate of a kind of claim 5, described metal are a kind of in titanium, aluminium, silicon, chromium, the stainless steel, and described metal oxide is a kind of in titanium dioxide, the alundum (Al, and nonmetal oxide is a silica.
7, the described bicolor basal plate of a kind of claim 1, described base material is plastics or metal.
8, a kind of preparation method of bicolor basal plate, adopt a kind of processing method in chemical etching, punching press, the die cast to handle to base material, substrate surface is formed protrude district and non-protruding district, carry out sputter process at least one time to containing the substrate surface that protrudes district and non-protruding district, sputter process makes the thicknesses of layers that protrudes the district different with the thicknesses of layers in non-protruding district, the thicknesses of layers that protrusion is distinguished makes to protrude to distinguish with non-protruding district with the thicknesses of layers difference in non-protruding district and presents different colors, and the described protrusion that covers is distinguished identical with the film material that covers non-protruding district.
9, the preparation method of the described bicolor basal plate of a kind of claim 8, the thickness that protrude than non-protruding district in described protrusion district is 0.1-1mm.
10, the preparation method of the described bicolor basal plate of a kind of claim 8, described rete is a skim, described base material is an extinction material.
11, the preparation method of the described bicolor basal plate of a kind of claim 8, described rete is at least two tunics, the refractive index difference of the material of adjacent two tunics.
12, the preparation method of the described bicolor basal plate of a kind of claim 11, described rete is two tunics, this two tunic is a kind of in metal level and metal oxide layer, metal level and the nonmetal oxide layer.
13, the preparation method of the described bicolor basal plate of a kind of claim 12, described metal is a kind of in titanium, aluminium, silicon, chromium, the stainless steel, and described metal oxide is a kind of in titanium dioxide, the alundum (Al, and nonmetal oxide is a silica.
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| CN102922938A (en) * | 2012-09-21 | 2013-02-13 | 赵赫 | Manufacturing method of plate painting with a convex pattern |
| CN102922938B (en) * | 2012-09-21 | 2014-12-17 | 赵赫 | Manufacturing method of plate painting with a convex pattern |
| CN110944468A (en) * | 2018-09-21 | 2020-03-31 | 联想(北京)有限公司 | Processing method, shell and electronic equipment |
| CN110996573A (en) * | 2019-12-11 | 2020-04-10 | 维沃移动通信有限公司 | Housing processing method, housing, and electronic device |
| CN111791024A (en) * | 2020-06-01 | 2020-10-20 | 肇庆宏旺金属实业有限公司 | Method for processing common sand super-black steel stainless steel plate |
| CN111549315A (en) * | 2020-06-23 | 2020-08-18 | 中建材蚌埠玻璃工业设计研究院有限公司 | Rapid prefabrication method for multiple colors of single-layer structure colored glass |
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