CN101651084B - Electrostatic chuck supply current sampling device, method and plasma device - Google Patents
Electrostatic chuck supply current sampling device, method and plasma device Download PDFInfo
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- CN101651084B CN101651084B CN2008101181865A CN200810118186A CN101651084B CN 101651084 B CN101651084 B CN 101651084B CN 2008101181865 A CN2008101181865 A CN 2008101181865A CN 200810118186 A CN200810118186 A CN 200810118186A CN 101651084 B CN101651084 B CN 101651084B
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Abstract
The invention discloses an electrostatic chuck supply current sampling device, a method and a plasma device. The sampling device comprises a sampling resistance connected in series with the output end of an electrostatic chuck power supply, wherein both ends of the sampling resistance are connected with resistance dividers respectively; the other end of each resistance divider is earthed; and the dividing point of each resistance divider is provided with a voltage acquisition device. By measuring a voltage of each dividing point, a voltage between both ends of the sampling resistance is calculated so as to calculate the current in the sampling resistance, namely the output current of the electrostatic chuck power supply. The dividing points have lower voltage and lower requirements on the voltage acquisition device, thereby ensuring low cost and high reliability of the entire device.
Description
Technical field
The present invention relates to a kind of plasma technique, relate in particular to a kind of electrostatic chuck supply current sampling device and method and plasma device.
Background technology
Plasma etching technology is widely used in the production process of semiconductor device.In etching process, substrate is placed on the electrostatic chuck, and the electrostatic attraction effect between the DC electrode of dependence and chuck is adsorbed on chuck surface.The static here is the high direct voltage static that is produced by electrostatic chuck supply.
In plasma etch process, in order to guarantee the reliable of substrate absorption, need the size of monitoring electrostatic chuck supply output current, so that whether the work of monitoring electrostatic chuck supply is normal.Because the output voltage of chuck power supply is several kilovolts high pressure normally, the sampling difficulty of electrostatic chuck supply output current is bigger.
As shown in Figure 1, detection method of the prior art is the resistance R 3 of output polyphone at electrostatic chuck supply, current signal is converted to voltage signal, amplify by a high withstand voltage isolation operational amplifier then, the input and the output ground that isolate amplifier isolate, output can directly be exported to monitoring equipment to the voltage signal after collection and the amplification, then, is calculated the size of electrostatic chuck supply output current by checkout equipment.
There is following shortcoming at least in above-mentioned prior art:
The cost height of high withstand voltage isolated amplifier, and withstand voltage numerical value is limited, causes the reliability of current monitoring relatively poor.
Summary of the invention
The purpose of this invention is to provide a kind of cost is low, reliability is high electrostatic chuck supply current sampling device and method and plasma device.
The objective of the invention is to be achieved through the following technical solutions:
Electrostatic chuck supply current sampling device of the present invention, comprise the sampling resistor that is series at described electrostatic chuck supply output, the two ends of described sampling resistor are connected with resistance respectively and divide the resistance device, described resistance divides the other end ground connection of resistance device, and described resistance divides the branch resistance point of resistance device to be provided with voltage collecting device.
The method that above-mentioned electrostatic chuck supply current sampling device of the present invention is gathered electrostatic chuck supply current comprises step:
At first, the resistance of gathering described sampling resistor two ends respectively divides the voltage to earth of the branch resistance point of resistance device, and calculates described two resistance respectively according to the voltage to earth of being gathered and divide electric current in the resistance device;
Then, divide the electric current in the resistance device to calculate the voltage that described two resistance divide resistance device two ends respectively according to described two resistance, other voltage to earth is divided at promptly described sampling resistor two ends;
Afterwards, divide other voltage to earth to calculate voltage between the described sampling resistor two ends, and then calculate the electric current in the described sampling resistor, the i.e. output current of described electrostatic chuck supply according to described sampling resistor two ends.
Plasma device of the present invention comprises electrostatic chuck and electrostatic chuck supply, and the output of described electrostatic chuck supply is connected with above-mentioned electrostatic chuck supply current sampling device.
As seen from the above technical solution provided by the invention, electrostatic chuck supply current sampling device of the present invention and method and plasma device.Because being connected with resistance respectively, the two ends of sampling resistor divide the resistance device, resistance divides the other end ground connection of resistance device, resistance divides the branch resistance point of resistance device to be provided with voltage collecting device, can calculate the voltage between the sampling resistor two ends, and then calculate the electric current in the sampling resistor by measuring the voltage that divides the resistance point, it is the output current of electrostatic chuck supply, divide the voltage of resistance point lower, lower to the requirement of voltage collecting device, make the cost of whole device low, reliability is high.
Description of drawings
Fig. 1 is the circuit theory diagrams of electrostatic chuck supply current sampling device of the prior art;
Fig. 2 is the circuit theory diagrams of electrostatic chuck supply current sampling device of the present invention.
Embodiment
Electrostatic chuck supply current sampling device of the present invention, its preferable embodiment as shown in Figure 2, output at electrostatic chuck supply is in series with sampling resistor R3, and sampling resistor R3 can be series on the positive pole of output of electrostatic chuck supply and also can be connected on the negative pole.
The two ends of sampling resistor R3 are connected with resistance respectively and divide resistance device R1, R2, the end of resistance branch resistance device R1, R2 is connected with the end points of sampling resistor R3, other end ground connection, resistance divides the branch resistance point of resistance device R1, R2 to be provided with voltage collecting device, as isolating operational amplifier or other voltage collecting device etc.
It promptly is a tap at resistance minute resistance device R1, R2 middle part that resistance divides the branch resistance point of resistance device R1, R2, and the resistance to earth of this point is less than the resistance at resistance minute resistance device R1, R2 two ends, can select different branch resistance ratios as required for use.Can select for use branch resistance that resistance divides the resistance device than more than or equal to 10, the branch resistance point that promptly divides resistance device R1, R2 is less than or equal to 1/10 of minute resistance of resistance device R1, R2 to the resistance of its earth terminal, also can select for use other bigger branch to hinder to compare etc.When dividing resistance bigger, can make the voltage to earth of branch resistance point lower, be convenient to detect, and lower to the requirement of voltage collecting device.
The resistance of resistance branch resistance device R1, R2 can be much larger than the resistance of sampling resistor R3.Dividing the resistance of resistance device R1, R2 as resistance is 1000～100000 times of resistance of sampling resistor R3, or bigger etc.Like this, resistance be can reduce and resistance device R1, R2 divided influence power supply.
Plasma device of the present invention, its preferable embodiment be, comprises electrostatic chuck, and electrostatic chuck is located in the reaction chamber.Electrostatic chuck is connected with electrostatic chuck supply, and the output of electrostatic chuck supply is connected with above-mentioned electrostatic chuck supply current sampling device.
The method that above-mentioned electrostatic chuck supply current sampling device of the present invention is gathered electrostatic chuck supply current, its preferable embodiment is to comprise step:
At first, the resistance of gathering sampling resistor R3 two ends respectively divides voltage to earth U3, the U4 of the branch resistance point of resistance device R1, R2, because resistance divides the resistance of resistance device R1, R2 and divides resistance than being known, therefore can calculate two resistance respectively and divide electric current I 1, the I2 that hinders among device R1, the R2 according to voltage to earth U3, the U4 of the branch resistance point of being gathered.
Then, divide electric current I 1, the I2 that hinders among device R1, the R2, can calculate two resistance respectively and divide resistance device R1, the voltage U 1 at R2 two ends, U2, be the sampling resistor two ends and divide other voltage to earth according to two resistance;
Afterwards, divide other voltage to earth U1, U2 to calculate voltage U 1-U2 between the sampling resistor R3 two ends according to sampling resistor R3 two ends, and then can calculate the electric current I 3 among the sampling resistor R3, the i.e. output current of electrostatic chuck supply.
Concrete computational process can be by the following derivation of equation:
By formula: U1=I1R1; U2=I2R2; U1-U2=I3R3 can draw:
I3=(I1R1-I2R2)/R3, in the formula: R1, R2, R3 are known, then can calculate I3 by I1 and I2.And I1 and I2 can divide the branch of resistance device R1, R2 to hinder the voltage U 3 of point, U4 and minute resistance than calculating by resistance, and then I3 can calculate.
To minute voltage U 3, the U4 of resistance point, because resistance divides the branch resistance of resistance device R1, R2 than higher, therefore divide voltage U 3, the U4 of resistance point not high, adopt common isolation operational amplifier or other voltage collecting device just can detect and be transferred to monitoring device, checkout gear can calculate the output current of electrostatic chuck supply according to default program.
The present invention adopts the resistance of high withstand voltage high score ratio to divide resistance device R1, R2 and sampling resistor R3 tower to build resistor network, has solved the problem of the output current sampling difficulty of crossing high power supply voltage, can improve the voltage range of monitoring, has reduced cost and reliability height.
Among the present invention, R1 and R2 are much larger than R3, and be very little to the influence of power supply.In concrete the application, be not limited to above-mentioned resistor network, also can wait and reduce the magnitude of voltage that sample devices directly touches by device network.
The above; only for the preferable embodiment of the present invention, but protection scope of the present invention is not limited thereto, and anyly is familiar with those skilled in the art in the technical scope that the present invention discloses; the variation that can expect easily or replacement all should be encompassed within protection scope of the present invention.
Claims (7)
1. electrostatic chuck supply current sampling device, comprise the sampling resistor that is series at described electrostatic chuck supply output, it is characterized in that, the two ends of described sampling resistor are connected with resistance respectively and divide the resistance device, described resistance divides the other end ground connection of resistance device, and described resistance divides the branch resistance point of resistance device to be provided with voltage collecting device;
It is 1000～100000 times of resistance of described sampling resistor that described resistance divides the resistance of resistance device;
The branch resistance that described resistance divides the resistance device is than more than or equal to 10, and the branch resistance point of promptly described branch resistance device is less than or equal to 1/10 of the resistance that hindered device in described minute to the resistance of its earth terminal.
2. electrostatic chuck supply current sampling device according to claim 1 is characterized in that described sampling resistor is series at the negative or positive electrode of the power output end of described electrostatic chuck.
3. electrostatic chuck supply current sampling device according to claim 1 is characterized in that, described voltage collecting device is for isolating operational amplifier.
4. the method that each described electrostatic chuck supply current sampling device of claim 1 to 3 is gathered electrostatic chuck supply current is characterized in that, comprises step:
At first, the resistance of gathering described sampling resistor two ends respectively divides the voltage to earth of the branch resistance point of resistance device, and calculates described two resistance respectively according to the voltage to earth of being gathered and divide electric current in the resistance device;
Then, divide the electric current in the resistance device to calculate the voltage that described two resistance divide resistance device two ends respectively according to described two resistance, other voltage to earth is divided at promptly described sampling resistor two ends;
Afterwards, divide other voltage to earth to calculate voltage between the described sampling resistor two ends, and then calculate the electric current in the described sampling resistor, the i.e. output current of described electrostatic chuck supply according to described sampling resistor two ends.
5. the method for collection electrostatic chuck supply current according to claim 4, it is characterized in that, the resistance at the described sampling resistor two ends of being gathered divides the voltage to earth of the branch resistance point of resistance device to input to checkout gear, and described checkout gear calculates the output current of described electrostatic chuck supply according to default program.
6. a plasma device comprises electrostatic chuck and electrostatic chuck supply, it is characterized in that, the output of described electrostatic chuck supply is connected with each described electrostatic chuck supply current sampling device of claim 1 to 3.
7. plasma device according to claim 6 is characterized in that, comprises reaction chamber, and described electrostatic chuck is located in the described reaction chamber.
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| CN2008101181865A CN101651084B (en) | 2008-08-13 | 2008-08-13 | Electrostatic chuck supply current sampling device, method and plasma device |
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| CN2008101181865A CN101651084B (en) | 2008-08-13 | 2008-08-13 | Electrostatic chuck supply current sampling device, method and plasma device |
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| CN101651084B true CN101651084B (en) | 2011-08-17 |
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| CN104749413A (en) * | 2013-12-31 | 2015-07-01 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Current detection device and current detection method of electrostatic chuck power supply |
| CN104991107A (en) * | 2015-07-31 | 2015-10-21 | 苏州华电电气股份有限公司 | Measurement device of power grid primary current and method thereof |
| CN104991106A (en) * | 2015-07-31 | 2015-10-21 | 苏州华电电气股份有限公司 | Measurement method of power grid primary current and device thereof |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5325261A (en) * | 1991-05-17 | 1994-06-28 | Unisearch Limited | Electrostatic chuck with improved release |
| CN1244924A (en) * | 1997-12-02 | 2000-02-16 | 株式会社爱德万测试 | Method of measuring current while applying a voltage and apparatus therefor |
-
2008
- 2008-08-13 CN CN2008101181865A patent/CN101651084B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5325261A (en) * | 1991-05-17 | 1994-06-28 | Unisearch Limited | Electrostatic chuck with improved release |
| CN1244924A (en) * | 1997-12-02 | 2000-02-16 | 株式会社爱德万测试 | Method of measuring current while applying a voltage and apparatus therefor |
Non-Patent Citations (1)
| Title |
|---|
| JP特开2008-47564A 2008.02.28 |
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Address after: 100176 Beijing economic and Technological Development Zone, Wenchang Road, No. 8, No. Patentee after: Beijing North China microelectronics equipment Co Ltd Address before: 100016, building 2, block M5, No. 1 East Jiuxianqiao Road, Beijing, Chaoyang District Patentee before: Beifang Microelectronic Base Equipment Proces Research Center Co., Ltd., Beijing |