CN101587300A - A kind of preparation method of heat-sensitive CTP plate - Google Patents
A kind of preparation method of heat-sensitive CTP plate Download PDFInfo
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- CN101587300A CN101587300A CNA2009100259509A CN200910025950A CN101587300A CN 101587300 A CN101587300 A CN 101587300A CN A2009100259509 A CNA2009100259509 A CN A2009100259509A CN 200910025950 A CN200910025950 A CN 200910025950A CN 101587300 A CN101587300 A CN 101587300A
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Abstract
The invention discloses a kind of preparation method of heat-sensitive CTP plate, it may further comprise the steps: step 1, at first select substrate, and roughened is carried out on the surface of substrate; Step 2 is washed the substrate water behind the roughening, removes the electrolysis ash of substrate surface, carry out chemical etching by aqueous slkali at a certain temperature, lower the temperature after the chemical etching, carry out the first time with acid solution again and clean, carry out the second time at water at last and clean; Step 3 is carried out anodized to the substrate after cleaning for the second time; Step 4 will adopt aqueous solution to handle through the substrate of anodized, form heat-sensitive layer then on substrate; Step 5 scribbles the temperature-sensitive image and forms composition formation presentized printing plate on the heat-sensitive layer of substrate; Step 6 is carried out exposure image with presentized printing plate, scribbles developer at last on the presentized printing plate after the imaging and obtains heat-sensitive CTP plate.
Description
Technical field
The present invention relates to a kind of preparation method of heat-sensitive CTP plate.
Background technology
The Grains that is used to prepare lithographic common PS version does not have level, and influence the printing durability of printed panel, and the ink-water balance ability of PS version matrix, easy residual light-sensitive surface, the heat-sensitive CTP plate of this invention has on hydrophilic substrate and forms heat-sensitive layer. when the heat-sensitive layer of this CTP version is exposed, through developer the heat-sensitive layer that is exposed is developed then, remove exposed areas, expose the water-wetted surface of above-mentioned substrate.On the other hand, do not have exposed areas to be retained in the surface of substrate, form the image part that receives printing ink, obtain lithographic printed panel thus.In this printed panel, the pollution for the printing material that prevents to cause in non-image areas because of ink adhesion need make this non-image areas comparatively hydrophilic.Usually, contain the developer of alkali silicate so that this plate develops by use, the askiatic zone of this plate can be by hydrophiling to reduce described pollution.But, when using this developer that contains alkali silicate, following problem can appear: be easy to generate the solid precipitation, and can cause the askiatic zone so to leave color or film.
Summary of the invention
The invention provides a kind of preparation method of heat-sensitive CTP plate, it not only can increase level, compositeness, density and the water wettability of Grains, makes the printing durability of printed panel wait until very big raising; And the oxide film that can improve printed panel is careful and density good, and the hydrophilicity of matrix is greatly improved, and light-sensitive surface is residual to be reduced greatly.
The present invention has adopted following technical scheme: a kind of preparation method of heat-sensitive CTP plate, and it may further comprise the steps: step 1, at first select substrate, roughened is carried out on the surface of substrate; Step 2 is washed the substrate water behind the roughening, removes the electrolysis ash of substrate surface, carry out chemical etching by aqueous slkali at a certain temperature, lower the temperature after the chemical etching, carry out the first time with acid solution again and clean, carry out the second time at water at last and clean; Step 3 is carried out anodized to the substrate after cleaning for the second time; Step 4 will adopt aqueous solution to handle through the substrate of anodized, form heat-sensitive layer then on substrate; Step 5 scribbles the temperature-sensitive image and forms composition formation presentized printing plate on the heat-sensitive layer of substrate; Step 6 is carried out exposure image with presentized printing plate, scribbles developer at last on the presentized printing plate after the imaging and obtains heat-sensitive CTP plate.
Described substrate aluminium sheet or aluminium alloy plate.Roughened process in the step 1 is: substrate is put into hydrochloric acid or the nitric acid electrolyte that contains 0.1-50%, the aluminium ion that in electrolytic solution, contains 0.5wt%, be to carry out the three-phase electrolysis under 20-80 ℃ the condition in temperature, the reaction time is 1 second-120 seconds, and current density is 1-200A/d m
2The temperature of the chemical etching in the step 2 is 70 ℃, and aqueous slkali comprises NaOH and the 6wt% aluminium ion of 26wt%, and temperature is reduced to 30 ℃ after the chemical etching, and acid solution is to contain the sulfuric acid of 1wt% and the aluminium ion of 0.5wt%.The process of the anodized in the step 3 is: carry out electrolytic reaction at the surface of substrate formation anode oxide film thereby substrate is put into electrolyte by direct current.Described electrolyte is sulfuric acid, phosphoric acid, chromic acid, oxalic acid, sulfaminic acid, benzene sulfonic acid or their potpourri, electrolyte concentration be 1-50%Wt, electrolyte temperature at 10-40 ℃, galvanic current density is 0.5-60A/dm
2, galvanic voltage is 1-50V, the time of electrolytic reaction is 10 to 120 seconds, the amount of anode oxide film is preferably 0.5-20g/m
2Aqueous solution is the polymkeric substance that comprises acidic group and base in the step 4, the concentration range of aqueous solution is 0.01 to 20%Wt, and the pH value of aqueous solution is 0 to 12, and the method that aqueous solution is handled is for being immersed in the solution, the dipping temperature scope is 20-90 ℃, and dip time is 0.1 second-20 minutes.Temperature-sensitive image formation composition comprises that the positivity heat sensitive image forms composition and the negative thermo-sensitive image forms composition in the step 5, the positivity heat sensitive image forms composition and comprises the alkali-soluble polymer compound that has acidic-group on infrared absorbent and main chain and/or the side chain, infrared absorbent is wavelength effectively dyestuff or pigment between 750nm-1200nm, the negative thermo-sensitive image form composition comprise acid agent and with the crosslinking chemical of sour cross-linking reaction.Use radioactive ray, g-ray, i-ray, dark-UV line or high density energy Shu Jinhang irradiation in the step 6 in the exposure process, described radioactive ray are electron beam, X ray, ion beam or far infrared.The step 6 developer comprises at least a sugar that is selected from non-reducing sugar, at least a pH value is at 9.0 to 13.5 alkali, ealkaline buffer, surfactant, stabilizing agent, reductive agent, organic carboxyl acid and adjuvant, ealkaline buffer is sulfosalicylic acid or salicylic acid, surfactant is a negative ion, kation, nonionic or zwitterionic surfactant, stabilizing agent is the polyethylene glycol adducts or the tetraalkylammonium salt of sugar alcohol, reductive agent is a sulphite, the amount of organic carboxyl acid preferred 0.1 is to 10wt%, and adjuvant comprises antiseptic, colorant, thickening agent, defoamer and water softener.
The present invention has following beneficial effect: the present invention needs to carry out roughened in the process of making, can improve viscosity and printing durability, water wettability and soil resistance between photosensitive layer and the substrate like this, the depression hole that roughened produces has reduced the pollution in askiatic zone on the lithographic printed panel, and has improved printing durability.Adopt the three-phase electrolysis in the roughened, can increase level, compositeness, density and the water wettability of Grains like this, improve the printing durability of printed panel; The present invention adopts liquid to carry out anodized, the oxide film of the printed panel of producing like this is careful and density good, the hydrophilicity of matrix is greatly improved, prevented at askiatic zone residual color or residual film, light-sensitive surface is residual to be reduced greatly, has also improved the printing durability of product simultaneously; The present invention adds developer in manufacturing process, can make the solid resolution of precipitate like this, makes the askiatic zone not have the residual of color or film.The aqueous solution that the present invention adopts can suppress the formation of spot and mud in the developer, the sensitivity that improves heat-sensitive layer simultaneously.The present invention applies heat-sensitive layer and forms the CTP version on the aluminium substrate of handling with a kind of aqueous solution after the anodic oxidation, with the developer that does not contain silicate this CTP version of developing, when aqueous solution is handled described anodised substrate, the sealing that absorbed water of this anode oxide film, form heat conductivity and show lower space, can improve the sensitivity of the CTP version of heat-sensitive layer like this.
Embodiment
The invention provides a kind of preparation method of heat-sensitive CTP plate, it may further comprise the steps: step 1, at first select substrate, substrate aluminium sheet or aluminium alloy plate, the surface of substrate is carried out after the roughened producing the annular hole that diameter is 0.2 to 20 μ m or the dell of honeycomb sample at substrate surface, surface roughness (Ra=) after the roughening is preferably 0.2 to 0.65 μ m, the roughened process is: substrate is put into hydrochloric acid or the nitric acid electrolyte that contains 0.1-50%, the aluminium ion that contains 0.5wt% in the electrolyte, be to carry out the three-phase electrolysis under 20-80 ℃ the condition in temperature, reaction time is 1 second-120 seconds, and current density is 1-200A/d m
2Step 2, substrate water behind the roughening is washed, remove the electrolysis ash of substrate surface, carry out chemical etching by aqueous slkali at a certain temperature, aqueous slkali comprises NaOH and the 6wt% aluminium ion of 26wt%, and the temperature of chemical etching is 70 ℃, cool to 30 ℃ after the chemical etching, carry out the first time with acid solution again and clean, acid solution is to contain the sulfuric acid of 1wt% and the aluminium ion of 0.5wt%, carries out the second time at water at last and cleans; Step 3, substrate after cleaning is for the second time carried out anodized, the process of anodized is: carry out electrolytic reaction at the surface of substrate formation anode oxide film thereby substrate is put into electrolyte by direct current, electrolyte is sulfuric acid, phosphoric acid, chromic acid, oxalic acid, sulfaminic acid, benzene sulfonic acid or their potpourri, electrolyte concentration be 1-50%Wt, electrolyte temperature at 10-40 ℃, galvanic current density is 0.5-60A/d m
2, galvanic voltage is 1-50V, the time of electrolytic reaction is 10-120 second, the amount of anode oxide film is preferably 0.5-20g/m
2Step 4, to adopt aqueous solution to handle through the substrate of anodized, on substrate, form heat-sensitive layer then, aqueous solution is for comprising the polymkeric substance of acidic group and base (composite cation), and the concentration range of aqueous solution is 0.01 to 20%Wt, and the pH value of aqueous solution is 0 to 12, the method that aqueous solution is handled is for being immersed in the solution, the dipping temperature scope is 20-90 ℃, and dip time is 0.1 second-20 minutes, and the method for water treatment can also be coating, spraying, sputter or evaporation; Step 5; on the heat-sensitive layer of substrate, scribble the temperature-sensitive image and form composition formation presentized printing plate; the temperature-sensitive image forms composition and comprises that the positivity heat sensitive image forms composition and the negative thermo-sensitive image forms composition; the positivity heat sensitive image forms composition and comprises the alkali-soluble polymer compound that has acidic-group on infrared absorbent and main chain and/or the side chain; the alkali-soluble polymer compound will be selected from has phenolic group; at least two kinds of monomer polymerizations in the group that the polymerisable monomer of sulfamoyl and active imido grpup is formed and the polymkeric substance that obtains; or the polymkeric substance that is obtained by described at least two kinds of monomers and other polymerisable monomer copolymerization is preferential the use; infrared absorbent is wavelength effective dyestuff or pigment between 750nm-1200nm; infrared absorbent can directly use or can use after surface treatment without surface treatment; surface treatment method comprises the surface coated method with resin and wax; coating surface active agent method from the teeth outwards; the method that reactive materials is combined with surface of pigments; the negative thermo-sensitive image form composition comprise acid agent and with the crosslinking chemical of sour cross-linking reaction; when the image forming material is under the situation of negativity; can use acid agent in addition; acid agent is to produce the compound of acid when heating; acid agent can improve in the amount that is heated to the acid-producing cpd under 100 ℃ or the higher temperature; logical give birth to acid that this compound produces preferably PKa at the strong acid below 2 or 2; sulfonic acid for example; hydrochloric acid etc.; when planographic printing plate is the negativity type; can use crosslinking chemical to be used for carrying out cross-linking reaction in addition with acid; the present invention is suitable for the image forming layer with the planographic printing plate of alkaline developer processing; can optionally comprise multiple additives; in order to improve the photosensitivity of image formation layer; can add known adjuvant; cyclic acid anhydride for example; phenols; organic acid or sulfonyl compound etc.; in order to increase the Treatment Stability of development conditions; can add non-ionic surfactant and amphoteric surfactant; in the image formation layer of the present invention; can contain the printing agent; so that after by exposure, directly obtain visible image; and can contain dyestuff or pigment as the image colorant, they all have storage endurance and produce printed images clearly.As the image colorant, can use other dyestuff that replaces or combine with above-mentioned salify organic dyestuff. preferred dyestuff comprises the salify organic dyestuff, for example is oil-soluble dyes and basic-dyeable fibre.In addition, in the image formation layer of the present invention, can optionally add plastifier, so that improve the coating layer pliability.For example, can add the pyrolysis compound, make that the dissolubility of buck soluble polymeric compounds is lowered basically before pyrolysis.The such compound of preferred interpolation is because this compound can prevent that image area from dissolving into developer; Step 6, presentized printing plate is carried out exposure image, exposure can be adopted radioactive ray, the g-ray, the i-ray, deeply-UV line or high density energy Shu Jinhang irradiation, radioactive ray are electron beam, X ray, ion beam or far infrared, at last on the presentized printing plate after the imaging, scribble developer and obtain heat-sensitive CTP plate, developer comprises at least a sugar that is selected from non-reducing sugar, at least a pH value is at 9.0 to 13.5 alkali, ealkaline buffer, surfactant, stabilizing agent, reductive agent, organic carboxyl acid and adjuvant, ealkaline buffer is sulfosalicylic acid or salicylic acid, surfactant is a negative ion, kation, nonionic or zwitterionic surfactant, stabilizing agent is the polyethylene glycol adducts or the tetraalkylammonium salt of sugar alcohol, reductive agent is a sulphite, the amount of organic carboxyl acid preferred 0.1 is to 10wt%, and adjuvant comprises antiseptic, colorant, thickening agent, defoamer and water softener.
Claims (10)
1, a kind of preparation method of heat-sensitive CTP plate, it may further comprise the steps:
Step 1 is at first selected substrate, and roughened is carried out on the surface of substrate;
Step 2 is washed the substrate water behind the roughening, removes the electrolysis ash of substrate surface, carry out chemical etching by aqueous slkali at a certain temperature, lower the temperature after the chemical etching, carry out the first time with acid solution again and clean, carry out the second time at water at last and clean;
Step 3 is carried out anodized to the substrate after cleaning for the second time;
Step 4 will adopt aqueous solution to handle through the substrate of anodized, form heat-sensitive layer then on substrate;
Step 5 scribbles the temperature-sensitive image and forms composition formation presentized printing plate on the heat-sensitive layer of substrate;
Step 6 is carried out exposure image with presentized printing plate, scribbles developer at last on the presentized printing plate after the imaging and obtains heat-sensitive CTP plate.
2, the preparation method of heat-sensitive CTP plate according to claim 1 is characterized in that described substrate aluminium sheet or aluminium alloy plate.
3, the preparation method of heat-sensitive CTP plate according to claim 1, it is characterized in that the roughened process in the step 1 is: substrate is put into hydrochloric acid or the nitric acid electrolyte that contains 0.1-50%, the aluminium ion that in electrolytic solution, contains 0.5wt%, be to carry out the three-phase electrolysis under 20-80 ℃ the condition in temperature, reaction time is 1 second-120 seconds, and current density is 1-200A/d m
2
4, the preparation method of heat-sensitive CTP plate according to claim 1, the temperature that it is characterized in that the chemical etching in the step 2 is 70 ℃, aqueous slkali comprises NaOH and the 6wt% aluminium ion of 26wt%, temperature is reduced to 30 ℃ after the chemical etching, and acid solution is to contain the sulfuric acid of 1wt% and the aluminium ion of 0.5wt%.
5, the preparation method of heat-sensitive CTP plate according to claim 1 is characterized in that the process of the anodized in the step 3 is: carry out electrolytic reaction at the surface of substrate formation anode oxide film thereby substrate is put into electrolyte by direct current.
6, the preparation method of heat-sensitive CTP plate according to claim 5, it is characterized in that described electrolyte is sulfuric acid, phosphoric acid, chromic acid, oxalic acid, sulfaminic acid, benzene sulfonic acid or their potpourri, electrolyte concentration be 1-50%Wt, electrolyte temperature at 10-40 ℃, galvanic current density is 0.5-60A/d m
2, galvanic voltage is 1-50V, the time of electrolytic reaction is 10 to 120 seconds, the amount of anode oxide film is preferably 0.5-20g/m
2
7, the preparation method of heat-sensitive CTP plate according to claim 1, it is characterized in that aqueous solution is the polymkeric substance that comprises acidic group and base in the step 4, the concentration range of aqueous solution 0.01 to 20%Wt, the pH value of aqueous solution is 0 to 12, the method that aqueous solution is handled is for being immersed in the solution, the dipping temperature scope is 20-90 ℃, and dip time is 0.1 second-20 minutes.
8, the preparation method of heat-sensitive CTP plate according to claim 1, it is characterized in that temperature-sensitive image formation composition comprises that the positivity heat sensitive image forms composition and the negative thermo-sensitive image forms composition in the step 5, the positivity heat sensitive image forms composition and comprises the alkali-soluble polymer compound that has acidic-group on infrared absorbent and main chain and/or the side chain, infrared absorbent is wavelength effectively dyestuff or pigment between 750nm-1200nm, the negative thermo-sensitive image form composition comprise acid agent and with the crosslinking chemical of sour cross-linking reaction.
9, the preparation method of heat-sensitive CTP plate according to claim 1, it is characterized in that using in the exposure process in the step 6 radioactive ray, g-ray, i-ray, dark-UV line or high density energy Shu Jinhang irradiation, described radioactive ray are electron beam, X ray, ion beam or far infrared.
10, the preparation method of heat-sensitive CTP plate according to claim 1, it is characterized in that the step 6 developer comprises at least a sugar that is selected from non-reducing sugar, at least a pH value is at 9.0 to 13.5 alkali, ealkaline buffer, surfactant, stabilizing agent, reductive agent, organic carboxyl acid and adjuvant, ealkaline buffer is sulfosalicylic acid or salicylic acid, surfactant is a negative ion, kation, nonionic or zwitterionic surfactant, stabilizing agent is the polyethylene glycol adducts or the tetraalkylammonium salt of sugar alcohol, reductive agent is a sulphite, the amount of organic carboxyl acid preferred 0.1 is to 10wt%, and adjuvant comprises antiseptic, colorant, thickening agent, defoamer and water softener.
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102241181A (en) * | 2010-04-30 | 2011-11-16 | 富士胶片株式会社 | Lithographic printing plate support and presensitized plate |
| CN102312262A (en) * | 2011-08-22 | 2012-01-11 | 吴江市精工铝字制造厂 | Hard anodization method of mixed acid of copper aluminium alloy |
| CN102991176A (en) * | 2012-12-01 | 2013-03-27 | 刘华礼 | Method for fabricating coated light-sensitive thermosensitive CTP plate |
| CN103625145A (en) * | 2012-08-23 | 2014-03-12 | 温州市华彩印刷器材有限公司 | Treatment technology for thermosensitive positive CTP plate manufacturing substrate |
| CN103625146A (en) * | 2012-08-28 | 2014-03-12 | 温州市华彩印刷器材有限公司 | Plate-substrate graining process |
| CN104087998A (en) * | 2014-07-10 | 2014-10-08 | 江苏乐彩印刷材料有限公司 | Manufacturing method of UV (Ultraviolet)-resistant developing-free digital printing CTP (Computer-To-Print) plate |
| CN104928744A (en) * | 2015-07-13 | 2015-09-23 | 佛山市高明高盛铝业有限公司 | Electrolyte for oxidation treatment of heating plate |
| CN107490581A (en) * | 2017-08-01 | 2017-12-19 | 中铝瑞闽股份有限公司 | A kind of detection method of CTP version bases surface underworld defect |
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2009
- 2009-03-16 CN CNA2009100259509A patent/CN101587300A/en active Pending
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102241181A (en) * | 2010-04-30 | 2011-11-16 | 富士胶片株式会社 | Lithographic printing plate support and presensitized plate |
| CN102241181B (en) * | 2010-04-30 | 2014-07-23 | 富士胶片株式会社 | Lithographic printing plate support and presensitized plate |
| CN102312262A (en) * | 2011-08-22 | 2012-01-11 | 吴江市精工铝字制造厂 | Hard anodization method of mixed acid of copper aluminium alloy |
| CN102312262B (en) * | 2011-08-22 | 2013-10-09 | 吴江市精工铝字制造厂 | Hard anodization method of mixed acid of copper aluminium alloy |
| CN103625145A (en) * | 2012-08-23 | 2014-03-12 | 温州市华彩印刷器材有限公司 | Treatment technology for thermosensitive positive CTP plate manufacturing substrate |
| CN103625146A (en) * | 2012-08-28 | 2014-03-12 | 温州市华彩印刷器材有限公司 | Plate-substrate graining process |
| CN102991176A (en) * | 2012-12-01 | 2013-03-27 | 刘华礼 | Method for fabricating coated light-sensitive thermosensitive CTP plate |
| CN104087998A (en) * | 2014-07-10 | 2014-10-08 | 江苏乐彩印刷材料有限公司 | Manufacturing method of UV (Ultraviolet)-resistant developing-free digital printing CTP (Computer-To-Print) plate |
| CN104087998B (en) * | 2014-07-10 | 2017-04-12 | 江苏乐彩印刷材料有限公司 | Manufacturing method of UV (Ultraviolet)-resistant developing-free digital printing CTP (Computer-To-Print) plate |
| CN104928744A (en) * | 2015-07-13 | 2015-09-23 | 佛山市高明高盛铝业有限公司 | Electrolyte for oxidation treatment of heating plate |
| CN107490581A (en) * | 2017-08-01 | 2017-12-19 | 中铝瑞闽股份有限公司 | A kind of detection method of CTP version bases surface underworld defect |
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