CN101561606B - Active component array substrate - Google Patents

Active component array substrate Download PDF

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Publication number
CN101561606B
CN101561606B CN2009101118974A CN200910111897A CN101561606B CN 101561606 B CN101561606 B CN 101561606B CN 2009101118974 A CN2009101118974 A CN 2009101118974A CN 200910111897 A CN200910111897 A CN 200910111897A CN 101561606 B CN101561606 B CN 101561606B
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CN
China
Prior art keywords
light
base plate
array base
active assembly
assembly array
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Expired - Fee Related
Application number
CN2009101118974A
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Chinese (zh)
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CN101561606A (en
Inventor
李仲明
刘志鸿
林宜平
吴政动
黄坤源
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Chunghwa Picture Tubes Ltd
Original Assignee
CPTF Visual Display Fuzhou Ltd
Chunghwa Picture Tubes Ltd
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Application filed by CPTF Visual Display Fuzhou Ltd, Chunghwa Picture Tubes Ltd filed Critical CPTF Visual Display Fuzhou Ltd
Priority to CN2009101118974A priority Critical patent/CN101561606B/en
Publication of CN101561606A publication Critical patent/CN101561606A/en
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  • Optical Filters (AREA)

Abstract

The invention relates to an active component array substrate which comprises a substrate, a pixel array, and a plurality of shading patterns. The substrate is provided with a display area and a colored light-filtering area around the display area, while the colored light-filtering area is provided with a plurality of spacers. The pixel array comprises a plurality of control wirings and a pluralityof pixel units connected with the control wirings, wherein the control wirings extend to the colored light-filtering area, while the spacers in the colored light-filtering area are located between ev ery two adjacent control wirings. The spacer has a plurality of shading patterns and is electrically insulated from the pixel array, wherein a plurality of the shading patterns are arranged in each spacer.

Description

Active assembly array base plate
Technical field
The invention relates to a kind of package count group substrate, and particularly be provided with the active assembly array base plate of a light-shielding pattern relevant for a kind of edge.
Background technology
Present comparatively general LCD mostly is Thin Film Transistor-LCD greatly, and (Thin FilmTransistor Liquid Crystal Display, TFT-LCD) its primary clustering comprises a plurality of groups of substrates of thin-film transistor, a colored optical filtering substrates and a liquid crystal layer.Colored optical filtering substrates is the top that is arranged at plurality of groups of substrates of thin-film transistor abreast, and liquid crystal layer is to be folded between plurality of groups of substrates of thin-film transistor and the colored optical filtering substrates.
Please refer to Fig. 1, display panels 100 can be divided into a viewing area 100a and a colorized optical filtering section 100b, wherein, viewing area 100a is the part of main show image picture, and a frame glue 110 is set among the 100b of colorized optical filtering section, make plurality of groups of substrates of thin-film transistor see through frame glue 110 and engage with colored optical filtering substrates.
Find at present, the light that being arranged at the backlight module (not shown) of display panels 100 belows is provided can pass among the 110b of colorized optical filtering section gap between each scan wiring 111 and the gap between each data wiring 112, and makes display panels frontside edge place that the situation of light leak take place.Therefore, at present several suspension joint metals (floating metal) 113 can be set generally below frame glue, with usefulness as shading.
Yet, the setting of these suspension joint metals 113, the injury that but may produce static discharge, and then the yield of reduction panel.
Summary of the invention
The purpose of this invention is to provide a kind of active assembly array base plate, to reduce the probability that static discharge takes place.
The present invention proposes a kind of active assembly array base plate.Active assembly array base plate comprises a substrate, a picture element array and a plurality of light-shielding pattern.Substrate has a viewing area and a colorized optical filtering section around the viewing area, and the colorized optical filtering section has a plurality of spacer regions.The picture element array comprises many control distributions and a plurality of picture element unit that are connected those control distributions, and wherein said control distribution extends to the colorized optical filtering section, and the spacer region in the colorized optical filtering section is then between every adjacent two control distributions.Have a plurality of light-shielding patterns in the spacer region, and be electrically insulated with this picture element array, wherein the quantity of the light-shielding pattern in each spacer region is a plurality of.
In an embodiment of the present invention, wherein each light-shielding pattern be shaped as a strip.
In an embodiment of the present invention, the width of light-shielding pattern is less than the distance between this two adjacent control distribution.
In an embodiment of the present invention, the width of light-shielding pattern is greater than the distance between this two adjacent control distribution.
In an embodiment of the present invention, these light-shielding patterns are by a metal material or a light-proof material, and light-proof material is a resin or an organic photoresistance.
In an embodiment of the present invention, the control distribution comprises most bar scan wirings and most bar data wiring.Wherein these scan wirings and some light-shielding patterns are by being formed with patterning process.These data wirings and some light-shielding patterns are by being formed with patterning process.
In an embodiment of the present invention, wherein in this spacer region respectively, the distance between adjacent two light-shielding patterns is between 5 microns to 8 microns.
In an embodiment of the present invention, a plurality of transistors are arranged along empty data distribution.
In an embodiment of the present invention, more comprise a protective seam, this protective seam is covered in those light-shielding patterns.
In sum, the included picture element array of active assembly array base plate of the present invention can drive the liquid crystal molecule in the liquid crystal layer, and then produces image, so active assembly array base plate of the present invention can be applied in the display.For above-mentioned feature and advantage of the present invention can be become apparent, embodiment cited below particularly, and cooperate appended graphicly, be described in detail below.
Description of drawings
Fig. 1 is the schematic top plan view of the active assembly array base plate of known techniques;
Fig. 2 is the schematic top plan view of the active assembly array base plate of one embodiment of the invention;
Fig. 3 is the local enlarged diagram of the active assembly array base plate among Fig. 2;
Fig. 4 is the diagrammatic cross-section of the center line I-I among Fig. 2; And
Fig. 5 is the diagrammatic cross-section of another embodiment of the center line I-I among Fig. 2.
Primary clustering symbol description in the accompanying drawing:
100 display panels
The 100a viewing area
100b colorized optical filtering section
110 frame glue
111 scan wirings
112 data distributions
113 suspension joint metals
200 active assembly array base plates
210 substrates
The 210a viewing area
210b colorized optical filtering section
2100 spacer regions
220 picture element arrays
221 scan wirings
222 data distributions
223 picture element unit
230 light-shielding patterns
The light-shielding pattern of 230a ground connection design
240 insulation courses
250 protective seams
Embodiment
Fig. 2 is the schematic top plan view of the active assembly array base plate of one embodiment of the invention.See also Fig. 2, active assembly array base plate 200 comprises a substrate 210, a picture element array 220 and a plurality of light-shielding pattern 230, and wherein substrate 210 can be glass substrate, and can have light transmission.
Substrate 210 has a viewing area 210a and a colorized optical filtering section 210b.Colorized optical filtering section 210b is positioned at the other 210a in viewing area, and colorized optical filtering section 210b has a plurality of spacer regions 2100.Viewing area 210a and colorized optical filtering section 210b are all on the same surface of substrate.
Picture element array 220 comprises many control distributions 221,222 and a plurality of picture elements unit 223, and picture element unit 223 electrically connects these control distributions 221,222.Control distribution 221,222 comprises plurality of scanning wirings 221 and many data wirings 222.And these plurality of scanning wirings 221 and many data wirings 222 extend to this colorized optical filtering section 210b respectively, and respectively this spacer region 2100 between adjacent two scan wirings 221 or between adjacent two data wirings 222.
Each picture element unit 223 comprises that a transistor and electrically connects transistorized pixel electrode.These transistors for example are thin film transistor (TFT)s, and all have gate (gate), source electrode (source) and drain (drain).Pixel electrode can be transparency conducting layer, its material for example be indium tin oxide (Indium Tin Oxide, ITO) or indium-zinc oxide (Indium Zinc Oxide, IZO).
Hold above-mentionedly, these transistorized gates electrically connect these scan wirings 221 respectively, and source electrode electrically connects these data wirings 222 respectively, and drain electrically connects these pixel electrodes respectively.Therefore, these transistors can be opened or close to these scan wirings 221, gives pixel electrode to control these data wiring 222 output voltages.
Above-mentioned a plurality of light-shielding patterns 230 are positioned at colorized optical filtering section 210b, and be disposed at respectively in the interior spacer region 2100 of colorized optical filtering section 210b, and be electrically insulated with this picture element array 220, wherein respectively the quantity of the light-shielding pattern 230 of this spacer region interior 2100 is a plurality of, and having certain distance between adjacent two light-shielding patterns, this distance is preferably between 5 microns to 8 microns.In addition, light-shielding pattern 230 is to be positioned between the two adjacent control distributions (221,222), and can be less than the distance between the two adjacent control distributions (221,222) from the width of sectional view light-shielding pattern 230.
In addition, these light-shielding patterns 230 can be a metal material or a light-proof material, and for instance, light-proof material can be an organic photoresistance.Secondly, these light-shielding patterns 230 can avoid producing between the signal line situation of light leak, to reach good shaded effect.
The shape of light-shielding pattern 230 can be a strip.Therefore, in this spacer region respectively, the design of light-shielding pattern can be a plurality of discontinuous strips and arranges, and these discontinuous strips are arranged light-shielding patterns design, can avoid the accumulation of electric charge, reduce the probability that static discharge takes place.Secondly, these light-shielding patterns 230 can be designed to a dotted line (Dotted line) pattern, generally speaking, because of dashed pattern has less graphics area than solid pattern, so can prevent the accumulation of electric charge, but not undermine the function of its shading, and the design of dashed pattern, the transmission of electric charge capable of blocking does not again allow static to conducted inside, the generation of further anti-system electrostatic breakdown.
Fig. 3 is the local enlarged diagram of the active assembly array base plate among Fig. 2.Please refer to Fig. 3, in a plurality of light-shielding patterns 230 in this spacer region 2100 respectively, one of them light-shielding pattern 230 is one to have the light-shielding pattern 230a of ground connection design.
Fig. 4 be for the plurality of groups of substrates of thin-film transistor drawn along the I-I ' profile line of Fig. 2 in the diagrammatic cross-section of colorized optical filtering section.See also Fig. 2 and Fig. 4, in this embodiment, the scan wiring 221 in the 210b of colorized optical filtering section is to be made by the first metal layer (M1), and data distribution 222 is to be made by second metal level (M2).
Therefore, the light-shielding pattern 230 that is disposed at 221 of adjacent two scan wirings can be made by second metal level (M2), as the shading design of scan wiring 221.
In like manner, the light-shielding pattern that is disposed at adjacent two data wirings 222 then forms when making the first metal layer (M1), designs as the shading and the electrostatic prevention of data wiring 222.
That is to say that when carrying out the patterning process of the first metal layer (M1), it can form scan wiring 221 and the light-shielding pattern 230 that is disposed at adjacent two data wirings 222 simultaneously.When carrying out the patterning process of second metal level (M2), can form data wiring 222 and the light-shielding pattern 230 that is disposed at adjacent two scan wirings 221 simultaneously.By this, these light-shielding patterns 230 can be avoided 222 of data wirings or 221 situations that produce light leak of scan wiring respectively.
In this embodiment, light-shielding pattern 230 is except that can being made by metal material, and it also can be made by light-proof material, as: organic photoresistance.In addition, dispose an insulation course 240 (being so-called lock insulation course) on the first metal layer (M1), so that light-shielding pattern 230 is electrically insulated with scan wiring 221.
Moreover, on scan wiring 221 and data wiring 222, dispose a protective seam 250 equally, avoid being undermined in order to protection scan wiring 221 and data wiring 222 and make moist, and the assembly of scan wiring 221 and data wiring 222 and its top is electrically insulated.
Fig. 5 be for the plurality of groups of substrates of thin-film transistor drawn along the I-I ' profile line of Fig. 2 in another embodiment diagrammatic cross-section of colorized optical filtering section.See also Fig. 5 and Fig. 2, in this embodiment, the scan wiring 221 in the 210b of colorized optical filtering section is to be made by the first metal layer (M1), and data distribution 222 is to be made by second metal level (M2).
On the first metal layer (M1), dispose an insulation course 240 (being so-called lock insulation course).In addition, on scan wiring 221 and data wiring 222, dispose a protective seam 250 equally, avoid being undermined in order to protection scan wiring 221 and data wiring 222 and make moist, and the assembly of scan wiring 221 and data wiring 222 and its top is electrically insulated.
What need special instruction is that in this embodiment, 250 of protective seams are covered in light-shielding pattern 230.
The material of light-shielding pattern 230 can be that a light-proof material is formed in the present embodiment, and for example light-proof material can be a resin.So, when the material of light-shielding pattern 230 is a resin, the method for making of light-shielding pattern 230 can with practise black matrix (Black Matrix) identical.That is to say that when making of matrix (Black Matrix) deceived in general formation, black matrix (Black Matrix) can form simultaneously with light-shielding pattern 230.What must special one carry is, light-shielding pattern 230 designs at this moment are because of considering the demand of shading, so during from sectional view, the width of light-shielding pattern 230 is greater than the distance between this two adjacent control distribution (221,222).
Therefore, light-shielding pattern 230 also can be avoided the situation of static discharge injury in the known techniques except the shaded effect that can reach black matrix (Black Matrix).
In sum, in active assembly array base plate of the present invention, have a plurality of light-shielding patterns owing to be disposed between the control distribution in the septal area, and have certain distance between adjacent two light-shielding patterns.Therefore, in the manufacture process of LCD, or in the LCD running, when static discharge (Electrostatic Discharge takes place, ESD) or when having surging to produce, disconnect come the light-shielding pattern design, can reduce the static surging and enter to chance in the empty picture element region, improve antistatic capacity, further increase the yield of product.
Though the present invention discloses as above with previous embodiment, so it is not in order to limiting the present invention, anyly has the knack of alike skill person, and without departing from the spirit and scope of the present invention, institute does to change and the equivalence replacement of retouching, and still is in the scope of patent protection of the present invention.

Claims (10)

1. an active assembly array base plate is characterized in that, comprising:
One substrate have a viewing area and a colorized optical filtering section around this viewing area, and this colorized optical filtering section has a plurality of spacer regions;
One picture element array comprises many control distributions and a plurality of picture element unit that are connected those control distributions, and wherein those are controlled distributions and extend to this colorized optical filtering section, and respectively this spacer region between two adjacent control distributions; And
A plurality of light-shielding patterns are disposed at respectively in those spacer regions, and are electrically insulated with this picture element array, and wherein respectively the quantity of the light-shielding pattern in this spacer region is a plurality of, and has certain distance between adjacent two light-shielding patterns.
2. active assembly array base plate according to claim 1 is characterized in that, described light-shielding pattern be shaped as a strip.
3. active assembly array base plate according to claim 2 is characterized in that, the width of described light-shielding pattern is less than the distance between this two adjacent control distribution.
4. active assembly array base plate according to claim 2 is characterized in that, the width of described light-shielding pattern is greater than the distance between this two adjacent control distribution.
5. active assembly array base plate according to claim 1 is characterized in that, described light-shielding pattern is made up of a metal material or a light-proof material.
6. active assembly array base plate according to claim 5 is characterized in that, described light-proof material is a resin or an organic photoresistance.
7. active assembly array base plate according to claim 1 is characterized in that, described control distribution comprises most bar scan wirings and most bar data wiring; Described scan wiring and the light-shielding pattern that is disposed between adjacent two data wirings are by being formed with patterning process.
8. active assembly array base plate according to claim 7 is characterized in that, described data wiring and the light-shielding pattern that is disposed between adjacent two scan wirings are by being formed with patterning process.
9. active assembly array base plate according to claim 1 is characterized in that, in described each spacer region, the distance between adjacent two light-shielding patterns is between 5 microns to 8 microns.
10. active assembly array base plate according to claim 1 is characterized in that, more comprises a protective seam, and this protective seam is covered in those light-shielding patterns.
CN2009101118974A 2009-06-02 2009-06-02 Active component array substrate Expired - Fee Related CN101561606B (en)

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Application Number Priority Date Filing Date Title
CN2009101118974A CN101561606B (en) 2009-06-02 2009-06-02 Active component array substrate

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Application Number Priority Date Filing Date Title
CN2009101118974A CN101561606B (en) 2009-06-02 2009-06-02 Active component array substrate

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CN101561606B true CN101561606B (en) 2011-01-05

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Patentee after: Chunghwa Picture Tubes Ltd.

Address before: 350015 No. 1 Xingye Road, Mawei Science Park, Fujian, Fuzhou

Patentee before: Fuzhou Huaying Video & Telecom Co., Ltd.

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