CN101630031B - Optical film - Google Patents
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- CN101630031B CN101630031B CN200910160566XA CN200910160566A CN101630031B CN 101630031 B CN101630031 B CN 101630031B CN 200910160566X A CN200910160566X A CN 200910160566XA CN 200910160566 A CN200910160566 A CN 200910160566A CN 101630031 B CN101630031 B CN 101630031B
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Abstract
The invention provides an optical film comprising a base material and a microstructure layer, wherein the base material comprises a first optical surface and a second optical surface, and the microstructure layer is positioned on the first optical surface of the base material; the microstructure layer comprises a plurality of first light regulating structures and a plurality of second light regulating structures, the first light regulating structures are selecting from free prism column structures, cone structures, solid angle structures, orange peel block structures and a group formed by combining the structures; the second light regulating structures are selecting from free arc-shaped column structures, lens structures, capsule structures, and a group formed by combining the structures; and the height of at least a part of the second light regulating structures is larger than the height of the first light regulating structures. The optical film can avoid the injury of the microstructure layer and combine light concentration effect and can effectively reduce an optical interference phenomenon.
Description
Technical field
This case is dividing an application of Chinese patent application 200710188768.6.The present invention system refers to a kind of condensing film that is applied to LCD especially about a kind of blooming.
Background technology
The known backlight liquid crystal display module that is used for mainly utilizes diffuser plate, diffusion barrier and condensing film to reach the purpose of even light and light harvesting.Diffuser plate, diffusion barrier major function are for providing the LCD uniform surface light source.The condensing film industry is practised and is called brightness enhancement film (Brightness Enhancement Film) or prismatic lens (prismfilm), the condensing film major function be by the refraction with inner full-reflection with ray-collecting at random, and be concentrated to positive visual angle (On-axis) direction of degree approximately ± 35, to improve the briliancy of LCD.General condensing film commonly used is to utilize the linear prism column structure of regularly arranged or irregular alignment to reach spotlight effect.
Known condensing film is as shown in Figure 1 (as No. the 96/23649th, PCT patent and United States Patent (USP) the 5th, 626, No. 800), a plurality of prism structures 2 that it comprises a base material 1 and is positioned at base material 1 top, described prism structure is parallel each other, wherein each prism structure system is made of two inclined surfaces, and this two inclined surface forms peak 3 in the prism roof intersection, and intersects formation paddy 4 with another inclined surface of adjacent prisms in the prism bottom separately.
For further integrating light harvesting and diffusion, as shown in Figure 2, United States Patent (USP) the 6th, 280, disclose a kind of condensing film 20 for No. 063, it comprises a base material 22, be positioned at lip-deep another lip-deep irregular diffusion material 24 that has the linear column structure 26 of arc chord angle and be positioned at base material 22 of base material 22 to reach light harvesting and even light purpose.
The known refracted ray that condensing film produced with regularly arranged column structure easily with from the reflection of other diaphragm in the display or refracted ray or with other reflection or the refracted ray generation optical interference phenomenon of this condensing film itself, cause occurring in appearance moire or Newton ring.The TaiWan, China patent discloses a kind of shaped form optical modulation assembly for M291542 number, in the hope of reducing the optical interference phenomenon and reaching light harvesting simultaneously and even light purpose.Shown in Fig. 3 (a) and Fig. 3 (b), this shaped form optical modulation assembly system comprises a base material 31 and shaped form microstructure 33, base material 31 has first optical surface 311 and second optical surface 313, and shaped form microstructure 33 is arranged at first optical surface 311, and it has diffusion part 331 and light collecting portion 333.Fig. 3 (b) is the shaped form optical modulation assembly vertical view of Fig. 3 (a), and shown in Fig. 3 (b), diffusion part 331 extends with the curve that light collecting portion 333 is continuous bend, can avoid the optical interference phenomenon by this.
When the prism structure of known condensing film contacts with panel or other diaphragm, easily produce scratch, influence its optical property.The method of industry solution at present is mainly utilizes protectiveness diffusion barrier (or being called diffusion barrier) to prevent that condensing film and panel or other diaphragm from producing vibration and causing mutual damage when carrying.Cause the scratch except that utilizing the protectiveness diffusion barrier to prevent that condensing film from contacting with panel, before assembling, also need attach the damage of diaphragm to avoid condensing film during storing and/or transporting, may cause.Use protectiveness diffusion barrier and diaphragm, improve required cost all relatively.Above-mentioned United States Patent (USP) the 6th, 280, though contact the scratch that is produced between the prism structure that No. 063 linear column structure of disclosed arc can reduce condensing film and other diaphragm or the panel, increase wearing quality, but because the spotlight effect of arc column structure is not so good as the prism column structure, the spotlight effect that therefore contains the condensing film of arc column structure contains the prism structure than known techniques, and the person is low.Though the TaiWan, China patent discloses for M291542 number a kind of by containing the arc column structure (promptly, diffusion part) and the prism column structure (promptly, light collecting portion) to reach the optical modulation assembly of light harvesting and even light purpose simultaneously, only, as mentioned above, because of easily contacting with other diaphragm or panel, its prism column structure produces scratch, so wearing quality is also not good.
In view of this, the invention provides a kind of blooming to improve above-mentioned shortcoming, it can avoid being in contact with one another the scratch that is caused between blooming and other blooming or panel, and then can save and use the cost of going up diffusion barrier or attaching diaphragm.
Summary of the invention
Fundamental purpose of the present invention is that a kind of blooming is provided, it comprises the microstructured layers that a base material and with first optical surface and second optical surface is positioned at first optical surface of this base material, this microstructured layers comprises a plurality of being selected from by the prism column structure, cone-shaped structure, cube corner structures, first light modulation structure of the group that orange petal shape block structure and combination thereof are formed and a plurality of being selected from by the arc column structure, lentoid, second light modulation structure of the group that capsule shape structure and combination thereof are formed, wherein the height of second light modulation structure of at least one part is greater than the height of all first light modulation structures.
Description of drawings
Fig. 1 is the synoptic diagram of known condensing film.
Fig. 2 is the synoptic diagram of known condensing film.
Fig. 3 (a) and Fig. 3 (b) are the side view and the vertical view of known optical modulation assembly.
Fig. 4 (a) is the synoptic diagram of the present invention's first light modulation structure embodiment to Fig. 4 (d).
Fig. 5 (a) is the synoptic diagram of the present invention's second light modulation structure embodiment to Fig. 5 (c).
Fig. 6 (a) is the synoptic diagram of a better embodiment of blooming of the present invention.
Fig. 6 (b) is the synoptic diagram of another better embodiment of blooming of the present invention.
Fig. 7 (a) one has the synoptic diagram (vertical view) of the microstructured layers of the prism column structure that is not parallel to each other.
Fig. 7 (b) is the further embodiment of the blooming of figure (6a).
Fig. 8 is the synoptic diagram of an embodiment of light modulation structure of the present invention.
Fig. 9 is the synoptic diagram of another embodiment of blooming of the present invention.
Figure 10 is sweep electron microscope (SEM) striograph of embodiment 1 blooming microstructured layers.
Figure 11 is sweep electron microscope (SEM) striograph of embodiment 2 blooming microstructured layers.
Embodiment
The employed base material of blooming of the present invention can be any the technical field of the invention and has and know the known person of the knowledgeable, for example glass or plastics usually.Above-mentioned plastic basis material there is no particular restriction, and it is such as but not limited to vibrin (polyester resin), as polyethylene terephthalate (polyethyleneterephthalate, PET); Polyacrylate resin (polyacrylate resin), as polymethylmethacrylate (polymethyl methacrylate, PMMA); Polyolefin resin (polyolefin resin) is as tygon (PE) or polypropylene (PP); Poly-cyclic olefin resins (polycycloolefin resin); Polyimide resin (polyimide resin); Polycarbonate resin (polycarbonate resin); Polyurethane resin (polyurethane resin); Triafol T (triacetate cellulose, TAC); Or its potpourri.Be preferably vibrin or polyacrylate resin.The thickness of base material depends on the demand of the optical articles of wishing to get usually, and it is preferable between about 50 microns (μ m) are to about 300 microns.
Base material of the present invention has first optical surface and second optical surface, wherein has a microstructured layers on first optical surface.Microstructured layers of the present invention can be made of the resin of any refractive index greater than air refraction.Generally speaking, refractive index is high more, and effect is good more.Blooming of the present invention has at least 1.50 refractive index, and preferable system is from 1.50 to 1.7.Be persond having ordinary knowledge in the technical field of the present invention institute well known in order to the resin that forms this microstructured layers, for example, thermosetting resin or ultraviolet hardening resin are preferably ultraviolet hardening resin.Can be in order to the monomer that constitutes above-mentioned ultraviolet hardening resin such as but not limited to acrylic ester monomer.The kind of aforesaid propylene esters of gallic acid monomer is preferably acrylate or methacrylate such as but not limited to acrylate, methacrylate, amido formate acrylic acid (urethane acrylate), polyester acrylate (polyester acrylate), epoxy acrylate (epoxy acrylate) or its mixing.In addition, aforesaid propylene esters of gallic acid monomer can have one or more functional group, and preferable have a multiple functional radical.
The example that is applicable to acrylic ester monomer of the present invention for example is selected from and comprises (methyl) acrylate, tripropylene glycol two (methyl) acrylate (tripropylene glycol di (meth) acrylate), 1,4-butylene glycol two (methyl) acrylate (1,4-butanediol di (meth) acrylate), 1,6-hexanediol two (methyl) acrylate (1,6-hexanediol di (meth) acrylate), polyglycol two (methyl) acrylate (polyethyleneglycol di (meth) acrylate), allylation two (methyl) cyclohexyl acrylate (allylated cyclohexyl di (meth) acrylate), two (methyl) acrylic acid chlorinated isocyanurates (isocyanurate di (meth) acrylate), 2-phenoxy group ethyl (methyl) acrylate (2-phenoxyl ethyl (meth) acrylate), ethoxylated trimethylolpropane three (methyl) acrylate (ethoxylated trimethylol propane tri (meth) acrylate), propoxylated glycerol three (methyl) acrylate (propoxylated glycerol tri (meth) acrylate), trimethylolpropane tris (methyl) acrylate (trimethylol propane tri (meth) acrylate), 2-(right-cumenyl-phenoxy group)-ethyl propylene acid esters (Cumyl Phenoxyl Ethyl Acrylate, the group that CPEA) and composition thereof is formed.
The example of commercial acrylate class monomer comprises: produced by Sartomer company, commodity are by name
Or
The person; Produced by Eternal company, commodity are called 624-
Or
The person; And by UCB. S.A.'s production, commodity are called Ebecryl
Ebecryl
Ebecryl
Or Ebecryl
Person etc.
The resin of above-mentioned formation microstructured layers can optionally add any known adjuvant, for example light trigger, crosslinking chemical, inorganic particles, levelling agent, defoamer or antistatic agent etc., its kind is a persond having ordinary knowledge in the technical field of the present invention institute well known.
Can be used in antistatic agent of the present invention and be persond having ordinary knowledge in the technical field of the present invention institute well known, it is such as but not limited to ethoxy fatty acid glyceride class, quaternary ammonium compound compound, fatty amine analog derivative, epoxy resin (as polyethylene oxide), siloxane (siloxane) or other alcohol derivatives (as poly-ethanol ester or polyglycol ether) etc.Resin in microstructured layers optionally adds antistatic agent, can make prepared blooming have anlistatig effect, and then improves the operation yield.
Can be used in light trigger of the present invention, be after rayed, can produce free radical, and see through the transmission initiated polymerization person of free radical.Be applicable to that light trigger of the present invention is a persond having ordinary knowledge in the technical field of the present invention institute well known; it is such as but not limited to benzophenone (benzophenone); diphenylhydroxyethanone (benzoin); 2-hydroxy-2-methyl-1-phenyl third-1-ketone (2-hydroxy-2-methyl-1-phenyl-propan-1-one); 2; 2-dimethoxy-1; 2-diphenyl second-1-ketone (2; 2-dimethoxy-1; 2-diphenylethan-1-one); 1-hydroxycyclohexylphenylketone (1-hydroxy cyclohexyl phenyl ketone); 2; 4; 6-trimethylbenzoyl diphenyl phosphine oxide (2; 4; or its potpourri 6-trimethylbenzoyl diphenyl phosphine oxide).Preferable light trigger is benzophenone or 1-hydroxycyclohexylphenylketone.
For promoting the hardness of microstructure, can in resin, add inorganic particles.Can be used in inorganic particles of the present invention is persond having ordinary knowledge in the technical field of the present invention institute well known, it is preferably titania, silicon dioxide, zinc paste or its potpourri such as but not limited to zinc paste, silicon dioxide, strontium titanates, zirconia, aluminium oxide, titania, calcium sulphate, barium sulphate, lime carbonate or its potpourri.Above-mentioned inorganic particles have about 0.01 micron to about 100 microns particle size.
Also can be if necessary in the granule proliferation of any appropriate amount of interpolation in the resin that forms microstructured layers of the present invention, with further reinforcement optics diffusion effect.The granule proliferation that is applicable to microstructured layers of the present invention there is no particular restriction, it is persond having ordinary knowledge in the technical field of the present invention institute well known, can be organic granular, for example acrylate resin, methacrylate resin, styrene resin, amido formate resin, silicone resin or its potpourri are preferably acrylate resin, silicone resin or its potpourri; Or inorganic particle, for example zinc paste, silicon dioxide, titania, zirconia, aluminium oxide, zinc sulphide, barium sulphate or its potpourri; Or the two combination.Preferable particle is an organic granular.The shape of above-mentioned granule proliferation there is no particular restriction, for example can be sphere, rhombus etc., and its particle size is preferable between 1 micron to 30 microns.According to the present invention, granule proliferation is the granule proliferation of about 0.1 weight portion of per 100 parts by weight resin composition solids to about 10 weight portions with respect to the amount of resinous principle solid in the microstructured layers.
Microstructured layers of the present invention comprises a plurality of first light modulation structure and a plurality of second light modulation structures that are selected from the group that is made up of arc column structure, lentoid, capsule shape structure and combination thereof that are selected from the group that is made up of prism column structure, cone-shaped structure, cube corner structures, orange petal shape block structure and combination thereof, and wherein the height of second light modulation structure of at least one part is greater than the height of all first light modulation structures.Fig. 4 is the synoptic diagram of the present invention's first light modulation structure, and wherein Fig. 4 (a), 4 (b), 4 (c) and 4 (d) are respectively prism column structure, cone-shaped structure, cube corner structures, reach the orange petal shape block structure.Fig. 5 is the synoptic diagram of the present invention's second light modulation structure, and wherein Fig. 5 (a) is respectively arc column structure, lentoid and capsule shape structure to 5 (c).First light modulation structure is less because of the drift angle radius-of-curvature, thus have preferable optically focused characteristic, however its drift angle produces damage because of colliding or contacting easily; Second light modulation structure is then bigger because of the drift angle radius-of-curvature, has the light diffusion property, even light effect can be provided and wearing quality is preferable and.Therefore; blooming of the present invention is by the height of at least one part second light modulation structure in the microstructured layers feature greater than the height of all first light modulation structures; can effectively reduce the chance that first light modulation structure contacts with other diaphragm or base material; thereby can improve the wearing quality of blooming; and can take into account optically focused and even light effect by the first preferable light modulation structure of use spotlight effect, and can reduce diaphragm and use.
" second light modulation structure of at least one part " means two or more at least second light modulation structures in this article, is preferably 20% to 100% second light modulation structure, is more preferred from 40% to 60% second light modulation structure.Yet the needs in the visual practical application and the demand of optical property are adjusted, and use second light modulation structure of any appropriate amount directly to contact with other diaphragm or panel to avoid first light modulation structure.Below cooperate appended graphicly now with specific embodiment, optical thin film of the present invention is described in detail in detail, only non-in order to limit the scope of the invention.Modification and change that any personage who is familiar with this skill can reach easily are included in this case instructions disclosure.
Fig. 6 (a) is the synoptic diagram of a better embodiment of blooming of the present invention, and wherein first light modulation structure is that the prism column structure 601 and second light modulation structure are lentoid 602.The said lens structure is preferably semicircle lens, and the height of each lentoid (that is, its radius of circle) each other can be identical or different, is preferably identically, and its height size system is between the 2-30 micron.In the better embodiment of Fig. 6 (a), because the height of at least a portion lentoid is greater than the height of prism column structure, therefore can effectively avoid the wedge angle of prism column structure to contact and cause damage, thereby can increase the wearing quality of blooming with other blooming or panel.In addition, this better embodiment can and reduce the moire phenomenon with the light homogenize owing to have lentoid; And, also can provide required spotlight effect simultaneously because of having the prism column structure.
Fig. 6 (b) is the synoptic diagram of another better embodiment of blooming of the present invention.Shown in Fig. 6 (b), blooming of the present invention comprises base material 60 and microstructured layers 62, and this base material 60 has first optical surface 61 and second optical surface 63.First optical surface 61 of base material 60 has microstructured layers 62, this microstructured layers 62 comprise a plurality of prism column structures 621 as first light modulation structure and a plurality of arc column structure 622 as second light modulation structure, wherein the height of the arc column structure 622 of at least one part is greater than the height of prism column structure 621.By arc column shape structure 622 and the difference design of prism column structure 621 on height, can avoid the wedge angle of prism column structure 621 to contact and cause damage, thereby can increase the wearing quality of blooming with other blooming or panel.Spotlight effect because of prism column structure 621 is better than arc column structure 622 simultaneously, therefore can take into account the function of wear-resisting and optically focused.
When first light modulation structure comprises prism column structure and/or second light modulation structure and comprises the arc column structure, plural at least column structure is not parallel to each other each other, reduce the optical interference phenomenon by this.The above-mentioned column structure that is not parallel to each other can be the prism column structure that is not parallel to each other, the arc column structure that is not parallel to each other, prism column structure that is not parallel to each other and arc column structure or its combination.Above-mentioned uneven column structure can be the form that has intersected or do not intersected in microstructured layers.Fig. 7 (a) one has the synoptic diagram (vertical view) of the microstructured layers of the prism column structure that is not parallel to each other.As shown in Figure 7, the microstructured layers of the blooming of the present invention column structure 73 that can comprise the column structure that is not parallel to each other (for example: the not parallel column structure 71 of Xiang Jiaoing, the not parallel column structure 72 that do not intersect) and be parallel to each other.
Fig. 7 (b) is the further embodiment of the blooming of figure (6a), in this embodiment, first light modulation structure is that the prism column structure 601 and second light modulation structure are lentoid 602, wherein the height of at least a portion lentoid is greater than the height of prism column structure, and is not parallel to each other each other more than at least two in the wherein said prism column structure.This better embodiment can further reduce the optical interference phenomenon owing to have the prism column structure that is not parallel to each other on the microstructured layers.
According to another better embodiment of the present invention, blooming of the present invention comprises the microstructured layers that a base material and with first optical surface and second optical surface is positioned at first optical surface of this base material.This microstructured layers comprise a plurality of prism column structures as first light modulation structure and a plurality of arc column structure as second light modulation structure, wherein the height of the arc column structure of at least one part is greater than the height of all prism column structures, and wherein is not parallel to each other each other more than at least two in first light modulation structure and second light modulation structure.According to this better embodiment, blooming of the present invention is not only avoided the damage that causes because of contacting between microstructured layers and other blooming or the panel and is provided outside the good spotlight effect; Owing to have the light modulation structure that is not parallel to each other on the microstructured layers, can further reduce the optical interference phenomenon simultaneously.
Be example hereinafter, further specify the geometric propertieses such as height, width, drift angle angle and radius-of-curvature of the present invention's first light modulation structure and second light modulation structure with Fig. 6 (b).Only, notice: hereinafter can be used for first and second light modulation structure of the present invention and improvement thereof applicable to any, be not limited only to prism column structure shown in Fig. 6 (b) and arc column shape structure about the definition of geometric propertieses such as height, width, drift angle angle and radius-of-curvature.In addition, be not that all first light modulation structure and the radius-of-curvature and the drift angle of second light modulation structure all can record.For example, the radius-of-curvature of orange petal shape block structure and drift angle promptly can't define and measure easily.
According to the present invention, the height of light modulation structure means the top of this light modulation structure and the distance of base material first optical surface (referring to Fig. 6 (b), label is 631).In microstructured layers the height of second light modulation structure of at least one part must restrictive condition greater than the height of all first light modulation structures outside, the height of first light modulation structure of the present invention and second light modulation structure there is no particular restriction.The height of each first light modulation structure or second light modulation structure each other can be identical or inequality, is the scope between 5 μ m to 100 μ m, preferable scope between 10 μ m to 50 μ m, better scope between 20 μ m to 40 μ m.If first light modulation structure is the prism column structure and/or second light modulation structure when being the arc column structure, can be optionally by making same column structure have different height in the different length position, to reduce the optical interference phenomenon.Fig. 8 is one and has the synoptic diagram of height along the microstructured layers of the prism column structure of extension position variation.Preferably, have in the column structure an of nominal height (or average height) one, have at least the height system of part position to change along extension position at random in this column structure, its amplitude of variation is at least 5 percent of this nominal height, preferable its amplitude of variation be this nominal height 50 5 percent to percent between.
According to the present invention, the width of light modulation structure means the distance (referring to Fig. 6 (b), label is 632) between these light modulation shape structure two paddy.The width of first light modulation structure of the present invention and second light modulation structure there is no particular restriction, and is persond having ordinary knowledge in the technical field of the present invention institute well known.The width of each first light modulation structure or second light modulation structure each other also can be identical or inequality, is the scope between 1 μ m to 100 μ m.The selection of preferable width need be decided on the pel spacing of LCD, should select to help to reduce the width of moire interference.In addition, if first light modulation structure is that the prism column structure and/or second light modulation structure are when being the arc column structure, same column structure can have different width in the different length position, and when this column structure and another column structure intersect, the width of this column structure in the intersection can be 0 μ m.
According to the present invention, the radius-of-curvature at the first light modulation structure top (not being shown in Fig. 6 (b)) is less than 2 μ m; The radius-of-curvature at each first light modulation structure top each other can be identical or inequality.According to the present invention, the radius-of-curvature at the second light modulation structure top (referring to Fig. 6 (b), label is R person) is between 2 μ m to 50 μ m, and is preferable between 5 μ m to 35 μ m, better between 10 μ m to 25 μ m; The radius-of-curvature at each second light modulation structure top each other can be identical or inequality.
According to the present invention, the drift angle angle of light modulation structure (referring to Fig. 6 (b), label is 633) each other can be identical or inequality, and it is between 40 ° to 120 °, and is preferable between 85 ° to 95 °.
Under notion of the present invention, anyly should be Reasonable Protection category of the present invention by improvement first light modulation structure or the prepared blooming of second light modulation structure.Speech for example can on column structure further processing, makes it have fine structure as prism column, arc column, coniform, three-dimensional horn shape, lensing and capsule shape.In the present invention, the arrangement mode that can change first light modulation structure and second light modulation structure makes it be regularly arranged or (for example is random alignment, with several prism column structures several arc column structures of arranging in pairs or groups is the cycle, prepares this microstructured layers in regularly arranged mode).In addition, the column structure of microstructured layers of the present invention can be linearity (linear), broken line type (zigzag) or shaped form (serpentine).
Blooming of the present invention is preferable can further go up shape one anti-scratch layer in second optical surface (that is, incidence surface) of base material, is influenced the optical property of diaphragm by scratch to avoid it.Above-mentioned anti-scratch layer can be level and smooth shape or non-level and smooth shape.Above-mentioned anti-scratch layer formation method there is no particular restriction, is to be familiar with this operator to know, and it is processed such as but not limited to screen painting, spraying, embossing or forms coating etc. in substrate surface.The preferable scope of thickness of above-mentioned anti-scratch layer between 1～50 μ m, better scope between 1～10 μ m.
The resin that is applicable to the anti-scratch layer of preparation the present invention there is no particular restriction, it is persond having ordinary knowledge in the technical field of the present invention institute well known, the group that its optional free ultraviolet hardening resin, thermoset resin (thermalsetting resin), thermoplastic resin (thermal plastic resin) and composition thereof are formed, and optionally handle to form anti-scratch layer of the present invention with heat curing, ultraviolet curing or heating and two (dual curing) modes of solidifying of ultraviolet ray.
According to an embodiment of the present invention, used resin system comprises the resin that a ultraviolet hardening resin and is selected from the group that is made up of thermoset resin, thermoplastic resin and composition thereof, and handle by heating and two (dual curing) modes of solidifying of ultraviolet ray and to form anti-scratch layer, formed anti-scratch have remarkable thermotolerance and minimum volumetric shrinkage (shrinkage).
Can be used for ultraviolet hardening resin of the present invention system and at least aly have one or more functional group's acrylic monomer or the monomer of acrylic ester monomer is constituted, be preferably acrylic ester monomer by comprising.Can be used for the acrylic ester monomer among the present invention, such as but not limited to, methacrylate monomers, acrylate monomer, amido formate acrylate (urethane acrylate) monomer, polyester acrylate (polyester acrylate) monomer or epoxy acrylate (epoxy acrylate) monomer etc. are preferably acrylate monomer.
Say it for example, the acrylic ester monomer that is applicable to ultraviolet hardening resin of the present invention can be selected from and comprise methyl methacrylate, butyl acrylate, 2-phenoxyethyl acrylate (2-phenoxy ethylacrylate), ethoxyquin 2-phenoxyethyl acrylate (ethoxylated 2-phenoxy ethylacrylate), 2-(2-ethoxy ethoxy) ethyl propylene acid esters (2-(2-ethoxyethoxy) ethylacrylate), ring trimethylolpropane dimethoxym ethane acrylate (cyclic trimethylolpropaneformal acrylate), β-propyloic acrylic ester (β-carboxyethyl acrylate), lauric acid methacrylate (lauryl methacrylate), isooctyl acrylate (isooctyl acrylate), stearic acid methacrylate (stearyl methacrylate), isodecyl acrylate (isodecylacrylate), isobornyl methacrylate (isoborny methacrylate), benzyl acrylate (benzyl acrylate), 3-hydroxyl-2,2-neopentanoic acid 3-hydroxyl-2,2-dimethyl propyl ester diacrylate (hydroxypivalyl hydroxypivalate diacrylate), ethoxyquin 1, (ethoxylated 1 for the 6-hexanediyl ester, 6-hexanediol diacrylate), propylene glycol diacrylate (dipropylene glycol diacrylate), tristane dimethanol diacrylate (Tricyclodecane dimethanol diacrylate), ethoxyquin propylene glycol diacrylate (ethoxylated dipropylene glycol diacrylate), neopentylglycol diacrylate (neopentyl glycol diacrylate), the third oxidation neopentylglycol diacrylate (propoxylatedneopentyl glycol diacrylate), ethoxyquin bisphenol a dimethacrylate (ethoxylatedbisphenol-A dimethacrylate), the 2-methyl isophthalic acid, ammediol diacrylate (2-methyl-1,3-propanediol diacrylate), ethoxyquin-2-methyl isophthalic acid, ammediol diacrylate (ethoxylated 2-methyl-1,3-propanediol diacrylate), 2-butyl-2-ethyl-1, ammediol diacrylate (2-butyl-2-ethyl-1,3-propanediol diacrylate), ethylene glycol dimethacrylate (ethylene glycol dimethacrylate), diethylene glycol dimethylacrylate (diethylene glycol dimethacrylate), 2-hydroxyethyl methacrylate phosphate (2-hydroxyethyl metharcrylate phosphate), three (2-hydroxyethyl) isocyanuric acid triacrylate (Tris (2-hydroxy ethyl) isocyanurate triacrylate), pentaerythritol triacrylate (pentaerythritol triacrylate), ethoxyquin trimethylolpropane triacrylate (ethoxylated trimethylolpropane triacrylate), the third oxidation trimethylolpropane triacrylate (propoxylated trimethylolpropane triacrylate), trimethylol-propane trimethacrylate (trimethylolpropane trimethacrylate), tetramethylol methane tetraacrylate (pentaerythritol tetraacrylate), ethoxyquin tetramethylol methane tetraacrylate (ethoxylatedpentaerythritol tetraacrylate), two-trimethylolpropane tetra-acrylate (ditrimethylolpropane tetraacrylate), the third oxidation tetramethylol methane tetraacrylate (propoxylated pentaerythritol tetraacrylate), dipentaerythritol acrylate (dipentaerythritol hexaacrylate), hydroxy-ethyl acrylate (hydroxyethyl acrylate, HEA), methacrylic acid-2-hydroxy methacrylate (2-hydroxyethyl methacrylate, HEMA), tripropylene glycol dimethylacrylate (tripropylene glycol dimethacrylate), 1,4-butanediol dimethylacrylate (1,4-butanediol dimethacrylate), 1,6-hexanediol dimethacrylate (1,6-hexanediol dimethacrylate), allylation dimethacrylate cyclohexyl (allylated cyclohexyl dimethacrylate), dimethacrylate chlorinated isocyanurates (isocyanurate dimethacrylate), ethoxylated trimethylolpropane trimethyl acrylic ester (ethoxylated trimethylol propane trimethacrylate), propoxylated glycerol trimethyl acrylic ester (propoxylated glycerol trimethacrylate), trimethylol-propane trimethacrylate (trimethylol propane trimethacrylate), the group that three (propylene oxygen ethyl) chlorinated isocyanurates (tris (acryloxyethyl) isocyanurate) and composition thereof is formed.Preferably, this acrylic ester monomer comprises dipentaerythritol acrylate, trimethylolpropane triacrylate and pentaerythritol triacrylate.
Ultraviolet hardening resin used in the present invention can optionally comprise molecular weight between about 10
3To about 10
4Oligomer, this type of oligomerization system is had the knack of the personage institute well known of this technology, acrylic ester oligomer for example, it is such as but not limited to the amido formate acrylate, as fatty amine carbamate acrylate (aliphatic urethane acrylate), fatty amine carbamate six acrylate (aliphaticurethane hexaacrylate), aromatic amine carbamate six acrylate (aromatic urethanehexaacrylate); Epoxy acrylate is as bisphenol-A epoxy diacrylate (bisphenol-A epoxydiacrylate), phenolic aldehyde epoxy acrylate (novolac epoxy acrylate); Polyester acrylate is as polyester diacrylate (polyester diacrylate); Or pure acrylic acid ester.
Can be used for thermoset resin of the present invention, its mean molecular weight is generally between about 10
4To about 2 * 10
6Between, preferable between about 2 * 10
4To about 3 * 10
5Between, better for about 4 * 10
4To about 10
5Between.Thermoset resin of the present invention is optional from containing hydroxyl (OH) and/or the carboxyl (group that vibrin COOH), epoxy resin, polymethacrylate resin, polyacrylate resin, polyamide, fluoroplast, polyimide resin, polyurethane resin, alkyd resin (alkyd resin) and composition thereof are formed, be preferably contain hydroxyl (OH) and/or carboxyl (polymethacrylate resin COOH) or polyacrylate resin are as the polymethylacrylic acid polyol resin.
Can be used for the optional autopolyester resin of thermoplastic resin of the present invention; Polymethacrylate resin is as polymethylmethacrylate (PMMA); And the group that forms of they's potpourri.
In order to strengthen the light diffusion effect, can further in resin, add the granule proliferation of any appropriate amount.Above-mentioned granule proliferation kind system as this paper before definition, its particle size is preferable between 1～15 micron.Above-mentioned granule proliferation is the granule proliferation of about 0.1 weight portion of per 100 parts by weight resin composition solids to about 10 weight portions with respect to the amount of resinous principle solid in the anti-scratch layer.
Fig. 9 is a better embodiment synoptic diagram of blooming of the present invention.As shown in Figure 9, blooming of the present invention comprises base material 90, microstructured layers 92 and anti-scratch layer 94, and this base material 90 has first optical surface 91 and second optical surface 93.First optical surface of base material 90 has microstructured layers 92, and this microstructured layers 92 comprises prism column structure 921 and arc column structure 922.Second optical surface of base material has anti-scratch layer 94, and this anti-scratch layer 94 is formed by the resin 942 that comprises granule proliferation 941.
Anti-scratch layer of the present invention can optionally comprise any persond having ordinary knowledge in the technical field of the present invention's known additives, and it is such as but not limited to antistatic agent, light trigger, leveling agent, wetting agent, spreading agent or inorganic particles.The example that is applicable to antistatic agent of the present invention, light trigger and inorganic particles is as described earlier in this article.
Can use any known method to prepare the microstructured layers and the anti-scratch layer of blooming of the present invention, and the sequencing of preparation microstructured layers and anti-scratch layer there is no particular restriction.
The microstructured layers of blooming of the present invention can be according to persond having ordinary knowledge in the technical field of the present invention's any way manufacturing known, for example, and can be via the method manufacturing that comprises following steps:
Resin and proper additive are mixed to form a colloidal state coating composition;
On a cylindrical blank (or claiming cylinder), move with direction on the cylinder that rotates with jewelling tool with the cylinder traversed by, make jewelling tool on cylinder, carve out specific groove by the translational speed of control jewelling tool and/or the rotating speed of cylinder;
This colloidal state coating composition is coated on the base material, utilized step (b) cylinder of finishing of carving to carry out roller embossing, hot transfer printing or hot extrusion mode then and make this coating form a patterned surface; And
To this coating irradiation energy ray or heating or both and with so that this coating solidify.
Preferably, in the above-mentioned steps (b), the translational speed of jewelling tool can be controlled, for example, fixed frequency or random frequency can be used by electric signal; When using random frequency, repeat step (b), can obtain many uneven grooves, also can produce crossing groove.Preferably, the coating curing schedule system of step (d) is undertaken by the irradiation energy ray produces photopolymerization reaction, this energy-ray means the light source of certain limit wavelength, and for example it can be ultraviolet light, infrared light, visible light or hot line (radiation or radiation) etc., is preferably ultraviolet light.Exposure intensity can be from 1 to 500 millijoule/square centimeter (mJ/cm
2), preferable system from 50 to 300mJ/cm
2
The anti-scratch layer of blooming of the present invention can be according to persond having ordinary knowledge in the technical field of the present invention's any way manufacturing known, for example: will comprise particle, resin and optionally the coating composition of adjuvant be coated on and form coating on the base material, again to this coating irradiation energy ray or heating or both and with so that this coating solidify.
The prepared blooming of the present invention, its microstructured layers and anti-scratch layer have and are lower than 10
13The surface impedance of Ω/ is preferably 10
8～10
12Ω/, and measure the mist degree (Hz) have between 5%～70% scope according to JIS K7136 standard method.
Following examples systems is used for that the invention will be further described, and is only non-in order to limit the scope of the invention.Modification and change that any personage who is familiar with this skill can reach easily are included in the scope of this case instructions disclosure and appended claim.
The preparation of preparation example 1 resin formula A
Get one 250 milliliters vial, with solvent: 40 gram toluene add in the vials.Under high-speed stirred, add acrylic ester monomer in regular turn: 10 gram dipentaerythritol acrylates, 2 gram trimethylolpropane triacrylates, 14 gram pentaerythritol triacrylates, oligomer: 28 gram fatty amine carbamates, six acrylate [Etercure 6145-100, Eternal company], light trigger: 6 gram 1-hydroxycyclohexylphenylketones, last infusion becomes the resin formula A of solid about 60% and about 100 grams of gross weight.
Preparation example 2 mould rollers engraving
Accurate roller surface is electroplated no electrolytic nickel or oxygen-free copper, with CNC fine turning lathe and monocrystalline diamond cutter, below the lathe rotating speed 500rpm, 0.015 millimeter of amount of feeding higher limit, write Numerical Control (NC) program according to the pattern of setting, the microstructure groove of being desired in the roller surface processing and preparing is as the used mould of following process processing procedure.
The preparation of microstructured layers
With 60 grams
(the 2-phenoxyethyl acrylate is sold by Eternal company) and 60 gram 624-
(epoxy acrylate is sold by Eternal company) mixes, and adds 5 grams then
In 50 ℃ and rotating speed 1,000rpm stirs down BP, forms a colloidal state coating composition as light trigger (benzophenone (benzophenone), two key chemical industry provide).
This colloidal state coating composition is coated on polyphenyl dioctyl phthalate second diester (PET) base material (
Produced by TORAY company), to form coating, utilize the roller of the tool microstructure groove of preparation example 2 gained on coating, to form a patterned surface then in the embossing mode.Then, under normal temperature, with energy-ray (the UV lamp of 200～400nm, intensity: 150～300mJ/cm
2, the time: 2～15 seconds) and shine this coating, the curing that makes.Figure 10 is the striograph that the microstructured layers of embodiment 1 blooming is produced through sweep electron microscope (SEM).
As described earlier in this article, can be on the base material with respect to microstructured layers another surface go up the anti-scratch layer of preparation, the sequencing of preparation microstructured layers and anti-scratch layer there is no particular restriction.Details are as follows for the preparation method of anti-scratch layer:
The preparation of anti-scratch layer
Get one 250 milliliters vial, with solvent: 27 gram toluene, 13.5 gram butanone add in the vials.The mean grain size that adds 0.5 gram under high-speed stirred in regular turn is the acryl particulate [SSX-108 of 8 μ m, Japan's ponding changes into company], 40 restrain example 1 prepared resin formula A fully, thermoset resin: 20 gram acrylate resin [Eterac 7365-S-30, Eternal company] (solid about 30%), 2 gram antistatic agent [GMB-36M-AS, Marubishi oil Chem.Co., Ltd] (solid about 20%), last infusion becomes solid about 30% and the about 100 gram coating of gross weight.With RDS paint daubs #3 coating is coated on the PET base material [U34 that thickness is 188 μ m, Toray company] on the surface, through 100 ℃ of dryings after 1 minute, again with UV exposure bench (Fusion UV, F600V, 600W/inch, H type lamp source) power is set at 100%, speed 15m/min, energy-ray 200mJ/cm
2, making coating thickness after being solidified is the anti-scratch layer of about 5 μ m.
The preparation of microstructured layers
Get acryl particulate [SSX-105, Japanese ponding changes into company] and 45 grams that 5 gram mean grain sizes are 5 μ m
[2-(right-cumenyl-phenoxy group)-ethyl propylene acid esters (Cumyl PhenoxylEthyl Acrylate (CPEA)) is sold by Eternal company] mixes, and gets the 20g said mixture then and restrains 60
(the 2-phenoxyethyl acrylate is sold by Eternal company) and 60 gram 624-
(epoxy acrylate is sold by Eternal company) mixes, and adds 5 grams then
In 50 ℃ and rotating speed 1,000rpm stirs down BP, forms a colloidal state coating composition as light trigger (benzophenone (benzophenone), two key chemical industry provide).
This colloidal state coating composition is coated on polyphenyl dioctyl phthalate second diester (PET) base material (
Produced by TORAY company), to form coating, utilize the roller of the tool microstructure groove of preparation example 2 gained on coating, to form a patterned surface then in the embossing mode.Then, under normal temperature, with energy-ray (the UV lamp of 200～400nm, intensity: 150～300mJ/cm
2, the time: 2～15 seconds) and shine this coating, the curing that makes.Figure 11 is the striograph that the microstructured layers of embodiment 2 bloomings is produced through sweep electron microscope (SEM).
The preparation of anti-scratch layer
With embodiment 1 described method, prepare anti-scratch layer in the opposite side of base material.
Comparative example 1
Commercially available condensing film BEFIII-M-3M company, its microstructure is the prism column structure.
Comparative example 2
Commercially available condensing film MP2-65-Jia Wei company, its microstructure is the prism column structure.
Comparative example 3
Commercially available condensing film CM-30-meets brightness company, and its microstructure is the prism column structure.
Comparative example 4
Commercially available condensing film PTR713-SHINWHA company, its microstructure is a lentoid.
The commercially available condensing film of blooming of the present invention and comparative example 1 to 4 is carried out following every attribute testing, and the gained result is shown in table 1 and 2.
Method of testing:
Briliancy method for measurement: the BM-that provides with TOPCON company
Instrument carries out briliancy to testing sample and increases test, and the gained result is as shown in table 1.
The test of transparent material brightness: utilize NDH 5000W haze meter [Japanese electric look company], according to JIS K7136 standard method, measure the mist degree (Hz) and the total light transmittance (Tt) of testing sample, the gained result is as shown in table 2.
Pencil hardness test: utilize pencil scratching tester [Elcometer 3086, SCRATCH BOY], (2H, 3H) with the pencil hardness on JISK-5400 method test testing sample microstructured layers surface, the gained result is as shown in table 2 with the Mitsubishi pencil.
Abrasion Resistance test: (area length and width 20mm * 20mm) goes up and pastes glutinous 3M BEF-III-10T diaphragm (the length and width 20mm * 20mm) that puts in 600 g weight platform to utilize linear abrasion wear test machine [TABER 5750], directly test the weight scratch resistance ability of testing sample microstructured layers with its water chestnut mirror microstructure layer, with test trip 2inch, the speed of 10 cycle/min is carried out 10 cycles scratch resistances test, shown in the following tabulation 2 of result.
Surface resistivity test: utilize teraohmmeter [East Asia TOADKK company, SM8220﹠amp; SME-8310,500V] measurement testing sample surface resistivity.Test environment is as follows: 23 ± 2 ℃, and 55 ± 5%RH, the gained result is as shown in table 2.
Table 1
| Numbering | The luminance |
| Embodiment | |
| 1 | 26.54 |
| Embodiment | |
| 2 | 21.54％ |
| Comparative example 4 | 11.32％ |
Table 2
| Mist degree Hz (%) | Total light transmittance Tt (%) | Pencil hardness (microstructured layers) | Abrasion Resistance test (microstructured layers) | Surface resistivity Ω/ (anti-scratch layer) | |
| Comparative example 1 | 89.38 | 9.51 | H | Scratch | 3.12×10 13 |
| Comparative example 2 | 90.85 | 11.66 | F | Serious scratch | 4.56×10 14 |
| Comparative example 3 | 91.40 | 14.10 | F | Serious scratch | 2.45×10 16 |
| Comparative example 4 | 87.72 | 60.21 | 3H | No scratch | 2.99×10 15 |
| |
83.91 | 50.69 | 3H | No scratch | 2.99×10 11 |
| |
74.24 | 61.88 | 3H | No scratch | 2.99×10 15 |
Blooming of the present invention as shown in Table 1 can provide good spotlight effect with respect to using lentiform known condensing film to have preferable luminance gain value; As shown in Table 2, blooming of the present invention has preferable hardness and weight scratch resistance ability with respect to the known condensing film that uses the prism column structure, can effectively avoid the damage of microstructured layers and then can save the cost that diffusion barrier and diaphragm are gone up in use.Blooming of the present invention not only can effectively be avoided the damage of microstructured layers, and can take into account spotlight effect simultaneously, therefore is applicable in the backlight module as a scratch resistance condensing film.
Claims (26)
1. blooming, it comprises a microstructured layers that has the base material of first optical surface and second optical surface and be positioned at first optical surface of this base material, this microstructured layers comprises a plurality of first light modulation structure and a plurality of second light modulation structures that are selected from the group that is made up of arc column structure, lentoid, capsule shape structure and combination thereof that are selected from the group that is made up of prism column structure, cone-shaped structure, cube corner structures, orange petal shape block structure and combination thereof, and the height of second light modulation structure of 20-60% is greater than the height of all first light modulation structures.
2. blooming as claimed in claim 1, the height of wherein said first light modulation structure or second light modulation structure is between the scope of 5 μ m to 100 μ m.
3. blooming as claimed in claim 1, second light modulation structure of wherein said 20-60% is two or more at least second light modulation structures.
4. blooming as claimed in claim 1, wherein said first light modulation structure are that prism column structure and described second light modulation structure are lentoid.
5. blooming as claimed in claim 4, wherein said prism column structure is not parallel to each other each other more than two at least.
6. blooming as claimed in claim 2, wherein said first light modulation structure are that prism column structure and described second light modulation structure are the arc column structure.
7. blooming as claimed in claim 6, wherein said prism column structure or arc column structure have a nominal height, and the height that has the part position in the described column structure at least is a random variation, and its amplitude of variation is at least 5 percent of this nominal height.
8. blooming as claimed in claim 7, wherein said amplitude of variation be described nominal height 50 5 percent to percent between.
9. blooming as claimed in claim 6, the drift angle of wherein said prism column structure is between 40 ° to 120 °.
10. blooming as claimed in claim 6, the radius-of-curvature at the top of wherein said prism column is less than 2 μ m.
11. blooming as claimed in claim 6, the radius-of-curvature at wherein said arc column top is between 2 μ m to 50 μ m.
12. blooming as claimed in claim 1, wherein said blooming further comprise the anti-scratch layer of second optical surface that is positioned at described base material.
13. blooming as claimed in claim 12, wherein said anti-scratch layer is made by the resin that is selected from the group that ultraviolet hardening resin, thermoset resin, thermoplastic resin and composition thereof formed.
14. blooming as claimed in claim 13, wherein said anti-scratch layer is made of the resin that comprises granule proliferation.
15. blooming as claimed in claim 14, wherein said granule proliferation has 1 micron to 15 microns particle size.
16. blooming as claimed in claim 14, wherein said granule proliferation are the inorganic particle that is selected from the organic granular of the group that is made up of acrylate resin, methacrylate resin, styrene resin, amido formate resin, silicone resin and composition thereof and/or is selected from the group that is made up of zinc paste, silicon dioxide, titania, zirconia, aluminium oxide, zinc sulphide, barium sulphate and composition thereof.
17. blooming as claimed in claim 14, wherein said granule proliferation is the granule proliferation of per 100 parts by weight resin composition solids, 0.1 weight portion to 10 weight portion with respect to the amount of resinous principle solid in the anti-scratch layer.
18. blooming as claimed in claim 13, wherein said ultraviolet hardening resin at least aly has one or more functional group's acrylic monomer or the monomer of acrylic ester monomer is constituted by comprising.
19. blooming as claimed in claim 18, wherein said acrylic ester monomer are selected from the group that is made up of methacrylate monomers, acrylate monomer, amido formate acrylate monomer, polyester acrylate monomer and epoxy acrylate monomer.
20. blooming as claimed in claim 18, wherein said ultraviolet hardening resin further comprises the acrylic ester oligomer.
21. blooming as claimed in claim 13, wherein said thermoset resin are selected from the group that is made up of the vibrin that contains hydroxyl and/or carboxyl, epoxy resin, polymethacrylate resin, polyamide, fluoroplast, polyimide resin, polyurethane resin, alkyd resin and composition thereof; And described thermoplastic resin is to be selected from the group that is made up of vibrin, polymethacrylate resin and they's potpourri.
22. blooming as claimed in claim 12, wherein said microstructured layers and/or described anti-scratch layer comprise the antistatic agent that is selected from the group that is made up of ethoxy fatty acid glyceride class, quaternary ammonium compound compound, fatty amine analog derivative, polyethylene oxide, siloxane and alcohol derivatives.
23. blooming as claimed in claim 12, the numerical value of the surface impedance impedance of wherein said microstructured layers and anti-scratch layer is lower than 10
13Ω/.
24. blooming as claimed in claim 1, wherein said microstructured layers comprises granule proliferation.
25. blooming as claimed in claim 24, wherein said granule proliferation are the inorganic particle that is selected from the organic granular of the group that is made up of acrylate resin, methacrylate resin, styrene resin, amido formate resin, silicone resin and composition thereof and/or is selected from the group that is made up of zinc paste, silicon dioxide, titania, zirconia, aluminium oxide, zinc sulphide, barium sulphate and composition thereof.
26. blooming as claimed in claim 24, wherein said granule proliferation has 1 micron to 30 microns particle size.
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|---|---|---|---|
| CN200910160566XA CN101630031B (en) | 2007-11-16 | 2007-11-16 | Optical film |
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|---|---|---|---|
| CN200910160566XA CN101630031B (en) | 2007-11-16 | 2007-11-16 | Optical film |
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| CN102445723A (en) * | 2011-12-21 | 2012-05-09 | 北京康得新复合材料股份有限公司 | Prism-structured brightness enhancement film with scratch-resistant characteristic |
| CN102445722A (en) * | 2011-12-21 | 2012-05-09 | 北京康得新复合材料股份有限公司 | Prism-structured brightness enhancement film with scratch-resistant characteristic |
| CN102455449A (en) * | 2011-12-21 | 2012-05-16 | 北京康得新复合材料股份有限公司 | Prism-structured brightness enhancement film with anti-scraping property |
| CN102419458A (en) * | 2011-12-21 | 2012-04-18 | 北京康得新复合材料股份有限公司 | Prism structural bright enhancement film with anti-scraping property |
| CN103744135B (en) * | 2014-01-22 | 2016-03-23 | 东莞轩朗实业有限公司 | A kind of brightness enhancement film of composite structure |
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|---|---|---|---|---|
| CN1902511A (en) * | 2003-12-31 | 2007-01-24 | 3M创新有限公司 | Scratch-resistant light directing films |
| CN2874533Y (en) * | 2006-03-23 | 2007-02-28 | 长兴化学工业股份有限公司 | Anti-scraping light focusing sheet |
| CN1932609A (en) * | 2005-09-16 | 2007-03-21 | 财团法人工业技术研究院 | Intensifying module and light source device |
| CN1996099A (en) * | 2005-12-31 | 2007-07-11 | 财团法人工业技术研究院 | Optical modulation assembly |
| CN101004461A (en) * | 2007-01-22 | 2007-07-25 | 长兴光学材料（苏州）有限公司 | Anti scraping thin film, and liquid crystal display |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1902511A (en) * | 2003-12-31 | 2007-01-24 | 3M创新有限公司 | Scratch-resistant light directing films |
| CN1932609A (en) * | 2005-09-16 | 2007-03-21 | 财团法人工业技术研究院 | Intensifying module and light source device |
| CN1996099A (en) * | 2005-12-31 | 2007-07-11 | 财团法人工业技术研究院 | Optical modulation assembly |
| CN2874533Y (en) * | 2006-03-23 | 2007-02-28 | 长兴化学工业股份有限公司 | Anti-scraping light focusing sheet |
| CN101004461A (en) * | 2007-01-22 | 2007-07-25 | 长兴光学材料（苏州）有限公司 | Anti scraping thin film, and liquid crystal display |
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