CN101503215A - Preparation of photochromic MoO3 film - Google Patents

Preparation of photochromic MoO3 film Download PDF

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Publication number
CN101503215A
CN101503215A CNA2009100610764A CN200910061076A CN101503215A CN 101503215 A CN101503215 A CN 101503215A CN A2009100610764 A CNA2009100610764 A CN A2009100610764A CN 200910061076 A CN200910061076 A CN 200910061076A CN 101503215 A CN101503215 A CN 101503215A
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film
aqueous solution
photochromic
moo
preparation
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CNA2009100610764A
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沈毅
王萍萍
曹元媛
胡小伟
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China University of Geosciences
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China University of Geosciences
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Abstract

The invention discloses a preparation method for a photochromic MoO3 film, which comprises the following steps: preparing molyadate aqueous solution with the concentration of 0.05 to 3 mol/L; and then preparing the molyadate aqueous solution by using the ion exchange method; adjusting the pH value of the molyadate aqueous solution into 0.5 to 2.0 by using hydrochloric acid; adding a film-forming agent into the molyadate aqueous solution under the agitating condition, wherein the volume ratio of the film-forming agent and the molyadate aqueous solution is 1.0:1.0 to 2.0; uniformly agitating and enabling the molyadate aqueous solution to form sol; filming on an inorganic nonmetal substrate by using the sol; drying; and finally sintering for 0.5 to 3 hours at the temperature of 100 to 200 DEG C and 1 to 3 hours at the temperature of 300 to 600 DEG C. The prepared MoO3 film can fade under the natural nonluminous condition; as crystals on the surface of the film are uniformly distributed and compact, the growth of the crystals is anisotropic, thereby facilitating MoO3 crystal grains to absorb light; and the photochromic efficiency is high. In addition, the invention has the advantages of simple method, low cost and easy control of the thickness of the film.

Description

A kind of photochromic MoO 3The preparation method of film
Technical field
The present invention relates to a kind of MoO 3The preparation method of film particularly relates to a kind of MoO with photochromic properties 3The preparation method of film.
Background technology
Photochromic (photochromism) refers to certain material reversible change between two kinds of physics or chemical state, wherein has at least the transformation of a direction to be caused by optical radiation.Luminescent material is excited the back energy directly to be absorbed by luminescence center by the external energy optical energy irradiation, and activator or impurity also can be by the matrix absorption of luminescent material.Under first kind of situation, absorb or with the electronics in the activator Elektronenschale to the transition or the electronics of higher energy level with activator breaks away from fully and activator transits to ionization states formation " hole ".Under second kind of situation, during the matrix absorption energy, form hole and electronics in matrix, the hole may be moved along crystal, and be bound on each luminescence center, radiation is because electronics turns back to low initial energy level or electronics and hole, ion center again in conjunction with due to compound.Promptly bump and cause that they excite ionization when the atom of the particle of external energy luminous energy and luminous host.The unbound electron that ionization is come out has certain energy, can cause the ionization that excites of other atoms again, when the atom of excited state or state of ionization comes back to stable state, just causes luminously, and luminous host is optical radiation with the energy transformation that is absorbed.The Application Areas of photochromic material is comparatively extensive, as photochromic camouflage material, and photochromic printing plate and printed wiring etc.Also have the flourish of subjects such as photoelectronics and supramolecular chemistry in addition, photochromic material in information demonstration, transmitter, the storage of super-high density optical information and false proof discrimination, against sunshine etc. great application prospect is arranged aspect many, thereby become one of research focus of material science.
MoO 3Be a kind of important novel semiconductor material, have electrochromism, gas-discoloration, multiple performance such as photochromic, can be used for aspects such as solid state battery, gas sensor, lubricant, dyestuff, paint, media inhibitor.Wherein because MoO 3Material certain wavelength light according under, material structure and metal molybdenum atom valence state change, and show photochromic characteristic, make MoO 3Can produce absorption uniformly at visible region, demonstrate soft neutral color, on image demonstration, information storage, variable reflectivity mirror and high efficiency smart window, all have a good application prospect, obtain people and paid close attention to widely.Vast scientific research personnel has carried out extensive and deep research to this novel photochromic material both at home and abroad.But at present for MoO 3The research of photochromic properties concentrates on colloidal sol and the powder mostly, for pure MoO 3The research of film photochromic properties does not appear in the newspapers as yet, in order to enlarge MoO 3The range of application of photochromic material is necessary pure MoO 3Photochromic film is studied.
Summary of the invention
The objective of the invention is to remedy the deficiencies in the prior art, a kind of photochromic MoO is provided 3The preparation method of film.The MoO that adopts this method to make 3The photochromic efficient height of film, and can under the unglazed condition of normality, fade.
For achieving the above object, technical scheme provided by the invention is: a kind of photochromic MoO 3The preparation method of film comprises following concrete steps:
(1) compound concentration is the molybdate aqueous solution of 0.05~3mol/L;
(2) adopt ion exchange method that the molybdate aqueous solution is made the molybdic acid aqueous solution;
(3) with hydrochloric acid the molybdic acid pH value of aqueous solution is adjusted into 0.5~2.0;
(4) add membrane-forming agent in this molybdic acid aqueous solution under agitation condition, the volume ratio of the membrane-forming agent and the molybdate aqueous solution is 1.0:1.0~2.0, stirs homogenizing then and forms colloidal sol;
(5) with gained colloidal sol plated film on the inorganic non-metallic substrate of cleaning, drying;
(6) dried inorganic non-metallic substrate is incubated 0.5~3 hour at 100~200 ℃, sintering under 1~3 hour the conditions of 300~600 ℃ of insulations.
Described molybdate is soluble in water, and its cationic strong acid salt molybdate also soluble in water.
Under stirring, in being 0.5~2.0 the molybdic acid aqueous solution, the pH value dropwise adds membrane-forming agent in the above-mentioned steps (4) with the speed of 200~600r/min.
Described membrane-forming agent is a number-average molecular weight 2000~5000, dissolves each other with water and at 300 ℃ of polyelectrolyte that can begin to decompose.
After stirring homogenizing formation colloidal sol in the above-mentioned steps (4), place the dark place to place 24~48 hours colloidal sol, then plated film on the inorganic non-metallic substrate of cleaning.
Above-mentioned steps (5) is middle to be to adopt dip-coating method that the inorganic non-metallic substrate of cleaning is immersed in the colloidal sol with gained colloidal sol plated film on the inorganic non-metallic substrate of cleaning, and with pull rate plated film on substrate of 15~25mm/s, the plated film time is 80~200s.
Drying temperature is 40~80 ℃ described in the above-mentioned steps (5).
MoO 3Film is under the irradiation of daylight or UV-light, and the electronics in the valence band is excited in the conduction band, stays the hole in valence band, produces electron-hole pair, and light induced electron is by Mo 6+Catch, generate Mo 5+, the transformation of ionic valence condition causes aberration, the inner or surperficial reduction species of photohole oxide film generate proton H as water simultaneously +, inject film inside, also can be so that Mo 6+Be reduced into Mo 5+And the generation aberration.
Advantage of the present invention is as follows:
1. the MoO that adopts the inventive method to make 3The crystal of film surface is evenly distributed and is fine and close, the growth tool anisotropy of crystal grain, and this film can issue the look that changes in the irradiation of daylight or UV-light, fades under the unglazed condition of normality.
2. the inventive method is simple, and cost is low, and film thickness is controlled easily.
Description of drawings
Fig. 1 is MoO of the present invention 3The sem photograph of film microscopic appearance.
Embodiment
Below in conjunction with the drawings and specific embodiments to photochromic MoO provided by the invention 3The preparation method of film is described further, and its purpose is to help better to understand content of the present invention, but the protection domain that these specific embodiments do not limit the present invention in any way.
Embodiment 1
At first, with Na 2MoO 4Be dissolved in the redistilled water, be made into the Na that 25mL concentration is 0.2mol/L 2MoO 4The aqueous solution, this aqueous solution is obtained the molybdic acid aqueous solution after by Zeo-karb, hydrochloric acid with mass percent concentration 37% is adjusted into 1.0 with the molybdic acid pH value of aqueous solution, under the speed with 400r/min stirs, dropwise add the 25mL number-average molecular weight and be 2000~5000 polyacrylic acid, form colloidal sol after then reaction system being stirred homogenizing 4~8h, put to the dark place and leave standstill 24~48h, subsequently clean glass substrate is immersed in the colloidal sol, with pull rate on glass substrate the plated film of dip-coating method with 20mm/s, the plated film time is 120s, then 50 ℃ of dryings.At last, place resistance furnace at 200 ℃ of insulation 1h the slide behind the plated film, sintering under the condition of 450 ℃ of insulation 60min promptly gets photochromic MoO 3Film.Utilizing the full-automatic colour-difference meter of SC-80C (Beijing Kang Guang Instr Ltd.) to record film colourity is 20.99; With MoO 3Film is put into Z-F-20C camera bellows formula uv analyzer, and (the Shanghai Golconda turns round and look at village electric light instrument plant and makes, and power is 6W, and the ultraviolet wavelength of selection is 365nm.MoO 3Film is apart from light source 10cm), light application time 5h at room temperature, recording its colourimetric number is 15.10.MoO is described 3Film is excited variable color under UV-irradiation.The film of variable color is moved into unglazed place, approximately fade behind the 24h, its colourimetric number is 20.03, and prepared MoO is described 3Film fades under no optical condition.
To MoO 3The microscopic appearance of film characterizes by scanning electron microscope, obtain Fig. 1, as can be seen from the figure, crystal grain is embedded on the glass substrate equably, it is dense to distribute, and crystal becomes the shuttle shape more, and average grain size length is between 2~3 μ m, two is most advanced and sophisticated wide between 100~150nm, and the particle belly is wide between 300~500nm.At these intergranules, growth is an anisotropy, and above surface property also makes MoO 3Film is easier to take place photochromic character under ultraviolet excitation.
To MoO 3Film is photochromic to be analyzed: when illumination is mapped to MoO 3During film surface, electronics is excited in the conduction band in the valence band, stays the hole in valence band, produces electron-hole pair, and light induced electron is by Mo 6+Catch, generate Mo 5+, the inner or surperficial reduction species of photohole oxide film generate proton H as water simultaneously +, inject film inside, generate blue molybdenum bronze H with the oxide-bonded that is reduced xMoO 3And the crystal of the sample surfaces that this experiment obtains is evenly distributed and densification, and the growth of crystal grain is an anisotropy, and these characteristics all help MoO 3Crystal grain excites the more charged son of multivalence to the absorption of light, thereby improves MoO 3Photochromic efficient of film.
Embodiment 2
At first, with (NH 4) 2MoO 4Be dissolved in the redistilled water, be made into (the NH that 25mL concentration is 0.2mol/L 4) 2MoO 4The aqueous solution, this aqueous solution is obtained the molybdic acid aqueous solution after by Zeo-karb, hydrochloric acid with mass percent concentration 13% is adjusted into 0.5 with the molybdic acid pH value of aqueous solution, under the speed with 300r/min stirs, dropwise add the 25mL number-average molecular weight and be 2000~5000 polyvinylamine, then this reaction system is stirred homogenizing 4~8h, it is opened in dark place leave standstill 24~48h, subsequently clean glass substrate is immersed in the colloidal sol, with pull rate on glass substrate the plated film of dip-coating method with 18mm/s, the plated film time is 140s, then with glass substrate 60 ℃ of dryings.At last, place resistance furnace at 180 ℃ of insulation 70min the slide behind the plated film, sintering under the condition of 500 ℃ of insulation 60min promptly gets photochromic MoO 3Film.Adopt the method identical with embodiment 1, recording film is 5.261 with the variation size of its value of chromatism before and after the ultra violet lamp 5 minutes, film change indigo plant.Fade after moving into dark place 38h.
Embodiment 3
At first, with K 2MoO 4Be dissolved in the redistilled water, be made into the K that 25mL concentration is 0.05mol/L 2MoO 4The aqueous solution, this aqueous solution is obtained the molybdic acid aqueous solution after by Zeo-karb, hydrochloric acid with mass percent concentration 20% is adjusted into 1.0 with the molybdic acid pH value of aqueous solution, under the speed with 400r/min stirs, dropwise add the 12.5mL number-average molecular weight and be 2000~5000 polyacrylic acid, form colloidal sol after then reaction system being stirred homogenizing 4~8h, subsequently clean glass substrate is immersed in the colloidal sol, with pull rate on glass substrate the plated film of dip-coating method with 20mm/s, the plated film time is 100s, then with glass substrate 70 ℃ of dryings.At last, place resistance furnace at 200 ℃ of insulation 50min the slide behind the plated film, sintering under the condition of 600 ℃ of insulation 80min promptly gets photochromic MoO 3Film.Adopt the method identical with embodiment 1, recording film is 3.743 with the variation size of its value of chromatism before and after the ultra violet lamp 5 minutes, film change indigo plant.Fade after moving into dark place 34h.
Embodiment 4
At first, with Li 2MoO 4Be dissolved in the redistilled water, be made into the Li that 25mL concentration is 0.05mol/L 2MoO 4The aqueous solution, this aqueous solution is obtained the molybdic acid aqueous solution after by Zeo-karb, hydrochloric acid with mass percent concentration 30% is adjusted into 2.0 with the molybdic acid pH value of aqueous solution, under the speed with 500r/min stirs, dropwise add the 25mL number-average molecular weight and be 2000~5000 polyacrylic acid, form colloidal sol after then reaction system being stirred homogenizing 4~8h, subsequently clean glass substrate is immersed in the colloidal sol, with pull rate on glass substrate the plated film of dip-coating method with 20mm/s, the plated film time is 110s, then with glass substrate 50 ℃ of dryings.At last, place resistance furnace at 200 ℃ of insulation 1h the slide behind the plated film, sintering under the condition of 600 ℃ of insulation 60min promptly gets photochromic MoO 3Film.Adopt the method identical with embodiment 1, recording film is 3.815 with the variation size of its value of chromatism before and after the ultra violet lamp 5 minutes, film change indigo plant.Fade after moving into dark place 32h.
Embodiment 5
At first, with (NH 4) 2MoO 4Be dissolved in the redistilled water, be made into (the NH that 25mL concentration is 0.2mol/L 4) 2MoO 4The aqueous solution, this aqueous solution is obtained the molybdic acid aqueous solution after by zeolite, hydrochloric acid with mass percent concentration 18% is adjusted into 0.5 with the molybdic acid pH value of aqueous solution, under the speed with 350r/min stirs, dropwise add the 25mL number-average molecular weight and be 2000~5000 polyvinylamine, form colloidal sol after then reaction system being stirred homogenizing 4~8h, colloidal sol put to the dark place leave standstill 24~48h, subsequently glass substrate is immersed in the colloidal sol, with pull rate on glass substrate the plated film of dip-coating method with 20mm/s, the plated film time is 130s, then with glass substrate 60 ℃ of dryings.At last, place resistance furnace at 180 ℃ of insulation 70min the slide behind the plated film, sintering under the condition of 500 ℃ of insulation 60min promptly gets photochromic MoO 3Film.Adopt the method identical with embodiment 1, recording film is 4.873 with the variation size of its value of chromatism before and after the ultra violet lamp 5 minutes, film change indigo plant.Fade after moving into dark place 37h.
Embodiment 6
As different from Example 1 with identical sample at its photochromic properties of test between southern area summer fine 12 noon to 14, the variation size of colourimetric number is 7.6906 before and after its illumination 5 minutes, moves into and fades after dark place 48h days.
Agents useful for same is analytical pure in the embodiment of the invention, and institute's water is a redistilled water, can also adopt deionized water, pure water, ultrapure water, distilled water etc.Adopt glass substrate in the embodiment of the invention, inorganic non-metallic carrier substrates such as all right adopting quartz glass, ITO.Adopt dip-coating method to carry out plated film in the embodiment of the invention, can adopt the method for being coated with, scraping blade method etc. in addition.

Claims (7)

1. photochromic MoO 3The preparation method of film is characterized in that comprising following concrete steps:
(1) compound concentration is the molybdate aqueous solution of 0.05~3mol/L;
(2) adopt ion exchange method that the molybdate aqueous solution is made the molybdic acid aqueous solution;
(3) with hydrochloric acid the molybdic acid pH value of aqueous solution is adjusted to 0.5~2.0;
(4) add membrane-forming agent in this molybdic acid aqueous solution under agitation condition, the volume ratio of the membrane-forming agent and the molybdate aqueous solution is 1.0:1.0~2.0, stirs homogenizing then and forms colloidal sol;
(5) with gained colloidal sol plated film on the inorganic non-metallic substrate of cleaning, drying;
(6) dried inorganic non-metallic substrate is incubated 0.5~3 hour at 100~200 ℃, sintering under 1~3 hour the conditions of 300~600 ℃ of insulations.
2. photochromic MoO according to claim 1 3The preparation method of film is characterized in that: described molybdate is soluble in water, and its cationic strong acid salt molybdate also soluble in water.
3. photochromic MoO according to claim 1 3The preparation method of film is characterized in that: dropwise add membrane-forming agent in the pH value is 0.5~2.0 the molybdic acid aqueous solution in the step (4) under stirring with the speed of 200~600r/min.
4. according to claim 1 or 3 described photochromic MoO 3The preparation method of film is characterized in that: described membrane-forming agent is a number-average molecular weight 2000~5000, dissolves each other with water and at 300 ℃ of polyelectrolyte that can begin to decompose.
5. photochromic MoO according to claim 1 3The preparation method of film is characterized in that: after stirring homogenizing formation colloidal sol in the step (4), place the dark place to place 24~48 hours colloidal sol, then plated film on the inorganic non-metallic substrate of cleaning.
6. photochromic MoO according to claim 1 3The preparation method of film, it is characterized in that: step (5) is middle to be to adopt dip-coating method that the inorganic non-metallic substrate of cleaning is immersed in the colloidal sol with gained colloidal sol plated film on the inorganic non-metallic substrate of cleaning, with pull rate plated film on substrate of 15~25mm/s, the plated film time is 80~200s.
7. photochromic MoO according to claim 1 3The preparation method of film is characterized in that: drying temperature is 40~80 ℃ described in the step (5).
CNA2009100610764A 2009-03-10 2009-03-10 Preparation of photochromic MoO3 film Pending CN101503215A (en)

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102357658A (en) * 2011-04-29 2012-02-22 福州大学 Hydrosol for preparing solar photo-thermal conversion absorption film
CN102701701A (en) * 2012-04-20 2012-10-03 上海沪正纳米科技有限公司 Thermal-insulation energy-saving thin-layer coating
CN103288138A (en) * 2013-05-15 2013-09-11 中国地质大学(武汉) Preparation method of thorn-ball photochromic MoO3 thin film
CN105621487A (en) * 2016-03-03 2016-06-01 广东工业大学 Preparation method of molybdenum trioxide thin film and prepared photoelectric device
US10444552B2 (en) 2015-05-25 2019-10-15 Huawei Technologies Co., Ltd. Photochromic lens module, camera and terminal device
CN115353701A (en) * 2022-07-05 2022-11-18 北京仿生界面科学未来技术研究院 Intelligent window foil capable of self-adapting to illumination intensity and preparation method and application thereof

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102357658A (en) * 2011-04-29 2012-02-22 福州大学 Hydrosol for preparing solar photo-thermal conversion absorption film
CN102357658B (en) * 2011-04-29 2014-03-26 福州大学 Hydrosol for preparing solar photo-thermal conversion absorption film
CN102701701A (en) * 2012-04-20 2012-10-03 上海沪正纳米科技有限公司 Thermal-insulation energy-saving thin-layer coating
CN102701701B (en) * 2012-04-20 2013-12-25 上海沪正纳米科技有限公司 Thermal-insulation energy-saving thin-layer coating
CN103288138A (en) * 2013-05-15 2013-09-11 中国地质大学(武汉) Preparation method of thorn-ball photochromic MoO3 thin film
US10444552B2 (en) 2015-05-25 2019-10-15 Huawei Technologies Co., Ltd. Photochromic lens module, camera and terminal device
CN105621487A (en) * 2016-03-03 2016-06-01 广东工业大学 Preparation method of molybdenum trioxide thin film and prepared photoelectric device
CN115353701A (en) * 2022-07-05 2022-11-18 北京仿生界面科学未来技术研究院 Intelligent window foil capable of self-adapting to illumination intensity and preparation method and application thereof
CN115353701B (en) * 2022-07-05 2023-09-29 北京仿生界面科学未来技术研究院 Preparation method and application of intelligent window foil capable of self-adapting to illumination intensity

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