CN101581866B - Line width compression device containing beam shaping and wavelength rotation tuning - Google Patents
Line width compression device containing beam shaping and wavelength rotation tuning Download PDFInfo
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- CN101581866B CN101581866B CN2009100521192A CN200910052119A CN101581866B CN 101581866 B CN101581866 B CN 101581866B CN 2009100521192 A CN2009100521192 A CN 2009100521192A CN 200910052119 A CN200910052119 A CN 200910052119A CN 101581866 B CN101581866 B CN 101581866B
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- 238000007493 shaping process Methods 0.000 title claims abstract description 39
- 230000006835 compression Effects 0.000 title claims abstract description 24
- 238000007906 compression Methods 0.000 title claims abstract description 24
- 238000007747 plating Methods 0.000 claims description 4
- 239000000919 ceramic Substances 0.000 claims description 2
- 240000007594 Oryza sativa Species 0.000 claims 1
- 235000007164 Oryza sativa Nutrition 0.000 claims 1
- 235000009566 rice Nutrition 0.000 claims 1
- 230000007246 mechanism Effects 0.000 abstract description 6
- 238000005516 engineering process Methods 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 241000931526 Acer campestre Species 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
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Abstract
A line width compression device containing beam shaping and wavelength rotation tuning is composed of a beam shaper, a prism beam expander and a diffraction grating. The long axis of a rectangle beam is split into sub beams in a plurality of directions by placing a prism on a light path, the deflecting sub beams are overlaid with the short axis of an original beam by a high reflective mirror, thusrealizing variation of length-width ratio of the beam and further reducing beam length requiring beam expansion and effectively reducing the grating length; the central wavelength tuning mechanism of a laser is realized by rotating the rotating floor of a fixed prism, a stepping motor rotating floor and a PZT nano rotating floor respectively realize rough tuning and precise tuning on two beam exp ansion prisms, and the incident angle of the beam and the grating is adjusted to realize rough tuning and precise tuning of the central wavelength of the laser. The invention can realize narrow line width laser output, the beam shaping can effectively reduce the size of the diffraction grating, the tuning of the central wavelength causes the structure to be compact and be easy for tuning, and the invention is applicable to multiple lasers, especially an excimer laser.
Description
Technical field
The present invention relates to the line width compression device of photoetching, particularly a kind of line width compression device that contains beam shaping and wavelength rotation tuning with excimer laser.
Background technology
Excimer laser can be used as the light source of integrated circuit (IC) etching, promptly gives wafer by the irradiation mask plate with its image projection.In order to reduce projecting lens, provide particularly necessary less than the narrow spectral line width light source of 1pm because of the aberration that diffraction produces.For the ArF excimer laser that freely turns round, the about 500pm of its spectral bandwidth.Thereby, as the photoetching light source, need compress significantly live width.
The Littrow structure that adopts prism and grating to form can be carried out the wavelength selection to light beam, thereby obtains narrow-linewidth laser output.In excimer laser, way commonly used is whole light beam directly to be expanded bundle and incides diffraction grating compress live width, referring to technology [US patent NO.5978409] formerly.Yet light beam needs the large scale diffraction grating to carry out wavelength and selects after prism beam-expanded device expands bundle.So not only increase the grating difficulty of processing, and increased device size and cost.Therefore, under the situation that does not influence original device live width compression effectiveness, be necessary to adopt beam shaping to reduce raster size.On the other hand, in the technology in the past, use the centre wavelength of leverage tuning laser light beam, this technical scheme complex structure is difficult to control, also can exert an influence to the stability of wavelength and bandwidth, referring to technology [US patentNO.2008/0151944] formerly, and it is convenient and easy that the turntable of fixed prism is implemented rotation tuning, and the attainable 0.1 μ rad rotation precision of present nanometer positioning system can satisfy the tuning requirement of narrow bandwidth optical maser wavelength.
Summary of the invention
The object of the present invention is to provide a kind of line width compression device that contains beam shaping and wavelength rotation tuning, reduce the raster size of line width compression device and realize narrow-linewidth laser output by beam shaping.
Technical solution of the present invention is as follows:
A kind of line width compression device that contains beam shaping and wavelength rotation tuning, its characteristics are that this device is made up of beam shaping, prism beam-expanded device and diffraction grating:
Described beam shaping has the rectangular apertures passage by one, first right angle prism and second right angle prism are formed, the relative both sides that also are distributed in described rectangular apertures passage abreast of a right angle face of described first right angle prism and second right angle prism, relative position at the string face of described first right angle prism and second right angle prism respectively is provided with one first high reflection mirror, be arranged on the top of described rectangular apertures passage two second catoptrons and described two first high reflection mirror counterpart fonts, make the light beam of this beam shaping of input, deviation does not take place in the beamlet through described rectangular apertures passage, through the beamlet of described first right angle prism and second right angle prism respectively to the string face deviation of prism separately, and the beamlet of this deviation behind first high reflective mirror and second high reflective mirror, lead deviation beamlet not the top and be parallel to this not deviation beamlet and will described three way light beams close bundle and export;
Described prism beam-expanded device is arranged in order by a plurality of right-angle prisms to be formed, this prism beam-expanded device be last-on ... on-following structure, the drift angle that is each right-angle prism makes progress, the drift angle of exclusive last right-angle prism is placed downwards, first right-angle prism is arranged on the stepper motor turntable, and described last right-angle prism is arranged on the PZT nanometer turntable;
Described diffraction grating is an echelle grating.
Described prism beam-expanded device is by three or four achromatic systems that right-angle prism is formed.
Described stepper motor turntable is made up of stepper motor driver and controller
Described PZT nanometer turntable is made up of piezoelectric ceramic actuator and controller.
The blazing angle of described diffraction grating is 71 °～82 °.
The string face plating anti-reflection film of described first right angle prism and second right angle prism.
A branch of rectangular light beam incides described beam shaping, the deviation beamlet is distributed in and a side of deviation parallel beam not, light beam after the shaping incides described prism beam-expanded device and carries out one dimension expansion bundle, light beam behind the expansion bundle incides described diffraction grating and carries out the wavelength selection, realizes that narrow-linewidth laser output also effectively reduces raster size; Respectively the rough rotation of first prism beam expander of described prism beam-expanded device is in harmonious proportion the precision of last prism beam expander and rotates by rotating described stepper motor turntable and PZT nanometer turntable, and then the light beam behind the realization expansion bundle is finally realized the coarse adjustment and the accurate adjustment of laser center wavelength to the coarse adjustment and the accurate adjustment of grating incident angle.
Excimer laser discharge cavity emitted light beams is the broadband rectangular light beam, directly it is expanded bundle and incides diffraction grating and carry out wavelength when selecting, and needs the grating of large-size, and process technology is difficult to realize the grating more than the long 600mm of monolithic.And prolong raster size by the grating splicing, little to the feasibility that the live width of excimer laser is compressed.
In order further to compress laser linewidth, need to improve the expansion bundle rate of beam expander, thereby need to prolong grating length.To the incident beam beam splitting, can reduce the size of required diffraction grating by beam shaping of the present invention effectively.
Rectangular light beam incides prism, selects the number and the layout of space and prism according to the number of required beamlet with distributing.
The beamlet of deviation is through high reflective mirror reflection guiding primary optical axis direction, and this high reflective mirror plating high-reflecting film is to reduce optical loss.
So far, the incident rectangular light beam cut apart guiding after, compressed light beam in the length that expands Shu Fangxiang, finished shaping to incident beam.
Light beam after the shaping incides prism beam-expanded device to carry out one dimension and expands bundle, its objective is separate wavelengths and reduces the angle of divergence of light beam.Prism beam-expanded device is made up of three to five right-angle prisms, and prism too much can produce the distortion of can not ignore to the wavefront of light.
Coarse adjustment mechanism and accurate adjustment mechanism are used to select the also centre wavelength of stabilized lasers light beam.Coarse adjustment mechanism is to rotate a prism beam expander with the stepper motor turntable to change light beam and incide wavelength and select angle on the element grating, thus the centre wavelength of coarse adjustment light beam; Accurate adjustment mechanism is to rotate the prism beam expander that closes on diffraction grating with PZT nanometer turntable to finely tune the angle that light beam incides wavelength selection element grating, thus the centre wavelength of accurate adjustment laser.The close fit of these two kinds of schemes can be good at tuning wavelength.
The light beam that amplifies incides diffraction grating with blazing angle and carries out the wavelength selection.Selecteed narrow bandwidth wavelength returns along original optical path, is exported by coupling mirror after power amplification.This diffraction grating is blazed grating, echelle grating in particular.The characteristics of echelle grating are that blazing angle is big, and the order of diffraction is inferior high, can realize ultrahigh resolution.Because the deep ultraviolet wavelength has high photon ionization energy, high-reflecting film need be plated in the surface of grating, and for example the aluminium film adds the magnesium fluoride film.
Technique effect of the present invention:
The present invention is divided into the major axis of rectangular light beam the beamlet of some directions by insert prism in light path, by high reflective mirror that the minor axis of the beamlet of break-in and elementary beam is overlapping, thereby realize the variation of light beam length breadth ratio, and then reduce the beam length that palpus expands Shu Fangxiang, reduced grating length effectively; Realize the centre wavelength Tuning mechanism of laser by the turntable of rotational fixation prism, stepper motor turntable and PZT nanometer turntable are realized accurate rotation of rough rotation mediation to two prism beam expanders respectively, adjust light beam is realized laser center wavelength to the grating incident angle coarse adjustment and accurate adjustment.Can realize the output of narrow linewidth excimer laser, reduce the size of diffraction grating simultaneously, simplify the tuning physical construction of centre wavelength.
Description of drawings
Fig. 1 is the structural representation that contains the line width compression device of beam shaping and wavelength rotation tuning of the present invention.
Fig. 2 is the structural representation of beam shaping of the present invention.
Embodiment
See also Fig. 1, Fig. 1 is the structural representation that the present invention contains the line width compression device of beam shaping and wavelength rotation tuning.The length that the light beam that laser tube sends expands Shu Fangxiang through beam shaping 1 compression.The structural drawing of this beam shaping 1 as shown in Figure 2, this beam shaping 1 is formed by being distributed in first right angle prism 11 and second right angle prism 12 with rectangular apertures passage both sides of square-section, the relative both sides that also are distributed in described rectangular apertures passage abreast of a right angle face of described first right angle prism 11 and second right angle prism 12, one first high reflection mirror 13 respectively is set in that the string face of described first right angle prism 11 and second right angle prism 12 is relative, be arranged on the top of described rectangular apertures passage two second catoptrons 14 and described first high reflection mirror 13 counterpart's fonts, make the light beam of this beam shaping of input, behind described beam shaping 1, be divided into three way light beams, wherein deviation does not take place in the light beam through interstitial channels, through the light beam of described first right angle prism 11 and second right angle prism 12 respectively to the string face deviation of prism separately, behind first high reflective mirror 13 and second high reflective mirror 14, lead the not parallel upside of deviation beamlet and close bundle of the beamlet of deviation, the width of its compression direction becomes originally 1/2 behind the beam shaping, and the length of diffraction grating 3 is reduced by half.Light beam after the shaping carries out one dimension through prism beam-expanded device 2 and expands bundle, this prism beam-expanded device 2 is made up of four prisms 6,7,8,9, light beam incides the string face of each prism and successively through the face outgoing of the right angle of correspondence, adjust angle that light beam incides prism and can adjust the expansion bundle rate of beam expander, simultaneously, for the optical loss that the Fresnel reflection that reduces between prism forms, the string face plating antireflective film of prism.Light beam behind the expansion bundle incides diffraction grating 3 and carries out the wavelength selection, and this diffraction grating is an echelle grating, and its surface needs to plate the photoionization damage that high-reflecting film causes to reduce incident light.First prism 6 is fixed on the stepper motor turntable 4, and the 4th prism 9 is fixed on the PZT nanometer turntable 5, by rotating table respectively coarse adjustment and accurate adjustment light beam incide the angle of diffraction grating 4, thereby realize the coarse adjustment and the accurate adjustment of laser beam centre wavelength.
For this line width compression device, light beam is after beam expander amplifies, and the laser beam live width (FWHM) that can realize through the grating compression is
Wherein, λ
0Incident light centre wavelength, θ
0Be the angle of divergence of light source, α
BBe the blazing angle of grating, M is the total magnification of beam expander.
For the grating of finite length, expand bundle rate M and restricted by the length L of grating
Pulse comes and goes the final live width δ that obtains after N time in resonator cavity
λCan be written as
The times N of pulse round trip in laser instrument can influence the live width of compression.The life-span of the gain media counter-rotating of pulsed discharge Mode for Laser device is usually less than 100ns.N is directly proportional with the last energy level ion lifetime (be 2-6ns the life time of the level of ArF) of ArF, grows up to inverse ratio with the chamber, and the decision of relevant gain time; We get N=4 in calculating.Then final live width formula can be written as
For long 316mm blazing angle is 79 ° diffraction grating, if the spot size of laser tube emission light beam is 8mm * 4mm, corresponding beam divergence angle is 0.8mrad * 1.5mrad.The 8mm length direction is expanded bundle, and the expansion bundle rate of light beam can reach 18 before the shaping, and the live width of corresponding compression is 0.4pm, and the expansion bundle rate of light beam can expand and is twice behind the beam shaping, and the live width of corresponding compression is 0.2pm, and promptly compressed capability is doubled.
Claims (6)
1. line width compression device that contains beam shaping and wavelength rotation tuning is characterized in that this device is made up of beam shaping (1), prism beam-expanded device (2) and diffraction grating (3):
Described beam shaping (1) is formed by being distributed in first right angle prism (11) and second right angle prism (12) with rectangular apertures passage both sides of square-section, the relative both sides that also are distributed in described rectangular apertures passage abreast of a right angle face of described first right angle prism (11) and second right angle prism (12), relative position at the string face of described first right angle prism (11) and second right angle prism (12) respectively is provided with one first high reflection mirror (13), be arranged on to two second high reflection mirrors (14) and herringbone relative the top of described rectangular apertures passage with described two first high reflection mirrors (13), make the light beam of this beam shaping of input (1), behind described beam shaping (1), be divided into three way light beams, promptly deviation does not take place in the beamlet through described rectangular apertures passage, be called not deviation beamlet, through the beamlet of described first right angle prism (11) and the beamlet of second right angle prism (12) respectively to the string face deviation of prism separately, be called the deviation beamlet, and this two bundles deviation beamlet behind first high reflection mirror (13) and second high reflection mirror (14), lead respectively deviation beamlet not the top and be parallel to this not deviation beamlet and will described three way light beams close to restraint and export;
Described prism beam-expanded device (2) is arranged in order by a plurality of right-angle prisms to be formed, this prism beam-expanded device (2) be last-on ... on-following structure, the drift angle that is each right-angle prism makes progress, the drift angle of exclusive last right-angle prism is placed downwards, first right-angle prism is arranged on the stepper motor turntable (4), and described last right-angle prism is arranged on a PZT interior rice turntable (5);
Described diffraction grating (3) is an echelle grating.
2. the line width compression device that contains beam shaping and wavelength rotation tuning according to claim 1 is characterized in that described prism beam-expanded device (2) is made up of three or four right-angle prisms.
3. the line width compression device that contains beam shaping and wavelength rotation tuning according to claim 1 is characterized in that described stepper motor turntable (4) is made up of stepper motor driver and controller.
4. the line width compression device that contains beam shaping and wavelength rotation tuning according to claim 1 is characterized in that described PZT nanometer turntable (9) is made up of piezoelectric ceramic actuator and controller.
5. the line width compression device that contains beam shaping and wavelength rotation tuning according to claim 1, the blazing angle that it is characterized in that described diffraction grating (3) are 71 °～82 °.
6. according to each described line width compression device that contains beam shaping and wavelength rotation tuning of claim 1 to 5, it is characterized in that the string face plating anti-reflection film of described first right angle prism (11) and second right angle prism (12).
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| CN103036143B (en) * | 2012-12-18 | 2015-04-01 | 中国科学院光电研究院 | Method and device for laser coherence length continuous adjustment |
| CN103018897B (en) * | 2013-01-08 | 2014-11-26 | 中国科学院上海光学精密机械研究所 | Precise wavelength tuning device |
| CN108432067B (en) * | 2016-01-20 | 2020-04-28 | 特拉迪欧德公司 | Wavelength beam combining laser system with prism for beam quality improvement and bandwidth reduction |
| US10416471B2 (en) | 2016-10-17 | 2019-09-17 | Cymer, Llc | Spectral feature control apparatus |
| WO2018198215A1 (en) | 2017-04-26 | 2018-11-01 | ギガフォトン株式会社 | Band-narrowing module |
| CN108493751A (en) * | 2018-01-19 | 2018-09-04 | 北京科益虹源光电技术有限公司 | A kind of Wavelength stability controller |
| CN109490206A (en) * | 2019-01-04 | 2019-03-19 | 北京科益虹源光电技术有限公司 | A kind of line width adjustment apparatus and system of spectrum-stable |
| CN113588101B (en) * | 2020-04-30 | 2023-05-02 | 北京科益虹源光电技术有限公司 | Absolute wavelength calibration method of excimer laser |
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Effective date of registration: 20220517 Address after: 241200 Chungu 3D Printing Industrial Park, Fanchang Economic Development Zone, Wuhu City, Anhui Province Patentee after: Anhui Zhongke Spring Valley Laser Industry Technology Research Institute Co.,Ltd. Address before: 201800 Shanghai 800-211 post office box Patentee before: SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS CHINESE ACADEMY OF SCIENCES |
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